Metasurface, antenna and electronic equipment

Abstract

The invention provides a metasurface, an antenna and electronic equipment, belongs to the technical field of microwave and wireless communication, and can solve the problem that the design difficulty of an existing metasurface is large. The metasurface comprises a dielectric substrate and a plurality of metasurface units arranged on the dielectric substrate, the dielectric substrate comprises a plurality of first elastic structures and a plurality of second elastic structures, and the first elastic structures and the second elastic structures are alternately arranged in a first direction and / or a second direction; wherein one metasurface unit is located on one first elastic structure, and is only in contact with the first elastic structure; the elastic modulus of the first elastic structure is smaller than that of the second elastic structure.

Description

Metasurfaces, Antennas and Electronic Devices Technical Field

[0001] This disclosure belongs to the field of microwave and wireless communication technology, and specifically relates to a metasurface, antenna, and electronic device. Background Technology

[0002] The beamwidth of a base station antenna is a crucial parameter. In different application scenarios (such as densely populated urban areas or sparsely populated suburban areas), base station antennas typically require different horizontal beamwidths to optimize signal coverage. Using different types of antennas to achieve different coverage areas would increase the difficulty of deploying existing base stations and raise antenna procurement costs. Therefore, a low-cost metasurface structure capable of controlling beamwidth would greatly facilitate the deployment of base station antennas.

[0003] Metasurfaces are a newly proposed, highly efficient artificial electromagnetic surface. They can alter the equivalent impedance of each element on the surface to change the propagation amplitude and phase of electromagnetic waves within any defined region of space. Compared to phased array technology, metasurfaces offer a low-loss, low-cost, and easily fabricated beam control technology. However, current metasurface beam modulation techniques have many limitations. Current tunable metasurfaces are primarily based on electronic modulation, which increases the complexity and manufacturing cost of metasurface design, and necessitates the addition of an electronically adjustable control port at the antenna end. Furthermore, continuous power supply to the metasurface is required to maintain the corresponding phase adjustment, leading to increased energy consumption in the antenna system.

[0004] Summary of the Invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and to provide a metasurface, antenna and electronic device.

[0006] In a first aspect, the technical solution adopted to solve the technical problem of the present invention is a metasurface, which includes a dielectric substrate and a plurality of metasurface units disposed on the dielectric substrate. The dielectric substrate includes a plurality of first elastic structures and a plurality of second elastic structures, wherein the first elastic structures and the second elastic structures are alternately disposed in a first direction and / or a second direction; wherein...

[0007] One of the metasurface units is located on and in contact with the first elastic structure; the elastic modulus of the first elastic structure is less than that of the second elastic structure.

[0008] In some embodiments, the first elastic structure and the second elastic structure are made of the same material, and the thickness of the first elastic structure is greater than the thickness of the second elastic structure.

[0009] In some embodiments, the width of the plurality of the first elastic structures is the same in the first direction;

[0010] Along the first direction, the distance between any two adjacent metasurface units is the first distance, and the distance from the middle region of the dielectric substrate is smaller.

[0011] In some embodiments, the first elastic structure includes a first surface and a second surface disposed opposite to each other along its thickness direction, wherein the center of the metasurface unit in the orthographic projection of the first surface of the first elastic structure coincides with the center of the first surface.

[0012] In some embodiments, along the first direction, the widths of the plurality of second elastic structures are the same; the width of the metasurface unit increases the further away from the middle region of the dielectric substrate.

[0013] In some embodiments, the widths of the metasurface units are the same along the first direction; and along a direction away from the middle region of the dielectric substrate, the width of the first elastic structure increases along the first direction, and the width of the second elastic structure decreases along the first direction.

[0014] In some embodiments, for the first elastic structure and the metasurface unit located thereon, the ratio of the thickness of the first elastic structure to the thickness of the second elastic structure is greater than 3.

[0015] In some embodiments, for the first elastic structure and the metasurface unit located thereon, the metasurface unit covers the first elastic structure.

[0016] In some embodiments, the ratio of the width of the first elastic structure to the width of the metasurface unit ranges from 1 / 4 to 1.

[0017] In some embodiments, the first elastic structure has a first surface and a second surface disposed opposite to each other along its thickness, the metasurface unit being in contact with the second surface; the second elastic structure has a third surface and a fourth surface disposed opposite to each other along its thickness, the fourth surface being closer to the metasurface unit, wherein...

[0018] The first surface and the third surface are in the same plane; or,

[0019] The third surface is spaced apart from the plane containing the first surface.

[0020] In some embodiments, the first elastic structure and the second elastic structure have the same thickness, and the first elastic structure and the second elastic structure are made of different materials.

[0021] In some embodiments, the first elastic structure includes a first surface and a second surface disposed opposite to each other along its thickness direction, wherein the orthographic projection of the metasurface unit onto the first surface of the first elastic structure coincides with the first surface.

[0022] In some embodiments, any two adjacent metasurface units are spaced equally along the first direction, and the materials of the plurality of second elastic structures are different.

[0023] In some embodiments, any two adjacent metasurface units are spaced differently along the first direction, and the materials of the plurality of second elastic structures are the same.

[0024] In some embodiments, the spacing between two adjacent metasurface units along the first direction and / or the second direction ranges from 10 μm to 1 / 3λ.

[0025] In some embodiments, the orthographic projection of the plurality of metasurface units onto the dielectric substrate is a plurality of nested annular rings; or,

[0026] The orthographic projection of the multiple metasurface units onto the dielectric substrate is a plurality of rectangles arranged in an array.

[0027] In some embodiments, both the first elastic structure and the second elastic structure are made of elastic materials; or,

[0028] The first elastic structure is made of a rigid material, and the second elastic structure is made of an elastic material.

[0029] Secondly, embodiments of this disclosure also provide an antenna, wherein the antenna includes the metasurface described in any of the first aspects above.

[0030] In some embodiments, the antenna further includes an antenna element disposed on the metasurface near the dielectric substrate.

