Surface micro-discharge seed batch processing system and method for self-adaptive product regulation and control mode aiming at seed types

Abstract

The invention provides a surface micro-discharge seed batch processing system and a surface micro-discharge seed batch processing method for adaptively regulating and controlling a product mode according to seed types. The surface micro-discharge seed batch processing system comprises a reaction device, a high-voltage power supply, a parameter detection system and an automatic voltage regulating system, the reaction device comprises a reaction chamber, a high-voltage electrode and a grounding grid electrode which are arranged in the reaction chamber, a dielectric sheet arranged between the high-voltage electrode and the grounding grid electrode, and an observation window arranged at the bottom of the reaction chamber; the parameter detection system is used for detecting discharge parameters and environmental parameters in the reaction device in real time; and the automatic voltage regulating system is in communication connection with the high-voltage power supply and the parameter detection system and is used for dynamically regulating the output voltage of the high-voltage power supply based on the parameters detected by the parameter detection system so as to stabilize a plasma product mode in a target mode. The atmospheric pressure air discharge plasma treatment device is used for promoting seed germination and can flexibly switch product modes based on seed types.

Description

Technical Field

[0001] This invention belongs to the field of discharge plasma technology and relates to a surface micro-discharge plasma reaction device. Specifically, it relates to an atmospheric pressure air discharge plasma treatment device and method for promoting seed germination and flexibly switching product modes based on seed type. Background Technology

[0002] Atmospheric pressure cold plasma obtained from air discharge can generate various reactive oxygen species (such as O, OH, O3, and H2O2) and reactive nitrogen species (such as NO, NO2, and ONOO) in an atmospheric environment close to room temperature. ⁻ While possessing high activity, it can avoid the thermal damage and environmental pollution problems that may occur to the treated materials, making it a valuable tool for applications in biomedicine, food sterilization, wastewater treatment, space technology, air purification and material surface modification.

[0003] In early agricultural explorations, low-pressure plasma treatment has been used to promote seed germination. Compared to traditional methods, atmospheric pressure plasma treatment has attracted much attention due to its advantages such as low cost and ease of operation. Studies have shown that factors such as plasma source structure, discharge voltage amplitude and frequency, gas environment, and treatment time all affect its treatment effect. The resulting plasma dosage is a key parameter; excessive treatment can damage plant tissue, making it crucial to balance the promoting and inhibiting effects.

[0004] Power supply parameters (including drive source type, voltage amplitude, and frequency) directly affect plasma characteristics and discharge states. As the injected energy (discharge power and discharge time) increases, the air plasma sequentially evolves into the aforementioned O3 mode, transition mode, and NO mode. x There are three product modes. Most existing plasma seed treatment devices generate active particles (mainly O3) in the air through dielectric barrier discharge, which are used to oxidize the seed coat, sterilize, and thus promote seed germination. The impact of different product modes on seed germination rate has not yet been reliably studied.

[0005] Currently, there are many plasma seed treatment devices on the market. For example, patent CN106508170A proposes a seed treatment device to improve the drought resistance of wheat seedlings. This device uses a stainless steel sheet as a high-voltage electrode, a quartz glass plate directly below the high-voltage electrode as a discharge medium, and a metal mesh as a grounding electrode. It generates plasma through an adjustable AC high-voltage power supply (0-50kV) to treat wheat seeds, promoting germination and seedling growth under drought conditions. This solution only treats one type of crop seed and does not involve automatic voltage control or mode switching. Patent CN119073045A proposes a rotary plasma seed treatment device with a coaxial DBD structure. The inner and outer glass tubes rotate in opposite directions, causing the seeds to tumble and advance within a spiral channel, aiming to achieve uniform treatment of the entire seed surface. However, its structure is complex (dual-motor drive, spiral pipe), costly, and difficult to quickly clean and change seed batches. It is not suitable for large-scale agricultural applications that prioritize simplicity, low cost, and easy maintenance. The dielectric barrier discharge seed treatment device proposed in patent CN110036717A uses a stainless steel mesh as the high-voltage electrode and ground electrode, and quartz glass as the barrier medium. Seeds are placed between the high-voltage electrode and an intermediate dielectric cover, and processed under normal pressure. The difference between this device and the present invention is that it does not involve product mode switching; the purpose of discharge parameter adjustment is only to maintain discharge stability, not to regulate product composition. Solutions such as CN106508170A have a single product mode and cannot be differentiated according to seed characteristics; solutions such as CN119073045A have complex structures and high costs, which are not conducive to large-scale application; and solutions such as CN110036717A adjust discharge parameters not to regulate product composition, thus having limited intelligence. Summary of the Invention

[0006] In view of this, the purpose of the present invention is to provide a surface micro-discharge seed batch processing system and method that adaptively adjusts the product mode according to seed type, which is used to promote seed germination and can flexibly switch the product mode based on seed type.

