Gear strengthening equipment based on ion implantation and gradient coating

Abstract

The invention provides gear strengthening equipment based on ion implantation and gradient coating, and belongs to the technical field of gear production equipment, the gear strengthening equipment comprises an equipment main body, and the equipment main body defines a process chamber; the invention relates to a magnetron sputtering ion implantation device, which comprises a workpiece support part, a workpiece platform, a bias system, a vacuum system, a plasma generation device and a magnetron sputtering system, and is characterized in that the ion implantation function and the magnetron sputtering coating function are integrated in the same vacuum process chamber, and the rotatable workpiece support part and the bias system are arranged; the continuous and integrated treatment of ion implantation strengthening and gradient coating deposition on the surface of the gear in sequence under the one-time vacuumizing environment is achieved. The technological process time is remarkably shortened, and the pollution risk and efficiency loss caused by traditional multi-equipment transfer are avoided; the ion implantation pretreatment effectively enhances the film-substrate bonding strength and the substrate surface activity, and the rotatable support ensures the uniformity of complex tooth surface treatment, so that the service reliability, the wear resistance and the fatigue life of the gear coating are integrally improved.

Description

A gear strengthening device based on ion implantation and gradient coating Technical Field

[0001] This invention belongs to the technical field of gear manufacturing equipment, specifically relating to a gear strengthening device based on ion implantation and gradient coating. Background Technology

[0002] Aerospace gears are core precision components in aircraft power transmission systems. Their design, materials, and manufacturing processes are all geared towards achieving near-absolute reliability under extremely demanding operating conditions. These gears must be able to operate stably for tens of thousands of hours in harsh environments with high speeds, heavy loads, drastic temperature fluctuations, and limited lubrication. Their failure directly impacts flight safety. Therefore, their manufacturing transcends the scope of ordinary mechanical parts, entering a field that demands the ultimate integration of materials science, precision machining, and surface engineering.

[0003] As machine operating speeds increase, the working environment for gears becomes increasingly harsh, leading to more stringent requirements for gear surface performance in industry. Diamond-like carbon (DLC) coatings, with their superior mechanical properties, extremely low coefficient of friction, and excellent chemical stability, have shown promising application prospects in the surface treatment of aerospace gears. However, problems such as high internal stress and insufficient film-substrate bonding strength severely restrict their service reliability and lifespan.

[0004] Traditional gear surface strengthening technologies often employ single-coating processes, such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). These methods suffer from poor film-substrate adhesion, easy coating peeling, and difficulty in covering complex tooth surfaces. For high-precision gears, traditional ion implantation technology struggles to achieve uniform treatment across the entire tooth profile, resulting in insufficient wear resistance and fatigue strength, thus impacting gear lifespan and reliability. When multiple strengthening processes are required, the workpiece must be transferred to different equipment, incurring lengthy transfer times and multiple waiting periods for vacuuming, severely hindering production efficiency. Summary of the Invention

[0005] The present invention aims to at least solve one of the aforementioned technical problems existing in the prior art. To this end, the present invention provides a gear strengthening device based on ion implantation and gradient coating, which can solve the problem of gear production efficiency.

[0006] According to an embodiment of the present invention, a gear strengthening device based on ion implantation and gradient coating includes: a device body defining a process chamber; a workpiece platform disposed in the process chamber, a workpiece support rotatably disposed on the workpiece platform, the workpiece support being configured to support a gear; a bias system disposed in the workpiece platform; a vacuum system connected to the process chamber; a plasma generation device disposed in the process chamber; and a magnetron sputtering system disposed in the process chamber and circumferentially offset from the plasma generation device around the process chamber; wherein the device is configured to first adjust the vacuum level of the process chamber through the vacuum system, then sequentially start the plasma generation device and the magnetron sputtering system to perform ion implantation and sputtering coating, and when the plasma generation device is started, the bias system is activated to apply a negative high-voltage electric field to the gear and control the rotation of the workpiece support.

[0007] The gear strengthening equipment based on ion implantation and gradient coating according to embodiments of the present invention has at least the following beneficial effects: This embodiment integrates ion implantation and magnetron sputtering coating functions into the same vacuum process chamber, and is equipped with a rotatable workpiece support and bias system, realizing continuous and integrated processing of ion implantation strengthening and gradient coating deposition on the gear surface in a single vacuum environment. This significantly shortens the process flow time and avoids the pollution risks and efficiency losses caused by traditional multi-equipment transfer; ion implantation pretreatment effectively enhances the film-substrate bonding strength and substrate surface activity, and the rotatable support ensures the uniformity of complex tooth surface treatment, thereby improving the overall service reliability, wear resistance, and fatigue life of the gear coating.

