Matching method and device for scanning speed of laser direct writing equipment and computer equipment

Abstract

The invention relates to a scanning speed matching method and device of laser direct writing equipment, computer equipment and a storage medium. The method comprises the following steps: acquiring a mass production line width requirement, and matching a mass production line width difference value according to the mass production line width requirement; the micro-mirror size of a digital micro-mirror in the laser direct writing equipment, the included angle between the digital micro-mirror and a workpiece table and the multiplying power of an imaging lens are obtained; matching the grid precision and the grid precision multiple according to the mass production line width requirement, the mass production line width difference value, the micro-mirror size of a digital micro-mirror in the laser direct writing equipment, the included angle between the digital micro-mirror and a workpiece table and the multiplying power of an imaging lens; acquiring the actual use line number of one frame of image of the digital micromirror in the laser direct writing equipment; and matching the scanning speed according to the grid precision, the grid precision multiple and the actually used line number. By means of the method, the downtime caused by improper parameter adjustment can be shortened, meanwhile, the product quality stability is enhanced, and the consistency and reliability of machined parts are ensured.

Description

Technical Field

[0001] This application relates to the field of exposure technology, and in particular to a method, apparatus, computer device, storage medium, and computer program product for matching the scanning speed of a laser direct writing device. Background Technology

[0002] With the rapid development of laser direct writing technology, its application in exposure fields such as semiconductor manufacturing, microelectronic device processing, and precision optical component fabrication is becoming increasingly widespread. The current market is placing more diverse and sophisticated demands on laser direct writing equipment, requiring it not only to meet mass production needs for different linewidth specifications but also to meet higher standards for production efficiency and capacity.

[0003] In traditional process development workflows, technicians typically use empirical methods to determine equipment parameters. Specifically, they first determine an initial lens magnification setting based on theoretical calculations and empirical data, and then verify and optimize the actual lens magnification and corresponding scanning speed parameters through multiple rounds of process testing. This process requires iterative adjustments and testing to ultimately determine the combination of process parameters that meets specific linewidth requirements and production capacity targets.

[0004] However, this traditional method of parameter determination has significant limitations. First, due to its reliance on extensive experimental verification, the entire parameter determination cycle is lengthy, ranging from several days to several weeks, severely impacting the iteration speed of product development. Second, multiple process tests not only consume substantial human and material resources but may also cause unnecessary wear and tear on equipment. Furthermore, traditional methods struggle to adapt to the growing demand for personalized customization, lacking the ability to quickly switch between and adapt to different product specifications. In addition, the subjectivity of human experience may lead to inaccurate parameter selection, affecting the yield and consistency of the final product.

[0005] Therefore, there is an urgent need for a more efficient, accurate, and adaptable method for determining the parameters of laser direct writing equipment to shorten the equipment matching cycle, improve process development efficiency, and meet diverse production needs. This method can quickly determine the optimal combination of lens magnification and scanning speed through an intelligent parameter optimization algorithm, thereby significantly improving the production efficiency and product quality stability of laser direct writing equipment. Summary of the Invention

[0006] Therefore, it is necessary to provide a method, apparatus, computer equipment, computer-readable storage medium, and computer program product that can accelerate the optimization of parameters of laser direct writing equipment in response to the above-mentioned technical problems.

[0007] Firstly, this application provides a method for matching the scanning speed of a laser direct-writing device. The method includes:

[0008] Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements;

[0009] Obtain the micromirror dimensions, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens in the laser direct writing device;

[0010] Based on the mass production linewidth requirements, mass production linewidth differences, the micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens, the grid accuracy and grid accuracy multiple are matched.

[0011] Obtain the actual number of rows used in a single frame of digital micromirror image in a laser direct writing device;

[0012] The scanning speed is matched based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0013] In one embodiment, the matching grid accuracy and grid accuracy multiplier are based on mass production linewidth requirements, mass production linewidth difference values, micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens, including:

[0014] The grid accuracy is matched based on the micromirror size, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens.

