Lithium plating device
By designing the delivery structure and nitrogen ion generator for the lithium plating device, the problems of uneven lithium ion adhesion and easy reaction on the copper foil surface were solved, thereby achieving the suppression of lithium dendrites and the improvement of the coating success rate.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-30
- Publication Date
- 2026-03-31
AI Technical Summary
In existing lithium plating equipment, lithium ions cannot adhere evenly and tightly to the copper foil surface during the lithium plating process. They are prone to reacting with other substances, and lithium dendrite growth and penetration of solid electrolyte lead to serious interface contact problems.
A lithium plating device was designed, comprising a vacuum chamber, a conveying mechanism, and a lithium plating mechanism. By setting up a conveying structure and a nitrogen ion generator, the surface roughness of the substrate is improved and lithium nitride is formed, thereby inhibiting lithium dendrite growth and solid electrolyte penetration.
It improves the adhesion rate of lithium ions on the substrate surface, enhances the success rate of coating, avoids problems such as lithium dendrite growth and solid electrolyte penetration, and improves the reliability of the lithium plating process.
Smart Images
Figure CN121759916A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of vapor deposition equipment technology, specifically to lithium plating apparatus. Background Technology
[0002] The energy density of lithium-ion batteries is gradually approaching its theoretical limit, making it difficult to meet the demands for higher safety and energy density in fields such as electric vehicles and large-scale energy storage. All-solid-state batteries are widely recognized as the strategic direction for next-generation energy storage technology. Their core lies in replacing the current flammable organic liquid electrolyte with a non-flammable solid electrolyte. The three major advantages of solid-state batteries are safety, high energy density, and long lifespan.
[0003] Currently, the commercialization of all-solid-state batteries, especially those based on lithium metal anodes, is severely hampered by solid-solid interface problems. These issues are somewhat alleviated in liquid batteries due to the wetting and fluidity of the electrolyte, but become particularly prominent in all-solid-state systems. The solid-solid contact problem between the lithium anode and the solid electrolyte is a point-to-point issue, resulting in a small physical contact area and extremely high interfacial impedance. During cycling, volume changes caused by lithium deposition / stripping further exacerbate contact failure, creating porosity, leading to current concentration and localized overpotential increases, as well as lithium dendrite growth, solid electrolyte penetration, and interfacial chemical instability.
[0004] Against this backdrop, lithium vapor deposition technology, as an advanced thin-film preparation process, is considered a potential solution to the solid-solid interface contact problem. However, existing lithium deposition equipment still faces challenges such as ineffective lithium ion adsorption, inability to uniformly and tightly adhere to the copper foil surface, high lithium ion reactivity leading to easy reactions with other substances, lithium dendrite growth, and solid electrolyte penetration. Summary of the Invention
[0005] This invention provides a lithium plating apparatus to solve the problems that existing lithium plating apparatuses still have in the lithium plating process, such as the inability of lithium ions to be better adsorbed, the inability to be uniformly and tightly attached to the copper foil surface, the high activity of lithium ions and their easy reaction with other substances, the growth of lithium dendrites and the penetration of solid electrolyte.
[0006] In a first aspect, the present invention provides a lithium plating apparatus, comprising: A vacuum chamber, comprising an upper chamber and a lower chamber that are isolated from each other; A conveying mechanism is disposed within the upper cavity and is used to convey a substrate; A lithium plating mechanism includes a feeding structure and a vapor deposition structure. The vapor deposition structure and the feeding structure are spaced apart in the lower cavity. The feeding structure and the vapor deposition structure are connected to each other to provide lithium metal wire to the vapor deposition structure. The vapor deposition structure is used to evaporate the lithium metal wire into lithium ions. The conveying mechanism is partially disposed between the upper cavity and the lower cavity; the vapor deposition structure includes a vapor deposition generating chamber and a nitrogen ion generator, the vapor deposition generating chamber is disposed in the lower cavity and communicates with the feeding structure, and the nitrogen ion generator is disposed in the vapor deposition generating chamber.
