Cleaning device

Abstract

The present invention addresses the problem of providing a cleaning device capable of appropriately positioning a substrate storage container during rotation of a rotary stage. The cleaning apparatus includes: a cleaning processing tank configured to clean the substrate storage container; and a container holding unit for holding and rotating the substrate storage container, the container holding unit including: a rotating stage on which the substrate storage container is placed; and a container fixing part which is provided on the rotating stage, fixes the substrate storage container when the rotating stage is in a rotating state, does not come into contact with the substrate storage container when the rotating stage is in a stopped state, and does not come into contact with the substrate storage container when the rotating stage is in the rotating state. A part of the container fixing portion is in contact with the substrate storage container due to a centrifugal force acting on the rotary stage.

Description

Technical Field

[0001] One embodiment of the present invention relates to a cleaning apparatus for a substrate storage container for storing substrates such as semiconductor wafers. Background Technology

[0002] Traditionally, in the semiconductor manufacturing process, front-opening unified pods (FOUPs) or front-opening shipping boxes (FOSBs) have been used as containers to hold semiconductor wafers. During the storage of semiconductor wafers, these containers can become contaminated, necessitating periodic cleaning. Typically, a cleaning device for these containers places them on a rotating stage and sprays cleaning fluid while the stage rotates. The wafer container is positioned on the rotating stage by multiple locking mechanisms.

[0003] [Existing Technical Documents]

[0004] [Patent Literature]

[0005] [Patent Document 1] Japanese Patent Application Publication No. 2005-109523 Summary of the Invention

[0006] [The problem the invention aims to solve]

[0007] The size or shape of the wafer receiving container sometimes varies depending on the type or purpose of the container. In such cases, it may be impossible to properly position the wafer receiving container according to its size or shape using the locking mechanism. If the rotary table is rotated in this state, the position of the wafer receiving container will be uncertain, which may cause large vibrations in the cleaning device or the wafer receiving container to fall off.

[0008] One of the objectives of this invention is to provide a cleaning apparatus that can properly position a substrate storage container during the rotation of a rotating stage.

[0009] [Technical means to solve the problem]

[0010] A cleaning apparatus according to one embodiment of the present invention includes: a cleaning treatment tank for cleaning a substrate storage container; and a container holding part for holding and rotating the substrate storage container. The container holding part includes: a rotating platform for placing the substrate storage container; and a container fixing part disposed on the rotating platform, which fixes the substrate storage container when the rotating platform is rotating. When the rotating platform is stopped, the container fixing part does not contact the substrate storage container. When the rotating platform is rotating, a portion of the container fixing part contacts the substrate storage container due to the centrifugal force acting on the rotating platform. Attached Figure Description

[0011] Figure 1 This is a block diagram showing the overall structure of the cleaning apparatus according to the first embodiment.

[0012] Figure 2 This is a cross-sectional view schematically showing the internal structure of the cleaning processing unit in the cleaning apparatus of the first embodiment.

[0013] Figure 3 This is a plan view schematically showing the structure of the container holding part in the cleaning apparatus of the first embodiment.

[0014] Figure 4 This is a schematic diagram showing the structure of the container fixing part in the cleaning apparatus of the first embodiment.

[0015] Figure 5A This is a schematic diagram used to explain the operation of the container fixing part in the cleaning apparatus of the first embodiment.

[0016] Figure 5B This is a schematic diagram used to explain the operation of the container fixing part in the cleaning apparatus of the first embodiment.

[0017] Figure 6A This is a diagram schematically illustrating the structure of the container fixing part in a modified example of the cleaning apparatus of the first embodiment.

[0018] Figure 6B This is a diagram schematically illustrating the structure of the container fixing part in a modified example of the cleaning apparatus of the first embodiment.

[0019] Figure 7A This is a schematic diagram showing the structure of the container fixing part in the cleaning apparatus of the second embodiment.

[0020] Figure 7B This is a schematic diagram showing the structure of the container fixing part in the cleaning apparatus of the second embodiment.

[0021] Explanation of icon numbers

[0022] 10: Cleaning device

[0023] 41, 41-3: Support section

[0024] 41-3a: Protrusion

[0025] 41a: First support section

[0026] 41b: Second support section

[0027] 42: Rotating shaft

[0028] 43, 43-1: Rotating part

[0029] 43-1b: Protrusion

[0030] 43-2: Rotating part

[0031] 43-2b: First protrusion

[0032] 43-2c: Second protrusion

[0033] 43-3: Rotating part

[0034] 43a: First end

[0035] 43b: Second end

[0036] 44: Counterweight section

[0037] 100: Casing

[0038] 110: Move into the gate

[0039] 120: Move the gate out

[0040] 200: Loading port

[0041] 300: Moving and Transporting Company

[0042] 310: Transport arm

[0043] 320: Handshake

[0044] 400: Decompose / Connect Platform

[0045] 500: Cleaning and Treatment Department

[0046] 510: Cleaning and treatment tank

[0047] 520: Cover

[0048] 521: Cover retaining part

[0049] 521a: Rotating shaft

[0050] 521b: Rotary support section

[0051] 521c: Retention section

[0052] 522: Rotary drive unit

[0053] 530: Container holding section

[0054] 531: Rotating shaft

[0055] 532: Rotary stage

[0056] 532a: Drain hole

[0057] 532b: Movement Restriction Section

[0058] 532ba: Protruding component

[0059] 532c: Incision area

[0060] 532d: Mounting surface

[0061] 533, 533-1, 533-2, 533-3: Container fixing part

[0062] 534: Balance Adjustment Department

[0063] 540: Rotary drive unit

[0064] 551~553: Cleaning nozzles

[0065] 561~563: Drying nozzles

[0066] 600: Drying Processing Department

[0067] 700: Unloading port

[0068] 800: Control Department

[0069] 810: Computing device

[0070] 820: Storage device

[0071] 821: Control Procedure

[0072] 900: Chip Storage Container

[0073] 910: Container body

[0074] 920: Cover Detailed Implementation

[0075] Hereinafter, a cleaning apparatus according to one embodiment of the present invention will be described with reference to the accompanying drawings. However, the cleaning apparatus of the present invention can be implemented in many different forms and is not limited to the description of the examples shown below.