[0008] According to some embodiments of the present invention, the apparatus further includes an argon gas supply system connected to the process chamber; the apparatus is configured to activate the argon gas supply system to supply argon gas to the process chamber during ion implantation and sputtering deposition.

[0009] According to some embodiments of the present invention, the apparatus further includes a nitrogen supply system connected to the process chamber; the apparatus is configured to activate the nitrogen supply system to supply nitrogen to the process chamber during ion implantation, and the activation of the nitrogen supply system is later than the activation of the argon supply system.

[0010] According to some embodiments of the present invention, the magnetron sputtering system includes a Cr target and a WC target, the Cr target and the WC target being uniformly distributed circumferentially around the process chamber.

[0011] According to some embodiments of the present invention, the magnetron sputtering system alternately arranges a plurality of Cr targets and WC targets around the circumference of the process chamber.

[0012] According to some embodiments of the present invention, the workpiece support is provided with a plurality of loading components around a rotation center, the loading components being rotatably connected to the workpiece support and used for loading gears.

[0013] According to some embodiments of the present invention, the magnetron sputtering system is rotatably provided with a sputtering target, a sputtering layer is provided on a first side of the sputtering target, and a magnetic shielding layer is provided on a second side of the sputtering target opposite to the first side; during the rotation of the sputtering target, the sputtering layer can be switched to face the center of the process chamber or the magnetic shielding layer can be switched to face the center of the process chamber.

[0014] According to some embodiments of the present invention, the magnetron sputtering system is further provided with an exit mechanism connected to the sputtering target to control the sputtering target away from the center of the process chamber.

[0015] According to some embodiments of the present invention, the main body of the device is further provided with a plurality of pretreatment chambers, the plurality of pretreatment chambers being movable and adjustable along a first direction to connect one by one with the process chambers, and the vacuum system is also connected to the pretreatment chambers.

[0016] According to some embodiments of the present invention, the pretreatment chamber is disposed below the process chamber, and the pretreatment chamber is provided with a lifting mechanism for lifting the workpiece platform into the process chamber.

[0017] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and some of these additional aspects and advantages will become apparent from the description or may be learned by practice of the invention. Attached Figure Description

[0018] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein: Figure 1 is a schematic diagram of an overall structure of the present invention; Figure 2 is a schematic diagram of the distribution of process chambers in the present invention; Figure 3 is a schematic diagram of the lifting mechanism in the present invention; and Figure 4 is a schematic diagram of the structure of the pretreatment chamber in the present invention. Detailed Implementation

[0019] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0020] In the description of this invention, it should be understood that the orientation descriptions, such as up, down, front, back, left, right, etc., are based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0021] In the description of this invention, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0022] In the description of this invention, unless otherwise explicitly defined, terms such as "set up," "install," and "connect" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this invention in conjunction with the specific content of the technical solution.

[0023] In the description of this invention, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0024] Aerospace gears are core precision components in aircraft power transmission systems. Their design, materials, and manufacturing processes are all geared towards achieving near-absolute reliability under extremely demanding operating conditions. These gears must be able to operate stably for tens of thousands of hours in harsh environments with high speeds, heavy loads, drastic temperature fluctuations, and limited lubrication. Their failure directly impacts flight safety. Therefore, their manufacturing transcends the scope of ordinary mechanical parts, entering a field that demands the ultimate integration of materials science, precision machining, and surface engineering.

[0025] As machine operating speeds increase, the working environment for gears becomes increasingly harsh, leading to more stringent requirements for gear surface performance in industry. Diamond-like carbon (DLC) coatings, with their superior mechanical properties, extremely low coefficient of friction, and excellent chemical stability, have shown promising application prospects in the surface treatment of aerospace gears. However, problems such as high internal stress and insufficient film-substrate bonding strength severely restrict their service reliability and lifespan.

