High-voltage pulse back-blowing cleaning equipment and method for mining ceramic filter plate

Abstract

The invention relates to the technical field of ceramic filter plate cleaning, in particular to high-voltage pulse back-flushing cleaning equipment and method for a mining ceramic filter plate. The cleaning mechanism is used for cleaning the ceramic plate; the fixing mechanism is used for mounting and fixing the ceramic plate; the pressure control mechanism is used for controlling air pressure in the shell; the cleaning mechanism is arranged on the shell, the fixing mechanism is arranged in the shell, and the pressure control mechanism is arranged on one side of the shell. The cleaning mechanism, the heating mechanism and the pressure control mechanism cooperate with one another, air in the ceramic filter plate is pumped through the vacuum pump to form a low-pressure state, the ceramic filter plate is kept within a set temperature range through the heating mechanism, and finally cleaning water is periodically sprayed to the surface of the ceramic filter plate through the cleaning mechanism. And the cleaning water permeating into the micropores can be evaporated in a low-pressure heating state, impurities are cleaned through the rapid change of the volume of the cleaning water, and the cleaning effect of follow-up back flushing is improved.

Description

Technical Field

[0001] This invention relates to the field of ceramic filter plate cleaning technology, specifically to a high-pressure pulse backflushing cleaning device and method for mining ceramic filter plates. Background Technology

[0002] Ceramic filter plates, as efficient and durable solid-liquid separation elements, are widely used in precision filtration processes in mining, chemical, and environmental protection industries. Their core functionality lies in utilizing internally interconnected micron-sized pores to achieve solid particle retention and filtrate passage under pressure differential. However, during filtration, especially when processing viscous and fine mineral slurries, some fine particles can penetrate deeply and firmly block the micropores of the ceramic plate. This deep blockage not only leads to a sharp increase in filtration resistance, increased energy consumption, and decreased production capacity, but also significantly shortens the filter plate's lifespan.

[0003] Currently, the industry widely adopts high-pressure pulsed gas backflushing technology as the main method for filter plate regeneration. This technology releases compressed air instantaneously, impacting the non-filtering surface of the filter plate in reverse to peel off the filter cake layer and remove shallow blockages. However, traditional high-pressure backflushing technology has some shortcomings when facing stubborn blockages deep in the micropores. The flow velocity drops sharply and the momentum decreases drastically when the gas flows through the narrow micropores, making it difficult to effectively clean the blockages deep in the pores. At the same time, backflushing cleaning mainly relies on the impact of airflow to clean the adhering and caking particles, resulting in limited cleaning effect.

[0004] In view of this, we propose a high-pressure pulse backflushing cleaning device and method for mining ceramic filter plates. Summary of the Invention

[0005] The purpose of this invention is to provide a high-pressure pulse backflushing cleaning device and method for mining ceramic filter plates, which solves the problems mentioned in the background art.

[0006] To achieve the above objectives, the present invention provides the following technical solution: A high-pressure pulse backflushing cleaning device for mining ceramic filter plates includes a housing; Cleaning equipment used for cleaning ceramic slabs; A fixing mechanism is used to install and fix ceramic plates; Pressure control mechanism, used to control the air pressure inside the housing; The cleaning mechanism is mounted on the outer casing, the fixing mechanism is mounted inside the outer casing, and the pressure control mechanism is mounted on one side of the outer casing.

[0007] Preferably, the cleaning mechanism includes a diversion pipe, which is fixedly connected inside the housing. A misting head is fixedly connected to the end of the diversion pipe, and a connecting pipe is connected to the end of the diversion pipe. The connecting pipe is connected to a liquid storage tank through a liquid pump.

[0008] Preferably, a heating assembly is provided inside the outer shell. The heating assembly includes a support shell, which is fixedly connected inside the outer shell. The support shell has a hollow structure, and a heating device is fixedly connected inside the support shell. The heating device is a resistance heating device or a radiant heating device.

[0009] Preferably, the pressure control mechanism includes a buffer tank, which is connected to one side of the outer shell via a suction pipe, and a vacuum pump is connected to the side of the buffer tank via a pipe.

[0010] Preferably, the pressure control mechanism further includes a high-pressure tank, which is connected to the side of the outer shell away from the buffer tank via a pressure pipe. An air pump is connected to the side of the high-pressure tank via a pipe, and a pulse valve is fixedly connected to the pressure pipe.

[0011] Preferably, an installation tube is fixedly connected inside the support shell. The installation tube is a three-way pipe structure. One end of the installation tube is connected to a connector. The air extraction pipe and the pulse valve are respectively connected to the two ends of the three-way pipe.