[0076] In the specification and claims of this application, "upper" refers to a direction moving vertically away from the installation surface of the cleaning device (e.g., the floor surface of a factory) when the cleaning device is set up for normal use, and "lower" refers to the opposite direction to "upper". Additionally, "inner side" refers to a direction closer to the center of the cleaning device, and "outer side" refers to the opposite direction to "inner side".

[0077] <First Implementation>

[0078] As an example of a cleaning apparatus according to one embodiment of the present invention, a cleaning apparatus for a wafer storage container will be described. However, the embodiments of the cleaning apparatus are not limited to a cleaning apparatus for a wafer storage container, and also include a cleaning apparatus for cleaning a substrate storage container for storing other substrates such as glass substrates and intermediate masks.

[0079] [Structure of cleaning device 10]

[0080] Figure 1 This is a block diagram showing the overall structure of the cleaning apparatus 10 according to the first embodiment. The cleaning apparatus 10 is, for example, disposed in a semiconductor wafer manufacturing plant to clean used wafer storage containers. The cleaning apparatus 10 of this embodiment includes a housing 100, a loading port 200, a conveying mechanism 300, a disassembly / connection stage 400, a cleaning processing unit 500, a drying processing unit 600, an unloading port 700, and a control unit 800. However, the structure of the cleaning apparatus 10 is not limited to the above example and may be omitted. Figure 1 The component shown is a subset of the components shown; additional components may also be added.

[0081] The housing 100 serves as a frame protecting the cleaning device 10. The housing 100 houses the aforementioned conveying mechanism 300, disassembly / connection platform 400, cleaning treatment unit 500, and drying treatment unit 600. Furthermore, the loading port 200 and unloading port 700 are provided spanning both the interior and exterior of the housing 100. Regarding the control unit 800, in… Figure 1 The example shown is configured inside the housing 100, but it can also be configured outside the housing 100.

[0082] The loading port 200 is a component for moving a wafer storage container 900, which is the object to be cleaned, into the interior of the cleaning apparatus 10. The wafer storage container 900 is, for example, a FOUP or FOSB. The wafer storage container 900 is initially placed in the portion of the loading port 200 located outside the housing 100. When the loading gate 110 provided in the housing 100 is opened, the wafer storage container 900 moves into the portion of the loading port 200 located inside the housing 100. The movement of the wafer storage container 900 is performed, for example, by a conveying device such as a slide conveyor (not shown). Afterward, the loading gate 110 is closed, and the loading of the wafer storage container 900 is completed.

[0083] The conveying mechanism 300 is a component that transports the wafer storage container 900 to various components. The conveying mechanism 300 includes a conveying arm 310 and a gripper 320. While the gripper 320 is holding the wafer storage container 900, the conveying mechanism 300 extends, retracts, or rotates the conveying arm 310 to transport the wafer storage container 900 to various components. The conveying mechanism 300 is also referred to as a conveying robot.

[0084] The disassembly / connection stage 400 is an assembly that disassembles the wafer storage container 900 into a container body (also referred to as a shell) and a cover (also referred to as a door), or connects the container body and the cover. The wafer storage container 900, transported from the loading port 200 by the transfer mechanism 300, is disassembled into a container body and a cover while fixed on the disassembly / connection stage 400. Furthermore, the wafer storage container 900, having undergone drying treatment by the drying treatment unit 600 (described later), is transported from the drying treatment unit 600 to the disassembly / connection stage 400 via the transfer mechanism 300, where the container body and cover are reconnected.

[0085] The cleaning processing unit 500 is an assembly for cleaning the wafer storage container 900. Although not shown in the figure, the cleaning processing unit 500 includes a cleaning solution reservoir for storing cleaning solution. Regarding the wafer storage container 900, which is to be cleaned, the container body and the cover are separately transported from the disassembly / connection stage 400 and held in the cleaning processing unit 500 in a separated state. For example, the container body of the wafer storage container 900 is held inside the cleaning processing tank of the cleaning processing unit 500, and the cover of the wafer storage container 900 is held inside the cleaning processing unit 500 with the cover attached to the cover. As described later, in this embodiment, an example is shown where the container body is cleaned in the cleaning processing tank and the cover is cleaned, but this is not limited to this example; the container body and the cover may also be cleaned in separate cleaning processing tanks. Alternatively, if only the container body is brought into the cleaning apparatus 10 without the cover attached, it is not necessary to separate the container body and the cover during cleaning; only the container body is cleaned in the cleaning processing tank.

[0086] As described below, the cleaning processing unit 500 is configured as a container body capable of holding the wafer storage container 900 on a rotating stage disposed internally. During the cleaning process of the container body, the container body rotates due to the rotation of the rotating stage, and cleaning is performed while cleaning fluid is blown onto the rotating container body. Detailed structure and operation of the cleaning processing unit 500 will be described later.

[0087] The cleaning processing unit 500 includes a drying component for temporary drying (generally removing water droplets adhering to the surface of the wafer storage container 900), enabling the drying process of the cleaned wafer storage container 900. As mentioned earlier, the interior of the cleaning processing unit 500 is a rotatable structure, thus, by increasing the rotation speed, a rotational drying process can be performed on the cleaned wafer storage container 900. Furthermore, the cleaning processing unit 500 can supply heated drying air into its interior; by performing rotational drying while blowing drying air, water droplets adhering to the wafer storage container 900 can be generally removed. The container body and lid of the wafer storage container 900, after temporary drying, are separately transferred to the drying processing unit 600.

[0088] The drying unit 600 is a component that performs a drying process (formal drying) on ​​the wafer storage container 900 using reduced pressure drying. The drying unit 600 is configured to hold the wafer storage container 900 internally and has airtightness to create a reduced pressure environment (vacuum environment) inside. Similar to the cleaning unit 500, the container body and lid of the wafer storage container 900 are separately held inside the drying unit 600 and subjected to drying processes separately. Although not shown in the figures, the drying unit 600 includes an exhaust device (e.g., an exhaust pump) for reducing internal pressure and creating a reduced pressure environment.

