Sample motion platform, control method thereof and detection equipment

Abstract

The invention relates to the technical field of semiconductor measurement, in particular to a sample motion platform, a control method thereof and detection equipment, and the sample motion platform comprises an auxiliary motion platform and a sample table; the sample table comprises a first driving mechanism and a bearing table, and the first driving mechanism is used for outputting first driving force to drive the bearing table to move in the first axis direction and outputting second driving force to drive the bearing table to move in the second axis direction; the auxiliary motion platform comprises a second driving mechanism and a base plate, and the second driving mechanism is used for outputting a third driving force to drive the base plate to move in the first axis direction and outputting a fourth driving force to drive the base plate to move in the second axis direction; the first driving mechanism and the second driving mechanism are the same in height, the first driving force and the third driving force are the same in magnitude and opposite in direction, and the second driving force and the fourth driving force are the same in magnitude and opposite in direction. The detection efficiency can be improved at least.

Description

Technical Field

[0001] This invention belongs to the field of semiconductor measurement technology, and particularly relates to a sample motion platform and its control method and detection equipment. Background Technology

[0002] In electron beam inspection equipment, the high resolution of the electron beam at the nanometer level allows for the clear identification of minute defects and features within wafers. However, this same high resolution also makes the electron beam highly sensitive to vibration; even minor vibrations can cause beam deflection, leading to inaccurate detection or measurement. Furthermore, due to efficiency requirements, wafers need to move rapidly. The frequent start-stop cycles of the motion platform during wafer movement generate significant vibrations, which take a considerable amount of time to reduce to the nanometer or sub-nanometer level required by the electron beam. This wastes significant time and fails to meet the demands of high-efficiency detection and measurement. Simultaneously, external vibrations, such as those from other equipment operating in the environment or from people walking by, can also cause significant beam deflection. Therefore, how to reduce the vibration level of the motion platform to the nanometer or sub-nanometer level required by the electron beam in a shorter time to meet the needs of electron beam detection and measurement and improve efficiency has become a pressing technical problem. Summary of the Invention

[0003] In view of this, the present invention aims to provide a sample motion platform and its control method, as well as a detection device, which at least helps to improve detection efficiency.

[0004] To achieve the above objectives, the technical solution created by this invention is implemented as follows: This invention provides a sample motion platform, comprising: an auxiliary motion platform and a sample stage disposed on the same base plate; the sample stage includes a first driving mechanism and a support platform, the support platform being used to carry a sample, the first driving mechanism being used to output a first driving force to drive the support platform to move along a first axis, and to output a second driving force to drive the support platform to move along a second axis; the auxiliary motion platform includes a second driving mechanism and a substrate, the second driving mechanism being used to output a third driving force to drive the substrate to move along the first axis, and to output a fourth driving force to drive the substrate to move along the second axis; wherein the first driving mechanism and the second driving mechanism are at the same height, the load of the first driving mechanism is the same as the load of the second driving mechanism, the center of gravity of the load of the first driving mechanism is at the same height as the center of gravity of the load of the second driving mechanism, the first driving force and the third driving force are the same in magnitude but opposite in direction, and the second driving force and the fourth driving force are the same in magnitude but opposite in direction.

[0005] Furthermore, the first driving mechanism includes a first driving component and a second driving component, and the sample stage also includes a first base and a second base. The first base, the first driving component, the second base, the second driving component, and the support platform are arranged sequentially from bottom to top. The first base is mounted on the base plate. The first driving component is used to output a first driving force to drive the second base to move relative to the first base along a first axis direction. The second driving component is used to output a second driving force to drive the support platform to move relative to the second base along a second axis direction. The second driving mechanism includes a third driving component and a fourth driving component, and the auxiliary motion platform also includes a third base and a fourth base. The third base, the third driving component, the fourth base, the fourth driving component, and the substrate are arranged sequentially from bottom to top. The third base is mounted on the base plate. The third driving component is used to output a third driving force to drive the fourth base to move relative to the third base along a first axis direction. The fourth driving component is used to output a fourth driving force to drive the substrate to move relative to the fourth base along a second axis direction. The first driving component and the third driving component have the same height, and the second driving component and the fourth driving component have the same height.

[0006] Furthermore, the first drive component has the same structure as the third drive component, and the second drive component has the same structure as the fourth drive component.

[0007] Furthermore, the load of the first drive component is the same as the load of the third drive component, and the load of the second drive component is the same as the load of the fourth drive component; the center of gravity height of the load of the first drive component is the same as the center of gravity height of the load of the third drive component, and the center of gravity height of the load of the second drive component is the same as the center of gravity height of the load of the fourth drive component.

[0008] Furthermore, the first drive assembly includes a first motor stator and a first motor mover. The first motor stator is disposed on a first base, one end of the first motor mover is connected to the first motor stator, and the other end of the first motor mover is connected to a second base. The first motor mover is movable relative to the first motor stator along a first axis. The second drive assembly includes a second motor stator and a second motor mover. The second motor stator is disposed on a second base, one end of the second motor mover is connected to the second motor stator, and the other end of the second motor mover is connected to a support platform. The second motor mover is movable relative to the second motor stator along a second axis.

