Film measuring device

Abstract

The invention discloses a thin film measuring device. The thin film measuring device has the following advantages: compared with a conventional device, the number of components is small, the manufacturing cost is reduced, the manufacturing is simple and convenient, and the manufacturing time and the measuring time are short. The thin film measurement device according to an embodiment of the present invention measures the thickness or shape of a region of an insulating film corresponding to a region of light reaching the insulating film by using a spectral surface generated by a spectroscopic module.

Description

Technical Field

[0001] This invention relates to a thin film measuring device for measuring the thickness and shape of a thin film. Background Technology

[0002] Reference Figure 1 A positive electrode material (positive electrode active material) 11 is disposed on an aluminum foil 12, and an insulating film 10 of a predetermined area is coated (disposed) along the edge of the positive electrode material 11. Figure 1 Although not shown in the figure, a separator is disposed on the positive electrode material 11, and a negative electrode material is disposed on the separator.

[0003] The insulating film 10 is continuously disposed (applied) on a predetermined portion of the positive electrode material 11 adjacent to the edge of the positive electrode material 11 and on a predetermined portion of the aluminum foil 12 adjacent to the edge of the positive electrode material 11.

[0004] Figure 2 This is a device for measuring the thickness of the insulating film 10. Existing thin film measuring devices using scanning mirror 23 have the following problems: a drive unit is needed to tilt the scanning mirror 23 at a preset angle; the tilting speed of the scanning mirror 23 causes dimensional limitations in the thickness inspection of the insulating film 10; during the measurement of multiple spots of the insulating film 10, inspection errors occur due to the tilting delay of the scanning mirror 23; and an additional structure is needed to suppress noise and vibration.

[0005] PCT Patent Publication No. 2019-238715 (December 19, 2019) discloses a device using a scanning mirror. Summary of the Invention

[0006] The problem that the invention aims to solve

[0007] The purpose of this invention is to eliminate the problems existing in existing thin film measuring devices and to provide a thin film measuring device that can measure the thickness and / or shape of a thin film (insulating film) without a scanning mirror and a drive unit for tilting the scanning mirror.

[0008] Methods for solving problems

[0009] The foregoing objectives of this invention are achieved through the specific details described below.

[0010] An example embodiment of the present invention provides a thin-film measurement apparatus comprising a light source, a beam splitter, a beam splitting module, and a sensor. The beam splitter directs light emitted from the light source toward an insulating film. Light reflected from the insulating film reaches the beam splitting module. The spectrum of the light passing through the beam splitting module reaches the sensor. Furthermore, the beam splitting module forms a spectral surface of a predetermined size. The thin-film measurement apparatus of the present invention utilizes this spectral surface to measure the thickness or shape of a region of the insulating film corresponding to the region where light reaches the insulating film.

[0011] Specifically, the light emitted from the light source is any one of infrared, visible, or ultraviolet light.

[0012] Specifically, a first lens is disposed between the light source and the beam splitter, and the first lens makes the incident light parallel.

[0013] Specifically, the beam splitting module includes multiple beam splitting apertures and multiple spectrometers, with the spectrometers disposed within the beam splitting apertures.

[0014] Specifically, the plurality of spectrometers includes a plurality of first spectrometers and a plurality of second spectrometers. The plurality of first spectrometers are arranged at a predetermined distance in one direction. The plurality of second spectrometers are arranged below the plurality of first spectrometers and at a predetermined distance in the same direction.

[0015] Specifically, a plurality of second spectrometers are arranged below a first spectrometer included in a plurality of first spectrometers. The second spectrometers are arranged at a predetermined horizontal distance from the first spectrometers, extending vertically below them.

[0016] Specifically, the spectrometer includes an aperture component, a second lens, and a diffraction grating. Light reflected from the insulating film reaches the aperture component. Light passing through the aperture component reaches the second lens. Light passing through the second lens reaches the diffraction grating.

[0017] Specifically, the opening component has a hole for light to pass through.

[0018] Specifically, the second lens makes the light reaching the second lens parallel.

[0019] Specifically, the spectrum of light passing through a diffraction grating is arranged longitudinally on a surface of the sensor section.

[0020] Specifically, the spectral surface is formed by the spectral convergence of light passing through the diffraction gratings of each of the multiple spectrometers. Moreover, the spectral surface has a predetermined length in the transverse direction and a predetermined length in the longitudinal direction.

[0021] Specifically, the spectral surface reaches one surface of the sensor section.

[0022] Specifically, the sensor unit analyzes the spectral surface and generates a spectroscopic signal corresponding to each spectrum constituting the spectral surface.

