Bending baffle trap for inhibiting extra-high voltage direct current GIL metal particles

Abstract

The invention provides a bent baffle trap for suppressing extra-high voltage direct current GIL metal particles, and relates to the technical field of metal particle suppression, and the bent baffle trap structurally comprises an arc-shaped shell and a bent baffle, the peripheral edges of the arc-shaped shell are a first turned-over edge, a second turned-over edge, a third turned-over edge and a fourth turned-over edge which are formed by being turned over towards the inner wall of the GIL equipment shell; the arc-shaped shell is divided into a plurality of square areas, the long edge of each square area is cut, the wide edge of each square area is cut according to a preset value, and a bent baffle is obtained; the bent baffle is bent towards the direction of an internal space between the arc-shaped shell and the inner wall of the GIL equipment shell to form a groove structure; the width of the bent baffle is the width of a groove opening of the groove structure, and the uncut width of the square area is the width of the groove wall of the groove structure. According to the invention, the metal particles can be accurately guided into the trap, and the escape of the particles and the migration of the particles to the insulator can be effectively inhibited.

Description

Technical Field

[0001] This invention relates to the field of metal particle suppression technology, specifically to a bending baffle trap for suppressing metal particles in ultra-high voltage direct current (UHVDC) GIL (Gas Injection Line). Background Technology

[0002] With the development of ultra-high voltage power grids, gas-insulated transmission lines (GILs) have become key equipment for large-capacity power interconnection. However, metal particles generated by mechanical wear in DC GILs can cause air gap breakdown or surface flashover, seriously threatening insulation safety. Therefore, particle suppression technology is of paramount importance.

[0003] Since metal particles were identified as a major hidden danger in gas-insulated equipment, various trap structures for particle suppression have been proposed both domestically and internationally, mainly including strip-shaped, perforated, and grid-type structures. Related research has largely focused on AC operating conditions. To improve active capture capabilities under AC conditions, existing technologies have proposed a perforated trap structure, overcoming the limitation of traditional grids which can only passively capture particles. Subsequently, based on the jumping motion characteristics of particles, a lift-up trap was further designed. By increasing the distance between the trap and the outer shell, the path for particles to enter from the bottom or top is widened, thereby improving capture efficiency.

[0004] However, in a DC electric field, particles generally exhibit significant penetrating motion characteristics, resulting in a significant increase in their incident kinetic energy and exacerbating insulation risks. This places higher demands on the design of trap structures and parameters. The lift-up traps developed in AC environments are limited by their straight-slot structure. Due to the small incident angle and high velocity of the particles, particles easily escape directly from the slot opening after only one collision. Furthermore, this structure is difficult to effectively dissipate particle kinetic energy, and even after multiple collisions, particles may still escape, leading to unsatisfactory capture efficiency. The pull-out trap structure also has limited applicability, restricting its widespread adoption.

[0005] Furthermore, with the continuous increase in the operating voltage of ultra-high voltage direct current (UHVDC) GILs, the kinetic energy gained by metal particles further increases, and the number of collision dissipation steps required for effective capture also increases accordingly. Existing traditional trap structures are neither able to effectively prevent particles from escaping directly nor do they have sufficient energy dissipation mechanisms to adequately reduce the kinetic energy of the particles, making the particle escape problem particularly prominent in high-voltage direct current environments. Summary of the Invention

[0006] This invention provides a baffle-type particle trap to guide particles away from critical insulating components and into the trap. To achieve the above objective, the technical solution adopted by this invention is as follows: Arc-shaped shell and bent baffle; The four edges of the arc-shaped shell are formed by folding towards the inner wall of the GIL device housing, forming a first flange, a second flange, a third flange, and a fourth flange; The arc-shaped shell is divided into several square areas. The long side of each square area is cut, and the wide side is cut according to a preset value to obtain a bending baffle. The bending baffle bends toward the internal space between the arc-shaped shell and the inner wall of the GIL device housing to form a groove structure; The width of the bending baffle is the width of the groove opening of the groove structure, and the uncut width of the square area is the width of the groove wall of the groove structure.

[0007] In some embodiments, the width of the bending baffle is smaller than the width of the first flange, the second flange, the third flange, and the fourth flange.

[0008] In some embodiments, the arcuate housing covers a range of 160° to 170°.

[0009] In some embodiments, the first flange and the third flange are slidably inserted along the inner wall of the GIL device housing.

[0010] In some embodiments, the bending angle formed by the bending baffle and the vertical direction ranges from 45° to 55°.

