Halogen source blocking and controlling method and device in thermal treatment of retired new energy device

Abstract

The invention discloses a halogen source blocking and controlling method in thermal treatment of a decommissioned new energy device, which comprises the following steps: S1, sequentially carrying out mechanical crushing and screening separation treatment on the decommissioned new energy device to obtain a material in which a halogen-containing organic component and a halogen-containing inorganic component are uniformly mixed; s2, the mixed material obtained in S1 is fed into a partition heating reactor, partition heating heat treatment is conducted through the partition heating reactor, and the halogen source blocking and controlling device in the heat treatment of the decommissioned new energy device comprises a feeding unit, the partition heating reactor, a halogen blocking and controlling medium adding and circulating unit, a solid-phase residue discharging unit and a gas-phase product guiding-out unit. According to the invention, source controlled release, in-situ capture and solid-phase stable fixation of halogen are realized, migration of halogen to a gas phase is reduced, the risk of secondary pollution generation is reduced, meanwhile, the safe disposal performance of solid residues is improved, and the method is adaptive to engineering large-scale application.

Description

Technical Field

[0001] This invention belongs to the field of solid waste resource utilization and safe disposal technology, specifically relating to a method and device for controlling halogen sources in the thermal treatment of decommissioned new energy devices. Background Technology

[0002] Retired photovoltaic modules, lithium batteries, and other new energy devices contain a large amount of halogenated organic components. During thermal treatment processes such as pyrolysis, gasification, or incineration, these components are prone to decomposition under high-temperature conditions, releasing substances such as hydrogen halides and halogenated organic intermediates. These substances are highly corrosive and toxic, not only corroding the equipment and pipelines of the thermal treatment system and reducing the service life of the equipment, but also potentially undergoing complex chemical reactions in subsequent cooling and secondary combustion stages, generating highly toxic secondary pollutants such as dioxins, significantly increasing the environmental risks and control difficulties of the treatment system.

[0003] Currently, in engineering practice, the treatment of halogens mostly adopts end-of-pipe flue gas treatment methods. This involves waiting for halogen pollutants to enter the gas phase and exit with the flue gas from the thermal treatment reactor before removing them through end-of-pipe devices such as desulfurization and dehalogenation towers and activated carbon adsorption. This treatment model has significant technical drawbacks: First, end-of-pipe treatment needs to handle high loads of gaseous halogen pollutants, resulting in large-scale equipment, complex processes, and high energy and reagent costs. Second, end-of-pipe treatment can only passively remove released halogens and cannot inhibit the release, migration, and transformation of halogens during the thermal treatment process at the source. The potential risk of pollutant escape remains, making it difficult to meet the environmental safety requirements for the resource-based treatment of decommissioned new energy devices. Summary of the Invention

[0004] The purpose of this invention is to provide a method and apparatus for controlling the source of halogens in the thermal treatment of retired new energy devices. By synergistic regulation inside the zoned heating reactor, the source-controlled release, in-situ capture and solid-phase stabilization of halogens are achieved, reducing the migration of halogens to the gas phase, lowering the risk of secondary pollution, and improving the safe disposal performance of solid residues, making it suitable for large-scale engineering applications.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a method for controlling the halogen source during the thermal treatment of decommissioned new energy devices, comprising the following steps: S1. The retired new energy devices are mechanically crushed and screened in sequence to obtain a material with a uniform mixture of halogen-containing organic components and inorganic components. S2. The mixture obtained in S1 is fed into a zoned heating reactor for zoned heating heat treatment. S3. A solid barrier medium containing alkaline or metal oxides is quantitatively introduced into the partitioned heating reactor so that the halogens released during the heat treatment process can undergo preferential in-situ chemical reaction with the solid barrier medium to generate stable halogen inorganic salts or solid residues, thereby realizing the conversion of halogens from the gas phase to the solid phase. S4. The solid residue after the in-situ halogen reaction in S3 is continuously discharged from the partitioned heating reactor. The solid residue is first cooled to room temperature by gradient cooling. Then, a curing agent is added to the cooled solid residue for mixing and curing. After curing, a stable solid product is obtained by curing, thus achieving long-term stabilization and fixation of halogen.