[0023] Specifically, the diffraction grating includes a first diffraction grating and a second diffraction grating. The first diffraction grating and the second diffraction grating are arranged adjacent to each other and spaced apart by a preset distance.

[0024] Specifically, the first and second diffraction gratings are prism-type diffraction gratings. Moreover, the central axes of the second lens, the first diffraction grating, and the second diffraction grating are arranged parallel to each other in one direction and spaced apart from each other.

[0025] Specifically, the sensor unit is any one of an infrared spectrophotometer, a visible light spectrophotometer, or an ultraviolet light spectrophotometer.

[0026] Invention Effects

[0027] The thin film measuring device of the present invention has the following advantages: it eliminates the need for the scanning mirror and the drive unit that rotates the scanning mirror in existing thin film measuring devices, and can simultaneously measure the thickness and / or shape of a preset size area of ​​a thin film (insulating film) using a spectrometer module equipped with multiple spectrometers.

[0028] Furthermore, the thin film measuring device of the present invention has the following advantages: compared with the existing device, it has fewer components, thus reducing manufacturing costs, and is simple to manufacture with a shorter manufacturing time.

[0029] Furthermore, the thin film measuring device of the present invention has the following effect: by having a beam splitting module, it is possible to simultaneously measure a region of a preset size of the thin film (insulating film).

[0030] Furthermore, the thin film measurement device of the present invention has the following effect: it forms a spectral surface corresponding to a specific region of the thin film (insulating film) and analyzes it, thereby reducing measurement time and analysis time.

[0031] Furthermore, the thin film measuring device of the present invention has the following effect: it is not limited to the industrial field of battery manufacturing, but can be applied to all industrial fields for measuring the thickness and / or shape of thin films.

[0032] The effects of the thin film measuring device of the present invention will be described in more detail in the following embodiments of the invention. Attached Figure Description

[0033] Figure 1 The placement of the insulating film is shown in a simplified manner.

[0034] Figure 2A simplified illustration of an existing thin-film measurement device is provided.

[0035] Figure 3 It shows Figure 2 The device scans the trajectory of a specific location on the insulating film.

[0036] Figure 4 The thin film measuring device of the present invention is shown in a simplified manner.

[0037] Figure 5 schematically shown Figure 4 The beam splitter module shown.

[0038] Figure 6 It shows Figure 5 Spectrometer.

[0039] Figures 7 to 9 Examples of other implementations of a spectrometer configured within a beam-splitting aperture are shown. Detailed Implementation

[0040] Hereinafter, examples of embodiments of the present invention will be described in more detail with reference to the accompanying drawings. To avoid obscuring the spirit of the present invention, specific descriptions of the constituent elements of the present invention that are readily understood and reproduced by those skilled in the art will be omitted.

[0041] The accompanying drawings are merely examples to facilitate understanding of the embodiments disclosed in this specification, and the technical ideas disclosed in this specification are not limited to the drawings.

[0042] Unless the context clearly indicates otherwise, singular expressions include plural expressions.

[0043] Furthermore, the terms "first," "second," etc., which include ordinal numbers, used in this specification can be used to describe multiple constituent elements, but the constituent elements are not limited by the terms. The terms are only used to distinguish one constituent element from another. For example, without departing from the scope of this invention, a first constituent element can be referred to as a second constituent element, and similarly, a second constituent element can also be referred to as a first constituent element.

[0044] Hereinafter, an example of a thin film measuring apparatus provided by an embodiment of the present invention will be described.

[0045] The thin film measuring device of the present invention specifically refers to a device for measuring the thickness and / or shape of an insulating film 10 disposed (applied) on a battery.

[0046] Figure 1 The placement of the insulating film 10 is shown in a simplified manner.

[0047] observe Figure 1A positive electrode material (positive electrode active material) 11 is disposed on an aluminum foil 12, and an insulating film 10 of a predetermined area is coated (disposed) along the edge of the positive electrode material 11. The positive electrode material 11 may include a conductive material (not shown) and an adhesive (not shown). The conductive material improves the ionic conductivity of the positive electrode material 11, and the adhesive firmly bonds the positive electrode material 11 to the conductive material.

[0048] Figure 1 Although not illustrated, a separator is disposed on the positive electrode material 11, and a negative electrode material is disposed on the separator. This configuration structure is equivalent to known technology, therefore detailed description is omitted.

[0049] like Figure 1 As shown, the insulating film 10 is continuously disposed (applied) on a predetermined portion of the positive electrode material 11 adjacent to the edge of the positive electrode material 11 and on a predetermined portion of the aluminum foil 12 adjacent to the edge of the positive electrode material 11.