[0031] Thirdly, embodiments of this disclosure also provide an electronic device including an antenna as described in any one of the second aspects above. Attached Figure Description

[0032] Figures 1-5 are schematic diagrams of a metasurface provided in the embodiments of this disclosure;

[0033] Figure 6 is a schematic diagram of yet another metasurface provided in an embodiment of this disclosure;

[0034] Figure 7 shows the transmission characteristics curves of the metasurface corresponding to Figure 6;

[0035] Figure 8 shows the transmittance curves of metasurface unit 3 for different periods;

[0036] Figure 9 is a schematic diagram of an antenna provided in an embodiment of this disclosure;

[0037] Figure 10 is a graph showing the horizontal beamwidth of an antenna provided in an embodiment of this disclosure;

[0038] Figures 11-13 are top views of a metasurface provided in an embodiment of this disclosure. Detailed Implementation

[0039] To enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0040] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different constituent parts. Similarly, the terms “an,” “a,” or “the,” and similar terms do not indicate a quantity limitation, but rather indicate the presence of at least one. The terms “including,” “comprising,” or “containing,” and similar terms mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. The terms “connected,” “linked,” and similar terms are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. The terms “upper,” “lower,” “left,” and “right,” etc., are used only to indicate relative positional relationships, and these relative positional relationships may change accordingly when the absolute position of the described object changes.

[0041] The main mechanisms for dynamic control of metasurfaces currently include electro-control, thermal control, optical control, mechanical control, and chemical control. Mechanical control uses mechanical force as an external excitation to change the geometry of superatoms and the spacing between adjacent atoms in the metasurface, and mainly employs two approaches: microelectromechanical systems (MEMS) and flexible substrates. Early work on tunable metasurfaces using flexible substrates involved transferring the superatomic array onto a flexible substrate, stretching the substrate to change the superatomic structure and lattice of the metasurface. The method of functional reconfiguration of metasurfaces through stretching is suitable for some applications requiring quasi-static control of electromagnetic waves. Mechanically stretched metasurfaces do not require the complex driving circuits of electrically controlled metasurfaces, saving significant manufacturing and design costs. Typically, the method of achieving functional reconfiguration of metasurfaces by stretching flexible substrates involves fabricating the metasurface on a substrate of uniform thickness. As the substrate is stretched or bent, each unit in the metasurface undergoes corresponding tensile or torsional deformation, resulting in changes in electromagnetic properties and thus altering the control (polarization, phase, amplitude) of incident electromagnetic waves in the corresponding frequency band. This application of altering metasurface properties through stretching typically has a drawback: the thin metal layer fabricated on an elastic substrate experiences electrical degradation as it is stretched. The greater the stretching or bending deformation of the elastic substrate, the more severe the degradation of the metal film on the substrate. When the number of repeated stretching cycles increases or the stretching deformation becomes excessive, the metal film itself is prone to irreversible changes, thus destroying the metasurface's functionality.

[0042] Another type of mechanically stretched metasurface fabricated on an elastic substrate employs a kirigami structure. Inspired by the art of kirigami, the metasurface field has recently proposed developing a new class of reconfigurable electromagnetic devices by utilizing the deformable properties of mechanical metamaterials. By designing kinematically based cells with metallic coatings that can rotate relative to each other to provide tunable resonant electromagnetic properties, it is possible to tune the electromagnetic frequency response or induce anisotropy in wave propagation using mechanically driven deformable structures. However, this application is currently mainly used for switching between bistable or multiple stable states, rather than for continuous changes with substrate stretching. Furthermore, this design is relatively complex and cannot arbitrarily set the required response of the metasurface structure.

[0043] In view of the technical problems existing in the related technologies, the present disclosure provides a metasurface.

[0044] Figures 1-5 are schematic diagrams of a metasurface provided in an embodiment of this disclosure. As shown in Figures 1-5, the metasurface includes a dielectric substrate 10 and a plurality of metasurface units 3 disposed on the dielectric substrate 10. The dielectric substrate 10 includes a plurality of first elastic structures 1 and a plurality of second elastic structures 2, with the first elastic structures 1 and the second elastic structures 2 alternately disposed in a first direction x and / or a second direction y. A metasurface unit 3 is located on a first elastic structure 1 and is in contact only with the first elastic structure 1; the elastic modulus of the first elastic structure 1 is less than the elastic modulus of the second elastic structure 2.

[0045] Specifically, the metasurface provided in this disclosure is an electromagnetically reconfigurable metasurface based on mechanical stretching. This disclosure illustrates the application of this metasurface to a phase-modulated projection metasurface as an example. This metasurface can operate in mainstream frequency bands of 4G and 5G communication, ranging from 700MHz, 1.7GHz, 2.6GHz, 3.5GHz to 26GHz, 28GHz. It is understood that this metasurface can also be applied to reflective metasurfaces.

[0046] In practical applications, the inventors discovered that the horizontal beamwidth of an antenna in a specific environment is often fixed and does not require frequent changes. The beamwidth only needs to be set initially during antenna installation. Furthermore, the antenna beamwidth can be adjusted by horizontally stretching the metasurface and regulating its length. Therefore, the initial antenna beamwidth value can be easily set during antenna installation.

[0047] Metasurface element 3 is constructed using subwavelength to deep subwavelength structures as periodic units, with the unit period of metasurface element 3 located between 0.5λ and 0.02λ. Optionally, metasurface element 3 can also employ a unit periodic structure with a smaller unit size. This ensures that many smaller unit periodic structures can be spliced ​​together and still be smaller than one wavelength, thus enabling control of the antenna single-electrode beam even with limited phase modulation amplitude.

[0048] In this disclosure, metasurface units 3 are disposed on a dielectric substrate 10, which includes a first elastic structure 1 and a second elastic structure 2 with different elastic moduli. Specifically, the metasurface units 3 are placed on the first elastic structure 1, which has a relatively smaller elastic modulus, within the dielectric substrate 10. With this arrangement, when a certain tensile force is applied to the dielectric substrate 10 for stretching, the elastic deformation is mainly concentrated on the second elastic structure 1, which has a larger elastic modulus. The deformation of the first elastic structure 1, with its smaller elastic modulus, can be reduced through appropriate design, and may even be made negligible.

[0049] As shown in Figures 1-5, a comparison of the dielectric substrate 10 before and after stretching reveals that, since the metasurface unit 3 is located on and only in contact with the first elastic structure 1, the structure of the metasurface unit 3 itself does not deform as the dielectric substrate 10 is stretched because the first elastic structure 1 hardly deforms. However, due to the elastic deformation of the second elastic structure 2 under tension, the spacing d1 between the metasurface units 3 increases. This change in spacing d1 can alter the coupling strength between adjacent metasurface units 3, thereby changing the electromagnetic modulation function of the metasurface. For example, if the transmission phase is modulated, the change in spacing d1 can increase the coupling strength between adjacent metasurface units 3, thus changing the transmission phase at the corresponding position. Here, the spacing d1 between the metasurface units 3 refers to the minimum distance between two adjacent metasurface units 3.