[0006] Preferably, in step S1, the retired new energy devices are subjected to mechanical crushing and screening processes in sequence, specifically: breaking the device's packaging and internal structure, and removing halogen-free coarse and heavy impurities from the metal support and outer shell.

[0007] Preferably, S2 specifically includes: The material is heated by gradient zone heating along the material flow direction, so that the halogen-containing organic components slowly undergo thermal decomposition reaction within a preset controlled temperature range.

[0008] Preferably, the zoned heating includes at least a low-temperature preheating stage and a medium-temperature pyrolysis stage. The temperature of the low-temperature preheating stage is controlled at 150-250℃, and the temperature of the medium-temperature pyrolysis stage is controlled at 300-500℃ to avoid the concentration and explosive release of halogens in the high-temperature zone.

[0009] Preferably, in step S3, an independent halogen resistance zone is provided at the end of the partitioned heating reactor, the temperature of the halogen resistance zone is maintained at 350-450°C, and the solid resistance medium containing alkaline or metal oxide is transported to the halogen resistance zone.

[0010] Preferably, the solid barrier medium is one or more of calcium hydroxide, magnesium oxide, aluminum oxide, and dolomite, and the dosage is 1.2-2.0 times the theoretical halogen release amount.

[0011] A halogen source control device for the thermal treatment of decommissioned new energy devices, applied in steps S2-S4, includes a feeding unit, a zoned heating reactor, a halogen control medium addition and circulation unit, a solid residue discharge unit, and a gaseous product discharge unit. The feeding unit is connected to the feeding end of the zoned heating reactor, the halogen control medium addition and circulation unit is connected to the halogen control zone in the zoned heating reactor, the solid residue discharge unit is connected to the residue discharge end of the halogen control zone, and the gaseous product discharge unit is connected to the gaseous discharge end of the halogen control zone.

[0012] Preferably, the feeding unit includes a storage bin, a quantitative feeder, and a feeding sealing valve, used to store the pretreated mixture and to realize the continuous, quantitative, and sealed delivery of materials to the zoned heating reactor.

[0013] Preferably, the partitioned heating reactor is provided with a low-temperature preheating zone, a medium-temperature pyrolysis zone and a halogen resistance zone in sequence along the material flow direction. Each zone is equipped with an independent temperature control system and temperature sensor. The halogen resistance zone is also equipped with a stirrer and a media distributor to improve the contact reaction efficiency between the solid resistance medium and the material.

[0014] Preferably, the halogen resistance medium dosing and circulation unit includes a medium storage tank, a quantitative spraying pump, and a medium recovery mechanism, used for the storage and quantitative dosing of solid resistance medium, as well as the recovery, screening, and recycling of unreacted resistance medium in solid residues.

[0015] Preferably, the solid residue discharge unit includes a slag discharge sealing valve, a gradient cooling mechanism, a solidification mixer, a pressing and molding machine, and a curing chamber, which sequentially realize the sealed discharge, gradient cooling, solidification mixing, pressing and molding, and curing of solid residue, and output a stabilized solid product.

[0016] Preferably, the gas phase product export unit includes a gas phase export pipe, a gas-liquid separator, a condenser, and an induced draft fan, which is used to continuously export a small amount of unfixed gas phase products from the reactor. After gas-liquid separation and condensation, the gas and liquid products are separated and collected. The induced draft fan controls the inside of the reactor to be in a slightly negative pressure state to ensure smooth export of gas phase products.

[0017] Compared with the prior art, the beneficial effects of the present invention are: (1) This invention achieves source control of halogens. By using zoned heating and heat treatment, it avoids the concentrated decomposition of halogen-containing organic components at high temperatures, thereby suppressing the explosive release of halogens from the source. Compared with traditional end treatment, it significantly reduces the amount of halogens released in the gas phase and reduces the load on subsequent treatment.

[0018] (2) The present invention uses the in-situ resistance control design in the partitioned heating reactor to complete the capture and reaction at the first position of halogen release. The halogen reacts with the solid resistance control medium to generate stable inorganic salts or solid solutions. The halogen fixation rate is high, which effectively prevents the migration of halogen to the gas phase and reduces the risk of secondary pollutants such as dioxins.