[0012] Preferably, the fixing mechanism includes a mounting bracket, which is fixedly connected to the inside of the housing, and a fastening bracket is detachably connected to the mounting bracket. A baffle is fixedly connected to the inside of the housing.

[0013] Preferably, a partition plate is fixedly connected inside the outer shell, and a plurality of partition plates are provided, which divide the interior of the outer shell into independent chambers. The air pump is connected to the interior of the outer shell through a connecting pipe.

[0014] A high-pressure pulse backflushing cleaning method for mining ceramic filter plates, and a high-pressure pulse backflushing cleaning device for mining ceramic filter plates, includes the following steps: S1. Installation of ceramic filter plates: Install the ceramic filter plates that need to be cleaned one by one into the housing and secure them with the fixing mechanism. S2. Spray cleaning: The pressure control mechanism evacuates the ceramic filter plate to a pressure range of 9-12 kPa. At the same time, the cleaning mechanism sprays cleaning liquid evenly onto the surface of the ceramic filter plate. Meanwhile, the heating component heats the ceramic filter plate to 45-50℃. Each spraying session lasts 5-10 minutes, followed by a 3-5 minute pause. This process is repeated 5-10 times to complete the spray cleaning operation. S3. High-frequency backflushing: The air extraction pipe is closed by the solenoid valve, the cleaning mechanism is closed at the same time, and the pulse valve is opened. The pulse valve blows high-pressure pulse airflow into the ceramic filter plate through the water outlet pipe of the ceramic filter plate at pulse intervals of 10-15 seconds.

[0015] By employing the above technical solution, the present invention provides a high-pressure pulse backflushing cleaning device and method for mining ceramic filter plates, which has at least the following beneficial effects: (1) The present invention uses the coordinated operation of the cleaning mechanism, heating mechanism and pressure control mechanism to create a low-pressure state by evacuating the inside of the ceramic filter plate by a vacuum pump, and maintain the ceramic filter plate in a set temperature range by the heating mechanism. Finally, the cleaning mechanism periodically sprays cleaning water onto the surface of the ceramic filter plate, so that the cleaning water that penetrates into the micropores can evaporate under low-pressure heating. This allows the rapid change in the volume of the cleaning water to clean the blocked impurities and improve the cleaning effect of the subsequent backflushing.

[0016] (2) The present invention divides the interior of the outer shell into independent cavities by setting a partition plate, and the air inlet of the air pump is connected to the interior of the cavity, so that the air inside the cavity can be extracted to form a low-pressure environment. This can increase the pressure difference between the inside and outside of the ceramic filter plate when backflushing is performed through the pulse valve, thereby improving the backflushing cleaning effect. Attached Figure Description

[0017] The accompanying drawings, which are provided to further illustrate the invention, constitute a part of this application: Figure 1 This is a schematic diagram of the structure of the present invention. Figure 1 ; Figure 2 This is a schematic diagram of the structure of the present invention. Figure 2 ; Figure 3 This is a schematic diagram of the internal structure of the present invention. Figure 1 ; Figure 4 This is a schematic diagram of the internal structure of the present invention. Figure 2 ; Figure 5 In this invention Figure 4 Enlarged diagram of point A.

[0018] In the diagram: 1. Outer shell; 2. Cleaning mechanism; 21. Diverter pipe; 22. Mist head; 23. Liquid storage tank; 24. Connecting pipe; 25. Heating component; 251. Support shell; 252. Heating device; 3. Fixing mechanism; 31. Mounting bracket; 33. Baffle; 34. Spare plate; 4. Pressure control mechanism; 41. Buffer tank; 42. Air extraction pipe; 43. High-pressure tank; 44. Pressure pipe; 45. Pulse valve; 46. Installation pipe. Detailed Implementation

[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0020] Example 1 A high-pressure pulse backflushing cleaning device for mining ceramic filter plates, such as Figures 1-5 As shown, it includes a housing 1; a cleaning mechanism 2 is provided on the housing 1 for high-frequency cleaning of ceramic plates; a fixing mechanism 3 is provided inside the housing 1 for installing and fixing ceramic plates; a pressure control mechanism 4 is provided on one side of the housing 1 for controlling the air pressure inside the housing 1.