[0011] In some embodiments, a preset value is set according to the width ratio range of the slot opening and the slot wall, wherein the width ratio range is 0.75 to 1.5.

[0012] In some embodiments, the distance between the upper surface of the arcuate housing and the inner wall of the GIL device housing ranges from 18±2 mm.

[0013] In some embodiments, the arc-shaped housing is an integrally formed aluminum alloy sheet metal part, and the thickness of the arc-shaped housing is 3±1mm.

[0014] In some embodiments, the surface roughness of the arcuate housing and the bent baffle ranges from 4 to 6.3 μm.

[0015] In some embodiments, the arcuate housing has a curvature adapted to the inner wall of the GIL device housing.

[0016] Compared with the prior art, the present invention has the following beneficial effects: This invention proposes a bending baffle trap for suppressing metal particles in ultra-high voltage direct current (UHVDC) gas ionizers (GILs). The structure includes an arc-shaped shell and a bending baffle. The four edges of the arc-shaped shell are formed by folding towards the inner wall of the GIL device housing, creating a first, second, third, and fourth flange. The arc-shaped shell is divided into several square regions. The long side of each square region is cut, and the wide side is cut according to a preset value to obtain the bending baffle. The bending baffle is bent towards the internal space between the arc-shaped shell and the inner wall of the GIL device housing, forming a groove structure. The width of the bending baffle is the width of the groove opening of the groove structure, and the uncut width of the square region is the width of the groove wall of the groove structure.

[0017] This invention cuts the body of the arc-shaped shell and bends it into its internal space to form a bending baffle. While maintaining the original insulation distance of the equipment, it effectively expands the low electric field region inside the trap cavity, providing better spatial conditions for the dissipation of particle kinetic energy, thereby systematically improving the insulation reliability of GIL.

[0018] This invention introduces a baffle with a specific angle to physically intercept the incident path of particles. The collision not only changes the charge polarity of the particles and uses the electric field to offset some of their kinetic energy, but also actively controls their rebound direction. When the particle's incident angle towards the insulator is small or away from it, the baffle can effectively rebound the particle to the low electric field region at the bottom of the trap. When the particle is towards the insulator and the incident angle is large, the baffle can effectively adjust the particle's rebound angle, causing the particle to move away from the insulator. This prevents the particle from escaping directly while significantly reducing the risk of the particle moving towards the insulator.

[0019] This invention improves the bending angle. θ Groove width W 槽口 With the width of the tank wall W 槽壁 The coordinated design and optimization of key parameters ensured the feasibility of the structure and process while precisely balancing the conflict between the probability of particles entering the groove and the "trapping capture rate" after particles enter the groove. (Bending angle) θ The coverage and trajectory control capabilities of the bending baffle have been optimized; W 槽口 and W 槽壁 ratio J This balances the conflict between the trap entry probability and the trap capture rate, thereby maximizing the overall trap capture performance.

[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other embodiments can be obtained based on these drawings without creative effort.

[0021] Figure 1 This invention provides a schematic diagram of the overall structure of a bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles.

[0022] Figure 2 This is a partial structural schematic diagram of a bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles, provided by the present invention.

[0023] Figure 3 This is a schematic diagram illustrating the effect of the particle incident angle on the motion trajectory of a bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles, as provided by the present invention.

[0024] Figure 4 The present invention provides a bending baffle angle for suppressing the trapping of metal particles in ultra-high voltage direct current (UHVDC) GILs. θ A schematic diagram illustrating the effect on the trajectory of particles.

[0025] Figure 5 This invention provides a comparison of particle trapping rates for a bent baffle trap with different structural parameters used to suppress ultra-high voltage direct current (UHVDC) GIL metal particles.

[0026] The attached figures are labeled as follows: 1. Arc-shaped shell; 2. Bending baffle; 3. Groove; 4. Groove wall; 5. First flange; 6. Second flange; 7. Third flange; 8. Fourth flange. Detailed Implementation

[0027] The present invention will be further described below with reference to the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solutions of the present invention and should not be construed as limiting the scope of protection of the present invention. It should be noted that the following detailed descriptions are exemplary and intended to provide further explanation of this application.

[0028] It should be noted that all uses of "first" and "second" in the embodiments of the present invention are for the purpose of distinguishing two entities or parameters with the same name but different names. It is clear that "first" and "second" are only for the convenience of expression and should not be construed as limiting the embodiments of the present invention. Subsequent embodiments will not explain this in detail.