[0050] The thin film measuring device of the present invention is a device for measuring the thickness and / or shape of an insulating film 10 disposed (coated) on a specified portion adjacent to the edge of the positive electrode material 11 and a specified portion of the aluminum foil 12.

[0051] However, the thin film measuring device of the present invention is not limited to the industrial field of battery manufacturing, but can be applied to all industrial fields for measuring the thickness and / or shape of thin films.

[0052] Therefore, the examples of embodiments described in this specification and the accompanying drawings are exemplary embodiments shown to illustrate the thin film measuring apparatus of the present invention.

[0053] In this specification, Figure 1 The object shown, which has an aluminum foil 12 with an insulating film 10 and a positive electrode material 11, can be referred to as an 'object body'.

[0054] Figure 2 A simplified illustration of an existing thin-film measurement device is provided.

[0055] Figure 3 It shows Figure 2 The device scans a preset spot on the insulating film 10 to measure its thickness. Figure 3 In this context, the trajectory S represents the specific location (spot) reached by the light (e.g., infrared light) from the insulating film 10.

[0056] In the field of battery manufacturing, existing thin-film measurement devices use scanning mirrors.23

[0057] Light emitted from the light source 20 passes through the scanning mirror 23 and multiple lenses 24, reaches the insulating film 10, and is reflected. It then passes sequentially through the multiple lenses 24, the scanning mirror 23, the fiber optic coupler 21, and the beam splitter 25. Through the beam splitter 25, the light is displayed as a beam splitter signal 26 and a shape signal 27.

[0058] The user observes the thickness and / or shape of the insulating film 10 through the shape signal 27.

[0059] exist Figure 2 In the above, multiple lenses 24, for example, represent F-θ lenses 24, and lenses 22 disposed between fiber coupler 21 and scanning mirror 23, for example, represent collimating lenses 22.

[0060] Collimating lens 22 refers to a conventional curved optical lens that makes incident light rays parallel. When using collimating lens 22, the user can set the FOV (Field of View), thereby controlling the collection efficiency and spatial resolution.

[0061] Infrared light (IR) can be used as light emitted from the light source unit 20. Specifically, collimating lens 22 refers to infrared collimating lens 22, fiber optic coupler 21 refers to infrared fiber optic coupler 21, and beam splitter 25 refers to infrared beam splitter 25.

[0062] The existing thin film measurement device using scanning mirror 23 has the following problems: a drive unit is needed to tilt scanning mirror 23 at a preset angle; the tilting speed of scanning mirror 23 causes dimensional limitations in the inspection of the thickness of insulating film 10; during the measurement of multiple spots of insulating film 10, inspection errors occur due to the tilting delay of scanning mirror 23; and an additional structure is needed to suppress noise and vibration.

[0063] To solve the aforementioned problems, the thin film measurement device of the present invention does not require a scanning mirror 23, a drive unit for rotating it, or an optical fiber coupler 21.

[0064] Figure 4 The thin film measuring device of the present invention is shown in a simplified manner.

[0065] Reference Figure 4 The thin film measuring device of the present invention includes a light source 20, a beam splitter 30, a lens 31 (located between the light source 20 and the beam splitter 30), a beam splitting module 40, and a sensor 50.

[0066] The light source unit 20 is a light-emitting device that includes a light source. The light source refers to the constituent element that emits light.

[0067] Light source unit 20 can be used Figure 2 The existing light source unit 20 is shown.

[0068] The light source 20 can be a diode light source.

[0069] Specifically, the light source 20 can be an SLD (Super-Luminescent Diode) light source. The light source 20 can emit light that provides the following characteristics: output power equivalent to a laser diode; a wide oscillation spectrum equivalent to an LED (Light Emitting Diode); and low interference.

[0070] The light emitted from the light source 20 can be infrared (IR).

[0071] However, according to the example of the embodiment, the light emitted from the light source 20 is not limited to infrared light, but may also be visible light or ultraviolet light.

[0072] In other words, the light emitted from the light source 20 can be any one of infrared, visible light, and ultraviolet light. Any one of the infrared, visible, and ultraviolet light emitted from the light source 20 can be used in the thin-film measurement apparatus of the present invention.

[0073] The light emitted from the light source 20 is directed toward the beam splitter 30.

[0074] The beam splitter 30 separates the light emitted from the light source 20 and directs the separated light toward the insulating film 10. For example, 50% of the light emitted from the light source 20 passes through the beam splitter 30, and the remaining 50% of the light is directed toward the insulating film 10.

[0075] The light reaching the beam splitter 30 is directed toward the insulating film 10 disposed on one side (e.g., the lower side).

[0076] The light passing through the beam splitter 30 reaches a preset area (area) of the insulating film 10, rather than a specific point.

