Glass ceramic strengthening method and strengthened glass ceramic

Abstract

The invention provides a glass ceramic strengthening method and strengthened glass ceramic, and belongs to the technical field of glass ceramic processing. The glass ceramic strengthening method comprises the following steps: sequentially carrying out first-time surface modification treatment, toughening treatment, second-time surface modification treatment and organic acid treatment on the glass ceramic, the first surface modification treatment and the second surface modification treatment independently comprise at least one of polishing treatment, alkaline etching treatment and inorganic acid liquid etching treatment. The glass ceramic is sequentially subjected to the first surface modification treatment, the toughening treatment, the second surface modification treatment and the organic acid treatment, so that the roughness can be reduced, and the impact resistance of the glass ceramic is remarkably improved.

Description

Technical Field

[0001] This application relates to the field of glass-ceramic processing technology, and in particular to a method for strengthening glass-ceramics and a method for strengthening glass-ceramics. Background Technology

[0002] Currently, most mobile phones use glass-ceramic for the front cover (CG) or back cover (BG), and the thickness of the glass-ceramic cover is becoming increasingly thinner. However, after traditional low-thickness glass-ceramic is processed into tempered glass, problems such as microcracks on the surface, large roughness, residual tempering additives, and uneven surface stress distribution result in low impact resistance of tempered glass-ceramic, which in turn affects the safety and stability of glass-ceramic.

[0003] Therefore, how to improve the strengthening process of glass-ceramics to enhance their impact resistance has become an urgent technical problem to be solved. Summary of the Invention

[0004] Therefore, the main objective of this application is to provide a method for strengthening glass-ceramics and to strengthen glass-ceramics in order to improve the impact resistance of strengthened glass-ceramics.

[0005] The first aspect of this application provides a method for strengthening microcrystalline glass, comprising the following steps:

[0006] The microcrystalline glass is subjected to a first surface modification treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment in sequence. The first surface modification treatment and the second surface modification treatment independently include at least one of polishing treatment, alkaline etching treatment, and inorganic acid etching treatment.

[0007] In some embodiments, the glass-ceramic is a front cover glass-ceramic, and the strengthening method of the front cover glass-ceramic includes:

[0008] The front cover glass is subjected to a first polishing treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence.

[0009] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies alkali resistance ≤ acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0010] The back cover glass is subjected to a first polishing treatment, a first alkaline etching treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment in sequence. The second surface modification treatment includes a second polishing treatment or a second alkaline etching treatment. The first alkaline etching treatment and the second alkaline etching treatment are independent of each other and satisfy the following: the treatment system includes 40%-80% KOH by mass and 0%-60% NaOH by mass.

[0011] In some embodiments, the glass-ceramic is a back cover glass-ceramic, and the nucleating agent of the back cover glass-ceramic satisfies alkali resistance ≤ acid resistance. The nucleating agent includes at least one of TiO2, P2O5, SnO2, and Cr2O3. The strengthening method of the back cover glass-ceramic includes: sequentially performing a first polishing treatment, a first alkaline etching treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment on the back cover glass-ceramic. The second surface modification treatment includes a second polishing treatment or a second alkaline etching treatment. The first alkaline etching treatment and the second alkaline etching treatment independently satisfy the following: the treatment system includes 40%-80% by mass of KOH and 0%-60% by mass of NaOH.

[0012] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies the condition that alkali resistance > acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0013] The back cover glass is subjected to a first polishing treatment, an inorganic acid etching treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence.

[0014] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies the condition that alkali resistance > acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0015] The back cover glass is subjected to a first polishing treatment, an inorganic acid etching treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence; the nucleating agent includes at least one of ZrO2 and Fe2O3.

[0016] In some embodiments, the organic acid treatment specifically includes: soaking in an organic acid soaking solution;

[0017] The organic acid immersion solution comprises the following components by mass fraction:

[0018] Organic acids 3%-15%;

[0019] Organic additives: 0%-30%;

[0020] Inorganic acids 0%-5%; and

[0021] Water content: 50%-97%.

[0022] In some embodiments, the organic acid in the organic acid immersion solution includes at least one of hydroxyethylidene diphosphonic acid, aminotrimethylphosphonic acid, ethylenediaminetetramethylidene phosphonic acid, phosphonate butylamine-1,2,4-tricarboxylic acid, itaconic acid, tartaric acid, citric acid, maleic acid, oxalic acid, malonic acid, isophenylene disulfonic acid, 1,4-butanedisulfonic acid, and methyl disulfonic acid.

[0023] In some embodiments, the organic additives in the organic acid soaking solution include at least one of ethylene glycol, glycerin, and polyethylene glycol.

[0024] In some embodiments, the inorganic acid in the organic acid immersion solution includes at least one of sulfuric acid, nitric acid, and hydrochloric acid.

[0025] In some embodiments, the organic acid treatment conditions include: a temperature of 50-100°C and a time of 2-180 min.

[0026] In some embodiments, the second surface modification treatment is a second polishing treatment, which is a single-sided abrasive polishing treatment; the conditions for single-sided abrasive polishing treatment include: a polishing amount of 1-10 μm, a polishing solution containing cerium oxide, and a polishing time of 1-10 min.

[0027] In some embodiments, the second surface modification treatment is a second alkaline etching treatment; the first alkaline etching treatment and the second alkaline etching treatment independently satisfy the following conditions: the treatment temperature is 80-240℃, and the treatment time is 5-240 min; the first alkaline etching treatment includes etching with a first alkaline solution or a first molten alkali, and the second alkaline etching treatment includes etching with a second alkaline solution or a second molten alkali; wherein the first alkaline solution and the second alkaline solution independently comprise 40%-85% by mass of alkali, 0.2%-10% by mass of chelating agent, and 14.8%-69.8% by mass of water; the alkali includes KOH and / or NaOH, and the chelating agent includes at least one of sodium citrate, disodium ethylenediaminetetraacetate, and sodium gluconate; the first molten alkali and the second molten alkali are independently composed of KOH and NaOH.

[0028] In some embodiments, the inorganic acid etching process specifically includes: etching with an inorganic acid solution;

[0029] The inorganic acid solution includes 5%-30% by mass of HF.