[0015] The grid accuracy multiple is matched based on the mass production linewidth requirements, grid precision, digital micromirror resolution, and mass production linewidth differences.

[0016] In one embodiment, the angle between the digital micromirror and the workpiece stage is (0, 1 / 16] radians.

[0017] In one embodiment, matching the mass production linewidth difference value according to the mass production linewidth requirement includes:

[0018] Obtain the laser type and the energy density required for the photoresist on the substrate to be exposed;

[0019] The mass production linewidth difference value is matched according to the laser type, the energy density required for the photoresist on the substrate to be exposed, and the mass production line requirements.

[0020] In one embodiment, the laser type includes a constant current laser or a pulsed laser.

[0021] In one embodiment, the scanning speed is inversely proportional to the angle between the digital micromirror and the workpiece stage.

[0022] In one embodiment, after matching the scan speed, the process further includes:

[0023] The matched scanning speed is sent to the workpiece stage execution unit of the laser direct writing device;

[0024] The workpiece stage execution unit controls the workpiece stage to move and execute according to the scanning speed.

[0025] Secondly, this application also provides a matching device for the scanning speed of a laser direct-writing device. The device includes:

[0026] The information acquisition module is used to acquire mass production line width requirements, micromirror size of digital micromirrors, angle between digital micromirrors and workpiece stage, magnification of imaging lens, and actual number of rows used in one frame of digital micromirror image.

[0027] The information processing module is used to calculate and obtain the mass production linewidth difference value, mesh accuracy, and mesh accuracy multiple;

[0028] The scan speed matching module is used to match the scan speed based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0029] Thirdly, this application also provides a computer device. The computer device includes a memory and a processor, the memory storing a computer program, and the processor executing the computer program to perform the following steps:

[0030] Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements;

[0031] Obtain the micromirror dimensions, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens in the laser direct writing device;

[0032] Based on the mass production linewidth requirements, mass production linewidth differences, the micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens, the grid accuracy and grid accuracy multiple are matched.

[0033] Obtain the actual number of rows used in a single frame of digital micromirror image in a laser direct writing device;

[0034] The scanning speed is matched based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0035] Fourthly, this application also provides a computer-readable storage medium. The computer-readable storage medium stores a computer program thereon, which, when executed by a processor, performs the following steps:

[0036] Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements;

[0037] Obtain the model of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens;

[0038] Based on the mass production linewidth requirements, mass production linewidth differences, the micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens, the grid accuracy and grid accuracy multiple are matched.

[0039] The actual number of rows used when acquiring a frame of image from a digital micromirror in a laser direct writing device;

[0040] The scanning speed is matched based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0041] Fifthly, this application also provides a computer program product. The computer program product includes a computer program that, when executed by a processor, performs the following steps:

[0042] Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements;

[0043] Obtain the model of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens;

[0044] Based on the mass production linewidth requirements, mass production linewidth differences, the micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens, the grid accuracy and grid accuracy multiple are matched.

[0045] Obtain the actual number of rows used in a single frame of digital micromirror image in a laser direct writing device;

[0046] The scanning speed is matched based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0047] The aforementioned laser direct-writing equipment's scanning speed matching method, apparatus, computer equipment, storage medium, and computer program products comprehensively consider mass production linewidth requirements, the micromirror size of the digital micromirror, the angular relationship between the digital micromirror and the workpiece stage, and the magnification parameters of the imaging lens. Through a series of calculation steps, the grid accuracy and its corresponding grid accuracy multiple are obtained. Grid accuracy reflects the equipment's ability to capture minute details during processing, while the grid accuracy multiple further quantifies the proportional relationship between this accuracy and the standard reference value, providing a basis for subsequent parameter matching. Based on the calculated grid accuracy and grid accuracy multiple, this method further matches the corresponding scanning speed. The selection of scanning speed must balance processing efficiency and accuracy requirements; excessively high speeds may lead to a decrease in processing quality, while excessively low speeds will affect production efficiency. Through intelligent parameter optimization algorithms, the system can quickly analyze multiple possible combinations of lens magnification and scanning speed, evaluate the potential impact of each combination on production efficiency and quality stability, and thus select the optimal configuration. This algorithm, through iterative calculation and comparison, ensures that the selected combination maximizes equipment output efficiency while meeting mass production linewidth requirements and reduces quality fluctuations caused by improper parameters. Through this method, device, and supporting technology, laser direct writing equipment can significantly improve production efficiency, reduce downtime caused by improper parameter adjustment, enhance product quality stability, and ensure the consistency and reliability of processed parts. Attached Figure Description