[0029] This invention proposes a bending baffle trap for suppressing ultra-high voltage direct current (UHVDC) GIL metal particles. Please refer to [link / reference]. Figure 1 , Figure 2 , Figure 3 and Figure 4 ,include: Arc-shaped shell 1 and bent baffle 2; The four edges of the arc-shaped housing 1 are formed by folding the first flange 5, the second flange 6, the third flange 7, and the fourth flange 8 towards the inner wall of the GIL device housing; The arc-shaped shell 1 is divided into several square areas. The long side of each square area is cut and the wide side is cut according to a preset value to obtain the bending baffle 2. The bending baffle 2 bends toward the internal space between the arc-shaped housing 1 and the inner wall of the GIL device housing to form a groove structure; The width of the bending baffle 2 is the width of the groove opening 3 of the groove structure, and the width of the uncut square area is the width of the groove wall 4 of the groove structure.

[0030] This invention creates a bent baffle 2 at a specific angle by cutting and bending an arc-shaped shell 1. Without altering the original insulation spacing, this effectively expands the low-electric-field region inside the trap, creating better conditions for particle kinetic energy dissipation. The bent baffle 2 physically intercepts the particle's path, altering its charge through collision and reducing its kinetic energy using an electric field. Simultaneously, it actively controls the rebound direction, causing the particle to deviate from the insulator and be guided to the bottom of the trap, significantly reducing the risk of escape and impact. Furthermore, through the coordinated optimization of key parameters such as the bending angle, slot 3, and slot wall 4, the probability of particle entry into the trap and the capture efficiency are balanced, thereby maximizing the overall performance of the trap, enhancing the insulation reliability of the GIL, and making it suitable for suppressing metal particles in ultra-high voltage DC power systems.

[0031] In addition to being cut into a long strip structure, the bending baffle 2 can also be a multi-segment adjustable shape. The shape and angle of the bending baffle 2 can be flexibly adjusted according to the particle distribution in different positions inside the GIL equipment to adapt to diverse working conditions.

[0032] Ultra-high voltage direct current (UHVDC) is a direct current transmission technology of ±800 kV and above.

[0033] In some embodiments, please refer to Figure 1 The width of the bending baffle 2 is smaller than the width of the first flange 5, the second flange 6, the third flange 7, and the fourth flange 8.

[0034] During assembly, to avoid the bending baffle 2 from interfering with other flanges due to its excessive size, all flanges provide stable support for the internal space between the arc-shaped housing 1 and the inner wall of the GIL device housing, enhancing resistance to deformation and vibration.

[0035] In some embodiments, please refer to Figure 1 The arc-shaped shell 1 covers an area of ​​160°~170°.

[0036] For example, the trap described in this invention has a coverage area of ​​170°. From the perspective of the particle movement range, the particles mainly move below the GIL guide rod. The arc-shaped housing 1 has a coverage area of ​​160°~170°, covering the vast majority of the particle movement range, which can effectively capture the particles. Furthermore, the maximum radius of the arc-shaped housing 1 is lower than the inner wall of the GIL device housing, ensuring that the trap is easy to install.

[0037] In some embodiments, please refer to Figure 1 The first flange 5 and the third flange 7 are slidably inserted along the inner wall of the GIL device housing.

[0038] When connecting to the inner wall of the GIL device housing, the first flange 5 and the third flange 7 are reliably connected to the GIL device housing by welding or bolting, ensuring the arc-shaped housing 1 is fixed and effectively coping with vibrations and other factors during equipment operation. The bending baffle 2 can adjust the bending angle according to the actual needs of different voltage levels, better adapting to the movement of particles inside the equipment, actively guiding particles into the slot 3, and achieving a balance between the trapping probability and the trapping capture rate by adjusting the width of the slot wall 4, thereby maximizing the overall trapping performance.

[0039] Four flanges are used to create a low electric field region, thereby reducing the electric field force experienced by particles entering the trap and improving the particle capture effect. The arc-shaped shell folds inward to form the first flange 5 and the third flange 7, which allows the trap to slide into the inner wall of the GIL device shell. The first flange 5 and the third flange 7 are reliably connected to the GIL device shell by welding or bolting, ensuring that the arc-shaped shell 1 is fixed and can effectively cope with factors such as vibration during equipment operation.

[0040] In some embodiments, please refer to Figure 1 and Figure 2 The bending angle formed by the bending baffle 2 and the vertical direction is in the range of 45°~55°.