[0007] To achieve the above objectives, the present invention adopts the following technical solution: a surface micro-discharge seed batch processing system for adaptively regulating product mode based on seed type, comprising: a reaction device (1), a high-voltage power supply (2), a parameter detection system, and an automatic voltage regulation system; The reaction device (1) includes a reaction chamber (16), a high-voltage electrode (12) and a grounding grid electrode (15) disposed in the reaction chamber (16), and a dielectric sheet (14) disposed between the high-voltage electrode (12) and the grounding grid electrode (15). The high-voltage power supply (2) is electrically connected to the high-voltage electrode (12) and is used to provide a discharge voltage for the reaction device (1); The parameter detection system is used to detect the discharge parameters and environmental parameters in the reaction device (1) in real time; The automatic voltage regulation system is communicatively connected to the high-voltage power supply (2) and the parameter detection system, and is used to dynamically adjust the output voltage of the high-voltage power supply (2) based on the parameters detected by the parameter detection system, so as to stabilize the plasma product mode in the target mode.

[0008] In a preferred embodiment, the parameter detection system includes: The electrical parameter detection unit includes an oscilloscope (3), a high-voltage probe (4), and a current transformer (5) for detecting discharge voltage and discharge current; The gas concentration detection unit includes an O3 gas sensor (7) and an NO gas sensor (8) disposed in the reaction chamber (16), for detecting the gas concentrations of O3 and NO, respectively; and The temperature detection unit includes a temperature sensor (6) disposed in the reaction chamber (16) for detecting the reaction temperature.

[0009] In a preferred embodiment, the parameter detection system further includes a camera (11) for acquiring images of the seeds inside the reaction chamber (16).

[0010] In a preferred embodiment, the automatic voltage regulation system includes an embedded development platform (9), which is configured to: identify seed types based on images captured by the camera; retrieve corresponding target product modes and target parameters from a pre-stored optimal product mode database according to the identified seed types, the target parameters including target gas concentration and target temperature threshold; and adjust the output voltage of the high-voltage power supply (2) by a control algorithm based on the deviation between the real-time data fed back by the gas concentration detection unit and the temperature detection unit and the target parameters.

[0011] In a preferred embodiment, the automatic voltage regulation system follows a safety-first dual-objective control strategy: when the detected reaction temperature exceeds the safety threshold, the output voltage of the high-voltage power supply (2) is reduced first to control the temperature rise; when the detected target gas concentration is lower than the lower limit of the set range and the temperature does not exceed the limit, the output voltage of the high-voltage power supply (2) is increased to enhance the discharge; when both the gas concentration and temperature are within the ideal range, the current voltage is maintained for stable output.

[0012] In a preferred embodiment, the reaction apparatus (1) further includes: A sealing cap (13), made of insulating material, is used to achieve a tight seal of the reaction chamber (16); and An observation window (19) is located at the bottom of the reaction chamber (16) and is made of transparent insulating material to facilitate image acquisition by the camera (11).

[0013] In a preferred embodiment, the dielectric sheet (14) is made of alumina ceramic, quartz glass or mica, and has a thickness between 0.5 mm and 2 mm.

[0014] This invention also provides a method for batch processing of surface micro-discharge seeds that adaptively regulates product modes based on seed type. The method utilizes the aforementioned surface micro-discharge seed batch processing system that adaptively regulates product modes based on seed type, and includes the following steps: Seed loading and chamber sealing steps: The pretreated seeds are loaded into the reaction chamber (16) in batches and the chamber is sealed; Mode selection and parameter setting steps: Determine the type of seed to be processed based on the image recognition module, and set the target product mode and corresponding target parameters based on the pre-stored optimal product mode database; Plasma processing steps: The high-voltage power supply (2) is activated to generate plasma for seed processing. Simultaneously, the discharge parameters and environmental parameters are monitored in real-time by a parameter detection system, and the output voltage of the high-voltage power supply (2) is dynamically adjusted by an automatic voltage regulation system to stabilize the product mode; and Settling and post-processing steps: After stopping the discharge, let the seeds stand in a chamber filled with active gas for a preset time, and then take them out.

