Display substrate, manufacturing method thereof and display device

Abstract

The invention discloses a display substrate, a manufacturing method thereof and a display device. The display substrate includes sub-pixels and a pixel defining pattern. The sub-pixel comprises a light-emitting functional layer, and the light-emitting functional layer comprises a plurality of film layers; the pixel defining pattern includes a first opening, a second opening, and a pixel defining portion, the first opening is configured to define a light-emitting region of the sub-pixel, and at least one of the light-emitting functional layers is partitioned in the second opening. The pixel limiting part comprises a first side face surrounding the second opening and a second side face surrounding the first opening, the included angles between the first side face and the same first plane parallel to the substrate and between the second side face and the same first plane parallel to the substrate are the first side face angle and the second side face angle respectively, and the first side face angle and the second side face angle are both not larger than 90 degrees; the first side angle is larger than the second side angle. By arranging the first side surface to be steeper than the second side surface, crosstalk between adjacent sub-pixels can be reduced.

Description

Display substrate, manufacturing method thereof, and display device TECHNICAL FIELD

[0001] Embodiments of the present disclosure relate to a display substrate, a manufacturing method thereof, and a display device. BACKGROUND

[0002] An organic light emitting diode (OLED) display device is a new generation of display device after liquid crystal display device, and has advantages of rich color, fast response time, foldable, etc., and is favored by users. An organic light emitting display device with a tandem structure improves the service life and brightness of the light emitting device, and reduces power consumption by adding at least one light emitting layer and a charge generating layer in the organic light emitting device, thereby meeting the needs of users for power consumption and service life of the display device.

[0003] SUMMARY

[0004] Embodiments of the present disclosure provide a display substrate, a manufacturing method thereof, and a display device.

[0005] Embodiments of the present disclosure provide a display substrate, comprising: a substrate and a plurality of sub-pixels and a pixel defining pattern on the substrate. Each of at least part of the sub-pixels comprises a light emitting functional layer, and the light emitting functional layer comprises a plurality of film layers; the pixel defining pattern comprises a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to define a light emitting area of the at least part of the sub-pixels, at least one layer in the light emitting functional layer is located in at least part of the first openings which is a continuous part, and at least part of the at least one layer in the light emitting functional layer is blocked in at least one second opening. The pixel defining portion comprises a first side surface surrounding the second opening and a second side surface surrounding the first opening, and the included angle between the first side surface and a same first plane parallel to the substrate is a first side surface angle and a second side surface angle, respectively, the first side surface angle and the second side surface angle are both not greater than 90 degrees, and the first side surface angle is greater than the second side surface angle.

[0006] For example, according to embodiments of the present disclosure, a surface of the pixel defining portion on a side close to the substrate at the first side surface position is a first pixel defining surface, a surface of the pixel defining portion on a side close to the substrate at the second side surface position is a second pixel defining surface, an angle between the first pixel defining surface and the first side surface is a first angle, and an angle between the second pixel defining surface and the second side surface is a second angle, and the first angle is greater than the second angle.

[0007] For example, according to an embodiment of the present disclosure, the first angle is 30-90 degrees, and the second angle is 15-35 degrees.

[0008] For example, according to an embodiment of the present disclosure, a maximum thickness of the pixel defining part at the first side surface position is not less than a maximum thickness of the pixel defining part at the second side surface position.

[0009] For example, according to an embodiment of the present disclosure, a length of a cross section of the first side surface cut by a second plane perpendicular to the substrate is a first length, and a length of a cross section of the second side surface cut by the second plane is a second length, and the first length is less than the second length.

[0010] For example, according to an embodiment of the present disclosure, the first side surface includes a first side surface part close to the substrate and a second side surface part away from the substrate, the first side surface part and the second side surface part are connected to each other, an included angle between the first side surface part and the first pixel defining surface is the first angle, and an included angle between the second side surface part and a plane parallel to the first pixel defining surface is less than 90 degrees and not more than the first angle.

[0011] For example, according to an embodiment of the present disclosure, the display substrate further includes a limiting structure between the pixel defining part and the substrate, a portion of the limiting structure exposed by the second opening is configured to block the at least one layer in the light-emitting functional layer. The limiting structure includes a first limiting layer and a second limiting layer stacked, the second limiting layer is between the first limiting layer and the substrate, an edge of the first limiting layer protrudes towards the second opening surrounded thereby relative to an edge of the second limiting layer; the pixel defining part and the second limiting layer are both organic materials, and the first limiting layer includes a metal material or an inorganic non-metal material.

[0012] For example, according to an embodiment of the present disclosure, the first side surface includes a first side surface part close to the substrate and a second side surface part away from the substrate, the first side surface part and the second side surface part are connected to each other, and the second side surface part protrudes towards a side close to a center of the second opening surrounded thereby relative to the first side surface part so that the first side surface part includes a surface of a recess.

[0013] For example, according to an embodiment of the present disclosure, a ratio of a size of the recess in a direction perpendicular to the substrate to a size of the second limiting layer in the direction perpendicular to the substrate is 0.9-1.1.

[0014] For example, according to an embodiment of the present disclosure, a ratio of a size of the recessed portion recessed inwardly relative to the second side surface portion to a size of the edge of the second limiting layer recessed inwardly relative to the edge of the first limiting layer is 0.9-1.1.

[0015] For example, according to an embodiment of the present disclosure, an edge of the recessed portion on a side close to the substrate is recessed inwardly relative to an edge on a side away from the substrate by a size of not more than 5 micrometers.

[0016] For example, according to an embodiment of the present disclosure, a size of the recessed portion in a direction perpendicular to the substrate is 100-10000 angstroms.

[0017] For example, according to an embodiment of the present disclosure, the display substrate further includes an insulating layer between the limiting structure and the substrate. The second limiting layer is a part of the insulating layer.

[0018] For example, according to an embodiment of the present disclosure, the at least one layer in the light-emitting functional layer includes a first portion on the first side surface and a second portion on the second side surface, the second portion having a thickness greater than that of the first portion.

[0019] Another embodiment of the present disclosure provides a display substrate, including: a substrate and a plurality of sub-pixels, a pixel limiting pattern, and a partition structure on the substrate. Each of at least some of the sub-pixels includes a light-emitting functional layer, the light-emitting functional layer including a plurality of film layers; the pixel limiting pattern includes a plurality of openings and a pixel limiting portion surrounding the plurality of openings, the plurality of openings being configured to define a light-emitting area of the at least some of the sub-pixels, at least one layer in the light-emitting functional layer being located in at least some of the openings in a continuous manner; the partition structure is located on a side surface of the pixel limiting portion away from the substrate, at least some of the at least one layer in the light-emitting functional layer being partitioned at the partition structure. The pixel limiting portion includes a first pixel limiting portion overlapping the partition structure and a second pixel limiting portion surrounding at least part of the partition structure, the maximum thickness of the first pixel limiting portion being greater than that of the second pixel limiting portion.

[0020] For example, according to an embodiment of the present disclosure, a ratio of the thickness of the second pixel limiting portion to the thickness of the first pixel limiting portion is in a range of 5%-95%.

[0021] For example, according to an embodiment of the present disclosure, the thickness of the second pixel limiting portion is 0.1-2 micrometers.

[0022] For example, according to an embodiment of the present disclosure, the partition structure includes an organic material, a cross section of the partition structure cut by a plane perpendicular to an extending direction of the partition structure has a dimension parallel to the substrate in a direction pointing from the substrate to the light-emitting functional layer and perpendicular to the substrate, and the dimension gradually increases along the direction.

[0023] For example, according to an embodiment of the present disclosure, the cross section includes a first side close to the substrate, a second side away from the substrate, and a side edge connecting the first side and the second side, an included angle between the side edge and the second side is 40-90 degrees, and a thickness of the partition structure is 0.8-3 microns.

[0024] For example, according to an embodiment of the present disclosure, a projection of the partition structure on the substrate is completely located within a projection of the first pixel defining portion on the substrate.

[0025] Another embodiment of the present disclosure provides a display device including any of the display substrates.

[0026] Another embodiment of the present disclosure provides a manufacturing method of a display substrate, including: forming an insulating layer on a substrate; forming a plurality of defining layers on the insulating layer; forming a first electrode of a plurality of sub-pixels on the plurality of defining layers, wherein the sub-pixel includes the first electrode, a light-emitting functional layer, and a second electrode which are sequentially stacked in a direction perpendicular to the substrate; forming a pixel defining layer on the first electrode; performing a first patterning process on the pixel defining layer to form a plurality of first openings to expose the first electrode; and performing a second patterning process on the pixel defining layer to form a plurality of second openings to expose a portion of the defining layer. The manufacturing method further includes: etching a portion of the insulating layer that is not covered by the defining layer and is exposed by the second openings to form a protruding portion stacked with the defining layer in the same step of forming the plurality of second openings, wherein an edge of the protruding portion is recessed relative to an edge of the defining layer; forming the light-emitting functional layer after forming the protruding portion, the light-emitting functional layer including a plurality of film layers, at least one layer of the light-emitting functional layer being continuous in at least a portion of the first openings, and at least a portion of the at least one layer of the light-emitting functional layer being partitioned at the edge of the defining layer in at least one second opening.

[0027] For example, according to an embodiment of the present disclosure, while etching the insulating layer, the manufacturing method further includes: etching a portion of the pixel defining layer close to the defining layer to form a recessed portion around the second opening.

[0028] For example, according to an embodiment of the present disclosure, the pixel defining layer is etched by a dry etching method to form the plurality of second openings. BRIEF DESCRIPTION OF DRAWINGS

[0029] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some of the embodiments of the present disclosure, and not all of the embodiments of the present disclosure.

[0030] FIG. 1 is a schematic diagram of a partial cross-sectional structure of a display substrate according to an embodiment of the present disclosure.

[0031] FIG. 2 is a film layer structure before forming a light-emitting functional layer in the display substrate shown in FIG. 1.

[0032] FIGS. 3 and 4 are schematic diagrams of partial cross-sectional structures of display substrates in different examples according to embodiments of the present disclosure.

[0033] FIGS. 5 to 9 are partial process diagrams of a manufacturing method of a display substrate according to an embodiment of the present disclosure.

[0034] FIG. 10 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another embodiment of the present disclosure.

[0035] FIG. 11 is a schematic diagram of a partial planar structure of a display substrate according to an embodiment of the present disclosure.

[0036] FIG. 12 is a partial enlarged view of the display substrate shown in FIG. 11.

[0037] FIG. 13 is a schematic diagram of a partial planar structure of a display substrate according to another example of an embodiment of the present disclosure.