[0041] For example, the bending angle of the trap described in this invention is 50°. The angle of the bending baffle 2... θ It has a significant impact on regulating particle motion behavior. Smaller... θ This allows the bending baffle 2 to cover a larger area of ​​the slot 3, effectively altering the rebound trajectory of particles with smaller incident angles, thereby reducing their direct escape phenomenon; however, θ If the size is too small, the control effect will be weakened, or even the particles may escape directly after colliding with the bending baffle 2. Conversely, θWhile a larger bending angle can enhance control over the direction of particle rebound, the coverage area of ​​the bending baffle 2 is limited, and it is difficult to effectively suppress direct escape. Setting the bending angle range to 45°~55° achieves a balance between coverage and control efficiency.

[0042] The angle between the bending baffle 2 and the trap body is the bending angle θ, which ranges from 45° to 55°. This reduces local stress concentration and ensures the long-term stability of the connection. When particles move at a certain speed and direction, the bending baffle effectively changes their trajectory, making it easier for them to fall into the groove. It also increases the contact time and collision area between the particles and the bending baffle 2, enhancing collision energy dissipation and reducing the possibility of particles rebounding and escaping.

[0043] The bending baffle 2 can adjust its angle according to actual needs, better adapting to the complex airflow and particle movement inside the equipment, and actively guiding particles into the groove. The stable connection between the bending baffle 2 and the bottom of the groove ensures that the bending baffle 2 will not easily loosen or fall off when particles collide, and can continuously play its role in capturing particles, enhancing collision energy dissipation, effectively suppressing particle escape, and improving the insulation reliability of the equipment.

[0044] In some embodiments, please refer to Figure 1 and Figure 2 A preset value is set according to the width ratio range of the slot 3 and the slot wall 4, wherein the width ratio range is 0.75~1.5.

[0045] For example, the width ratio of the trap opening 3 and the trap wall 4 in this invention is 0.75. The width of the opening 3... W 槽口3 Under fixed conditions, the width of the tank wall is 4. W 槽壁4 This directly affects the capture effect of particles within the trap. W 槽壁4 When larger, it can provide a longer blocking path, increasing the chance of a collision; however, as... W 槽壁4 Increase W 槽口3 and W 槽壁4 ratio J The corresponding reduction in size decreases the probability of particles entering the trap slot 3. Therefore, within a given slot 3 size W... 槽口3 The following needs to be determined reasonably: the width W of the tank wall 4. 槽壁4 To balance the probability of particles entering slot 3 with the trap's effectiveness in capturing particles, the width ratio of slot 3 to slot wall 4 was set to a range of 0.75 to 1.5, thus maximizing the overall trap capture performance.

[0046] In some embodiments, please refer to Figure 1 and Figure 2 The distance between the upper surface of the arc-shaped housing and the inner wall of the GIL device housing is 18±2mm.

[0047] For example, the trap height of the present invention is 18 mm. The upper surface of the arc-shaped shell 1 maintains a distance of 18 ± 2 mm from the inner wall of the GIL device housing. This provides necessary buffer space for particle collision, rebound, and settling, while ensuring sufficient safe insulation distance from the high-voltage electrode, forming the basis for the trap's kinetic design. Furthermore, under the condition of DC superimposed lightning impulse voltage, the maximum electric field strength on the trap surface is 8.36 MV / m, meeting the requirements of the electric field strength design criteria.

[0048] The optimal overall height of the trap described in this invention is 18mm. When a particle moves to the vicinity of the bending baffle 2, the bending baffle 2 can change the trajectory of the particle at an appropriate height and angle, allowing it to fall smoothly into the groove. This ensures that the connection between the bending baffle 2 and the groove structure has sufficient strength and rigidity when subjected to the impact force of the particle, preventing deformation or damage and maintaining the reliability of the connection.

[0049] In some embodiments, please refer to Figure 1 and Figure 2 The arc-shaped shell 1 is an integrally formed aluminum alloy sheet metal part, and the thickness of the arc-shaped shell 1 is 3±1mm.

[0050] For example, the trap of the present invention has a thickness of 3mm. Aluminum alloy sheet metal within this thickness range is selected to ensure that the trap has sufficient mechanical strength and stability, while taking into account the feasibility of processing and bending and the need to control the overall weight.