[0089] After the wafer storage container 900 is held inside the drying processing unit 600, it is placed in a reduced-pressure environment to perform a drying process (reduced-pressure drying). Specifically, reduced-pressure drying is performed by reducing the pressure inside the drying processing unit 600 after the wafer storage container 900 is placed inside the drying processing unit 600. Water droplets and other moisture adhering to the surface of the wafer storage container 900 under reduced-pressure environment evaporate and dry.

[0090] After the wafer storage container 900 has completed drying in the drying process section 600, the wafer storage container 900 returns to the disassembly / connection stage 400, and the container body and cover are reconnected. The wafer storage container 900, with the container body and cover connected, is then transported to the unloading port 700 via the conveying mechanism 300.

[0091] The unloading port 700 is a component used to remove the wafer storage container 900 to the outside of the cleaning apparatus 10. The wafer storage container 900 is initially placed in the portion of the unloading port 700 located inside the housing 100. When the removal gate 120 provided in the housing 100 is opened, the wafer storage container 900 moves to the portion of the unloading port 700 located outside the housing 100. Afterwards, the removal gate 120 closes, completing the removal of the wafer storage container 900.

[0092] The control unit 800 controls the operation of the cleaning apparatus 10. The control unit 800 includes a processing unit 810 and a storage unit 820. The processing unit 810 is, for example, a central processing unit (CPU). The storage unit 820 is, for example, a read-only memory (ROM). In the control unit 800, the operation of each component of the cleaning apparatus 10 is controlled by reading and executing a control program 821 stored in the storage unit 820. The control program 821 includes command groups for performing various processes such as cleaning, drying, and conveying. The components constituting the control unit 800 are not limited to... Figure 1The components shown. For example, the control unit 800 may also include other components such as a large-capacity storage device like a hard disk for storing various data, or a communication interface for communicating with an external network.

[0093] [Structure of Cleaning Processing Unit 500]

[0094] Figure 2 This is a schematic cross-sectional view showing the internal structure of the cleaning processing unit 500 in the cleaning apparatus 10 of the first embodiment. The cleaning processing unit 500 includes a cleaning processing tank 510, a cover 520, a container holding part 530, a rotation drive part 540, cleaning nozzles 551 to 553, and drying nozzles 561 to 563. However, Figure 2 The structure of the cleaning processing unit 500 shown is only one example and is not limited to this example. For example, the cleaning processing unit 500 may also be equipped with other components such as a rotation detector for detecting the rotation speed of the rotating stage 532 (described later) and an analysis device for measuring the internal state of the cleaning processing tank 510 (e.g., the drying state of the wafer storage container 900). In addition, the drying nozzles 561 to 563 may be omitted.

[0095] The cleaning tank 510 is for forming the container body 910 for the wafer storage container 900 (in Figure 2 The frame of the space for cleaning (shown as dashed lines in the middle). As described later, a portion of the container holding part 530 (rotating stage 532, container fixing part 533, etc.), or cleaning nozzles 551 to 553 and drying nozzles 561 to 563, etc., are disposed inside the cleaning treatment tank 510.

[0096] The cover 520 not only functions as a cover to seal the cleaning tank 510, but also as a cover 920 for holding the wafer storage container 900 (in Figure 2 The cover portion 520 (shown as dashed line in the image) functions as a holding part. In other words, the cover portion 520 functions as a frame that forms a space for cleaning the cover 920 of the wafer storage container 900. The cover portion 520 includes a cover holding part 521 and a rotation drive part 522.

[0097] The cover holding portion 521 has the function of holding the cover 920 of the wafer storage container 900 and allowing it to rotate during cleaning. The cover holding portion 521 includes a rotating shaft portion 521a, a rotating support portion 521b, and a holding portion 521c. The rotating support portion 521b is configured to be connected to the rotating shaft portion 521a, which is supported by the rotating drive portion 522, and is capable of rotating at a predetermined rotational speed. The cover 920 is held in the rotating support portion 521b by a plurality of holding portions 521c provided therein. Thus, the cover 920, held inside the cover portion 520, is held in a position to rotate by the rotating support portion 521b. As will be described later, when the cleaning process begins, the cover 920 also rotates along with the rotation of the rotating support portion 521b. The cover 920 is cleaned by the supply of cleaning fluid from the cleaning nozzle 552 while rotating.

[0098] The container holding unit 530 has the function of holding and rotating the container body 910 of the wafer storage container 900 during cleaning. The container holding unit 530 includes a rotating shaft 531, a rotating stage 532, a container fixing part 533, and a balance adjustment part 534. The container body 910 is moved in from above the cleaning processing tank 510, as... Figure 2 As shown, the substrate is placed on the rotating stage 532 with the opening for storing the substrate (the side with the cover 920) facing downwards.

[0099] The rotating stage 532 is configured to be connected to the rotating shaft 531, which is supported by the rotating drive unit 540, and is capable of rotating at a predetermined rotational speed. The rotating stage 532 is a quadrilateral with chamfered corners when viewed from above. A cleaning nozzle 553 and a drying nozzle 563 are fixedly disposed independently of the rotating stage 532 at its center. As described later, the cleaning nozzle 553 is a nozzle for supplying cleaning fluid for cleaning the container body 910 from the inside. The drying nozzle 563 is a nozzle for supplying heated, dry air for drying the container body 910 from the inside. The cleaning fluid supplied to the cleaning nozzle 553 and the dry air supplied to the drying nozzle 563 are supplied via piping provided inside the cylindrical member constituting the rotating shaft 531. Furthermore, the shape of the rotating stage 532 is not limited to the aforementioned shape and may also be circular or polygonal. For example, the ideal shape of the rotating stage 532 is such that the rotation center of the rotating stage 532 coincides with the center of the holding area HA, and the weight balance is not lost when the rotating stage 532 rotates.

[0100] In addition to functioning as a stage for holding the container body 910 of the wafer receiving container 900 that is moved in from above the cleaning tank 510, the rotary stage 532, as described above, also has the function of rotating the container body 910. The rotary stage 532 has multiple drainage holes 532a and a movement limiting part 532b (see reference) that restricts the movement of the container body 910 in the horizontal direction (strictly speaking, the direction of centrifugal force when the rotary stage 532 rotates). Figure 3 Furthermore, a container fixing part 533 and a balance adjustment part 534 are installed on the rotating stage 532. Details regarding the rotating stage 532, the container fixing part 533, and the balance adjustment part 534 will be described later.