[0038] FIG. 14 is a schematic diagram of a planar structure of a display substrate according to another embodiment of the present disclosure.

[0039] FIG. 15 is a schematic block diagram of a display device according to another embodiment of the present disclosure. DETAILED DESCRIPTION

[0040] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some of the embodiments of the present disclosure, and not all of the embodiments of the present disclosure.

[0041] Unless otherwise defined, technical terms or scientific terms used in the present disclosure shall have the ordinary meaning as understood by a person of ordinary skill in the art to which the present disclosure pertains. The terms "first", "second", and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. The terms "include", "contain", and similar terms mean that the elements or objects before the terms encompass the elements or objects listed after the terms and their equivalents, and do not exclude other elements or objects. The features "parallel", "vertical", and "identical" used in the embodiments of the present disclosure include the strict "parallel", "vertical", and "identical" features, and also include the "approximately parallel", "approximately vertical", and "approximately identical" features with certain errors, which are considered in the light of measurement and errors related to the measurement of specific values (for example, limitations of a measurement system), and represent an acceptable deviation range for a specific value determined by a person of ordinary skill in the art. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value. When the quantity of a component is not specifically indicated in the following embodiments of the present disclosure, it means that the component can be one or more, or can be understood as at least one. "At least one" means one or more, and "a plurality of" means at least two.

[0042] The tandem technology is to stack and connect the light-emitting layers of the sub-pixels, and to arrange a whole charge generation layer, such as a P-type doped charge generation layer P-CGL and an N-type doped charge generation layer N-CGL, between the stacked light-emitting layers. Compared with a display substrate without a tandem device, the tandem device uses N / P-CGL as a heterojunction to connect two light-emitting layers in series, which realizes a double light-emitting device in series, greatly reduces the light-emitting current of the light-emitting device under the same light-emitting intensity, and improves the service life of the organic light-emitting element and reduces the power consumption.

[0043] In research, the inventors of the present application found that the charge generation layers of two adjacent sub-pixels in a tandem device are continuous film layers, and there is a charge lateral migration phenomenon, which causes a monochromatic chromaticity shift phenomenon of a display substrate at a low gray scale, such as easy to cause crosstalk between adjacent sub-pixels, resulting in color shift of the display substrate.

[0044] The embodiments of the present disclosure provide a display substrate and a manufacturing method thereof, and a display device.

[0045] The display substrate provided by the embodiments of the present disclosure includes a substrate and a plurality of sub-pixels and a pixel defining pattern on the substrate. Each of at least some of the sub-pixels includes a light-emitting functional layer including a plurality of film layers; the pixel defining pattern includes a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to define a light-emitting area of at least some of the sub-pixels, at least part of at least one of the film layers in the light-emitting functional layer is continuous in at least some of the first openings, and at least part of at least one of the film layers in the light-emitting functional layer is interrupted in at least one of the second openings. The pixel defining portion includes a first side surface surrounding the second opening and a second side surface surrounding the first opening, an included angle between the first side surface and a same first plane parallel to the substrate is a first side surface angle, an included angle between the second side surface and the same first plane is a second side surface angle, the first side surface angle and the second side surface angle are both not greater than 90 degrees, and the first side surface angle is greater than the second side surface angle.

[0046] By setting the first side surface surrounding the second opening in the pixel defining portion to be steeper than the second side surface surrounding the first opening, the thickness of at least one of the film layers in the light-emitting functional layer on the first side surface is thinned, the resistance is increased, and the cross talk between adjacent sub-pixels is reduced.

[0047] Another display substrate provided by the embodiments of the present disclosure includes a substrate and a plurality of sub-pixels, a pixel defining pattern, and an interruption structure on the substrate. Each of at least some of the sub-pixels includes a light-emitting functional layer including a plurality of film layers; the pixel defining pattern includes a plurality of openings and a pixel defining portion surrounding the plurality of openings, the plurality of openings are configured to define a light-emitting area of at least some of the sub-pixels, at least part of at least one of the film layers in the light-emitting functional layer is continuous in at least some of the openings; the interruption structure is located on a side surface of the pixel defining portion away from the substrate, and at least part of at least one of the film layers in the light-emitting functional layer is interrupted at the interruption structure. The pixel defining portion includes a first pixel defining portion overlapping the interruption structure and a second pixel defining portion surrounding at least part of the interruption structure, and the thickness of the first pixel defining portion is greater than the thickness of the second pixel defining portion.

[0048] By setting the interruption structure and setting the thickness of the first pixel defining portion overlapping the interruption structure to be greater than the thickness of the second pixel defining portion surrounding the interruption structure, the conductive path of at least one of the film layers in the light-emitting functional layer is extended, the cross talk between adjacent sub-pixels is reduced, the contact area and adhesion of the film layer on the side of the interruption structure away from the substrate are improved, and peeling is prevented.

[0049] The embodiment of the present disclosure provides a manufacturing method of a display substrate, including: forming an insulating layer on a substrate; forming a plurality of limiting layers on the insulating layer; forming a first electrode of a plurality of sub-pixels on the plurality of limiting layers, wherein the sub-pixel comprises the first electrode, a light-emitting functional layer and a second electrode which are sequentially stacked in a direction perpendicular to the substrate; forming a pixel limiting layer on the first electrode; performing a first patterning process on the pixel limiting layer to form a plurality of first openings to expose the first electrode; and performing a second patterning process on the pixel limiting layer to form a plurality of second openings, the second openings exposing a part of the limiting layer. The manufacturing method further comprises: in the same step of forming the plurality of second openings, etching a part of the insulating layer which is not covered by the limiting layer and exposed by the second openings to form a protruding part stacked with the limiting layer, wherein an edge of the protruding part is recessed relative to an edge of the limiting layer; forming the light-emitting functional layer after forming the protruding part, the light-emitting functional layer comprising a plurality of film layers, at least one layer of the light-emitting functional layer being continuous in at least a part of the first opening, and at least a part of at least one layer of the light-emitting functional layer being blocked at the edge of the limiting layer in at least one second opening.

[0050] By performing the two patterning processes on the pixel limiting layer to form the first openings and the second openings respectively, not only the topography of the first electrode can be prevented from being affected by the topography of the insulating layer, but also the influence of the second openings on the pixel limiting layer around the first openings and other film layers formed subsequently can be reduced, thereby improving the process yield.

[0051] The display substrate and the manufacturing method thereof and the display device provided by the present disclosure will be described below in conjunction with the accompanying drawings.

[0052] FIG. 1 is a schematic diagram of a partial cross-sectional structure of a display substrate according to an embodiment of the present disclosure. FIG. 2 is a film layer structure before a light-emitting functional layer is formed in the display substrate shown in FIG. 1.

[0053] As shown in FIGS. 1 and 2, the display substrate comprises a substrate 01 and a plurality of sub-pixels 100 and a pixel limiting pattern 200 on the substrate 01. Each of at least part of the sub-pixels 100 comprises a light-emitting functional layer 130, and the light-emitting functional layer 130 comprises a plurality of film layers. For example, the at least part of the sub-pixels 100 is located in a display area of the display substrate, i.e., an area for displaying images, and the display substrate further comprises a peripheral area surrounding the display area.

[0054] For example, as shown in FIG. 1, the sub-pixel 100 further comprises a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 in a direction perpendicular to the substrate 01 (e.g., the Z direction shown in FIG. 1), and the first electrode 110 is located between the light-emitting functional layer 130 and the substrate 01.

[0055] For example, as shown in FIG. 1, the light-emitting functional layer 130 can include a light-emitting layer for emitting light and a charge generation layer 133. For example, the light-emitting functional layer 130 can be a film layer in an organic light-emitting element. For example, the light-emitting functional layer 130 can include a first light-emitting layer (EML) 131, a charge generation layer (CGL) 133, and a second light-emitting layer (EML) 132, which are stacked, and the charge generation layer 133 is located between the first light-emitting layer 131 and the second light-emitting layer 132. The light-emitting functional layer 130 shown in FIG. 1 includes multiple film layers, and the thickness of the film layers is only for the purpose of clearly indicating the film layers, and does not represent the actual size.

[0056] For example, as shown in FIG. 1, the charge generation layer 133 has strong conductivity, which can make the light-emitting functional layer 130 have the advantages of long service life, low power consumption, and high brightness. For example, the same sub-pixel 100 can include a tandem light-emitting element, such as a Tandem OLED. Of course, embodiments of the present disclosure are not limited thereto, and the light-emitting functional layer 130 of each sub-pixel 100 can also include only one light-emitting layer.

[0057] For example, in the same sub-pixel 100, the first light-emitting layer 131 and the second light-emitting layer 132 can be light-emitting layers that emit the same color light. For example, the first light-emitting layer 131 in a sub-pixel 100 that emits different color light emits different color light. For example, the second light-emitting layer 132 in a sub-pixel 100 that emits different color light emits different color light. Of course, embodiments of the present disclosure are not limited thereto, for example, in the same sub-pixel 100, the first light-emitting layer 131 and the second light-emitting layer 132 can be light-emitting layers that emit different color light, and by providing light-emitting layers that emit different color light in the same sub-pixel 100, the light emitted by the multiple light-emitting layers included in the sub-pixel 100 can be mixed into white light, and the color of the light emitted by each sub-pixel 100 can be adjusted by providing a color film layer.

[0058] For example, in each sub-pixel 100, the light-emitting functional layer 130 can also include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).

[0059] For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer, the charge generation layer 133, and the second electrode 120 are common film layers of the multiple sub-pixels 100, which can be referred to as common layers. For example, the common layers and the second electrode 120 described above can be film layers formed using an open mask.

[0060] For example, the second light-emitting layer 132 can be located between the first light-emitting layer 131 and the second electrode 120, and the hole injection layer can be located between the first electrode 110 and the first light-emitting layer 131. For example, an electron transport layer can also be provided between the charge generation layer 133 and the first light-emitting layer 131. For example, a hole transport layer can be provided between the second light-emitting layer 132 and the charge generation layer 133. For example, an electron transport layer and an electron injection layer can be provided between the second light-emitting layer 132 and the second electrode 120.

[0061] For example, the charge generation layer 133 can include an N-type charge generation layer and a P-type charge generation layer.

[0062] For example, the material of the electron transport layer can include aromatic heterocyclic compounds, such as benzimidazole derivatives, imidazopyridine derivatives, benzimidazophenanthroline derivatives, and other imidazole derivatives; pyrimidine derivatives, triazine derivatives, and other azine derivatives; quinoline derivatives, isoquinoline derivatives, phenanthroline derivatives, and other compounds containing a nitrogen-containing six-membered ring structure (also including compounds having a phosphine oxide group as a substituent on the heterocycle); and the like.