[0019] (3) The present invention performs gradient cooling and solidification curing stabilization treatment on solid residues to achieve long-term solid fixation of halogens. The leaching toxicity of the solidified solid products meets the national standard requirements, thereby improving the feasibility of safe disposal and resource utilization of solid residues.

[0020] (4) The device of the present invention adopts a modular design, each unit operates independently and works in coordination, and is equipped with a resistance control medium recycling system, which reduces the cost of reagent consumption. At the same time, the device has good overall airtightness and is suitable for the engineering and large-scale application of thermal treatment of retired new energy devices.

[0021] (5) The method and apparatus of the present invention have high adaptability, simple operation process, and easy control of process parameters such as temperature and dosage. They can be widely used in the pyrolysis and gasification treatment of various new energy devices such as retired photovoltaic modules and retired lithium batteries, and have good practicality and promotion value. Attached Figure Description

[0022] Figure 1 A flowchart illustrating the halogen source control method in the thermal treatment of retired new energy devices; Figure 2 A schematic diagram of the overall structure of the halogen source control device in the heat treatment of retired new energy devices; Figure 3 A front cross-sectional view of the feeding unit in the halogen source control device for the heat treatment of retired new energy devices. Figure 4 A half-section schematic diagram of the zoned heating reactor in the halogen source control device for the heat treatment of decommissioned new energy devices; Figure 5 A schematic diagram of the halogen control medium dosing circulation unit in the halogen source control device for the heat treatment of retired new energy devices; Figure 6 A schematic diagram of the main view cross-sectional structure of the solid residue discharge unit in the halogen source control device for the heat treatment of retired new energy devices. Figure 7 A schematic diagram of the gas phase product extraction unit in the halogen source control device for the thermal treatment of retired new energy devices. In the diagram: 1. Feeding unit, 11. Storage silo, 12. Quantitative feeder, 13. Feed sealing valve; 2. Zoned heating reactor, 21. Low temperature preheating zone, 22. Medium temperature pyrolysis zone, 23. Halogen resistance controlled zone, 24. Agitator, 25. Media distributor; 3. Halogen resistance controlled media addition and circulation unit, 31. Media storage tank, 32. Quantitative spraying pump, 33. Media recovery mechanism; 34. Media conveying pipe, 35. Media recovery pipe; 4. Solid phase residue discharge unit, 41. Slag discharge sealing valve, 42. Gradient cooling mechanism, 43. Solidification mixer, 44. Compression molding machine, 45. Curing chamber; 5. Gas phase product discharge unit, 51. Gas phase discharge pipe, 52. Gas-liquid separator, 53. Condenser, 54. Exhaust fan. Detailed Implementation

[0023] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0024] Please see Figure 1 This invention provides a technical solution: a method for controlling the halogen source during the thermal treatment of decommissioned new energy devices, comprising the following steps: Step 1: Pre-processing of retired new energy devices The retired new energy devices are mechanically crushed and screened in sequence to remove halogen-free coarse and heavy impurities, and a mixture of halogen-containing organic and inorganic components with a particle size of 5-20mm is obtained. Retired new energy devices refer to retired photovoltaic modules or retired lithium batteries; The mechanical crushing process adopts a combination of jaw crushing and roller crushing, and the screening and sorting accuracy is 20 mesh.

[0025] Step 2: Zoned heating and heat treatment The mixture from step 1 is fed into the zoned heating reactor 2 and heated by a gradient zoned heating method, including at least a low-temperature preheating stage and a medium-temperature thermal decomposition stage. The temperature of the low-temperature preheating stage is 150-250℃, and the temperature of the medium-temperature thermal decomposition stage is 300-500℃, so that the halogen-containing organic components are slowly thermally decomposed within the controlled temperature range. The material residence time in the low-temperature preheating stage is 30-60 min, and the material residence time in the medium-temperature pyrolysis stage is 60-120 min.