[0030] In some embodiments, the microcrystalline glass is a front cover microcrystalline glass, and the second polishing treatment is a double-sided abrasive polishing treatment; the conditions for the double-sided abrasive polishing treatment include: polishing amount of 2-20 μm; polishing liquid including cerium oxide; polishing time of 2-20 min.

[0031] In a second aspect, this application provides a reinforced glass crystal, prepared by the glass crystal strengthening method described in the first aspect.

[0032] Compared with traditional technologies, this application has at least the following beneficial effects:

[0033] This application reduces the roughness of microcrystalline glass and significantly improves its impact resistance by sequentially performing a first surface modification treatment, tempering treatment, a second surface modification treatment, and organic acid treatment. Detailed Implementation

[0034] The present application will be further described in detail below with reference to the embodiments and examples. These embodiments and examples are for illustrative purposes only and are not intended to limit the scope of the present application. The purpose of providing these embodiments and examples is to enable a more thorough and comprehensive understanding of the disclosure of the present application. It should also be understood that the present application can be implemented in many different forms and is not limited to the embodiments and examples described herein. Those skilled in the art can make various modifications or alterations without departing from the spirit of the present application, and the equivalent forms obtained also fall within the protection scope of the present application. Furthermore, numerous specific details are set forth in the following description to provide a fuller understanding of the present application. It should be understood that the present application can be implemented without one or more of these details.

[0035] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0036] To address the issue that traditional tempered microcrystalline glass suffers from low impact resistance due to surface microcracks, high roughness, residual tempering agents, and uneven surface stress distribution, which negatively impacts its safety and stability, this application addresses this problem by sequentially performing a first surface modification treatment, tempering treatment, a second surface modification treatment, and organic acid treatment on the microcrystalline glass. This process reduces roughness and significantly improves its impact resistance.

[0037] The first aspect of this application provides a method for strengthening microcrystalline glass, comprising the following steps:

[0038] The microcrystalline glass is subjected to a first surface modification treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment in sequence. The first surface modification treatment and the second surface modification treatment independently include at least one of polishing treatment, alkaline etching treatment, and inorganic acid etching treatment.

[0039] This application reduces the roughness of microcrystalline glass and significantly improves its impact resistance by sequentially performing a first surface modification treatment, tempering treatment, a second surface modification treatment, and organic acid treatment.

[0040] In the process of surface modification treatment (especially chemical etching) of glass-ceramics, the applicant discovered that the surface roughness of glass-ceramics with different nucleating agents varies after different chemical etching treatments. Glass-ceramic cover products (front and back covers) generally require multiple grinding or polishing processes, resulting in a transparent overall appearance and a relatively low roughness Sa, typically between 0.3-1 nm. However, after polishing and then undergoing different chemical etching treatments, the roughness of glass-ceramics with different nucleating agents increases to varying degrees, with Sa increasing by 1.5 nm to 300 nm, a very large range. In addition, the applicant also found that glass-ceramics with different surface roughness obtained after different chemical etching treatments also exhibit significant differences in the center impact level after chemical tempering. Therefore, the applicant speculates that the above differences are due to the fact that the nucleus phase of glass-ceramics generally accounts for more than 50%, and the nucleus phase and the glass phase have different resistance to chemical etching. Typically, the nucleus phase is far more resistant to chemical corrosion than the glass phase. During etching, the etching rates of the nucleus phase and the glass phase differ, leading to excessive etching of the glass phase between the nucleus phases, forming grooves that affect the integrity of the microcrystalline structure on the product surface, significantly increasing roughness and thus affecting the center ball drop performance. Furthermore, while the glass phase composition of glass-ceramics is generally similar, the composition of the microcrystalline phase varies greatly. Therefore, the type of nucleating agent that promotes the formation of the microcrystalline phase in CG (front cover) and BG (back cover) microcrystalline products needs to be specifically chosen, and appropriate surface modification processes must be adopted.

[0041] In some embodiments, the glass-ceramic is a front cover glass-ceramic, and the strengthening method of the front cover glass-ceramic includes:

[0042] The front cover glass is subjected to a first polishing treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence.

[0043] This application sequentially performs a first polishing treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment on the front cover glass. The synergistic effect of these steps reduces the degree of scratches on the front cover glass. Under the action of organic acid, the broken silicon-oxygen bonds on the surface of the pretreated glass are reconnected through a dehydration condensation reaction, improving the integrity and rigidity of the microstructure on the surface of the glass, and effectively enhancing the impact resistance of the strengthened glass.

[0044] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies alkali resistance ≤ acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0045] The back cover glass is subjected to a first polishing treatment, a first alkaline etching treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment in sequence. The second surface modification treatment includes a second polishing treatment or a second alkaline etching treatment. The first alkaline etching treatment and the second alkaline etching treatment are independent of each other and satisfy the following: the treatment system includes 40%-80% KOH by mass and 0%-60% NaOH by mass.

[0046] In some embodiments, the glass-ceramic is a back cover glass-ceramic, and the nucleating agent of the back cover glass-ceramic satisfies alkali resistance ≤ acid resistance. The nucleating agent includes at least one of TiO2, P2O5, SnO2, and Cr2O3. The strengthening method of the back cover glass-ceramic includes: sequentially performing a first polishing treatment, a first alkaline etching treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment on the back cover glass-ceramic. The second surface modification treatment includes a second polishing treatment or a second alkaline etching treatment. The first alkaline etching treatment and the second alkaline etching treatment independently satisfy the following: the treatment system includes 40%-80% by mass of KOH and 0%-60% by mass of NaOH.

[0047] This application utilizes a method to strengthen the back cover glass by controlling its position, function, and the properties of its nucleating agent. After a second surface modification treatment, the back cover glass exhibits lower roughness, which improves its impact resistance. Furthermore, organic acid treatment can further enhance the impact resistance of the strengthened glass.

[0048] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies the condition that alkali resistance > acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0049] The back cover glass is subjected to a first polishing treatment, an inorganic acid etching treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence.

