Tail gas treatment equipment for preparing high-dispersion silicon dioxide by seed crystal method

Abstract

The invention provides tail gas treatment equipment for preparing high-dispersion silicon dioxide through a seed crystal method, and belongs to the technical field of tail gas treatment equipment.The tail gas treatment equipment comprises a gas-liquid contact mixing box, and a high-speed motor is fixedly connected to the center of the bottom of the gas-liquid contact mixing box through bolts; the high-speed motor is fixedly connected with a rotating column through the output end of one side of the high-speed motor, a gas circulation cavity is formed in the center of the top of the rotating column, a gas inlet hole is formed in the position, close to the outer side of the gas circulation cavity, of the outer side wall of the rotating column, and a filler cover is welded to the top end of the rotating column. The packing cover is filled with a packing layer, and a liquid drop throwing-out groove is formed in the peripheral surface of the packing cover; according to the invention, the waste gas entering tangentially is in hedging contact with an extremely thin liquid film or tiny liquid drops, so that the alkali liquor and the waste gas are in reverse full contact reaction, reaction components are in contact reaction, diffusion and mixing in the movement process, and the gas-liquid contact area is increased.

Description

Technical Field

[0001] This invention belongs to the technical field of exhaust gas treatment equipment, specifically relating to an exhaust gas treatment device for preparing highly dispersed silica using the seed crystal method. Background Technology

[0002] Highly dispersed silica is a silica powder with a high degree of dispersibility. Its particle size is usually between 5 and 50 nanometers, and it can form a highly dispersed colloidal solution. It has a wide range of applications in many fields such as rubber industry, animal feed carrier, medicine, oral care, papermaking, coatings, agrochemicals, and silicone rubber. Highly dispersed silica is prepared using the seed crystal method, which is a technique that controls the crystal growth process by adding a small amount of crystals (seed crystals) to a supersaturated solution.

[0003] When preparing highly dispersed silica using the seed crystal method, exhaust gas containing dilute sulfuric acid mist is generated, which needs to be treated by exhaust gas treatment equipment. Exhaust gas treatment equipment is used to purify harmful gases emitted by engines, industrial equipment, etc., to meet environmental protection requirements. When treating this type of exhaust gas, most of the time, water washing and alkaline washing are used in spray towers. However, due to the size limitation of the exhaust gas treatment equipment, it is difficult for the exhaust gas to fully contact with water / alkaline solution during the treatment process, resulting in poor exhaust gas treatment effect and inability to completely absorb the sulfuric acid mist generated in the reaction stage.

[0004] Therefore, a tail gas treatment device for the preparation of highly dispersed silica by the seed crystal method is proposed. Summary of the Invention

[0005] This invention provides a tail gas treatment device for the preparation of highly dispersed silica by the seed crystal method, which aims to solve the problems mentioned above.

[0006] This invention provides a tail gas treatment device for preparing highly dispersed silica using a seed crystal method. The device includes a gas-liquid contact mixing chamber. A high-speed motor is bolted to the center of the bottom of the mixing chamber. A rotating column is fixedly connected to the high-speed motor via its output end on one side. A gas flow chamber is formed at the center of the top of the rotating column, and an air inlet is formed on the outer side of the rotating column near the outer side of the gas flow chamber. A packing cover is welded to the top of the rotating column, and the inside of the packing cover is filled with a packing layer. A droplet ejection groove is formed on the outer circumference of the packing cover. A gas guide channel is formed at the center of the bottom of the packing cover, and the top of the packing cover... A liquid inlet groove is provided at the center of the part. A liquid inlet pipe is embedded at the top center of the packing cover. A through hole is provided on the outer circumference of the liquid inlet pipe near the inner side of the packing layer. A liquid injection pipe is provided on one side outer wall of the liquid inlet pipe near the top. A gas guide pipe passes through the top center of the liquid inlet pipe. An exhaust gas connecting pipe is embedded on one side outer wall of the gas-liquid contact mixing box. An exhaust gas flow ring is provided at one end of the exhaust gas connecting pipe near the inside of the gas-liquid contact mixing box. A tangential gas outlet is provided on the inner side wall of the exhaust gas flow ring. An air baffle ring is provided on the inner side wall of the gas-liquid contact mixing box near the top of the packing cover and the exhaust gas flow ring.