[0007] Beneficial effects: By using the conveying mechanism and lithium plating mechanism set in the vacuum chamber, the surface of the substrate can be treated through auxiliary structures to improve the surface roughness of the substrate, thereby increasing the adhesion rate of lithium ions on the substrate surface; at the same time, by using the nitrogen ion generator set in the vapor deposition chamber, some lithium ions in the vapor deposition chamber can form lithium nitride with nitrogen ions, thereby suppressing the activity of lithium ions and avoiding problems such as lithium dendrite growth and solid electrolyte penetration, which is conducive to improving the success rate of vapor deposition.
[0008] In one optional embodiment, the conveying mechanism includes a conveying structure disposed within the upper cavity. The conveying structure includes an unwinding component, a coating component, and a winding component. The unwinding component and the winding component are spaced apart within the upper cavity. The coating component is disposed between the unwinding component and the winding component. A portion of the coating component is disposed between the upper cavity and the vapor deposition chamber to attach lithium ions to the substrate.
[0009] Beneficial effects: By setting the conveying structure including an unwinding component, a coating component, and a rewinding component, in this embodiment the unwinding component, coating component, and rewinding component are respectively an unwinding roller, a coating roller, and a rewinding roller. The unwinding component and the rewinding component are spaced apart in the upper cavity, while the coating component is positioned between the unwinding component and the rewinding component. Thus, the substrate can be conveyed through the unwinding component, the coating component, and the rewinding component. In addition, some of the coating components are positioned between the upper cavity and the lower cavity, so that the substrate conveyed to the coating component can pass through the lower cavity, thereby allowing lithium ions in the lower cavity to adhere to the surface of the substrate, thus realizing the coating operation.
[0010] In one optional embodiment, the conveying structure further includes a plurality of guide members, some of which are spaced apart between the unwinding member and the coating member, and other of which are spaced apart between the coating member and the winding member, to guide the conveying of the substrate.
[0011] Beneficial effects: The conveying structure also includes several guide components. In this embodiment, the guide components are guide rollers. Some of the guide components are spaced between the unwinding component and the coating component to guide the conveying of the substrate from the unwinding component to the coating component. Other guide components are spaced between the coating component and the winding component to guide the substrate between the coating component and the winding component.
[0012] In one alternative embodiment, the conveying mechanism further includes an auxiliary structure comprising a magnetron sputtering assembly disposed on the side of the coated part near the winding part, the magnetron sputtering assembly being used to deposit a protective film on the substrate.
[0013] Beneficial effects: By setting an auxiliary structure including a magnetron sputtering component, which is specifically set on one side of the coated part, after lithium ions are attached to the surface of the substrate delivered to the coated part, the magnetron sputtering component can magnetron sputter an alloy passivation film on the lithium ion layer attached to the substrate surface to protect the lithium ion layer and prevent the lithium ion layer from being damaged by external factors.
[0014] In one optional embodiment, two coating components are provided, one coating component is provided between the upper cavity and the vapor deposition chamber, and the other coating component is provided close to the winding component, and the magnetron sputtering assembly is provided on one side of the coating component.
[0015] Beneficial effects: By setting two coating parts, and placing one coating part between the upper and lower cavities, lithium ions can be attached to the surface of the substrate transported to the coating part; while the other coating part is placed close to the winding part, and the magnetron sputtering assembly is placed on one side of the coating part, so that an alloy passivation film can be magnetron sputtered onto the lithium ion layer of the substrate transported to the coating part with the lithium ion layer attached. In this way, the magnetron sputtering can avoid affecting the adhesion of lithium ions.
[0016] In one optional embodiment, the auxiliary structure further includes a heating element and an ion source, both of which are disposed on one side of the conveying structure. The heating element is used to heat the surface of the substrate, and the ion source is used to bombard the surface of the substrate.
[0017] Beneficial effects: By setting the auxiliary structure, a heating element and an ion source are also included. In this embodiment, the heating element is a heater. Both the heater and the ion source are set on one side of the conveying structure, with the heating element close to the unwinding element and the ion source close to the coating element. In this way, when the conveying structure conveys the substrate, the heating element can first heat the surface of the substrate to remove water vapor and impurities from the surface of the substrate, and the ion source can bombard the surface of the substrate to improve the surface roughness of the substrate.
[0018] In one optional embodiment, the feeding structure includes a vacuum feeding chamber and a vacuum glove box connected in communication. The vacuum feeding chamber is disposed in the lower cavity, and the vacuum glove box is disposed in the vacuum feeding chamber. The vacuum glove box stores lithium metal wire to supply lithium metal wire to the vapor deposition chamber through the vacuum feeding chamber.
