Method for manufacturing local anti-glare glass

Abstract

The invention provides a local anti-dazzle glass manufacturing method which comprises the following steps: locally coating the surface of glass with an ink layer, and setting the area, not covered with the ink layer, of the surface of the glass as an anti-dazzle area; trimming the edge of the ink layer by laser; performing anti-dazzle spraying on the glass to form an anti-dazzle film layer; and removing all the ink layer by using laser. According to the technical scheme, the problems that in the prior art, in the local anti-dazzle glass production process, the product quality is poor, and the percent of pass is low are effectively solved.

Description

Technical Field

[0001] This application relates to the technical field of anti-glare glass production, and more particularly to a method for manufacturing partial anti-glare glass. Background Technology

[0002] Anti-glare (AG) glass, by forming a micro-nano-level rough structure on the glass surface, effectively reduces light reflectivity and glare, and is widely used in various display devices and glass components in public places. With the increasing demand for integrated functions in terminal products, single-sided AG-treated glass can no longer meet the needs of practical applications. For example, automotive center console glass needs to achieve anti-glare in the operating area to ensure driving safety, while maintaining high light transmittance in the display area to ensure clear information presentation; smart terminal cover glass may need to reserve a non-AG high-transmittance area in a specific logo area to balance brand display and overall anti-glare effect. Therefore, partitioned AG glass with "AG functional area + non-AG functional area" has become a research and development hotspot in the industry.

[0003] Currently, the main methods for achieving zoned AG coating are as follows: using a photoresist mask to block non-AG coating areas, and then using chemical reagents to peel off the mask after coating; using metal masks, tapes, etc. to physically block non-AG coating areas, and then performing AG coating; using lasers to remove non-AG coating areas after AG coating; or using printing ink to block non-AG coating areas, and then using chemical reagents to remove the ink after coating.

[0004] Existing technologies suffer from various problems, such as chemical reagent residues, chemical reagent corrosion of glass, poor precision at the boundary between AG and non-AG zones, and scratches on the glass surface, resulting in low product qualification rates, as exemplified by CN114426401A. Summary of the Invention

[0005] One of the technical problems this application aims to solve is that in the production process of partial anti-glare glass, there are issues of poor product quality and low pass rate.

[0006] To address the aforementioned technical problems, this application provides a method for manufacturing partial anti-glare glass.

[0007] A method for manufacturing partial anti-glare glass according to this application includes the following steps: A layer of ink is applied to specific areas of the glass surface; the areas of the glass surface not covered by the ink layer are designated as anti-glare zones. Curing of the ink layer; Laser trimming of ink layer edges; Apply an anti-glare spray to the glass to form an anti-glare film layer; All ink layers are removed using a laser.

[0008] In some embodiments, the ink layer is made of high-temperature UV-curable glass ink, which is printed on a designated area of ​​the glass surface by screen printing.

[0009] In some embodiments, the screen printing pressure is 0.3 MPa to 0.4 MPa, the speed is 65 mm / s to 80 mm / s, and the ink layer thickness is 8 μm to 12 μm.

[0010] In some embodiments, the ink layer is irradiated with ultraviolet light of wavelength 365 nm and power 80 W for 25 to 50 seconds.

[0011] In some embodiments, the anti-glare coating uses silica-based AG sol.

[0012] In some embodiments, when spraying silica-based AG sol, the spraying pressure is 0.3 MPa to 0.4 MPa, the spraying distance is 180 mm to 200 mm, and the spraying speed is 90 mm / s to 105 mm / s.

[0013] In some embodiments, the thickness of the silica-based AG sol is 3 μm to 5 μm.

[0014] In some embodiments, after the anti-glare coating is applied, it is cured at 200°C for 60 minutes.

[0015] In some embodiments, the laser power is 20W to 30W, the pulse frequency is 30kHz, the spot diameter is 0.2mm to 0.3mm, and the scanning speed is 1000mm / s.

[0016] In some embodiments, the ink layer is a thermosetting glass ink, which is printed on a designated area of ​​the glass surface by gravure printing.