[0101] Cleaning nozzles 551 to 553 are nozzles that supply cleaning fluid to the container body 910 during cleaning. For ease of explanation, simplified illustrations are provided, but cleaning nozzles 551 to 553 have a structure with multiple discharge holes provided in the cylindrical member. Cleaning fluid supplied to the interior of the cylindrical member at a certain pressure is discharged from each discharge hole. Figure 2 Only the nozzle portion (the rod-shaped portion with the discharge hole) is shown in the diagram. In reality, each cleaning nozzle 551 to 553 is installed inside the cleaning treatment tank 510 via a support member or the like. Cleaning fluid is supplied to each cleaning nozzle 551 to 553 from a cleaning fluid reservoir (not shown) located outside the cleaning treatment tank 510 via piping or the like (not shown).

[0102] The cleaning nozzle 551 supplies cleaning fluid from the side of the container body 910. During the cleaning process, the container body 910 rotates due to the rotation of the rotating platform 532, thus supplying cleaning fluid to the entire side of the container body 910 through the cleaning nozzle 551. The cleaning nozzle 552 faces the bottom surface of the container body 910 (on the side of the container body 910). Figure 2 The cleaning nozzle 553 supplies cleaning fluid to the container body 910 and the cover 920. Therefore, multiple discharge holes provided with the cleaning nozzle 552 are positioned facing both the container body 910 and the cover 920. The cleaning nozzle 553 supplies cleaning fluid to the inside of the container body 910 as previously described. Similarly, in this case, since the container body 910 rotates during the cleaning process, cleaning fluid is supplied to the entire inside of the container body 910 by supplying cleaning fluid from the cleaning nozzle 553.

[0103] Although not shown in the diagram, one end of the cleaning nozzle 552 is connected to a rotatable support member extending vertically. Therefore, when the support member rotates, the cleaning nozzle 552 rotates and moves in an arc around the support member. With this structure, when the container body 910 is moved into the cleaning tank 510, the cleaning nozzle 552 can be moved to a position that does not obstruct the movement of the container body 910, and during cleaning, the cleaning nozzle 552 can be moved above the container body 910.

[0104] Drying nozzles 561 to 563 are nozzles that supply heated, dry air to the container body 910 after cleaning. Similar to cleaning nozzles 551 to 553, drying nozzles 561 to 563 have a structure with multiple ejection holes in the cylindrical member. Dry air supplied to the interior of the cylindrical member at a certain pressure is ejected from each ejection hole. Figure 2 Only the nozzle portion (the rod-shaped portion with the discharge hole) is shown in the diagram. In reality, each of the drying nozzles 561 to 563 is installed inside the cleaning treatment tank 510 via a support member or the like. Dry air is supplied to each of the drying nozzles 561 to 563 from a gas cylinder or the like (not shown) located outside the cleaning treatment tank 510 via piping or the like (not shown).

[0105] Drying nozzle 561 supplies drying air from the side of container body 910. During the rotary drying process after cleaning, container body 910 rotates due to the rotation of the rotating platform 532, thus the entire side of container body 910 is dried by supplying drying air from drying nozzle 561. Drying nozzle 562 supplies drying air toward the bottom surface of container body 910 and cover 920. Therefore, a plurality of nozzles provided in drying nozzle 562 are positioned facing both container body 910 and cover 920. Drying nozzle 563 supplies drying air to the inside of container body 910 as described above. Similarly, in this case, since container body 910 rotates during rotary drying, the entire inside of container body 910 is dried by supplying drying air from drying nozzle 563.

[0106] Although not shown in the figure, the drying nozzle 562 has the same structure as the cleaning nozzle 552, and can rotate in an arc shape by rotating a rotatable support member (not shown). That is, when the container body 910 is moved into the cleaning treatment tank 510, the drying nozzle 562 can be moved to a position that does not obstruct the movement, and during the rotary drying process, the drying nozzle 562 can be moved above the container body 910.

[0107] [Structure of container holding part 530]

[0108] Figure 3This is a plan view schematically showing the structure of the container holding part 530 in the cleaning apparatus 10 of the first embodiment. (As shown) Figure 3 As shown, a holding region HA is provided on the rotating stage 532 for holding the wafer receiving container 910. A plurality of drainage holes 532a are arranged inside the holding region HA. The plurality of drainage holes 532a are through holes for draining downwards any liquid (cleaning fluid or pure water) that falls onto the rotating stage 532 during the cleaning process of the container body 910. Figure 3 In the example shown, eight drain holes 532a are shown, but the number of drain holes 532a is not limited to the example shown.

[0109] In the region outside the holding area HA, the aforementioned movement restriction part 532b, container fixing part 533, and balance adjustment part 534 are arranged. That is, the structure is such that when the container body 910 is placed on the rotating platform 532, multiple movement restriction parts 532b, container fixing parts 533, and balance adjustment parts 534 are arranged to surround the container body 910. Ideally, the positions of the movement restriction parts 532b, container fixing parts 533, and balance adjustment parts 534 should be considered in relation to the gripper 320 of the conveying mechanism 300 used for moving the container body 910 in and out (see reference). Figure 1 The movement path of the gripper 320 is configured accordingly. Since the gripper 320 grips a portion of the container body 910 (e.g., the flange portion) to transport the container body 910, it is ideal that the movement restriction part 532b, the container fixing part 533, and the balance adjustment part 534 are not arranged near the gripping portion of the gripper 320. For example, in Figure 3 The rotating stage 532 shown has its flange portion located at... Figure 3 On the left side. Corresponding to the position of the flange portion, the container fixing part 533 is provided in two positions on the left side of the container body 910, which is a rectangle in terms of the holding area HA, avoiding the center where the flange is provided, and in the center of the right side.