[0019] Beneficial effects: By setting up a feeding structure including a vacuum feeding chamber and a vacuum glove box, wherein the vacuum feeding chamber is located in the lower cavity and the vacuum glove box is located in the vacuum feeding chamber, the supply of lithium metal wire can be carried out in a vacuum environment; in addition, the vacuum glove box is connected to the vapor deposition chamber, thereby enabling the vacuum glove box to supply lithium metal wire to the vapor deposition chamber.
[0020] In one optional embodiment, the lithium plating mechanism further includes a heating structure disposed in the lower cavity and communicating with the vapor deposition chamber to heat and dry the vapor deposition chamber.
[0021] Beneficial effects: By including a heating structure in the lithium plating mechanism, which is a heating and drying device in this embodiment, the heating structure is specifically located in the lower cavity and is connected to the vapor deposition chamber. Thus, before the coating process begins, the heating and drying device can preheat and dry the vapor deposition chamber to prevent the lithium metal from reacting with the moisture in the vapor deposition chamber. After the coating process is completed, the heating and drying device can continue to heat the vapor deposition chamber, causing the lithium metal adhering to the inner wall of the vapor deposition chamber to melt and flow back into the collection pool, facilitating the disposal of the lithium metal.
[0022] In one optional embodiment, the vacuum cavity includes a partition disposed within the vacuum cavity to divide the vacuum cavity into an upper cavity and a lower cavity; the partition has a connecting portion connecting the upper cavity and the lower cavity; the vacuum cavity further includes a baffle member rotatably disposed on the partition relative to the connecting portion to control the opening or closing of the connecting portion.
[0023] Beneficial effects: By setting the vacuum cavity to include a separator and a baffle, which in this embodiment are a separator plate and a baffle plate, the separator is set in the vacuum cavity, thereby dividing the vacuum cavity into an upper cavity and a lower cavity; at the same time, the separator has a connecting part that connects the upper cavity and the lower cavity, which in this embodiment is a connecting hole, so that the coating part can be set between the upper cavity and the lower cavity through the connecting part. The baffle is rotatably set on the separator, so that the baffle can open or close the connecting part by rotating relative to the separator.
[0024] In one optional embodiment, the vapor deposition structure further includes an evaporation source disposed in the vapor deposition chamber, and the nitrogen ion generator is disposed between the evaporation source and the connecting portion.
[0025] Beneficial effects: The vapor deposition structure also includes an evaporation source, which is specifically located in the vapor deposition generation chamber. The lithium metal wire in the vapor deposition generation chamber can be evaporated by the evaporation source. In addition, a nitrogen ion generator is located between the evaporation source and the connecting part, so that when lithium ions flow from the vapor deposition generation chamber to the connecting part, lithium ions can be mixed with nitrogen ions, thereby reducing the activity of lithium ions. Attached Figure Description
[0026] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.
[0027] Figure 1 This is a first planar schematic diagram of a lithium plating apparatus according to an embodiment of the present invention; Figure 2 This is a second planar schematic diagram of a lithium plating apparatus according to an embodiment of the present invention.
[0028] Explanation of reference numerals in the attached figures: 1-Vacuum chamber; 11-Upper chamber; 12-Lower chamber; 13-Separator; 14-Baffle; 211-Unwinding component; 212-Coating component; 213-Rewinding component; 214-Guide component; 221-Heating component; 222-Ion source; 223-Magnetron sputtering assembly; 31-Feeding structure; 311-Vacuum feeding chamber; 312-Vacuum glove box; 32-Evaporation structure; 321-Evaporation generation chamber; 322-Nitrogen ion generator; 323-Evaporation source; 33-Heating structure. Detailed Implementation
[0029] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0030] The following is combined Figure 1 and Figure 2 The following describes embodiments of the present invention.