[0015] In a preferred embodiment, the target product mode includes an O3-dominant mode and a NO-dominant mode. x Dominant mode; For mung bean or wheat seeds, select the O3-dominant mode for treatment; For buckwheat seeds, choose NO. x The dominant mode is used for processing.

[0016] In a preferred embodiment, the automatic voltage regulation system uses a proportional-integral-derivative control, incremental control, or fuzzy control algorithm to dynamically fine-tune the output voltage of the high-voltage power supply (2).

[0017] Compared with the prior art, the present invention has the following beneficial effects: 1. Flexible and adjustable product mode: O3 and NO can be reacted by adjusting the voltage. x The mode can be switched to adapt to different seed processing needs.

[0018] 2. Parameter Adaptation and Precise Control: By conducting preliminary research to build an optimal processing database based on seed type, different product modes and working parameters can be called according to the seed type.

[0019] 3. High degree of automation: The entire process from automatic identification to intelligent voltage regulation requires no manual intervention, which significantly reduces the difficulty of operation and human error, and ensures a high degree of consistency and repeatability of the treatment effect of different batches of seeds.

[0020] 4. Simple equipment structure and low cost: It has no complex components, few parts, few potential failure points, and is extremely convenient to assemble and maintain, making it easy to integrate into existing agricultural facilities. The device mainly uses conventional industrial materials and air as a raw material, requiring no chemical reagents, resulting in low cost and suitability for agricultural production.

[0021] 5. Easy to operate: The design of this device fully considers the actual operating experience of end users. From the seed spreading and placement into the chamber to the sealing process, the steps are clear and the training threshold is low; the display screen shows all data in real time, and the status is clear at a glance; after startup, no manual intervention or complex power adjustment is required. Attached Figure Description

[0022] Figure 1 This is a system diagram of the SMD surface micro-discharge device according to a preferred embodiment of the present invention; Figure 2 A diagram of a preferred embodiment of the SMD surface micro-discharge device of the present invention is shown. Figure 3 This is a schematic diagram of the system flow of a preferred embodiment of the present invention; Figure 4 This is a comparison diagram of the growth status of mung beans according to a preferred embodiment of the present invention; Figure 5 This is a comparison diagram of wheat growth status according to a preferred embodiment of the present invention; Figure 6 This is a comparison diagram of buckwheat growth in a preferred embodiment of the present invention. Detailed Implementation

[0023] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0024] It should be noted that the following detailed descriptions are illustrative and intended to provide further explanation of this application. Unless otherwise specified, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0025] It should be noted that the terminology used herein is for the purpose of describing particular implementations only and is not intended to limit the exemplary implementations according to this application; as used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise; furthermore, it should be understood that when the terms “comprising” and / or “including” are used in this specification, they indicate the presence of features, steps, operations, devices, components and / or combinations thereof.

[0026] A surface micro-discharge seed batch processing system that adaptively regulates product modes based on seed type, referenced Figure 1-6 It includes: reaction device 1, high voltage power supply 2, parameter detection system and automatic voltage regulation system; The reaction device 1 includes a reaction chamber 16, a high-voltage electrode 12 and a grounding grid electrode 15 disposed in the reaction chamber 16, and a dielectric sheet 14 disposed between the high-voltage electrode 12 and the grounding grid electrode 15. The high-voltage power supply 2 is electrically connected to the high-voltage electrode 12 and is used to provide discharge voltage for the reaction device 1; the output voltage adjustment range of the high-voltage power supply 2 is 0 to 30kV, and the frequency adjustment range is 1kHz to 100kHz.

[0027] The parameter detection system is used to detect the discharge parameters and environmental parameters within the reaction device 1 in real time. The automatic voltage regulation system is communicatively connected to the high-voltage power supply 2 and the parameter detection system, and is used to dynamically adjust the output voltage of the high-voltage power supply 2 based on the parameters detected by the parameter detection system, so as to stabilize the plasma product mode at the target mode.