[0063] For example, the material of the charge generation layer 133 can be a material containing a phosphorus oxygen group, or a material containing a triazine.

[0064] For example, the ratio of the electron mobility of the material of the charge generation layer 133 to the electron mobility of the electron transport layer is 10 -2 ~ 10 2 .

[0065] For example, the first electrode 110 can be an anode, and the second electrode 120 can be a cathode. For example, the cathode can be formed of a material with high conductivity and a low work function, for example, the cathode can be made of a metal material. For example, the anode can be formed of a transparent conductive material with a high work function.

[0066] For example, as shown in FIG. 1, the side of the first electrode 110 facing the substrate 01 is also provided with other structures (not shown), such as pixel circuits, signal lines, and various insulating layers electrically connected to the first electrode 110 of the sub-pixel 100, such as flat layers, passivation layers, buffer layers, gate insulating layers, interlayer insulating layers, and the like.

[0067] As shown in FIGS. 1 and 2, the pixel definition pattern 200 (PDL) includes a plurality of first openings 210, a plurality of second openings 220, and a pixel definition portion 230 surrounding the plurality of first openings 210 and the plurality of second openings 220, the plurality of first openings 210 are configured to define at least part of the light-emitting area 010 of the sub-pixel 100, at least part of at least one layer in the light-emitting functional layer 130 located in at least part of the first openings 210 is continuous, and at least part of at least one layer in the light-emitting functional layer 130 is interrupted in at least one second opening 220.

[0068] For example, as shown in FIG. 1, one sub-pixel 100 corresponds to at least one first opening 210, at least part of the light-emitting functional layer 130 of the sub-pixel 100 is located in the first opening 210 corresponding to the sub-pixel 100, and the first opening 210 is configured to expose the first electrode 110.

[0069] For example, as shown in FIG. 1, when the light-emitting functional layer 130 is formed in the first opening 210 of the pixel defining pattern 200, the first electrode 110 and the second electrode 120 located on both sides of the light-emitting functional layer 130 can drive the light-emitting functional layer 130 in the first opening 210 to emit light. For example, the first opening 210 of the pixel defining pattern 200 is used to define the light-emitting area 010 of the sub-pixel 100. The above-mentioned light-emitting area 010 can refer to the area of the effective light-emitting of the sub-pixel 100, and the shape of the light-emitting area 010 refers to a two-dimensional shape, for example, the shape of the light-emitting area 010 can be the same as the shape of the first opening 210 of the pixel defining pattern 200.

[0070] For example, as shown in FIG. 1, the material of the pixel defining part 230 can include polyimide, acrylic, polyethylene terephthalate, etc.

[0071] For example, as shown in FIG. 1, the part of each layer in the light-emitting functional layer 130 located in the first opening 210 is continuous, and the part of the second electrode located in the first opening 210 is continuously arranged. For example, the charge generation layer in the light-emitting functional layer 130 is interrupted in at least one second opening 220, such as the film layer between the charge generation layer 133 in the light-emitting functional layer 130 and the substrate 01. For example, each layer in the light-emitting functional layer 130 is interrupted in at least one second opening 220. For example, the second electrode 120 is interrupted in at least one second opening 220.

[0072] As shown in FIG. 1 and FIG. 2, the pixel defining part 230 includes a first side surface 240 surrounding the second opening 220 and a second side surface 250 surrounding the first opening 210, the included angle between the first side surface 240 and the second side surface 250 and the same first plane P1 parallel to the substrate 01 is the first side surface angle a01 and the second side surface angle a02, respectively, both the first side surface angle a01 and the second side surface angle a02 are not greater than 90 degrees, and the first side surface angle a01 is greater than the second side surface angle a02.

[0073] The first plane P1 can be a plane perpendicular to the Z direction. The first plane can be a plane in which a surface of the first electrode 110 on a side away from the substrate 01, but is not limited thereto, and can be any plane passing through both the first side surface and the second side surface, such as a plane in which the first side surface angle and the second side surface angle are each an angle between a side surface of the pixel defining portion and a portion of the plane inside the pixel defining portion.

[0074] For example, as shown in FIG. 1, a cross section of the first side surface 240 by a plane perpendicular to the substrate 01 can be a straight line segment or a curved line segment. When the cross section is a straight line segment, the first side surface angle a01 is an angle between the straight line segment and the first plane. When the cross section is a curved line segment, the first side surface angle a01 is an angle between a tangent of the curved line segment at a position of intersection with the first plane and the first plane. For example, a cross section of the second side surface 250 by a plane perpendicular to the substrate 01 can be a straight line segment or a curved line segment. When the cross section is a straight line segment, the second side surface angle a02 is an angle between the straight line segment and the first plane. When the cross section is a curved line segment, the second side surface angle a02 is an angle between a tangent of the curved line segment at a position of intersection with the first plane and the first plane. For example, the angles between the respective positions of the straight line segments and the first plane can be equal. The curved line segment can be a continuous curved line segment.

[0075] By setting the first side surface surrounding the second opening in the pixel defining portion to be steeper than the second side surface surrounding the first opening, the thickness of at least one layer of the light emitting functional layer on the first side surface can be thinned to increase the resistance and reduce crosstalk between adjacent sub-pixels.

[0076] In some examples, as shown in FIGS. 1 and 2, a surface of the pixel defining portion 230 on a side close to the substrate 01 at a position of the first side surface 240 is a first pixel defining surface 2001, a surface of the pixel defining portion 230 on a side close to the substrate 01 at a position of the second side surface 250 is a second pixel defining surface 2002, an angle between the first pixel defining surface 2001 and the first side surface 240 is a first angle a1, an angle between the second pixel defining surface 2002 and the second side surface 250 is a second angle a2, and the first angle a01 is greater than the second angle a02.

[0077] For example, the first pixel defining surface 2001 and the second pixel defining surface 2002 are surfaces of the pixel defining portion 230 on different positions on a side facing the substrate 01, such as the first pixel defining surface 2001 being closer to the substrate 01 than the second pixel defining surface 2002.

[0078] The first angle a1 can be the slope angle of the first side surface 240 at the position where the pixel defining surface contacts other structures, such as the limiting structure 300 (described later) or the insulating layer 400 (described later), and the first pixel defining surface can be the surface of the pixel defining portion contacting the limiting structure 300 (described later) or the insulating layer 400 (described later). The second angle a2 can be the slope angle of the second side surface 250 at the position where the second pixel defining surface contacts other structures, such as the first electrode, and the second pixel defining surface can be the surface of the pixel defining portion contacting the first electrode.

[0079] By setting the slope angle of the first side surface and the slope angle of the second side surface to be different, not only can the influence of the second opening on the shape of the pixel defining portion forming the first opening be reduced, but also the isolation effect of the light-emitting functional layer in the second opening can be improved.

[0080] For example, as shown in FIG. 1, the cross section of the first side surface 240 perpendicular to the plane of the substrate 01 can be a straight line segment or a curved line segment. When the cross section is a straight line segment, the first angle a1 is the angle between the straight line segment and the first pixel defining surface. When the cross section is a curved line segment, the first angle a1 is the angle between the tangent of the curved line segment at the position where the limiting structure 300 or the insulating layer 400 contacts and the first pixel defining surface. For example, the cross section of the second side surface 250 perpendicular to the plane of the substrate 01 can be a straight line segment or a curved line segment. When the cross section is a straight line segment, the second angle a2 is the angle between the straight line segment and the second pixel defining surface. When the cross section is a curved line segment, the second angle a2 is the angle between the tangent of the curved line segment at the position of the first electrode and the second pixel defining surface.

[0081] In some examples, as shown in FIGS. 1 and 2, the first angle a1 is 30-90 degrees, and the second angle a2 is 15-35 degrees. For example, the second angle a2 is 20-30 degrees.

[0082] For example, as shown in FIGS. 1 and 2, the first angle a1 is 32-88 degrees, and the second angle a2 is 22-28 degrees. For example, the first angle a1 is 35-85 degrees, and the second angle a2 is 24-25 degrees. For example, the first angle a1 is 45-60 degrees, and the second angle a2 is 23-27 degrees. Here, the values of the first angle and the second angle are not listed one by one. The first angle can be other angles between 30-90 degrees, and the second angle can be other angles between 15-35 degrees.

[0083] In some examples, as shown in FIGS. 1 and 2, at least one layer of the light-emitting functional layer 130 includes a first portion on the first side surface 240 and a second portion on the second side surface 250, and the thickness of the second portion is greater than the thickness of the first portion.

[0084] By setting the first side of the pixel defining part around the second opening to be steeper than the second side around the first opening, the thickness of at least one layer of the light-emitting functional layer on the first side is reduced to increase the resistance and reduce the crosstalk between adjacent sub-pixels.

[0085] For example, as shown in FIGS. 1 and 2, the thickness of the part of each film layer in the light-emitting functional layer 130 on the first side 240 is smaller than that on the second side 250. For example, the thickness of the part of the second electrode 120 on the first side 240 is smaller than that on the second side 250.

[0086] In some examples, as shown in FIGS. 1 and 2, the maximum thickness of the pixel defining part 230 at the first side 240 is not less than the maximum thickness of the pixel defining part 230 at the second side 250.

[0087] For example, as shown in FIGS. 1 and 2, the maximum thickness of the pixel defining part 230 at the first side 240 is 0.2-5 microns, and the maximum thickness of the pixel defining part 230 at the second side 250 is 0.1-2 microns.

[0088] For example, as shown in FIG. 2, the surface of the pixel defining part 230 away from the substrate 01 between the first side 240 and the second side 250 can be a plane substantially parallel to the substrate 01, or an inclined surface with a certain angle with the substrate 01. When the surface is a plane substantially parallel to the substrate 01, the thickness of the pixel defining part 230 at the position where the first side 240 meets the plane is substantially the same as the thickness of the pixel defining part 230 at the position where the second side 250 meets the plane. When the surface is an inclined surface with a certain angle with the substrate 01, the thickness of the pixel defining part 230 at the position where the first side 240 meets the inclined surface is greater than the thickness of the pixel defining part 230 at the position where the second side 250 meets the inclined surface, or there is no obvious boundary between the inclined surface and the second side.

[0089] In some examples, as shown in FIGS. 1 and 2, the length of the cross section of the first side 240 by a second plane perpendicular to the substrate 01 is a first length, and the length of the cross section of the second side 250 by the second plane is a second length, and the first length is less than the second length. The second plane can be a plane parallel to the XZ plane, or other planes perpendicular to the X direction.