[0026] Step 3: In-situ resistance control within the reactor A halogen-controlled zone 23 is set at the end of the pyrolysis zone of the partitioned heating reactor 2, with the temperature maintained at 350-450℃. A solid control medium containing alkaline or metal oxides is introduced into it, so that the released halogens react in situ with the solid control medium to generate stable inorganic salts or solid solutions. The solid control medium is one or more of calcium hydroxide, magnesium oxide, aluminum oxide, and dolomite, and the dosage is 1.2-2.0 times the theoretical halogen release amount. Step 4: Stabilize solid phase output The solid residue after the in-situ reaction of halogen is discharged from the partitioned heating reactor 2, cooled to room temperature by gradient, and then mixed and cured with a curing agent. After curing and shaping, it is cured for no less than 72 hours to achieve long-term stabilization and fixation of halogen. The curing agent is one or more of cement and fly ash, and the amount added is 5%-10% of the mass of the solid residue.

[0027] Example The specific steps for handling retired photovoltaic modules are as follows: Pre-treatment: The retired photovoltaic modules are crushed to a particle size of 10mm using a combination of jaw crusher and roller crusher. After being screened through a 20-mesh sieve, halogen-free impurities such as aluminum brackets and glass frames are removed, resulting in a mixture of EVA film (containing halogen organic components) and silicon and metal oxides (inorganic components). Zoned heating heat treatment: The mixture is fed into the zoned heating reactor 2. The temperature of the low temperature preheating zone 21 is controlled at 200℃ and held for 40 minutes to remove moisture. Then it enters the medium temperature pyrolysis zone 22, where the temperature is controlled at 400℃ and held for 90 minutes to achieve mild pyrolysis of the EVA film. In-situ resistance control: The temperature of the halogen resistance control zone 23 is maintained at 400℃. Solid calcium hydroxide resistance control medium is continuously sprayed through the medium distributor 25. The amount added is 1.5 times the theoretical release amount of halogen. The speed of the stirrer 24 is controlled at 40r / min, so that the Cl released by thermal decomposition reacts with calcium hydroxide to generate CaCl2, a stable inorganic salt. Stabilized solid phase output: The solid phase residue was sealed and discharged, first air-cooled to 140℃, then water-cooled to room temperature, and 8% by mass of cement curing agent was added to the residue. After mixing, it was pressed into a solid block with a particle size of 30mm and cured for 72h. The halogen leaching concentration was found to meet the national standard HJ / T299, and the halogen fixation rate reached 92%.

[0028] Please see Figure 2 The halogen source control device for the thermal treatment of retired new energy devices includes a feeding unit 1, a zoned heating reactor 2, a halogen control medium addition and circulation unit 3, a solid residue discharge unit 4, and a gaseous product discharge unit 5. The feeding unit 1 is connected to the feed end of the zoned heating reactor 2, the halogen control medium addition and circulation unit 3 is connected to the halogen control zone 23 in the zoned heating reactor 2, the solid residue discharge unit 4 is connected to the residue discharge end of the halogen control zone 23, and the gaseous product discharge unit 5 is connected to the gaseous discharge end of the halogen control zone 23.

[0029] Please see Figure 3 The feeding unit 1 includes a storage bin 11, a quantitative feeder 12, and a feed sealing valve 13. The storage bin 11 is located on one side of the partitioned heating reactor 2. The quantitative feeder 12 is installed inside the storage bin 11. The feed sealing valve 13 is installed at the connection between the quantitative feeder 12 and the partitioned heating reactor 2. It is used to store the pretreated mixture and realize the continuous, quantitative, and sealed delivery of materials to the partitioned heating reactor 2.

[0030] Please see Figure 4The partitioned heating reactor 2 is sequentially configured with a low-temperature preheating zone 21, a medium-temperature pyrolysis zone 22, and a halogen resistance zone 23 along the material flow direction. Each zone is equipped with an independent temperature control system and a temperature sensor. The temperature control system of the partitioned heating reactor 2 controls the temperature fluctuation range of each zone to ±10℃. The halogen resistance zone 23 is also equipped with a stirrer 24 and a media distributor 25. The stirring speed of the stirrer 24 is 30-50 r / min to improve the contact reaction efficiency between the solid resistance medium and the material.

[0031] Please see Figure 5 The halogen resistance medium dosing and circulation unit 3 includes a medium storage tank 31, a quantitative spraying pump 32, and a medium recovery mechanism 33. The medium storage tank 31 is connected to the medium distributor 25 through a medium conveying pipe 34. The quantitative spraying pump 32 is also installed on the medium conveying pipe 34. One end of the medium recovery mechanism 33 is connected to the medium storage tank 31 through a pipe, and the other end is connected to the curing chamber 45 through a medium recovery pipe 35. It is used for the storage and quantitative dosing of solid resistance medium, as well as the recovery, screening, and recycling of unreacted resistance medium in solid residue.

