An ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates

Abstract

This invention relates to the technical field of copper foil substrate cleaning equipment. The ultrasonic cleaning machine for polytetrafluoroethylene (PTFE) copper foil substrates includes a main housing with a cleaning tank inside. A heating tube and an ultrasonic cleaning unit are embedded within the main housing. A support basket is placed inside the cleaning tank, and a substrate clamping mechanism is mounted on the support basket. The substrate clamping mechanism holds the copper foil substrate and is equipped with a double eccentric wheel mechanism. The invention uses a fixed support rod to drive the upper eccentric wheel to rotate, and a gear meshing mechanism to drive the lower eccentric wheel to rotate synchronously in the opposite direction. Through the geometric characteristics of the eccentric wheels, the lower eccentric wheel drives the support rod of the turbulence-driven mechanism to periodically reciprocate and oscillate. The protrusions on the support rod intermittently push the copper foil substrate, causing it to sway slightly around the lifting rod. This slight sway disrupts the boundary layer on the substrate surface, accelerating the removal of peeled impurities and ensuring effective cleaning.

Description

Technical Field

[0001] This invention belongs to the technical field of copper foil substrate cleaning equipment, specifically relating to an ultrasonic cleaning machine for polytetrafluoroethylene copper foil substrates. Background Technology

[0002] Polytetrafluoroethylene (PTFE) copper-clad laminate, also known as PTFE copper-clad board, is made by pressing PTFE resin onto a copper foil substrate. It has excellent high-frequency characteristics, low dielectric loss, and good chemical corrosion resistance, and is widely used in high-frequency and high-speed communication equipment, radar antennas, aerospace electronics, precision instruments, and other fields. During the production, cutting, drilling, and subsequent processing of PTFE copper-clad laminate, its surface and hole walls are easily contaminated with cutting debris, resin dust, oil, and processing aid residues. To ensure the quality of subsequent circuit fabrication, ultrasonic cleaning machines are usually used to clean the substrate.

[0003] However, due to the low surface energy and strong hydrophobicity of polytetrafluoroethylene (PTFE) materials, the cleaning solution is difficult to fully wet the substrate surface, which easily forms a boundary layer. This results in a significant weakening of the ultrasonic cavitation effect in the area near the substrate surface, limiting the cleaning efficiency and cleanliness. At the same time, if the tiny particles on the substrate surface are not carried away by the cleaning solution after being loosened by the ultrasonic action, they are easy to redeposit on the substrate surface, causing secondary pollution. Therefore, it is necessary to design an ultrasonic cleaning machine for PTFE copper-clad foil substrates. Summary of the Invention

[0004] The purpose of this invention is to provide an ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates that has a simple structure and reasonable design in order to solve the above-mentioned problems.

[0005] The present invention achieves the above objectives through the following technical solutions:

[0006] An ultrasonic cleaning machine for polytetrafluoroethylene (PTFE) copper-clad laminate substrates includes a main housing with a cleaning tank inside. A heating element and an ultrasonic cleaning unit are embedded within the main housing. A support basket is placed inside the cleaning tank, and a substrate clamping mechanism is mounted on the support basket. The substrate clamping mechanism holds the copper-clad laminate and includes a double eccentric wheel mechanism. The double eccentric wheel mechanism includes a closed box and a support plate fixed to the substrate clamping mechanism. A fixed support rod is rotatably connected between the closed box and the support plate. An upper eccentric wheel is symmetrically fixed on the fixed support rod, and a lower eccentric wheel is rotatably connected to it. Both the upper and lower eccentric wheels are equipped with lateral gears that mesh with each other. A stabilizing distance mechanism is provided between the upper and lower eccentric wheels. A turbulence-driven mechanism is provided on the lower eccentric wheel, and a driving mechanism is provided on the closed box.

[0007] As a further optimization of the present invention, the stabilizing spacing mechanism includes an upper annular groove and a lower annular groove respectively formed on the inner wall of the upper eccentric wheel and the inner wall of the lower eccentric wheel. Support wheels are rolledly connected in both the upper annular groove and the lower annular groove, and a fixed plate is rotatably connected between the two support wheels.