[0051] The optimal thickness range of the trap described in this invention is 3mm. Excessive thickness would make it difficult to accurately install the bending baffle 2 into the groove, hindering the connection process and potentially damaging components due to forced installation; excessive thinness would create a gap between the bending baffle 2 and the groove, reducing the tightness of the connection, affecting the particle capture effect and the equipment's sealing performance. Ensuring a perfect fit between the bending baffle 2 and the groove is crucial for a stable connection.

[0052] In some embodiments, the surface roughness of the arc-shaped housing 1 and the bent baffle 2 ranges from 4 to 6.3 μm.

[0053] For example, the surface roughness of the trap described in this invention is 6.3 μm. A moderately rough surface increases friction, allowing the kinetic energy of particle collisions to be more effectively converted into heat and other dissipated energy, causing the particles to lose their vitality more quickly and settle at the bottom of the trap, thus improving capture stability. From a microscopic perspective, when particles move to the surface of the groove wall 4 or the bent baffle 2 under the influence of an electric field, the surface roughness increases the contact opportunities and friction between the particles and the structural surface. A rough surface has more uneven areas, making it easier for particles to adhere to the structural surface, thereby improving the particle capture rate. After sandblasting, the roughness of the inner wall of the groove and the surface of the bent baffle 2 increases, enhancing the particle capture ability. Simultaneously, sandblasting can also remove impurities such as oxide layers and oil stains from the surface, improving surface cleanliness and facilitating particle adhesion.

[0054] In some embodiments, please refer to Figure 1 and Figure 2 The arc-shaped housing 1 has a curvature that adapts to the inner wall of the GIL device housing.

[0055] Ensure that the arc-shaped housing 1 can fit tightly against the inner wall of the GIL device housing, reduce the gap between the flange of the arc-shaped housing 1 and the inner wall of the GIL device housing, avoid adverse electrical phenomena such as partial discharge and electric field concentration caused by the existence of gaps, form a relatively regular and continuous internal space, optimize the electric field distribution inside the device, and reduce electric field distortion.

[0056] In some embodiments, please refer to Figure 3 The bending baffle 2 is installed facing away from the insulator.

[0057] From the perspective of the incident angle of particle motion, such as Figure 3 As shown: the dashed line represents the direction of the particle's velocity, and the solid line represents the force acting on it. When the particle collides with the bending baffle 2, the polarity of its charge changes. At this time, the electric field force will counteract part of its kinetic energy, thereby slowing down the particle's velocity as it enters the bottom of the trap. In addition, as shown in particles ② and ③, when the particle is incident on the insulator at a small angle or away from the insulator, the bending baffle 2 can effectively bounce the particle to the low electric field region at the bottom of the trap; when the particle is incident on the insulator at a large angle, as shown in particle ①, the bending baffle 2 can effectively adjust the particle's bounce angle, causing the particle to move away from the insulator.

[0058] In some embodiments, please refer to Figure 1 , Figure 2 , Figure 4 and Figure 5 Specifically, such as Figure 1 and Figure 2 As shown, the baffle-type particle trap of this invention is made of aluminum alloy and is integrally formed through cutting and bending processes. The overall height of the trap... hThe design measures 18mm in diameter and 3mm in thickness, with all edges chamfered to homogenize the electric field. Simulation results show that under DC superimposed lightning impulse voltage conditions, the maximum electric field strength on the trap surface is 8.36MV / m, which meets the electric field strength design criteria.

[0059] The core of the trap lies in the bent baffle 2 at the bottom of its groove. The bending angle θ is a key parameter affecting the capture performance. Figure 4 As shown, when θ When the angle is less than 45°, the bending baffle 2's ability to control the direction of particle rebound weakens, and the particles can still easily escape after collision; while when θ Within the range of 45° to 90°, it can effectively ensure that particles do not bounce directly out of the slot 3 after collision. Therefore, the present invention θ Values ​​were selected within the range of 45° to 90°, and optimal values ​​were obtained.

[0060] Another key parameter is the slot width W. 槽口 With the width W of the groove wall 槽壁 ratio J W 槽壁 It directly affects the number of collisions of particles within the trap, and W 槽口 This affects the probability of particles entering the trap. To balance both factors, this invention will incorporate W... 槽口 With W 槽壁 The ratio is designed to be between 0.75 and 1.5. In a preferred embodiment, W is selected. 槽口 =15mm, and set W accordingly. 槽壁 The three control groups were 10mm, 15mm, and 20mm respectively.

[0061] To evaluate the capture effectiveness, the trap capture rate was defined. M The probability of a particle being captured after entering the environment is used as the core evaluation indicator.

