Automatic polycrystalline silicon pressing sequence control method
By automating the control of valve opening and pressure, the pressing process of the drain tank in polysilicon production is made intelligent and precise, solving the problems of cumbersome operation and safety hazards in the existing technology, and improving production safety and efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-05
- Publication Date
- 2026-04-21
AI Technical Summary
In polysilicon production, the operation of pressing materials in the drain tank is cumbersome, the workload of personnel is high, the pressure control accuracy depends on manual labor, and there are potential safety hazards.
An automated one-button feeding method is adopted, and the valve opening and pressure are controlled through human-machine interaction equipment to achieve real-time feedback closed-loop control of pressure/liquid level, replacing manual fine-tuning.
It reduces the labor intensity of staff, reduces operational errors, improves operational accuracy and safety, and avoids safety hazards caused by material backflow and pressure fluctuations.
Smart Images

Figure CN121892014A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of control method technology, specifically a method for automatic polysilicon pressing sequence control. Background Technology
[0002] In polysilicon production, during manual pressing operations of the drain tank (chlorosilane tank), operators (on-site) must strictly wear full protective equipment, including gas masks and acid / alkali resistant chemical protective suits. Before operation, it is necessary to confirm that the pit ventilation system (exhaust volume ≥ 5 times / h) is operating normally, and remotely check the status of the GDS toxic and flammable alarm through the DCS system to ensure there is no alarm signal. Subsequently, on-site personnel check the drain tank level gauge, pressure gauge (range 0-1MPa), safety valve (set value equal to 0.7MPa), and nitrogen pressurization valve (ensuring the nitrogen pipeline pressure is approximately equal to 0.6MPa) to confirm that the equipment is sealed and leak-free. After closing all unrelated connecting valves, only the discharge valve leading to the target chlorosilane tank (closed state) remains open. On-site personnel slowly open the nitrogen inlet valve to fill the tank with nitrogen, raising the pressure to 0.4-0.5MPa, and stabilize the pressure for 2 minutes to check for leaks. After confirming there are no leaks, on-site personnel slowly open the discharge valve.
[0003] During the pressing process, the central control operator continuously monitors and fine-tunes the nitrogen valve opening via DCS to precisely stabilize the tank pressure within the range of 0.4-0.5 MPa (to prevent material backflow). Simultaneously, on-site personnel closely coordinate with the central control personnel to monitor liquid level changes. When the liquid level drops below 10%, the discharge valve and nitrogen valve are immediately closed. Finally, the central control personnel open the pressure relief valve (connected to the waste gas recovery system) to slowly release pressure until the residual pressure is below 0.05 MPa. On-site personnel then clean the operating area and record the pressing volume.
[0004] However, the following problems exist in the above operation process:
[0005] The entire operation process is complicated, especially during the pressing process, the nitrogen valve needs to be continuously and manually finely adjusted to accurately maintain a pressure of 0.4-0.5MPa, and the liquid level changes need to be closely monitored at the same time. This results in a high workload for personnel, and staff are prone to operational errors due to fatigue.
[0006] Furthermore, the accuracy of pressure control depends on the subjective judgment of the staff, making it difficult to achieve instantaneous, precise, and stable control of 0.4-0.5MPa pressure. Excessive pressure fluctuations can cause materials to backflow and spray out through the nitrogen pipeline, posing a significant safety hazard. Summary of the Invention
[0007] The purpose of this invention is to provide an automatic polysilicon pressing sequence control method to solve the problems raised in the prior art.
[0008] To achieve the above objectives, the present invention provides the following technical solution: an automatic polysilicon pressing sequence control method, wherein a human-machine interface device is connected to a 01V0109:
[0009] When LT0106a ≥ 60% and LT0106b ≥ 60% within 01V0109, the human-machine interface device will pop up a dialog box to start the material pressing process within 01V0109. After clicking "Automatic Operation", the following steps will be executed.
[0010] Step 1: Turn off XV0101, XV0102, XV0103 and PV0104;
[0011] Step 2: Turn off HV0105;
[0012] Step 3: Open the shut-off valve XV0108;
[0013] Step 4: When PT0107 ≥ 500 kPa (configurable), turn off XV0108; when PT0107 ≤ 400 kPa (configurable), turn on XV0108.