[0090] By setting the slope angle relationship of the pixel defining part at the first side and the second side, and further setting the maximum thickness relationship and the cross section length relationship at the first side and the second side, the blocking effect of at least one layer of the light-emitting functional layer in the second opening can be greatly improved.

[0091] In some examples, as shown in FIG. 1 and FIG. 2, the display substrate further includes a limiting structure 300 located between the pixel limiting portion 230 and the substrate 01, and a portion of the limiting structure 300 exposed by the second opening 220 is configured to isolate at least one layer in the light-emitting functional layer 130. For example, the limiting structure 300 is located between the first electrode 110 and the substrate 01 to improve the flatness of the first electrode 110. For example, the orthogonal projection of the first electrode 110 on the substrate 01 is entirely located within the orthogonal projection of the limiting structure 300 on the substrate 01. For example, the limiting structure 300 overlaps with the pixel limiting portion 230, the first opening 210, and the second opening 220 in a direction perpendicular to the substrate 01.

[0092] In some examples, as shown in FIG. 1 and FIG. 2, the limiting structure 300 includes a first limiting layer 310 and a second limiting layer 320 stacked, the second limiting layer 320 is located between the first limiting layer 310 and the substrate 01, and the edge of the first limiting layer 310 protrudes into the second opening 220 surrounded thereby relative to the edge of the second limiting layer 320. By setting the edge of the first limiting layer 310 to protrude relative to the edge of the second limiting layer 320 for isolating at least one layer in the light-emitting functional layer 130.

[0093] For example, as shown in FIG. 1 and FIG. 2, the edge of the second limiting layer 320 is recessed relative to the edge of the first limiting layer 310 by a size of no less than 0.05 microns, such as no less than 0.08 microns, such as no less than 0.1 microns, such as no less than 0.15 microns, such as no less than 0.2 microns, such as no less than 0.5 microns.

[0094] For example, as shown in FIG. 1 and FIG. 2, the thickness of the limiting structure 300 can be greater than 100 angstroms. For example, the thickness of the limiting structure 300 can be 150-5000 angstroms. For example, the thickness of the limiting structure 300 can be 200-500 angstroms. For example, the thickness of the limiting structure 300 can be 300-1000 angstroms. For example, the thickness of the limiting structure 300 can be 400-2000 angstroms. For example, the thickness of the limiting structure 300 can be 600-1500 angstroms. For example, the thickness of the limiting structure 300 is less than the thickness of the pixel limiting portion 230 in a direction perpendicular to the substrate 01.

[0095] In some examples, as shown in FIG. 1 and FIG. 2, the materials of the pixel limiting portion 230 and the second limiting layer 320 are both organic materials, and the first limiting layer 310 includes a metal material or an inorganic non-metal material.

[0096] For example, as shown in FIG. 1 and FIG. 2, the material of the first limiting layer 310 can include silicon nitride or silicon oxide. For example, the material of the second limiting layer 320 can include polyimide and the like.

[0097] For example, as shown in FIG. 1 and FIG. 2, the etching selectivity of the etching liquid to the material of the second confinement layer 320 is greater than the etching selectivity of the etching liquid to the material of the first confinement layer 310, so that the edge of the second confinement layer 320 formed after etching is recessed inward relative to the edge of the first confinement layer 310.

[0098] Of course, the embodiments of the present disclosure are not limited to the confinement structure comprising a two-layer structure arranged in layers, but can also be a three-layer structure arranged in layers, wherein the layer structure farthest from the substrate substrate is protruded relative to the edge of the middle layer structure to achieve the isolation of the light-emitting functional layer, such as the layer structure closest to the substrate substrate can also be protruded relative to the edge of the middle layer structure; or the isolation portion only comprises a layer structure, and the edge of the structure has a protruding portion for isolating the light-emitting functional layer.

[0099] In some examples, as shown in FIG. 1 and FIG. 2, the display substrate further comprises: an insulating layer 400 located between the confinement structure 300 and the substrate substrate 01, and the second confinement layer 320 is part of the insulating layer 400. For example, the second confinement layer 320 and the insulating layer 400 can be an integrated structure. For example, the second confinement layer 320 can be a part of the insulating layer 400 protruding away from the substrate substrate 01. For example, the above-mentioned insulating layer 400 can be a planar layer. For example, the material of the above-mentioned insulating layer 400 can include an organic material. For example, the material of the above-mentioned insulating layer 400 can be the same as the material of the pixel confinement portion 230, or can be different from the material of the pixel confinement portion 230.

[0100] For example, FIG. 2 schematically shows that the edge of the first side surface 240 of the confinement structure 300 exposed is farther away from the center of the second opening 220 than the edge of the second confinement layer 320, but is not limited thereto. The edge of the first side surface 240 of the confinement structure 300 exposed can be closer to the center of the second opening 220 than the edge of the second confinement layer 320, or the distance between the edge of the first side surface 240 of the confinement structure 300 exposed and the edge of the second confinement layer 320 to the center of the second opening 220 is substantially the same.

[0101] FIG. 2 schematically shows that the second opening 220 exposes the confinement structure 300 on one side, but is not limited thereto. The second opening 220 can also expose the confinement structure 300 on both sides.

[0102] FIG. 3 is a schematic diagram of a partial cross-sectional structure of a display substrate in another example according to an embodiment of the present disclosure. The display substrate shown in FIG. 3 is different from the display substrate shown in FIG. 2 in that the shape of the first side surface 240 is different. The features of the display substrate shown in FIG. 3 other than the first side surface 240 can be the same as the features of the display substrate shown in FIG. 2, and will not be repeated here.

[0103] In some examples, as shown in FIG. 3, the first side surface 240 includes a first side surface portion 241 close to the substrate 01 and a second side surface portion 242 away from the substrate 01, the first side surface portion 241 and the second side surface portion 242 are connected to each other, an included angle between the first side surface portion 241 and the first pixel-defining surface 2001 is a first angle a1, and an included angle between the second side surface portion 242 and a plane parallel to the first pixel-defining surface 2001 is less than 90 degrees and not greater than the first angle a1. For example, the first angle a1 can be 90 degrees. For example, the first side surface portion 241 can be a surface perpendicular to the first plane.

[0104] The first side surface portion and the second side surface portion described above can be an integrated structure. The included angle between the second side surface portion and the first plane can be the slope angle of the second side surface portion at the position where the second side surface portion contacts the first side surface portion.

[0105] For example, as shown in FIG. 3, in a direction perpendicular to the substrate 01, such as the Z direction, the size of the second side surface portion 242 is greater than the size of the first side surface portion 241.

[0106] For example, as shown in FIG. 3, the first side surface 240 for exposing the limiting structure 300 can include the first side surface portion 241 and the second side surface portion 242 described above, and the first angle between the first side surface 240 of the limiting structure 300 not exposed and the first pixel-defining surface is less than the first angle between the first side surface portion and the first pixel-defining surface.

[0107] FIG. 3 schematically shows that the first side surface portion 241 is flush with the edge of the second limiting layer 320, but is not limited thereto. The first side surface portion 241 can be farther away from the center of the second opening 220 than the second limiting layer 320, or the first side surface portion 241 can be closer to the center of the second opening 220 than the second limiting layer 320.

[0108] FIG. 4 is a schematic diagram of a partial cross-sectional structure of a display substrate in another example according to an embodiment of the present disclosure. The display substrate in the example shown in FIG. 4 is different from the display substrate in the example shown in FIG. 2 in that the shape of the first side surface 240 is different. The features of the display substrate in FIG. 4 other than the first side surface 240 can be the same as those of the display substrate in FIG. 2, and will not be described here again.

[0109] In some examples, as shown in FIG. 4, the first side surface 240 includes a first side surface portion 241 close to the substrate 01 and a second side surface portion 242 away from the substrate 01, the first side surface portion 241 and the second side surface portion 242 are connected to each other, and the second side surface portion 242 protrudes relative to the first side surface portion 241 to a side close to the center of the second opening 220 surrounded thereby so that the first side surface portion 241 includes a surface of a recess 2411.

[0110] By setting the first side surface portion 241 to include the surface perpendicular to the substrate 01 shown in FIG. 3 or to include the recessed portion 2411 shown in FIG. 4, the first side surface 240 can have a blocking effect on at least one layer of the light-emitting functional layer 130 to assist the structure 300 in blocking the light-emitting functional layer 130, further reducing the crosstalk between adjacent subpixels 100.

[0111] For example, as shown in FIG. 4, the orthogonal projection of at least part of the first side surface 240 on the substrate 01 is located outside the orthogonal projection of the first pixel defining surface 2001 on the substrate 01. For example, the orthogonal projection of the position where the first side surface portion 241 meets the second side surface portion 242 on the substrate is located outside the orthogonal projection of the first pixel defining surface 2001 on the substrate 01.

[0112] For example, as shown in FIG. 4, the angle between the second side surface portion 242 and the first plane is less than 90 degrees, and the angle between the first side surface portion 241 and the first plane is greater than 90 degrees.

[0113] The first side surface portion and the second side surface portion described above can be an integrated structure. The angle between the second side surface portion and the first plane can be the slope angle at the position where the second side surface portion meets the first side surface portion.

[0114] For example, as shown in FIG. 4, the intersection line of the first side surface portion 241 with a plane perpendicular to the substrate 01 (such as a plane parallel to the XZ plane or other plane perpendicular to the X direction) can be a straight line segment or a curved line segment. When the intersection line is a straight line segment, the first angle a1 is the angle between the straight line segment and the first pixel defining surface. When the intersection line is a curved line segment, the first angle a1 is the angle between the tangent line of the curved line segment at the intersection position of the first side surface portion 241 and the first pixel defining surface and the first pixel defining surface.

[0115] For example, as shown in FIG. 4, in a direction perpendicular to the substrate 01, such as the Z direction, the size of the second side surface portion 242 is greater than the size of the first side surface portion 241.

[0116] In some examples, as shown in FIG. 4, the ratio of the size of the recessed portion 2411 in a direction perpendicular to the substrate 01 to the size of the second defining layer 320 in a direction perpendicular to the substrate 01 is 0.9-1.1. For example, the ratio of the size of the recessed portion 2411 in a direction perpendicular to the substrate 01 to the size of the second defining layer 320 in a direction perpendicular to the substrate 01 is 0.95-1.05. For example, the size of the recessed portion 2411 in a direction perpendicular to the substrate 01 is equal to the size of the second defining layer 320 in a direction perpendicular to the substrate 01.