[0007] Furthermore, a support column is provided on the top of the gas-liquid contact mixing box, and a waste gas adsorption and purification box is provided at the top of the support column. The bottom of the waste gas adsorption and purification box is provided with a lower cooling port, a connecting hole, and an electric heating tube in sequence in the circumferential direction. A stepper motor is fixedly connected to the center of the bottom of the waste gas adsorption and purification box by bolts. A rotating cover is fixedly connected to the stepper motor through its output end on one side. Three partitions are provided at equal intervals in the circumferential direction on the bottom of the rotating cover. Several flow holes are opened at the bottom of the rotating cover. The interior of the rotating cover is filled with an activated carbon adsorption layer. A box cover is fixedly connected to the top of the rotating cover by screws. An upper cooling port is opened at the top of the box cover near the lower cooling port, and an exhaust pipe is opened at the top of the box cover near the electric heating tube.

[0008] Furthermore, a drain pipe is connected to the bottom of the gas-liquid contact mixing box, and three fixed columns are evenly spaced around the bottom of the gas-liquid contact mixing box. A base is provided at the bottom of the three fixed columns, and a support leg is provided between the top of the base and the bottom of the waste gas adsorption and purification box. The support leg can better support the waste gas adsorption and purification box and ensure that the waste gas adsorption and purification box is set up stably and firmly.

[0009] Furthermore, the bottom end of the air guide tube is located inside the gas flow cavity, and both the air guide tube and the air inlet are connected to the gas flow cavity. The outer side wall of the air guide tube is attached to the inner side wall of the gas flow cavity. By adopting the above technical solution, the position of the bottom of the gas guide tube allows the treated gas to flow downwards and then pass through the air inlet into the gas flow chamber. With the gas flow chamber connected, the gas can flow vertically upwards from the gas guide tube, thus achieving gas guidance and ensuring that the gas can be fully alkaline washed. Furthermore, by utilizing the close fit between the gas guide tube and the air inlet, it can be ensured that the gas guide tube will not rotate when the rotating column rotates, thus maintaining the position of the gas guide tube and achieving gas flow guidance.

[0010] Furthermore, a recessed hole is provided at the top center of the packing layer for inserting the liquid inlet pipe, and the packing layer is made of wire mesh, corrugated steel or porous ball; By adopting the above technical solution, the bottom end of the liquid inlet pipe can be located inside the packing layer, thereby allowing the liquid inlet pipe to inject alkaline solution into the packing layer. The packing layer can change the shape of the alkaline solution from liquid film to liquid line to droplet, so that the droplets can fully contact the incoming waste gas.

[0011] Furthermore, the gas discharge direction of the tangential outlet is tangential to the packing cover, and the gas discharge direction of the tangential outlet is opposite to the rotation direction of the packing cover. By adopting the above technical solution, the tangential setting allows the exhaust gas to enter tangentially, thereby allowing the tangentially entering exhaust gas to collide with the alkaline droplets ejected by high-speed centrifugation. Utilizing the high-speed reverse rotation of the packing hood, the alkaline solution enters the packing layer in the packing hood axially through the inlet pipe. Under the high-speed rotation of the packing hood, the alkaline solution reacts with the exhaust gas in a counter-current manner. Under the action of the packing, the reaction components come into contact with each other during the movement, diffuse and mix, and the liquid phase products are ejected to the inner wall of the gas-liquid contact mixing chamber before being discharged.

[0012] Furthermore, a gas-liquid mixing space is formed between the outer wall of the packing cover and the inner wall of the gas-liquid contact mixing box, as well as at the position below the air baffle ring. By adopting the above technical solution, the gas-liquid mixing space formed allows the waste gas to fully contact and mix with the alkaline solution, and prevents the waste gas from overflowing upwards. It also limits and guides the flow trajectory of the waste gas, ensuring that the waste gas must react with the alkaline solution before leaving the gas-liquid contact mixing box.

[0013] Furthermore, an alkaline solution is injected into one end of the injection tube, and the injection tube is connected to the inlet tube; By adopting the above technical solution, the injected alkaline solution can be used to treat the dilute sulfuric acid in the waste gas, thereby achieving alkaline washing of the waste gas.