[0077] After passing through the beam splitter 30, the light reaches the insulating film 10 and is reflected. The reflected light then passes through the beam splitter 30 and reaches the beam splitting module 40. For example, 50% of the reflected light passes through the beam splitter 30 and reaches the beam splitting module 40, while the remaining 50% of the reflected light is directed toward the light source unit 20. Thus, 25% of the light emitted from the light source unit 20 reaches the beam splitting module 40.

[0078] By using the beam splitter 30, it is not necessary to arrange a large number of lenses and / or mirrors between the light source 20, the insulating film 10 and the beam splitting module 40.

[0079] A lens (first lens) 31 is disposed between the light source 20 and the beam splitter 30.

[0080] The first lens 31 makes the incident light parallel.

[0081] Furthermore, the first lens 31 enables the light emitted from the light source 20 to reach the beam splitter 30 in a manner that forms a predetermined area. Here, "forming a predetermined area" does not mean that the area of ​​the light (the area illuminated by the light) gradually increases during its journey, but rather that the light travels in parallel and the area illuminated by the light remains constant as the light travels.

[0082] The first lens 31 is not limited to a specific lens. Any lens that enables light emitted from the light source 20 to reach the beam splitter 30 in a manner that forms a predetermined area can be used as the first lens 31 of the present invention.

[0083] Although not illustrated, according to examples of embodiments, there may be multiple first lenses 31. That is, the first lens 31 may be a first lens assembly composed of multiple lenses.

[0084] The first lens group consists of multiple lenses spaced apart at a predetermined distance. At this time, the central axes of each lens are aligned. That is, the multiple lenses are arranged on the same central axis at predetermined distances. The central axis of a lens refers to the axis passing through the center of the lens.

[0085] Alternatively, the central axis of a portion of the lenses constituting the first lens group may be spaced apart from the central axes of the other lenses by a predetermined distance.

[0086] Figure 5 The diagram illustrates Figure 4 The beam splitter module 40 shown is shown. Figure 6 It shows Figure 5 Spectrometer 42.

[0087] Reference Figures 4 to 6 The beam splitting module 40 includes a plurality of beam splitting apertures 42h and spectrometers 42 respectively disposed in the plurality of beam splitting apertures 42h. The spectrometers 42 will be described first below.

[0088] The spectrometer module 40 includes multiple spectrometers 42.

[0089] Spectrometer 42 disperses the light reflected from insulating film 10. More specifically, spectrometer 42 is a device that disperses light according to wavelength to form a spectrum.

[0090] The light passing through the spectrometer 42 reaches the sensor section 50 in spectral form.

[0091] Since the spectrometer module 40 includes multiple spectrometers 42, the spectrometer module 40 arranges multiple spectra.

[0092] The spectroscopic module 40 forms a spectral surface 51 of a preset size.

[0093] Specifically, the light passing through the beam splitter 40 is arranged into multiple spectra, which together form a spectral surface 51 of a preset size along the horizontal and vertical directions.

[0094] In the spectrophotometer module 40, multiple spectrometers 42 can be configured in a structure that is the same as or similar to a matrix structure.

[0095] Specifically, multiple spectrometers 42 can be aligned in one direction ( Figure 5 The spectrometers 42 are arranged at preset distances in the X-direction (lateral direction), and multiple other spectrometers 42 can be arranged below the multiple spectrometers 42 arranged in the X-direction along the X-direction. Furthermore, multiple other spectrometers 42 can be arranged below the multiple spectrometers 42 arranged in the X-direction along the X-direction. Such arrangements of multiple spectrometers 42 can also be added according to the measurement area of ​​the insulating film 10.

[0096] For example, the multiple spectrometers 42 include a first row of spectrometers 42 and a second row of spectrometers 42.

[0097] The first line, spectrometer 42, indicates along one direction ( Figure 5 Multiple spectrometers 42 are arranged at preset distances in the X direction (lateral direction).

[0098] Furthermore, the second row of spectrometers 42 is positioned below the first row of spectrometers 42 and along one direction ( Figure 5 Multiple spectrometers 42 are arranged at preset distances in the X direction (lateral direction).

[0099] Below the first spectrometer 42 included in the first row of spectrometers 42, a second spectrometer 42 included in the second row of spectrometers 42 is disposed. In this case, the second spectrometer 42 can be disposed vertically below the first spectrometer 42, or it can be disposed offset from the first spectrometer 42 by being horizontally spaced a preset distance from the vertically below it.