[0117] In some examples, as shown in FIG. 4, the ratio of the size S1 of the recessed portion 2411 recessed inwardly relative to the second side portion 242 to the size S2 of the edge of the second confinement layer 320 recessed inwardly relative to the edge of the first confinement layer 310 is 0.9-1.1. For example, the ratio of the size S1 of the recessed portion 2411 recessed inwardly relative to the second side portion 242 to the size S2 of the edge of the second confinement layer 320 recessed inwardly relative to the edge of the first confinement layer 310 is 0.95-1.05. For example, the size S1 of the recessed portion 2411 recessed inwardly relative to the second side portion 242 is equal to the size S2 of the edge of the second confinement layer 320 recessed inwardly relative to the edge of the first confinement layer 310.

[0118] In at least one example of the present disclosure, the recessed portion and the second confinement layer can be formed in the same step of the patterning process, so that the recessed portion and the second confinement layer have substantially the same size characteristics recessed inwardly relative to the first confinement layer, so that the recessed portion assists the confinement structure in blocking at least one layer of the light-emitting functional layer to further reduce the crosstalk between adjacent sub-pixels.

[0119] In some examples, as shown in FIG. 4, the size of the edge of the recessed portion 2411 on the side close to the substrate 01 recessed inwardly relative to the edge on the side away from the substrate 01, such as S1, is not greater than 5 microns. For example, the size of the edge of the recessed portion 2411 on the side close to the substrate 01 recessed inwardly relative to the edge on the side away from the substrate 01 is not greater than 4 microns, or not greater than 3.5 microns, or not greater than 3 microns, or not greater than 2.5 microns.

[0120] In some examples, as shown in FIG. 4, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is 100-10000 angstroms. For example, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is 200-5000 angstroms. For example, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is 500-1000 angstroms. For example, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is 1000-2000 angstroms. For example, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is greater than 600 angstroms. For example, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is greater than 3000 angstroms. For example, the size of the recessed portion 2411 in the direction perpendicular to the substrate 01 is 550-4500 angstroms. The embodiments of the present disclosure do not enumerate all the above-mentioned sizes of the recessed portion 2411, and the size of the recessed portion 2411 can be other sizes in the range of 100-10000 angstroms.

[0121] As shown in FIGS. 1-4, an embodiment of the present disclosure provides a display substrate, comprising a substrate and a plurality of sub-pixels and a pixel defining pattern on the substrate. The plurality of sub-pixels are on the substrate, each of at least part of the sub-pixels comprises a light-emitting functional layer, the light-emitting functional layer comprises a plurality of film layers; the pixel defining pattern is on the substrate, the pixel defining pattern comprises a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to define a light-emitting area of the at least part of the sub-pixels, at least one layer in the light-emitting functional layer is continuous in at least part of the first openings, and at least part of the at least one layer in the light-emitting functional layer is blocked in at least one second opening. The pixel defining portion comprises a first side surrounding the second opening and a second side surrounding the first opening, at least part of a first projection of the first side on the substrate is outside a second projection of a surface of the pixel defining portion facing the substrate on the substrate, and an edge of a third projection of the second side on the substrate coincides with an edge of the second projection. The sub-pixels and the pixel defining pattern in the embodiment can be the same as those in the above embodiments, and will not be described here again.

[0122] FIGS. 5-9 are partial process diagrams of a manufacturing method of a display substrate according to an embodiment of the present disclosure. As shown in FIG. 5, the manufacturing method of the display substrate comprises forming an insulating layer 400 on a substrate 01.

[0123] As shown in FIG. 6, the manufacturing method of the display substrate comprises forming a plurality of defining layers 301 on the insulating layer 400. For example, a defining layer material is formed on the insulating layer 400 and is patterned to form the plurality of defining layers 301, such as the first defining layer 310 in the above defining structure 300. For example, the material of the defining layer can comprise a metal material or an inorganic non-metal material. For example, the material of the defining layer can comprise silicon nitride.

[0124] As shown in FIG. 7, the manufacturing method of the display substrate comprises forming a first electrode 110 of a plurality of sub-pixels 100 on the plurality of defining layers. For example, a conductive layer is formed on the defining layer and is patterned to form the first electrode 110 of the plurality of sub-pixels 100. The sub-pixel 100 comprises the above first electrode, light-emitting functional layer, and second electrode which are sequentially stacked in a direction perpendicular to the substrate 01. For example, the defining layer can comprise a via, and the first electrode formed on the defining layer can be electrically connected to a pixel circuit between the defining layer and the substrate through the via in the defining layer.

[0125] As shown in FIG. 8, the manufacturing method of the display substrate comprises forming a pixel defining layer 201 on the first electrode 110. For example, the pixel defining layer 201 completely covers the first electrode 110 of the plurality of sub-pixels 100.

[0126] As shown in FIG. 9, the manufacturing method of the display substrate includes performing a first patterning process on the pixel defining layer 201 to form a plurality of first openings 210 to expose the first electrode 110. For example, the surface of the pixel defining layer 201 around the first opening 210 is the second side surface 250 in the above example, and the slope angle of the second side surface 250 is the second angle a2.

[0127] As shown in FIGS. 2-4, the manufacturing method of the display substrate includes performing a second patterning process on the pixel defining layer to form a plurality of second openings 220 to expose a portion of the defining layer. The pattern of the pixel defining layer after forming the second openings 220 is the pixel defining pattern 200 described above.

[0128] For example, the display substrate includes a first area and a second area, and the structures shown in FIGS. 1-9 are located in the first area, and the first area is located at the periphery of the second area, such as the first area surrounding the second area. For example, the first area is provided with sub-pixels for display, and the second area is not provided with sub-pixels for display, such as the second area being a non-display area, such as a hole area, which can be provided with a required hardware structure such as a photosensitive sensor. For example, the second area is provided with at least one isolation column to separate the light-emitting functional layer 130 and the second electrode, and the isolation column can include a three-layer structure, such as a titanium / aluminum / titanium structure. The defining layer material not only covers the first area, but also covers the isolation column in the second area. In the process of patterning the defining layer material to form a plurality of defining layers, some material will be left on the side wall of the isolation column, which will affect the final morphology of the isolation column. Generally, an additional etching process (Hole Mask) is required to remove the inorganic material left on the side wall of the isolation column in the second area. The manufacturing method provided in the embodiments of the present disclosure can perform a second patterning process on the pixel defining layer, which can be the same as the etching process for the second area, thereby avoiding the addition of a mask process.

[0129] As shown in FIGS. 2-4, the manufacturing method of the display substrate further includes, in the same patterning process of forming the plurality of second openings 220, etching a portion of the insulating layer 400 that is not covered by the defining layer and exposed by the second opening 220 to form a protruding portion stacked with the defining layer, i.e., the second defining layer 320, and the edge of the protruding portion is inwardly recessed relative to the edge of the defining layer (i.e., the first defining layer 310). The above manufacturing method can form the display substrate shown in any of FIGS. 2-4. The “same patterning process” in the above “in the same patterning process of forming the plurality of second openings 220” can refer to a process using the same mask, so as not to increase the mask process.

[0130] Compared with a method in which the second limiting layer in the limiting structure, such as the protrusion in the insulating layer, is formed at the same time when the first limiting layer is formed, and the first opening and the second opening in the pixel limiting pattern are formed in the same step of the patterning process, in the method for manufacturing the display substrate provided by the present disclosure, the first opening and the second opening in the pixel limiting pattern are formed in different processes, and the second limiting layer in the limiting structure is formed in the same step of forming the second opening. This not only avoids the rough surface of the insulating layer before the first electrode is formed, which affects the manufacturing process of the first electrode, but also prevents the process of forming the second opening from affecting the slope angle of the pixel limiting part at the first opening and the height, angle and other topographies of the PS (photo spacer) formed on the side of the pixel limiting part away from the substrate, thereby alleviating the problem of dark or bright spots in the display substrate and improving the yield of the product. In addition, since the first opening and the second opening in the pixel limiting pattern have different functions, forming the first opening and the second opening separately can prevent mutual interference between the two openings, which is conducive to optimizing the effects of different openings.

[0131] As shown in FIG. 1, the light-emitting functional layer 130 is formed after the protrusion is formed, that is, the light-emitting functional layer 130 is formed after the limiting structure 300 is formed. The light-emitting functional layer 130 includes a plurality of film layers, at least a portion of at least one layer in the light-emitting functional layer 130 in the first opening 210 is continuous, and at least a portion of at least one layer in the light-emitting functional layer 130 is interrupted at the edge of the limiting layer in at least one second opening 220.

[0132] The structure in the display substrate formed by the above manufacturing method can have the same features as the corresponding structure in the display substrate in any one of FIGS. 1 to 4, and will not be described here again.

[0133] In some examples, as shown in FIGS. 4 to 9, while the insulating layer 400 is etched, the method for manufacturing the display substrate further includes etching the portion of the pixel limiting part 230 in the pixel limiting layer surrounding the second opening 220 close to the limiting layer to form a recessed part 2411.

[0134] The recessed part in the pixel limiting part and the second limiting layer in the insulating layer can be formed in the same step of the patterning process to save process steps.

[0135] In some examples, as shown in FIGS. 2-4, the pixel defining layer is etched by a dry etching process to form the plurality of second openings 220. The second openings 220 formed by the dry etching process not only make the topography of the pixel defining pattern 200 more accurate, but also make the slope angle of the first side surface 240 of the pixel defining portion 230 around the second opening 220 steeper (e.g., greater than the slope angle of the second side surface 250 around the first opening 210), and make the thickness adjustment range of the second limiting layer 320 larger, which is more conducive to the isolation of at least one layer of the light emitting functional layer 130.

[0136] For example, as shown in FIGS. 2-4, the material of the insulating layer 400 and the material of the pixel defining layer, such as the pixel defining portion 230, can be the same or different. When the materials of the two are the same, one etching gas can be used to etch the pixel defining layer and the insulating layer 400 to form the second opening 220 and the second limiting layer 320. When the materials of the two are different, different etching gases can be used to etch the pixel defining layer and the insulating layer 400, respectively, to form the second opening 220 and the second limiting layer 320.

[0137] FIG. 10 is a schematic view of a partial cross-sectional structure of a display substrate according to another embodiment of the present disclosure.

[0138] As shown in FIG. 10, the display substrate includes a substrate 01 and a plurality of sub-pixels 100, a pixel defining pattern 200, and an isolation structure 500 on the substrate 01. Each of at least some of the sub-pixels 100 includes a light emitting functional layer 130 including a plurality of film layers. The sub-pixels 100 in the display substrate provided in the present embodiment can have the same features as the sub-pixels 100 in the display substrate in the embodiments shown in FIGS. 1-9, and thus will not be described again here.