[0050] In this embodiment, the dielectric substrate 10 is divided into a first elastic structure 1 and a second elastic structure 2 with different elastic moduli, and the first elastic structure 1 and the second elastic structure 2 are alternately arranged. The metasurface unit 3 is disposed on the first elastic structure 1 with the smaller elastic modulus. With this arrangement, when a certain tensile force is applied to the periphery of the dielectric substrate 10, the first elastic structure 1 will not deform, and thus will not affect the structure of the metasurface unit 3; at the same time, the second elastic structure 2 deforms, causing the spacing d1 between the metasurface units 3 to change. The change in spacing d1 can cause the coupling strength between adjacent metasurface units 3, thereby changing the electromagnetic control function of the metasurface.

[0051] In some embodiments, the material of the first elastic structure 1 is a rigid material, and the material of the second elastic structure 2 is an elastic material. That is, the elastic modulus of the first elastic structure 1 is 0, and the elastic modulus of the second elastic structure 2 is greater than 0. This ensures that when a certain tensile force is applied to the dielectric substrate 10, the first elastic structure 1 will not deform at all, thus not affecting the structure of the metasurface unit 3; simultaneously, the second elastic structure 2 will deform under the tensile force, causing a change in the spacing d1 between the metasurface units 3. In this case, the elastic modulus of the second elastic structure 2 only needs to be determined based on the amplitude of the phase to be adjusted (the required change in the spacing d1 between the metasurface units 3). Furthermore, in the fabrication process, the rigid material and the elastic material need to be assembled using a specific process to obtain a dielectric substrate 10 that is integrally connected.

[0052] In some embodiments, the material of the first elastic structure 1 is an elastic material, and the material of the second elastic structure 2 is also an elastic material. In this case, both the first elastic structure 1 and the second elastic structure 2 are elastic, and both the first elastic structure 1 and the second elastic structure 2 may undergo elastic deformation under tensile force. The elastic modulus of the first elastic structure 1 needs to be less than the elastic modulus of the second elastic structure 2, and the difference between their elastic moduli needs to meet certain conditions to ensure that when a certain tensile force is applied to the dielectric substrate 10, only the second elastic structure 2 deforms, while the first elastic structure 1 does not undergo elastic deformation or the elastic deformation is very small and can be ignored. The difference in elastic modulus between the first elastic structure 1 and the second elastic structure 2 can be determined according to the amplitude of the required phase adjustment (the required change in the spacing d1 between the metasurface units 3). Optionally, when both the materials of the first elastic structure 1 and the second elastic structure 2 are elastic materials, the first elastic structure 1 and the second elastic structure 2 can be integrally molded. This simplifies the process.

[0053] In some embodiments, the elastomeric material of the second elastic structure 2 and / or the first elastic structure 1 may be common PDMS (polydimethylsiloxane), or various rubber materials, liquid crystal elastomer materials, polyurethane, polyethylene, polyvinyl chloride, polyester fiber and other elastic materials, and this disclosure does not limit them.

[0054] The materials of the first elastic structure 1 and the second elastic structure 2 can be the same or different. To address different situations and ensure that the elastic moduli of the first elastic structure 1 and the second elastic structure 2 are different, this disclosure provides a detailed description of the specific structure of the metasurface through the following Embodiment 1 and Embodiment 2.

[0055] Example 1: The first elastic structure 1 and the second elastic structure 2 are made of the same material. In this case, both the first elastic structure 1 and the second elastic structure 2 are made of elastic materials.

[0056] As shown in Figures 1-4, the metasurface includes a dielectric substrate 10 and a plurality of metasurface units 3 disposed on the dielectric substrate 10. The dielectric substrate 10 includes a plurality of first elastic structures 1 and a plurality of second elastic structures 2, which are alternately arranged in a first direction x and / or a second direction y. A metasurface unit 3 is located on a first elastic structure 1 and is in contact only with the first elastic structure 1; the elastic modulus of the first elastic structure 1 is less than the elastic modulus of the second elastic structure 2. The first elastic structures 1 and the second elastic structures 2 are made of the same material, and the thickness H of the first elastic structure 1 is greater than the thickness h of the second elastic structure 2.

[0057] Specifically, the first elastic structure 1 and the second elastic structure 2 are made of the same material, meaning that under the same conditions, the elastic modulus of the first elastic structure 1 and the second elastic structure 2 are the same. The thickness of the elastic material affects its elastic modulus; the thicker the elastic material, the smaller its elastic modulus. In this embodiment, the thickness H of the first elastic structure 1 is set to be less than the thickness h of the second elastic structure 2, thus ensuring that the elastic modulus of the first elastic structure 1 is less than the elastic modulus of the second elastic structure 2.

[0058] In some embodiments, for the first elastic structure 1 and the metasurface unit 3 located thereon, the thickness of the first elastic structure 1 is H, the thickness of the second elastic structure 2 is h, and H / h is greater than 3.

[0059] Specifically, the thickness ratio of the first elastic structure 1 and the second elastic structure 2 affects the difference in their elastic moduli. If the value of H / h is too small, it indicates that the difference in elastic moduli between the first elastic structure 1 and the second elastic structure 2 is too small. When a certain tensile force is applied to the dielectric substrate 10, both the first elastic structure 1 and the second elastic structure 2 will undergo elastic deformation, which will cause the metasurface unit 3 located on the first elastic structure 1 to change with the deformation of the first elastic structure 1. In this embodiment, the change in the spacing d1 between the metasurface units 3 can be determined by combining the amplitude of the phase to be adjusted, further determining the tensile force to be applied to the dielectric substrate 10, and determining the thickness ratio of the first elastic structure 1 and the second elastic structure 2 based on the tensile force to be applied to the dielectric substrate 10. This ensures that the difference in elastic moduli between the first elastic structure 1 and the second elastic structure 2 is within a certain range. In other words, this ensures that under the action of tensile force, the second elastic structure 2 undergoes elastic deformation, and the spacing d1 between the metasurface units 3 changes, but at the same time, the first elastic structure 1 does not undergo or hardly undergoes elastic deformation, ensuring that the structure of the metasurface unit 3 itself does not deform.