[0031] According to embodiments of the present invention, in one aspect, a lithium plating apparatus is provided, such as... Figure 1 and Figure 2As shown, the system includes a vacuum chamber 1, a conveying mechanism, and a lithium plating mechanism. The vacuum chamber 1 includes an upper chamber 11 and a lower chamber 12 that are isolated from each other. The conveying mechanism is located in the upper chamber 11 and is used to convey the substrate. The lithium plating mechanism includes a feeding structure 31 and a vapor deposition structure 32. The vapor deposition structure 32 and the feeding structure 31 are spaced apart in the lower chamber 12 and are connected to each other to provide lithium metal wire to the vapor deposition structure 32. The vapor deposition structure 32 is used to evaporate the lithium metal wire into lithium ions. Part of the conveying mechanism is located between the upper chamber 11 and the lower chamber 12. The vapor deposition structure 32 includes a vapor deposition generating chamber 321 and a nitrogen ion generator 322. The vapor deposition generating chamber 321 is located in the lower chamber 12 and is connected to the feeding structure 31. The nitrogen ion generator 322 is located in the vapor deposition generating chamber 321.
[0032] The lithium plating apparatus described above comprises a conveying mechanism and a lithium plating mechanism disposed within a vacuum chamber 1. The vacuum chamber 1 includes an upper chamber 11 and a lower chamber 12 disposed separately. The conveying mechanism includes a conveying structure and an auxiliary structure. The conveying structure is disposed within the upper chamber 11 and is capable of conveying a substrate. The auxiliary structure is disposed on one side of the conveying structure, thereby enabling the auxiliary structure to process the surface of the substrate conveyed by the conveying structure, thereby improving the surface roughness of the substrate. This allows lithium ions to adhere more easily to the surface of the substrate, thus increasing the adhesion rate of lithium ions on the substrate surface.
[0033] In addition, the lithium plating mechanism includes a feeding structure 31 and a vapor deposition structure 32. The vapor deposition structure 32 and the feeding structure 31 are spaced apart in the lower cavity 12 and are connected to each other. This allows the feeding structure 31 to provide lithium metal wires to the vapor deposition structure 32, and the vapor deposition structure 32 to vapor deposit the lithium metal wires provided by the feeding structure 31, thereby enabling the vapor deposition structure 32 to provide a large number of lithium ions. At the same time, a part of the conveying structure is arranged between the upper cavity 11 and the lower cavity 12, so that the substrate conveyed by the conveying structure can pass through the lower cavity 12, thereby enabling the lithium ions provided by the vapor deposition structure 32 to adhere to the surface of the substrate, so as to realize the vapor deposition operation of lithium ions.
[0034] Specifically, the vapor deposition structure 32 includes a vapor deposition generating chamber 321 and a nitrogen ion generator 322. The vapor deposition generating chamber 321 is located inside the lower cavity 12 and is connected to the feeding structure 31, so that the lithium metal wire provided by the feeding structure 31 can enter the vapor deposition generating chamber 321 and be evaporated into lithium ions, thereby enabling the vapor deposition generating chamber 321 to provide a large number of lithium ions. The nitrogen ion generator 322 is located inside the vapor deposition generating chamber 321, so that the nitrogen ion generator 322 can provide a large number of nitrogen ions in the vapor deposition generating chamber 321. In this way, some lithium ions can form lithium nitride with nitrogen ions, thereby suppressing the activity of lithium ions and avoiding problems such as lithium dendrite growth and solid electrolyte penetration, which is conducive to improving the success rate of vapor deposition.
[0035] In summary, by using the conveying mechanism and lithium plating mechanism located within the vacuum chamber 1, the surface of the substrate can be treated through auxiliary structures to improve the surface roughness of the substrate, thereby increasing the adhesion rate of lithium ions on the substrate surface. Simultaneously, by using the nitrogen ion generator 322 located within the vapor deposition chamber 321, some lithium ions within the vapor deposition chamber 321 can form lithium nitride with nitrogen ions, thereby suppressing the activity of lithium ions and avoiding problems such as lithium dendrite growth and solid electrolyte penetration, which is beneficial to improving the success rate of vapor deposition.
[0036] In one embodiment, such as Figure 1 and Figure 2 As shown, the conveying mechanism includes a conveying structure disposed within the upper cavity 11. The conveying structure includes an unwinding component 211, a coating component 212, and a winding component 213. The unwinding component 211 and the winding component 213 are disposed at intervals within the upper cavity 11. The coating component 212 is disposed between the unwinding component 211 and the winding component 213. Part of the coating component 212 is disposed between the upper cavity 11 and the vapor deposition chamber 321 to attach lithium ions to the substrate.