[0026] Traditional gear surface strengthening technologies often employ single-coating processes, such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). These methods suffer from poor film-substrate adhesion, easy coating peeling, and difficulty in covering complex tooth surfaces. For high-precision gears, traditional ion implantation technology struggles to achieve uniform treatment across the entire tooth profile, resulting in insufficient wear resistance and fatigue strength, thus impacting gear lifespan and reliability. When multiple strengthening processes are required, the workpiece must be transferred to different equipment, incurring lengthy transfer times and multiple waiting periods for vacuuming, severely hindering production efficiency.

[0027] Therefore, the present invention provides a gear strengthening device based on ion implantation and gradient coating, which can solve the problem of gear production efficiency.

[0028] Referring to Figures 1 to 4, in some embodiments of the present invention, a gear strengthening device based on ion implantation and gradient coating includes a device body 100, a workpiece platform 103, a bias system, a vacuum system, a plasma generation device 1012, and a magnetron sputtering system 1011. The device body 100 defines a process chamber 101 to provide space for gear processing. The workpiece platform 103 is disposed within the process chamber 101, and a workpiece support 1031 is rotatably mounted on the workpiece platform 103. The workpiece support 1031 is configured to support the gear, thereby fixing the gear within the process chamber 101 and subjecting it to uniform processing through rotation. It is understood that the workpiece platform 103 can be removed from the process chamber 101 for gear loading and transfer. The bias system is disposed on the workpiece platform 103 to apply a negative high-voltage electric field to the gear, accelerating ion impact on the gear surface. The vacuum system is connected to the process chamber 101 to adjust the vacuum level of the process chamber 101 according to process requirements. A plasma generation device 1012 is disposed in the process chamber 101 for performing an ion implantation process. A magnetron sputtering system 1011 is disposed in the process chamber 101 and is circumferentially offset from the plasma generation device 1012 around the process chamber 101. The magnetron sputtering system 1011 is used to perform magnetron sputtering deposition, and by being circumferentially distributed with the plasma generation device 1012, the gears can be subjected to uniform process treatment.

[0029] In this embodiment, the equipment is configured to first adjust the vacuum level of the process chamber 101 through the vacuum system, and then start the plasma generation device 1012 and the magnetron sputtering system 1011 in sequence to perform ion implantation and sputtering coating. When the plasma generation device 1012 is started, the bias system is started to apply a negative high voltage electric field to the gear and control the workpiece support 1031 to rotate.

[0030] Understandably, this embodiment integrates ion implantation and magnetron sputtering coating functions into the same vacuum process chamber 101, and is equipped with a rotatable workpiece support 1031 and a bias system, achieving continuous and integrated processing of ion implantation strengthening and gradient coating deposition on the gear surface in a single vacuum environment. This significantly shortens the process time and avoids the contamination risks and efficiency losses caused by traditional multi-equipment transfer; the ion implantation pretreatment effectively enhances the film-substrate bonding strength and substrate surface activity, and the rotatable support ensures the uniformity of complex tooth surface treatment, thereby improving the overall service reliability, wear resistance, and fatigue life of the gear coating.

[0031] In some embodiments of the invention, the apparatus further includes an argon gas supply system connected to the process chamber 101. The apparatus of this embodiment is configured to activate the argon gas supply system to supply argon gas to the process chamber 101 during ion implantation and sputtering deposition processes.

[0032] In some embodiments of the invention, the apparatus further includes a nitrogen supply system connected to the process chamber 101. The apparatus of this embodiment is configured to activate the nitrogen supply system to deliver nitrogen to the process chamber 101 during ion implantation, and the activation of the nitrogen supply system is later than the activation of the argon supply system.

[0033] Using the setup of this embodiment, argon gas supplied by the argon gas supply system, combined with the environmental settings of the process chamber 101, ionizes and bombards the gear surface with Ar ions. Combined with the effect of the bias system, this high-speed bombardment of the entire gear tooth profile effectively removes surface contaminants. Then, nitrogen gas is introduced, immersing the gear in nitrogen ionization to achieve ion implantation.

[0034] To ensure the uniformity of ion implantation, multiple plasma generation devices 1012 can be arranged circumferentially in the process chamber 101.

[0035] Referring to FIG2, in some embodiments of the present invention, the magnetron sputtering system 1011 includes a Cr target 10111 and a WC target 10112, which are uniformly distributed circumferentially around the process chamber 101. The Cr target 10111 is used in conjunction with a nitrogen supply system to deposit a CrN layer on the gear, while the WC target 10112 is used to deposit a WC-DLC coating on the gear.