[0008] As a further optimization of the present invention, a limit frame is fixedly installed on both the enclosed box and the support plate, a fixed support rod is rotatably connected between the limit frames, a lower support rod is provided on the lower eccentric wheel, and the lower support rod is movably attached to the inner wall of the U-shaped groove opened at the bottom of the limit frame. A lifting bracket is rotatably connected to the lower support rod, and plate-shaped protrusions are symmetrically provided on both sides of the inner wall of the lifting bracket.

[0009] As a further optimization of the present invention, the turbulence-driving mechanism includes a fixed turbulence plate fixed on a fixed support rod and a connecting member fixed on the inner wall of the lower eccentric wheel, with a support rod fixedly sleeved between the connecting members.

[0010] As a further optimization of the present invention, the support rod is provided with raised strips at the center, and a swinging spoiler is fixedly provided on the support rod.

[0011] As a further optimization of the present invention, the driving mechanism includes a transmission rod rotatably connected to the top of the enclosed box, and the bottom end of the transmission rod and one end of the fixed support rod are both fixedly fitted with bevel gears located inside the enclosed box and meshing with each other.

[0012] As a further optimization of the present invention, the top ends of the transmission rods are interconnected by a belt roller assembly, the top of the main housing is provided with a closed cover, the bottom of the closed cover is fixedly installed with a drive motor, and the output end of the drive motor is fixedly connected to the top end of one of the transmission rods.

[0013] As a further optimization of the present invention, the substrate clamping mechanism includes an upper support disposed on the top of the support basket, and a closed box and a support plate respectively fixed on the bottom two sides of the upper support.

[0014] As a further optimization of the present invention, the upper support is uniformly provided with lifting rods, and the two ends of the lifting rods are rotatably connected to clamping platforms, and the copper foil substrate is clamped on the clamping platforms.

[0015] As a further optimization of the present invention, a connecting pipe is provided at the bottom of the cleaning tank, the connecting pipe is fixedly inserted through the main tank body, a valve is provided on the connecting pipe, and an operation panel is provided on one side of the main tank body.

[0016] The beneficial effects of this invention are as follows:

[0017] 1. The present invention uses a fixed support rod to drive the upper eccentric wheel to rotate, and through gear meshing, drives the lower eccentric wheel to rotate synchronously in the opposite direction. Through the geometric characteristics of the eccentric wheel, the lower eccentric wheel drives the support rod of the turbulence-driven mechanism to perform periodic reciprocating rotation and oscillation during rotation. The protrusions on the support rod intermittently push the copper foil substrate, causing it to sway slightly around the lifting rod. This slight swaying breaks the boundary layer on the surface of the substrate, accelerates the removal of the peeled impurities, and ensures the cleaning effect.

[0018] 2. During the swinging process of the support rod of the present invention, it can drive the swinging baffle plate on it to form a low-speed vortex on both sides of the substrate. At the same time, the lower eccentric wheel drives the lifting bracket to reciprocate up and down along the limit frame, further agitating the cleaning fluid. The generated dynamic turbulence quickly carries the peeled impurities away from the substrate surface and suspends them in the liquid, preventing the impurities from being re-adsorbed.

[0019] 3. During the rotation of the fixed support rod of the present invention, the lifting bracket can be driven to move up and down. The up and down movement of the lifting bracket, together with the rotation of the baffle plate, breaks the temperature stratification phenomenon in the cleaning tank, making the temperature distribution of the heated cleaning liquid more uniform and avoiding excessive local temperature deviation from affecting the cleaning effect. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0021] Figure 2 This is a schematic diagram of the installation position of the connecting pipe in this invention;

[0022] Figure 3 This is a schematic diagram showing the position of the support basket in the cleaning tank in this invention;

[0023] Figure 4 This is a schematic diagram showing the position of the copper foil substrate in this invention;