[0048] Figure 1 This is a flowchart illustrating a method for matching the scanning speed of a laser direct-writing device in one embodiment;

[0049] Figure 2 This is a flowchart illustrating the steps of obtaining mass production linewidth requirements and matching mass production linewidth difference values ​​based on those requirements in one embodiment.

[0050] Figure 3 This is a flowchart illustrating the steps of matching mesh precision and mesh precision multiple in one embodiment;

[0051] Figure 4 This is a flowchart illustrating the method for matching the scanning speed of a laser direct writing device in another embodiment;

[0052] Figure 5 This is a structural block diagram of a scanning speed matching device for a laser direct writing device in one embodiment;

[0053] Figure 6 This is an internal structural diagram of a computer device in one embodiment. Detailed Implementation

[0054] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0055] In one embodiment, such as Figure 1 As shown, a method for matching the scanning speed of a laser direct-writing device is provided. This embodiment illustrates the application of this method to a terminal. It is understood that this method can also be applied to a server, and to a system including both a terminal and a server, and implemented through interaction between the terminal and the server. In this embodiment, the method includes the following steps:

[0056] S01: Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements.

[0057] S02: Obtain the micromirror size, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens in the laser direct writing device.

[0058] S03: Match the grid accuracy and grid accuracy multiple based on the mass production linewidth requirements, mass production linewidth difference value, micromirror size of digital micromirrors in laser direct equipment, the angle between digital micromirrors and workpiece stage, and the magnification of imaging lenses.

[0059] S04: Obtain the actual number of rows used in a single frame of digital micromirror image from the laser direct writing device.

[0060] S05: Match the scanning speed according to the grid precision, grid precision multiplier, and the actual number of rows used.

[0061] In step S01, the mass production linewidth requirement refers to the mass production linewidth requirement of the substrate to be exposed, such as common values ​​like 60μm, 55μm, 50μm, 45μm, 40μm, 30μm, 20μm, 12μm, 10μm, 8μm, 4μm, 1μm, 0.8μm, and 0.6μm. The mass production linewidth difference value refers to the percentage difference in mass production linewidth under the mass production linewidth requirement; for example, if the mass production linewidth difference value for 60μm is 10%, then the mass production linewidth difference is 54μm~66μm. Similarly, if the mass production linewidth difference value for 45μm is 5%, then the mass production linewidth difference is 42.75μm~47.25μm.

[0062] In step S02, the size of the digital micromirror (DMD) in the laser direct writing equipment is generally determined by the model of the DMD. Commonly used DMDs are those from TI, including but not limited to models such as DLP6500, DLP7000, DLP9500, and DLP9000X. The main differences between these different DMD models are their resolution and micromirror size. For example, the DLP7000 has a resolution of 1024×768 and a micromirror size of 13.68μm×13.68μm; the DLP9500 has a resolution of 1920×1080 and a micromirror size of 10.8μm×10.8μm. The angle between the digital micromirror and the workpiece stage refers to the angle formed by the short side of the digital micromirror device on the horizontal plane and the direction of movement of the substrate to be exposed on the workpiece stage. The imaging lens magnification refers to the magnification of the imaging lens assembly that passes through when the DMD is emitted onto the substrate to be exposed. The function of the imaging lens assembly is to magnify or reduce the image on the DMD before illuminating it onto the substrate. Examples of imaging lens magnification include 1.5x, 0.5x, 2x, 4x, and 0.1x. In step S04, obtaining the actual number of rows used for one frame of image from the digital micromirror in the laser direct-writing device refers to obtaining the number of rows occupied by each frame of image in the DMD according to the design image. Examples of a frame of image include 500 rows, 300 rows, and 750 rows.