[0009] Furthermore, the sample stage also includes a corresponding first guide rail and a first slider, as well as a corresponding second guide rail and a second slider; the first guide rail is disposed on the first base, the first guide rail is connected to the second base through the first slider, and the first slider is slidable relative to the first guide rail along the first axis direction; the second guide rail is disposed on the second base, the second guide rail is connected to the support stage through the second slider, and the second slider is slidable relative to the second guide rail along the second axis direction.

[0010] Furthermore, the sample stage also includes a corresponding first brake guide rail and a first brake element, as well as a corresponding second brake guide rail and a second brake element. The first brake guide rail is disposed on the first base, the first brake element is connected to the second base and is in contact with the first brake guide rail. When the first driving force output by the first drive assembly is non-zero, the first brake element can slide relative to the first brake guide rail along the first axis direction. When the first driving force output by the first drive assembly is zero, the first brake element applies pressure to the first brake guide rail to suppress the movement of the second base. The second brake guide rail is disposed on the second base, the second brake element is connected to the support platform and is in contact with the second brake guide rail. When the second driving force output by the second drive assembly is non-zero, the second brake element can slide relative to the second brake guide rail along the second axis direction. When the second driving force output by the second drive assembly is zero, the second brake element applies pressure to the second brake guide rail to suppress the movement of the support platform.

[0011] Furthermore, the sample stage includes two sets of corresponding first guide rails and first sliders, two sets of corresponding first brake rails and first brake components, two sets of corresponding second guide rails and second sliders, and two sets of corresponding second brake guide rails and second brake components; the first base has a first groove extending along a first axis and first protrusions located on both sides of the first groove, each first protrusion having a corresponding set of first guide rails and first sliders on its top surface, and each first protrusion having a corresponding set of first brake guide rails and first brake components on its side away from the first groove, and a first drive assembly disposed within the first groove; the second base has a second groove extending along a second axis and second protrusions located on both sides of the second groove, each second protrusion having a corresponding set of second guide rails and second sliders on its top surface, and each second protrusion having a corresponding set of second brake guide rails and second brake components on its side away from the second groove, and a second drive assembly disposed within the second groove.

[0012] Furthermore, the auxiliary motion platform also includes a corresponding third guide rail and a third slider, as well as a corresponding fourth guide rail and a fourth slider. The third guide rail is disposed on the third base and is connected to the fourth base via the third slider, and the third slider is slidable relative to the third guide rail along the first axis direction. The fourth guide rail is disposed on the fourth base and is connected to the substrate via the fourth slider, and the fourth slider is slidable relative to the fourth guide rail along the second axis direction.

[0013] Furthermore, the auxiliary motion platform includes two sets of corresponding third guide rails and third sliders, and two sets of corresponding fourth guide rails and fourth sliders; the third base has a third groove extending along the first axis and third protrusions located on both sides of the third groove, each of the third protrusions on both sides being provided with a set of corresponding third guide rails and third sliders, and the third drive assembly is disposed in the third groove; the fourth base has a fourth groove extending along the second axis and fourth protrusions located on both sides of the fourth groove, each of the fourth protrusions on both sides being provided with a set of corresponding fourth guide rails and fourth sliders, and the fourth drive assembly is disposed in the fourth groove.

[0014] Furthermore, the sample motion platform also includes a main control system, a command generator, a feedback controller, and an auxiliary motion controller. The main control system is used to control the command generator to issue a first control command. The feedback controller controls the first drive mechanism to output a first driving force and a second driving force based on the first control command. The feedback controller issues a second control command to the auxiliary motion controller. Alternatively, the main control system is used to control the command generator to issue a second control command. The auxiliary motion controller controls the second drive mechanism to output a third driving force and a fourth driving force based on the second control command.

[0015] Furthermore, the sample motion platform also includes a vacuum chamber, a support base, and a vibration isolator. The auxiliary motion platform and the sample stage are both located inside the vacuum chamber. The support base includes multiple legs, the vacuum chamber is located on top of the multiple legs, and the vibration isolator is located between the legs and the vacuum chamber.

[0016] Another aspect of this invention provides a control method for a sample motion platform, comprising: providing the aforementioned sample motion platform, the sample motion platform including an auxiliary motion platform and a sample stage disposed on the same base plate, the sample stage including a first driving mechanism and a support stage, the support stage being used to support a sample, the auxiliary motion platform including a second driving mechanism and a substrate, the first driving mechanism and the second driving mechanism having the same height; controlling the first driving mechanism to output a first driving force to move the support stage along a first axis while controlling the second driving mechanism to output a third driving force to move the substrate along the first axis, the first driving force and the third driving force having the same magnitude but opposite directions; controlling the first driving mechanism to output a second driving force to move the support stage along a second axis while controlling the second driving mechanism to output a fourth driving force to move the substrate along the second axis, the second driving force and the fourth driving force having the same magnitude but opposite directions.

[0017] In another aspect, the present invention provides a detection device, comprising: the aforementioned sample motion platform; an electron optical lens tube corresponding to the sample stage of the sample motion platform.

[0018] Furthermore, the sample motion platform also includes a laser interferometer, which is used to measure the position of the sample stage and feed back the measured relative position deviation between the sample stage and the electron optical tube to the main control system of the sample motion platform. The main control system controls the electron optical tube based on the relative position deviation to suppress vibration.