[0014] When PT0107 is 400 kPa (adjustable), HV0105 opening is 25% (adjustable);
[0015] When PT0107 is 450 kPa (adjustable), HV0105 opening is 50% (adjustable);
[0016] When PT0107 is 480 kPa (adjustable), HV0105 opening is 75% (adjustable);
[0017] When PT0107 is 500 kPa (adjustable), HV0105 opening is 100% (adjustable);
[0018] When both LT0106a and LT0106b are ≤10%, HV0105 is completely off.
[0019] Step 5: Turn off XV0108;
[0020] Step Six: Turn on PV0104 (the startup rate can be set);
[0021] Step 7: When PT0107 ≤ 50KPa (adjustable), activate XV0101, XV0102, XV0103, and 01V0109 to end the pressing process. (When the liquid level LT0106a ≥ 60% and the liquid level LT0106b ≥ 60%, the liquid level will trigger the human-machine interface to display the 01V0109 pressing start dialog box, realizing the self-circulation of pressing.)
[0022] Preferably, 01V0109 refers to the drain tank, LT0106a refers to the liquid chlorosilane level height, LT0106b refers to the liquid chlorosilane level height, and PT0107 refers to the internal pressure of 01V0109.
[0023] Preferably, XV0101 refers to the first unloading shut-off valve, XV0102 refers to the second unloading shut-off valve, XV0103 refers to the third unloading shut-off valve, PV0104 refers to the pressure relief valve, HV0105 refers to the pressure regulating valve, and XV0108 refers to the fourth nitrogen pressurization shut-off valve.
[0024] Preferably, in step one above, after the closing signals of XV0101, XV0102, XV0103 and PV0104 are triggered, step two is performed; in step two, after the closing signal of HV0105 is triggered, step three is performed; in step three above, after the opening signal of XV0108 is triggered, step four is performed.
[0025] Preferably, in step four above, when LT0106a and LT0106b are both ≤10%, after the HV0105 shut-off signal is triggered, step five is performed. In step five above, after the XV0108 shut-off signal is triggered, step six is performed.
[0026] Preferably, when the human-machine interface device pops up the 01V0109 internal pressure start dialog box and clicks "automatic operation", after automatically achieving the effects of steps one, two, and three, when achieving the effect provided in step four, when PT0107 is 400KPa (adjustable), the HV0105 is automatically controlled to open to 25% (adjustable); when PT0107 is 450KPa (adjustable), the HV0105 is automatically controlled to open to 50% (adjustable); when PT0107 is 480KPa (adjustable), the HV0105 is automatically controlled to open to 75% (adjustable); when PT0107 is 500KPa (adjustable), the HV0105 is automatically controlled to open to 100% (adjustable); when LT0106a and LT0106b are both ≤10%, the liquid level interlock triggers the HV0105 to fully close.
[0027] Preferably, after the HV0105 full-closing operation in step four, the regulating valve closing signal triggers step five to close XV0108.
[0028] Preferably, in step five, the nitrogen pressurization shut-off valve XV0108 shut-off valve closing signal triggers step six to open PV0104.
[0029] Preferably, after the pressure relief valve PV0104 is opened in step six, when PT0107 ≤ 50KPa (adjustable), the pressure signal triggers the simultaneous opening of the unloading shut-off valves XV0101, XV0102, and XV0103. When the liquid level in the drain tank again reaches LT0106a ≥ 60% and the liquid level LT0106b ≥ 60%, the liquid level triggers the human-machine interface device to display the 01V0109 pressure start dialog box, realizing pressure self-circulation.
[0030] Compared with the prior art, the beneficial effects of the present invention are:
[0031] 1. When this application is used, the automated one-button pressing programmatic and intelligent control replaces manual operation, which has the advantages of reducing the labor intensity of workers, eliminating human error, and improving the stability of equipment operation. Through real-time pressure / liquid level feedback closed-loop control, it replaces manual continuous fine-tuning, reduces the labor intensity of workers, and reduces accidents such as material backflow, untimely pressure relief, and large pressure fluctuations in the drain tank caused by inaccurate human operation. By replacing manual operation with programmatic and intelligent control, it improves the safety level, reduces labor intensity, eliminates human error, and ensures the accuracy and consistency of operation.