[0036] Furthermore, the equipment also includes an acetylene supply system connected to the process chamber 101 for supplying acetylene gas to the process chamber 101 during the deposition of the WC-DLC coating.

[0037] Referring to FIG2, in some embodiments of the present invention, a plurality of Cr targets 10111 and WC targets 10112 are alternately arranged around the process chamber 101 in the circumferential direction, so as to provide a more uniform deposition material during the sputtering process.

[0038] Specifically, in some embodiments, the circumferential sidewalls of the process chamber 101 are configured as polygonal structures, and the Cr target 10111, WC target 10112 and plasma generation device 1012 are disposed on different sidewalls of the process chamber 101 to ensure the uniformity of the relevant processes and to facilitate the installation of the relevant structures.

[0039] Referring to Figure 4, in some embodiments of the present invention, a plurality of loading assemblies 1032 are arranged around the rotation center of the workpiece support 1031. The loading assemblies 1032 are rotatably connected to the workpiece support 1031 and are used to load gears. With the structural arrangement of this embodiment, multiple gears can be loaded by multiple loading assemblies 1032, controlling both the rotation of the gears on their own axis and their revolution around the workpiece support 1031.

[0040] In some embodiments of the present invention, a magnetron sputtering system 1011 is rotatably equipped with a sputtering target. A sputtered layer is disposed on a first side of the sputtering target, and a magnetic shielding layer is disposed on a second side of the sputtering target opposite to the first side. During rotation, the sputtering target can switch the direction of the sputtered layer toward the center of the process chamber 101 or switch the direction of the magnetic shielding layer toward the center of the process chamber 101. Because the sputtering target has a magnetic structure, this embodiment can switch the magnetic shielding layer toward the gear during non-sputtering periods by controlling the rotation of the sputtering target, thus avoiding the magnetic structure from affecting other process operations.

[0041] It is understood that the sputtering target in this embodiment is the Cr target 10111 and WC target 10112 in the previous embodiments.

[0042] Considering that in some application scenarios, the sputtering target requires a large space to rotate, which could easily interfere with the gears inside the process chamber 101, in some embodiments of the present invention, the magnetron sputtering system 1011 is also provided with a withdrawal mechanism connected to the sputtering target to control the sputtering target away from the center of the process chamber 101. This allows the sputtering target to be controlled away from the center of the process chamber 101 before rotation, and then reset after rotation, thereby overcoming the aforementioned problem.

[0043] In some embodiments, the sidewall of the process chamber 101 has multiple mounting windows, and the magnetron sputtering system 1011 covers and seals the mounting windows. The withdrawal mechanism includes a withdrawal slide rail and a rotating base, the rotating base being slidably mounted on the withdrawal slide rail and driven by it to move. The sputtering target is rotatably mounted on the rotating base.

[0044] In some embodiments of the present invention, the device is further provided with a temperature control system, wherein a plurality of heating elements 1013 are uniformly arranged along the circumference of the process chamber 101, and a temperature monitoring module is configured to regulate the temperature of the process chamber 101.

[0045] Referring to Figure 1, in some embodiments of the present invention, the main body 100 of the equipment is further provided with a plurality of pretreatment chambers 102. The plurality of pretreatment chambers 102 are movable and adjustable along a first direction to connect one by one with the process chambers 101, and a vacuum system is also connected to the pretreatment chambers 102. The pretreatment chambers 102 can be used to perform some processing on the gears in the preceding process, and can also be used for loading and unloading the gears, and to perform vacuuming in advance. In this way, when the gears are sent from the pretreatment chambers 102 into the process chambers 101, the time and number of vacuuming operations can be reduced.

[0046] Referring to Figures 1 and 3, in some embodiments of the present invention, to facilitate gear transfer, a pretreatment chamber 102 is located below the process chamber 101. The pretreatment chamber 102 is equipped with a lifting mechanism for lifting the workpiece platform 103 into the process chamber 101. In this embodiment, two pretreatment chambers 102 are provided, each equipped with a lifting mechanism and a workpiece platform 103. During operation, the gears are quickly changed by switching between the two pretreatment chambers 102, achieving non-stop operation.