[0017] The present application provides a method for manufacturing partial anti-glare glass by coating an ink layer onto the glass surface to cover non-AG areas, curing the ink layer to prevent displacement during the anti-glare spraying process, and using a laser to smooth the edges of the ink layer. An anti-glare film is then formed by spraying the glass with the ink, and the remaining ink layer is removed by the laser, exposing the non-AG areas to obtain partial anti-glare glass. This technical solution effectively solves the problems of poor product quality and low yield rate in the production of partial anti-glare glass in existing technologies. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 A schematic flowchart of the method for manufacturing partial anti-glare glass disclosed in Embodiment 1 of this application is shown; Figure 2 It shows Figure 1 A schematic diagram of the main structure of the glass after the ink layer has been coated, illustrating the manufacturing method of partial anti-glare glass; Figure 3 It shows Figure 1 A top view of the glass structure after the ink layer is applied in the manufacturing method of partial anti-glare glass; Figure 4 It shows Figure 1 A schematic diagram of the main structure of the glass after anti-glare spraying, illustrating the manufacturing method of partial anti-glare glass. Figure 5 It shows Figure 1 A top view of the glass after anti-glare spraying, illustrating the manufacturing method of localized anti-glare glass. Figure 6 It shows Figure 1 A schematic diagram of the main structure of the glass after laser removal of the ink layer in the manufacturing method of partial anti-glare glass; Figure 7 It shows Figure 1 A top view of the glass structure after laser removal of the ink layer, a method for manufacturing partially anti-glare glass.

[0020] Explanation of reference numerals in the attached figures: 10. Glass; 20. Ink layer; 30. Anti-glare film layer. Detailed Implementation

[0021] The embodiments of this application will be further described in detail below with reference to the accompanying drawings and examples. The detailed description of the following embodiments and the accompanying drawings are used to illustrate the principles of this application by way of example, but should not be used to limit the scope of this application. This application can be implemented in many different forms and is not limited to the specific embodiments of the application herein, but includes all technical solutions falling within the scope of the claims.

[0022] These embodiments are provided to make the application thorough and complete, and to fully express the scope of the application to those skilled in the art. It should be noted that, unless otherwise specifically stated, the relative arrangement of components and steps, material composition, numerical expressions, and values ​​illustrated in these embodiments should be interpreted as merely exemplary and not as limiting.

[0023] It should be noted that, in the description of this application, unless otherwise stated, "a plurality of" means two or more; the terms "upper," "lower," "left," "right," "inner," and "outer," etc., indicating orientation or positional relationship, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0024] Furthermore, the terms "first," "second," and similar terms used in this application do not indicate any order, quantity, or importance, but are merely used to distinguish different parts. "Vertical" is not strictly vertical, but within the permissible margin of error. "Parallel" is not strictly parallel, but within the permissible margin of error. Terms such as "including" or "contains" mean that the element preceding the word encompasses the element listed after it, and do not exclude the possibility of encompassing other elements as well.

[0025] It should also be noted that, in the description of this application, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this application depending on the specific circumstances. When a specific device is described as being located between a first device and a second device, an intermediary device may or may not be present between the specific device and the first or second device.

[0026] All terms used in this application have the same meaning as understood by one of ordinary skill in the art to which this application pertains, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant art, and not as idealized or highly formalized, unless expressly defined herein.

[0027] Techniques, methods, and equipment known to those skilled in the art may not be discussed in detail, but where appropriate, they should be considered part of the specification.

[0028] like Figures 1 to 7 As shown, the method for manufacturing partial anti-glare glass disclosed in Embodiment 1 of this application includes the following steps: An ink layer 20 is applied to a portion of the surface of glass 10. The area of ​​glass 10 not covered by the ink layer 20 is the anti-glare area. Curing of ink layer 20; Laser trimming of the ink layer 20 edges; Anti-glare spraying is applied to glass 10 to form an anti-glare film layer 30; All ink layers were removed using a laser.20

[0029] Applying the technical solution of Embodiment 1, an ink layer 20 is coated onto the glass surface to cover the non-AG area of ​​the glass 10. The ink layer 20 is then cured to prevent displacement during the anti-glare spraying process. Laser trimming of the ink layer 20 ensures smooth edges. Anti-glare spraying is then performed on the glass 10 to form an anti-glare film layer 30. The remaining ink layer 20 is then removed by laser, exposing the non-AG area, resulting in a partially anti-glare glass. The technical solution of Embodiment 1 effectively solves the problems of poor product quality and low pass rate in the production process of partially anti-glare glass in the prior art.

