Film coating device with adjustable magnetron sputtering distance

Abstract

The invention discloses a magnetron sputtering distance-adjustable coating device, and aims to drive a conveying module to move in the Y-axis direction through a distance adjusting module so as to adjust the distance between a substrate of a substrate frame and a sputtering cathode assembly, so that the coating quality is improved, and the technical scheme is as follows: the magnetron sputtering distance-adjustable coating device comprises a shell which is provided with a process cavity; a sputtering cathode assembly and a conveying module are arranged in the process cavity; a film coating position is arranged on the conveying module, and the conveying module is used for conveying the substrate frame to the film coating position for film coating; the sputtering cathode assembly is used for coating a substrate on the substrate frame in the Y-axis direction; the shell is provided with a distance adjusting module, the distance adjusting module is connected with the conveying module, and the distance adjusting module is used for driving the conveying module to move in the Y-axis direction so as to adjust the distance between a substrate of the substrate frame and the sputtering cathode assembly.

Description

Technical Field

[0001] This invention belongs to the field of sputtering coating, and more specifically, relates to a coating apparatus with adjustable magnetron sputtering distance. Background Technology

[0002] Sputtering coating technology uses ions to bombard the surface of a target material, and the phenomenon of the target material's atoms being ejected is called sputtering. The atoms generated by sputtering are deposited on the surface of the substrate to form a film, which is called sputtering coating. Usually, gas discharge is used to generate gas ionization, and the positive ions bombard the cathode target at high speed under the action of an electric field, ejecting the cathode target atoms or molecules, which fly to the surface of the substrate to be coated and deposit into a thin film.

[0003] CN108774731A discloses a vacuum chamber substrate holder lifting module for a vacuum coating machine. Two cylinders are fixed below the bottom plate of the vacuum chamber, and the piston rods of the two cylinders are connected to the same end plate. Each end of the end plate is provided with a support rod, which penetrates the bottom plate of the vacuum chamber and extends into the vacuum chamber. The top of the support rod is connected to a support seat, and a sealing plate is provided where the support rod passes through the bottom plate of the vacuum chamber. A corrugated tube is sleeved on the support rod between the vacuum chamber and the end plate, and the two ends of the corrugated tube are respectively sealed to the sealing plate and the end plate.

[0004] In the above technical solution, the substrate holder is separated from the transmission module by a lifting module, so that one or more substrate holders can be independently transmitted in a vacuum environment. However, the distance between the substrate holder and the target material in this technical solution is fixed and cannot be adjusted. Therefore, it is difficult to flexibly adjust the distance between the substrate and the target material according to the actual coating requirements during coating, which affects the coating quality. Summary of the Invention

[0005] The main objective of this invention is to provide a coating apparatus with adjustable magnetron sputtering distance, which aims to improve coating quality by driving the conveying module to move along the Y-axis through the distance adjustment module.

[0006] According to a first aspect of the present invention, a magnetron sputtering distance adjustable coating apparatus is provided, comprising a housing having a process cavity, wherein a sputtering cathode assembly and a transport module are disposed within the process cavity;

[0007] The conveying module is equipped with a coating position, which is used to convey the substrate holder to the coating position; the sputtering cathode assembly is used to coat the substrate on the substrate holder at the coating position along the Y-axis direction.

[0008] The housing is equipped with a distance adjustment module, which is connected to the conveying module. The distance adjustment module is used to drive the conveying module to move along the Y-axis to adjust the distance between the substrate of the substrate holder and the sputtering cathode assembly.

[0009] In the above-mentioned magnetron sputtering distance adjustable coating apparatus, the top of the substrate holder is made of magnetic material in the X-axis direction.

[0010] The conveying module includes a conveying wheel mechanism and a magnetic attraction mechanism located inside the process chamber, with the conveying wheel mechanism situated below the magnetic attraction mechanism;

[0011] The conveyor wheel mechanism is used to transport the substrate holder along the X-axis, and the magnetic attraction mechanism is used to attract the top of the substrate holder transported on the conveyor wheel mechanism so that the substrate holder is kept upright.