[0110] As previously described, the movement restriction part 532b functions to restrict the horizontal movement of the container body 910. Specifically, the movement restriction part 532b of this embodiment includes a pin-shaped protruding member 532ba that protrudes upward from the rotating stage 532. When cleaning begins and the rotating stage 532 rotates, a centrifugal force is applied to the container body 910, which rotates together with the rotating stage 532, and the center of gravity of the container body 910 may sometimes become off-center. This is because the shape or position of the center of gravity of the container body 910 varies depending on the type of wafer storage container 900. In addition, a gap is provided between the movement restriction part 532b and the container body 910. The gap is provided with reference to the following situations: the size of the container body 910 may vary depending on the type of wafer storage container 900; or even wafer storage containers 900 of the same type may have individual differences. Alternatively, the gap is provided to prevent interference between the movement restriction part 532b and the descending container body 910 when the container body 910 is placed on the rotating stage 532. Due to the presence of this gap, when the rotating stage 532 rotates, the container body 910 may sometimes rotate towards the eccentric direction and move horizontally due to centrifugal force. The movement restriction part 532b is provided to limit this horizontal movement of the container body 910 during rotation.

[0111] In this embodiment, a movement limiting part 532b is provided at a position slightly outward from the holding area HA to prevent it from becoming an obstacle when the container body 910 is placed on the rotating stage 532. Therefore, even if the center of gravity of the container body 910 becomes off-center and the container body 910 moves in the horizontal direction, the movement of the container body 910 can be limited by the contact between the container body 910 and the protruding member 532ba.

[0112] The container fixing part 533 serves the following function: to prevent the container body 910 from tilting due to the eccentricity of its center of gravity when centrifugal force is applied to the container body 910 during the rotation of the rotating stage 532. In the wafer storage container 900, the surface serving as the bottom (the surface facing the surface where the flange portion is provided) has the greatest weight when the substrate is stored. This is because a base member is provided on the bottom surface to maintain the levelness of the wafer storage container 900 itself, so that the substrate remains horizontal within the wafer storage container 900. In the cleaning apparatus 10 of this embodiment, as described above, the substrate is placed on the rotating stage 532 with the opening for storing the substrate (the surface where the cover 920 is installed) facing downwards. Figure 3The right side of the rotating platform 532 shown becomes heavier. When the rotating platform 532 and the container body 910 rotate in this state, the center of gravity of the container body 910 becomes off-center, or the center of gravity of the rotating platform 532 and the container body 910 as a whole becomes off-center. Therefore, if the rotation continues in this state, the container body 910 may eventually tilt in the direction of the off-center center of gravity due to centrifugal force, causing one side of the container body 910 to float off the rotating platform 532. As mentioned earlier, the movement limiting part 532b restricts the horizontal movement of the container body 910 and cannot cope with the upward movement of the container body 910, i.e., the vertical movement. In contrast, the container fixing part 533 prevents the container body 910 from tilting or floating relative to the rotating platform 532 by physically pressing the container body 910. The detailed structure of the container fixing part 533 will be described later.

[0113] The balance adjustment unit 534 is a component used to adjust the imbalance that occurs when the rotating platform 532 rotates. Specifically, the balance adjustment unit 534 functions as a counterweight to correct the shift in the center of gravity of the rotating platform 532 caused by the installation of the container fixing part 533 on the rotating platform 532. As described later, the container fixing part 533 includes counterweights, and the weight or arrangement of these components can cause the center of gravity of the rotating platform 532 to shift. Therefore, in this embodiment, for example, the balance adjustment unit 534 is provided at a position symmetrical to the container fixing part 533, with the rotation axis of the rotating platform 532 as a reference, to adjust the imbalance that occurs when the rotating platform 532 rotates.

[0114] The balance adjustment unit 534 can be any component, such as a metal component (lead, tungsten, steel, etc.), as long as it functions as a counterweight. As a metal component, one or more components capable of achieving the specified weight can be used, and there are no particular restrictions on its shape. To enable the balance adjustment unit 534 to function as a counterweight for the container fixing unit 533, the weight of the counterweight constituting the balance adjustment unit 534 is preferably the same as the weight of the counterweight included in the corresponding container fixing unit 533. If the balance adjustment unit 534 is composed of multiple metal plates, it can be fixed to the rotating platform 532 using bolts or other fastening components. In this case, the weight can be adjusted arbitrarily by varying the number of metal plates.

[0115] [Structure of container fixing part 533]

[0116] Figure 4 This is a schematic diagram illustrating the structure of the container fixing part 533 in the cleaning apparatus 10 of the first embodiment. Specifically, Figure 4 This is a view equivalent to observing the container fixing part 533 from a slightly upper left angle. The container fixing part 533 includes a support part 41, a rotating shaft part 42, a rotating part 43, and a counterweight part 44. Figure 4In the example shown, the container fixing part 533 is configured to cooperate with the cutout part 532c of the rotating stage 532.

[0117] The support portion 41 is a component for supporting the rotating portion 43, configured to be mounted on the rotating platform 532. The support portion 41 includes a first support portion 41a and a second support portion 41b for supporting the rotating shaft portion 42. In this embodiment, as... Figure 3 As shown, the first support portion 41a and the second support portion 41b are connected to each other, forming a U-shaped integral structure when viewed from above. However, not limited to the example described, the first support portion 41a and the second support portion 41b can also be separated separately. Although in Figure 4 The illustration is omitted, but the first support portion 41a and the second support portion 41b can be detachably mounted on the mounting surface 532d of the rotating platform 532 using fastening components such as bolts. However, not limited to the example described, the first support portion 41a and the second support portion 41b can also be fixed to the mounting surface 532d using adhesives or other fixing means.

[0118] The rotating shaft portion 42 is composed of a cylindrical or cylindrical member supported on the first support portion 41a and the second support portion 41b. In other words, the rotating shaft portion 42 is mounted between the first support portion 41a and the second support portion 41b. The rotating shaft portion 42 is configured to rotate about a direction intersecting the rotation axis of the rotating platform 532 (i.e., the rotation axis of the rotating shaft portion 531). Specifically, the rotating portion 43 supported on the rotating shaft portion 42 swings at its second end 43b in directions approaching and moving away from the rotation axis of the rotating platform 532. That is, the rotating shaft portion 42 is arranged parallel to the tangent of the concentric circle centered on the rotation axis of the rotating platform 532 (i.e., orthogonal to the radial direction relative to the rotation axis of the rotating platform 532). More specifically, the rotating shaft portion 42 is arranged parallel to the side of the rectangular holding area HA set on the rotating platform 532 corresponding to the position where the container fixing portion 533 is arranged. The rotating shaft 42 is connected to the rotating part 43 and functions as the rotating shaft when the rotating part 43 rotates.