[0019] Compared with existing technologies, this invention achieves the following beneficial effects: To enable rapid nanometer-level calibration after the sample stage stops, thereby meeting the requirements of high-efficiency detection, this invention provides a sample motion platform including an auxiliary motion platform and a sample stage. The auxiliary motion platform and the sample stage are mounted on the same base plate. The auxiliary motion platform is used to counteract the vibration generated during the movement of the sample stage, thereby preventing vibration from causing electron beam deflection. Specifically, the sample stage includes a first driving mechanism and a support stage, and the auxiliary motion platform includes a second driving mechanism and a substrate. The first driving mechanism can drive the support stage to move along a first axis or a second axis, and the second driving mechanism can drive the substrate to move along the first axis or a second axis. The first driving force output by the first driving mechanism when it drives the support stage to move along the first axis is the same in magnitude but opposite in direction to the third driving force output by the second driving mechanism when it drives the substrate to move along the first axis. When the first driving mechanism moves the support stage along the second axis, the second driving force output is the same in magnitude and opposite in direction to the fourth driving force output when the second driving mechanism moves the substrate along the second axis. Thus, the driving forces output by the first and second driving mechanisms can cancel each other out. Furthermore, the first and second driving mechanisms have the same height, the same load, and the same center of gravity. This ensures that the motion of the auxiliary motion platform is highly consistent with the motion of the sample stage, thereby facilitating similar motion states and preventing additional torque from being generated when the two forces cancel each other out. This avoids equipment rotation interference, significantly improves the stability and effectiveness of vibration suppression, and can also more efficiently reduce the vibration impact generated during sample stage movement, shortening the settling time for the sample stage to reach nanometer-level vibration requirements, thus improving detection efficiency. Attached Figure Description

[0020] The accompanying drawings, which form part of this invention, are used to provide a further understanding of the invention. The illustrative embodiments and descriptions of the invention are used to explain the invention and do not constitute an undue limitation of the invention. In the drawings: Figure 1 A schematic diagram of the sample motion platform described in the embodiments of the present invention; Figure 2 A schematic diagram of the sample stage described in an embodiment of the present invention from one perspective; Figure 3 A schematic diagram of the sample stage described in an embodiment of the present invention from another perspective; Figure 4 A schematic diagram of the auxiliary motion platform described in an embodiment of the present invention from one perspective; Figure 5 A schematic diagram of the auxiliary motion platform described in an embodiment of the present invention from another perspective; Figure 6 A schematic diagram of the control system of the sample motion platform described in the embodiment of the present invention; Figure 7 A side view of the detection device described in the embodiment of the present invention; Figure 8 A top view of the detection device described in an embodiment of the present invention. Detailed Implementation

[0021] Analysis revealed that during the electron beam detection and measurement of wafers, both the external environment and the vibration of the sample stage significantly impact the detection and measurement results. The nanometer-level settling time of the sample stage also greatly affects detection efficiency. Existing vibration suppression technologies typically mitigate vibrations generated by the moving platform using active vibration isolation devices placed outside the vacuum environment. However, because the driving force and the force generated by the moving platform are not on the same plane, a certain torque is generated, causing rotation of the entire device and affecting vibration suppression. Furthermore, this method has a slow response to vibrations generated by the moving platform, which is not conducive to achieving high-speed detection. After the sample stage stops moving, a long settling time is also required to reach the nanometer-level vibration requirements for detection and measurement, which is detrimental to improving detection efficiency.

[0022] This invention addresses several issues related to environmental vibration, large vibrations generated during sample stage startup, torque generated when the vibration force and the suppression force are not on the same plane, and the inability to quickly achieve nanometer-level settling after the sample stage stops. It provides a sample motion platform, its control method, and a detection device. This approach helps mitigate the impact of environmental vibrations on detection. By employing an auxiliary motion platform to suppress large vibrations generated during sample stage startup, the stability and effectiveness of vibration suppression are significantly improved. It also more efficiently eliminates the vibration effects generated during sample stage movement, avoids generating additional torque, shortens the settling time for the sample stage to reach nanometer-level vibration requirements, and improves detection efficiency. To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not constitute a limitation thereof.

[0023] It should be noted that, unless otherwise specified, the embodiments and features described in the present invention can be combined with each other.

[0024] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," and "counterclockwise," etc., indicating orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this invention. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0025] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art will understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0026] The invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0027] refer to Figures 1 to 8This invention provides a sample motion platform, comprising: an auxiliary motion platform 4 and a sample stage 3 disposed on the same base plate; the sample stage 3 includes a first driving mechanism and a support platform, the support platform being used to carry a sample, the first driving mechanism being used to output a first driving force to drive the support platform to move along a first axis, and to output a second driving force to drive the support platform to move along a second axis; the auxiliary motion platform 4 includes a second driving mechanism and a substrate 411, the second driving mechanism being used to output a third driving force to drive the substrate 411 to move along the first axis, and to output a fourth driving force to drive the substrate 411 to move along the second axis; wherein the first driving mechanism and the second driving mechanism are at the same height, the load of the first driving mechanism is the same as the load of the second driving mechanism, the center of gravity of the load of the first driving mechanism is at the same height as the center of gravity of the load of the second driving mechanism, the first driving force and the third driving force are the same in magnitude but opposite in direction, and the second driving force and the fourth driving force are the same in magnitude but opposite in direction.