[0060] In some embodiments, the first elastic structure 1 has a first surface a and a second surface b disposed opposite to each other along its thickness, and the metasurface unit 3 is in contact with the second surface b; the second elastic structure 2 has a third surface c and a fourth surface d disposed opposite to each other along its thickness, and the fourth surface d is closer to the metasurface unit 3. Optionally, the first surface a and the third surface c are in the same plane; optionally, the third surface c and the plane containing the first surface a are spaced apart.

[0061] That is, as shown in Figures 1-2, the thickness h of the second elastic structure 2 is less than the thickness of the first elastic structure 1. The second elastic structure 2 can be arranged parallel to the bottom of the first elastic structure 1, or it can be arranged at a certain distance from the bottom of the first elastic structure 1. The specific arrangement can be determined based on the manufacturing process or actual requirements, and this disclosure does not impose any restrictions on this. It should be noted that when the second elastic structure 2 is at a certain distance from the bottom of the first elastic structure 1, the fourth surface d of the second elastic structure 2 can also be arranged parallel to the second surface b of the first elastic structure 1. However, it is necessary to ensure that the second elastic structure 2 does not disengage from the metasurface unit 3 to prevent changes in the structure of the metasurface unit 3 due to deformation of the second elastic structure 2.

[0062] Furthermore, as shown in Figures 1-2, due to the conductive nature of force, if the material of the second elastic structure 2 is the same and uniform, the tensile force experienced by the second elastic structure 1 located at the periphery and the center is the same, and the elastic deformation of each second elastic structure 2 is the same. That is, the spacing d1 between the metasurface units 3 varies uniformly, meaning that the spacing d1 changes the same at different positions throughout the entire metasurface. For example, if the transmission phase is adjusted, if the transmission phase changes are the same at different positions, the electromagnetic wave wavefront cannot be transformed. For instance, in applications such as electromagnetic lenses, the phase adjustment amount at different positions of the metasurface needs to change differently so that the lens's ability to converge electromagnetic waves can change accordingly.

[0063] In some embodiments, when the first elastic structure 1 and the second elastic structure 2 are made of the same material, not only is the thickness H of the first elastic structure 1 greater than the thickness h of the second elastic structure 2, ensuring that the elastic modulus of the first elastic structure 1 is less than that of the second elastic structure 2, but the thicknesses of the multiple second elastic structures 2 are also different. This ensures that when the multiple second elastic structures 2 are subjected to the same tensile force, the magnitudes of their elastic deformations are different, thereby ensuring that the spacing d1 at different positions changes differently. This allows the phase modulation amount at different positions of the metasurface to change differently, thus allowing the lens's ability to converge electromagnetic waves to change accordingly. It should be noted that when the thicknesses of the multiple second elastic structures 2 are different, the minimum value of the ratio H / h of the thickness H of the first elastic structure 1 to the thickness h of the second elastic structure 2 must be greater than 3. This ensures that none of the first elastic structures 1 undergo elastic deformation, so that the structure of the metasurface unit 3 itself remains unchanged.

[0064] In some embodiments, when the materials of the first elastic structure 1 and the second elastic structure 2 are the same, not only is the thickness H of the first elastic structure 1 greater than the thickness h of the second elastic structure 2, ensuring that the elastic modulus of the first elastic structure 1 is less than that of the second elastic structure; but also, the width w1 of the plurality of first elastic structures 1 in the first direction x is the same; wherein, along the first direction x, the distance d1 between any two adjacent metasurface units 3 is the first distance, and the distance from the middle region of the dielectric substrate 10 is smaller. Optionally, along the first direction x, the distance d1 between any two adjacent metasurface units 3 is the first distance, and the distance from the middle region of the dielectric substrate 10 is larger.

[0065] Specifically, as described above, if the material of the second elastic structure 2 is the same and uniform, the spacing d1 between the metasurface units 3 varies uniformly, meaning that the spacing d1 varies the same at different positions throughout the entire metasurface. In this embodiment, before stretching the dielectric substrate 10, the spacing of the metasurface units 3 is set to different distances, such as a smaller spacing in the middle and a larger spacing at the edges; or a larger spacing in the middle and a smaller spacing at the edges. Thus, when the same spacing is added to both the middle and the edges simultaneously, the difference between the middle and edge spacing decreases relatively, thereby changing the focusing ability of the electromagnetic lens. Specifically, from the middle region to the edge region of the dielectric substrate 10, the first spacing decreases, which can be considered a concave lens; from the middle region to the edge region of the dielectric substrate 10, the first spacing increases, which can be considered a convex lens. A concave lens becomes less concave due to stretching, thus weakening the divergence effect; a convex lens weakens the focusing effect due to stretching, and both situations can change the focusing ability of the electromagnetic lens.

[0066] Since adjacent metasurface units 3 are separated by a second elastic structure 2, the present disclosure can achieve different spacing d1 between adjacent metasurface units 3 by setting the width w2 of the plurality of second elastic structures 2 to be different. Alternatively, when the width w2 of the second elastic structures 2 is the same, the spacing d1 between adjacent metasurface units 3 can be achieved by setting the width w0 of the different metasurface units 3 to be different.

[0067] In some embodiments, not only are the widths w1 of the plurality of first elastic structures 1 the same in the first direction x, but the widths w2 of the plurality of second elastic structures 2 are also the same along the first direction x; wherein, the width w0 of the metasurface unit 3 is larger the further away from the middle region of the dielectric substrate 10.

[0068] As shown in Figure 3 (the second elastic structure 2 is not shown), in this embodiment of the present disclosure, before stretching the dielectric substrate 10, the widths w0 of the different metasurface units 3 are set to be different, so that the distance d1 between two adjacent metasurface units 3 is different at the initial moment. Thus, when the same interval is added simultaneously at the center and the edge, the difference between the interval at the center and the interval at the edge is relatively reduced, thereby changing the focusing ability of the electromagnetic lens. When the width w0 of the metasurface unit 3 can be larger further away from the center region of the dielectric substrate 10, the distance d1 between adjacent metasurface units 3 decreases from the center region to the edge region of the dielectric substrate 10, which can be considered as a concave lens. When a concave lens is stretched, it becomes less concave, and the diverging effect weakens. Optionally, the width w0 of the metasurface unit 3 can be smaller further away from the center region of the dielectric substrate 10, and the distance d1 between adjacent metasurface units 3 increases from the center region to the edge region of the dielectric substrate 10, which can be considered as a convex lens. When a convex lens is stretched, the focusing effect weakens. Both cases can change the focusing ability of the electromagnetic lens.