[0063] In step S05, the scanning speed is matched based on the grid precision, grid precision multiplier, and the actual number of rows used. The scanning speed is calculated using the following formula: Scanning speed = Grid precision × Grid precision multiplier / (DMD reset pulse signal and settling time + Number of blocks occupied by the actual number of rows used × Data loading time of each DMD block). The DMD reset pulse signal and settling time are generally determined by the DMD model, as are the number of rows per block and the data loading time per block. For example, the reset pulse signal and settling time of the DMD model DLP9500 is 13μs, the number of rows per block is 72, and the data loading time per block is 2.88μs.

[0064] The scanning speed matching method for the aforementioned laser direct writing equipment calculates the grid accuracy and grid accuracy multiplier based on mass production linewidth requirements, the micromirror size of the digital micromirror, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens. Subsequently, this data is integrated to match a suitable scanning speed that meets both processing efficiency and accuracy requirements, thus adapting to product production needs. This algorithm, through iterative calculation and comparison, ensures that the selected combination maximizes equipment output efficiency while meeting mass production linewidth requirements and reduces quality fluctuations caused by improper parameters. By applying this method, laser direct writing equipment can effectively improve production efficiency, reduce downtime caused by parameter adjustment issues, enhance product quality stability, and ensure the consistency and reliability of processed parts.

[0065] In a specific embodiment, such as Figure 2 As shown, step S01, matching the mass production linewidth difference value according to the mass production linewidth requirements, includes:

[0066] S011. Obtain the laser type and the energy density required for the photoresist on the substrate to be exposed;

[0067] S012. Match the mass production linewidth difference value according to the laser type, the required energy density of the photoresist on the substrate to be exposed, and the mass production line requirements.

[0068] Specifically, when the laser type is constant current and the required energy density of the photoresist on the substrate to be exposed is high, the required linewidth for mass production is coarser, resulting in a larger difference in mass production linewidth. Conversely, when the laser type is pulsed and the required energy density of the photoresist on the substrate to be exposed is low, the required linewidth for mass production is finer, resulting in a smaller difference in mass production linewidth. For example, in one embodiment, the laser type is constant current, the required photoresist energy density for the substrate to be exposed is 100 mJ (high energy density), and the required mass production linewidth is 60 μm, so the mass production linewidth difference can be set relatively high, at 10%. In another embodiment, the laser type is pulsed laser, the required photoresist energy density for the substrate to be exposed is 20 mJ (low energy density), and the required mass production linewidth is 10 μm, so the mass production linewidth difference can be set relatively low, at 5%.

[0069] The selection method described above determines the mass production linewidth difference value based on the laser type, the required photoresist energy density of the substrate to be exposed, and the mass production linewidth requirements. By inputting different requirements, corresponding mass production linewidth difference values ​​are obtained, thereby achieving customized matching and improving the accuracy of scanning speed matching.

[0070] like Figure 3 As shown, in a specific embodiment, step S03 matches the grid accuracy and grid accuracy multiplier based on the mass production linewidth, the mass production linewidth difference value, the micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens; including:

[0071] S031: The grid accuracy is matched based on the micromirror size, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens. Grid accuracy = micromirror size × magnification × sin(angle).

[0072] S032: Match the grid precision multiple according to the grid precision and the mass production linewidth difference value, wherein the grid precision multiple ≤ mass production linewidth requirement × (1 + mass production linewidth difference value) ÷ grid precision, and the grid precision multiple is a positive integer and less than the reciprocal of the grid precision.

[0073] This application first matches the grid precision, and then matches the grid precision multiple based on the grid precision, mass production linewidth requirements, and mass production linewidth differences. In this way, the optimal grid precision multiple is determined, providing a reference value for the scanning speed that needs to be matched subsequently, and further improving the matching accuracy of the scanning speed.