[0024] Figure 5 This is a schematic diagram of the substrate clamping mechanism in this invention;

[0025] Figure 6 This is a schematic diagram of the double eccentric wheel mechanism in this invention;

[0026] Figure 7 This is a schematic diagram of the drive mechanism in this invention;

[0027] Figure 8 This is a schematic diagram showing the position of the bevel gear in this invention;

[0028] Figure 9 This is a schematic diagram showing the positions of the connectors and fixed spoilers in this invention;

[0029] Figure 10 This is a schematic diagram of the assembly structure of the stabilizing spacing mechanism in this invention;

[0030] Figure 11 This is a schematic diagram of the assembly structure of the support wheel and the fixing plate in this invention.

[0031] In the diagram: 1. Main housing; 2. Cleaning tank; 3. Support basket; 4. Substrate clamping mechanism; 5. Double eccentric wheel mechanism; 6. Connecting pipe; 7. Sealed top cover; 8. Operation panel; 9. Copper foil substrate; 41. Upper support; 42. Lifting rod; 43. Clamping platform; 50. Lower support rod; 51. Sealed box; 52. Support plate; 53. Fixed support rod; 54. Upper eccentric wheel; 55. Lower eccentric wheel; 56. Turbulence-driven mechanism; 57. Lateral gear 58. Stabilizing spacing mechanism; 59. Drive mechanism; 561. Connecting component; 562. Fixed spoiler; 563. Support rod; 564. Raised strip; 565. Swinging spoiler; 581. Upper annular groove; 582. Lower annular groove; 583. Support wheel; 584. Fixed plate; 585. Limiting frame; 586. Lifting bracket; 591. Transmission rod; 592. Bevel gear; 593. Belt and roller assembly; 594. Drive motor. Detailed Implementation

[0032] The present application will now be described in further detail with reference to the accompanying drawings. It should be noted that the following specific embodiments are only used to further illustrate the present application and should not be construed as limiting the scope of protection of the present application. Those skilled in the art can make some non-essential improvements and adjustments to the present application based on the above application content.

[0033] Example: Please refer to Figures 1-11An ultrasonic cleaning machine for polytetrafluoroethylene (PTFE) copper-clad laminate substrates includes a main housing 1, within which a cleaning tank 2 for storing cleaning fluid is installed. A heating element and an ultrasonic cleaning unit are embedded within the main housing 1. The ultrasonic cleaning unit includes an ultrasonic generator and an ultrasonic transducer. The ultrasonic transducer is fixed to the bottom of the cleaning tank 2, causing the cleaning fluid in the cleaning tank 2 to vibrate at high frequency. (The ultrasonic cleaning unit is prior art and will not be described in detail here.) The heating element is attached to the outside of the side wall of the cleaning tank 2. A temperature sensor for monitoring the temperature of the cleaning fluid is installed inside the cleaning tank 2. An embedded control module monitors the temperature data from a temperature sensor and adjusts the operating status of the heating element to regulate the cleaning temperature. A support basket 3, made of welded steel wire, is placed inside the cleaning tank 2. The top of the basket has symmetrical square frames for easy handling, and the four corners of the bottom are fitted with rubber vibration-damping feet. A substrate clamping mechanism 4 is installed on the support basket 3 to hold the copper foil substrate 9. The substrate clamping mechanism 4 also has a double eccentric wheel mechanism 5, which intermittently pushes the copper foil substrate 9 during the cleaning process. The swaying motion causes the cleaning impurities to detach from the surface of the substrate. The substrate clamping mechanism 4 includes an upper support 41 located on top of the support basket 3. The bottom of the upper support 41 has a groove corresponding to the square frame on top of the support basket 3, allowing it to be placed between the left and right square frames. Lifting rods 42 are evenly arranged on the upper support 41. Both ends of the lifting rods 42 are rotatably connected to clamping platforms 43. The clamping platform 43 includes a fixed base and a screw-locking frame. The fixed base is threadedly connected to the screw-locking frame. During installation, the upper edge of the copper foil substrate 9 is inserted between the clamping platforms 43. Rotating the screw-locking frame can lock the top two corners of the copper foil substrate 9 into the clamping platform. On platform 43, after the copper foil substrate 9 is fixed, it can swing around the hoisting rod 42. The bottom of the cleaning tank 2 is provided with a connecting pipe 6, which is fixed through the main box 1. A valve is provided on the connecting pipe 6. Before cleaning, the connecting pipe 6 is connected to the cleaning fluid input pump, which can input the cleaning fluid into the cleaning tank 2. During cleaning, the valve is closed to maintain the depth of the cleaning fluid. After cleaning, the valve is opened to discharge the cleaning fluid. The top of the main box 1 is provided with a sealing cover 7. During testing, the sealing cover 7 can seal the cleaning tank 2. An operation panel 8 for controlling the operating status of the device is provided on one side of the main box 1.