[0032] 2. When using this application, the opening speed of HV0105 is monitored in real time. When the opening speed of HV0105 exceeds the preset value, the human-machine interface device will issue an alarm to assist manual operation, reduce the occurrence of accidents, and flexibly change the control mode according to actual production needs. Attached Figure Description
[0033] Figure 1 This is a schematic diagram of the drain tank of the present invention. Detailed Implementation
[0034] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0035] Example: Figure 1As shown, this invention provides a technical solution for an automatic polysilicon pressing sequence control method. This method involves connecting a 01V0109 to a human-machine interface device to control various valves. In this application, 01V0109 refers to the guide tank, LT0106a refers to the liquid chlorosilane level height, LT0106b refers to the liquid chlorosilane level height, PT0107 refers to the internal pressure of 01V0109, XV0101 refers to the first unloading shut-off valve, XV0102 refers to the second unloading shut-off valve, XV0103 refers to the third unloading shut-off valve, PV0104 refers to the pressure relief valve, HV0105 refers to the pressing regulating valve, and XV0108 refers to the nitrogen pressurization fourth shut-off valve.
[0036] The specific application method of the automatic polysilicon pressing sequence control method is as follows:
[0037] Example 1: When LT0106a ≥ 60% and LT0106b ≥ 60% in 01V0109, the human-machine interface device pops up a dialog box for starting the material pressing in 01V0109. After clicking "Automatic Operation", the following steps will be executed.
[0038] Step 1: Turn off XV0101, XV0102, XV0103 and PV0104. After the turn-off signals of XV0101, XV0102, XV0103 and PV0104 are triggered, proceed to Step 2 below.
[0039] Step 2: Turn off HV0105. After the signal to turn off HV0105 is triggered, proceed to Step 3 below;
[0040] Step 3: Open the shut-off valve XV0108. After the XV0108 opening signal is triggered, proceed to step 4 below.
[0041] Step 4: When PT0107 ≥ 500 kPa (configurable), turn off XV0108; when PT0107 ≤ 400 kPa (configurable), turn on XV0108.
[0042] When PT0107 is 400 kPa (adjustable), HV0105 opening is 25% (adjustable);
[0043] When PT0107 is 450 kPa (adjustable), HV0105 opening is 50% (adjustable);
[0044] When PT0107 is 480 kPa (adjustable), HV0105 opening is 75% (adjustable);
[0045] When PT0107 is 500 kPa (adjustable), HV0105 opening is 100% (adjustable);
[0046] When both LT0106a and LT0106b are ≤10%, HV0105 is fully turned off; when both LT0106a and LT0106b are ≤10%, after the HV0105 is turned off, proceed to step five below.
[0047] Step 5: Turn off XV0108. After the signal to turn off XV0108 is triggered, proceed to Step 6 below;
[0048] Step Six: Turn on PV0104 (the startup rate can be set);
[0049] Step 7: When PT0107 ≤ 50KPa (adjustable), activate XV0101, XV0102, XV0103, and 01V0109 to end the pressing process. (When the liquid level LT0106a ≥ 60% again, and the liquid level LT0106b ≥ 60%, the liquid level triggers the human-machine interface to display the 01V0109 pressing start dialog box, realizing the self-circulation of pressing.)
[0050] By controlling the internal pressure of the shower tank through the above steps, and replacing manual operation with automated one-button material pressing programmed and intelligent control, it has the advantages of reducing the labor intensity of workers, eliminating human error, and improving the stability of equipment operation.
[0051] By using real-time pressure / liquid level feedback closed-loop control, manual fine-tuning is replaced, reducing the labor intensity of staff and minimizing accidents such as material backflow, untimely pressure relief, and large pressure fluctuations in the drain tank caused by inaccurate human operation.
[0052] The existing chlorosilane pressing process has been completely optimized and transformed. By replacing manual operation with programmed and intelligent control, the safety level is improved, the labor intensity is reduced, human error is eliminated, and the accuracy and consistency of operation are ensured.
[0053] Example 2: When the human-machine interface device pops up the 01V0109 internal pressure start dialog box, after clicking "Automatic Operation", after automatically achieving the effects of steps one, two, and three, when achieving the effect provided in step four, when PT0107 is 400KPa (adjustable), HV0105 automatically controls the opening to 25% (adjustable); when PT0107 is 450KPa (adjustable), HV0105 automatically controls the opening to 50% (adjustable); when PT0107 is 480KPa (adjustable), HV0105 automatically controls the opening to 75% (adjustable); when PT0107 is 500KPa (adjustable), HV0105 automatically controls the opening to 100% (adjustable); when LT0106a and LT0106b are both ≤10%, the liquid level interlock triggers the full closure operation of HV0105.