[0028] In some embodiments, the sample may be a wafer.

[0029] In some embodiments, the first axial direction can be Figure 1 The X-axis direction shown can be the second axis direction. Figure 1 The Y-axis direction shown in the diagram should be explained as follows: the first axis direction includes a first positive direction and a first negative direction, and the second axis direction includes a second positive direction and a second negative direction. When the first driving mechanism drives the support platform to move along the first positive direction, the second driving mechanism drives the substrate 411 to move along the first negative direction, and the magnitude of the force output by the first driving mechanism is the same as the magnitude of the force output by the second driving mechanism; when the first driving mechanism drives the support platform to move along the first negative direction, the second driving mechanism drives the substrate 411 to move along the first positive direction, and the magnitude of the force output by the first driving mechanism is the same as the magnitude of the force output by the second driving mechanism; when the first driving mechanism drives the support platform to move along the second negative direction, the second driving mechanism drives the substrate 411 to move along the second positive direction, and the magnitude of the force output by the first driving mechanism is the same as the magnitude of the force output by the second driving mechanism; when the first driving mechanism drives the support platform to move along the second positive direction, the second driving mechanism drives the substrate 411 to move along the second negative direction, and the magnitude of the force output by the first driving mechanism is the same as the magnitude of the force output by the second driving mechanism.

[0030] In some embodiments, reference Figure 3 The support stage includes a support plate 315 and a chuck 316. The chuck 316 is disposed on the support plate 315, which is disposed on the first drive mechanism. In some examples, the chuck 316 is an electrostatic chuck, which is used to adsorb and fix the wafer.

[0031] Further reference Figures 2 to 5The first driving mechanism includes a first driving component and a second driving component. The sample stage 3 also includes a first base 301 and a second base 308. The first base 301, the first driving component, the second base 308, the second driving component, and the support platform are arranged sequentially from bottom to top. The first base 301 is mounted on the base plate. The first driving component outputs a first driving force to drive the second base 308 to move relative to the first base 301 along a first axis. The second driving component outputs a second driving force to drive the support platform to move relative to the second base 308 along a second axis. The second driving mechanism includes a third driving component and a fourth driving component. The motion-assisted platform 4 also includes a third base 401 and a fourth base 406. The third base 401, the third drive assembly, the fourth base 406, the fourth drive assembly, and the substrate 411 are arranged sequentially from bottom to top. The third base 401 is mounted on the base plate. The third drive assembly is used to output a third driving force to drive the fourth base 406 to move relative to the third base 401 along the first axis direction. The fourth drive assembly is used to output a fourth driving force to drive the substrate 411 to move relative to the fourth base 406 along the second axis direction. The first drive assembly and the third drive assembly have the same height, and the second drive assembly and the fourth drive assembly have the same height.

[0032] Furthermore, the first drive component has the same structure as the third drive component, and the second drive component has the same structure as the fourth drive component.

[0033] In some embodiments, the first drive component is a linear motor, the third drive component is a linear motor configured the same as the first drive component; the second drive component is a linear motor, and the fourth drive component is a linear motor configured the same as the second drive component.

[0034] Furthermore, the load of the first drive component is the same as the load of the third drive component, and the load of the second drive component is the same as the load of the fourth drive component; the center of gravity height of the load of the first drive component is the same as the center of gravity height of the load of the third drive component, and the center of gravity height of the load of the second drive component is the same as the center of gravity height of the load of the fourth drive component.

[0035] It is understood that in some embodiments, the structure carried by the first drive component and the structure carried by the third drive component may not be exactly the same in shape and composition. Therefore, the structure carried by the first drive component and the structure carried by the third drive component can be designed with different materials so that the load of the first drive component is the same as the load of the third drive component. Similarly, the structure carried by the second drive component and the structure carried by the fourth drive component may not be exactly the same in shape and composition. Therefore, the structure carried by the second drive component and the structure carried by the fourth drive component can be designed with different materials so that the load of the second drive component is the same as the load of the fourth drive component.

[0036] Further reference Figure 2 and Figure 3 The first drive assembly includes a first motor stator 302 and a first motor mover 303. The first motor stator 302 is mounted on a first base 301. One end of the first motor mover 303 is connected to the first motor stator 302, and the other end of the first motor mover 303 is connected to a second base 308. The first motor mover 303 is movable relative to the first motor stator 302 along a first axis. The second drive assembly includes a second motor stator 309 and a second motor mover 310. The second motor stator 309 is mounted on a second base 308. One end of the second motor mover 310 is connected to the second motor stator 309, and the other end of the second motor mover 310 is connected to a support platform. The second motor mover 310 is movable relative to the second motor stator 309 along a second axis.

[0037] Further reference Figure 2 and Figure 3 The sample stage 3 also includes a corresponding first guide rail 306 and a first slider 307, as well as a corresponding second guide rail 313 and a second slider 314. The first guide rail 306 is disposed on the first base 301 and connected to the second base 308 via the first slider 307, and the first slider 307 is slidable relative to the first guide rail 306 along a first axis. The second guide rail 313 is disposed on the second base 308 and connected to the support stage via the second slider 314, and the second slider 314 is slidable relative to the second guide rail 313 along a second axis. The corresponding first guide rail 306 and first slider 307 are used to ensure the stability and directionality of the movement of the second base 308 relative to the first base 301 along the first axis. The corresponding second guide rail 313 and second slider 314 are used to ensure the stability and directionality of the movement of the support stage relative to the second base 308 along the second axis.