[0037] The lithium plating apparatus described above includes a conveying structure comprising an unwinding component 211, a coating component 212, and a winding component 213. In this embodiment, the unwinding component 211, the coating component 212, and the winding component 213 are respectively an unwinding roller, a coating roller, and a winding roller. The unwinding component 211 and the winding component 213 are spaced apart within the upper cavity 11, while the coating component 212 is disposed between the unwinding component 211 and the winding component 213. This allows the substrate to be conveyed via the unwinding component 211, the coating component 212, and the winding component 213. Furthermore, a portion of the coating component 212 is disposed between the upper cavity 11 and the vapor deposition chamber 321, allowing the substrate conveyed to the coating component 212 to pass through the vapor deposition chamber 321. Consequently, lithium ions within the vapor deposition chamber 321 can adhere to the surface of the substrate, thus achieving the lithium ion depositing process.
[0038] In one embodiment, such as Figure 1 and Figure 2 As shown, the conveying structure also includes several guide members 214. Some guide members 214 are spaced apart between the unwinding member 211 and the coating member 212, and other guide members 214 are spaced apart between the coating member 212 and the winding member 213 to guide the conveying of the substrate.
[0039] The lithium plating apparatus described above further includes several guide members 214 in its conveying structure. In this embodiment, the guide members 214 are guide rollers. Some of the guide members 214 are spaced apart between the unwinding member 211 and the coating member 212 to guide the substrate conveying between the unwinding member 211 and the coating member 212. Other guide members 214 are spaced apart between the coating member 212 and the winding member 213 to guide the substrate between the coating member 212 and the winding member 213. At the same time, the guide members ensure that the substrate remains taut during the conveying process, thereby improving the coating success rate.
[0040] In one embodiment, such as Figure 1 and Figure 2 As shown, the conveying mechanism also includes an auxiliary structure, which includes a heating element 221 and an ion source 222. The heating element 221 and the ion source 222 are both disposed on one side of the conveying structure. The heating element 221 is used to heat the surface of the substrate, and the ion source 222 is used to bombard the surface of the substrate.
[0041] The lithium plating apparatus described above includes an auxiliary structure comprising a heating element 221 and an ion source 222. In this embodiment, the heating element 221 is a heater. Both the heater and the ion source 222 are located on one side of the conveying structure, with the heating element 221 positioned close to the unwinding member 211 and the ion source 222 positioned close to the coating member 212. Thus, when the conveying structure transports the substrate, the heating element 221 can first heat the surface of the substrate to remove water vapor and impurities from the substrate surface, while the ion source 222 can bombard the substrate surface to improve the surface roughness of the substrate.
[0042] In one embodiment, such as Figure 1 and Figure 2 As shown, the auxiliary structure also includes a magnetron sputtering assembly 223, which is disposed on the side of the coating part 212 near the winding part 213. The magnetron sputtering assembly 223 is used to deposit a protective film on the substrate.
[0043] The lithium plating apparatus described above also includes a magnetron sputtering assembly 223 by setting an auxiliary structure. The magnetron sputtering assembly 223 is specifically disposed on one side of the coating part 212. After lithium ions are attached to the surface of the substrate transported to the coating part 212, the magnetron sputtering assembly 223 can magnetron sputter an alloy passivation film on the lithium ion layer attached to the surface of the substrate to protect the lithium ion layer and prevent the lithium ion layer from being damaged by the outside world. At the same time, the alloy passivation film can also prevent the lithium ion layer from contacting the outside world and oxidizing.
[0044] In one embodiment, such as Figure 1 and Figure 2 As shown, there are two coating parts 212. One coating part 212 is located between the upper cavity 11 and the vapor deposition chamber 321, and the other coating part 212 is located near the winding part 213. The magnetron sputtering assembly 223 is located on one side of the coating part 212.
[0045] The lithium plating apparatus described above uses two plating elements 212. One of the plating elements 212 is positioned between the upper cavity 11 and the vapor deposition chamber 321, allowing lithium ions to adhere to the surface of the substrate transported to the plating element 212. The other plating element 212 is positioned close to the winding member 213, and the magnetron sputtering assembly 223 is positioned on one side of the plating element 212. This allows an alloy passivation film to be magnetron sputtered onto the lithium ion layer of the substrate transported to the plating element 212, thus avoiding the magnetron sputtering affecting the adhesion of lithium ions.