[0047] Specifically, the lifting mechanism is equipped with four bevel gear transmission assemblies 1021, and synchronous shafts 1022 are provided between the four bevel gear transmission assemblies 1021 for synchronization. A transmission screw 1023 is vertically mounted on each bevel gear transmission assembly 1021, and a support frame 1024 is mounted on the transmission screw 1023. The four support frames 1024 together support the workpiece platform 103. When the lifting mechanism drives one bevel gear transmission assembly 1021, the four transmission screws 1023 rotate synchronously, thereby controlling the lifting and lowering movement of the support frames 1024, and thus driving the workpiece platform 103 to rise or fall, so as to enter or exit the process chamber 101.

[0048] Understandably, the bottom of the process chamber 101 is equipped with a valve structure to seal it during normal process handling.

[0049] In summary, this invention relates to a gear strengthening device based on ion implantation and gradient coating, aiming to solve the problems of poor film-substrate adhesion, uneven processing, and low production efficiency in traditional gear surface strengthening processes through integrated design. The main body 100 of the device has a process chamber 101 inside, which is maintained by a vacuum system to ensure that the process is free from external contamination. A workpiece platform 103 is located at the center of the process chamber 101, on which a rotatable workpiece support 1031 supports the gear. When a negative high-voltage electric field is applied by the bias system, the support can drive the gear to rotate at a uniform speed, allowing the complex tooth surface of the gear to be uniformly exposed to the process atmosphere of ion implantation and coating deposition. This eliminates the coverage blind spots caused by the fixed posture in traditional processing, improving the strengthening consistency of the entire tooth profile. The plasma generation device 1012 and the magnetron sputtering system 1011 are staggered around the circumference of the process chamber 101. This arrangement allows for sequential ion implantation and sputtering coating in a single vacuum environment without the need to transfer the workpiece. This avoids the time loss and interface contamination risk caused by multiple vacuuming operations, significantly shortens the production cycle, and enhances the bonding strength between the coating and the substrate.

[0050] In specific operation, the equipment first evacuates the process chamber 101 to a predetermined vacuum level using a vacuum system. Then, a bias system is activated to apply a negative high-voltage electric field to the gear, while simultaneously controlling the rotation of the workpiece support 1031 and activating the plasma generation device 1012 to generate a high-energy ion stream that bombards and implants ions onto the gear surface. This process forms a strengthening and modified layer on the gear surface, effectively improving surface hardness and activity, providing an ideal transition interface for subsequent coating deposition. After ion implantation, the equipment switches to the magnetron sputtering system 1011, activating the Cr target 10111 and WC target 10112, which are uniformly distributed around the process chamber 101. Argon gas is supplied to the chamber via an argon gas supply system to maintain the sputtering plasma, gradually depositing a gradient coating on the gear surface consisting of a Cr transition layer, a WC intermediate layer, and even a diamond-like carbon (DLC) functional layer. This gradual change in composition and structure alleviates internal stress in the coating, inhibits crack initiation, and thus significantly improves the gear's wear resistance, fatigue resistance, and service life. To further optimize the process effect, the equipment is also equipped with a nitrogen supply system. Nitrogen is turned on after argon is introduced during the ion implantation stage, so that nitrogen element is introduced to participate in surface modification and form nitride reinforced phase, which further enhances the film-substrate adhesion and substrate load-bearing capacity.

[0051] In the magnetron sputtering system 1011, the Cr target 10111 and WC target 10112 can be arranged alternately around the circumference of the chamber to achieve simultaneous or sequential sputtering of multiple targets. This not only improves the coating efficiency and coating uniformity but also facilitates the formation of a dense composite gradient coating. The workpiece support 1031 can be configured with multiple independently rotating loading components 1032, each carrying a gear. This allows multiple workpieces to be processed simultaneously in a single process cycle. During rotation, it ensures that each gear tooth surface receives consistent ion implantation and coating coverage, thereby significantly improving equipment capacity and processing efficiency. The sputtering target is designed as a rotatable structure, with a sputtering layer on one side and a magnetic shielding layer on the other side. By rotating the target, the magnetic shielding layer can be oriented toward the center of the process chamber 101 to quickly shield the target position, which facilitates flexible control of the sputtering process or target maintenance and avoids process interference. At the same time, the sputtering target is connected to an ejection mechanism, which can control the target to move away from the center of the chamber during non-sputtering stages, preventing the target surface from being contaminated by steps such as ion implantation, extending the service life of the target and simplifying equipment operation.