[0100] For example, 30 spectrometers 42 can be arranged laterally, and another 30 spectrometers 42 can be arranged below the first 30 spectrometers 42. In this case, the spectrometers 42 arranged below can be arranged side by side or staggered with the spectrometers 42 arranged above in the vertical direction.

[0101] To form a uniform spectral surface 51, the first row of spectrometers 42 and the second row of spectrometers 42 need to be staggered vertically (downward) (see reference). Figure 5 ).

[0102] Figure 5 The beam splitting module 40 shown is configured with 30 horizontally and two vertically (30 x 2 channels) spectrometers 42, indicating one direction of the beam splitting module 40 ( Figure 5 The case where the length D1 (in the X direction, laterally) is 6mm.

[0103] exist Figure 5 Although the spectrometer 42 is shown as having 30 x 2 channels, the spectrometer 42 is not limited to the 30 x 2 channels and may have multiple channels depending on the measurement area of ​​the insulating film 10.

[0104] exist Figure 5 In the figure, reference numeral 41 indicates the beam-splitting body 41.

[0105] The beam splitter 41 is the main body that constitutes the beam splitter module 40.

[0106] exist Figure 5 In the process, the beam-splitting body 41 is formed into a cuboid shape, but the outer contour of the beam-splitting body 41 can also be formed into various shapes.

[0107] Figure 6 One of the multiple spectrometers 42 is shown in cross-section.

[0108] The beam splitting module 40 includes multiple beam splitting apertures 42h.

[0109] Spectrometer 42 is disposed (formed) within the beam-splitting aperture 42h formed in the beam-splitting body 41. The number of beam-splitting apertures 42h is the same as the number of spectrometers 42.

[0110] The beam-splitting aperture 42h is a hole that penetrates the beam-splitting body 41.

[0111] Specifically, the beam splitter 42h is along a direction orthogonal to a horizontal direction ( Figure 5 The aperture (in the Y direction, front and back directions) penetrates the main body 41 of the beam splitter.

[0112] One side of the beam splitter 42h faces the insulating film 10, and the other side faces the sensor section 50.

[0113] The spectrometer 42 includes an aperture component 421, a lens (second lens) 422, and a diffraction grating 423.

[0114] The opening component 421, the second lens 422, and the diffraction grating 423 are arranged sequentially from one side of the beam splitter 42h toward the other side.

[0115] Light reflected from the insulating film 10 reaches the opening component 421.

[0116] The opening component 421 is a component with a small hole (referred to as 'opening hole 421h') formed in the middle.

[0117] The opening hole 421h is a hole that penetrates the opening member 421 and can be formed in the middle of the opening member 421.

[0118] The wavelength of light passing through the opening 421h can be, for example, 1,550 ± 25 nm. Furthermore, the cross-sectional diameter of the beam-splitting aperture 42h can be, for example, 0.2 mm or less, and the diameter of the opening 421h can be, for example, 0.1 mm or less. These values ​​are suitable for determining the thickness and / or shape of the insulating film 10.

[0119] Light reflected from a point on the insulating film 10 passes through the beam splitter 30 and reaches the beam splitting module 40. The light reaching the beam splitting module 40 then enters any one of the plurality of beam splitting apertures 42h. A portion of the light entering any of the beam splitting apertures 42h passes through the opening aperture 421h and then moves towards the second lens 422.

[0120] Light reflected from various points on the insulating film 10 passes through the beam splitter 30 and is incident on multiple beam-splitting apertures 42h formed in the beam-splitting module 40. The light entering each beam-splitting aperture 42h forms a spectrum, which converges to form a spectral surface 51.

[0121] Light passing through the opening hole 421h of the opening member 421 reaches the second lens 422.

[0122] The second lens 422 makes the incident light parallel.

[0123] Furthermore, the second lens 422 ensures that the light reaching the second lens 422 reaches the diffraction grating 423 in a manner that forms a predetermined area. Here, "forming a predetermined area" does not mean that the area of ​​the light (the area illuminated by the light) gradually increases during its journey, but rather that the light travels in parallel, so that the area illuminated by the light remains constant as the light travels.

[0124] The second lens 422 is not limited to a specific lens. Any lens that allows light passing through the second lens 422 to reach the diffraction grating 423 in a manner that forms a specified area can be used as the second lens 422 of the present invention.

[0125] Although not illustrated, according to examples of embodiments, there may be multiple second lenses 422. That is, the second lens 422 may be a second lens group composed of multiple lenses.

[0126] The second lens group consists of multiple lenses spaced apart at a predetermined distance. In this case, the central axes of each lens are aligned. That is, the multiple lenses are arranged at predetermined distances along the same central axis. The central axis of a lens refers to the axis passing through the center of the lens.