[0069] In some embodiments, the width w0 of the metasurface units 3 is the same along the first direction x; and along the direction away from the middle region of the dielectric substrate 10, the width w1 of the first elastic structure 1 increases along the first direction x, and the width w2 of the second elastic structure 2 decreases along the first direction x. Optionally, along the direction away from the middle region of the dielectric substrate 10, the width w1 of the first elastic structure 1 decreases along the first direction x, and the width w2 of the second elastic structure 2 increases along the first direction x.

[0070] Specifically, as shown in Figure 4, unlike the embodiment corresponding to Figure 3, in this embodiment, the width of the metasurface unit 3 is the same, while the width of the first elastic structure 1 varies at different positions. In the application of the electromagnetic lens, before the dielectric substrate 10 is stretched, the period of the metasurface unit 3 remains unchanged from the center to the edge of the metasurface, but the width w1 of the first elastic structure 1 gradually increases or decreases. Therefore, the duty cycle of the second elastic structure 2 is different, and after the dielectric substrate 10 is stretched, the stretching length from the center to the edge is not uniformly changed. This causes the spacing between the metasurface units 3 to gradually widen or narrow from the center to the edge, thereby achieving a phase gradient distribution and realizing the electromagnetic lens function.

[0071] Figure 6 is a schematic diagram of another metasurface provided in an embodiment of this disclosure. The dark areas represent the first elastic structure 1, and the light-colored areas represent the second elastic structure 2. The further away from the center of the dielectric substrate 10, the smaller the width of the first elastic structure 1 and the larger the width of the second elastic structure 2. Figure 7 is a transmission characteristic curve of the metasurface corresponding to Figure 6. Figure 8 is a transmittance curve of the metasurface unit 3 for different periods.

[0072] As shown in Figure 6, the dielectric substrate 10 has a thickness T of 10 mm and a dielectric constant ε = 4.6. The upper and lower surfaces of the dielectric substrate 10 along its thickness direction have "iron cross" shaped metal structures, where L = 8 mm, b = 0.5 mm, a = 0.5 mm, and S = 7 mm. Assuming that electromagnetic waves in the 3-4 GHz frequency band are incident perpendicularly onto the metasurface shown in Figure 6, when the periods of metasurface unit 3 are p0 = 9.6 mm (L2 curve) and p0 = 14 mm (L1 curve), the transmission characteristics shown in Figure 7 are obtained.

[0073] As shown in Figure 8, the transmittance curves corresponding to different periods p0 of the metasurface unit 3 show corresponding changes in their transmission phase. Curve L3 corresponds to p0 = 14 mm, and curve L4 corresponds to p0 = 9.6 mm. As the period of the metasurface unit 3 increases, that is, the spacing between the metasurface units 3 increases, the corresponding transmission phase increases.

[0074] Figure 9 is a schematic diagram of an antenna provided in an embodiment of this disclosure, wherein the antenna includes a metasurface 100 and an antenna element 200. Further, when the metasurface shown in Figure 6 is placed on the high-frequency antenna element 200 with a frequency of 2.6 GHz-3.6 GHz, the horizontal beamwidth of the antenna element 200 can be changed by stretching the metasurface 100. Figure 10 is a graph showing the horizontal beamwidth of an antenna provided in an embodiment of this disclosure. In Figure 10, L5 represents a period p0 = 14 mm, and L6 represents a period p0 = 9.6 mm. The beamwidth of the antenna element 200 at a frequency of 3.4 GHz is 52 degrees before stretching the metasurface 100 (the spacing between all metasurface elements 3 is 9.6 mm), and after stretching the metasurface 100 (the spacing between the outermost metasurface elements 3 reaches 15 mm), the horizontal beamwidth becomes 29 degrees, and the gain increases by 1.7 dB.

[0075] In some embodiments, the metasurface unit 3 covers the first elastic structure 1 and the metasurface unit 3 located thereon. This arrangement avoids excessive spacing between the metasurface units 3 due to the first elastic structure 1 being too large. If the spacing between the metasurface units 3 is too large, the coupling strength between the metasurface units 3 will be insignificant due to the change in spacing, thus the electromagnetic control function will also be insignificant.

[0076] In some embodiments, the width of the first elastic structure 1 is w1, and the width of the metasurface unit 3 is w0, with w1 / w0 ranging from 1 / 4 to 1. Under otherwise identical conditions, the width w1 of the first elastic structure 1 will not affect the modulation of the electromagnetic wave phase; however, considering process precision, the width w1 of the first elastic structure 1 is generally between 1 / 4 and 1 / 3 of the width w0 of the metasurface unit 3. Simultaneously, considering the sensitivity of electromagnetic wave phase modulation, the distance between the metasurface units 3 should not be too large; therefore, it is preferable that the width of the first elastic structure 1 is less than or equal to the width of the metasurface unit 3.

[0077] In some embodiments, the spacing between two adjacent metasurface units 3 along the first direction x and / or the second direction y ranges from 10 μm to 1 / 3λ. This setting ensures that changes in the spacing between the metasurface units 3 significantly alter the coupling strength between them, thereby changing the electromagnetic control function of the metasurface.

[0078] In some embodiments, for the first elastic structure 1 and the metasurface unit 3 located thereon, the first elastic structure 1 includes a first surface and a second surface disposed opposite to each other along its thickness direction, and the center of the orthographic projection of the metasurface unit 3 onto the first surface of the first elastic structure 1 coincides with the center of the first surface. This arrangement ensures that the metasurfaces are symmetrically distributed, and the electromagnetic control function of the metasurface can be better modified by varying the spacing between the metasurface units 3.

[0079] In this embodiment, the material of the first elastic structure 1 is the same as that of the second elastic structure 2. By setting the thickness of the first elastic structure 1 to be greater than the thickness of the second elastic structure 2, the elastic modulus of the first elastic structure 1 is ensured to be less than that of the second elastic structure 2. Therefore, when the dielectric substrate 10 is stretched, only the second elastic structure 2 deforms, increasing the distance between the metasurface structures 3; while the first elastic structure 1 does not undergo elastic deformation, thus not affecting the structure of the metasurface unit 3 itself. Furthermore, by different configurations of the first elastic structure 1, the second elastic structure 2, and the metasurface unit 3, different behavioral control parameters at different locations of the metasurface can be ensured to change, thereby altering the focusing capability of the electromagnetic lens.