[0021] Specifically, the fixing mechanism 3 includes a mounting bracket 31, which is fixedly connected inside the outer casing 1. The mounting bracket 31 is used to install the ceramic filter plate on one side of the water outlet pipe. The mounting bracket 31 has an arc-shaped structure, and the arc of the mounting bracket 31 is the same as the arc of the water outlet pipe side of the ceramic filter plate. A rubber strip can be selectively installed on the mounting bracket 31 as a buffer structure to protect the ceramic filter plate and provide an auxiliary sealing effect. The mounting bracket 31 is inexpensive, so it can be customized according to the arc of the ceramic filter plate to improve the stability of the ceramic filter plate installation. A fastening bracket is detachably connected to the mounting bracket 31 to fix the ceramic filter plate on the mounting bracket 31, preventing the end of the ceramic filter plate away from the mounting bracket 31 from shaking.

[0022] It is worth noting that the pressure control mechanism 4 includes a buffer tank 41, which is connected to one side of the outer shell 1 via a vacuum pipe 42. A vacuum pump is connected to the side of the buffer tank 41 via a pipe. The vacuum pump is used to evacuate the inside of the outer shell 1 to bring the inside of the outer shell 1 into a set pressure range. The buffer tank 41 is used to buffer the vacuum pump. A solenoid valve is connected to the vacuum pipe 42 to control the opening and closing of the vacuum pipe 42.

[0023] Based on this, the pressure control mechanism 4 also includes a high-pressure tank 43. The high-pressure tank 43 is connected to the side of the outer casing 1 away from the buffer tank 41 via a pressure pipe 44. An air pump is connected to the side of the high-pressure tank 43 via a pipe. The air pump is used to pump outside air into the high-pressure tank 43 and maintain the pressure inside the high-pressure tank 43 within a set pressure range. A pulse valve 45 is fixedly connected to the pressure pipe 44. The pulse valve 45 is used to form a pulsed airflow from the high-pressure gas in the high-pressure tank 43 to backflush the ceramic filter plate. Pressure sensors are installed inside the buffer tank 41 and the high-pressure tank 43 to monitor the internal pressure of the buffer tank 41 and the high-pressure tank 43 in real time.

[0024] Furthermore, a plurality of partition plates 34 are fixedly connected inside the outer casing 1, dividing the interior of the outer casing 1 into independent chambers. These independent chambers create independent cleaning environments, allowing different batches of ceramic filter plates to be cleaned sequentially. This improves cleaning efficiency and avoids internal pressure fluctuations caused by repeated installation and disassembly due to varying cleaning times for ceramic filter plates. A baffle 33 is fixedly connected inside the outer casing 1 to separate the ceramic filter plates within the same chamber, preventing interference from splashed cleaning fluid or impurities during cleaning. A sealing cover is detachably connected to the side of the outer casing 1 to seal the independent chambers. An air pump is connected to the interior of the outer casing 1 via a connecting pipe, which can connect to different chambers within the outer casing 1. A solenoid valve is fixedly connected to the connecting pipe.

[0025] In addition, the cleaning mechanism 2 includes a diversion pipe 21, which is fixedly connected inside the housing 1. A misting head 22 is fixedly connected to the end of the diversion pipe 21 and is fixedly connected to the inner wall of the housing 1. The diversion pipe 21 is used to spray the cleaning liquid onto the surface of the ceramic filter plate through the misting head 22.

[0026] It is worth noting that a heating component 25 is installed inside the outer casing 1. The heating component 25 is used to heat the ceramic filter plate, allowing the ceramic filter plate to be cleaned at a higher temperature. The heating component 25, in conjunction with a vacuum pump, allows the cleaning solution to evaporate under low temperature and low pressure, thereby utilizing the rapid expansion volume to impact the micropores of the ceramic filter plate and improve the cleaning effect. The heating component 25 includes a support shell 251, which is fixedly connected inside the outer casing 1. The support shell 251 supports the mounting bracket 31, ensuring that the water outlet side of the ceramic filter plate faces the support shell 251. A heating device 252 is fixedly connected inside the support shell 251. The heating device 252 is a resistance heating device or a radiant heating device. In this embodiment, a heating rod is used for the heating device 252. The heating device 252 is used to heat the support shell 251 and the interior of the outer casing 1. The heating component 25 is equipped with a temperature sensor for real-time monitoring of the heating device 252, ensuring that the interior of the outer casing 1 and the ceramic filter plate are maintained within a set temperature range.

[0027] Furthermore, the end of the diversion pipe 21 is connected to a connecting pipe 24, which is connected to a liquid storage tank 23 via a liquid pump. The connecting pipe 24 is used to supply cleaning fluid to the diversion pipe 21. The connecting pipe 24, located at the center of the outer casing 1, can conveniently supply cleaning fluid to ceramic filter plates at different positions. The support shell 251 has a hollow structure, which facilitates the installation and placement of the heating device 252.

