High-temperature-resistant stable water-based ink and preparation method thereof

Abstract

The invention relates to the technical field of ink, in particular to high-temperature-resistant stable water-based ink and a preparation method thereof.The high-temperature-resistant stable water-based ink is prepared from, by weight, 60-70 parts of acrylic resin emulsion, 10-20 parts of pigment, 15-25 parts of deionized water, 4-8 parts of cosolvent, 4-8 parts of additive, 0.5-1.5 parts of wetting agent, 0.2-0.8 part of defoaming agent, 0.5-1.5 parts of flatting agent and 1-2 parts of wax emulsion. According to the water-based ink disclosed by the invention, a compact film matrix is formed by the acrylic resin emulsion, and the additive compounded by the aid A and the aid B is introduced, so that an ink layer formed after the ink is cured can bear frequent thermal shock and effectively resist softening and after-tack phenomena caused by excessive movement of a resin molecular chain due to the synergistic effect of the two additives; and the reliability in a high-temperature scene of continuous processing is ensured.

Description

Technical Field

[0001] This invention relates to the field of ink technology, specifically to a high-temperature resistant, stable water-based ink and its preparation method. Background Technology

[0002] Water-based inks are liquid mixtures with water as the main dispersion medium. They typically contain binders, pigments, and auxiliary components such as cosolvents and defoamers. The application of water-based inks in packaging printing, publication printing and other fields is receiving increasing attention, and their technological development is in line with the general trend of green chemistry.

[0003] In existing technologies, the resin binder in water-based ink systems is prone to weakening of its molecular chains due to increased thermal motion under continuous heating, leading to a decrease in the stability of the entire polymer network structure. Consequently, the ink layer exhibits adhesion and clumping at high temperatures due to reduced adhesion, resulting in poor reliability of water-based inks in high-temperature environments. Therefore, this invention provides a high-temperature resistant, stable water-based ink and its preparation method. Summary of the Invention

[0004] The purpose of this invention is to provide a high-temperature resistant stable water-based ink and its preparation method. The stable water-based ink prepared by this invention not only has good stability under high-temperature conditions, but also has good storage stability.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a high-temperature resistant and stable water-based ink, comprising the following raw materials in parts by weight: 60-70 parts acrylic resin emulsion, 10-20 parts pigment, 15-25 parts deionized water, 4-8 parts cosolvent, 4-8 parts additive, 0.5-1.5 parts wetting agent, 0.2-0.8 parts defoamer, 0.5-1.5 parts leveling agent, and 1-2 parts wax emulsion; The additive is prepared by the following method: S1: Preparation of additive A, wherein the raw materials of additive A include a first mixture, a second mixture, nano-silica, deionized water and BYK190; S2: Preparation of Additive B, wherein the raw materials for Additive B include deionized water, ethylene glycol ethyl ether acetate, triethanolamine, nano boron nitride, KH550 and organosilicon emulsion, and the mass of Additive B is 25-40% of the mass of Additive A; S3: Mixing treatment, additive A and additive B are mixed to obtain the additive.

[0006] Preferably, the additive A is prepared by the following method: deionized water and glacial acetic acid are mixed and added to a mixer. KH560 is added to the mixer, and the mixer is set to 40-60 rpm for 20-30 minutes. After mixing, the mixture is allowed to stand for 1-2 hours to obtain a first mixture, which is set aside for later use. Amino resin and propylene glycol methyl ether are added to the mixer, and the mixer is set to 40-60 rpm for 40-60 minutes to obtain a second mixture, which is set aside for later use. Nano silica, deionized water, and BYK190 are added to the mixer, and the mixer is set to 100-200 rpm for 10-20 minutes. Then, the first mixture is added to the mixer, and the mixture is stirred for another 10 minutes. The second mixture is added, and the mixture is stirred for another 20-30 minutes to obtain additive A.

[0007] Preferably, the mass ratio of deionized water, glacial acetic acid and KH560 is 20:0.5 to 1:3 to 5, the mass ratio of amino resin to propylene glycol methyl ether is 1:0.3 to 0.4, and the mass ratio of nano silica, deionized water and BYK190 is 1:20 to 25:2 to 3.