[0080] Example 2: The first elastic structure 1 and the second elastic structure 2 are made of different materials. In this case, the first elastic structure 1 can be a rigid material, and the second elastic structure 2 can be an elastic material. Alternatively, both the first elastic structure 1 and the second elastic structure 2 can be elastic materials.

[0081] As shown in Figure 5, the metasurface includes a dielectric substrate 10 and a plurality of metasurface units 3 disposed on the dielectric substrate 10. The dielectric substrate 10 includes a plurality of first elastic structures 1 and a plurality of second elastic structures 2, which are alternately arranged in a first direction x and / or a second direction y. A metasurface unit 3 is located on a first elastic structure 1 and is in contact only with the first elastic structure 1; the elastic modulus of the first elastic structure 1 is less than the elastic modulus of the second elastic structure 2. The first elastic structures 1 and the second elastic structures 2 are made of different materials, and have the same thickness.

[0082] Specifically, as shown in Figure 5, the first elastic structure 1 and the second elastic structure 2 are made of different materials, meaning that under the same conditions, the elastic moduli of the first elastic structure 1 and the second elastic structure 2 are different. That is, when the thicknesses of the first elastic structure 1 and the second elastic structure 2 are the same, their elastic deformations are different. This allows the second elastic structure 2 to deform when a tensile force is applied to the dielectric substrate 10, increasing the spacing between the metasurface units 3; while the first elastic structure 1 does not undergo elastic deformation, ensuring that the structure of the metasurface units 3 on the first elastic structure 1 remains unchanged. This configuration allows the dielectric substrate 10 to be obtained from elastic films of the same thickness but treated differently at different locations. For example, different exposure intensities, different baking temperatures, different additive materials, or different chemical reaction times can be used at different locations of the elastic film. In some embodiments, the first elastic structure 1 and the second elastic structure 2 are integrally molded. This reduces the complexity of the process flow.

[0083] In some embodiments, the first elastic structure 1 includes a first surface and a second surface disposed opposite to each other along its thickness direction. For the first elastic structure 1 and the metasurface unit 3 located thereon, the orthographic projection of the metasurface unit 3 onto the first surface of the first elastic structure 1 coincides with the first surface.

[0084] Specifically, as shown in Figure 5, since the first elastic structure 1 and the second elastic structure 2 have the same thickness, to avoid contact between the metasurface unit 3 and the second elastic structure 2, which could affect the structure of the metasurface unit 3 when the second elastic structure 2 deforms, the size of the metasurface unit 3 is not larger than the size of the first elastic structure 1. Simultaneously, to reduce the spacing between two adjacent metasurface units 3, the size of the metasurface unit 3 is set to be equal to the size of the first elastic structure 1. This arrangement ensures that the second elastic structure 2 does not affect the structure of the metasurface unit 3, and also ensures that changes in the spacing between the metasurface units 3 affect the coupling strength between them, thereby achieving electromagnetic control.

[0085] Furthermore, similar to Embodiment 1 above, if the material of the second elastic structure 2 is the same and uniform, the tensile force on the second elastic structure 1 located at the periphery and the center is the same, and the elastic deformation of each second elastic structure 2 is the same. That is, the spacing d1 between the metasurface units 3 varies uniformly, meaning that the spacing d1 varies the same at different positions throughout the entire metasurface. For example, if the transmission phase is adjusted, if the transmission phase changes are the same at different positions, the electromagnetic wave wavefront cannot be transformed. For instance, in applications such as electromagnetic lenses, the phase adjustment amount at different positions of the metasurface needs to change differently so that the lens's ability to converge electromagnetic waves can change accordingly.

[0086] In some embodiments, the metasurface not only has different materials for the first elastic structure 1 and the second elastic structure 2, but also has equal spacing between any two adjacent metasurface units 3 along the first direction x, and the materials of the multiple second elastic structures 2 are different. That is, in this embodiment, the elastic moduli of the multiple second elastic structures 2 are different. Thus, under the same tensile force, the deformation of each second elastic structure 2 is different, which allows the phase modulation amount at different positions of the metasurface to change differently, thereby changing the focusing ability of the lens to electromagnetic waves accordingly.

[0087] In some embodiments, the metasurface is made of different materials for the first elastic structure 1 and the second elastic structure 2, the spacing between any two adjacent metasurface units 3 along the first direction x is unequal, and the materials of the multiple second elastic structures 2 are the same.

[0088] That is, multiple second elastic structures 2 exhibit the same elastic deformation under the same tensile force. In this embodiment, the initial spacing d1 between adjacent metasurface units 3 is different. Thus, when the same spacing is added simultaneously at the center and edge, the difference between the center and edge spacing decreases, thereby altering the focusing ability of the electromagnetic lens. Specifically, the distance d1 between adjacent metasurface units 3 can decrease from the center to the edge region of the dielectric substrate 10, which can be considered as a concave lens. When a concave lens is stretched, it becomes less concave, weakening the divergence effect. Optionally, the distance d1 between adjacent metasurface units 3 can also increase from the center to the edge region of the dielectric substrate 10, which can be considered as a convex lens. When a convex lens is stretched, the focusing effect weakens. Both cases can alter the focusing ability of the electromagnetic lens.

[0089] The difference between this embodiment and Embodiment 1 is only that the materials of the first elastic structure 1 and the second elastic structure 2 are different in this embodiment. In this case, the thicknesses of the first elastic structure 1 and the second elastic structure 2 can be the same. However, in Embodiment 1, since the materials of the first elastic structure 1 and the second elastic structure 2 are the same, the thicknesses of the first elastic structure 1 and the second elastic structure 2 must be different.

[0090] Additionally, it should be noted that in the photographs of the embodiments disclosed herein, when the first elastic structure 1 and the second elastic structure 2 are made of different elastic materials, the thicknesses of the first elastic structure 1 and the second elastic structure 2 can also be different. Specifically, this can be determined based on the difference in elastic modulus between the first elastic structure 1 and the second elastic structure 2 and the required phase adjustment amplitude. In the embodiments of this disclosure, when the thicknesses of the first elastic structure 1 and the second elastic structure 2 are different, the specific principles for setting their metasurfaces can also refer to the part of Embodiment 1 described above, and will not be repeated here.