[0119] The rotating part 43 is a columnar member connected to the rotating shaft part 42. As described above, the rotating shaft part 42 is supported by the first support part 41a and the second support part 41b to be able to rotate, therefore the rotating part 43 becomes a structure that can rotate together with the rotating shaft part 42. At this time, as Figure 4 As shown, since the rotating shaft 42 is connected to the center of the rotating part 43, the lower end (first end 43a) and the upper end (second end 43b) of the rotating part 43 move in opposite directions.

[0120] A counterweight 44 is detachably mounted on the first end 43a of the rotating part 43. Figure 4The example shown illustrates a counterweight 44 composed of a single component, but it is not limited to this example; the counterweight 44 can also be composed of multiple components (e.g., multiple metal plates). The counterweight 44 can be adjusted arbitrarily by being designed as a whole or a part that can be disassembled.

[0121] The weight of the counterweight 44 is set taking into account the magnitude of the centrifugal force applied to the rotating substrate storage container (container body 910 in this embodiment) during the cleaning process. For example, the centrifugal force applied to the container body 910 can be calculated based on the offset (eccentricity) of the center of gravity of the container body 910 relative to the rotation center of the rotating stage 532 and the rotational speed (angular velocity) of the rotating stage 532, and the weight of the counterweight 44 can be determined by taking into account the magnitude of the calculated centrifugal force. Alternatively, the lateral load when the container body 910 begins to tilt due to centrifugal force can be measured by rotating the rotating stage 532 at a predetermined rotational speed while the container body 910 is mounted, and the weight exceeding the measured lateral load (e.g., more than 3 times the weight) can be set as the weight of the counterweight 44.

[0122] exist Figure 4 In the example shown, the rotating part 43 is designed to overlap with the cutout 532c provided on the rotating platform 532 when viewed from above. Therefore, the first end portion 43a of the rotating part 43 can be located lower than the mounting surface 532d of the support portion 41 on the rotating platform 532. That is, the counterweight 44 mounted on the rotating part 43 is also located lower than the mounting surface 532d. By configuring the container fixing portion 533 in conjunction with the cutout 532c in this way, the length of the portion of the rotating part 43 lower than the rotation axis portion 42 can be designed without being limited by the rotating platform 532. As a result, even without drastically increasing the weight of the counterweight 44, the moment of inertia applied to the second end portion 43b of the rotating part 43 can be increased. Furthermore, the rotating part 43 can also be configured on the rotating platform 532 without providing the cutout 532c. In this case, ideally, when the rotating part 43 is configured such that its first end 43a is located lower than the mounting surface 532d, sufficient distance is ensured between the rotating part 43 and the rotating platform 532 to avoid interference between the rotating part 43 and the rotating platform 532 during rotation. Additionally, in this case, the weight of the counterweight 44 can be further increased compared to when the cutout portion 532c is provided, and the container body 910 can be pressed using the second end 43b of the rotating part 43, just as with the cutout portion 532c.

[0123] [Action of container fixing part 533]

[0124] Figure 5A and Figure 5BThis is a schematic diagram used to explain the operation of the container fixing part 533 in the cleaning device 10 of the first embodiment. Figure 5A The diagram shows the state before the cleaning process begins, with the container body 910 positioned on the rotating stage 532. Figure 5B The image shows the state after the container body 910 is positioned on the rotary stage 532 and a cleaning process is performed.

[0125] like Figure 5A As shown, when the rotating platform 532 is in a stopped state, the container fixing part 533 does not contact the container body 910, and the rotating part 43 remains in a generally upright state. That is, when the rotating platform 532 is stopped, the rotating part 43 extends in the vertical direction (up and down direction) in a manner that is approximately orthogonal to the mounting surface 532d of the rotating platform 532 due to the weight of the counterweight 44. More specifically, the rotating part 43 is configured to rotate clockwise until the position of the center of gravity, including the counterweight 44, reaches a position directly below the rotating shaft 42, at which point the rotating part 43 comes into contact with the abutment part (not shown), thereby stopping in a vertical state. The abutment part can be, for example, the innermost edge of the cut 532c (the edge closest to the holding area HA). Therefore, when the container body 910 is moved in from above (open side) of the cleaning treatment tank 510 and placed in the holding area HA, the container fixing part 533 does not obstruct the movement.

[0126] As described above, in top view, the rotating part 43 and the counterweight part 44 are located inside the cutout 532c provided on the rotating platform 532. In this embodiment, as mentioned above, the rotating part 43 can be kept in a substantially upright state by the abutment part (not shown). However, it is not limited to this example, and it may also be configured such that the rotation of the rotating part 43 is stopped when the counterweight part 44 is located directly below the rotating shaft part 42 without the abutment part.

[0127] When the container body 910 is placed in the holding area HA of the rotating stage 532, the cleaning process begins, and the rotating stage 532 rotates at a specified speed. At this time, as... Figure 5B As shown, centrifugal force acts on the counterweight 44 of the container fixing part 533, and as indicated by the arrow, the first end 43a of the rotating part 43 moves outward (away from the rotation center of the rotating platform 532). Conversely, the second end 43b of the rotating part 43 moves inward (closer to the rotation center of the rotating platform 532). As a result, the second end 43b of the rotating part 43 and a part of the container body 910 (in...) Figure 5B The example shown is the side contact of the container body 910.

[0128] exist Figure 5BIn the shown state, the container body 910 is pressed downwards by the second end 43b of the rotating part 43 of the container fixing part 533. Therefore, even if the center of gravity of the container body 910 becomes off-center during the rotation of the rotating platform 532 as described above, resulting in a force that causes the container body 910 to tilt, the downward pressing of the container body 910 by the container fixing part 533 can prevent the container body 910 from floating (tilting).