[0028] The parameter detection system includes: The electrical parameter detection unit includes an oscilloscope 3, a high-voltage probe 4, and a current transformer 5, which are used to detect discharge voltage and discharge current. The gas concentration detection unit includes an O3 gas sensor 7 and an NO gas sensor 8 disposed within the reaction chamber 16, for detecting the gas concentrations of O3 and NO, respectively; and The temperature detection unit includes a temperature sensor 6 disposed in the reaction chamber 16 for detecting the reaction temperature.

[0029] The reaction chamber 16 has two sealable circular outlets on its side, namely a gas concentration detection interface 17 and a temperature detection interface 18. The gas concentration detection interface 17 is used to connect the O3 gas sensor 7 and the NO gas sensor 8, and the temperature detection interface 18 is used to connect the temperature sensor 6.

[0030] The parameter detection system also includes a camera 11, which is used to acquire images of the seeds inside the reaction chamber 16.

[0031] The automatic voltage regulation system includes an embedded development platform 9 and a display screen 10. The embedded development platform 9 is configured to: identify seed types based on images captured by the camera; retrieve the corresponding target product mode and target parameters from a pre-stored optimal product mode database according to the identified seed type, the target parameters including target gas concentration and target temperature threshold; and display the deviation between real-time data fed back by the gas concentration detection unit and the temperature detection unit and the target parameters on the display screen 10 for user confirmation. The output voltage of the high-voltage power supply 2 is adjusted through a control algorithm.

[0032] The real-time temperature is detected by temperature sensor 6 within reaction chamber 16; the gas concentration is detected by NO gas sensor 7 and O3 gas sensor 8 within reaction chamber 16. Each sensor transmits data to the embedded development platform 9, which ultimately displays the voltage and current characteristic parameters (average or peak-to-peak values, etc.), temperature, and gas concentration on the screen. The embedded development platform 9 can be configured using Raspberry Pi, microcontroller, etc., depending on requirements. It can also be expanded to include various sensor types such as NO2 gas concentration and humidity. The automatic voltage regulation system follows a safety-first dual-objective control strategy: when the monitored reaction temperature exceeds a safety threshold, the output voltage of the high-voltage power supply 2 is preferentially reduced to control the temperature rise; when the monitored target gas concentration is below the lower limit of the set range and the temperature does not exceed the limit, the output voltage of the high-voltage power supply 2 is increased to enhance discharge; when both the gas concentration and temperature are within the ideal range, the current voltage is maintained at a stable output.

[0033] Specifically, when the discharge is not in the optimal product mode, the voltage can be increased or decreased to supply NO. x Or, O3 mode shift. When the target gas concentration is detected to be below the lower limit of the set range, it indicates insufficient discharge intensity. The output voltage of high-voltage power supply 2 is increased to enhance discharge and increase the formation of target products, while avoiding product mode shift. When the temperature is detected to exceed the safety threshold, it indicates a risk of thermal damage. The output voltage of high-voltage power supply 2 is reduced to weaken the discharge and control the temperature rise. When both gas concentration and temperature are within the ideal range, the system maintains a stable output voltage.

[0034] The reaction apparatus 1 further includes: The sealing cap 13, made of insulating material, is used to seal the reaction chamber 16 and ensure the stability of the gaseous product concentration during the process. The cylindrical portion of the high-voltage electrode 12 is enclosed within the sealing cap 13, with only its bottom surface in contact with the dielectric sheet 14. The small cylindrical portion is exposed and connected to the high-voltage power supply 2. The observation window 19 is located at the bottom of the reaction chamber 16 and is made of transparent insulating material to facilitate image acquisition by the camera 11.

[0035] The dielectric sheet 14 is made of alumina ceramic, quartz glass or mica, with a thickness between 0.5 mm and 2 mm. It is a key factor affecting the product mode conversion characteristics. The grounding grid electrode 15 is a dense stainless steel mesh. When the SMD is working normally, plasma is generated in its gaps.