[0028] Furthermore, an installation pipe 46 is fixedly connected inside the support shell 251. The installation pipe 46 is a three-way pipe structure. One end of the installation pipe 46 is connected to a connector. The installation pipe 46 is used to connect with the ceramic filter plate. The connector is used to connect and seal the water outlet pipe of the ceramic filter plate to the installation pipe 46. The suction pipe 42 and the pressure pipe 44 are respectively connected to the two ends of the three-way pipe. The suction pipe 42 is used to evacuate the ceramic filter plate, so that a negative pressure state is formed inside the ceramic filter plate. In conjunction with the heating device 252, the cleaning water sprayed into the micropores inside the ceramic filter plate evaporates under low temperature and low pressure, thereby loosening the blocked impurities.

[0029] Example 2 A high-pressure pulse backflushing cleaning method for mining ceramic filter plates includes the following steps: S1. Installation of ceramic filter plates: Install the ceramic filter plates that need to be cleaned one by one into the housing 1 and secure them with the fixing mechanism 3.

[0030] S2. Spray cleaning: The pressure control mechanism 4 evacuates the ceramic filter plate to a pressure range of 9-12 kPa. At the same time, the cleaning mechanism 2 sprays cleaning fluid evenly onto the surface of the ceramic filter plate. The pressure difference between the inside of the outer shell 1 and the external environment causes the cleaning fluid to periodically impact the ceramic filter plate and the micropores inside the ceramic filter plate. Meanwhile, the heating component 25 heats the ceramic filter plate to 45-50°C. The cleaning water inside the ceramic filter plate evaporates under low-pressure heating, thereby loosening the impurities blocked in the micropores of the ceramic filter plate. The mist head 22 sprays for 5-10 minutes each time, stops for 3-5 minutes, and repeats the operation 5-10 times to complete the spray cleaning operation.

[0031] S3. High-frequency backflushing: Close the suction pipe 42 via the solenoid valve, and simultaneously close the cleaning mechanism 2. At the same time, open the pulse valve 45. The pulse valve 45 blows high-pressure pulse airflow into the ceramic filter plate through the water outlet pipe of the ceramic filter plate at pulse intervals of 10-15 seconds, blowing out and cleaning the loosened impurities from step S2.

[0032] In the high-pressure pulse backflushing cleaning equipment and method for mining ceramic filter plates of the present invention, the ceramic filter plate is first installed into the housing 1 through the fixing mechanism 3. After closing the sealing cover, the air extraction pipe 42 is opened through the solenoid valve, and the air in the buffer tank 41 is extracted using the vacuum. Under the low pressure inside the air extraction pipe 42, the air inside the ceramic filter plate is extracted to form a negative pressure state, and the interior of the ceramic filter plate is maintained in a stable low absolute pressure environment. At the same time, the liquid pump pumps cleaning water to the mist head 22, which atomizes the cleaning water into fine droplets and sprays them intermittently onto the surface of the ceramic filter plate. The cleaning water penetrates deep into the micropores under capillary action, contacting the clogging particles in the pores. The cleaning water can effectively reduce the interfacial tension between the particles and the pore walls, partially break down the liquid bridges formed by capillary forces, and weaken the adhesion of particles. Meanwhile, the ceramic filter plate is maintained at a temperature close to 50°C under the continuous heating of the heating device 252. Because the boiling point of water decreases significantly with decreasing environmental pressure, the cleaning water penetrating the micropores is in a superheated state and is prone to violent vaporization. Deep within the micropores, the cleaning liquid instantly transforms from a liquid to a gas, its volume expanding rapidly hundreds to thousands of times. This violent phase change generates a micro-explosive force within the confined micropore space. This force acts from the inside on the clogging particles and pore walls, effectively breaking up the caked filter cake clumps and peeling off particles adsorbed on the pore walls, ultimately loosening the blockage. The periodic spray design allows the cleaning water to penetrate the ceramic filter plate in batches multiple times. After each spray, evaporation and physical loosening occur under low pressure, creating new channels and spaces for deeper penetration of subsequent cleaning water. This cyclical cumulative effect achieves layer-by-layer, deep cleaning of the micropores from the surface inwards. After several spray-evaporation cycles, the blockages within the micropores are sufficiently loosened and broken up; at this point, the water pump and exhaust pipe 42 are shut off. Simultaneously, the solenoid valve and pulse valve 45 on the connecting pipe are opened. The air pump draws air from inside the chamber of the outer casing 1 into the high-pressure tank 43, creating a low-pressure state inside the chamber of the outer casing 1. At the same time, the pulse valve 45 sprays high-pressure gas from the high-pressure tank 43 at a high frequency onto the ceramic filter plate. The low-pressure state of the chamber enhances the effect of the high-pressure pulse. The loosened and partially displaced blockages in the ceramic filter plate are blown out from inside the ceramic filter plate by the strong directional airflow, completing the final cleaning.