[0014] Furthermore, the top end of the air guide tube is embedded inside the connecting hole, and the air guide tube guides the exhaust gas into the interior of the exhaust gas adsorption and purification box. By adopting the above technical solution, the waste gas that has undergone water washing can be guided to the waste gas adsorption and purification box through the gas guide pipe, and the dilute sulfuric acid in the waste gas can be adsorbed and purified again by the waste gas adsorption and purification box, so as to ensure the quality of waste gas treatment.

[0015] Furthermore, the lower cooling port, the activated carbon adsorption layer, and the upper cooling port have the same cross-section; By adopting the above technical solution, a vertical gas flow path can be formed, thereby cooling the activated carbon adsorption layer between the lower cooling port and the upper cooling port. This ensures that the activated carbon adsorption layer, after being heated and cooled, still has gas filtration capabilities, guaranteeing the effect of subsequent gas adsorption, filtration, and purification.

[0016] The beneficial effects of this invention are as follows: 1. This invention utilizes the centrifugal force generated by the high-speed rotation of the packing hood, which is hundreds of times stronger than gravity. This force disperses the alkaline solution entering the packing layer of the packing hood axially through the inlet pipe into an extremely thin liquid film or tiny droplets. This allows the tangentially entering waste gas to come into contact with the extremely thin liquid film or tiny droplets, ensuring that the alkaline solution and waste gas have sufficient counter-current contact and reaction. This allows the reaction components to come into contact with each other, react, diffuse, and mix during the movement, increasing the gas-liquid contact area. With limited equipment volume, the gas-liquid interface area is increased by 1-2 orders of magnitude compared to traditional towers, improving the waste gas treatment effect, increasing absorption efficiency, reducing the use of alkaline solution, lowering treatment costs, and improving treatment effect. 2. This invention utilizes the sequential circumferential movement of three sets of activated carbon adsorption layers within a rotating hood. This allows the saturated activated carbon adsorption layers to undergo heating and desorption, followed by ventilation and cooling. Even after heating and cooling, the activated carbon adsorption layers retain their gas filtration capacity, ensuring the effectiveness of subsequent gas adsorption, filtration, and purification. By rotating the hood, the waste gas adsorption and purification box can maintain its gas adsorption and purification capacity, enabling secondary treatment of waste gas and thorough treatment of dilute sulfuric acid in the waste gas.

[0017] Other features and advantages of the invention will be set forth in the following description, and will be apparent in part from the description, or may be learned by practicing the invention. The objects and other advantages of the invention may be realized and obtained by means of the structures particularly pointed out in the description and the drawings. Attached Figure Description