[0052] To expand equipment functionality and process efficiency, the main body 100 can also be equipped with multiple pretreatment chambers 102. These pretreatment chambers 102 can be moved and adjusted along the first direction to dock with the process chamber 101 one by one, forming a continuous vacuum processing link. The pretreatment chambers 102 are located below the process chamber 101 and are equipped with a lifting mechanism inside to smoothly lift the work platform loading the gears into the process chamber 101, achieving seamless transfer of the workpiece in a vacuum environment. This design allows the pretreatment steps such as gear loading, preheating, or cleaning to be completed in an independent chamber parallel to the main process, eliminating the contamination that may be introduced by the workpiece being exposed to the atmosphere, while optimizing the equipment rhythm and further improving overall production efficiency and process reliability. Through the above-mentioned integrated and modular design, the entire equipment realizes integrated continuous processing of gear surface ion implantation and gradient coating deposition. This not only solves the problems of insufficient bonding force and uniformity in traditional multi-equipment processes, but also significantly improves processing efficiency and coating performance, providing an effective guarantee for the long-term reliable service of high-precision gears in harsh environments.

[0053] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments, and various changes can be made within the scope of knowledge possessed by those skilled in the art without departing from the spirit of the present invention. Furthermore, the embodiments of the present invention and the features thereof can be combined with each other unless otherwise specified.

Claims

1. A gear strengthening device based on ion implantation and gradient coating, characterized in that, include: The equipment body defines a process chamber; A workpiece platform is disposed in the process chamber, and a workpiece support is rotatably provided on the workpiece platform, the workpiece support being configured as a support gear; a biasing system is disposed on the workpiece platform; A vacuum system connected to the process chamber; a plasma generation device disposed in the process chamber; and a magnetron sputtering system disposed in the process chamber and offset from the plasma generation device circumferentially around the process chamber. The equipment is configured to first adjust the vacuum level of the process chamber via the vacuum system, then sequentially activate the plasma generation device and the magnetron sputtering system for ion implantation and sputtering deposition. Furthermore, when the plasma generation device is activated, the bias system is activated to apply a negative high-voltage electric field to the gear and control the rotation of the workpiece support.

2. The gear strengthening device based on ion implantation and gradient coating according to claim 1, characterized in that, The device also includes an argon gas supply system connected to the process chamber; the device is configured to activate the argon gas supply system to supply argon gas to the process chamber during ion implantation and sputtering deposition.

3. The gear strengthening device based on ion implantation and gradient coating according to claim 2, characterized in that, The device also includes a nitrogen supply system connected to the process chamber; the device is configured to activate the nitrogen supply system to supply nitrogen to the process chamber during ion implantation, and the activation of the nitrogen supply system is later than the activation of the argon supply system.

4. The gear strengthening device based on ion implantation and gradient coating according to claim 1, characterized in that, The magnetron sputtering system includes a Cr target and a WC target, which are uniformly distributed circumferentially around the process chamber.

5. The gear strengthening device based on ion implantation and gradient coating according to claim 4, characterized in that, The magnetron sputtering system alternately arranges multiple Cr targets and WC targets around the circumference of the process chamber.

6. The gear strengthening device based on ion implantation and gradient coating according to claim 1, characterized in that, The workpiece support is provided with multiple loading components around the rotation center. The loading components are rotatably connected to the workpiece support and are used to load gears.

7. The gear strengthening device based on ion implantation and gradient coating according to claim 1, characterized in that, The magnetron sputtering system is rotatably equipped with a sputtering target. A sputtering layer is disposed on a first side of the sputtering target, and a magnetic shielding layer is disposed on a second side of the sputtering target opposite to the first side. During rotation, the sputtering target can switch the direction of the sputtering layer toward the center of the process chamber or switch the direction of the magnetic shielding layer toward the center of the process chamber.

8. The gear strengthening device based on ion implantation and gradient coating according to claim 7, characterized in that, The magnetron sputtering system is also provided with an ejection mechanism connected to the sputtering target to control the sputtering target away from the center of the process chamber.

9. The gear strengthening device based on ion implantation and gradient coating according to claim 1, characterized in that, The main body of the equipment is also provided with multiple pretreatment chambers, which can be moved and adjusted along a first direction to connect with the process chambers one by one, and the vacuum system is also connected to the pretreatment chambers.

10. The gear strengthening device based on ion implantation and gradient coating according to claim 9, characterized in that, The pretreatment chamber is located below the process chamber, and the pretreatment chamber is equipped with a lifting mechanism for lifting the workpiece platform into the process chamber.

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