[0032] Please see Figure 6 The solid residue discharge unit 4 includes a slag discharge sealing valve 41, a gradient cooling mechanism 42, a solidification mixer 43, a pressing and molding machine 44, and a curing chamber 45, which sequentially realize the sealed discharge, gradient cooling, solidification mixing, pressing and molding, and curing of solid residue, and output a stable solid product.

[0033] The input end of the slag discharge sealing valve 41 is vertically and sealed to the bottom slag discharge port of the halogen resistance zone 23 of the partitioned heating reactor 2 through a high-temperature resistant sealing flange. It is the only connection point between the unit and the reactor, realizing the sealed and continuous discharge of high-temperature solid residue. The output end of the slag discharge sealing valve 41 is sealed to the feed inlet of the gradient cooling mechanism 42 through a wear-resistant sealing hard pipe. The hard pipe has an insulation layer to prevent the residue from cracking due to rapid cooling during transportation.

[0034] The gradient cooling mechanism 42 is a two-stage integrated structure, including a front-end air-cooling module and a rear-end water-cooling module. The modules are seamlessly connected internally, and there is no leakage of residue. The input end of the gradient cooling mechanism 42 is directly connected to the sealing hard pipe at the output end of the slag discharge sealing valve 41, serving as the only feed channel for the residue. The output end of the gradient cooling mechanism 42 is sealed to the main material inlet of the curing mixer 43.

[0035] The auxiliary material inlet of the curing mixer 43: The top is independently set with a curing agent inlet (matching a quantitative screw feeder), which is the only channel for adding curing agents such as cement / fly ash. It forms a dual material synchronous feeding structure with the main material inlet to ensure uniform mixing. Output end of the curing mixer 43: The bottom discharge port is sealed to the feed hopper of the compression molding machine 44 through a sealed discharge valve to realize the quantitative and continuous discharge of the mixed materials.

[0036] The discharge end of the compression molding machine 44: The molding discharge port is sealed to the inlet of the curing chamber 45 through a belt conveyor. The belt conveyor transports the compressed and cured blocks (20-50mm) to the curing chamber 45 without damage. The dust cover prevents material dust from being emitted.

[0037] Main discharge port of curing chamber 45: Located at the bottom of the chamber, it is the final discharge port for the stabilized solid products. After 72 hours of curing, the solidified blocks are discharged from this port and can be directly utilized for resource recovery or safely landfilled.

[0038] Please see Figure 7 The gas phase product outlet unit 5 includes a gas phase outlet pipe 51, a gas-liquid separator 52, a condenser 53, and an induced draft fan 54, which is used to continuously outlet a small amount of unfixed gas phase products in the reactor. After gas-liquid separation and condensation, the gas and liquid products are separated and collected. The induced draft fan 54 controls the inside of the reactor to be in a slightly negative pressure state to ensure smooth outlet of the gas phase products.

[0039] The input end of the gas phase outlet pipe 51 adopts a high temperature resistant and corrosion-resistant sealing flange, which is vertically and sealed to the gas phase outlet at the top of the halogen resistance zone 23 of the partitioned heating reactor 2. It is the only discharge channel for the gas phase products in the partitioned heating reactor 2. The pipeline is equipped with a heat insulation layer and a temperature sensor to prevent the gas phase from condensing and accumulating liquid in advance during transportation. The output end of the gas phase outlet pipe 51 is horizontally and sealed to the top gas phase inlet of the gas-liquid separator 52. The gas-liquid separator 52 is an integrated gas-liquid separation structure of cyclone or baffle plate, which is suitable for rapid gas-liquid separation of high temperature gas phase. The tank is equipped with a heat insulation layer and a liquid accumulation tank is set at the bottom.