[0036] A method for batch processing of surface micro-discharge seeds that adaptively regulates product modes based on seed type includes the following steps: Seed loading and chamber sealing steps: The pretreated seeds are loaded into the reaction chamber 16 in batches and the chamber is sealed. Mode selection and parameter setting steps: Determine the type of seed to be processed based on the image recognition module, and set the target product mode and corresponding target parameters based on the pre-stored optimal product mode database; Plasma treatment steps: High-voltage power supply 2 is activated to generate plasma for seed treatment. Simultaneously, a parameter detection system monitors discharge and environmental parameters in real time, and an automatic voltage regulation system dynamically adjusts the output voltage of high-voltage power supply 2 to stabilize the product mode; and Settling and post-processing steps: After stopping the discharge, let the seeds stand in a chamber filled with active gas for a preset time, and then take them out.

[0037] The target product mode includes the O3-dominant mode and NO. x Dominant mode; For mung bean or wheat seeds, select the O3-dominant mode for treatment; For buckwheat seeds, choose NO. x The dominant mode is used for processing.

[0038] The automatic voltage regulation system uses proportional-integral-derivative control, incremental control, or fuzzy control algorithms to dynamically fine-tune the output voltage of the high-voltage power supply 2.

[0039] Combination Figure 3 The seed treatment method of the present invention includes the following steps: 1. Seed loading and chamber sealing: After pretreatment (soaking and absorbing water for 12 hours), the seeds are placed in batches into the reaction chamber 16 and the chamber is closed.

[0040] 2. Mode Selection and Parameter Setting: The image recognition module determines the type of seed to be processed (e.g., mung beans, wheat, buckwheat, etc.), and based on the pre-established database of optimal product modes for multiple seeds, the product mode and corresponding parameters are determined in the control system. For example, for mung beans and wheat, the "O3 mode" and its corresponding parameters are selected; for buckwheat, the "NO" mode is selected.x The "mode" and its corresponding parameters are displayed on the screen.

[0041] 3. Plasma Treatment: Start high-voltage power supply 2, ensuring it outputs the voltage of the set mode. This generates plasma of the corresponding mode in the SMD reactor, containing active particles (O3 or NO). x The gas permeates the chamber, providing comprehensive treatment for the seeds. During the treatment, the parameter detection system monitors the discharge voltage, current, power, gas concentration, and temperature in real time, and inputs the data into the embedded development platform 9, displaying it on the screen 10. Simultaneously, the data is processed and compared. When the gas concentration or temperature exceeds the preset range, the controller adjusts the voltage appropriately based on the control algorithm to ensure the stability of the concentration and temperature.

[0042] 4. Settling and Post-treatment: After the discharge stops, allow the seeds to stand in a chamber filled with active gas for a period of time (e.g., 5 minutes) to enhance the treatment effect. Then remove the seeds and place them in a petri dish.

[0043] Here, mung bean, wheat, and buckwheat seeds are selected as examples to describe the technical solutions in the embodiments of the invention in more detail. The described embodiments are some embodiments of the present invention, but not all embodiments. Seeds were evenly spread in petri dishes lined with moistened culture towels at a density of 100 seeds per group, awaiting treatment. A control group without any treatment was set up in the experiment. The water supply to each group was strictly controlled to ensure constant variables. Subsequently, the germination status of each plant seed was recorded and images were acquired at regular intervals to observe the germination rate. To maintain constant germination environmental conditions, a standardized water replenishment protocol was adopted: 5 mL of distilled water was added immediately after treatment as initial water, and then 3 mL of distilled water was added every 24 hours at regular intervals. All water replenishment operations were precisely controlled to ensure consistent water conditions in each experimental group. At the same time, other variables were kept the same, and all petri dishes were placed in the same area for cultivation, with the environmental temperature controlled at the same level. Through continuous timed observation and data acquisition over several days, a complete germination dynamic curve was obtained, providing reliable data support for subsequent analysis of the impact of different treatment conditions on the seed germination process.

[0044] (1) Mung bean. Based on the typical characteristics of dicotyledonous plants, the biological marker of mung bean seed germination is the emergence of the radicle through the seed coat (i.e., "showing white"). The observation index is based on the radicle tip emerging from the micropyle near the hilum of the seed coat, with obvious seed coat tearing structure at the breakthrough point. The analysis is based on the trend of germination rate changes. Through tracking experiments, the following is a comparison chart of mung bean germination time and growth status: Table 1. Germination count of mung beans under O3 mode in a single treatment compared with the control group.