[0018] The accompanying drawings are provided to further illustrate the invention and form part of the specification. They are used together with the embodiments of the invention to explain the invention and do not constitute a limitation thereof. In the drawings: Figure 1 This is a schematic diagram of the structure of an embodiment of the present invention; Figure 2 This is a partial three-dimensional cross-sectional view of the gas-liquid contact mixing tank according to an embodiment of the present invention; Figure 3 This is a schematic diagram of the gas-liquid contact mixing tank structure according to an embodiment of the present invention; Figure 4 This is a three-dimensional cross-sectional view of the inlet pipe and the rotating column according to an embodiment of the present invention; Figure 5 This is a schematic diagram of the exhaust gas flow ring hood structure according to an embodiment of the present invention; Figure 6 This is a three-dimensional sectional view of the packing cover according to an embodiment of the present invention; Figure 7 This is a schematic diagram of the waste gas adsorption and purification box structure according to an embodiment of the present invention; Figure 8 This is a schematic diagram of an explosion of the waste gas adsorption and purification box according to an embodiment of the present invention; Reference numerals: 1. Gas-liquid contact mixing box; 11. Support leg; 12. Support column; 2. High-speed motor; 21. Rotating column; 22. Gas flow chamber; 23. Air inlet; 3. Packing cover; 31. Packing layer; 32. Droplet ejection groove; 33. Air guide pipe groove; 34. Liquid inlet pipe groove; 4. Liquid inlet pipe; 41. Through hole; 42. Liquid injection pipe; 43. Air guide pipe; 5. Exhaust gas connecting pipe; 51. Exhaust gas flow ring cover; 52. Tangential air outlet; 53. Air baffle ring; 6. Exhaust gas adsorption and purification box; 61. Lower cooling port; 62. Connection hole; 63. Electric heating tube; 64. Stepper motor; 65. Rotating cover; 66. Flow hole; 67. Activated carbon adsorption layer; 68. Box cover; 681. Upper cooling port; 682. Exhaust pipe; 7. Liquid drain pipe; 8. Fixing column; 9. Base. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. The same reference numerals in the drawings represent the same components. It should be noted that the described embodiments are only some, not all, of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the described embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0020] Example 1 Reference Figure 1-6This invention provides a tail gas treatment device for preparing highly dispersed silica using the seed crystal method. The device includes a gas-liquid contact mixing chamber 1. A high-speed motor 2 is bolted to the center of the bottom of the gas-liquid contact mixing chamber 1. A rotating column 21 is fixedly connected to the output end of the high-speed motor 2 on one side. A gas flow chamber 22 is formed at the center of the top of the rotating column 21, and an air inlet 23 is formed on the outer wall of the rotating column 21 near the outer side of the gas flow chamber 22. A packing cover 3 is welded to the top of the rotating column 21, and the inside of the packing cover 3 is filled with a packing layer 31. A recessed hole for inserting a liquid inlet pipe 4 is formed at the center of the top of the packing layer 31. The packing layer 31 is made of wire mesh, corrugated steel, or porous balls, allowing for easy liquid inlet. The bottom end of pipe 4 is located inside the packing layer 31, allowing the inlet pipe 4 to inject alkaline solution into the packing layer 31. The packing layer 31 transforms the alkaline solution from a liquid film to a liquid line to a droplet, ensuring sufficient contact between the droplets and the incoming waste gas. A droplet ejection groove 32 is provided on the outer circumference of the packing cover 3. A gas guide groove 33 is provided at the center of the bottom of the packing cover 3, and an inlet pipe groove 34 is provided at the center of the top of the packing cover 3. An inlet pipe 4 is embedded at the center of the top of the packing cover 3. A through hole 41 is provided on the outer circumference of the inlet pipe 4 near the inner side of the packing layer 31. An injection pipe 42 is provided on one side of the outer wall of the inlet pipe 4 near the top. Alkaline solution is injected into one end of the injection pipe 42. Connected to the inlet pipe 4, the injected alkaline solution can treat the dilute sulfuric acid in the waste gas, achieving alkaline washing of the waste gas. A gas guide pipe 43 runs through the center of the top of the inlet pipe 4, with its bottom end located inside the gas flow chamber 22. Both the gas guide pipe 43 and the air inlet 23 are connected to the gas flow chamber 22. The outer wall of the gas guide pipe 43 is flush with the inner wall of the gas flow chamber 22. Through the location of the bottom end of the gas guide pipe 43, the treated gas can flow downwards and then through the air inlet 23 into the gas flow chamber 22. With the gas flow chamber 22 connected, the gas can flow vertically upwards from the gas guide pipe 43, achieving gas guidance and ensuring that the gas is fully alkaline washed. The flushed gas guide pipe 43 and air inlet... 23. This ensures that the gas guide pipe 43 does not rotate when the rotating column 21 rotates, thus maintaining the position of the gas guide pipe 43 and achieving gas flow guidance. A waste gas connecting pipe 5 is embedded in one outer wall of the gas-liquid contact mixing box 1. A waste gas flow ring cover 51 is set at one end of the waste gas connecting pipe 5 near the inside of the gas-liquid contact mixing box 1. A tangential gas outlet 52 is set on the inner side wall of the waste gas flow ring cover 51. The gas discharge direction of the tangential gas outlet 52 is tangential to the packing cover 3, and the gas discharge direction of the tangential gas outlet 52 is opposite to the rotation direction of the packing cover 3. Through the tangential setting, the waste gas can enter tangentially, and then the tangentially entering waste gas can collide with the alkaline droplets thrown out by high-speed centrifugation. The high-speed reverse rotation of the packing cover 3 is utilized.The alkaline solution enters the packing layer 31 in the packing shroud 3 axially through the inlet pipe 4. Under the high-speed rotation of the packing shroud 3, the alkaline solution reacts counter-currently with the exhaust gas. Under the action of the packing, the reaction components react with each other during the movement, diffuse and mix. The liquid products are thrown to the inner wall of the gas-liquid contact mixing tank 1 and then discharged. A baffle ring 53 is provided on the inner wall of the gas-liquid contact mixing tank 1 near the top of the packing shroud 3 and the exhaust gas flow ring shroud 51. The outer wall of the packing shroud 3 and the inner wall of the gas-liquid contact mixing tank 1 are separated by a... A gas-liquid mixing space is formed below the baffle ring 53. This space allows the waste gas to fully mix with the alkaline solution, preventing upward overflow and guiding the flow of the waste gas. This ensures the waste gas must react with the alkaline solution before leaving the gas-liquid contact mixing tank 1. A drain pipe 7 is connected to the bottom of the gas-liquid contact mixing tank 1, and three fixed posts 8 are evenly spaced around the bottom of the tank. A base 9 is provided at the bottom of each of the three fixed posts 8. Specifically, when treating the tail gas generated in the preparation of highly dispersed silica by the seed crystal method, the generated waste gas is introduced into the waste gas connecting pipe 5. Under the guidance of the waste gas connecting pipe 5, the waste gas enters the waste gas flow ring hood 51. The waste gas flows circumferentially in the waste gas flow ring hood 51, and under the action of the tangential outlet 52, the waste gas enters the gas-liquid contact mixing box 1 tangentially. At this time, the high-speed motor 2 is controlled to drive the rotating column 21 to rotate at high speed through the output end on one side. The rotating column 21 pulls the packing cover 3 to rotate at high speed, and makes the rotation direction of the packing cover 3 opposite to the direction of the tangentially entering waste gas. The alkaline solution used for tail gas reaction treatment is injected into the injection pipe 42. Under the guidance of the injection pipe 42, the alkaline solution enters the inlet pipe 4 and enters the packing layer 31 through the through hole 41 on the outer side wall of the inlet pipe 4. At this time, the alkaline solution enters the packing layer 31 in the packing shroud 3 axially through the inlet pipe 4. Under the high-speed rotation of the packing shroud 3, the alkaline solution reacts with the exhaust gas in the opposite direction. Under the action of the packing, the reaction components react with each other during the movement, diffuse and mix. The liquid phase product is thrown to the inner wall of the gas-liquid contact mixing box 1 and flows downward and is discharged from the drain pipe 7. The gas after the contact reaction cannot flow upward due to the obstruction of the baffle ring 53. With the push of the subsequent gas, the gas after the contact reaction enters the gas flow chamber 22 through the air inlet hole 23. With the connection of the gas flow chamber 22, the gas can flow vertically upward through the gas guide pipe 43 to achieve gas discharge.