[0012] The pitch adjustment module is connected to the magnetic attraction mechanism and the conveyor wheel mechanism. The pitch adjustment module is used to drive the magnetic attraction mechanism and the conveyor wheel mechanism to move synchronously towards or away from the sputtering cathode assembly, thereby changing the pitch between the substrate of the substrate holder and the sputtering cathode assembly.

[0013] In the above-mentioned magnetron sputtering distance adjustable coating device, the magnetic attraction mechanism includes a lead screw, a turbine lead screw lifting assembly, and a drive motor;

[0014] Both the lead screw and the worm gear lead screw lifting assembly are located inside the process cavity. The lead screw is arranged vertically and is connected to the worm gear lead screw lifting assembly for transmission.

[0015] The drive motor is located outside the process chamber. One end of the drive motor's shaft passes through the housing and is connected to the worm gear lifting assembly in the process chamber. The drive motor is also connected to the pitch adjustment module.

[0016] A magnetic block is provided at the bottom of the lead screw, and the length of the magnetic block extends along the X-axis. The magnetic block is located above the transmission wheel.

[0017] In the above-mentioned magnetron sputtering distance adjustable coating device, the conveyor wheel mechanism includes multiple conveyor wheels and a rotary motor;

[0018] Multiple conveyor wheels are arranged at intervals along the X-axis, and each conveyor wheel is connected to a rotary motor, which drives the conveyor wheel to rotate; all rotary motors are connected to the pitch adjustment module.

[0019] In the above-mentioned magnetron sputtering distance adjustable coating device, the distance adjustment module includes a first driving unit and a second driving unit. The first driving unit and the second driving unit are both located on the same side of the housing, and the first driving unit is located above the second driving unit.

[0020] The first drive unit is connected to the drive motor and is used to drive the drive motor to move along the Y-axis.

[0021] The rotary motor and the second drive unit are in one-to-one correspondence. The rotary motor is connected to the corresponding second drive unit, and the second drive unit is used to drive the rotary motor to move along the Y-axis.

[0022] In the above-mentioned magnetron sputtering distance adjustable coating apparatus, the sputtering cathode assembly and the transport module are spaced apart along the Y-axis direction.

[0023] In the above-mentioned magnetron sputtering distance adjustable coating device, a recess is provided on the circumferential surface of the conveyor wheel, which is used to cooperate with the grinding rod of the substrate holder.

[0024] In the above-mentioned magnetron sputtering distance adjustable coating apparatus, a vacuum system is provided on the housing, which is used to create a vacuum environment in the process chamber.

[0025] One of the above-described technical solutions of the present invention has at least one of the following advantages or beneficial effects:

[0026] In this invention, the substrate holder is first transported to the coating position by the conveying module. Then, the worker can activate the spacing adjustment module to drive the conveying module to move closer to or further away from the sputtering cathode assembly, thereby changing the spacing between the substrate and the sputtering cathode assembly. In this way, the worker can adjust the spacing between the substrate and the sputtering cathode assembly according to the process requirements, thereby improving the coating quality. Attached Figure Description

[0027] The present invention will be further described below with reference to the accompanying drawings and embodiments;

[0028] Figure 1 This is a schematic diagram of the structure of the magnetron sputtering distance adjustable coating device according to the first embodiment of the present invention;

[0029] Figure 2 This is a schematic diagram of the substrate holder of the magnetron sputtering distance adjustable coating device according to the first embodiment of the present invention being transported on the conveyor wheel;

[0030] The figure labels for each figure are as follows:

[0031] 1. Housing; 2. Process cavity; 3. Sputtering cathode assembly; 4. Conveying module; 41. Magnetic suction mechanism; 411. Lead screw; 412. Turbine lead screw lifting assembly; 413. Magnetic block; 414. Drive motor; 42. Transmission wheel mechanism; 421. Transmission wheel; 4211. Recess; 422. Rotary motor; 5. Substrate holder; 6. Gap adjustment module; 61. First drive unit; 62. Second drive unit. Detailed Implementation

[0032] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0033] The following disclosure provides many different implementations or examples for different ways of implementing the present invention.