[0030] It should be noted that before applying the ink layer 20, a plasma cleaning device is used to clean the surface of the glass substrate. The plasma cleaning process parameters are: plasma power 150W, processing time 60 seconds, and the glass 10 moving at a uniform speed of 50mm / s during the process to ensure that oil, dust, and impurities on the surface of the glass 10 are completely removed, resulting in a clean and dry glass 10. This ensures that the surface of the glass 10 is smooth and free of impurities, improving the adhesion between the glass 10 and the ink layer 20.

[0031] like Figures 1 to 5 As shown, in the technical solution of Embodiment 1, the ink layer 20 uses high-temperature UV-curable glass ink, which is printed on a designated area of ​​the glass 10 surface by screen printing. Screen printing offers high printing flexibility, is suitable for various complex graphics, and the screen can be reused, resulting in lower costs. It satisfies both planar and curved surface printing requirements. The ink layer 20 formed by the high-temperature UV-curable glass ink has strong coverage and a strong bond with the glass, making it less prone to peeling off. Its high-temperature resistance ensures that it is not easily affected by high temperatures during the subsequent curing of the anti-glare film layer 30, avoiding the problem of the final AG area and non-AG area not meeting the preset requirements due to ink layer 20 deformation caused by high temperatures.

[0032] like Figures 1 to 5As shown, in the technical solution of Embodiment 1, the screen printing pressure is 0.3MPa to 0.4MPa, the speed is 65mm / s to 80mm / s, and the thickness of the ink layer 20 is 8μm to 12μm. High-temperature UV-curable glass ink is printed onto the non-AG area of ​​the glass using the above method, thus masking the non-AG area. When the screen printing pressure is less than 0.3MPa, the ink is not easily removed from the screen; when the screen printing pressure is less than 0.4MPa, it is easy to scratch the glass surface; when the screen printing speed is less than 65mm / s, the production speed is low, and the ink is prone to accumulation; when the screen printing speed is greater than 80mm / s, ink breakage is likely to occur; when the ink layer 20 thickness is less than 8μm, the screen printing process requirements are high, making it difficult to achieve; when the ink layer 20 thickness is greater than 12μm, more ink is consumed, the cost is high, and it is also not conducive to subsequent removal.

[0033] like Figures 1 to 5 As shown, in the technical solution of Embodiment 1, the ink layer is irradiated with ultraviolet light of wavelength 365nm and power 80W for 2025s to 50s. The glass is placed in an ultraviolet curing machine, and the ink is cured using the above parameters. After the ink is cured, a laser beam is used to further refine the ink layer 20 to ensure that the edges of the ink layer 20 are smooth, ensuring a smooth boundary between the AG area and the non-AG area, thereby improving product quality.

[0034] like Figures 1 to 5 As shown, in the technical solution of Embodiment 1, the anti-glare spraying uses silica-based AG sol. Silica-based AG sol has a stable structure, is not easily affected by the external environment, and is easy to store. The formed anti-glare film layer 30 has a smooth surface, strong anti-glare capability, and good product quality.

[0035] like Figures 1 to 5 As shown, in the technical solution of Embodiment 1, when spraying silica-based AG sol, the spraying pressure is 0.3MPa to 0.4MPa, the spraying distance is 180mm to 200mm, and the spraying speed is 90mm / s to 105mm / s. An automatic spraying device and the above parameters are used to spray silica-based AG sol onto the glass. The nozzle causes the silica-based AG sol to appear as a water mist. The selected spraying pressure provides the power for the silica-based AG sol to move to the glass surface. The selected spraying distance ensures that the water mist-like silica-based AG sol is evenly dispersed in the air before moving to the glass surface. The selected spraying speed determines the production efficiency and further ensures the uniformity of the silica-based AG sol spraying.