[0091] In all embodiments mentioned in this disclosure, the metasurface unit 3 can be configured with different structures or arranged in different ways according to different needs. Correspondingly, the first elastic structure 1 and the second elastic structure 2 correspond to the structure of the metasurface unit 3.

[0092] In some embodiments, the orthographic projection of the plurality of metasurface units 3 in the metasurface onto the dielectric substrate 10 is a plurality of rectangles arranged in an array.

[0093] Specifically, in the metasurface shown in Figures 1-5, if multiple metasurface units 3 are arranged in an array, then the first elastic structure 1 and the second elastic structure 2 are also arranged in an array. The first elastic structure 1 and the second elastic structure 2 can be only one-dimensional deformation structures; in this case, the first elastic structure 1 and the second elastic structure 2 are alternately arranged only in the first direction x. Optionally, the first elastic structure 1 and the second elastic structure 2 can also be two-dimensional deformation structures arranged in an array; in this case, the first elastic structure 1 and the second elastic structure 2 are alternately arranged in the first direction x and the second direction y.

[0094] In some embodiments, the orthographic projection of the plurality of metasurface units 3 in the metasurface onto the dielectric substrate 10 is a plurality of nested annular rings.

[0095] Specifically, Figures 11-13 are top views of a metasurface provided in an embodiment of this disclosure. Figures 11-12 show only the first elastic structure 1 and the second elastic structure 2; Figure 12 shows only the second elastic structure 2 and the metasurface unit 3. As shown in Figures 11-13, the multiple metasurface units 3 are nested ring structures, and the first elastic structure 1 and the second elastic structure 2 also correspond to nested ring structures. In this case, the first elastic structure 1 and the second elastic structure 2 are alternately arranged only in a first direction x, which is the direction away from the center of the ring structure.

[0096] When the structure of the metasurface unit 3 is a ring structure, the other settings regarding the metasurface are similar to those when the structure of the metasurface unit 3 is an array structure. The elastic modulus of the first elastic structure 1 can be made smaller than that of the second elastic structure 2 by setting the material, thickness, and width along the first direction of the first elastic structure 1 and the second elastic structure 2, as well as the width of the metasurface unit 3 along the first direction. Thus, when a certain tensile force is applied to the dielectric substrate 10 for stretching, the elastic deformation is mainly concentrated on the second elastic structure 1 with the larger elastic modulus, while the deformation of the first elastic structure 1 with the smaller elastic modulus can be reduced through reasonable settings, or even made negligible.

[0097] As shown in Figure 11, the width of the first elastic structure 1 along the first direction x is the same; and the width of the second elastic structure 2 along the first direction x is also the same. In this embodiment, similar to the embodiment corresponding to Figure 3, the widths of the multiple metasurface units 3 along the first direction x can be set to be different; alternatively, similar to the embodiment corresponding to Figure 5, the first elastic structure 1 and the second elastic structure 2 can be made of different materials, and the multiple second elastic structures 2 can also be made of different materials. This allows the spacing at different positions on the metasurface to vary, thereby enabling different changes in the phase modulation amount at different positions on the metasurface, achieving electromagnetic control functionality.

[0098] As shown in Figure 12, in the direction away from the center region of the dielectric substrate 10, the width of the first elastic structure 1 increases along the first direction x, while the width of the second elastic structure 2 decreases along the first direction x. In this embodiment of the present disclosure, similar to the embodiment corresponding to Figure 4, the widths of the plurality of metasurface units 3 along the first direction x can be set to be the same.

[0099] As shown in Figure 13, if the width of the metasurface unit 3 along the first direction x remains constant, it can be similar to the embodiments corresponding to Figures 4-5. The width of the first elastic structure 1 increases along the first direction x, while the width of the second elastic structure 2 decreases along the first direction x. Alternatively, the first elastic structure 1 and the second elastic structure 2 can be made of different materials, and multiple second elastic structures 2 can also be made of different materials.

[0100] For specific details regarding Figures 11-13, please refer to the embodiments corresponding to Figures 3-5 above, which will not be repeated here.

[0101] The metasurface provided in this disclosure achieves beam control by setting the elastic modulus of the first elastic structure 1 to be smaller than that of the second elastic structure 2, and placing the metasurface unit 3 on the first elastic structure 1, which only contacts the first elastic structure 1. This effectively reduces the difficulty of metasurface design and makes it easy to achieve large deformation design. Specifically, the metasurface provided in this disclosure utilizes elastic structures with different thicknesses at different locations on the dielectric substrate 10 to achieve metasurface design with non-uniform elastic deformation (non-uniform stretching) at different locations. The first elastic structure 1, with its smaller elastic modulus, can have different width dimensions to generate a non-uniform elastic deformation (non-uniform stretching) design. Furthermore, elastic films at different locations are processed using different methods (light, heat, chemical, etc.) to produce deformable and non-deformable films, thus generating a metasurface design with non-uniform elastic deformation. Finally, this disclosure can also employ a metasurface design with non-uniform stretching of the annular / circular dielectric substrate 10.

[0102] The metasurface provided in this disclosure eliminates the need for complex electronically controlled metasurface driving circuit designs, reducing manufacturing costs and saving energy consumption in the control circuit, thus improving system efficiency. Furthermore, the metasurface provided in this disclosure can be applied to both transmissive and reflective metasurfaces, and is suitable for all frequency bands from 800MHz to millimeter waves and THz waves. Moreover, the metasurface provided in this disclosure can also be integrated into spotlight antennas and panel base station antennas to achieve bandwidth or waveform control.

[0103] Based on the same invention, this disclosure also provides an antenna, wherein it includes any of the metasurfaces described in the above embodiments.

[0104] In some embodiments, the antenna includes not only the metasurface 100 but also an antenna element 200 disposed on the side of the metasurface 100 near the dielectric substrate 10. As shown in FIG9, the metasurface 100 may be disposed only on a portion of the antenna element 200.

[0105] Based on the same invention, this disclosure also provides an electronic device, including any one of the antennas described in the above embodiments.

[0106] In some examples, the electronic device provided in this disclosure further includes a transceiver unit, a radio frequency transceiver, a signal amplifier, a power amplifier, and a filtering unit. The antenna in the electronic device can function as either a transmitting antenna or a receiving antenna. The transceiver unit may include a baseband and a receiving end. The baseband provides signals in at least one frequency band, such as 2G, 3G, 4G, and 5G signals, and transmits these signals to the radio frequency transceiver. After receiving the signal, the antenna in the electronic device can process it through the filtering unit, power amplifier, signal amplifier, and radio frequency transceiver before transmitting it to the receiving end in the transceiver unit. The receiving end may be, for example, a smart gateway.