[0046] In one embodiment, such as Figure 1 and Figure 2 As shown, the feeding structure 31 includes a vacuum feeding chamber 311 and a vacuum glove box 312 connected together. The vacuum feeding chamber 311 is located in the lower cavity 12, and the vacuum glove box 312 is located in the vacuum feeding chamber 311. The vacuum glove box 312 stores lithium metal wires so as to supply lithium metal wires to the vapor deposition chamber 321 through the vacuum feeding chamber 311.
[0047] The lithium plating apparatus described above includes a feeding structure 31 comprising a vacuum feeding chamber 311 and a vacuum glove box 312. The vacuum feeding chamber 311 is located within the lower cavity 12, while the vacuum glove box 312 is located within the vacuum feeding chamber 311, ensuring that the supply of lithium metal wire can be carried out in a vacuum environment. Furthermore, the vacuum glove box 312 is connected to the vapor deposition chamber 321, thereby enabling the vacuum glove box 312 to supply lithium metal wire to the vapor deposition chamber 321.
[0048] In one embodiment, such as Figure 1 and Figure 2As shown, the lithium plating mechanism also includes a heating structure 33, which is disposed in the lower cavity 12 and is connected to the vapor deposition chamber 321 to heat and dry the vapor deposition chamber 321.
[0049] The lithium plating apparatus described above also includes a heating structure 33, which in this embodiment is a heating and drying device. The heating structure 33 is specifically located in the lower cavity 12 and is connected to the vapor deposition chamber 321. Thus, before the coating process begins, the heating and drying device can preheat and dry the vapor deposition chamber 321 to prevent the lithium metal from reacting with the moisture in the vapor deposition chamber 321. After the coating process is completed, the heating and drying device can continue to heat the vapor deposition chamber 321, causing the lithium metal adhering to the inner wall of the vapor deposition chamber 321 to melt and flow back into the collection pool, facilitating the disposal of the lithium metal.
[0050] In one embodiment, such as Figure 1 and Figure 2 As shown, the vacuum chamber 1 includes a partition 13, which is disposed inside the vacuum chamber 1 to divide the vacuum chamber 1 into an upper chamber 11 and a lower chamber 12. The partition 13 has a connecting portion that connects the upper chamber 11 and the lower chamber 12. The vacuum chamber 1 also includes a baffle 14, which is rotatably disposed on the partition 13 relative to the connecting portion to control the opening or closing of the connecting portion.
[0051] The lithium plating apparatus described above includes a vacuum chamber 1 comprising a separator 13 and a baffle 14. In this embodiment, the separator 13 and the baffle 14 are a separator plate and a baffle plate, respectively. The separator 13 is disposed within the vacuum chamber 1, thereby dividing the vacuum chamber 1 into an upper chamber 11 and a lower chamber 12. Simultaneously, the separator 13 has a connecting portion that connects the upper chamber 11 and the lower chamber 12. In this embodiment, the connecting portion is a connecting hole, allowing the plating component 212 to be disposed between the upper chamber 11 and the lower chamber 12 through the connecting portion. The baffle 14 is rotatably disposed on the separator 13, allowing the baffle 14 to open or close the connecting portion by rotating relative to the separator 13.
[0052] In one embodiment, such as Figure 1 and Figure 2 As shown, the vapor deposition structure 32 also includes an evaporation source 323, which is disposed in the vapor deposition generation chamber 321, and a nitrogen ion generator 322 is disposed between the evaporation source 323 and the connecting part.
[0053] The lithium plating apparatus described above also includes an evaporation source 323 by setting the evaporation structure 32. The evaporation source 323 is specifically set inside the evaporation generation chamber 321, so that the lithium metal wire inside the evaporation generation chamber 321 can be evaporated by the evaporation source 323. In addition, a nitrogen ion generator 322 is set between the evaporation source 323 and the connecting part, so that when lithium ions flow from the evaporation generation chamber 321 to the connecting part, the lithium ions can be mixed with nitrogen ions, thereby reducing the activity of lithium ions by nitrogen ions.
[0054] Although embodiments of the invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the invention, and such modifications and variations all fall within the scope defined by the appended claims.