[0021] Example 2 Reference Figure 1 , Figure 7 and Figure 8This invention also proposes a tail gas treatment device for preparing highly dispersed silica using the seed crystal method, including a gas-liquid contact mixing box 1. A support column 12 is installed at the top of the gas-liquid contact mixing box 1, and a waste gas adsorption and purification box 6 is installed at the top of the support column 12. The bottom of the waste gas adsorption and purification box 6 has a lower cooling port 61, a connecting hole 62, and an electric heating tube 63 arranged sequentially in the circumferential direction. The top of a gas guide pipe 43 is embedded inside the connecting hole 62, and the gas guide pipe 43 guides the waste gas into the waste gas adsorption and purification box 6. The waste gas, which has undergone water washing, can be guided to the waste gas adsorption and purification box 6 through the gas guide pipe 43, and the waste gas adsorption and purification box 6 further adsorbs and purifies the dilute sulfuric acid in the waste gas, ensuring the quality of waste gas treatment. A stepper motor 64 is fixedly connected to the center of the bottom of the waste gas adsorption and purification box 6 by bolts. A rotating cover 65 is fixedly connected to the stepper motor 64 through its output end on one side. The rotating cover 65 has an inner... The bottom of the unit has three partitions at equal intervals in the circumference, and the bottom of the rotating cover 65 has several flow holes 66. The interior of the rotating cover 65 is filled with an activated carbon adsorption layer 67, and the top of the rotating cover 65 is fixedly connected to a box cover 68 by screws. The top of the box cover 68 is provided with an upper cooling port 681 near the lower cooling port 61. The lower cooling port 61, the activated carbon adsorption layer 67 and the upper cooling port 681 have the same cross-section, which can form a vertical gas flow path, thereby cooling the activated carbon adsorption layer 67 between the lower cooling port 61 and the upper cooling port 681, so that the activated carbon adsorption layer 67 still has gas filtration capacity after heating and cooling, ensuring the effect of subsequent gas adsorption filtration and purification. The top of the box cover 68 is provided with an exhaust pipe 682 near the electric heating tube 63. A support leg 11 is provided between the top of the base 9 and the bottom of the waste gas adsorption and purification box 6. Specifically, after the gas undergoing the contact reaction enters the waste gas adsorption and purification box 6 through the gas guide pipe 43, under the guidance of the flow hole 66, the gas passes through the flow hole 66 and enters the swirl cover 65 and comes into contact with the activated carbon adsorption layer 67 inside it. The activated carbon adsorption layer 67 adsorbs and purifies the waste gas in the gas. The gas that has completed the second treatment is discharged from the exhaust pipe 682 at the top of the box cover 68. Because the activated carbon adsorption layer 67 weakens or even loses its gas adsorption and purification capacity after becoming saturated, after a period of time, the stepper motor 64 drives the rotating cover 65 to rotate 120 degrees through its output end on one side. At this time, the saturated activated carbon adsorption layer 67 moves circumferentially above the electric heating tube 63. After the electric heating tube 63 is turned on, it generates high temperature to heat the activated carbon adsorption layer 67. After being heated, the gas adsorbed by the activated carbon adsorption layer 67 is released, allowing the activated carbon adsorption layer 67 to regain its adsorption and purification capacity. The stepper motor 64 is then controlled to pull the rotating cover 65 to rotate 120 degrees again. At this time, the activated carbon adsorption layer 67 is in a high-temperature state. The adsorption layer 67 moves circumferentially between the lower cooling port 61 and the upper cooling port 681. Since the lower cooling port 61 and the upper cooling port 681 are open, a vertical gas flow path can be formed between the lower cooling port 61, the upper cooling port 681, and the activated carbon adsorption layer 67. This cools the activated carbon adsorption layer 67 located between the lower cooling port 61 and the upper cooling port 681, ensuring that the heated and cooled activated carbon adsorption layer 67 still retains its gas filtration capacity, guaranteeing the effectiveness of subsequent gas adsorption, filtration, and purification. The rotation of the rotating cover 65 ensures that the waste gas adsorption and purification box 6 maintains its gas adsorption and purification capacity continuously.