[0034] The copper foil substrate 9 to be cleaned is placed between the clamping platforms 43 of the substrate clamping mechanism 4, so that the upper edge of the substrate is inserted between the fixing seat and the screw-locking frame. The top two corners of the substrate are locked and fixed by screwing the locking frame. Then, the entire substrate clamping mechanism 4 is mounted on the square frame on the top of the support basket 3 through the groove of the upper support 41, completing the installation of the substrate. The external cleaning fluid input pump is connected through the connecting pipe 6, the valve is opened, and the cleaning fluid is injected into the cleaning tank 2. When the liquid level reaches the preset height, the valve is closed to maintain a stable cleaning fluid depth. The control module starts the heating tube to heat the cleaning fluid in the cleaning tank 2, and the temperature sensor monitors the cleaning fluid temperature in real time. The temperature is measured and the data is fed back to the control module. When the temperature reaches the set value, the control module automatically adjusts the output power of the heating tube to keep the cleaning fluid within a stable cleaning temperature range. The ultrasonic generator drives the ultrasonic transducer to work, causing the cleaning fluid in the cleaning tank 2 to generate high-frequency vibration, forming a cavitation effect, which peels off the contaminants on the surface of the copper foil substrate 9. During the ultrasonic cleaning process, the double eccentric wheel mechanism 5 operates synchronously. Through intermittent eccentric pushing action, the copper foil substrate 9 swings slightly around the lifting rod 42. The swing action breaks the boundary layer on the substrate surface, causing impurities to detach from the substrate surface more quickly, improving cleaning efficiency and uniformity.

[0035] Please see Figures 4-10 The double eccentric wheel mechanism 5 includes a closed box 51 and a support plate 52 fixed on both sides of the bottom of the upper support 41. After the upper support 41 is erected on the top of the support basket 3, the closed box 51 and the support plate 52 are located on the inner sides of the support basket 3, respectively. A fixed support rod 53 is rotatably connected between the closed box 51 and the support plate 52. An upper eccentric wheel 54 is symmetrically fixed on the fixed support rod 53. The upper eccentric wheel 54 is rolledly connected to the lower eccentric wheel 55 through an annular groove on the side wall. Both the upper eccentric wheel 54 and the lower eccentric wheel 55 are provided with lateral gears 57, and the lateral gears 57 on the upper eccentric wheel 54 and the lower eccentric wheel 55 mesh with each other. A stabilizing gap mechanism 58 is provided between the upper eccentric wheel 54 and the lower eccentric wheel 55. The stabilizing gap mechanism 58 can maintain the distance between the lateral gears 57 on the upper eccentric wheel 54 and the lower eccentric wheel 55, preventing the lateral gears 57 from disengaging from each other or being damaged due to excessive compression. A turbulence-driving mechanism 56 is provided on the lower eccentric wheel 55. The turbulence-driving mechanism 56 can disturb the liquid environment in the cleaning fluid, making the overall temperature of the cleaning fluid more uniform and ensuring the consistency of the cleaning effect. At the same time, it can intermittently push the copper foil substrate 9 to produce a small sway around the lifting rod 42. A drive mechanism 59 for driving the fixed support rod 53 to rotate is provided on the enclosed box 51.