[0074] In one specific embodiment, the angle between the digital micromirror and the workpiece stage is (0, 1 / 16] radians, such as 1 / 16 radians. More preferably, in other embodiments, the angle between the digital micromirror and the workpiece stage is (0, 1 / 32] radians. In this application, the scanning speed is inversely proportional to the angle between the digital micromirror and the workpiece stage. Choosing a smaller angle can improve the scanning speed. Specifically, when the optical angle of the exposure system narrows, the grid accuracy value of the corresponding area shows an inverse convergence trend. This reduction in grid accuracy directly affects the matching of the grid accuracy multiple. Due to the reduction in the grid accuracy base, under the constraint that the grid accuracy multiple parameter must be a positive integer, the system can obtain a wider integer matching range. This mathematical characteristic brings a dual optimization effect: first, a larger range of selectable multiples significantly improves the flexibility of parameter configuration; second, the system can preferentially select higher-order accuracy multiple schemes. When a high multiple value is successfully matched, it directly leads to a further increase in scanning speed. The increase in scanning speed ultimately translates into an increase in exposure capacity, improving capacity while ensuring linewidth accuracy.

[0075] In one specific embodiment, after matching the scan speed, the following is also included:

[0076] The matching scanning speed is sent to the workpiece stage execution unit of the laser direct writing device;

[0077] The workpiece stage execution unit controls the workpiece stage to move and execute according to the scanning speed.

[0078] By sending the matched scanning speed to the execution unit for execution, fully automatic matching of scanning speed can be achieved, avoiding excessive human intervention. With only the mass production line width requirements known, the scanning speed can be obtained through the inherent data of the equipment, such as the digital micromirror model, imaging lens magnification, and angle. This greatly simplifies the operation, reduces the difficulty of operation, improves personnel efficiency, and thus increases the overall exposure capacity.

[0079] Based on the aforementioned scheme, the following embodiments will specifically demonstrate the application of the entire process.

[0080] like Figure 4 As shown, a method for matching the scanning speed of a laser direct writing device includes the following steps:

[0081] S201: Obtain the laser type, the required energy density of the photoresist on the substrate to be exposed, and the mass production linewidth requirements;

[0082] S202: Match the mass production linewidth difference value according to the laser type, the energy density required for the photoresist on the substrate to be exposed, and the mass production line requirements.

[0083] S203: Obtain the micromirror size, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens in the laser direct writing device.

[0084] S204: Match the grid accuracy according to the resolution and size of the digital micromirror, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens.

[0085] S205: Match the grid accuracy multiple according to the mass production line width requirements, grid accuracy, and mass production line width difference value;

[0086] S206: Obtain the actual number of rows used in a frame of digital micromirror image in the laser direct writing device;

[0087] S207: Match the scanning speed according to the grid precision, grid precision multiplier, and the actual number of rows used;

[0088] S208: Send the matched scanning speed to the workpiece stage execution unit of the laser direct writing device;

[0089] S209: The workpiece stage execution unit controls the workpiece stage to move and execute according to the scanning speed.

[0090] It should be understood that although the steps in the flowcharts of the embodiments described above are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some steps in the flowcharts of the embodiments described above may include multiple steps or multiple stages. These steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least some of the steps or stages of other steps.

[0091] Based on the same inventive concept, this application also provides a scanning speed matching device for a laser direct writing device, used to implement the scanning speed matching method of the laser direct writing device described above. The solution provided by this device is similar to the solution described in the above method. Therefore, the specific limitations of one or more embodiments of the scanning speed matching device for laser direct writing devices provided below can be found in the limitations of the scanning speed matching method for laser direct writing devices described above, and will not be repeated here.