[0022] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of this invention is defined by the appended claims and their equivalents.

Claims

1. An off-gas treatment apparatus for the production of highly dispersed silica by the seed crystal method, characterized by: Including gas liquid contact mixing box (1), the bottom central position of gas liquid contact mixing box (1) is fixedly connected with high-speed motor (2) by bolt, the output end of high-speed motor (2) is fixedly connected with spin column (21) by its one side, the top central position of spin column (21) is equipped with gas flow cavity (22), and the outer side wall of spin column (21) is equipped with gas inlet hole (23) near the outer side position of gas flow cavity (22), the top end of spin column (21) is welded with packing cover (3), the inside of packing cover (3) is filled with packing layer (31), and the outer circumferential surface of packing cover (3) is equipped with liquid drop throwing groove (32), the bottom central position of packing cover (3) is equipped with gas guide pipe through slot (33), and the top central position of packing cover (3) is equipped with liquid inlet pipe through slot (34), the top central position of packing cover (3) is embedded with liquid inlet pipe (4), the outer circumferential surface of liquid inlet pipe (4) is equipped with through hole (41) near the inner side position of packing layer (31), and the outer wall of one side of liquid inlet pipe (4) is provided with liquid injection pipe (42) near the top position, the top central position of liquid inlet pipe (4) is penetrated with gas guide pipe (43), one side outer wall of gas liquid contact mixing box (1) is embedded with waste gas communication pipe (5), one end of waste gas communication pipe (5) is provided with waste gas flow ring cover (51) near the inner position of gas liquid contact mixing box (1), the inner side wall of waste gas flow ring cover (51) is provided with tangential gas outlet nozzle (52), the inner side wall of gas liquid contact mixing box (1) is provided with gas baffle ring (53) near the top position of packing cover (3) and waste gas flow ring cover (51).