[0033] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0034] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A high-pressure pulse backflushing cleaning device for mining ceramic filter plates, characterized in that, Including the outer casing (1); Cleaning unit (2) is used to clean ceramic plates; Fixing mechanism (3) is used to install and fix ceramic plates; Pressure control mechanism (4) is used to control the internal air pressure of the outer casing (1); The cleaning mechanism (2) is mounted on the outer shell (1), the fixing mechanism (3) is mounted inside the outer shell (1), and the pressure control mechanism (4) is mounted on one side of the outer shell (1).

2. The high-pressure pulse backflushing cleaning equipment for mining ceramic filter plates according to claim 1, characterized in that: The cleaning mechanism (2) includes a diversion pipe (21), which is fixedly connected inside the outer shell (1). A mist spray head (22) is fixedly connected to the end of the diversion pipe (21), and a connecting pipe (24) is connected to the end of the diversion pipe (21). The connecting pipe (24) is connected to a liquid storage tank (23) through a liquid pump.

3. The high-pressure pulse backflushing cleaning equipment for mining ceramic filter plates according to claim 1, characterized in that: The outer shell (1) is provided with a heating component (25), which includes a support shell (251). The support shell (251) is fixedly connected inside the outer shell (1). The support shell (251) is a hollow structure. A heating device (252) is fixedly connected inside the support shell (251). The heating device (252) is a resistance heating device or a radiation heating device.

4. The high-pressure pulse backflushing cleaning equipment for mining ceramic filter plates according to claim 3, characterized in that: The pressure control mechanism (4) includes a buffer tank (41), which is connected to one side of the outer shell (1) via a suction pipe (42), and a vacuum pump is connected to the side of the buffer tank (41) via a pipe.

5. The high-pressure pulse backflushing cleaning equipment for mining ceramic filter plates according to claim 1, characterized in that: The pressure control mechanism (4) also includes a high-pressure tank (43), which is connected to the side of the outer shell (1) away from the buffer tank (41) via a pressure pipe (44). An air pump is connected to the side of the high-pressure tank (43) via a pipe, and a pulse valve (45) is fixedly connected to the pressure pipe (44).

6. A high-pressure pulse backflushing cleaning device for mining ceramic filter plates according to claim 4, characterized in that: The support shell (251) is internally fixedly connected to an installation tube (46), which is a three-way tube structure. One end of the installation tube (46) is connected to a connector, and the air extraction tube (42) and the pulse valve (45) are respectively connected to the two ends of the three-way tube.

7. The high-pressure pulse backflushing cleaning equipment for mining ceramic filter plates according to claim 1, characterized in that: The fixing mechanism (3) includes a mounting bracket (31), which is fixedly connected to the inside of the outer shell (1). A fastening bracket is detachably connected to the mounting bracket (31), and a baffle (33) is fixedly connected inside the outer shell (1).

8. A high-pressure pulse backflushing cleaning device for mining ceramic filter plates according to claim 5, characterized in that: The shell (1) is fixedly connected to a partition plate (34). There are several partition plates (34), and the several partition plates (34) divide the interior of the shell (1) into independent chambers. The air pump is connected to the interior of the shell (1) through a connecting pipe.

9. A high-pressure pulse backflushing cleaning method for mining ceramic filter plates, used in the high-pressure pulse backflushing cleaning equipment for mining ceramic filter plates as described in any one of claims 1-8, characterized in that, Includes the following steps: S1. Installation of ceramic filter plates: Install the ceramic filter plates that need to be cleaned one by one into the shell (1) and fasten them by fixing mechanism (3); S2. Spray cleaning: The ceramic filter plate is evacuated by the pressure control mechanism (4) so ​​that the inside of the ceramic filter plate is in the pressure range of 9-12 kPa. At the same time, the cleaning mechanism (2) sprays the cleaning liquid evenly onto the surface of the ceramic filter plate. Meanwhile, the heating component (25) heats the ceramic filter plate to 45-50°C. The mist spray head (22) sprays for 5-10 minutes each time, stops for 3-5 minutes, and repeats the operation 5-10 times to complete the spray cleaning operation. S3. High-frequency backflushing: close the suction pipe (42) through the solenoid valve, and at the same time close the cleaning mechanism (2), and open the pulse valve (45). The pulse valve (45) blows high-pressure pulse airflow into the ceramic filter plate through the water outlet pipe of the ceramic filter plate at a pulse interval of 10-15 seconds.

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