[0034] Reference Figures 1 to 2 As shown, a magnetron sputtering distance adjustable coating device includes a housing 1, the housing 1 having a process cavity 2, and a sputtering cathode assembly 3 and a conveying module 4 disposed in the process cavity 2;

[0035] The conveying module 4 is provided with a coating position, and the conveying module 4 is used to convey the substrate holder 5 to the coating position; the sputtering cathode assembly 3 coats the substrate on the substrate holder 5 at the coating position along the Y-axis direction;

[0036] The housing 1 is provided with a distance adjustment module 6, which is connected to the conveying module 4. The distance adjustment module 6 is used to drive the conveying module 4 to move along the Y-axis direction to adjust the distance between the substrate of the substrate holder 5 and the sputtering cathode assembly 3.

[0037] Generally, the process chamber 2 can be single or multiple. When there is a single process chamber 2, its two ends are respectively connected to the feed chamber and the discharge chamber of the external device. The substrate holder 5 is input from the feed chamber of the external device and output through the discharge chamber of the external device after the coating is completed in the process chamber 2.

[0038] When there are multiple process chambers 2, the multiple process chambers 2 are connected in sequence. The first process chamber 2 is connected to the feed chamber of the external device, and the last process chamber 2 is connected to the discharge chamber of the external device.

[0039] In this design, the conveying module 4 transports the substrate holder 5. After the conveying module 4 transports the substrate holder 5 to the coating position, the conveying module 4 stops operating. Subsequently, the sputtering cathode assembly 3 coats the substrate on the substrate holder 5. When it is necessary to adjust the distance between the substrate on the substrate holder 5 and the sputtering cathode assembly 3, the distance adjustment module 6 can be activated. The distance adjustment module 6 drives the conveying module 4 to move in the Y-axis direction, thereby changing the distance between the substrate on the substrate holder 5 and the sputtering cathode assembly 3. In this way, the worker can adjust the distance between the substrate and the sputtering cathode assembly 3 according to the process requirements, thereby improving the coating quality.

[0040] Preferably, the magnetron sputtering distance adjustable coating apparatus further includes a magnetic material on the top of the substrate holder 5 in the X-axis direction;

[0041] The conveying module 4 includes a magnetic attraction mechanism 41 and a conveying wheel mechanism 42 disposed within the process chamber 2. The magnetic attraction mechanism 41 is located above the conveying wheel mechanism 42 and is used to attract the top of the substrate holder 5 to keep the substrate holder 5 upright.

[0042] The conveyor wheel mechanism 42 is used to convey the substrate holder 5 along the X-axis direction;

[0043] The distance adjustment module 6 is connected to the magnetic attraction mechanism 41 and the transmission wheel mechanism 42. The distance adjustment module 6 is used to drive the magnetic attraction mechanism 41 and the transmission wheel mechanism 42 to move synchronously towards or away from the sputtering cathode assembly 3, thereby changing the distance between the substrate of the substrate holder 5 and the sputtering cathode assembly 3.

[0044] Specifically, the substrate holder 5 is transported by the conveying wheel mechanism 42, and the top of the substrate holder 5 is attracted by the magnetic attraction mechanism 41 to keep the substrate holder 5 upright. After the conveying wheel mechanism 42 transports the substrate holder 5 to the coating position, the conveying wheel mechanism 42 stops moving, while the magnetic attraction mechanism 41 is used to attract the substrate holder 5 to keep it upright. When the distance needs to be adjusted, the distance adjustment module 6 is driven. The distance adjustment module 6 drives the magnetic attraction mechanism 41 and the conveying wheel mechanism 42 to move synchronously in the Y-axis direction, thereby changing the distance between the substrate of the substrate holder 5 and the sputtering cathode assembly 3.