[0050] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies the condition that alkali resistance > acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0051] The back cover glass is subjected to a first polishing treatment, an inorganic acid etching treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence; the nucleating agent includes at least one of ZrO2 and Fe2O3.

[0052] This application utilizes a method to strengthen the back cover glass by controlling its position, function, and the properties of its nucleating agent. After a second polishing process, the back cover glass has a lower roughness, which improves its impact resistance. Furthermore, organic acid treatment can further enhance the impact resistance of the strengthened glass.

[0053] In some embodiments, the first polishing process specifically includes: wrapping a polishing pad with a polishing skin as an abrasive; using a double-sided polishing machine, the abrasive, and a polishing slurry to polish the microcrystalline glass to be polished on both sides, wherein the polishing slurry is located between the abrasive and the glass to be polished; wherein the pressure of the polishing machine is 0.05-0.4 MPa, which can be 0.05 MPa, 0.1 MPa, 0.2 MPa, 0.3 MPa, or 0.4 MPa; the material of the polishing skin includes white leather (containing polyurethane), rubber fibers (containing resin), or pig bristles (containing protein); the polishing slurry includes cerium oxide; the polishing time is 2-100 min, which can be 2 min, 10 min, 20 min, 30 min, 50 min, 80 min, or 100 min; the two abrasives used for double-sided polishing rotate in opposite directions, and the rotation speed of the upper and lower abrasives is 30-50 revolutions / min, which can be 30 revolutions / min, 40 revolutions / min, or 50 revolutions / min.

[0054] In some embodiments, the polishing solution includes cerium oxide and a solvent; the concentration of cerium oxide in the polishing solution is 0.5-3 g / mL, which can be 0.5 g / mL, 0.8 g / mL, 1 g / mL, 1.2 g / mL, 1.5 g / mL, 2 g / mL, 2.5 g / mL or 3 g / mL, and the solvent is water.

[0055] In some embodiments, the organic acid treatment specifically includes:

[0056] Soaking treatment with organic acid soaking solution;

[0057] The organic acid immersion solution comprises the following components by mass fraction:

[0058] Organic acids 3%-15%;

[0059] Organic additives: 0%-30%;

[0060] Inorganic acids 0%-5%; and

[0061] Water content: 50%-97%.

[0062] In some embodiments, the organic acid immersion solution comprises the following components by mass fraction:

[0063] Organic acids 3%-15%;

[0064] Organic additives: 0%-30%;

[0065] Inorganic acids 0%-5%; and

[0066] Water content 50%-97%;

[0067] In the organic acid soaking solution, the mass fraction of organic acid can be 3%, 5%, 8%, 10% or 15%, the mass fraction of organic additives can be 0%, 5%, 10%, 15%, 20%, 25% or 30%, and the mass fraction of inorganic acid can be 0%, 1%, 2%, 3%, 4% or 5%.

[0068] In some embodiments, the organic acid in the organic acid immersion solution includes at least one of hydroxyethylidene diphosphonic acid, aminotrimethylphosphonic acid, ethylenediaminetetramethylidene phosphonic acid, phosphonate butylamine-1,2,4-tricarboxylic acid, itaconic acid, tartaric acid, citric acid, maleic acid, oxalic acid, malonic acid, isophenylene disulfonic acid, 1,4-butanedisulfonic acid, and methyl disulfonic acid.

[0069] In some embodiments, the organic acid in the organic acid immersion solution is hydroxyethylidene diphosphonic acid. Hydroxyethylidene diphosphonic acid has strong complexing ability, good water solubility, and high reactivity.

[0070] In some embodiments, the organic additives in the organic acid soaking solution include at least one of ethylene glycol, glycerol, and polyethylene glycol. These organic additives can increase the solubility of the organic acid in water.

[0071] In some embodiments, the inorganic acid in the organic acid immersion solution includes at least one of sulfuric acid, nitric acid, and hydrochloric acid. The inorganic acid can lower the pH of the organic acid immersion solution and increase its reactivity.

[0072] In some embodiments, the organic acid treatment conditions include: a temperature of 50-100°C, which can be 50°C, 60°C, 70°C, 80°C, 90°C, 95°C, or 100°C; and a time of 2-180 min, which can be 2 min, 10 min, 20 min, 30 min, 40 min, 60 min, 100 min, 150 min, or 180 min. The dehydration condensation reaction between Si-OH on the glass-ceramic and the organic acid is a reversible reaction. By controlling the temperature and time of the organic acid treatment, this application can improve the service life of the organic acid immersion solution and enhance the impact resistance of the glass-ceramic.

[0073] In some embodiments, the microcrystalline glass is a front cover glass, and the strengthening method of the front cover glass includes: sequentially performing a first polishing treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment on the front cover glass, wherein the second polishing treatment is a double-sided abrasive polishing treatment.

[0074] For front cover glass (CG), as a front cover display product, acid or alkaline etching will amplify scratches, resulting in a high rate of process scratches. Therefore, after tempering, double-sided polishing is used to further enhance the strength of CG CG products and reduce the risk of warping. The polished CG CG surface is rich in silicon-oxygen bonds or silanol groups. Further organic acid treatment, under the action of organic acids, reconnects the broken silicon-oxygen bonds on the pre-treated glass surface through dehydration condensation reaction. This further improves the integrity and rigidity of the microstructure of the CG CG surface, effectively enhancing the center drop ball level of the strengthened CG CG and improving its impact resistance.

[0075] In some embodiments, the glass-ceramic is a back cover glass-ceramic, wherein the nucleating agent of the back cover glass-ceramic satisfies alkali resistance ≤ acid resistance, and the strengthening method of the back cover glass-ceramic includes:

[0076] The back cover glass is subjected to a series of treatments: a first polishing treatment, a first alkaline etching treatment, tempering treatment, a second surface modification treatment, and an organic acid treatment. The second surface modification treatment includes either a second polishing treatment or a second alkaline etching treatment. The first and second alkaline etching treatments are performed independently. The treatment system comprises 40%-80% KOH and 0%-60% NaOH by mass. The second polishing treatment includes single-sided abrasive polishing, which effectively improves the strength of the strengthened glass-ceramic product. By performing a second surface modification treatment (polishing or alkaline etching) after tempering, microcracks and tempering agent residues on the surface of the strengthened glass-ceramic can be effectively removed, improving the uniformity of stress distribution on the surface of the strengthened glass-ceramic. Because the back cover glass product has an AG surface, only the back side of the glass product can be polished using a single-sided abrasive. Problems such as surface microcracks, residual tempering agents, and uneven surface stress distribution on the front side (AG surface) cannot be completely resolved. Therefore, the second surface finishing process, using a second polishing treatment, results in a lower strength improvement for the glass than using a second alkaline etching treatment. This application, by controlling the processing system of the second alkaline etching treatment, can significantly reduce the roughness of the strengthened glass and improve its impact resistance.