[0127] Alternatively, the central axis of a portion of the lenses constituting the second lens group may be spaced apart from the central axes of the other lenses by a predetermined distance.

[0128] The light passing through the second lens 422 reaches the diffraction grating 423.

[0129] The diffraction grating 423 is a device that uses the diffraction phenomenon of light to separate the spectrum of light according to wavelength.

[0130] Multiple slits are formed at specified intervals on one surface of the diffraction grating 423.

[0131] Light passing through the diffraction grating 423 is dispersed by wavelength through a slit formed on a surface to form a spectrum.

[0132] The diffraction grating 423 separates light according to wavelength, just like a prism. The principle by which the diffraction grating 423 forms a spectrum is equivalent to well-known technology, so a detailed explanation is omitted.

[0133] Light (spectrum) passing through the diffraction grating 423 reaches a surface of the sensor section 50.

[0134] like Figure 6 As shown, the spectrum of light passing through a diffraction grating 423 is arranged along a direction perpendicular to one direction (Z direction, longitudinal direction).

[0135] The spectrum of light passing through the diffraction grating 423 is displayed on one surface of the sensor unit 50. Furthermore, the spectrum of light passing through the diffraction grating 423 reaches one surface of the sensor unit 50, and thus the spectrum is displayed on that surface. Figure 6 In the figure, reference numeral 511 indicates the longitudinal region of the spectrum of the displayed light in a surface of the sensor section 50.

[0136] On the other hand, multiple spectrometers 42 are arranged in one direction within the spectrometer module 40 ( Figure 5 (in the X direction, laterally) and directions perpendicular to orthogonal to said one direction ( Figure 5 In the Z direction (vertical direction), a matrix structure or a similar structure is formed and configured at preset distance intervals.

[0137] Therefore, as Figure 5As shown, when the spectrum of light passing through the diffraction grating 423 of each of the multiple spectrometers 42 converges, a spectral surface 51 of a predetermined size is formed, i.e., having a predetermined length D3 in the transverse direction and a predetermined length D2 in the longitudinal direction. Figure 5 In the figure, reference numeral 51 indicates a region of a predetermined size in a surface of the sensor unit 50 that displays the spectral surface 51 of light.

[0138] The spectral surface 51 displayed by the beam-splitting module 40 of the present invention on one surface of the sensor section 50 has, for example, a lateral length D3 of 6.4 mm (320 pixels) and a vertical length D2 of 5.12 mm (256 pixels). At this time, the beam-splitting body 41 is in one direction ( Figure 5 The length D1 (in the X direction, laterally) is, for example, 6mm.

[0139] Furthermore, the resolution of the spectral plane 51 displayed on one surface of the sensor unit 50 is, for example, 320 pixels x 256 pixels. At this time, the pixel pitch is 20 μm.

[0140] The thickness and / or shape of the region of the insulating film 10 corresponding to the region of light reaching the insulating film 10 through the beam splitter 30 can be known using the spectral surface 51 formed by the beam splitter module 40.

[0141] Figures 7 to 9 Examples of other embodiments of the spectrometer 42 configured within the beam-splitting aperture 42h are shown.

[0142] observe Figures 7 to 9 Examples of the embodiments shown are in Figure 7 , Figure 8 as well as Figure 9 In the diagram, (a) shows the spectrometer 42, and (b) shows the spectrum. In (b), the horizontal axis represents the magnitude of light collected on one surface of the sensor section 50 (image sensor), indicating the spectroscopic characteristics produced by the wavelength separation effect of the diffraction grating 423, and the vertical axis represents intensity.

[0143] Spectrometer 42 includes an opening component 421 ( Figures 7 to 9 (Not shown in the figure), lens (third lens) 4221, first prism diffraction grating 4231, second prism diffraction grating 4232, lens (fourth lens) 4222.

[0144] The opening component 421, the third lens 4221, the first prism-type diffraction grating 4231, the second prism-type diffraction grating 4232, and the fourth lens 4222 are arranged sequentially from one side of the beam splitter 42h toward the other side.

[0145] The third lens 4221 performs the function of the second lens 422 described above. That is, the third lens 4221 ensures that the light reaching the third lens 4221 reaches the first prism-type diffraction grating 4231 in a manner that forms a predetermined area.

[0146] The first prism-type diffraction grating 4231 and the second prism-type diffraction grating 4232 can be the same diffraction grating 423.

[0147] The basic shapes and principles of the first prism diffraction grating 4231 and the second prism diffraction grating 4232 are already known, so their specific descriptions are omitted.

[0148] Figure 7 The first prism diffraction grating 4231 and / or the second prism diffraction grating 4232 shown have a prism angle of 34° and a groove density of 200 l / mm.