[0045] In this embodiment, the magnetic attraction mechanism 41 includes a lead screw 411, a worm gear lead screw lifting assembly 412, and a drive motor 414;

[0046] Both the lead screw 411 and the worm screw lifting assembly 412 are located in the process chamber 2. The lead screw 411 is connected to the worm screw lifting assembly 412 in a transmission manner, and the lead screw is arranged vertically.

[0047] The drive motor 414 is located outside the process chamber 2. One end of the shaft of the drive motor 414 passes through the housing 1 and is connected to the worm screw lifting assembly 412 in the process chamber 2. The drive motor 414 is connected to the pitch adjustment module 6.

[0048] A magnetic block 413 is provided at the bottom end of the lead screw, and the length direction of the magnetic block 413 extends along the conveying direction of the substrate holder 5.

[0049] The turbine screw lifting assembly 412 has been disclosed in Chinese patent CN103861968A, so the structure of the turbine screw lifting assembly 412 will not be described in detail in this embodiment.

[0050] Specifically, there is a gap between the magnetic block 413 and the top of the substrate holder 5 so that the substrate holder 5 can remain upright. The lifting and lowering of the magnetic block 413 can change the distance between the magnetic block 413 and the top of the substrate holder 5, thereby changing the magnitude of the attraction force of the magnetic block 413 on the substrate holder 5, and thus reducing the pressure of the substrate holder 5 on the transmission wheel 421. Generally, to drive the magnetic block 413 to lift and lower, the drive motor 414 is started. The shaft of the drive motor 414 drives the worm gear screw lifting assembly 412, and then transmits the power to the screw 411 through the worm gear screw lifting assembly 412, thereby driving the screw 411 to move up or down, and thus driving the magnetic block 413 to lift and lower.

[0051] Preferably, the conveyor wheel mechanism 42 includes a plurality of conveyor wheels 421 and a rotary motor 422;

[0052] Multiple conveyor wheels are arranged at intervals along the X-axis. Each conveyor wheel 421 is connected to a rotary motor 422, which drives the conveyor wheel 421 to rotate. All rotary motors 422 are connected to the pitch adjustment module 6.

[0053] Preferably, the circumferential surface of the conveyor wheel 421 is provided with a recess 4211, which is used to cooperate with the grinding rod of the substrate holder 5.

[0054] The substrate holder 5 has been disclosed in Chinese patent CN209669342U, so the structure of the substrate holder 5 will not be described in detail in this embodiment.

[0055] Furthermore, the recess 4211 on the conveyor wheel 421 is used to cooperate with the grinding rod of the substrate holder 5, which can limit the substrate holder 5 and prevent it from shifting during the conveying process. The rotary motor 422 drives the conveyor wheel 421 to rotate, thereby conveying the substrate holder 5.

[0056] More preferably, the pitch adjustment module 6 includes a first drive unit 61 and a second drive unit 62. The first drive unit 61 and the second drive unit 62 are both disposed on the same side of the housing 1, and the first drive unit 61 is located above the second drive unit 62.

[0057] The first drive unit 61 is connected to the drive motor 414, and the first drive unit 61 is used to drive the drive motor 414 to move along the Y-axis direction.

[0058] The rotary motor 422 and the second drive unit 62 are in one-to-one correspondence. The rotary motor 422 is connected to the corresponding second drive unit 62. The second drive unit 62 is used to drive the rotary motor 422 to move along the Y-axis.

[0059] The sputtering cathode assembly 3 and the conveying module 4 are spaced apart along the Y-axis.

[0060] It should be noted here that both the first drive unit 61 and the second drive unit 62 can be linear modules or ball screw modules.

[0061] When the distance needs to be adjusted, the first drive unit 61 and the second drive unit 62 are started simultaneously. The first drive unit 61 drives the drive motor 414 to move in the Y-axis direction, while the second drive unit 62 drives the corresponding rotary motor 422 to move in the Y-axis direction. In this way, the distance between the substrate and the sputtering cathode assembly 3 is changed. During the distance adjustment process, the magnetic block 413 keeps attracting the substrate holder 5 to keep the substrate holder 5 upright and prevent it from tipping over.