[0040] The condenser 53 adopts a shell-and-tube cooling structure and is equipped with a low-temperature cooling medium circulation system to reduce the gas phase temperature to room temperature and achieve deep condensation and separation of trace liquid phase components. The induced draft fan 54 is a corrosion-resistant centrifugal induced draft fan 54 with frequency conversion speed regulation function, which can adjust the air volume in real time according to the pressure inside the reactor, and accurately maintain the micro negative pressure state inside the zoned heating reactor 2. The exhaust port of the induced draft fan 54 is the final discharge port of the unit and the entire gas phase conveying system. It can be directly connected to the exhaust gas emission system through pipeline, or connected to the gas recycling device (when the gas phase calorific value meets the standard) to realize the emission of gas phase products in compliance with standards / resource utilization.

[0041] The working principle is as follows: First, the mixture of halogenated organic and inorganic components that have been mechanically crushed and screened is stored. Then, the feed rate is precisely controlled by the quantitative feeder 12. With the help of the feed sealing valve 13, the material is continuously, quantitatively and sealedly transported to the partitioned heating reactor 2, which prevents the leakage of high-temperature gas in the reactor and the entry of outside air, thus laying the foundation for a closed reaction environment for subsequent partitioned heating and heat treatment.

[0042] The material first stays in the low-temperature preheating zone 21 for 30-60 minutes to remove moisture, and then enters the medium-temperature pyrolysis zone 22 for 60-120 minutes, so that the halogen-containing organic components are slowly pyrolyzed within the preset temperature range, avoiding the concentration and explosive release of halogens caused by high temperature. The pyrolyzed material enters the terminal halogen control zone 23, which provides a stable reaction temperature environment for in-situ halogen capture. The control zone is also equipped with a stirrer 24 (30-50 r / min) and a media distributor 25 to improve the contact reaction efficiency between the subsequent control medium and the material.

[0043] A solid barrier medium, composed of one or more compounds of calcium hydroxide, magnesium oxide, aluminum oxide, and dolomite, is quantitatively delivered to the halogen barrier zone 23 via a medium distributor 25 at a ratio of 1.2-2.0 times the theoretical halogen release amount, using a metering pump. At a stable temperature of 350-450℃, the halogen released during heat treatment undergoes a preferential in-situ chemical reaction with the solid barrier medium, generating stable halogen inorganic salts or solid residues. This achieves the conversion of halogen from the gas phase to the solid phase, significantly reducing the amount of halogen migrating to the gas phase. Simultaneously, the medium recovery mechanism 33 within the unit can recover and screen unreacted barrier media from the solid residues and return them to the medium storage tank 31 for recycling via a medium recovery pipe 35, reducing reagent consumption costs.

[0044] First, the high-temperature solid residue is continuously and sealed out via the slag discharge sealing valve 41. Then, the residue is gradually cooled to room temperature via a gradient cooling mechanism 42 (air cooling at the front end and water cooling at the rear end) to prevent rapid cooling and cracking. The cooled residue is then fed into a curing mixer 43 and thoroughly mixed with cement, fly ash, and other curing agents added at 5%-10% of the residue's mass. Subsequently, it is pressed into 20-50mm solid blocks by a pressing and molding machine 44, and finally placed in a curing chamber 45 for curing for at least 72 hours. After the above treatment, the halogen is permanently fixed in the solid product, and its leaching toxicity meets national standards. The solid blocks can be directly utilized for resource recovery or safely landfilled.

[0045] The gaseous products are discharged from the top of the halogen-controlled zone 23 through the gas phase outlet pipe 51, and then pass through the gas-liquid separator 52 for rapid gas-liquid separation. The condenser 53 cools the gas phase to room temperature for deep condensation separation, thus achieving the separation and collection of gas-liquid products. The induced draft fan 54 has a variable frequency speed control function, which can adjust the air volume in real time according to the pressure inside the reactor, precisely maintaining a slightly negative pressure state inside the zoned heating reactor 2 to ensure smooth discharge of gaseous products. The outlet of the induced draft fan 54 can be connected to a tail gas emission standard compliance system, or connected to a gas recycling device when the gas phase calorific value meets the standard, to achieve compliant emission or resource utilization of gaseous products.