[0077] In some embodiments, the second surface modification treatment is a second polishing treatment, which is a single-sided abrasive polishing treatment; the conditions for single-sided abrasive polishing treatment include: a polishing amount of 1-10 μm, a polishing solution containing cerium oxide, and a polishing time of 1-10 min.

[0078] In some embodiments, the second surface modification treatment is a second alkaline etching treatment, wherein the first and second alkaline etching treatments independently satisfy the following conditions: the treatment temperature is 80-240℃, and the treatment time is 5-240 min; the first alkaline etching treatment includes etching with a first alkaline solution or a first molten alkali, and the second alkaline etching treatment includes etching with a second alkaline solution or a second molten alkali; wherein the first and second alkaline solutions independently comprise 40%-85% by mass of alkali, 0.2%-10% by mass of chelating agent, and 14.8%-69.8% by mass of water; the alkali includes KOH and / or NaOH; the chelating agent includes at least one of sodium citrate, disodium ethylenediaminetetraacetate, and sodium gluconate; and the first and second molten alkalis are independently composed of KOH and NaOH.

[0079] This application can effectively prevent the precipitation of alkali in the alkaline solution and control the etching rate by controlling the temperature and time of the first and second alkaline etching processes.

[0080] In some embodiments, the second surface modification treatment is a second alkaline etching treatment, wherein the first alkaline etching treatment and the second alkaline etching treatment satisfy the following: the mass fraction of alkali in the first alkaline solution and the second alkaline solution is 40%; and the treatment temperature is 80-130℃.

[0081] In some embodiments, the second surface modification treatment is a second alkaline etching treatment. The first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution. The first and second alkaline etching treatments satisfy the following conditions: the mass fraction of alkali in the first and second alkaline solutions is 50%; and the treatment temperature is 100-140°C.

[0082] In some embodiments, the second surface modification treatment is a second alkaline etching treatment. The first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution. The first and second alkaline etching treatments satisfy the following conditions: the mass fraction of alkali in the first and second alkaline solutions is 60%; and the treatment temperature is 125-170°C.

[0083] In some embodiments, the second surface modification treatment is a second alkaline etching treatment. The first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution. The first and second alkaline etching treatments satisfy the following: the mass fraction of alkali in the first and second alkaline solutions is 80%; and the treatment temperature is 180-220°C.

[0084] In some embodiments, the second surface modification treatment is a second alkaline etching treatment. The first alkaline etching treatment includes etching with a first molten alkali, and the second alkaline etching treatment includes etching with a second molten alkali. The first and second molten alkalis are independently composed of KOH and NaOH. Since the melting points of individual alkalis are all >300℃, excessively high temperatures result in extremely fast etching rates, making them unsuitable as alkaline etching solutions. However, mixing KOH and NaOH can form a eutectic system, which significantly lowers the melting point, allowing it to be used as an alkaline etching solution.

[0085] In some embodiments, the first molten alkali and the second molten alkali are independently composed of KOH and NaOH, with a mass ratio of KOH to NaOH of 63:37. The melting point of the molten alkali system can be reduced to 180°C for alkaline etching treatment. The processing temperatures of the first alkaline etching treatment and the second alkaline etching treatment are independently between 185-240°C.

[0086] In some embodiments, the second surface modification treatment is a second alkaline etching treatment, wherein the first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution, wherein the first and second alkaline solutions are independently composed of the following components in mass fractions:

[0087] Alkali content 40%-85%;

[0088] Chelating agent 0.2%-10%; and

[0089] Water balance.

[0090] Since microcrystalline glass generally has good alkali resistance, this application can effectively control the etching speed by adjusting the alkali content in the alkali solution.

[0091] In some embodiments, the second surface modification treatment is a second alkaline etching treatment, wherein the first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution, wherein the first and second alkaline solutions are independently composed of the following components in mass fractions:

[0092] Alkali content 65%-85%;

[0093] Chelating agent 0.2%-2%; and

[0094] Water balance.

[0095] In some embodiments, the second surface modification treatment is a second alkaline etching treatment, wherein the first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution, wherein the first and second alkaline solutions are independently composed of the following components in mass fractions:

[0096] Alkali content 40%-65%;

[0097] Chelating agents 2%-8%; and

[0098] Water balance.

[0099] In some embodiments, the second surface modification treatment is a second alkaline etching treatment, wherein the first alkaline etching treatment includes etching with a first alkaline solution, and the second alkaline etching treatment includes etching with a second alkaline solution, wherein the first and second alkaline solutions are independently composed of the following components in mass fractions:

[0100] Alkali content 30%-40%;

[0101] Chelating agents 5%-10%; and

[0102] Water balance.

[0103] In some embodiments, the chelating agent includes at least one of sodium citrate, disodium EDTA, and sodium gluconate.

[0104] In some embodiments, the inorganic acid etching process specifically includes: etching with an inorganic acid solution;

[0105] The inorganic acid solution includes 5%-30% HF by mass, which can be 5%, 10%, 15%, 20%, 25% or 30% HF by mass.

[0106] In some embodiments, the polishing process includes at least one of laser polishing and abrasive polishing; the abrasive polishing process includes single-sided abrasive polishing or double-sided abrasive polishing.

[0107] In this application, polishing refers to a processing method that uses mechanical and chemical assistance to reduce the surface roughness of a workpiece in order to obtain a bright and smooth surface. It is a method of modifying the surface of a workpiece by using polishing tools and abrasive particles or other polishing media.