[0139] As shown in FIG. 10, the pixel defining pattern 200 includes a plurality of openings 210 configured to define a light emitting area 010 of at least some of the sub-pixels 100 and a pixel defining portion 230 around the plurality of openings 210, and at least one layer of the light emitting functional layer 130 is continuous in at least some of the openings 210. The openings in the display substrate provided in the present embodiment and the positional relationship between the sub-pixels and the openings can have the same features as the corresponding structures in the display substrate shown in FIGS. 1-9, and thus will not be described again here.

[0140] For example, as shown in FIG. 10, the material of the pixel defining portion 230 can be an organic material. For example, the material of the pixel defining portion 230 can include polyimide, acrylic, polyethylene terephthalate, or the like.

[0141] As shown in FIG. 10, the partition structure 500 is located on the side surface of the pixel defining part 230 away from the substrate 01, and at least part of at least one layer of the light emitting functional layer 130 is partitioned at the partition structure 500. For example, each film layer in the light emitting functional layer 130 is disconnected at the edge of the partition structure 500. For example, the second electrode is disconnected at the edge of the partition structure 500.

[0142] As shown in FIG. 10, the pixel defining part 230 includes a first pixel defining part 2310 overlapping the partition structure 500 and a second pixel defining part 2320 surrounding at least part of the partition structure 500, and the maximum thickness H1 of the first pixel defining part 2310 is greater than the maximum thickness H2 of the second pixel defining part 2320. For example, the first pixel defining part 2310 and the second pixel defining part 2320 are integrally arranged. For example, the second pixel defining part 2320 surrounds the first pixel defining part 2310.

[0143] By arranging the partition structure and setting the thickness of the first pixel defining part overlapping the partition structure to be greater than the thickness of the second pixel defining part surrounding the partition structure, the conductive channel of at least one layer of the light emitting functional layer is extended, which not only reduces the crosstalk between adjacent sub-pixels, but also improves the contact area and adhesion of the film layer on the side of the partition structure away from the substrate, preventing peeling. In addition, the first pixel defining part and the second pixel defining part are connected as an integral structure, which is conducive to improving the adhesion of the film layer at different positions.

[0144] For example, as shown in FIG. 10, the second pixel defining part 2320 is closer to the light emitting area 010 of the sub-pixel 100 than the first pixel defining part 2310. For example, the pixel defining part 230 further includes a third pixel defining part surrounding the opening 210, and the first pixel defining part 2310, the second pixel defining part 2320 and the third pixel defining part are integrally arranged. For example, the maximum thickness H1 of the first pixel defining part 2310 is substantially equal to the maximum thickness H3 of the third pixel defining part, and both are greater than the maximum thickness H2 of the second pixel defining part 2320. For example, the second pixel defining part 2320 is located between the first pixel defining part 2310 and the third pixel defining part. For example, between two adjacent first openings 210, the first pixel defining part 2310, the second pixel defining part 2320 surrounding the first pixel defining part 2310 and the third pixel defining part on both sides of the second pixel defining part 2320 can be arranged.

[0145] For example, as shown in FIG. 10, in the direction perpendicular to the extension direction of the partition structure 500, such as the X direction, the ratio of the distance between the two light emitting areas 010 on both sides of the partition structure 500 and the partition structure 500 is 0.8-1.2, such as 0.9-1.1.

[0146] In some examples, as illustrated in FIG. 10, the thickness of the second pixel defining portion 2320 is in a range of 5% to 95% of the thickness of the first pixel defining portion 2310. For example, the thickness of the second pixel defining portion 2320 is in a range of 20% to 50% of the thickness of the first pixel defining portion 2310. For example, the thickness of the second pixel defining portion 2320 is in a range of 10% to 90% of the thickness of the first pixel defining portion 2310. For example, the thickness of the second pixel defining portion 2320 is in a range of 20% to 60% of the thickness of the first pixel defining portion 2310. For example, the thickness of the second pixel defining portion 2320 is in a range of 30% to 70% of the thickness of the first pixel defining portion 2310. For example, the thickness of the second pixel defining portion 2320 is in a range of 40% to 50% of the thickness of the first pixel defining portion 2310. Here, the thickness of the second pixel defining portion 2320 is not limited to the above examples, and the thickness of the second pixel defining portion 2320 can be in a range of 5% to 95% of the thickness of the first pixel defining portion 2310.

[0147] In some examples, as illustrated in FIG. 10, the thickness of the second pixel defining portion 2320 is in a range of 0.1 to 2 micrometers. For example, the thickness of the second pixel defining portion 2320 is in a range of 0.5 to 1 micrometer. For example, the thickness of the second pixel defining portion 2320 is in a range of 0.3 to 0.7 micrometers. For example, the thickness of the second pixel defining portion 2320 is in a range of 0.8 to 1.5 micrometers. Here, the thickness of the second pixel defining portion 2320 is not limited to the above examples, and the thickness of the second pixel defining portion 2320 can be in a range of 0.1 to 2 micrometers.

[0148] In some examples, as illustrated in FIG. 10, the material of the partition structure 500 includes an organic material, and a cross section of the partition structure 500, which is cut by a plane perpendicular to the extending direction of the partition structure 500, has a dimension in a direction parallel to the substrate 01, which is gradually increased in a direction along the substrate 01 toward the second electrode 120 and perpendicular to the substrate 01. For example, the partition structure 500 illustrated in FIG. 10 can extend in a direction perpendicular to the XZ plane, and the above-mentioned plane can be a plane parallel to the XZ plane. For example, the above-mentioned dimension can be a dimension in the X direction illustrated in FIG. 10. For example, the above-mentioned direction along the substrate 01 toward the second electrode 120 and perpendicular to the substrate 01 can be a direction indicated by an arrow in the Z direction illustrated in FIG. 10. For example, the cross section of the partition structure 500 can be an inverted trapezoidal shape.

[0149] For example, as shown in FIG. 10, the material of the pixel defining part 230 and the material of the partition structure 500 are both organic materials, such as organic glue. For example, the material of the pixel defining part 230 can be positive photoresist, and the material of the partition structure 500 can be negative photoresist. For example, positive photoresist refers to a photoresist that is dissolved by a developing solution after a degradation reaction occurs in the part exposed to light, and the pattern of the non-exposed part left is consistent with the pattern of the mask plate. Negative photoresist refers to a photoresist that becomes insoluble after a cross-linking reaction occurs in the part exposed to light, and the pattern formed after the non-exposed part is dissolved by the developing solution is complementary to the pattern of the mask plate.

[0150] The display substrate provided by the embodiment greatly reduces the crosstalk between adjacent sub-pixels by extending the conductive channel through the side of the first pixel defining part using positive photoresist while partitioning at least one layer of the light-emitting functional layer using the partition structure of negative photoresist.

[0151] In some examples, as shown in FIG. 10, the cross section includes a first edge 510 close to the substrate 01, a second edge 520 away from the substrate 01, and a side edge 530 connecting the first edge 510 and the second edge 520, the angle between the side edge 530 and the second edge 520 is 40-90 degrees, and the thickness of the partition structure 500 is 0.8-3 microns.

[0152] For example, as shown in FIG. 10, for example, the angle between the side edge 530 and the second edge 520 is 50-80 degrees, and the thickness of the partition structure 500 is 2-2.5 microns. The angle between the side edge 530 and the second edge 520 is 60-70 degrees, and the thickness of the partition structure 500 is 1-1.5 microns. For example, the angle between the side edge 530 and the second edge 520 is 65-75 degrees, and the thickness of the partition structure 500 is 1.3-1.7 microns. The embodiment of the present disclosure does not enumerate the specific values of the angle between the side edge 530 and the second edge 520 and the thickness of the partition structure 500 one by one, the angle between the side edge 530 and the second edge 520 can be other values in the range of 40-90 degrees, and the thickness of the partition structure 500 can be other values in the range of 0.8-3 microns.

[0153] In some examples, as shown in FIG. 10, the orthographic projection of the partition structure 500 on the substrate 01 is entirely within the orthographic projection of the first pixel defining part 2310 on the substrate 01. For example, along a direction perpendicular to the substrate 01, the partition structure 500 does not overlap with the second pixel defining part 2320.

[0154] For example, as shown in FIG. 10, along the X direction, the size of the first pixel defining part 2310 is greater than the size of the second pixel defining part 2320, so as to improve the stability of the partition structure 500 formed on the first pixel defining part 2310 while preventing the second pixel defining part 2320 from affecting the aperture ratio of the sub-pixel 100.

[0155] For example, the partition structure 500 can be further provided with an encapsulation layer (not shown) away from the substrate 01. By providing the partition structure 500 away from the surface of the substrate 01 in the first pixel defining portion 2310, and setting the thickness of the second pixel defining portion to be less than the thickness of the first pixel defining portion, the contact area of the encapsulation layer and the structure on the side facing the substrate 01 can be significantly increased, the adhesion of the encapsulation layer can be improved, and the risk of peeling can be reduced.

[0156] For example, as shown in FIG. 10, the display substrate further includes an insulating layer 400 between the first electrode 110 and the substrate 01. For example, the display substrate further includes a pixel circuit (not shown) between the first electrode 110 and the substrate 01, and the first electrode 110 is electrically connected to the pixel circuit. For example, the insulating layer 400 can be a planarization layer.

[0157] FIG. 11 is a schematic diagram of a partial planar structure of a display substrate according to an embodiment of the present disclosure. FIG. 12 is a partial enlarged view of the display substrate shown in FIG. 11. FIG. 1 can be a schematic diagram of a partial cross-sectional structure along the AA' line shown in FIG. 11, and FIG. 12 can be a schematic diagram of one sub-pixel 100 and the second opening 220 around the light emitting area 010 of the sub-pixel 100 shown in FIG. 11.

[0158] For example, as shown in FIG. 11 and FIG. 12, the plurality of sub-pixels 100 include a first sub-pixel 101, a second sub-pixel 102, and a third sub-pixel 103. For example, the first sub-pixel 101, the second sub-pixel 102, and the third sub-pixel 103 can be sub-pixels 100 of different colors. For example, the third sub-pixel 103 can be a blue sub-pixel, one of the first sub-pixel 101 and the second sub-pixel 102 is a red sub-pixel, and the other is a green sub-pixel. For example, the first sub-pixel 101 is a red sub-pixel, and the second sub-pixel 102 is a green sub-pixel. For example, the area of the light emitting area 010 of the first sub-pixel 101 and the second sub-pixel 102 is less than the area of the light emitting area 010 of the third sub-pixel 103. For example, the shape of the light emitting area 010 of the first sub-pixel 101 and the second sub-pixel 102 is approximately circular, and the shape of the light emitting area 010 of the third sub-pixel 103 can be a special shape, such as a special shape including a first shape 1031, a second shape 1032, a third shape 1033, and a fourth shape 1034, the maximum size of the first shape 1031 and the third shape 1033 in the Q direction is greater than the maximum size in the P direction, and the maximum size of the second shape 1032 and the fourth shape 1034 in the P direction is greater than the maximum size in the Q direction. For example, the shape of the first shape 1031 after being flipped relative to a straight line extending in the Q direction is substantially the same as the third shape 1033, and the shape of the second shape 1032 after being flipped relative to a straight line extending in the P direction is substantially the same as the fourth shape 1034.