[0036] like Figures 1 to 5As shown, in the technical solution of Embodiment 1, the thickness of the silica-based AG sol is 3μm to 5μm. The thickness of the silica-based AG sol determines the thickness of the anti-glare film layer 30. The greater the thickness, the better the anti-glare performance; however, if the anti-glare film layer 30 is too thick, it will affect the visibility of the area, which is not conducive to practical use.

[0037] like Figures 1 to 5 As shown, in the technical solution of Embodiment 1, after the anti-glare spraying is completed, it is cured at 200℃ for 60 minutes. Curing at 200℃ for 60 minutes ensures that the anti-glare film layer 30 is fully cured, the anti-glare film layer 30 has good adhesion to the glass, and the anti-glare film layer 30 is not easy to fall off.

[0038] like Figures 1 to 5 As shown, in the technical solution of Embodiment 1, the laser power is 20W to 30W, the pulse frequency is 30kHz, the spot diameter is 0.2mm to 0.3mm, and the scanning speed is 1000mm / s. The laser power and pulse frequency directly affect whether the laser can remove the ink layer 20. The spot diameter determines the accuracy when trimming the edge of the ink layer 20; the smaller the spot diameter, the higher the accuracy of the ink layer 20 coverage area. The spot diameter also determines the efficiency of removing all of the ink layer 20; the larger the spot diameter, the higher the removal efficiency.

[0039] The following methods exist in the existing technology for producing partial anti-glare glass: Photoresist mask method: A photoresist mask is formed on the glass surface through steps such as coating, exposure, and development to protect non-AG areas. AG layers are then prepared (e.g., by spraying or etching), and finally, the photoresist mask is removed using chemical reagents. While this process can achieve patterned partitioning, photoresist is expensive, the coating and development processes require high-precision equipment, and chemical removal can leave reagent residues that can contaminate or corrode the glass surface. Furthermore, the process is cumbersome, has low production efficiency, and is difficult to adapt to industrial mass production.

[0040] Physical masking method: This method involves covering non-AG areas with a metal mask or high-temperature resistant tape before processing the AG layer. The masking material is then removed after processing. This method suffers from low mask positioning accuracy, easy missed spraying or burrs at the edges, and the metal mask needs to be customized for different patterns, resulting in poor versatility. The tape masking is prone to peeling and adhesive seepage during the high-temperature AG curing process, leading to contamination of non-AG areas.

[0041] Step-by-step etching method: First, the entire glass surface is etched with AG, and then the AG layer in the preset non-AG areas is removed by laser etching. This process requires the formation of a complete AG layer before local removal. The AG layer material utilization rate is low, and when the laser acts directly on the interface between the AG layer and the glass substrate, it is easy to cause scratches and discoloration on the glass substrate surface due to improper energy control, affecting the light transmittance and surface flatness of the non-AG areas.

[0042] Ink mask wet removal method: This method uses printing ink as a mask. After AG processing, the ink and surface AG layer are removed by solvent immersion or ultrasonic cleaning. In this method, the ink must be resistant to AG processing (such as high-temperature curing and chemical erosion). Conventional inks are prone to failure during AG processing, and wet removal can easily lead to jagged defects at the edges of non-AG areas. At the same time, solvent discharge will bring environmental pressure.

[0043] Partial anti-glare glass was manufactured using photoresist masking, physical shielding, step-by-step etching, and ink mask wet removal methods as control groups 1 to 4. Anti-glare glass was manufactured using the partial anti-glare glass manufacturing method described in Example 1 as the experimental group. Both control groups 1 to 4 and the experimental group used rectangular glass with dimensions of 9cm × 15cm. The non-AG area was a circle with a diameter of 2cm located at the center of the rectangular glass (the center of the circle coincides with the intersection of the diagonal). 70 pieces of partial anti-glare glass were produced in each group, and the glass surface was inspected.

[0044] Table 1 shows the experimental results of the experimental group and the control group in the technical solution of Example 1.