[0108] In some embodiments, when the microcrystalline glass is a front cover microcrystalline glass, the second polishing process is a double-sided abrasive polishing process; the conditions for the double-sided abrasive polishing process include: a polishing amount of 2-20 μm, which can be 2 μm, 4 μm, 6 μm, 8 μm, 10 μm, 12 μm, 14 μm, 16 μm, 18 μm or 20 μm; the polishing solution includes cerium oxide; and the polishing time is 2-20 min, which can be 2 min, 5 min, 10 min, 15 min or 20 min;

[0109] When the microcrystalline glass is a back cover microcrystalline glass, the second polishing process is a single-sided abrasive polishing process; the conditions for single-sided abrasive polishing process include: polishing amount of 1-10μm, which can be 1μm, 2μm, 4μm, 6μm, 8μm or 10μm; polishing liquid includes cerium oxide; polishing time of 1-10min, which can be 1min, 2min, 4min, 6min, 8min or 10min.

[0110] In some embodiments, the double-sided polishing process specifically includes: wrapping a polishing pad with a polishing skin as an abrasive; using the abrasive and polishing fluid to perform double-sided polishing of the microcrystalline glass to be polished, wherein the polishing fluid is located between the abrasive and the glass to be polished; wherein the polishing amount is 2-20 μm, the material of the polishing skin includes white leather (containing polyurethane), rubber filaments (containing resin) or pig bristles (containing protein), the polishing fluid includes cerium oxide, and the polishing time is 2-20 min; in the abrasive used for double-sided polishing, the upper and lower abrasives rotate in opposite directions, and the rotation speed of the upper and lower abrasives is 30-50 revolutions / min.

[0111] In some embodiments, in the double-sided abrasive polishing process, the polishing solution includes cerium oxide and a solvent; the concentration of cerium oxide in the polishing solution is 0.5-3 g / mL, which can be 0.5 g / mL, 0.8 g / mL, 1 g / mL, 1.2 g / mL, 1.5 g / mL, 2 g / mL, 2.5 g / mL or 3 g / mL, and the solvent is water.

[0112] In some embodiments, single-sided abrasive polishing specifically includes: wrapping a polishing pad with a polishing skin as an abrasive; using the abrasive and polishing fluid to perform single-sided polishing of the microcrystalline glass to be polished, wherein the polishing fluid is located between the abrasive and the glass to be polished; wherein the polishing amount is 1-10 μm, the material of the polishing skin includes white leather (containing polyurethane), rubber filaments (containing resin) or pig bristles (containing protein), the polishing fluid includes cerium oxide, and the polishing time is 1-10 min; in the abrasive used for single-sided polishing, the upper abrasive rotates while the lower abrasive does not rotate, and the rotation speed of the upper abrasive is 30-50 revolutions / min.

[0113] In some embodiments, in the single-sided abrasive polishing process, the polishing solution includes cerium oxide and a solvent; the concentration of cerium oxide in the polishing solution is 0.5-3 g / mL, which can be 0.5 g / mL, 0.8 g / mL, 1 g / mL, 1.2 g / mL, 1.5 g / mL, 2 g / mL, 2.5 g / mL or 3 g / mL, and the solvent is water.

[0114] In a second aspect, this application provides a reinforced glass crystal, prepared by the glass crystal strengthening method described in the first aspect.

[0115] The embodiments of this application will be described in detail below with reference to examples. It should be understood that these embodiments are for illustrative purposes only and are not intended to limit the scope of this application. For experimental methods in the following embodiments where specific conditions are not specified, please refer to the guidelines given in this application, or follow experimental manuals or conventional conditions in the art, or follow the conditions recommended by the manufacturer, or refer to experimental methods known in the art.

[0116] As an example, the raw materials used in the embodiments of this application are as follows:

[0117] Back cover (BG) glass-ceramic with P2O5 as nucleating agent: composed of the following components by mass fraction: SiO2 69%, Al2O3 18%, Li2O 5%, MgO 1.5%, ZnO 1.0%, P2O5 5%, and Sb2O3 0.5%; the dimensions of the BG glass-ceramic are 161mm × 74mm × 4mm (length × width × thickness);

[0118] Back cover (BG) glass-ceramic with ZrO2 as nucleating agent: SiO2 65%, Al2O3 13%, Li2O 8%, ZrO2 8%, MgO 1%, Na2O 2.5%, ZnO 1%, TiO2 1%, and Sb2O3 0.5%; the dimensions of the BG glass-ceramic are 161mm × 74mm × 4mm (length × width × thickness);

[0119] The front cover (CG) glass-ceramic with P2O5 as the nucleating agent consists of: SiO2 69%, Al2O3 18%, Li2O 5%, MgO 1.5%, ZnO 1.0%, P2O5 5%, and Sb2O3 0.5%; the dimensions of the CG glass-ceramic are 161mm × 74mm × 4mm (length × width × thickness).

[0120] Example 1

[0121] The strengthening methods for glass-ceramics are as follows:

[0122] (1) Using P2O5 as the nucleating agent, the back cover glass is used as the microcrystalline glass. The first polishing treatment is carried out. The first polishing treatment is as follows: a polishing skin is wrapped on the polishing pad as an abrasive. A double-sided polishing machine, abrasive and cerium oxide polishing liquid (cerium oxide concentration is 1.2g / mL, solvent is water) are used to polish the microcrystalline glass to be polished on both sides. The polishing liquid is located between the abrasive and the glass to be polished. The pressure of the double-sided polishing machine is 0.15MPa, the material of the polishing skin is white skin (containing polyurethane), and the polishing time is 50min. In the abrasive used for double-sided polishing, the upper and lower abrasives rotate in opposite directions and the rotation speed of the abrasive is 50 revolutions / min.

[0123] (2) The microcrystalline glass after the first polishing treatment is immersed in the first alkaline solution (composed of 80% KOH, 0.5% sodium gluconate and 19.5% water) for the first alkaline etching treatment at a temperature of 200°C for 9000s.

[0124] (3) The microcrystalline glass after the first alkaline etching treatment was immersed in tempering salt (composition: 80% by mass of NaNO3 and 20% by mass of KNO3) for tempering treatment at a temperature of 500℃ for 210 min.