[0036] Please see Figures 7-10The stabilizing gap mechanism 58 includes an upper annular groove 581 and a lower annular groove 582 respectively formed on the inner walls of the upper eccentric wheel 54 and the lower eccentric wheel 55. Support wheels 583 are rolled within both the upper annular groove 581 and the lower annular groove 582. A fixed plate 584 is rotatably connected between the two support wheels 583. During operation, the surfaces of the upper eccentric wheel 54 and the lower eccentric wheel 55 abut against each other to prevent the lateral gear 57 from getting too close. Simultaneously, the two support wheels 583 rolled within the upper annular groove 581 and the lower annular groove 582 prevent the lateral gear 57 from moving away from each other. Limit frames 585 are fixedly installed on both the enclosed box 51 and the support plate 52. A fixed support rod 53 is rotatably connected to the limit frame 585. Between, a lower support rod 50 is movably fitted to the inner wall of the U-shaped groove at the bottom of the limiting frame 585, and a lower eccentric wheel 55 is fixedly sleeved on the lower support rod 50. The two ends of the lower support rod 50 are rotatably connected to a square lifting bracket 586, and the inner walls of the lifting bracket 586 are symmetrically provided with plate-shaped protrusions. During the rotation of the fixed support rod 53, the eccentric structure of the upper eccentric wheel 54 and the lower eccentric wheel 55 can push the lower support rod 50, which serves as the rotation axis of the lower eccentric wheel 55, to slide back and forth along the U-shaped groove at the bottom of the limiting frame 585. During the back and forth lifting process, the lifting bracket 586 connected to the lower support rod 50 can move the cleaning fluid up and down through the plate-shaped protrusions, so that the temperature of the entire cleaning fluid is more uniform.

[0037] Please see Figures 6-7 and Figures 9-10 The turbulence-driving mechanism 56 includes a fixed turbulence plate 562 fixed to a fixed support rod 53 and a connector 561 fixed to the inner wall of the lower eccentric wheel 55. A support rod 563 is fixedly sleeved between the connectors 561. A raised strip 564 is evenly arranged at the center of the support rod 563, and a swinging turbulence plate 565 is fixedly mounted on the support rod 563. During the rotation of the fixed support rod 53, the fixed turbulence plate 562 rotates around the fixed support rod 53, and the lower eccentric wheel 55 rotates synchronously. The axial position of the lower eccentric wheel 55 is limited by the limiting frame 585. As the lower eccentric wheel 55 rotates, the connector 561 and the support rod 563 fixed to the lower eccentric wheel 55 move in opposite directions. It will swing outward and push the copper foil substrate 9 through the protrusion 564 during the swing. Under the push of the protrusion 564, the copper foil substrate 9 will swing slightly around the lifting rod 42 to promote the removal of impurities. At the same time, the swinging baffle 565 rotates around the lower support rod 50. During the rotation of the fixed baffle 562 and the swinging baffle 565, a low-speed and stable liquid vortex can be formed on both sides of the copper foil substrate 9. The vortex can drive the removed impurities to follow the liquid flow and prevent the impurities from re-attaching to the substrate surface, thereby significantly improving the cleaning effect. At the same time, the vortex can work with the lifting bracket 586 to adjust the liquid temperature synchronously, making the temperature environment of the entire cleaning more uniform.