2. The exhaust gas treatment device for preparing highly dispersed silica by the seed crystal method according to claim 1, characterized by: The top of the gas liquid contact mixing box (1) is provided with a support column (12), and the top end of the support column (12) is provided with a waste gas adsorption purification box (6). The bottom of the waste gas adsorption purification box (6) is sequentially provided with a lower cooling port (61), a connecting hole (62) and an electric heating pipe (63) in a circumferential direction. A stepping motor (64) is fixedly connected to the bottom central position of the waste gas adsorption purification box (6) by bolts. The output end of one side of the stepping motor (64) is fixedly connected with a rotating cover (65). Three partitions are arranged on the inner bottom of the rotating cover (65) in an equidistant circumferential direction. A plurality of flow holes (66) are formed in the bottom of the rotating cover (65). The inner part of the rotating cover (65) is filled with an activated carbon adsorption layer (67). The top of the rotating cover (65) is fixedly connected with a box cover (68) by screws. An upper cooling port (681) is formed in the top of the box cover (68) above the lower cooling port (61). An exhaust pipe (682) is formed in the top of the box cover (68) above the electric heating pipe (63).

3. The exhaust gas treatment device for preparing highly dispersed silica by the seed crystal method according to claim 2, characterized by: The bottom of the gas-liquid contact mixing box (1) is communicated with a liquid discharge pipe (7), and the bottom of the gas-liquid contact mixing box (1) is circumferentially and equidistantly provided with three fixing columns (8), the bottom of the three fixing columns (8) is provided with a base (9), and the top of the base (9) and the bottom of the waste gas adsorption purification box (6) are provided with a supporting leg (11).

4. The exhaust gas treatment device for preparing high-dispersion silica by the seed crystal method according to claim 1, characterized by: The bottom end of the gas guide pipe (43) is located inside the gas flow cavity (22), and the gas guide pipe (43) and the gas inlet hole (23) are both communicated with the gas flow cavity (22), and the outer side wall of the gas guide pipe (43) is attached to the inner side wall of the gas flow cavity (22).

5. The exhaust gas treatment device for preparing high-dispersion silica by the seed crystal method according to claim 1, characterized by: A recess hole is formed in the top central position of the filler layer (31) and the filler layer (31) is made of a wire mesh, corrugated steel or porous ball.

6. The exhaust gas treatment device for preparing highly dispersed silica by the seed crystal method according to claim 1, characterized by: The gas discharge direction of the tangential gas outlet nozzle (52) is tangent to the filler cover (3), and the gas discharge direction of the tangential gas outlet nozzle (52) is opposite to the rotating direction of the filler cover (3).

7. The apparatus for treating exhaust gas for preparing highly dispersed silica by a seed crystal method according to claim 1, characterized by: The gas-liquid mixing space is formed between the outer side wall of the filler cover (3) and the inner side wall of the gas-liquid contact mixing box (1) and below the gas blocking ring (53).

8. The exhaust gas treatment device for preparing highly dispersed silica by the seed crystal method according to claim 1, characterized by: One end of the liquid injection pipe (42) injects lye, and the liquid injection pipe (42) is communicated with the liquid inlet pipe (4).

9. The exhaust gas treatment apparatus for preparing highly dispersed silica by the seed crystal method according to claim 2, characterized by: The top end of the gas guide pipe (43) is embedded in the inside of the connecting hole (62), and the gas guide pipe (43) guides the waste gas into the inside of the waste gas adsorption purification box (6).

10. The apparatus for treating exhaust gas for preparing highly dispersed silica by a seed crystal method according to claim 2, characterized by: The cross sections of the lower cooling port (61), the activated carbon adsorption layer (67) and the upper cooling port (681) are the same. The bottom of the gas-liquid contact mixing box (1) is communicated with a liquid discharge pipe (7), and the bottom of the gas-liquid contact mixing box (1) is circumferentially and equidistantly provided with three fixing columns (8), the bottom of the three fixing columns (8) is provided with a base (9), and the top of the base (9) and the bottom of the waste gas adsorption purification box (6) are provided with a supporting leg (11).

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