[0129] The magnitude of the force exerted by the container fixing part 533 on the container body 910 is determined by various parameters, such as the rotational speed (angular velocity) of the rotating platform 532, the weight of the counterweight 44, the distance from the rotating shaft 42 to the counterweight 44, the distance from the rotating shaft 42 to the second end 43b, and the weight of the rotating part 43. Furthermore, the magnitude of the centrifugal force acting on the container body 910 is determined by various parameters, such as the rotational speed (angular velocity) of the rotating platform 532, the weight of the container body 910, the height of the center of gravity of the container body 910, and the offset (eccentricity) of the center of gravity of the container body 910 relative to the rotational center of the rotating platform 532. In this embodiment, when designing the container fixing part 533, these parameters are comprehensively considered to estimate the centrifugal force acting on the container body 910 when the rotating container body 910 begins to tilt. Based on this, the parameters of the container fixing part 533 are designed so that the rotating part 43 of the container fixing part 533 can press the container body 910 with a force exceeding the centrifugal force acting on the container body 910.

[0130] In addition, Figure 5A and Figure 5B The example shown illustrates a structure where the rotating part 43, which serves as the container fixing part 533, presses against the side of the container body 910, but it is not limited to this example. For instance, it is also possible to configure the container body 910 to have an upward-facing surface (e.g., Figure 5A and Figure 5B In the case of surface 910a), the second end 43b of the rotating part 43 abuts against the upward-facing surface. In this case, the container fixing part 533 can press the container body 910 with a downward force, thus more effectively preventing the container body 910 from floating.

[0131] As explained above, the cleaning apparatus 10 of this embodiment has a container fixing part 533 mounted on the rotating platform 532 of the cleaning processing unit 500, which uses centrifugal force to fix the container body 910. Since the container fixing part 533 is positioned separately from the holding area HA of the rotating platform 532, it does not obstruct the placement of the container body 910 on the rotating platform 532. That is, when the rotating platform 532 is stopped, the container fixing part 533 does not contact the container body 910. On the other hand, when the cleaning process begins and the rotating platform 532 is rotating, the rotating part 43 of the container fixing part 533 rotates and comes into contact with the container body 910 due to the centrifugal force acting on the counterweight 44. By having the rotating part 43 contact the container body 910, the rotating container body 910 is prevented from floating upwards or falling off the rotating platform 532 due to centrifugal force.

[0132] As described above, according to this embodiment, when the cleaning process is performed while the container body 910 is rotated, the container body 910 can be appropriately positioned with a simple structure. Furthermore, during the rotary drying process, the higher the rotational speed of the rotating platform 532, the greater the force exerted by the container fixing part 533 on the container body 910; therefore, the rotational speed can be increased to shorten the time required for the rotary drying process.

[0133] (Variation Example 1)

[0134] Figure 4 The container fixing part 533 shown illustrates an example where the upper end (second end 43b) of the rotating part 43 is merely the end of a columnar member, but it is not limited to this example. The second end 43b may also have a structure that protrudes inward (towards the container body 910).

[0135] Figure 6A This is a schematic diagram illustrating the structure of the container fixing part 533-1 in a modified example of the cleaning device 10 of the first embodiment. Figure 6A In the example shown, the second end of the rotating part 43-1 has a protrusion 43-1b that protrudes toward the container body 910. By configuring it with this structure, as... Figure 6A As shown, the structure of the protrusion 43-1b hooking onto the upward-facing surface 910a of the container body 910 can more effectively prevent the container body 910 from floating.

[0136] Furthermore, because a portion of the rotating part 43-1b protrudes towards the container body 910, compared to the case without the protrusion 43-1b, even with a reduced rotational speed of the rotating part 43, the protrusion 43-1b can still contact the container body 910. That is, Figure 6AThe structure shown is effective in the following situations: suppressing the rotation speed of the rotating stage 532 during cleaning, suppressing the center of gravity of the container body 910 from being off-center, or reducing the weight of the counterweight 44.

[0137] Figure 6B This is a schematic diagram illustrating the structure of the container fixing part 533-2 in a modified example of the cleaning device 10 of the first embodiment. Figure 6B In the example shown, the second end of the rotating part 43-2 has a first protrusion 43-2b and a second protrusion 43-2c. The second protrusion 43-2c is disposed between the first protrusion 43-2b and the rotating shaft part 42. With this structure, even when cleaning the upward-facing surface 910a at a position greater than... Figure 6A In the case of a low-profile container body 910, the second protrusion 43-2c can be hooked onto the upward-facing surface 910a to prevent the container body 910 from floating. By providing multiple protrusions (first protrusion 43-2b and second protrusion 43-2c) in the rotating part 43-2, it is possible to accommodate wafer storage containers of various shapes.

[0138] exist Figure 6B The example shown illustrates a structure with a first protrusion 43-2b and a second protrusion 43-2c, but more than three protrusions can also be provided. Furthermore, the positions of each protrusion can be variable. For example, in Figure 6B In the example shown, the structure can also be as follows: the position of the second protrusion 43-2c in the long side direction of the rotating part 43-2 can be changed to any position. In this case, by changing the position of the second protrusion 43-2c to a suitable position according to the shape of the container body 910, the upward floating of the container body 910 can be prevented more effectively.

[0139] (Variation Example 2)

[0140] In this embodiment, an example is shown where a counterweight made of metal components or the like is used as the balance adjustment unit 534. However, this is not a limited example; a container fixing unit 533 may be used instead of the balance adjustment unit 534. That is, the imbalance that occurs when the rotating platform 532 rotates can be adjusted without the balance adjustment unit 534 by utilizing the arrangement of the container fixing unit 533 on the rotating platform 532 or the weight of the counterweight 44 provided on the container fixing unit 533. In this case, for example, other container fixing units 533 for balance adjustment can be provided at positions symmetrical to the container fixing unit 533, with the rotation axis of the rotating platform 532 as a reference, and the weight of the counterweight 44 provided on each container fixing unit 533 can be made the same, thereby adjusting the imbalance during rotation.