[0038] Please see Figures 4-5 and Figures 7-9 The drive mechanism 59 includes a transmission rod 591 rotatably connected to the top of the enclosed box 51. A bevel gear 592 is fixedly fitted onto the bottom end of the transmission rod 591 and one end of the fixed support rod 53, and the bevel gear 592 on the transmission rod 591 and the fixed support rod 53 mesh with each other. The bevel gear 592 is located inside the enclosed box 51. The top ends of two adjacent transmission rods 591 are connected to each other via a belt roller assembly 593. A square groove is formed at the top end of one of the transmission rods 591, and a square block fixed within the square groove is fixedly connected to the drive motor 594. At the output end, the drive motor 594 is fixed to the bottom of the closed cover 7. After the closed cover 7 is installed above the main housing 1, the square block on the output end of the drive motor 594 slides into the square groove at the top of the transmission rod 591. The drive motor 594 drives one of the transmission rods 591 to rotate, and then drives all the transmission rods 591 to rotate synchronously through the belt roller group 593. The transmission rod 591 drives the fixed support rod 53 to rotate at low speed through the meshing bevel gear 592, providing stable and synchronous power for the double eccentric wheel mechanism 5 and the turbulence driving mechanism 56.

[0039] It should be noted that, in the use of this ultrasonic cleaning machine for polytetrafluoroethylene (PTFE) copper-clad foil substrates, the upper two corners of the PTFE copper-clad foil substrate 9 to be cleaned are first inserted into the clamping platform 43 of the substrate clamping mechanism 4, and then fixed by tightening the locking bracket. At this time, the substrate 9 is installed in a suspended position and can swing freely around the lifting rod 42. Subsequently, the entire substrate clamping mechanism 4 is mounted on the top of the support basket 3 via the upper support 41. The rubber vibration isolation feet at the bottom of the support basket 3 can effectively isolate the impact of ultrasonic vibration on the structure. Special cleaning fluid is injected into the cleaning tank 2 through the connecting pipe 6. After the injection is completed, the control module starts the heating tube to clean the substrate. The cleaning solution is heated, and a temperature sensor monitors the temperature inside the tank in real time and feeds the data back to the control module. When the temperature reaches the preset value, the control module automatically adjusts the heating power to keep the cleaning solution at a constant temperature, providing the best chemical activity and physical environment for subsequent cleaning. Then, the control module starts the ultrasonic generator, which drives the ultrasonic transducer installed at the bottom of the cleaning tank 2 to work. The transducer converts high-frequency electrical energy into mechanical vibration, which causes the cleaning solution to vibrate at high frequency and form a large number of tiny cavitation bubbles. When these bubbles close and burst, they generate micro-jet streams and shock waves, which directly act on the surface of the substrate 9, using physical impact force to peel off the attached dust, oil and resin residue.

[0040] During ultrasonic cleaning, the drive motor 594 on the sealed cover 7 drives the fixed support rod 53 of the double eccentric wheel mechanism 5 to rotate at low speed through the belt roller group 593 and bevel gear 592. The fixed support rod 53 drives the upper eccentric wheel 54 to rotate, and drives the lower eccentric wheel 55 to rotate synchronously in the opposite direction through gear meshing. Due to the geometric characteristics of the eccentric wheels, the lower eccentric wheel 55 pushes the support rod 563 of the turbulence driving mechanism 56 to perform periodic reciprocating rotation and oscillation during rotation. The protrusions 564 on the support rod 563 intermittently push the copper foil substrate 9, causing it to swing slightly around the lifting rod 42. The oscillation breaks the boundary layer on the surface of the substrate, allowing the ultrasonic energy to be released. It can act more effectively deep into the substrate and accelerate the removal of stripped impurities. The swing of the support rod 563 drives the swing baffle 565 on it to form a low-speed vortex on both sides of the substrate. At the same time, the lower eccentric wheel 55 drives the lifting bracket 586 to reciprocate up and down along the limit frame 585, further stirring the cleaning liquid, quickly carrying the stripped impurities away from the substrate surface and suspending them in the liquid to prevent the impurities from being re-adsorbed. At the same time, it promotes the overall circulation of the cleaning liquid. During the process, the up and down movement of the lifting bracket 586 and the rotation of the baffle break the temperature stratification phenomenon in the cleaning tank 2, making the temperature distribution of the heated cleaning liquid more uniform and avoiding excessive local temperature deviation that affects the cleaning effect.

[0041] The above-described embodiments are merely illustrative of several implementations of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the scope of protection of the present invention.