[0038] In some embodiments, a first guide rail 306 is provided with two first sliders 307, and a second guide rail 313 is provided with two second sliders 314.

[0039] Further reference Figure 2 and Figure 3The sample stage 3 also includes a corresponding first brake guide rail 304 and a first brake element 305, as well as a corresponding second brake guide rail 311 and a second brake element 312. The first brake guide rail 304 is disposed on the first base 301, and the first brake element 305 is connected to the second base 308, and the first brake element 305 is in contact with the first brake guide rail 304. When the first driving force output by the first drive assembly is non-zero, the first brake element 305 can slide relative to the first brake guide rail 304 along the first axis direction. When the first driving force output by the first drive assembly is zero, the first brake element 305 is slidable. The component 305 applies pressure to the first brake guide rail 304 to suppress the movement of the second base 308; the second brake guide rail 311 is disposed on the second base 308, the second brake component 312 is connected to the support platform, and the second brake component 312 is in contact with the second brake guide rail 311. When the second driving force output by the second drive assembly is not zero, the second brake component 312 can slide relative to the second brake guide rail 311 along the second axis direction. When the second driving force output by the second drive assembly is zero, the second brake component 312 applies pressure to the second brake guide rail 311 to suppress the movement of the support platform.

[0040] In other words, at the instant the control platform stops moving, the first brake component 305 applies pressure to the first brake guide rail 304, and the second brake component 312 applies pressure to the second brake guide rail 311, thereby increasing the friction between the brake component and the brake guide rail to suppress the movement of the platform. In this way, the platform can be quickly brought to a standstill, thereby greatly reducing the settling time and ensuring that the sample stage 3 quickly meets the nanometer-level vibration requirements for detection.

[0041] Further reference Figure 2 and Figure 3The sample stage 3 includes two sets of corresponding first guide rails 306 and first sliders 307, two sets of corresponding first brake rails and first brake components 305, two sets of corresponding second guide rails 313 and second sliders 314, and two sets of corresponding second brake guide rails 311 and second brake components 312. The first base 301 has a first groove extending along the first axis and first protrusions located on both sides of the first groove. Each first protrusion has a corresponding set of first guide rails 306 and first sliders 307 on its top surface, and a corresponding set of first brake guide rails 304 and first brake components 305 on the side away from the first groove. The first drive assembly is disposed in the first groove. The second base 308 has a second groove extending along the second axis and second protrusions located on both sides of the second groove. Each second protrusion has a corresponding set of second guide rails 313 and second sliders 314 on its top surface, and a corresponding set of second brake guide rails 311 and second brake components 312 on the side away from the second groove. The second drive assembly is disposed in the second groove. In this way, while ensuring a compact layout of components in sample stage 3, interference between components can be avoided.

[0042] Further reference Figure 4 and Figure 5 The third drive assembly includes a third motor stator 402 and a third motor mover 403. The third motor stator 402 is mounted on the third base 401. One end of the third motor mover 403 is connected to the third motor stator 402, and the other end of the third motor mover 403 is connected to the fourth base 406. The third motor mover 403 is movable relative to the third motor stator 402 along the first axis direction. The fourth drive assembly includes a fourth motor stator 407 and a fourth motor mover 408. The fourth motor stator 407 is mounted on the fourth base 406. One end of the fourth motor mover 408 is connected to the fourth motor stator 407, and the other end of the fourth motor mover 408 is connected to the base plate 411. The fourth motor mover 408 is movable relative to the fourth motor stator 407 along the second axis direction.

[0043] Further reference Figure 4 and Figure 5The auxiliary motion platform 4 also includes a corresponding third guide rail 404 and a third slider 405, as well as a corresponding fourth guide rail 409 and a fourth slider 410. The third guide rail 404 is disposed on the third base 401 and connected to the fourth base 406 via the third slider 405, and the third slider 405 is slidable relative to the third guide rail 404 along a first axis. The fourth guide rail 409 is disposed on the fourth base 406 and connected to the substrate 411 via the fourth slider 410, and the fourth slider 410 is slidable relative to the fourth guide rail 409 along a second axis. The corresponding third guide rail 404 and third slider 405 are used to ensure the stability and directionality of the movement of the fourth base 406 relative to the third base 401 along the first axis. The corresponding fourth guide rail 409 and fourth slider 410 are used to ensure the stability and directionality of the movement of the substrate 411 relative to the fourth base 406 along the second axis.

[0044] In some embodiments, a third guide rail 404 is provided with two third sliders 405, and a fourth guide rail 409 is provided with two fourth sliders 410.

[0045] Further reference Figure 4 and Figure 5 The auxiliary motion platform 4 includes two sets of corresponding third guide rails 404 and third sliders 405, and two sets of corresponding fourth guide rails 409 and fourth sliders 410. The third base 401 has a third groove extending along a first axis and third protrusions located on both sides of the third groove. Each of the third protrusions on both sides is provided with a corresponding third guide rail 404 and third slider 405. The third drive assembly is disposed within the third groove. The fourth base 406 has a fourth groove extending along a second axis and fourth protrusions located on both sides of the fourth groove. Each of the fourth protrusions on both sides is provided with a corresponding fourth guide rail 409 and fourth slider 410. The fourth drive assembly is disposed within the fourth groove. This design ensures a compact layout of components in the auxiliary motion platform 4 while preventing interference between components.