[0159] For example, as shown in FIG. 11 and FIG. 12, the defining structures 300 in the plurality of sub-pixels 100 that overlap with the partial sub-pixel 100 are exposed by the second openings 220, such as the defining structures 300 that overlap with the second sub-pixel 102 and the third sub-pixel 103 are exposed by the second openings 220, and the defining structures 300 that overlap with the first sub-pixel 101 are not exposed by the second openings 220. For example, the defining structures 300 can include a plurality of sub-structures, each of which overlaps with the first electrode 110 of one sub-pixel 100, and each of which further includes a ring of edges that is not covered by the first electrode 110 overlapping therewith, at least part of the ring of edges is exposed by the second openings 220 for partitioning at least one layer of the light-emitting functional layer 130. For example, the ring of edges of the sub-structure that is not covered by the first electrode 110 can have an equal-width feature, but is not limited thereto, and the width of the part of the ring of edges that overlaps with the second openings 220 can be greater than the width of the part that does not overlap with the second openings 220.

[0160] For example, as shown in FIG. 11, the plurality of sub-pixels 100 are arranged along the U direction and the V direction. For example, in the second sub-pixel 102 and the third sub-pixel 103 that are alternately arranged along the U direction, the number of the second openings 220 around the light-emitting area 010 of the second sub-pixel 102 is two and is located on both sides of the second sub-pixel 102 in the V direction, and in the second sub-pixel 102 and the third sub-pixel 103 that are alternately arranged along the V direction, the number of the second openings 220 around the light-emitting area 010 of the second sub-pixel 102 is two and is located on both sides of the second sub-pixel 102 in the U direction; the number of the second openings 220 around the light-emitting area 010 of the third sub-pixel 103 is four, thereby reducing the probability of crosstalk between the second sub-pixel 102 and the third sub-pixel 103 that are alternately arranged along the U direction and the V direction, and reducing the probability of crosstalk between the first sub-pixel 101 and the second sub-pixel 102 that are alternately arranged along the U direction and the V direction, and reducing the probability of crosstalk between the first sub-pixel 101 and the third sub-pixel 103 that are alternately arranged along the P direction and the Q direction.

[0161] For example, as shown in FIG. 11, the number of the second openings 220 around the light-emitting area 010 of the same sub-pixel 100 is zero or two. The above-mentioned second openings 220 around the light-emitting area 010 of the sub-pixel 100 refer to the second openings 220 that have a shape curved towards the center of the light-emitting area 010 of the sub-pixel 100.

[0162] For example, as shown in FIG. 11, the same second opening 220 only exposes the edges of the sub-structure of the first electrode 110 of the sub-pixel 100 that is surrounded thereby.

[0163] For example, the display substrate further includes a spacer (not shown) for supporting a fine metal mask (FMM).

[0164] FIG. 13 is a schematic diagram of a partial planar structure of a display substrate provided in another example according to an embodiment of the present disclosure.

[0165] The display substrate in the example shown in FIG. 13 is different from the display substrate in the example shown in FIG. 11 in that the sub-pixels 100 of the light-emitting region 010 of which the limiting structure 300 overlaps are the first sub-pixels 101.

[0166] For example, as shown in FIG. 13, the limiting structure 300 in the plurality of sub-pixels 100 of which the light-emitting region overlaps is exposed by the second opening 220, such as the limiting structure 300 overlapping with the first sub-pixel 101 is exposed by the second opening 220, and the limiting structure 300 overlapping with the light-emitting region 010 of the second sub-pixel 102 and the third sub-pixel 103 is not exposed by the second opening 220. For example, the limiting structure 300 can include a plurality of sub-structures, each of which overlaps with the first electrode 110 of one sub-pixel 100, and each of which further includes a ring of edges not covered by the first electrode 110 overlapping therewith, at least part of the ring of edges is exposed by the second opening 220 for partitioning at least one layer of the light-emitting functional layer 130. For example, the ring of edges of the sub-structure not covered by the first electrode 110 can have an equal-width feature, but is not limited thereto, and the width of the part of the ring of edges overlapping with the second opening 220 can be greater than the width of the part not overlapping with the second opening 220.

[0167] For example, as shown in FIG. 13, the plurality of sub-pixels 100 are arranged along the U direction and the V direction. For example, the number of the second openings 220 surrounding the light-emitting region 010 of the same first sub-pixel 101 can be four, respectively located on both sides of the light-emitting region 010 of the first sub-pixel 101 in the U direction and on both sides in the V direction, thereby reducing the crosstalk between the adjacent first sub-pixel 101 and the second sub-pixel 102 arranged along the U and V directions, while reducing the crosstalk between the adjacent first sub-pixel 101 and the third sub-pixel 103.

[0168] For example, in other examples, the light-emitting region of part of the plurality of third sub-pixels 103 is surrounded by two second openings 220, and the light-emitting region of another part of the plurality of third sub-pixels 103 is surrounded by four second openings 220; such as the light-emitting region of part of the plurality of second sub-pixels 102 is surrounded by two second openings 220, and the light-emitting region of another part of the plurality of second sub-pixels 102 is surrounded by four second openings 220. Thereby, the width of the communication channel of the second electrode, such as the cathode, can be increased, which is conducive to reducing the cathode resistance and saving power consumption.

[0169] For example, in other examples, the light emitting region of part of the plurality of third sub-pixels 103 is surrounded by two second openings 220, and the light emitting region of another part of the plurality of third sub-pixels 103 is surrounded by four second openings 220. Since the red sub-pixel is prone to crosstalk, the crosstalk channel of the red sub-pixel can be reduced.

[0170] For example, in other examples, the plurality of sub-pixels 100 are arranged along the U direction and the V direction. For example, in the first sub-pixel 101 and the second sub-pixel 102 arranged alternately along the U direction, the number of the second openings 220 surrounding the light emitting region 010 of the second sub-pixel 102 is two and is located on both sides of the second sub-pixel 102 in the V direction, and the number of the second openings 220 surrounding the light emitting region 010 of the first sub-pixel 101 is two and is located on both sides of the first sub-pixel 101 in the direction intersecting the U direction and the V direction, so as to reduce the probability of crosstalk between the first sub-pixel 101 and the second sub-pixel 102 arranged alternately along the U direction, and reduce the probability of crosstalk between the third sub-pixel 103 and the second sub-pixel 102 arranged alternately along the V direction.

[0171] For example, in other examples, in the third sub-pixel 103 and the second sub-pixel 102 arranged alternately along the U direction, the number of the second openings 220 surrounding the light emitting region 010 of the second sub-pixel 102 is two and is located on both sides of the second sub-pixel 102 in the U direction, so as to reduce the probability of crosstalk between the adjacent third sub-pixel 103 and the second sub-pixel 102 arranged along the U direction.

[0172] For example, in other examples, the number of the second openings 220 surrounding the light emitting region 010 of the same sub-pixel 100 is zero or two. The second opening 220 surrounding the light emitting region 010 of the sub-pixel 100 means that the second opening 220 has a shape curved towards the center of the light emitting region 010 of the sub-pixel 100.

[0173] For example, in other examples, the same second opening 220 only exposes the edge of the sub-structure overlapping the first electrode of the sub-pixel 100 surrounded by the second opening 220.

[0174] Of course, the embodiments of the present disclosure are not limited to the planar arrangement of the display substrate shown in FIGS. 11-13 using only the limiting structure 300 shown in FIG. 1 to block at least one layer of the light emitting functional layer 130. The planar arrangement of the display substrate shown in FIGS. 11-13 can also use the blocking structure 500 shown in FIG. 10 to block at least one layer of the light emitting functional layer 130, at which each blocking structure 500 can have the same planar shape as each second opening 220 shown in FIGS. 11-16, and one second pixel limiting portion 2320 surrounds one blocking structure 500 once.

[0175] FIG. 14 is a schematic view of a planar structure of a display substrate according to another embodiment of the present disclosure. FIG. 10 can be a schematic view of a partial cross-sectional structure along a line BB' shown in FIG. 14.

[0176] For example, as shown in FIG. 14, the plurality of sub-pixels 100 include a first sub-pixel 101, a second sub-pixel 102, and a third sub-pixel 103. For example, the first sub-pixel 101, the second sub-pixel 102, and the third sub-pixel 103 can be different color sub-pixels 100. For example, the third sub-pixel 103 can be a blue sub-pixel 100, one of the first sub-pixel 101 and the second sub-pixel 102 can be a red sub-pixel, and the other can be a green sub-pixel. For example, the area of the light emitting region 010 of the first sub-pixel 101 and the area of the light emitting region 010 of the second sub-pixel 102 are each smaller than the area of the light emitting region 010 of the third sub-pixel 103.

[0177] For example, as shown in FIG. 14, the second pixel defining portion 2320 surrounds the first pixel defining portion 2310 and the partition structure 500. For example, each partition structure 500 is surrounded by a ring of the second pixel defining portion 2320.

[0178] For example, as shown in FIG. 14, the first sub-pixel 101 and the second sub-pixel 102 are arranged along the Y direction, and the third sub-pixel 103 is arranged along the X direction with the first sub-pixel 101. For example, in the Y direction, the size of the light emitting region 010 of the first sub-pixel 101 and the size of the light emitting region 010 of the second sub-pixel 102 are each smaller than the size of the light emitting region 010 of the third sub-pixel 103. For example, a straight line extending along the X direction between the light emitting regions 010 of the first sub-pixel 101 and the second sub-pixel 102 passes through the light emitting region 010 of the third sub-pixel 103. For example, a portion of the orthogonal projection of the light emitting region 010 of the first sub-pixel 101 on a straight line along the Y direction overlaps the orthogonal projection of the light emitting region 010 of the third sub-pixel 103 on the straight line, and another portion does not overlap the orthogonal projection of the third sub-pixel 103. For example, a portion of the orthogonal projection of the light emitting region 010 of the second sub-pixel 102 on a straight line along the Y direction overlaps the orthogonal projection of the light emitting region 010 of the third sub-pixel 103 on the straight line, and another portion does not overlap the orthogonal projection of the third sub-pixel 103.