[0107] Furthermore, the RF transceiver is connected to the transceiver unit and is used to modulate the signals transmitted by the transceiver unit, or to demodulate the signals received by the antenna before transmitting them to the transceiver unit. Specifically, the RF transceiver may include a transmitting circuit, a receiving circuit, a modulation circuit, and a demodulation circuit. After the transmitting circuit receives various types of signals provided by the baseband, the modulation circuit can modulate these signals before sending them to the antenna. The antenna receives the signals and transmits them to the receiving circuit of the RF transceiver. The receiving circuit then transmits the signals to the demodulation circuit, which demodulates the signals before transmitting them to the receiving end.

[0108] Furthermore, the RF transceiver is connected to a signal amplifier and a power amplifier, which are then connected to a filtering unit. The filtering unit is connected to at least one antenna. During signal transmission by the electronic device, the signal amplifier improves the signal-to-noise ratio (SNR) of the RF transceiver's output signal before transmitting it to the filtering unit; the power amplifier amplifies the power of the RF transceiver's output signal before transmitting it to the filtering unit. The filtering unit may specifically include a duplexer and a filtering circuit. It combines the signals output from the signal amplifier and power amplifier, filters out noise, and transmits the signals to the antenna, which then radiates the signal. During signal reception by the electronic device, the antenna receives the signal and transmits it to the filtering unit. The filtering unit filters out noise from the received signal before transmitting it to the signal amplifier and power amplifier. The signal amplifier increases the gain of the received signal, improving the SNR; the power amplifier amplifies the power of the received signal. The signal received by the antenna is processed by the power amplifier and signal amplifier before being transmitted to the RF transceiver, which then transmits it to the transceiver unit.

[0109] In some examples, the signal amplifier may include various types of signal amplifiers, such as low-noise amplifiers, without limitation.

[0110] In some examples, the electronic device provided in this disclosure also includes a power management unit connected to a power amplifier and providing the power amplifier with a voltage for amplifying signals.

[0111] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of the present invention, and the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. A metasurface, comprising a dielectric substrate and a plurality of metasurface units disposed on the dielectric substrate, the dielectric substrate comprising a plurality of first elastic structures and a plurality of second elastic structures, wherein the first elastic structures and the second elastic structures are alternately disposed in a first direction and / or a second direction; wherein, One of the metasurface units is located on and in contact with the first elastic structure; the elastic modulus of the first elastic structure is less than that of the second elastic structure.

2. The metasurface according to claim 1, wherein, The first elastic structure and the second elastic structure are made of the same material, and the thickness of the first elastic structure is greater than the thickness of the second elastic structure.

3. The metasurface according to claim 2, wherein, The width of the plurality of the first elastic structures is the same in the first direction; Along the first direction, the distance between any two adjacent metasurface units is the first distance, and the distance from the middle region of the dielectric substrate is smaller.

4. The metasurface according to claim 3, wherein, The first elastic structure includes a first surface and a second surface disposed opposite to each other along its thickness direction. For the first elastic structure and the metasurface unit located thereon, the center of the orthographic projection of the metasurface unit onto the first surface of the first elastic structure coincides with the center of the first surface.

5. The metasurface according to claim 4, wherein, Along the first direction, the widths of the plurality of second elastic structures are the same; the width of the metasurface unit increases the further away from the middle region of the dielectric substrate.

6. The metasurface according to claim 4, wherein, Along the first direction, the widths of the metasurface units are the same; and along the direction away from the middle region of the dielectric substrate, the width of the first elastic structure increases along the first direction, while the width of the second elastic structure decreases along the first direction.

7. The metasurface according to claim 2, wherein, For the first elastic structure and the metasurface unit located thereon, the ratio of the thickness of the first elastic structure to the thickness of the second elastic structure is greater than 3.

8. The metasurface according to claim 2, wherein, The first elastic structure and the metasurface unit located thereon cover the first elastic structure.

9. The metasurface according to claim 8, wherein, The ratio of the width of the first elastic structure to the width of the metasurface unit ranges from 1 / 4 to 1.

10. The metasurface according to any one of claims 2-9, wherein, The first elastic structure has a first surface and a second surface disposed opposite to each other along its thickness, the metasurface unit being in contact with the second surface; the second elastic structure has a third surface and a fourth surface disposed opposite to each other along its thickness, the fourth surface being closer to the metasurface unit, wherein... The first surface and the third surface are in the same plane; or, The third surface is spaced apart from the plane containing the first surface.

11. The metasurface according to claim 1, wherein, The first elastic structure and the second elastic structure have the same thickness, but are made of different materials.

12. The metasurface according to claim 11, wherein, The first elastic structure includes a first surface and a second surface disposed opposite to each other along its thickness direction. For the first elastic structure and the metasurface unit located thereon, the orthographic projection of the metasurface unit onto the first surface of the first elastic structure coincides with the first surface.

13. The metasurface according to claim 12, wherein, Any two adjacent metasurface units are equally spaced along the first direction, and the materials of the multiple second elastic structures are different.

14. The metasurface according to claim 12, wherein, Any two adjacent metasurface units have unequal spacing along the first direction, and the materials of the multiple second elastic structures are the same.

15. The metasurface according to any one of claims 1-9, 11-14, wherein, The spacing between two adjacent metasurface units along the first direction and / or the second direction ranges from 10 μm to 1 / 3λ, where λ represents the wavelength.

16. The metasurface according to any one of claims 1-9, 11-14, wherein, The orthographic projection of the plurality of metasurface units onto the dielectric substrate is a plurality of nested annular rings; or, The orthographic projection of the multiple metasurface units onto the dielectric substrate is a plurality of rectangles arranged in an array.

17. The metasurface according to any one of claims 1-9, 11-14, wherein, Both the first elastic structure and the second elastic structure are made of elastic materials; or, The first elastic structure is made of a rigid material, and the second elastic structure is made of an elastic material.

18. An antenna, wherein, Includes the metasurface as described in any one of claims 1-17.

19. The antenna according to claim 18, wherein, The antenna also includes an antenna element disposed on the metasurface near the dielectric substrate.

20. An electronic device, wherein, Including the antenna as described in any one of claims 18-19.

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