[0092] In one embodiment, such as Figure 5 As shown, a scanning speed matching device for a laser direct-writing apparatus is provided. It includes an information acquisition module, an information processing module, and a scanning speed matching module. Specifically:

[0093] The information acquisition module is used to acquire mass production linewidth requirements, micromirror dimensions of the digital micromirror, the angle between the digital micromirror and the workpiece stage, the magnification of the imaging lens, and the actual number of rows used in a frame of digital micromirror image.

[0094] The information processing module is used to calculate and obtain the mass production linewidth difference value, mesh accuracy, and mesh accuracy multiple.

[0095] The scan speed matching module is used to match the scan speed based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0096] In one specific embodiment, the information acquisition module also includes the function of acquiring the laser type and the energy density required for the photoresist on the exposure substrate.

[0097] In other embodiments, the information processing module also includes the function of matching the mass production linewidth difference value according to the acquired laser type and the energy density and mass production linewidth requirements of the photoresist on the substrate to be exposed.

[0098] Each module in the aforementioned scanning speed matching device can be implemented entirely or partially through software, hardware, or a combination thereof. These modules can be embedded in or independent of the processor in a computer device, or stored in the memory of a computer device as software, so that the processor can call and execute the operations corresponding to each module.

[0099] In one embodiment, a computer device is provided, which may be a server, and its internal structure diagram may be as follows: Figure 6As shown, this computer device includes a processor, memory, input / output (I / O) interfaces, and a communication interface. The processor, memory, and I / O interfaces are connected via a system bus, and the communication interface is also connected to the system bus via the I / O interfaces. The processor provides computational and control capabilities. The memory includes non-volatile storage media and internal memory. The non-volatile storage media stores the operating system, computer programs, and a database. The internal memory provides the environment for the operating system and computer programs in the non-volatile storage media. The database stores data on mass production linewidth requirements, digital micromirror models (including resolution and size), the angle between the digital micromirror and the workpiece stage, the magnification of the imaging lens, and the actual number of rows used in a single frame of image from the digital micromirror. The I / O interfaces are used for information exchange between the processor and external devices. The communication interface is used for communication with external terminals via a network connection. When executed by the processor, the computer program implements a scanning speed matching method for a laser direct-writing device. The display unit of this computer device is used to form a visually visible image and can be a display screen, a projection device, or a virtual reality imaging device. The display screen can be an LCD screen or an e-ink screen. The input device of this computer device can be a touch layer covering the display screen, or buttons, a trackball, or a touchpad set on the casing of the computer device, or an external keyboard, touchpad, or mouse, etc.

[0100] Those skilled in the art will understand that Figure 6 The structure shown is merely a block diagram of a portion of the structure related to the present application and does not constitute a limitation on the computer device to which the present application is applied. Specific computer devices may include more or fewer components than those shown in the figure, or combine certain components, or have different component arrangements.

[0101] In one embodiment, a computer device is provided, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the computer program to perform the following steps:

[0102] Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements;

[0103] Obtain the micromirror dimensions, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens in the laser direct writing device;

[0104] Based on the mass production linewidth requirements, mass production linewidth differences, the micromirror size of the digital micromirror in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens, the grid accuracy and grid accuracy multiple are matched.

[0105] Obtain the actual number of rows used in a single frame of digital micromirror image in a laser direct writing device;

[0106] The scanning speed is matched based on the grid precision, the grid precision multiplier, and the actual number of rows used.

[0107] In one embodiment, when the processor executes the computer program, it also performs the following steps: obtaining the laser type and the required energy density of the photoresist on the substrate to be exposed; and matching the mass production linewidth difference value according to the laser type, the required energy density of the photoresist on the substrate to be exposed, and the mass production linewidth requirements.

[0108] In another embodiment, the processor, when executing the computer program, also performs the following steps:

[0109] The grid accuracy is matched based on the micromirror size, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens;

[0110] Match the mesh accuracy multiple based on the difference between mesh accuracy and mass production linewidth.

[0111] In one embodiment, a computer-readable storage medium is provided having a computer program stored thereon that, when executed by a processor, implements the steps in the above method embodiments.