[0046] Further reference Figure 6 The sample motion platform also includes a main control system, a command generator, a feedback controller, and an auxiliary motion controller. The main control system is used to control the command generator to issue a first control command. The feedback controller controls the first drive mechanism to output a first driving force and a second driving force based on the first control command. The feedback controller issues a second control command to the auxiliary motion controller. Alternatively, the main control system is used to control the command generator to issue a second control command. The auxiliary motion controller controls the second drive mechanism to output a third driving force and a fourth driving force based on the second control command.

[0047] In some embodiments, the feedback controller also acquires the motion parameters of the sample stage 3 and issues a second control command to the auxiliary motion controller based on the motion parameters of the sample stage 3. Thus, the auxiliary motion controller corrects the motion parameters of the auxiliary motion platform 4 in real time according to the actual motion parameters of the sample stage 3, thereby improving the vibration suppression effect.

[0048] Further reference Figure 7 The sample motion platform also includes a vacuum chamber 2, a support base, and a vibration isolator 7. The auxiliary motion platform 4 and the sample stage 3 are both located within the vacuum chamber 2. Specifically, the auxiliary motion platform 4 and the sample stage 3 are both mounted on the bottom plate of the vacuum chamber 2. The support base includes multiple legs 8, and the vacuum chamber 2 is located on top of the legs 8. The vibration isolator 7 is located between the legs 8 and the vacuum chamber 2. It should be noted that a corresponding vibration isolator 7 is installed between each leg 8 and the vacuum chamber 2. The vibration isolator 7 can mitigate the vibration impact of external environmental vibrations on the sample stage 3. The placement of both the auxiliary motion platform 4 and the sample stage 3 inside the vacuum chamber 2 helps ensure a consistent motion environment for both, thus facilitating the cancellation of lifting forces.

[0049] In some examples, the support base includes four legs 8, and the sample motion platform includes four vibration isolators 7.

[0050] Another aspect of this invention provides a control method for a sample motion platform, comprising: providing the aforementioned sample motion platform, the sample motion platform including an auxiliary motion platform 4 and a sample stage 3 disposed on the same base plate, the sample stage 3 including a first driving mechanism and a support platform, the support platform being used to support a sample, the auxiliary motion platform 4 including a second driving mechanism and a substrate 411, the first driving mechanism and the second driving mechanism having the same height; controlling the first driving mechanism to output a first driving force to move the support platform along a first axis direction, while controlling the second driving mechanism to output a third driving force to move the substrate 411 along the first axis direction, the first driving force and the third driving force having the same magnitude but opposite directions; controlling the first driving mechanism to output a second driving force to move the support platform along a second axis direction, while controlling the second driving mechanism to output a fourth driving force to move the substrate 411 along the second axis direction, the second driving force and the fourth driving force having the same magnitude but opposite directions. It should be noted that parts that are the same as or corresponding to the aforementioned embodiments can be referred to the aforementioned embodiments, and will not be repeated here.

[0051] In another aspect, this invention also provides a detection device, as shown in the reference. Figure 7 and Figure 8 It includes: the aforementioned sample motion platform; an electron optical lens 1, which corresponds to the sample stage 3 of the sample motion platform. It should be noted that parts that are the same as or corresponding to those in the aforementioned embodiments can be referred to in the aforementioned embodiments, and will not be repeated here.

[0052] In some embodiments, the output end of the electron optical lens tube 1 extends into the vacuum chamber 2, and the output end of the electron optical lens tube 1 is located above the support stage.

[0053] Furthermore, the sample motion platform also includes a laser interferometer 11. The laser interferometer 11 is used to measure the position of the sample stage 3 and feeds back the measured relative position deviation between the sample stage 3 and the electron optical tube 1 to the main control system of the sample motion platform. The main control system controls the electron optical tube 1 based on the relative position deviation to suppress vibration. Specifically, the main control system controls the electron optical tube 1 to correct the scanning trajectory of the electron beam based on the relative position deviation, ensuring that even with slight residual vibrations, the electron beam can still be accurately focused, thereby ensuring that the detection equipment has high detection accuracy and precision.

[0054] In some embodiments, a first reflector 13 is provided on the support platform, a second reflector 12 is provided on the electron optical lens barrel 1, a laser interferometer 11 cooperates with the first reflector 13 to measure the position of the sample stage 3, and a laser interferometer 11 cooperates with the second reflector 12 to measure the position of the electron optical lens barrel 1, thereby obtaining the relative positional deviation between the sample stage 3 and the electron optical lens barrel 1.

[0055] In some embodiments, the sample motion platform further includes a vacuum manipulator 5 disposed within the vacuum chamber 2. The detection device also includes an outer frame 9, a loadlock chamber 6, and an EFEM 10. The sample motion platform and the loadlock chamber 6 are both disposed within the outer frame 9. One end of the loadlock chamber 6 is connected to the vacuum chamber 2, and the other end of the loadlock chamber 6 is connected to the EFEM 10. The outer frame 9 is used to isolate the interior of the detection device from the external environment to reduce the impact of environmental noise and magnetic fields on the detection. The EFEM 10, the loadlock chamber 6, and the vacuum manipulator 5 are used to transfer samples and ensure the cleanliness of the device interior during sample transfer.