[0045] Multiple experimental comparative analyses showed that SMD treatment has a significant impact on the germination of mung bean seeds. Its mechanism of action can be analyzed from two aspects: the active substances generated by the discharge and the temperature effect during the treatment process. Under O3 treatment conditions, the discharge voltage and power are both low, resulting in a limited temperature rise in the discharge area (usually only slightly above room temperature). O3, as a strong oxidant, effectively improves seed coat permeability, promotes water absorption and internal metabolic activity, thereby stimulating germination. The mung bean seeds used in the experiment had softened seed coats after pretreatment, making them more susceptible to the positive effects of O3: the germination rate of the O3 treatment group reached 81% within 6 hours, while the control group only reached 58%, an increase of approximately 23%. Furthermore, while the control group required 12 hours to reach an 80% germination rate, the O3 treatment group shortened this time by approximately 6 hours. Therefore, the germination rate of mung bean seeds treated with O3 was significantly improved.

[0046] (2) Wheat. Based on the typical characteristics of germination in grasses, in the germination process of wheat seeds, the radicle sheath always breaks through the seed coat before the plumule. The observation index for wheat seed germination in the experiment was: the coleoptile breaks through the seed coat from the side of the hairy radicle, forming a white, semi-transparent, cone-shaped protrusion. The influence mechanism of SMD on wheat seed germination was determined based on the trend of germination rate changes. Through tracking experiments, the wheat germination timetable and growth status comparison diagram are as follows: Table 2. Germination number of wheat under O3 mode after single treatment, two days of treatment, three days of treatment, and control group.

[0047] Experimental results showed that SMD treatment also affected the germination process of wheat seeds. Within 24 hours after O3 treatment, the germination rate of wheat seeds was ~20% higher than that of the control group, and the germination rate was significantly improved. For the O3 treatment group, the treatment intensity was relatively mild, while SMD treatment showed a significant germination-promoting effect on wheat seeds.

[0048] (3) Buckwheat. Unlike mung bean seeds, buckwheat germinates by first developing a crack in the pericarp at the acute angle of the seed triangle. Then, the white radicle, accompanied by a mucous secretion, slowly emerges, while the cotyledons remain tightly enveloped by the endosperm. Therefore, the observation index for buckwheat germination is based on the white radicle breaking through the seed coat and showing signs of growth. The analysis is still based on the trend of germination rate changes. Through tracking experiments, the buckwheat germination timetable and growth status comparison chart are as follows: Table 3. Buckwheat in NO x Germination counts under single treatment, two-day treatment, and three-day treatment compared to the control group.

[0049] Experimental results showed that SMD treatment also significantly affected the germination process of buckwheat seeds. 12 to 24 hours after NOx treatment, the seed germination rate increased by 45%, compared to 27% in the control group, indicating a more significant promoting effect in the treatment group. Furthermore, after the germination rate stabilized, the NOx rate in the treatment group increased by approximately 9% over three days. Under these conditions, discharge primarily produced NOx, accompanied by a significant temperature rise. NOx and other substances produced during discharge are widely considered important plant signaling molecules. At low / moderate concentrations, they can break seed dormancy, promote germination and root development, acting more like a biostimulant than a simple fertilizer. Simultaneously, the hard seed coat of buckwheat played a crucial protective role, effectively resisting potential heat damage from the higher temperature rise. It may also regulate the penetration rate and concentration of certain harmful discharge products into the embryonic tissue, allowing beneficial signaling molecules (such as NO) to function while mitigating the effects of harmful nitrogen oxides (such as NO2).

Claims

1. A surface micro-discharge seed batch processing system that adaptively adjusts the product mode according to seed type, characterized in that, include: The reaction apparatus (1), high-voltage power supply (2), parameter detection system and automatic voltage regulation system; The reaction device (1) includes a reaction chamber (16), a high-voltage electrode (12) and a grounding grid electrode (15) disposed in the reaction chamber (16), and a dielectric sheet (14) disposed between the high-voltage electrode (12) and the grounding grid electrode (15). The high-voltage power supply (2) is electrically connected to the high-voltage electrode (12) and is used to provide a discharge voltage for the reaction device (1); The parameter detection system is used to detect the discharge parameters and environmental parameters in the reaction device (1) in real time; The automatic voltage regulation system is communicatively connected to the high-voltage power supply (2) and the parameter detection system, and is used to dynamically adjust the output voltage of the high-voltage power supply (2) based on the parameters detected by the parameter detection system, so as to stabilize the plasma product mode in the target mode.