[0179] For example, as shown in FIG. 10 and FIG. 14, in a direction perpendicular to the extension direction of the partition structure 500, such as the X or Y direction, the size of the first pixel defining portion 2310 is greater than the size of the second pixel defining portion 2320, and the size of the partition structure 500 is greater than the size of the second pixel defining portion 2320, to improve the partitioning effect of the light emitting functional layer.

[0180] For example, as shown in FIG. 10 and FIG. 14, the edge of the partition structure 500 in the orthographic projection on the substrate 01 is substantially parallel to the edge of the second pixel defining portion 2320, and there is an annular interval between the edge of the partition structure 500 and the edge of the second pixel defining portion 2320, which can have a uniform annular width. For example, the second pixel defining portion 2320 can be an annular structure with a uniform annular width.

[0181] For example, as shown in FIG. 14, the length of the partition structure 500 extending along the Y direction and located between the first sub-pixel 101 and the third sub-pixel 103 is greater than the size of the light emitting area 010 of the first sub-pixel 101 in the Y direction, and is less than the size of the light emitting area 010 of the third sub-pixel 103 in the Y direction, and the length of the partition structure 500 extending along the Y direction and located between the second sub-pixel 102 and the third sub-pixel 103 is greater than the size of the light emitting area 010 of the second sub-pixel 102 in the Y direction, and is less than the size of the light emitting area 010 of the third sub-pixel 103 in the Y direction.

[0182] For example, as shown in FIG. 14, the length of the partition structure 500 extending along the X direction and located between the first sub-pixel 101 and the second sub-pixel 102 is greater than the size of the light emitting area 010 of the first sub-pixel 101 and the second sub-pixel 102 in the X direction.

[0183] For example, as shown in FIG. 14, the display substrate further comprises a spacer 600 for supporting a fine metal mask (FMM).

[0184] Of course, the embodiments of the present disclosure are not limited to the planar arrangement of the display substrate shown in FIG. 14, which only uses the partition structure shown in FIG. 10 to partition at least one layer of the light emitting functional layer, and the planar arrangement of the display substrate shown in FIG. 14 can also use the limiting structure shown in FIG. 1 to partition at least one layer of the light emitting functional layer, and at this time, the second opening can have the same planar shape as the second pixel defining portion shown in FIG. 14.

[0185] FIG. 15 is a schematic block diagram of a display device provided by another embodiment of the present disclosure. As shown in FIG. 15, the display device provided by an embodiment of the present disclosure comprises any one of the display substrates described above.

[0186] For example, the display substrate provided by an embodiment of the present disclosure can be an organic light emitting diode display substrate. For example, the display substrate can be provided with a color filter layer, or can not be provided with a color filter layer.

[0187] For example, the display device further comprises a cover plate located on the light emitting side of the display substrate.

[0188] For example, the display device can be a display device such as an organic light emitting diode display device, and any product or component having a display function such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, or the like including the display device, and the embodiments are not limited thereto.

[0189] The following points need to be explained:

[0190] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can be referred to the general design.

[0191] (2) In the case of no conflict, the features in the same and different embodiments of the present disclosure can be combined with each other.

[0192] The above description is only exemplary embodiments of the present disclosure, not for limiting the protection scope of the present disclosure, and the protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: a substrate substrate; a plurality of sub-pixels on the substrate substrate, each of at least part of the sub-pixels comprising a light-emitting functional layer, the light-emitting functional layer comprising a plurality of film layers; a pixel defining pattern on the substrate substrate, the pixel defining pattern comprising a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings being configured to define a light-emitting area of the at least part of the sub-pixels, at least one layer in the light-emitting functional layer being continuous in at least part of the first openings, at least part of the at least one layer in the light-emitting functional layer being interrupted in at least one second opening; wherein the pixel defining portion comprises a first side surface surrounding the second opening and a second side surface surrounding the first opening, an included angle between the first side surface and a same first plane parallel to the substrate substrate being a first side surface angle, and an included angle between the second side surface and the same first plane being a second side surface angle, the first side surface angle and the second side surface angle each being not greater than 90 degrees, and the first side surface angle being greater than the second side surface angle. 2.The display substrate of claim 1, wherein, a surface of the pixel defining portion on a side close to the substrate substrate at a position of the first side surface is a first pixel defining surface, a surface of the pixel defining portion on a side close to the substrate substrate at a position of the second side surface is a second pixel defining surface, an angle between the first pixel defining surface and the first side surface is a first angle, and an angle between the second pixel defining surface and the second side surface is a second angle, the first angle being greater than the second angle. 3.The display substrate of claim 2, wherein, the first angle is 30-90 degrees, and the second angle is 15-35 degrees. 4.The display substrate of any one of claims 1-3, wherein, a maximum thickness of the pixel defining portion at the position of the first side surface is not less than a maximum thickness of the pixel defining portion at the position of the second side surface. 5.The display substrate of any one of claims 1-3, wherein, a length of a cross section of the first side surface intersected by a second plane perpendicular to the substrate substrate is a first length, and a length of a cross section of the second side surface intersected by the second plane is a second length, the first length being less than the second length. 6.The display substrate according to claim 2 or 3, wherein the first side surface comprises a first side surface portion close to the substrate substrate and a second side surface portion away from the substrate substrate, the first side surface portion and the second side surface portion being connected to each other, an included angle between the first side surface portion and the first pixel defining surface being the first angle, and an included angle between the second side surface portion and a plane parallel to the first pixel defining surface being less than 90 degrees and not greater than the first angle. 7.The display substrate of any one of claims 1-5, further comprising: a limiting structure between the pixel defining portion and the substrate substrate, a portion of the limiting structure exposed by the second opening being configured to interrupt the at least one layer in the light-emitting functional layer, wherein the limiting structure comprises a first limiting layer and a second limiting layer arranged in a stack, the second limiting layer being between the first limiting layer and the substrate substrate, an edge of the first limiting layer protruding into a second opening surrounded thereby relative to an edge of the second limiting layer. The material of the pixel defining part and the second defining layer is organic material, and the first defining layer includes metal material or inorganic non-metal material. 8.The display substrate of claim 7, wherein, The first side includes a first side part close to the substrate and a second side part away from the substrate, the first side part and the second side part are connected to each other, and the second side part protrudes toward a side close to the center of the second opening surrounded thereby relative to the first side part to make the first side part include a surface of a recess. 9.The display substrate of claim 8, wherein, The ratio of the size of the recess in the direction perpendicular to the substrate to the size of the second defining layer in the direction perpendicular to the substrate is 0.9-1.

1. 10.The display substrate according to claim 8 or 9, wherein The ratio of the size of the recess recessed in the second side part to the size of the edge of the second defining layer recessed in the first defining layer is 0.9-1.

1. 11.The display substrate of claim 10, wherein, The size of the edge of the recess close to the substrate recessed relative to the edge away from the substrate is not greater than 5 microns. 12.The display substrate of any one of claims 8-11, wherein, The size of the recess in the direction perpendicular to the substrate is 100-10000 angstroms.

13. The display substrate of any one of claims 7-11, further comprising: an insulating layer between the defining structure and the substrate, wherein the second defining layer is part of the insulating layer. 14.The display substrate of any one of claims 1-13, wherein, The at least one layer in the light-emitting functional layer includes a first part on the first side and a second part on the second side, and the thickness of the second part is greater than the thickness of the first part.

15. A display substrate, comprising: a substrate; a plurality of sub-pixels on the substrate, each of at least part of the sub-pixels including a light-emitting functional layer including a plurality of film layers; a pixel defining pattern on the substrate, the pixel defining pattern including a plurality of openings configured to define light-emitting areas of the at least part of the sub-pixels and a pixel defining part surrounding the plurality of openings, at least part of at least one layer in the light-emitting functional layer being continuous in the openings; a partition structure on a side surface of the pixel defining part away from the substrate, at least part of the at least one layer in the light-emitting functional layer being partitioned at the partition structure; wherein the pixel defining part includes a first pixel defining part overlapping the partition structure and a second pixel defining part surrounding at least part of the partition structure, and the maximum thickness of the first pixel defining part is greater than the maximum thickness of the second pixel defining part. 16.The display substrate of claim 15, wherein, The ratio of the thickness of the second pixel defining part to the thickness of the first pixel defining part ranges from 5% to 95%.

17. The display substrate of claim 15 or 16, wherein, The thickness of the second pixel defining part is 0.1-2 microns.

18. The display substrate according to any one of claims 15-17, wherein, The material of the partition structure includes organic material, and the size of the partition structure in a direction parallel to the substrate in a cross section of the partition structure cut by a plane perpendicular to the extension direction of the partition structure is a cross-sectional size in a direction along the substrate and perpendicular to the substrate, and the cross-sectional size gradually increases.

19. The display substrate of claim 18, wherein, The cross section includes a first side close to the substrate, a second side away from the substrate, and a side edge connecting the first side and the second side, an included angle between the side edge and the second side is 40-90 degrees, and a thickness of the partition structure is 0.8-3 microns.

20. The display substrate according to any one of claims 15-19, wherein, A normal projection of the partition structure on the substrate is completely located in a normal projection of the first pixel defining part on the substrate.

21. A display device comprising the display substrate of any one of claims 1-20.

22. A manufacturing method of a display substrate, comprising: forming an insulating layer on a substrate; forming a plurality of defining layers on the insulating layer; forming a plurality of first electrodes of a plurality of sub-pixels on the plurality of defining layers, wherein the sub-pixel comprises the first electrode, a light-emitting functional layer, and a second electrode which are sequentially stacked in a direction perpendicular to the substrate; forming a pixel defining layer on the first electrode; performing a first patterning process on the pixel defining layer to form a plurality of first openings to expose the first electrode; performing a second patterning process on the pixel defining layer to form a plurality of second openings, the second openings exposing portions of the defining layers; wherein the manufacturing method further comprises: in the same step of forming the plurality of second openings, etching portions of the insulating layer which are not covered by the defining layers and are exposed by the second openings to form protrusions stacked with the defining layers, wherein edges of the protrusions are recessed relative to edges of the defining layers; the light-emitting functional layer is formed after the protrusions are formed, the light-emitting functional layer comprises a plurality of film layers, at least one layer of the light-emitting functional layer is continuous in at least part of the first openings, and at least part of the at least one layer of the light-emitting functional layer is partitioned at edges of the defining layers in at least one second opening.

23. The method of manufacturing according to claim 22, wherein, The manufacturing method further comprises: etching portions of the pixel defining layer close to the defining layers to form recesses.

24. The method of manufacturing according to claim 22 or 23, wherein, dry etching the pixel defining layer to form the plurality of second openings.

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