[0045] Note: The data in the table represents the percentage of products that have the corresponding situation.

[0046] The experimental data shows that the technical solution in Example 1 has no chemical reagent residue, the pattern is clear, there are few glass scratches, and the product quality is good.

[0047] The difference between the technical solution of Embodiment 2 and Embodiment 1 is that the ink layer 20 uses thermosetting glass ink, which is printed on a designated area of ​​the glass 10 surface using gravure printing. The main components of the thermosetting glass ink are epoxy resin, thermal initiator, and filler. The thickness of the ink layer 20 is controlled at 8 μm, the curing temperature is 120℃, and the curing time is approximately 30 minutes. A fiber laser is used, with a laser power of 25W, a scanning speed of 800 mm / s, and a spot diameter of 0.3 mm, to irradiate the ink mask area. The energy of the fiber laser causes the thermosetting ink to rapidly vaporize, simultaneously peeling off the AG coating attached to its surface, exposing the underlying glass substrate and forming a specific patterned non-AG area.

[0048] In summary, the technical solution of this application includes: Step S1: Pre-treatment of the glass substrate using plasma cleaning equipment to clean the surface of the glass substrate. The process parameters for plasma cleaning are: plasma power 150W, processing time 60 seconds, and the glass substrate moving at a uniform speed of 50mm / s during the process to ensure that oil, dust, and impurities on the surface of the glass substrate are completely removed, resulting in a clean and dry glass substrate. Step S2: Patterning mask preparation using screen printing to coat an ink mask (ink layer 20) on a pre-designed non-AG area of ​​the pre-treated glass substrate. The selected ink is a high-temperature resistant UV-curable glass ink with a curing temperature of 100℃. The process parameters for screen printing are: printing pressure 0.3MPa, printing speed 80mm / s, and the thickness of the ink mask controlled at 10μm. After printing, the glass substrate is placed in a UV curing machine and irradiated for 30 seconds under UV light with a wavelength of 365nm and a power of 80W to cure the ink mask. A laser is then used to remove burrs from the pattern, forming a masking layer consistent with the target circular pattern, resulting in a glass substrate with a patterned ink masking layer. Step S3: AG film layer (anti-glare film layer 30) spraying. Silica-based AG sol is used as the spraying material, and an automatic spraying device is used to spray the AG coating onto the front side of the glass substrate treated in step S2. The spraying process parameters are: spraying pressure 0.4MPa, spraying distance 200mm, and spraying speed 100mm / s, ensuring the AG coating evenly covers the ink mask and the unmasked glass area. The thickness of the AG coating is controlled at 3μm. After spraying, the glass substrate is placed in a curing oven and cured at 200℃ for 60 minutes to obtain an intermediate body with the AG coating covering the mask and the glass surface. Step S4: Laser selective removal. A UV nanosecond laser is used to irradiate the ink mask area. The laser process parameters are: laser power 20W, scanning speed 1000mm / s, spot diameter 0.3mm, and pulse frequency 30kHz. During laser irradiation, the ink mask and the AG coating attached to its surface are peeled off together, exposing the underlying glass substrate and forming a circular non-AG area with a diameter of 20mm. This application also provides an alternative embodiment, the core difference from the above-mentioned optimal embodiment lies in the material selection and adjustment of some process parameters, as follows: I. Material substitution, ink mask: thermosetting glass ink (replacing the UV-curing ink in the optimal embodiment) is used, its main components are epoxy resin, thermal initiator and filler, the curing temperature is 120℃, and the curing time is 30 minutes. II. Process step adjustment, step S2: Patterning mask preparation: The thermosetting ink mask is coated on the preset non-AG area (such as a circular area with a diameter of 20mm) of the glass substrate by gravure printing, and the ink thickness is controlled at 8μm. After printing, the glass substrate is placed in an oven at 120℃ for 30 minutes to bake the ink completely, forming a masking layer consistent with the target circular pattern.Step S4: Selective laser removal uses a fiber laser (replacing the ultraviolet nanosecond laser in the preferred embodiment), with a laser power of 25W, a scanning speed of 800mm / s, and a spot diameter of 0.3mm, to irradiate the ink mask area. The energy of the fiber laser causes the thermosetting ink to rapidly vaporize, simultaneously peeling off the AG coating attached to its surface, exposing the underlying soda-lime glass substrate and forming a specific patterned non-AG area.