[0125] (4) The tempered microcrystalline glass is immersed in the second alkaline solution (composed of 80% KOH, 0.5% sodium gluconate and 19.5% water) for a second alkaline etching treatment at a temperature of 200°C for 1800s.

[0126] (5) The microcrystalline glass after the second alkaline etching treatment is immersed in an organic acid immersion solution (composed of 10% by mass of hydroxyethylidene diphosphonic acid and 90% by mass of water) for organic acid treatment at a temperature of 95°C for 60 min to prepare reinforced microcrystalline glass.

[0127] Example 2

[0128] The strengthening method of the microcrystalline glass in Example 2 is basically the same as that in Example 1, except that: the first alkaline solution is composed of 60% NaOH, 5% sodium gluconate and 35% water by mass; the temperature of the first alkaline etching treatment is 155°C; the second alkaline solution is composed of 60% NaOH, 5% sodium gluconate and 35% water by mass; and the strengthened microcrystalline glass is prepared according to the method of Example 1.

[0129] Example 3

[0130] The strengthening method of the microcrystalline glass in Example 3 is basically the same as that in Example 1, except that: the first alkaline solution is composed of 63% KOH and 37% NaOH by mass; the second alkaline solution is composed of 63% KOH and 37% NaOH by mass; and the strengthened microcrystalline glass is prepared according to the method in Example 1.

[0131] Example 4

[0132] The strengthening method of the microcrystalline glass in Example 4 is basically the same as that in Example 1, except that step (4) is different. Step (4) is: the tempered microcrystalline glass is immersed in a single-sided abrasive polishing treatment (single-sided LP). The single-sided abrasive polishing treatment is as follows: a layer of white skin (containing polyurethane) polishing skin is wrapped on the polishing pad as an abrasive; the abrasive and cerium oxide polishing liquid (cerium oxide concentration is 1.2g / mL, solvent is water) are used to polish the microcrystalline glass to be polished on one side. The polishing liquid is located between the abrasive and the glass to be polished. The polishing amount is 1-10μm, the material of the polishing skin is white skin (containing polyurethane), the polishing liquid includes cerium oxide, and the polishing time is 5min. In the two abrasives for single-sided polishing, the upper abrasive rotates while the lower abrasive does not rotate. The rotation speed of the abrasive is 50 revolutions / min. The strengthened microcrystalline glass is prepared according to the method of Example 1.

[0133] Example 5

[0134] (1) The back cover glass with ZrO2 as nucleating agent is used as the microcrystalline glass, and the first polishing treatment is carried out. The first polishing treatment is the same as in Example 1.

[0135] (2) The microcrystalline glass after the first polishing treatment was immersed in an inorganic acid solution (composed of 10% HF and 90% water by mass) for acid etching treatment at a temperature of 30°C for 300s.

[0136] (3) The microcrystalline glass after the first alkaline etching treatment was immersed in tempering salt (composition: 80% by mass of NaNO3 and 20% by mass of KNO3) for tempering treatment at a temperature of 500℃ for 210 min.

[0137] (4) The tempered microcrystalline glass is subjected to single-sided abrasive polishing treatment (single-sided LP), and the single-sided abrasive polishing treatment is the same as in Example 4;

[0138] (5) The microcrystalline glass after single-sided polishing is immersed in an organic acid immersion solution (composed of 10% by mass of hydroxyethylidene diphosphonic acid and 90% by mass of water) for organic acid treatment at 95°C for 60 min to prepare reinforced microcrystalline glass.

[0139] Example 6

[0140] (1) Using P2O5 as the nucleating agent, the front cover glass was polished for the first time. The first polishing process was the same as in Example 1.

[0141] (2) The microcrystalline glass after the first polishing treatment was immersed in tempering salt (composition: 80% by mass of NaNO3 and 20% by mass of KNO3) for tempering treatment at 500℃ for 210 min.

[0142] (3) The tempered microcrystalline glass is subjected to double-sided polishing treatment (double-sided LP). The double-sided polishing treatment is as follows: a layer of white skin (containing polyurethane) polishing skin is wrapped on the polishing pad as a polishing tool; the polishing tool and cerium oxide polishing liquid (cerium oxide concentration is 1.2g / mL, solvent is water) are used to polish the microcrystalline glass to be polished on both sides. The polishing liquid is located between the polishing tool and the glass to be polished. The polishing amount is 2-20μm. The polishing skin material includes white skin (containing polyurethane), rubber filament (containing resin) or pig hair (containing protein). The polishing liquid includes cerium oxide. The polishing time is 9min. The two polishing tools used for double-sided polishing rotate in opposite directions. The rotation speed of the polishing tool is 50 revolutions / min.

[0143] (4) The microcrystalline glass after double-sided polishing is immersed in an organic acid immersion solution (composed of 10% by mass of hydroxyethylidene diphosphonic acid and 90% by mass of water) for organic acid treatment at 95°C for 60 min to prepare reinforced microcrystalline glass.

[0144] Comparative Example 1

[0145] The strengthening methods for glass-ceramics are as follows:

[0146] (1) The back cover glass with P2O5 as nucleating agent is used as the microcrystalline glass, and the first polishing treatment is carried out. The first polishing treatment is the same as in Example 1.

[0147] (2) The microcrystalline glass after the first polishing treatment was immersed in an inorganic acid solution (composed of 10% HF and 90% water by mass) for acid etching treatment at a temperature of 30°C for 300s.

[0148] (3) The microcrystalline glass after acid etching is immersed in tempering salt (composed of 80% NaNO3 and 20% KNO3 by mass) for tempering treatment at 500℃ for 210 min.

[0149] (4) The tempered microcrystalline glass is subjected to single-sided abrasive polishing treatment (single-sided LP), and the single-sided abrasive polishing treatment is the same as in Example 5;

[0150] (5) The microcrystalline glass after single-sided polishing is immersed in an organic acid immersion solution (composed of 10% by mass of hydroxyethylidene diphosphonic acid and 90% by mass of water) for organic acid treatment at 95°C for 60 min to prepare reinforced microcrystalline glass.