[0149] and, Figure 8 The prism angle of the first prism diffraction grating 4231 and / or the second prism diffraction grating 4232 shown is 60°, and the scribe line density is 400 l / mm.

[0150] and, Figure 9 The prism angle of the first prism diffraction grating 4231 and / or the second prism diffraction grating 4232 shown is 69°, and the scribe line density is 500 l / mm.

[0151] The fourth lens 4222 is a lens that expands or contracts the light (spectrum) passing through the second prism-type diffraction grating 4232, or makes the spectrum reach the desired location.

[0152] The fourth lens 4222 can be selected from a variety of lenses that display a preset size spectrum, or a variety of lenses can be selected according to the user's needs.

[0153] The fourth lens 4222 may be, for example, an imaging lens or a delivery optics system.

[0154] According to an example of the implementation, the fourth lens 4222 may not be configured.

[0155] like Figures 7 to 9 As shown, in order to expand the measurement area and / or the beam splitting area of ​​the insulating film 10, the central axes of the third lens 4221, the first prism diffraction grating 4231, the second prism diffraction grating 4232 and / or the fourth lens 4222 can be spaced apart from each other in a manner that they are not arranged on the same central axis.

[0156] Specifically, the central axes of the third lens 4221, the first prism-type diffraction grating 4231, the second prism-type diffraction grating 4232 and / or the fourth lens 4222 can be arranged parallel to each other in one direction and spaced apart from each other.

[0157] Sensor section 50 indicates a spectrophotometer.

[0158] Specifically, for the sensor unit 50, when the light used in this invention is any one of infrared, visible light, and ultraviolet light, the sensor unit 50 can be any one of an infrared spectrophotometer, a visible light spectrophotometer, and an ultraviolet light spectrophotometer. An 'infrared spectrophotometer' can also be referred to as an 'infrared image sensor'.

[0159] The sensor unit 50 detects any one of infrared, visible light, and ultraviolet light, analyzes the spectrum reaching a surface of the sensor unit 50, and then generates a spectroscopic signal corresponding to the spectrum.

[0160] As mentioned above, when the light passing through the diffraction grating 423 of each of the multiple spectrometers 42 converges, a spectral surface 51 of a preset size is formed.

[0161] Through the spectral module 40 of the present invention, the spectral surface 51 is displayed on a surface of the sensor section 50.

[0162] The sensor unit 50 analyzes the spectral surface 51 that reaches one surface of the sensor unit 50 and generates a spectral signal corresponding to each spectrum constituting the spectral surface 51.

[0163] like Figure 4 As shown, the spectral signals 60 to 63 can be displayed by a measuring device electrically connected to the sensor unit 50.

[0164] Figure 4 The first split signal 60, the second split signal 61, the third split signal 62, and the sixtieth split signal 63 shown represent Figure 5 The spectrometer 42 in the shown spectrometer module 40 has 60 units (30 x 2 channels). Figure 4 The fourth to the fifty-ninth optical splitting signals are omitted.

[0165] The sensor unit 50 can analyze and detect the intensity, wavelength, and reflectance of the spectral signals 60 to 63. Figure 4 The graphs showing the spectral signals 60-63 represent reflectance.

[0166] Figure 4 Although not illustrated, it can be referenced. Figure 2When the analysis of the split signals 60-63 is completed, the shape signal of the light-arriving region in the insulating film 10 can be calculated. Based on the shape signal, the shape and / or thickness of the insulating film 10 can be calculated.

[0167] As mentioned above, the thin film measuring device of the present invention has the following advantages: by using a spectrophotometer module 40 equipped with multiple spectrometers 42, the thickness and / or shape of a preset-size area (the area irradiated by ultraviolet light) of the insulating film 10 can be measured simultaneously.

[0168] Using the existing thin film measurement device with scanning mirror 23 (see reference) Figure 2 as well as Figure 3 It has the following disadvantages: during the movement of the object, it is necessary to use the scanning mirror 23 to illuminate a specific position of the insulating film 10, and it is necessary to illuminate the light in a way that draws a specific trajectory S on the insulating film 10, so it is impossible to measure a specific area of ​​the insulating film 10 at the same time.

[0169] Furthermore, a cumbersome aspect of existing thin-film measurement devices is that, in order to illuminate a specific location on the insulating film 10, the moving speed of the object needs to be matched with the rotational speed of the scanning mirror 23.

[0170] The thin film measuring device of the present invention eliminates the problems existing in the conventional thin film measuring device that uses scanning mirror 23.