2. The surface micro-discharge seed batch processing system for adaptively regulating product modes based on seed type according to claim 1, characterized in that, The parameter detection system includes: The electrical parameter detection unit includes an oscilloscope (3), a high-voltage probe (4), and a current transformer (5) for detecting discharge voltage and discharge current; The gas concentration detection unit includes an O3 gas sensor (7) and an NO gas sensor (8) disposed in the reaction chamber (16), for detecting the gas concentrations of O3 and NO, respectively; and The temperature detection unit includes a temperature sensor (6) disposed in the reaction chamber (16) for detecting the reaction temperature.

3. The surface micro-discharge seed batch processing system for adaptively regulating product modes based on seed type according to claim 2, characterized in that, The parameter detection system also includes a camera (11) for acquiring images of the seeds inside the reaction chamber (16).

4. The surface micro-discharge seed batch processing system for adaptively adjusting product modes based on seed type according to claim 3, characterized in that, The automatic voltage regulation system includes an embedded development platform (9), which is configured to: identify seed types based on images captured by the camera; call the corresponding target product mode and target parameters from the pre-stored optimal product mode database according to the identified seed type, the target parameters including target gas concentration and target temperature threshold; and adjust the output voltage of the high voltage power supply (2) by a control algorithm based on the deviation between the real-time data fed back by the gas concentration detection unit and the temperature detection unit and the target parameters.

5. The surface micro-discharge seed batch processing system for adaptively regulating product modes based on seed type according to claim 4, characterized in that, The automatic voltage regulation system follows a dual-objective control strategy prioritizing safety: when the detected reaction temperature exceeds the safety threshold, the output voltage of the high-voltage power supply (2) is reduced first to control the temperature rise; when the detected target gas concentration is lower than the lower limit of the set range and the temperature does not exceed the limit, the output voltage of the high-voltage power supply (2) is increased to enhance the discharge; when both the gas concentration and temperature are within the ideal range, the current voltage is maintained for stable output.

6. The surface micro-discharge seed batch processing system for adaptively regulating product modes based on seed type according to claim 1, characterized in that, The reaction apparatus (1) further includes: A sealing cap (13), made of insulating material, is used to achieve a tight seal of the reaction chamber (16); and An observation window (19) is located at the bottom of the reaction chamber (16) and is made of transparent insulating material to facilitate image acquisition by the camera (11).

7. The surface micro-discharge seed batch processing system for adaptively controlling product modes based on seed type according to claim 1, characterized in that, The dielectric sheet (14) is made of alumina ceramic, quartz glass or mica, and its thickness is between 0.5 mm and 2 mm.

8. A method for batch processing of surface micro-discharge seeds that adaptively regulates product modes based on seed type, characterized in that, The surface micro-discharge seed batch processing system, which adaptively regulates the product mode for seed type as described in any one of claims 1 to 7, includes the following steps: Seed loading and chamber sealing steps: The pretreated seeds are loaded into the reaction chamber (16) in batches and the chamber is sealed; Mode selection and parameter setting steps: Determine the type of seed to be processed based on the image recognition module, and set the target product mode and corresponding target parameters based on the pre-stored optimal product mode database; Plasma processing steps: The high-voltage power supply (2) is activated to generate plasma for seed processing. Simultaneously, the discharge parameters and environmental parameters are monitored in real-time by a parameter detection system, and the output voltage of the high-voltage power supply (2) is dynamically adjusted by an automatic voltage regulation system to stabilize the product mode; and Settling and post-processing steps: After stopping the discharge, let the seeds stand in a chamber filled with active gas for a preset time, and then take them out.

9. The method for batch processing of surface micro-discharge seeds according to claim 8, characterized in that, The target product mode includes the O3-dominant mode and NO. x Dominant mode; For mung bean or wheat seeds, select the O3-dominant mode for treatment; For buckwheat seeds, choose NO. x The dominant mode is used for processing.

10. The method for batch processing of surface micro-discharge seeds according to claim 8, characterized in that, The automatic voltage regulation system uses proportional-integral-derivative control, incremental control or fuzzy control algorithms to dynamically fine-tune the output voltage of the high-voltage power supply (2).

Images