Carbon film cleaning system

By using an ion cleaning module and a laser cleaning module to clean contaminants on the carbon film surface sequentially within a vacuum chamber, the problem of low carbon film detection efficiency was solved, achieving a highly efficient and low-damage carbon film cleaning effect and improving the efficiency of space particle detection.

CN121847520BActive Publication Date: 2026-05-26UNIV OF SCI & TECH OF CHINA
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Patent Information

Application Number
CN202610328762.7
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2026-03-18
Publication Date
2026-05-26
Estimated Expiration
2046-03-18

AI Technical Summary

Technical Problem

In existing technologies, carbon films have low detection efficiency in space exploration, mainly because the presence of contaminants on the carbon film surface affects the charge exchange and secondary electron emission effects of the interaction between space particles and the carbon film.

Method used

The ion cleaning module and laser cleaning module inside the vacuum chamber work in sequence. The ion cleaning module cleans the contaminants first, and the laser cleaning module cleans the volatile substances. Combined with the thickness measurement and volatile substance measurement modules, the cleaning sequence and endpoint are controlled to ensure that the carbon film thickness is within the predetermined range.

Benefits of technology

It improves the efficiency of space particle detection, reduces the risk of carbon film damage, reduces secondary pollution, and improves cleaning efficiency and purity.

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Abstract

This application provides a carbon film cleaning system applicable to the field of particle detection technology. The carbon film cleaning system includes: a cleaning execution device comprising: a vacuum chamber configured to provide a vacuum environment; an ion cleaning module disposed in the vacuum chamber, configured to use an ion beam to clean contaminants adsorbed on the surface of the carbon film to be cleaned; a laser cleaning module disposed in the vacuum chamber, configured to use a laser beam to clean volatile substances adsorbed on the surface of the carbon film to be cleaned; and a control device communicatively connected to the cleaning execution device, configured to control the working sequence of the ion cleaning module and the laser cleaning module, such that the ion cleaning module operates before the laser cleaning module. This not only achieves the removal of different types of contaminants but also reduces the risk of over-cleaning or structural damage to the carbon film to be cleaned. While ensuring the effective thickness of the carbon film to be cleaned remains within a predetermined thickness range, this system improves cleaning efficiency and purity, thereby enhancing the efficiency of space particle detection.
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