[0049] The core of this application lies in constructing an innovative process chain of "printed ink mask → AG coating spraying → laser synchronous stripping," breaking through existing technological bottlenecks. Specifically: 1. Process Combination Innovation: A pioneering process route of "ink mask protection + AG full coating + laser selective synchronous stripping" is proposed, differing from existing solutions such as "photoresist mask + chemical stripping" and "full-area AG + laser delamination." By using laser to strip the composite layer of "ink mask + surface AG coating" in a single step, there is no need to process the mask and AG layer separately, simplifying the process and avoiding the corrosion of the glass by chemical reagents. This solves the problems of cumbersome processes and easy damage to the glass in existing processes. 2. Mask Material and Application Innovation: Printed ink is used as the mask material, replacing high-cost photoresist or poorly versatile metal masks. A patterned masking layer is directly formed on a pre-defined non-AG area through printing, which not only reduces material and equipment costs but also achieves high-precision pattern positioning, adapting to the needs of non-AG areas of different sizes and shapes. This solves the problems of high cost, poor versatility, and insufficient positioning accuracy of existing masks. III. Laser Removal Process Innovation: A laser is specifically applied to the composite structure of "ink mask + AG coating," using laser energy to rapidly vaporize or peel off the ink, simultaneously causing the surface AG coating to detach from the glass substrate. This method avoids direct laser action on the glass surface, effectively preventing substrate scratches and discoloration, while ensuring smooth edges in non-AG areas (with micron-level precision), solving the problems of glass damage and noticeable edge defects in existing laser delamination processes. IV. Process Compatibility and Efficiency Innovation: The selected printing ink can withstand the temperature and chemical environment of the AG coating spraying and curing process, with no risk of peeling or adhesive seepage, making it compatible with industrial AG spraying production lines. The entire process eliminates complex developing and solvent immersion steps, shortening the production cycle by more than 30%, and eliminating chemical solvent emissions, balancing production efficiency and environmental friendliness, solving the problems of poor compatibility, low efficiency, and high environmental pressure associated with existing processes.This application addresses five core pain points in existing partitioned AG glass manufacturing processes: high cost, insufficient precision, low product yield, poor process compatibility, and low environmental efficiency. Specifically, it solves the following technical problems: 1. It overcomes the limitations of existing photoresist mask methods, such as high material costs, residual reagents corroding the glass during development and chemical stripping, and cumbersome processes with poor adaptability, breaking through the cost and efficiency bottlenecks of mass production; 2. It addresses the problems of physical masking methods, such as poor versatility of metal masks, easy tape detachment and seepage at high temperatures, and obvious burrs at the edges of non-AG areas, satisfying the requirements of different patterned non-AG areas. 3. Addresses the issues of low AG layer material utilization and easy scratches / discoloration caused by direct laser action on the glass substrate in the step-by-step etching method, avoiding the decrease in light transmittance caused by damage to the glass body; 4. Addresses the issues of conventional ink mask wet removal method being "not resistant to the AG processing environment, solvent immersion easily causing edge jagged defects, and high environmental pressure", adapting to AG spraying and curing processes and meeting green production requirements; 5. Addresses the common problems of "poor process connection and long production cycle" in existing processes, achieving efficient continuous processing from substrate pretreatment to finished product, meeting the pace of industrial mass production. Based on the solution to the aforementioned technical problems, this application has the following significant advantages and forms a clear differentiation advantage from the prior art: 1. Significant cost advantage: Using printing ink to replace high-cost photoresist and customized metal masks reduces material costs by more than 40%; the printing process does not require high-precision developing equipment, reducing equipment investment by 30%, and significantly reducing the initial and operating costs of industrial production; 2. High processing precision: The ink mask is directly patterned and positioned through printing, with a non-AG area edge positioning error of ≤2μm; the laser synchronously peels off the "ink-AG coating" composite layer, avoiding glass damage, and the non-AG area edge flatness error is ≤5μm, meeting the needs of high-precision display scenarios such as automotive and smart terminals; 3. Improved product yield: No chemical reagent corrosion, no direct laser contact with glass. For glass substrates, the surface scratch rate is reduced from 8%-12% in existing processes to below 1%; the ink mask is resistant to high temperatures (≥200℃) during AG spraying without peeling, achieving 100% AG coating coverage and improving the overall product yield to over 95%; 4. Strong process compatibility: the entire process is compatible with existing AG glass spraying production lines without large-scale equipment modifications; the ink mask can be adjusted as needed to accommodate various non-AG area designs such as circles, text, and complex logos, expanding its application scenarios from automotive central control to smart terminals, instrument panels, and other fields; 5. Balancing environmental protection and efficiency: no chemical solvent emissions, meeting national green manufacturing standards; the process is simplified from 8-10 steps in existing processes to 4 steps, shortening the production cycle by more than 35% and increasing daily capacity by 40%, balancing environmental protection and industrial production efficiency.