[0062] Preferably, the housing 1 is provided with a vacuum system (not shown in the figure), which is used to create a vacuum environment in the process chamber 2.

[0063] The vacuum system has been disclosed in Chinese patent CN116497337A, so the structure of the vacuum system will not be described in detail in this embodiment.

Claims

1. A coating apparatus with adjustable magnetron sputtering distance, characterized in that, The device includes a housing, which has a process cavity, and the process cavity is provided with a sputtering cathode assembly and a delivery module. The conveying module is provided with a coating position, and the conveying module is used to convey the substrate holder to the coating position; the sputtering cathode assembly is used to coat the substrate on the substrate holder at the coating position along the Y-axis direction. The housing is provided with a distance adjustment module, which is connected to the conveying module. The distance adjustment module is used to drive the conveying module to move along the Y-axis to adjust the distance between the substrate of the substrate holder and the sputtering cathode assembly.

2. The magnetron sputtering distance adjustable coating apparatus according to claim 1, characterized in that, The magnetron sputtering distance adjustable coating device also includes an X-axis direction, and the top of the substrate holder is made of magnetic material; The conveying module includes a conveying wheel mechanism and a magnetic attraction mechanism disposed within the process cavity, with the conveying wheel mechanism located below the magnetic attraction mechanism; The conveying wheel mechanism is used to convey the substrate holder along the X-axis direction, and the magnetic attraction mechanism is used to attract the top of the substrate holder conveyed on the conveying wheel mechanism so that the substrate holder is kept upright. The distance adjustment module is connected to the magnetic attraction mechanism and the transmission wheel mechanism. The distance adjustment module is used to drive the magnetic attraction mechanism and the transmission wheel mechanism to move synchronously towards or away from the sputtering cathode assembly, thereby changing the distance between the substrate of the substrate holder and the sputtering cathode assembly.

3. The magnetron sputtering distance adjustable coating apparatus according to claim 2, characterized in that, The magnetic attraction mechanism includes a lead screw, a worm gear lead screw lifting assembly, and a drive motor; Both the lead screw and the turbine lead screw lifting assembly are located inside the process cavity. The lead screw is arranged vertically and is connected to the turbine lead screw lifting assembly in a transmission manner. The drive motor is located outside the process chamber. One end of the drive motor's shaft passes through the housing and is connected to the worm gear lifting assembly in the process chamber. The drive motor is also connected to the pitch adjustment module. The bottom end of the lead screw is provided with a magnetic block, the length direction of which extends along the X-axis, and the magnetic block is located above the transmission wheel mechanism.

4. The magnetron sputtering distance adjustable coating apparatus according to claim 3, characterized in that, The transmission wheel mechanism includes multiple transmission wheels and a rotary motor; Multiple conveyor wheels are arranged at intervals along the X-axis, and each conveyor wheel is connected to a rotary motor for driving the conveyor wheel to rotate; all rotary motors are connected to the pitch adjustment module.

5. The magnetron sputtering distance adjustable coating apparatus according to claim 4, characterized in that, The distance adjustment module includes a first driving unit and a second driving unit, both of which are located on the same side of the housing, with the first driving unit positioned above the second driving unit. The first drive unit is connected to the drive motor, and the first drive unit is used to drive the drive motor to move along the Y-axis direction; The rotary motor and the second drive unit are in one-to-one correspondence. The rotary motor is connected to the corresponding second drive unit, and the second drive unit is used to drive the rotary motor to move along the Y-axis.

6. The magnetron sputtering distance adjustable coating apparatus according to claim 1, characterized in that, The sputtering cathode assembly and the delivery module are spaced apart along the Y-axis.

7. The magnetron sputtering distance adjustable coating apparatus according to claim 4, characterized in that, The circumferential surface of the conveyor wheel has a recess, which is used to cooperate with the grinding rod of the substrate holder.

8. The magnetron sputtering distance adjustable coating apparatus according to claim 1, characterized in that, The housing is equipped with a vacuum system, which is used to create a vacuum environment in the process chamber.

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