[0171] The thin film measuring device of the present invention does not require a scanning mirror 23 and a drive unit to tilt the scanning mirror 23. By using a spectrometer module 40 equipped with multiple spectrometers 42, the thickness and / or shape of a preset-size region (the region irradiated by ultraviolet light) in the insulating film 10 can be measured simultaneously.

[0172] Therefore, the thin film measuring device of the present invention has the following advantages: fewer components reduce manufacturing costs, it is easy to manufacture, and the manufacturing time is short.

[0173] Importantly, the thin film measuring device of the present invention has the following advantages: by having a beam splitting module 40, it is possible to simultaneously measure an area of ​​a preset size of the insulating film 10.

[0174] This means that the thin film measuring device of the present invention can measure multiple independent measuring spots located in a preset-size area of ​​the insulating film 10.

[0175] Therefore, the thin film measurement device of the present invention has the following effect: it forms a spectral surface 51 for a specific region of the insulating film 10 and analyzes it, thereby reducing measurement time and analysis time. In the spectral surface 51, the vertical direction represents the spectrum (spectral dispersion) 511, and the horizontal direction represents the spatial (positional) information of the insulating film 10. Since this information is measured at the same time, the spectral surface 51 is like a snapshot of a camera.

[0176] Furthermore, the aforementioned thin film measuring device of the present invention has the following advantages: it is not limited to the industrial field of battery manufacturing, but can be applied to all industrial fields for measuring the thickness and / or shape of thin films.

Claims

1. A thin film measuring device, comprising: Light source section; A beam splitter directs light emitted from the light source toward the insulating film. The light reflected from the insulating film reaches the beam splitter module; as well as The sensor section receives the spectrum of light passing through the beam splitter module. The spectral module forms a spectral surface of a preset size. The thickness or shape of the region of the insulating film corresponding to the region of light reaching the insulating film is measured using the spectral surface.

2. The thin film measuring device according to claim 1, wherein, The light emitted from the light source is any one of infrared, visible light, and ultraviolet light.

3. The thin film measuring device according to claim 1, wherein, A first lens is disposed between the light source and the beam splitter. The first lens makes the incident light parallel.

4. The thin film measuring device according to claim 1, wherein, The beam splitting module includes multiple beam splitting apertures and multiple spectrometers. The spectrometer is disposed within the beam-splitting aperture.

5. The thin film measuring device according to claim 4, wherein, The plurality of spectrometers include: Multiple first spectrometers are arranged at a predetermined distance in one direction; and A plurality of second spectrometers are disposed below the plurality of first spectrometers and spaced apart at a predetermined distance in the one direction.

6. The thin film measuring device according to claim 5, wherein, Below the first spectrometer included in the plurality of first spectrometers, a second spectrometer included in the plurality of second spectrometers is disposed. The second spectrometer is configured to be positioned laterally at a predetermined distance below the first spectrometer along its longitudinal direction.

7. The thin film measuring device according to claim 4, wherein, The spectrometer includes: An opening component, through which light reflected from the insulating film reaches; The second lens, the light passing through the opening component reaches the second lens; and A diffraction grating, light passing through the second lens reaches the diffraction grating.

8. The thin film measuring device according to claim 7, wherein, A hole is formed in the opening component to allow the light to pass through.

9. The thin film measuring device according to claim 7, wherein, The second lens makes the light reaching the second lens parallel.

10. The thin film measuring device according to claim 7, wherein, The spectrum of light passing through one of the diffraction gratings is arranged longitudinally on one surface of the sensor section.

11. The thin film measuring apparatus according to claim 10, wherein, The spectral surface is formed by the spectral convergence of light passing through the diffraction grating of each of the plurality of spectrometers. The spectral surface has a preset length in the horizontal direction and a preset length in the vertical direction.

12. The thin film measuring apparatus according to claim 11, wherein, The spectral surface reaches one surface of the sensor unit.

13. The thin film measuring device according to claim 12, wherein, The sensor unit analyzes the spectral surface and generates a spectroscopic signal corresponding to each spectrum constituting the spectral surface.

14. The thin film measuring apparatus according to claim 7, wherein, The diffraction grating includes a first diffraction grating and a second diffraction grating. The first diffraction grating and the second diffraction grating are arranged adjacent to each other and spaced apart by a preset distance.

15. The thin film measuring apparatus according to claim 14, wherein, The first diffraction grating and the second diffraction grating are prism-type diffraction gratings. The central axes of the second lens, the first diffraction grating, and the second diffraction grating are arranged parallel to each other in one direction and are spaced apart from each other.

16. The thin film measuring device according to claim 1, wherein, The sensor unit is any one of an infrared spectrophotometer, a visible light spectrophotometer, and an ultraviolet light spectrophotometer.

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