[0046] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A method for controlling halogen sources during the thermal treatment of decommissioned new energy devices, characterized in that, Includes the following steps: S1. The retired new energy devices are mechanically crushed and screened in sequence to obtain a material with a uniform mixture of halogen-containing organic components and inorganic components. S2. The mixture obtained in S1 is fed into the partitioned heating reactor (2) for partitioned heating heat treatment. S3. Introduce a solid barrier medium containing alkaline or metal oxide into the partitioned heating reactor (2) in a quantitative manner so that the halogens released during the heat treatment process can undergo preferential in-situ chemical reaction with the solid barrier medium to generate stable halogen inorganic salts or solid residues. S4. The solid residue after the halogen in-situ reaction in S3 is continuously discharged from the partitioned heating reactor (2). The solid residue is first cooled to room temperature by gradient cooling, and then a curing agent is added to the cooled solid residue for mixing and curing treatment. After curing and shaping, a stable solid product is obtained.

2. The halogen source control method for the thermal treatment of decommissioned new energy devices according to claim 1, characterized in that, In step S1, the retired new energy devices are subjected to mechanical crushing and screening processes in sequence, specifically: breaking the device's packaging and internal structure, and removing halogen-free coarse and heavy impurities from the metal support and outer shell.

3. The halogen source control method for the thermal treatment of decommissioned new energy devices according to claim 1, characterized in that, Specifically, S2 is: The material is heated by gradient zone heating along the material flow direction, so that the halogen-containing organic components slowly undergo thermal decomposition reaction within a preset controlled temperature range.

4. The halogen source control method for the thermal treatment of decommissioned new energy devices according to claim 3, characterized in that, The zoned heating includes at least a low-temperature preheating stage and a medium-temperature pyrolysis stage. The temperature of the low-temperature preheating stage is controlled at 150-250℃, and the temperature of the medium-temperature pyrolysis stage is controlled at 300-500℃ to avoid the concentration and explosive release of halogens in the high-temperature zone.

5. The halogen source control method for the thermal treatment of decommissioned new energy devices according to claim 1, characterized in that: In S3, an independent halogen control zone (23) is set at the end of the partitioned heating reactor (2). The temperature of the halogen control zone (23) is maintained at 350-450°C. The solid control medium containing alkaline or metal oxide is transported to the halogen control zone (23).

6. The halogen source control method for the thermal treatment of decommissioned new energy devices according to claim 1 or 5, characterized in that: The solid barrier medium is one or more of calcium hydroxide, magnesium oxide, aluminum oxide, and dolomite, and the dosage is 1.2-2.0 times the theoretical halogen release amount.

7. A halogen source control device for heat treatment of decommissioned new energy devices, characterized in that: The method applied to steps S2-S4 of claim 1 includes a feeding unit (1), a zoned heating reactor (2), a halogen resistance medium addition and circulation unit (3), a solid residue discharge unit (4), and a gaseous product export unit (5). The feeding unit (1) is connected to the feeding end of the zoned heating reactor (2). The halogen resistance medium addition and circulation unit (3) is connected to the halogen resistance zone (23) in the zoned heating reactor (2). The solid residue discharge unit (4) is connected to the residue discharge end of the halogen resistance zone (23). The gaseous product export unit (5) is connected to the gaseous discharge end of the halogen resistance zone (23).

8. The halogen source control device for the thermal treatment of decommissioned new energy devices according to claim 7, characterized in that: The partitioned heating reactor (2) is arranged in sequence along the material flow direction as a low-temperature preheating zone (21), a medium-temperature thermal decomposition zone (22), and a halogen resistance control zone (23), with each zone equipped with an independent temperature control system and temperature control sensor.

9. The halogen source control device for the thermal treatment of decommissioned new energy devices according to claim 7, characterized in that: The halogen resistance medium addition and circulation unit (3) includes a medium storage tank (31), a quantitative injection pump (32), and a medium recovery mechanism (33), which are used for the storage and quantitative addition of solid resistance medium, as well as the recovery, screening, and recycling of unreacted resistance medium in solid residue.

10. The halogen source control method and apparatus for thermal treatment of decommissioned new energy devices according to claim 7, characterized in that: The solid residue discharge unit (4) includes a slag discharge sealing valve (41), a gradient cooling mechanism (42), a solidification mixer (43), a pressing molding machine (44), and a curing chamber (45), which sequentially realize the sealed discharge, gradient cooling, solidification mixing, pressing molding, and curing of solid residue, and output a stabilized solid product.

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