[0112] In one embodiment, a computer program product is provided, including a computer program that, when executed by a processor, implements the steps in the above method embodiments.

[0113] It should be noted that the user information (including but not limited to user device information, user personal information, etc.) and data (including but not limited to data used for analysis, data stored, data displayed, etc.) involved in this application are all information and data authorized by the user or fully authorized by all parties, and the collection, use and processing of related data must comply with the relevant laws, regulations and standards of the relevant countries and regions.

[0114] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium. When executed, the computer program can include the processes of the embodiments described above. Any references to memory, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take many forms, such as Static Random Access Memory (SRAM) or Dynamic Random Access Memory (DRAM). The databases involved in the embodiments provided in this application may include at least one type of relational database and non-relational database. Non-relational databases may include, but are not limited to, blockchain-based distributed databases. The processors involved in the embodiments provided in this application may be general-purpose processors, central processing units, graphics processing units, digital signal processors, programmable logic devices, quantum computing-based data processing logic devices, etc., and are not limited to these.

[0115] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0116] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. A method for matching the scanning speed of a laser direct writing device, characterized in that, The method includes: Obtain the mass production line width requirements and match the mass production line width difference value according to the mass production line width requirements; Obtain the micromirror dimensions, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens in the laser direct writing device; Based on the mass production linewidth requirements, mass production linewidth differences, resolution and micromirror size of the digital micromirrors in the laser direct writing equipment, the angle between the digital micromirrors and the workpiece stage, and the magnification of the imaging lens, the grid accuracy and grid accuracy multiple are matched. Obtain the actual number of rows used in a single frame of digital micromirror image in a laser direct writing device; The scanning speed is matched based on the grid precision, the grid precision multiplier, and the actual number of rows used.

2. The method according to claim 1, characterized in that, The matching grid accuracy and grid accuracy multiplier based on mass production linewidth requirements, mass production linewidth differences, micromirror dimensions in the laser direct writing equipment, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens include: The grid accuracy is matched based on the micromirror size of the digital micromirror, the angle between the digital micromirror and the workpiece stage, and the magnification of the imaging lens; The grid precision multiple is matched according to the mass production linewidth requirements, the grid precision, and the mass production linewidth difference value.

3. The method according to claim 1, characterized in that, The angle between the digital micromirror and the workpiece stage is (0, 1 / 16] radians.

4. The method according to any one of claims 1-3, characterized in that, The process of matching mass production linewidth difference values ​​according to mass production linewidth requirements includes: Obtain the laser type and the energy density required for the photoresist on the substrate to be exposed; The mass production linewidth difference value is matched according to the laser type, the required energy density of the photoresist on the substrate to be exposed, and the mass production linewidth requirements.

5. The method according to claim 4, characterized in that, The laser type includes constant current lasers or pulsed lasers.

6. The method according to any one of claims 1-3, characterized in that, The scanning speed is inversely proportional to the angle between the digital micromirror and the workpiece stage.

7. The method according to any one of claims 1-3, characterized in that, The matching scan speed also includes; The matched scanning speed is sent to the workpiece stage execution unit of the laser direct writing device; The workpiece stage execution unit controls the workpiece stage to move and execute according to the scanning speed.

8. A matching device for the scanning speed of a laser direct writing device, characterized in that, The device includes: The information acquisition module is used to acquire mass production linewidth requirements, resolution and size of digital micromirrors in laser direct writing equipment, angle between digital micromirrors and workpiece stage, magnification of imaging lens, and actual number of rows used in one frame of digital micromirror image. The information processing module is used to calculate and obtain the mass production linewidth difference value, mesh accuracy, and mesh accuracy multiple; The scan speed matching module is used to match the scan speed based on the grid precision, the grid precision multiplier, and the actual number of rows used.

9. A computer device comprising a memory and a processor, wherein the memory stores a computer program, characterized in that, When the processor executes the computer program, it implements the steps of the method according to any one of claims 1 to 7.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by a processor, it implements the steps of the method according to any one of claims 1 to 7.

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