[0054] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention. No reference numerals in the claims should be construed as limiting the scope of the claims.
Claims
1. A method for automatic polysilicon pressing sequence control, comprising a 01V0109 connected to a human-machine interface device, characterized in that: When the liquid level LT0106a in 01V0109 is ≥60% and the liquid level LT0106b is ≥60%, the human-machine interface device will pop up the 01V0109 material pressing start dialog box. After the DCS operator clicks "automatic operation", the following steps will be executed. Step 1: Turn off XV0101, XV0102, XV0103 and PV0104; Step 2: Turn off HV0105; Step 3: Open the shut-off valve XV0108; Step 4: When PT0107 ≥ 500 kPa (configurable), turn off XV0108; when PT0107 ≤ 400 kPa (configurable), turn on XV0108. When PT0107 is 400 kPa (adjustable), HV0105 opening is 25% (adjustable); When PT0107 is 450 kPa (adjustable), HV0105 opening is 50% (adjustable); When PT0107 is 480 kPa (adjustable), HV0105 opening is 75% (adjustable); When PT0107 is 500 kPa (adjustable), HV0105 opening is 100% (adjustable); When both LT0106a and LT0106b are ≤10%, HV0105 is completely off. Step 5: Turn off XV0108; Step Six: Turn on PV0104 (the startup rate can be set); Step 7: When PT0107 ≤ 50KPa (adjustable), turn on XV0101, XV0102, XV0103, and 01V0109 to finish pressing (when the liquid level LT0106a ≥ 60% and the liquid level LT0106b ≥ 60%, the liquid level triggers the human-machine interface device to pop up the 01V0109 pressing start dialog box, realizing the self-circulation of pressing).
2. The method for automatic polycrystalline silicon pressing sequence control according to claim 1, characterized in that: 01V0109 refers to the drain tank, LT0106a refers to the liquid chlorosilane level, LT0106b refers to the liquid chlorosilane level, and PT0107 refers to the internal pressure of 01V0109.
3. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: XV0101 refers to the first unloading shut-off valve, XV0102 refers to the second unloading shut-off valve, XV0103 refers to the third unloading shut-off valve, PV0104 refers to the pressure relief valve, HV0105 refers to the pressure regulating valve, and XV0108 refers to the fourth nitrogen pressurization shut-off valve.
4. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: After the closing signals of XV0101, XV0102, XV0103 and PV0104 in step one above are triggered, step two is performed. After the closing signal of HV0105 in step two is triggered, step three is performed. In step three above, after the opening signal of XV0108 is triggered, step four is performed.
5. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: In step four above, when LT0106a and LT0106b are both ≤10%, after the HV0105 shut-off signal is triggered, step five is performed. In step five above, after the XV0108 shut-off signal is triggered, step six is performed.
6. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: When the human-machine interface device pops up the 01V0109 internal pressure start dialog box, clicking "automatic operation" will automatically achieve the effects of steps one, two, and three. When achieving the effect provided in step four, when PT0107 is 400KPa (adjustable), HV0105 will automatically control the opening to 25% (adjustable); when PT0107 is 450KPa (adjustable), HV0105 will automatically control the opening to 50% (adjustable); when PT0107 is 480KPa (adjustable), HV0105 will automatically control the opening to 75% (adjustable); when PT0107 is 500KPa (adjustable), HV0105 will automatically control the opening to 100% (adjustable). When LT0106a and LT0106b are both ≤10%, the liquid level interlock will trigger the full closure of HV0105.
7. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: After step four, HV0105 is fully closed, the regulating valve closing signal triggers step five, XV0108, to close.
8. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: Step 5: Nitrogen pressurization shut-off valve XV0108 shut-off valve closing signal triggers step 6: PV0104 opens.
9. The automatic polycrystalline silicon pressing sequence control method according to claim 1, characterized in that: After the pressure relief valve PV0104 is opened in step six, when PT0107 ≤ 50KPa (adjustable), the pressure signal triggers the simultaneous opening of the unloading shut-off valves XV0101, XV0102, and XV0103. When the liquid level LT0106a in the drain tank is ≥ 60% and the liquid level LT0106b is ≥ 60%, the liquid level triggers the human-machine interface to display the 01V0109 pressure start dialog box, realizing the pressure self-circulation.