[0151] Comparative Example 2

[0152] The strengthening methods for glass-ceramics are as follows:

[0153] (1) The back cover glass with P2O5 as nucleating agent is used as the microcrystalline glass, and the first polishing treatment is carried out. The first polishing treatment is the same as in Example 1.

[0154] (2) The microcrystalline glass after the first polishing treatment was immersed in an inorganic acid solution (composed of 10% HF and 90% water by mass) for acid etching treatment at a temperature of 30°C for 300s.

[0155] (3) The microcrystalline glass after acid etching is immersed in tempering salt (composed of 80% NaNO3 and 20% KNO3 by mass) for tempering treatment at 500℃ for 210 min.

[0156] (4) The tempered microcrystalline glass was immersed in an alkaline solution (composed of 80% KOH, 0.5% sodium gluconate and 19.5% water) for alkaline etching at a temperature of 200°C for 1800s.

[0157] (5) The microcrystalline glass after alkaline etching is immersed in an organic acid immersion solution (composed of 10% by mass of hydroxyethylidene diphosphonic acid and 90% by mass of water) for organic acid treatment at a temperature of 95°C for 60 min to prepare reinforced microcrystalline glass.

[0158] Comparative Example 3

[0159] The strengthening method of the microcrystalline glass in Comparative Example 3 is basically the same as that in Example 1, except that the back cover microcrystalline glass with ZrO2 as the nucleating agent is used as the microcrystalline glass; and the strengthened microcrystalline glass is prepared according to the method in Example 1.

[0160] The strengthening methods for glass-ceramics are as follows:

[0161] (1) The back cover glass with ZrO2 as nucleating agent is used as the microcrystalline glass, and the first polishing treatment is carried out. The first polishing treatment is the same as in Example 1.

[0162] (2) The microcrystalline glass after the first polishing treatment is immersed in the first alkaline solution (composed of 80% KOH, 0.5% sodium gluconate and 19.5% water) for the first alkaline etching treatment at a temperature of 200°C for 9000s.

[0163] (3) The microcrystalline glass after the first alkaline etching treatment was immersed in tempering salt (composition: 80% by mass of NaNO3 and 20% by mass of KNO3) for tempering treatment at a temperature of 500℃ for 210 min.

[0164] (4) The tempered microcrystalline glass is immersed in the second alkaline solution (composed of 80% KOH, 0.5% sodium gluconate and 19.5% water) for a second alkaline etching treatment at a temperature of 200°C for 1800s.

[0165] (5) The microcrystalline glass after the second alkaline etching treatment is immersed in an organic acid immersion solution (composed of 10% by mass of hydroxyethylidene diphosphonic acid and 90% by mass of water) for organic acid treatment at a temperature of 95°C for 60 min to prepare reinforced microcrystalline glass.

[0166] Comparative Example 4

[0167] The strengthening methods of the microcrystalline glass in Comparative Example 4 and Example 4 are basically the same, except that: the back cover microcrystalline glass with ZrO2 as the nucleating agent is used as the microcrystalline glass; and the strengthened microcrystalline glass is prepared according to the method of Example 4.

[0168] Comparative Example 5

[0169] The strengthening methods for the microcrystalline glass in Comparative Example 5 and Example 6 are basically the same, except that: no organic acid treatment was performed; and the strengthened microcrystalline glass was prepared according to the method of Example 6.

[0170] Comparative Example 6

[0171] The strengthening methods for the microcrystalline glass in Comparative Example 6 and Example 6 are basically the same, except that: double-sided polishing (double-sided LP) was not performed; and the strengthened microcrystalline glass was prepared according to the method of Example 6.

[0172] Comparative Example 7

[0173] The strengthening methods for the microcrystalline glass in Comparative Example 7 and Example 6 are basically the same, except that: double-sided abrasive polishing (double-sided LP) and organic acid treatment were not performed; and the strengthened microcrystalline glass was prepared according to the method of Example 6.

[0174] Comparative Example 8

[0175] The strengthening method of the microcrystalline glass in Comparative Example 8 is basically the same as that in Example 1, except that the KOH in the first alkaline solution and the second alkaline solution is replaced with NaOH of equal mass fraction; and the strengthened microcrystalline glass is prepared according to the method in Example 1.

[0176] Experimental Example 1

[0177] In the preparation of reinforced glass-ceramics, white light interferometers were used to test the surface morphology of the prepared reinforced glass-ceramics and measure the surface roughness Sa of the reinforced glass-ceramics. Five glass-ceramics were tested in each group of verification tests, and five points were tested on each glass-ceramics. The specific results were based on the average value of 25 data points.

[0178] Central drop ball tests were conducted on tempered and reinforced glass-ceramics from each embodiment and comparative example. A cylinder with a metal sphere at one end was used to directly contact the sample. A 60g weight was dropped into the cylinder to indirectly impact the sample. The free fall height of the weight ranged from 20-100cm, starting at 20cm. If the sample did not break after impact, the height was increased by 5cm for a second impact. If the sample broke, the unbroken height was recorded (e.g., if the height was 50cm and the sample broke, the central drop ball height was recorded as 45cm). Twenty replicates were set for each sample. The average increase in central drop ball height after tempered glass-ceramics was calculated.

[0179] The results are shown in Table 1.

[0180] Table 1 Test results of Examples 1-6 and Comparative Examples 1-8

[0181]

[0182] " / " indicates that it was not measured.

[0183] The results are shown in Table 1:

[0184] Comparing Examples 1-4 and Comparative Examples 1-2 of this application, it can be seen that the surface roughness of the reinforced glass-ceramic product after etching is positively correlated with the average height of the central drop ball. For BG glass-ceramics with phosphorus pentoxide as the nucleating agent, the reinforced glass-ceramics prepared by alkaline etching in Examples 1-4 have significantly better impact resistance than those prepared by acid etching. This indicates that BG glass-ceramics with phosphorus pentoxide as the nucleating agent are unfavorable for acid etching.

[0185] Comparing Example 5 and Comparative Examples 3-4, it can be seen that for BG glass-ceramic products with ZrO2 as the nucleating agent, the inorganic acid etching process is beneficial to improve the impact resistance of the strengthened glass-ceramic, but is not suitable for the alkaline etching process.