[0056] It should be understood that the various forms of processes shown above can be used to reorder, add, or delete steps. For example, the steps described in this invention disclosure can be executed in parallel, sequentially, or in different orders, as long as the desired result of the technical solution disclosed in this invention can be achieved, and this is not limited herein.

[0057] The specific embodiments described above do not constitute a limitation on the scope of protection of this invention. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this invention should be included within the scope of protection of this invention.

Claims

1. A sample motion platform, characterized in that, include: The auxiliary motion platform (4) and the sample stage (3) are set on the same base plate. The sample stage (3) includes a first driving mechanism and a support stage. The support stage is used to carry the sample. The first driving mechanism is used to output a first driving force to drive the support stage to move along a first axis direction, and to output a second driving force to drive the support stage to move along a second axis direction. The auxiliary motion platform (4) includes a second drive mechanism and a base plate (411). The second drive mechanism is used to output a third drive force to drive the base plate (411) to move along the first axis direction, and to output a fourth drive force to drive the base plate (411) to move along the second axis direction. Wherein, the first driving mechanism and the second driving mechanism are at the same height, the load center of gravity of the first driving mechanism is at the same height as the load center of gravity of the second driving mechanism, the load of the first driving mechanism is the same as the load of the second driving mechanism, the first driving force and the third driving force are the same in magnitude but opposite in direction, and the second driving force and the fourth driving force are the same in magnitude but opposite in direction.

2. The sample motion platform according to claim 1, characterized in that, The first driving mechanism includes a first driving component and a second driving component. The sample stage (3) also includes a first base (301) and a second base (308). The first base (301), the first driving component, the second base (308), the second driving component, and the support platform are arranged sequentially from bottom to top. The first base (301) is disposed on the base plate. The first driving component is used to output the first driving force to drive the second base (308) to move relative to the first base (301) along the first axis direction. The second driving component is used to output the second driving force to drive the support platform to move relative to the second base (308) along the second axis direction. The second driving mechanism includes a third driving component and a fourth driving component. The auxiliary motion platform (4) also includes a third base (401) and a fourth base (406). The third base (401), the third driving component, the fourth base (406), the fourth driving component, and the substrate (411) are arranged sequentially from bottom to top. The third base (401) is disposed on the base plate. The third driving component is used to output the third driving force to drive the fourth base (406) to move relative to the third base (401) along the first axis direction. The fourth driving component is used to output the fourth driving force to drive the substrate (411) to move relative to the fourth base (406) along the second axis direction. The first driving component and the third driving component have the same height, and the second driving component and the fourth driving component have the same height.

3. The sample motion platform according to claim 2, characterized in that, The first driving component has the same structure as the third driving component, and the second driving component has the same structure as the fourth driving component.

4. The sample motion platform according to claim 2, characterized in that, The load of the first drive component is the same as the load of the third drive component, and the load of the second drive component is the same as the load of the fourth drive component; the center of gravity height of the load of the first drive component is the same as the center of gravity height of the load of the third drive component, and the center of gravity height of the load of the second drive component is the same as the center of gravity height of the load of the fourth drive component.

5. The sample motion platform according to claim 2, characterized in that, The first drive assembly includes a first motor stator (302) and a first motor mover (303). The first motor stator (302) is disposed on the first base (301). One end of the first motor mover (303) is connected to the first motor stator (302), and the other end of the first motor mover (303) is connected to the second base (308). The first motor mover (303) is movable relative to the first motor stator (302) along a first axis direction. The second drive assembly includes a second motor stator (309) and a second motor mover (310). The second motor stator (309) is disposed on the second base (308). One end of the second motor mover (310) is connected to the second motor stator (309), and the other end of the second motor mover (310) is connected to the support platform. The second motor mover (310) is movable relative to the second motor stator (309) along the second axis direction.

6. The sample motion platform according to claim 2, characterized in that, The sample stage (3) also includes a corresponding first guide rail (306) and a first slider (307), as well as a corresponding second guide rail (313) and a second slider (314). The first guide rail (306) is disposed on the first base (301), the first guide rail (306) is connected to the second base (308) through the first slider (307), and the first slider (307) is slidable relative to the first guide rail (306) along the first axis direction; The second guide rail (313) is disposed on the second base (308), the second guide rail (313) is connected to the support platform through the second slider (314), and the second slider (314) is slidable relative to the second guide rail (313) along the second axis direction.

7. The sample motion platform according to claim 6, characterized in that, The sample stage (3) also includes a corresponding first brake guide rail (304) and a first brake component (305), as well as a corresponding second brake guide rail (311) and a second brake component (312). The first brake guide rail (304) is disposed on the first base (301), the first brake member (305) is connected to the second base (308), and the first brake member (305) is in contact with the first brake guide rail (304). When the first driving force output by the first drive assembly is not zero, the first brake member (305) can slide relative to the first brake guide rail (304) along the first axis direction. When the first driving force output by the first drive assembly is zero, the first brake member (305) applies pressure to the first brake guide rail (304) to suppress the movement of the second base (308). The second brake guide rail (311) is disposed on the second base (308), the second brake member (312) is connected to the support platform, and the second brake member (312) is in contact with the second brake guide rail (311). When the second driving force output by the second drive assembly is non-zero, the second brake member (312) is slidable relative to the second brake guide rail (311) along the second axis direction. When the second driving force output by the second drive assembly is zero, the second brake member (312) applies pressure to the second brake guide rail (311) to suppress the movement of the support platform.