Claims
1. A lithium plating apparatus, characterized in that, include: The vacuum chamber (1) includes an upper chamber (11) and a lower chamber (12) that are isolated from each other. A conveying mechanism is disposed within the upper cavity (11) and is used to convey the substrate; The lithium plating mechanism includes a feeding structure (31) and a vapor deposition structure (32). The vapor deposition structure (32) and the feeding structure (31) are spaced apart in the lower cavity (12). The feeding structure (31) and the vapor deposition structure (32) are connected to each other to provide lithium metal wire to the vapor deposition structure (32). The vapor deposition structure (32) is used to evaporate the lithium metal wire into lithium ions. Among them, part of the conveying mechanism is disposed between the upper cavity (11) and the lower cavity (12); the vapor deposition structure (32) includes a vapor deposition generating chamber (321) and a nitrogen ion generator (322), the vapor deposition generating chamber (321) is disposed in the lower cavity (12) and communicates with the feeding structure (31), and the nitrogen ion generator (322) is disposed in the vapor deposition generating chamber (321).
2. The lithium plating apparatus according to claim 1, characterized in that, The conveying mechanism includes a conveying structure disposed within the upper cavity (11). The conveying structure includes an unwinding component (211), a coating component (212), and a winding component (213). The unwinding component (211) and the winding component (213) are disposed at intervals within the upper cavity (11). The coating component (212) is disposed between the unwinding component (211) and the winding component (213). A portion of the coating component (212) is disposed between the upper cavity (11) and the vapor deposition chamber (321) to attach lithium ions to the substrate.
3. The lithium plating apparatus according to claim 2, characterized in that, The conveying structure also includes a number of guide members (214). Some of the guide members (214) are spaced apart between the unwinding member (211) and the coating member (212), while other guide members (214) are spaced apart between the coating member (212) and the winding member (213) to guide the conveying of the substrate.
4. The lithium plating apparatus according to claim 3, characterized in that, The conveying mechanism also includes an auxiliary structure, which includes a magnetron sputtering assembly (223). The magnetron sputtering assembly (223) is disposed on the side of the coated part (212) near the winding part (213). The magnetron sputtering assembly (223) is used to deposit a protective film on the substrate.
5. The lithium plating apparatus according to claim 4, characterized in that, Two coating parts (212) are provided. One coating part (212) is located between the upper cavity (11) and the vapor deposition chamber (321), and the other coating part (212) is located near the winding part (213). The magnetron sputtering assembly (223) is located on one side of the coating part (212).
6. The lithium plating apparatus according to claim 5, characterized in that, The auxiliary structure also includes a heating element (221) and an ion source (222). The heating element (221) and the ion source (222) are both disposed on one side of the conveying structure. The heating element (221) is used to heat the surface of the substrate, and the ion source (222) is used to bombard the surface of the substrate.
7. The lithium plating apparatus according to any one of claims 1-6, characterized in that, The feeding structure (31) includes a vacuum feeding chamber (311) and a vacuum glove box (312) connected in series. The vacuum feeding chamber (311) is located in the lower cavity (12), and the vacuum glove box (312) is located in the vacuum feeding chamber (311). The vacuum glove box (312) stores lithium metal wires so as to supply lithium metal wires to the vapor deposition generating chamber (321) through the vacuum feeding chamber (311).
8. The lithium plating apparatus according to claim 7, characterized in that, The lithium plating mechanism also includes a heating structure (33), which is disposed in the lower cavity (12) and is connected to the vapor deposition chamber (321) to heat and dry the vapor deposition chamber (321).
9. The lithium plating apparatus according to claim 8, characterized in that, The vacuum cavity (1) includes a partition (13), which is disposed inside the vacuum cavity (1) to divide the vacuum cavity (1) into an upper cavity (11) and a lower cavity (12). The partition (13) has a connecting portion that connects the upper cavity (11) and the lower cavity (12). The vacuum cavity (1) also includes a baffle (14), which is rotatably disposed on the partition (13) relative to the connecting portion to control the opening or closing of the connecting portion.
10. The lithium plating apparatus according to claim 9, characterized in that, The vapor deposition structure (32) further includes an evaporation source (323), which is disposed in the vapor deposition generation chamber (321), and the nitrogen ion generator (322) is disposed between the evaporation source (323) and the connecting part.