[0186] Comparing Example 6 and Comparative Examples 5-7, it can be seen that the chemical strengthening process for CG glass-ceramics, which employs a first polishing treatment, tempering treatment, double-sided abrasive polishing treatment, and organic acid treatment, with each step working in synergy, can improve the impact resistance of the strengthened glass-ceramics.

[0187] Comparing Example 1 and Comparative Example 8, it is evident that etching with KOH is superior to etching with NaOH. This is because the products of the reaction between alkali and glass-ceramics are primarily silicates. Sodium silicate, generated by the reaction with NaOH, is highly viscous and easily adheres to the glass-ceramics, leading to uneven etching and increased surface roughness. In contrast, potassium silicate, generated by the reaction with KOH, is less viscous and does not easily adhere to the glass-ceramics, resulting in a smoother and better surface finish after etching. Furthermore, the NaOH alkaline etching solution system exhibits a faster etching speed, but its etching uniformity and stability are lower than those of the KOH alkaline etching solution system.

[0188] Comparing Examples 1 and 5, it can be seen that the chemically strengthened microcrystalline glass prepared by single-sided abrasive polishing after tempering has weaker impact resistance than that prepared by a second alkaline etching treatment.

[0189] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0190] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A method for strengthening microcrystalline glass, characterized in that, Includes the following steps: The microcrystalline glass is subjected to a first surface modification treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment in sequence. The first surface modification treatment and the second surface modification treatment independently include at least one of polishing treatment, alkaline etching treatment, and inorganic acid etching treatment.

2. The method for strengthening microcrystalline glass according to claim 1, characterized in that, The microcrystalline glass is a front cover glass, and the strengthening method of the front cover glass includes: The front cover glass is subjected to a first polishing treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence.

3. The method for strengthening microcrystalline glass according to claim 1, characterized in that, The microcrystalline glass is a back cover microcrystalline glass, and the nucleating agent of the back cover microcrystalline glass satisfies the requirement that alkali resistance ≤ acid resistance. The strengthening method of the back cover microcrystalline glass includes: The back cover glass is subjected to a first polishing treatment, a first alkaline etching treatment, a tempering treatment, a second surface modification treatment, and an organic acid treatment in sequence. The second surface modification treatment includes either a second polishing treatment or a second alkaline etching treatment. The first and second alkaline etching treatments are independent of each other and satisfy the following conditions: the treatment system includes 40%-80% KOH by mass and 0%-60% NaOH by mass; Optionally, the nucleating agent of the back cover glass microcrystalline includes at least one of TiO2, P2O5, SnO2 and Cr2O3.

4. The method for strengthening microcrystalline glass according to claim 1, characterized in that, The microcrystalline glass is a back cover glass, and the nucleating agent of the back cover glass satisfies the condition that alkali resistance > acid resistance. The strengthening method of the back cover glass includes: The back cover glass is subjected to a first polishing treatment, an inorganic acid etching treatment, a tempering treatment, a second polishing treatment, and an organic acid treatment in sequence. Optionally, the nucleating agent of the back cover glass microcrystalline includes at least one of ZrO2 and Fe2O3.

5. The method for strengthening microcrystalline glass according to any one of claims 1-4, characterized in that, The organic acid treatment specifically includes: soaking in an organic acid soaking solution; The organic acid immersion solution comprises the following components by mass fraction: Organic acids 3%-15%; Organic additives: 0%-30%; Inorganic acids 0%-5%; and Water content 50%-97%; Optionally, the organic acid in the organic acid immersion solution includes at least one of hydroxyethylidene diphosphonic acid, aminotrimethylphosphonic acid, ethylenediaminetetramethylidene phosphonic acid, phosphonate butylamine-1,2,4-tricarboxylic acid, itaconic acid, tartaric acid, citric acid, maleic acid, oxalic acid, malonic acid, isophenylene disulfonic acid, 1,4-butanedisulfonic acid, and methyl disulfonic acid. Optionally, the organic additives in the organic acid soaking solution include at least one of ethylene glycol, glycerin, and polyethylene glycol; Optionally, the inorganic acid in the organic acid immersion solution includes at least one of sulfuric acid, nitric acid, and hydrochloric acid; Optional conditions for organic acid treatment include: a temperature of 50-100℃ and a time of 2-180 min.

6. The method for strengthening microcrystalline glass according to claim 3, characterized in that, The second surface finishing process is a second polishing process, and the second polishing process is a single-sided abrasive polishing process; The conditions for single-sided abrasive polishing include: polishing amount of 1-10 μm, polishing solution containing cerium oxide, and polishing time of 1-10 min.

7. The method for strengthening microcrystalline glass according to claim 3, characterized in that, The second surface modification treatment is a second alkaline etching treatment; the first alkaline etching treatment and the second alkaline etching treatment independently satisfy the following conditions: the treatment temperature is 80-240℃ and the treatment time is 5-240min. The first alkaline etching process includes etching with a first alkaline solution or a first molten alkali, and the second alkaline etching process includes etching with a second alkaline solution or a second molten alkali. The first and second alkaline solutions independently comprise 40%-85% by mass of alkali, 0.2%-10% by mass of chelating agent, and 14.8%-69.8% by mass of water. The alkali includes KOH and / or NaOH; The chelating agent includes at least one of sodium citrate, disodium ethylenediaminetetraacetate, and sodium gluconate; The first and second molten bases are independently composed of KOH and NaOH.

8. The method for strengthening microcrystalline glass according to claim 4, characterized in that, Acid etching treatment specifically includes etching with inorganic acid solutions; The inorganic acid solution includes 5%-30% by mass of HF.

9. The method for strengthening microcrystalline glass according to claim 2, characterized in that, The microcrystalline glass is the front cover microcrystalline glass, and the second polishing process is a double-sided abrasive polishing process. The conditions for double-sided abrasive polishing include: polishing amount of 2-20 μm; polishing slurry containing cerium oxide; and polishing time of 2-20 min.

10. A reinforced microcrystalline glass, characterized in that, The microcrystalline glass is prepared by the strengthening method according to any one of claims 1-9.

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