8. The sample motion platform according to claim 7, characterized in that, The sample stage (3) includes two sets of corresponding first guide rails (306) and first sliders (307), two sets of corresponding first brake rails and first brake components (305), two sets of corresponding second guide rails (313) and second sliders (314), and two sets of corresponding second brake guide rails (311) and second brake components (312). The first base (301) has a first groove extending along the first axis and first protrusions located on both sides of the first groove. Each first protrusion has a set of corresponding first guide rails (306) and first sliders (307) on its top surface. Each first protrusion has a set of corresponding first brake guide rails (304) and first brake components (305) on its side away from the first groove. The first drive assembly is disposed in the first groove. The second base (308) has a second groove extending along the second axis and second protrusions located on both sides of the second groove. Each second protrusion has a set of corresponding second guide rails (313) and second sliders (314) on its top surface. Each second protrusion has a set of corresponding second brake guide rails (311) and second brake components (312) on its side away from the second groove. The second drive assembly is disposed in the second groove.

9. The sample motion platform according to claim 2, characterized in that, The auxiliary motion platform (4) further includes a corresponding third guide rail (404) and a third slider (405), as well as a corresponding fourth guide rail (409) and a fourth slider (410). The third guide rail (404) is disposed on the third base (401). The third guide rail (404) is connected to the fourth base (406) through the third slider (405), and the third slider (405) is slidable relative to the third guide rail (404) along the first axis direction. The fourth guide rail (409) is disposed on the fourth base (406), the fourth guide rail (409) is connected to the substrate (411) through the fourth slider (410), and the fourth slider (410) is slidable relative to the fourth guide rail (409) along the second axis direction.

10. The sample motion platform according to claim 9, characterized in that, The auxiliary motion platform (4) includes two sets of corresponding third guide rails (404) and third sliders (405) as well as two sets of corresponding fourth guide rails (409) and fourth sliders (410). The third base (401) has a third groove extending along the first axis and third protrusions located on both sides of the third groove. Each of the third protrusions on both sides is provided with a set of corresponding third guide rails (404) and third sliders (405). The third drive assembly is disposed in the third groove. The fourth base (406) has a fourth groove extending along the second axis and fourth protrusions located on both sides of the fourth groove. Each of the fourth protrusions on both sides is provided with a set of corresponding fourth guide rails (409) and fourth sliders (410). The fourth drive assembly is disposed in the fourth groove.

11. The sample motion platform according to claim 1, characterized in that, The sample motion platform further includes a main control system, a command generator, a feedback controller, and an auxiliary motion controller. The main control system is used to control the command generator to issue a first control command. The feedback controller controls the first drive mechanism to output the first driving force and the second driving force based on the first control command. The feedback controller issues a second control command to the auxiliary motion controller. Alternatively, the main control system is used to control the command generator to issue a second control command. The auxiliary motion controller controls the second drive mechanism to output the third driving force and the fourth driving force based on the second control command.

12. The sample motion platform according to claim 1, characterized in that, The sample motion platform also includes a vacuum chamber (2), a support base and a vibration isolator (7). The auxiliary motion platform (4) and the sample stage (3) are both located in the vacuum chamber (2). The support base includes multiple legs (8). The vacuum chamber (2) is located on top of the multiple legs (8). The vibration isolator (7) is located between the legs (8) and the vacuum chamber (2).

13. A control method for a sample motion platform, characterized in that, include: A sample motion platform according to any one of claims 1 to 12 is provided, the sample motion platform comprising an auxiliary motion platform (4) and a sample stage (3) disposed on the same base plate, the sample stage (3) comprising a first drive mechanism and a support stage, the support stage being used to support a sample, the auxiliary motion platform (4) comprising a second drive mechanism and a base plate (411), the first drive mechanism and the second drive mechanism having the same height; While controlling the first driving mechanism to output a first driving force to drive the support platform to move along the first axis direction, the second driving mechanism is controlled to output a third driving force to drive the substrate (411) to move along the first axis direction. The first driving force and the third driving force are the same in magnitude and opposite in direction. While controlling the first driving mechanism to output a second driving force to drive the support platform to move along the second axis, the second driving mechanism is controlled to output a fourth driving force to drive the substrate (411) to move along the second axis. The second driving force and the fourth driving force are the same in magnitude but opposite in direction.

14. A testing device, characterized in that, include: The sample motion platform according to any one of claims 1 to 12; Electro-optical lens tube (1), which corresponds to the sample stage (3) of the sample motion platform.

15. The sample motion platform according to claim 14, characterized in that, The sample motion platform also includes a laser interferometer (11), which is used to measure the position of the sample stage (3) and feed back the relative position deviation between the sample stage (3) and the electron optical tube (1) to the main control system of the sample motion platform. The main control system controls the electron optical tube (1) based on the relative position deviation to suppress vibration.

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