[0141] <Second Implementation>

[0142] This embodiment describes an example where the structure of the container fixing part differs from that of the first embodiment. The basic structure of the cleaning apparatus in this embodiment is the same as that of the cleaning apparatus 10 in the first embodiment. Therefore, in this embodiment, the description focuses on the structurally different parts. Regarding structures identical to those in the cleaning apparatus 10 of the first embodiment, repeated descriptions are sometimes omitted by using the same symbols.

[0143] Figure 7A and Figure 7B This is a schematic diagram illustrating the structure of the container fixing part 533-3 in the cleaning apparatus of the second embodiment. Specifically, Figure 7A This is a side view of the container fixing part 533-3. Figure 7B This is a diagram showing the container fixing part 533-3 viewed from the back side (the side where the counterweight part 44 is installed).

[0144] like Figure 7A and Figure 7B As shown, compared to the container fixing part 533 of the first embodiment, the support part 41-3 of the container fixing part 533-3 of this embodiment is longer in the vertical direction (up and down direction), and the position of the rotating shaft part 42 is higher. Specifically, in the container fixing part 533-3, the position of the rotating shaft part 42 in the vertical direction is closer to the center of gravity of the container body 910. In addition, since the position of the rotating shaft part 42 is set higher, even if the rotating part 43-3 is lengthened, the rotating part 43-3 can be arranged entirely above the rotating platform 532, without the need to set up a support part 41-3 on the rotating platform 532. Figure 4 The cut portion 532c shown.

[0145] exist Figure 7A and Figure 7B In the example shown, the rotating part 43-3 has a generally U-shaped cross-section and is configured to cover the support part 41-3 from the back side. Therefore, although the figure is omitted, similar to the first embodiment, when centrifugal force is applied to the counterweight part 44, the rotating part 43-3 rotates about the rotating shaft part 42 as the center of rotation and comes into contact with the container body 910.

[0146] In this embodiment, a protrusion 41-3a is provided on the back side of the support portion 41-3. Therefore, when the rotating platform 532 is in a stopped state, the rotating portion 43-3 returns to its original position due to the weight of the counterweight 44, and a portion of the rotating portion 43-3 (the portion where the counterweight 44 is provided) abuts against the protrusion 41-3a. Therefore, in Figure 7A In the state shown, the rotating part 43-3 can remain stationary in an upright position.

[0147] In the container fixing part 533-3 of this embodiment, the rotating part 43-3 rotates at a higher position than in the example shown in the first embodiment, so the side of the container body 910 can be pressed at a position close to the center of gravity of the container body 910. That is, even if a large horizontal force is applied to the container body 910 due to the centrifugal force accompanying the rotation of the rotating platform 532, the upward floating (tilting) of the container body 910 can be effectively prevented because the side of the container body 910 can be pressed at a higher position.

[0148] The cleaning apparatus according to one embodiment of the present invention has been described above with reference to the accompanying drawings. However, the present invention is not limited to the foregoing embodiments (including variations, the same below), and appropriate modifications can be made without departing from the spirit of the present invention. For example, embodiments in which those skilled in the art appropriately add, delete, or design changes the constituent elements based on the embodiments are included within the scope of the present invention, as long as they possess the spirit of the present invention. Furthermore, the structures of the foregoing embodiments can be appropriately combined as long as they do not contradict each other, and common technical matters in the embodiments are included in the structures even if not explicitly stated.

[0149] Even if the effects are different from those of the embodiments described above, the effects that are clearly defined according to this specification or that can be easily predicted by those skilled in the art can of course be understood as effects brought about by the present invention.

Claims

1. A cleaning device, comprising: A cleaning tank is used to clean the substrate storage container; and The container holding part holds and rotates the substrate storage container. The container holding part includes: a rotating platform for holding the substrate storage container; and a container fixing part disposed on the rotating platform to fix the substrate storage container when the rotating platform is rotating. When the rotating stage is in a stopped state, the container fixing part will not come into contact with the substrate storage container. When the rotating platform is rotating, due to the centrifugal force acting on the rotating platform, a portion of the container fixing part comes into contact with the substrate storage container.

2. The cleaning device according to claim 1, wherein, The container fixing part includes: a rotating part comprising a first end on which a counterweight is mounted and a second end located above the first end; and a rotating shaft part located between the first end and the second end, with the rotating shaft taking a direction parallel to the tangent of a concentric circle centered on the rotation axis of the rotating platform as the rotation axis. When the rotating stage is in a stopped state, the second end is located at a position separated from the substrate storage container. When the rotating platform is in a rotating state, the rotating part is rotated by changing the position of the counterweight using the centrifugal force acting on the counterweight, thereby causing the second end to come into contact with a part of the substrate storage container.

3. The cleaning apparatus according to claim 2, wherein, The container fixing part further includes a support part, which is mounted on the rotating platform and supports the rotating shaft part so that it can rotate.

4. The cleaning apparatus according to claim 3, wherein, The first end is located below the mounting surface of the support portion on the rotating platform.

5. The cleaning apparatus according to any one of claims 2 to 4, wherein, The counterweight is installed in a manner that allows it to be detached from the first end, either as a whole or in part.

6. The cleaning apparatus according to any one of claims 2 to 4, wherein, The rotating part has a protrusion that protrudes toward the side where the substrate storage container is disposed, located closer to the second end than the rotating shaft part.

7. The cleaning apparatus according to claim 6, wherein, The protrusions are provided in multiple ways.

8. The cleaning apparatus according to claim 6, wherein, The position of the protrusion can be changed along the long side of the rotating part.

9. The cleaning apparatus according to any one of claims 2 to 4, further comprising a balance adjustment unit disposed on the rotating platform for adjusting the imbalance of the rotating platform during rotation.

10. The cleaning apparatus according to claim 9, wherein, The balance adjustment unit is positioned symmetrically to the container fixing unit, with the rotation axis of the rotating platform as the reference.

11. The cleaning apparatus according to claim 10, wherein, The balance adjustment unit includes a counterweight of the same weight as the counterweight of the container fixing unit located at the symmetrical position.

12. The cleaning apparatus according to any one of claims 2 to 4, wherein, The substrate storage container is a wafer storage container.

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