Claims

1. An ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates, comprising a main housing (1), characterized in that: The main housing (1) is equipped with a cleaning tank (2). A heating tube and an ultrasonic cleaning unit are embedded in the main housing (1). A support basket (3) is placed in the cleaning tank (2). A substrate clamping mechanism (4) is provided on the support basket (3). A copper foil substrate (9) is clamped on the substrate clamping mechanism (4). A double eccentric wheel mechanism (5) is provided on the substrate clamping mechanism (4). The double eccentric wheel mechanism (5) includes a closed box (51) and a support plate (52) fixed on the substrate clamping mechanism (4). A fixed rotatable connection is provided between the closed box (51) and the support plate (52). Support rod (53), fixed support rod (53) is symmetrically fixedly sleeved with upper eccentric wheel (54), upper eccentric wheel (54) is tumblingly connected to lower eccentric wheel (55), both upper eccentric wheel (54) and lower eccentric wheel (55) are provided with lateral gear (57), and the lateral gear (57) on upper eccentric wheel (54) and lower eccentric wheel (55) mesh with each other, a stabilizing gap mechanism (58) is provided between upper eccentric wheel (54) and lower eccentric wheel (55), a turbulence pushing mechanism (56) is provided on lower eccentric wheel (55), and a drive mechanism (59) is provided on the enclosed box (51); The stabilizing spacing mechanism (58) includes an upper annular groove (581) and a lower annular groove (582) respectively opened on the inner wall of the upper eccentric wheel (54) and the inner wall of the lower eccentric wheel (55). Support wheels (583) are rolledly connected in both the upper annular groove (581) and the lower annular groove (582). A fixed plate (584) is rotatably connected between the two support wheels (583). Limit frames (585) are fixedly installed on both the enclosed box (51) and the support plate (52). Fixed support rods (53) are rotatably connected between the limit frames (585). A lower support rod (50) is provided on the lower eccentric wheel (55), and the lower support rod (50) is movable. The lower support rod (50) is rotatably connected to the inner wall of the U-shaped groove at the bottom of the limiting frame (585). The inner wall of the lifting support rod (586) is symmetrically provided with plate-shaped protrusions. The turbulence pushing mechanism (56) includes a fixed turbulence plate (562) fixed on the fixed support rod (53) and a connector (561) fixed on the inner wall of the lower eccentric wheel (55). A support rod (563) is fixedly sleeved between the connectors (561). A protrusion strip (564) is evenly provided at the center of the support rod (563), and a swing turbulence plate (565) is fixedly provided on the support rod (563).

2. The ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates according to claim 1, characterized in that: The drive mechanism (59) includes a transmission rod (591) rotatably connected to the top of the enclosed box (51). The bottom end of the transmission rod (591) and one end of the fixed support rod (53) are both fitted with bevel gears (592) located inside the enclosed box (51) and meshing with each other.

3. The ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates according to claim 2, characterized in that: The top ends of the transmission rods (591) are connected to each other by a belt roller assembly (593). The top of the main housing (1) is provided with a closed cover (7). The bottom of the closed cover (7) is fixedly installed with a drive motor (594), and the output end of the drive motor (594) is fixedly connected to the top end of one of the transmission rods (591).

4. The ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates according to claim 1, characterized in that: The substrate clamping mechanism (4) includes an upper support (41) disposed on the top of the support basket (3), and a closed box (51) and a support plate (52) respectively fixed on the bottom sides of the upper support (41).

5. An ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates according to claim 4, characterized in that: The upper support (41) is evenly provided with lifting rods (42), and the two ends of the lifting rods (42) are rotatably connected to clamping platforms (43), and the copper foil substrate (9) is clamped on the clamping platforms (43).

6. The ultrasonic cleaning machine for polytetrafluoroethylene copper-clad foil substrates according to claim 1, characterized in that: The bottom of the cleaning tank (2) is provided with a connecting pipe (6), which is fixedly connected through the main body (1). A valve is provided on the connecting pipe (6), and an operation panel (8) is provided on one side of the main body (1).

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