[0062] Simulation results of the optimization process are as follows Figure 5 Show. Figure 5 Showing different θ Angles and different W 槽口 With W 槽壁 Trapping capture rate at width ratio M As can be seen in the above θ The angle is between 45° and 55°. M It can maintain a high level. Through the optimized parameter combination of this invention, the trap can achieve significantly better capture performance than conventional structures.

[0063] Finally, it should be noted that those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The program can be stored in a computer-readable storage medium, and when executed, it can include the processes of the embodiments of the methods described above. The storage medium for the program can be a magnetic disk, optical disk, read-only memory (ROM), or random access memory (RAM), etc. The above computer program embodiments can achieve the same or similar effects as any of the corresponding foregoing method embodiments.

[0064] Those skilled in the art will also understand that the various exemplary logic blocks, modules, circuits, and algorithm steps described in conjunction with the disclosure herein can be implemented as electronic hardware, computer software, or a combination of both. To clearly illustrate this interchangeability between hardware and software, the functionality of various illustrative components, blocks, modules, circuits, and steps has been generally described. Whether this functionality is implemented as software or as hardware depends on the specific application and the design constraints imposed on the system as a whole. Those skilled in the art can implement the functionality in various ways for each specific application, but such implementation decisions should not be construed as departing from the scope of the embodiments disclosed herein.

[0065] The above are exemplary embodiments disclosed in this invention. However, it should be noted that various changes and modifications can be made without departing from the scope of the embodiments of this invention as defined by the claims. The functions, steps, and / or actions of the claims according to the disclosed embodiments described herein do not need to be performed in any particular order. The sequence numbers of the disclosed embodiments of this invention above are for descriptive purposes only and do not represent the superiority or inferiority of the embodiments. Furthermore, although the elements disclosed in the embodiments of this invention may be described or claimed individually, they may be understood as multiple unless explicitly limited to a singular number.

[0066] It should be understood that, as used herein, the singular form “a” is intended to include the plural form as well, unless the context clearly supports an exception. It should also be understood that, as used herein, “and / or” refers to any and all possible combinations of one or more of the associated listed items.

[0067] Those skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of the invention (including the claims) is limited to these examples. Within the framework of the invention, technical features of the above embodiments or different embodiments can be combined, and many other variations of different aspects of the invention exist, which are not provided in the details for the sake of brevity. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the invention should be included within the protection scope of the invention.

Claims

1. A bending baffle trap for suppressing ultra-high voltage direct current (UHVDC) gas ionizer (GIL) metal particles, disposed on the inner wall of the GIL equipment housing, characterized in that, include: Arc-shaped shell (1) and bent baffle (2); The four edges of the arc-shaped shell (1) are formed by folding the first flange (5), the second flange (6), the third flange (7), and the fourth flange (8) towards the inner wall of the GIL device shell. The arc-shaped shell (1) is divided into several square areas. The long side of each square area is cut and the wide side is cut according to a preset value to obtain a bending baffle (2). The bending baffle (2) bends toward the internal space between the arc-shaped shell (1) and the inner wall of the GIL device housing to form a groove structure; The width of the bending baffle (2) is the width of the groove opening (3) of the groove structure, and the width of the uncut square area is the width of the groove wall (4) of the groove structure.

2. The bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The width of the bending baffle (2) is smaller than the width of the first flange (5), the second flange (6), the third flange (7), and the fourth flange (8).

3. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The arc-shaped shell (1) covers a range of 160°~170°.

4. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The first flange (5) and the third flange (7) are slidably inserted along the inner wall of the GIL device housing.

5. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The bending angle formed by the bending baffle (2) and the vertical direction is in the range of 45°~55°.

6. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, A preset value is set according to the width ratio range of the slot (3) and the slot wall (4), wherein the width ratio range is 0.75~1.

5.

7. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The distance between the upper surface of the arc-shaped housing and the inner wall of the GIL device housing is 18±2mm.

8. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The arc-shaped shell (1) is an integrally formed aluminum alloy sheet metal part, and the thickness of the arc-shaped shell (1) is 3±1mm.

9. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The surface roughness of the arc-shaped shell (1) and the bent baffle (2) ranges from 4 to 6.3 μm.

10. A bending baffle trap for suppressing ultra-high voltage direct current GIL metal particles according to claim 1, characterized in that, The arc-shaped housing (1) has a curvature that adapts to the inner wall of the GIL device housing.

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