[0050] The embodiments of this application have now been described in detail. To avoid obscuring the concept of this application, some details known in the art have not been described. Those skilled in the art can fully understand how to implement the technical solutions of this application based on the above description.

[0051] While specific embodiments of this application have been described in detail by way of examples, those skilled in the art should understand that the above examples are for illustrative purposes only and are not intended to limit the scope of this application. Those skilled in the art should understand that modifications can be made to the above embodiments or equivalent substitutions can be made to some technical features without departing from the scope and spirit of this application. In particular, as long as there is no structural conflict, the various technical features mentioned in the embodiments can be combined in any manner.

Claims

1. A method for manufacturing a localized anti-glare glass, characterized in that, Including the following steps: An ink layer (20) is locally coated on the surface of the glass (10), and the area on the surface of the glass (10) not covered by the ink layer (20) is the anti-glare area: The ink layer (20) is cured; The edges of the ink layer (20) are trimmed using a laser; The glass (10) is coated with an anti-glare spray to form an anti-glare film layer (30). The entire ink layer (20) is removed using the laser.

2. The method for manufacturing partial anti-glare glass according to claim 1, characterized in that, The ink layer (20) is made of high temperature UV curing glass ink, which is printed on a designated area of ​​the glass (10) surface by screen printing.

3. The method for manufacturing partial anti-glare glass according to claim 2, characterized in that, The screen printing pressure is 0.3MPa to 0.4MPa, the speed is 65mm / s to 80mm / s, and the thickness of the ink layer (20) is 8μm to 12μm.

4. The method for manufacturing partial anti-glare glass according to claim 1, characterized in that, The ink layer (20) was irradiated with ultraviolet light with a wavelength of 365 mm and a power of 80 W for 25 to 50 seconds.

5. The method for manufacturing partial anti-glare glass according to claim 1, characterized in that, The anti-glare coating uses silica-based AG sol.

6. The method for manufacturing partial anti-glare glass according to claim 5, characterized in that, When spraying the silica-based AG sol, the spraying pressure is 0.3MPa to 0.4MPa, the spraying distance is 180mm to 200mm, and the spraying speed is 90mm / s to 105mm / s.

7. The method for manufacturing partial anti-glare glass according to claim 6, characterized in that, The thickness of the silica-based AG sol is 3 μm to 5 μm.

8. The method for manufacturing partial anti-glare glass according to claim 7, characterized in that, After the anti-glare coating is applied, it is cured at 200°C for 60 minutes.

9. The method for manufacturing partial anti-glare glass according to claim 1, characterized in that, The laser power is 20W to 30W, the pulse frequency is 30kHz, the spot diameter is 0.2mm to 0.3mm, and the scanning speed is 1000mm / s.

10. The method for manufacturing partial anti-glare glass according to claim 1, characterized in that, The ink layer (20) is made of thermosetting glass ink, which is printed on a designated area of ​​the glass (10) surface by gravure printing.

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