[0008] Preferably, the mass of the first mixture is 4 to 6 times the mass of the nano-silica, and the mass of the second mixture is 40 to 80% of the mass of the first mixture.

[0009] Preferably, the additive B is prepared by the following method: deionized water and ethylene glycol ethyl ether acetate are added to a mixer, the speed is set to 50-60 rpm, and the mixture is stirred for 5-10 minutes to obtain a solution. Triethanolamine is added to the solution, and the mixture is stirred for 3-5 minutes at 50-60 rpm. The pH of the product is adjusted to 7.5-8.5. Nano boron nitride is added, and the mixture is stirred and dispersed at 180-220 rpm for 20-30 minutes. Then the speed is reduced to 60-80 rpm, and KH550 is slowly added dropwise. After the addition is complete, an organosilicon emulsion is added, and the mixture is stirred at 60-80 rpm for 25-35 minutes. The product obtained after stirring is placed at 35-45°C and allowed to stand for 1.5-3 hours. After cooling to room temperature, additive B is obtained.

[0010] Preferably, the mass ratio of deionized water to ethylene glycol ethyl ether acetate is 30:10-15, the mass of triethanolamine is 3-5% of the mass of deionized water, the mass of nano boron nitride is 2-3 times the mass of triethanolamine, the mass of KH550 is 3-4 times the mass of triethanolamine, and the mass of organosilicon emulsion is 15-20 times the mass of triethanolamine.

[0011] Preferably, the mixing process is as follows: Additive A and Additive B are added to a reaction vessel, the temperature is set to 35-40°C, the stirring speed is 150-200 rpm, and the mixture is stirred at a constant temperature for 20-40 minutes to complete the mixing process and obtain the additive.

[0012] Preferably, the cosolvent is propylene glycol methyl ether, and the wetting agent is Surfynol 104E.

[0013] Preferably, the defoamer is BYK-024 and the leveling agent is BYK381.

[0014] Preferably, a method for preparing a high-temperature resistant, stable water-based ink includes the following steps: weighing pigment, wetting agent, 20% by mass of acrylic resin emulsion, and 30% by mass of deionized water as needed and adding them to a mixer, stirring at 600-800 rpm for 20-40 minutes to obtain a color paste; adding the color paste, 80% by mass of acrylic resin emulsion, 70% by mass of deionized water, cosolvent, additives, defoamer, leveling agent, and wax emulsion to a mixer, stirring at 200-400 rpm for 40-60 minutes; filtering the resulting product through a 100-mesh filter to obtain a high-temperature resistant, stable water-based ink.

[0015] Compared with the prior art, the beneficial effects of the present invention are: 1. In this invention, the water-based ink forms a dense film matrix through an acrylic resin emulsion, and introduces an additive composed of additive A and additive B. The nano-silica in additive A, after being modified by KH560, can effectively penetrate and enhance the resin network, thereby improving the thermomechanical strength of the ink film. Meanwhile, the nano-boron nitride in additive B, with its layered structure, constructs a highly efficient heat insulation barrier in the ink film. The synergistic effect of the two allows the ink layer formed after curing to withstand frequent thermal shocks, effectively resisting softening and re-adhesion caused by excessive movement of resin molecular chains, and ensuring reliability in high-temperature scenarios during continuous processing.

[0016] 2. In this invention, the nano-silica in additive A, after being modified by KH560 silane coupling agent, has significantly improved surface activity and can be effectively adsorbed on the surface of pigment particles. It prevents pigment agglomeration through steric hindrance effect. The organosilicon emulsion contained in additive B can effectively reduce the surface tension of the entire system and promote pigment wetting. The additive composed of the two utilizes the steric hindrance effect of nano-silica, the barrier effect of nano-boron nitride, and the wetting effect of organosilicon emulsion to construct a stable three-dimensional network, which can effectively prevent the sedimentation and flocculation of pigment particles and ensure the uniformity of ink storage period. Attached Figure Description

[0017] Figure 1The present invention provides a flowchart of a high-temperature resistant, stable water-based ink and its preparation method. Detailed Implementation

[0018] The technical solutions of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0019] It should be noted that the raw materials used in the following embodiments are all commercially available. Example 1:

[0020] A high-temperature resistant and stable water-based ink comprises the following raw materials in parts by weight: 60 parts acrylic resin emulsion, 10 parts pigment, 15 parts deionized water, 4 parts cosolvent, 4 parts additive, 0.5 parts wetting agent, 0.2 parts defoamer, 0.5 parts leveling agent, and 1 part wax emulsion. The additive is prepared by the following method: S1: Preparation of Additive A, the raw materials of Additive A include the first mixture, the second mixture, nano silica, deionized water and BYK190; Additive A is prepared by the following method: Deionized water and glacial acetic acid are mixed and added to a mixer. KH560 is added to the mixer, and the mixer is set to 40 rpm and stirred for 20 min. After stirring, it is allowed to stand for 1 h to obtain the first mixture, which is set aside for use. Amino resin and propylene glycol methyl ether are added to the mixer at a mass ratio of 1:0.3. The mixer is set to 40 rpm and stirred for 40 min to obtain the second mixture, which is set aside for use. Nano silica, deionized water and BYK190 are added to the mixer at a mass ratio of 1:20:2. The mixer is set to 100 rpm and stirred for 10 min. Then the first mixture is added to the mixer, and stirring is continued for 10 min. The second mixture is added, and stirring is continued for 20 min to obtain additive A. The mass ratio of deionized water, glacial acetic acid and KH560 is 20:0.5:3.

[0021] The mass of the first mixture is 4 times that of the nano-silica, and the mass of the second mixture is 40% of the mass of the first mixture. S2: Preparation of Additive B. The raw materials for Additive B include deionized water, ethylene glycol ethyl ether acetate, triethanolamine, nano boron nitride, KH550 and silicone emulsion. The mass of Additive B is 25% of the mass of Additive A. Additive B was prepared by the following method: Deionized water and ethylene glycol ethyl ether acetate were added to a mixer at a mass ratio of 30:10. The mixer was set to 50 rpm and stirred for 5 minutes to mix evenly, resulting in a solution. Triethanolamine was added to the solution, and the mixture was stirred at 50 rpm for 3 minutes. The pH of the product was adjusted to 7.5. Nano boron nitride with a mass twice that of triethanolamine was added, and the mixture was stirred and dispersed at 180 rpm for 20 minutes. Then, the stirring speed was reduced to 60 rpm, and KH550 was slowly added dropwise. After the dropwise addition was completed, an organosilicon emulsion was added, and the mixture was stirred at 60 rpm for 25 minutes. The product obtained after stirring was placed at 35°C and allowed to stand for 1.5 hours. After cooling to room temperature, additive B was obtained. The mass of triethanolamine was 3% of the mass of deionized water, the mass of KH550 was 3 times the mass of triethanolamine, and the mass of the organosilicon emulsion was 15 times the mass of triethanolamine. S3: Mixing treatment, additive A and additive B are mixed to obtain the additive.

[0022] The mixing process is as follows: Additive A and Additive B are added to a reaction vessel, the temperature is set to 35℃, the stirring speed is 150rpm, and the mixture is stirred at a constant temperature for 20 minutes to complete the mixing process and obtain the additive.

[0023] The cosolvent is propylene glycol methyl ether, and the wetting agent is Surfynol 104E.

[0024] The defoamer used is BYK-024, and the leveling agent used is BYK381.

[0025] A method for preparing a high-temperature resistant, stable water-based ink includes the following steps: Weigh out pigments, wetting agents, 20% by weight of acrylic resin emulsion, and 30% by weight of deionized water as needed, add them to a mixer, and stir at 600 rpm for 20 minutes to obtain a color paste. Add the color paste, 80% by weight of acrylic resin emulsion, 70% by weight of deionized water, cosolvent, additives, defoamer, leveling agent, and wax emulsion to the mixer, and stir at 200 rpm for 40 minutes. Filter the resulting product through a 100-mesh filter to obtain the high-temperature resistant, stable water-based ink. Example 2:

[0026] A high-temperature resistant and stable water-based ink comprises the following raw materials in parts by weight: 65 parts acrylic resin emulsion, 15 parts pigment, 20 parts deionized water, 6 parts cosolvent, 6 parts additive, 1 part wetting agent, 0.5 parts defoamer, 1 part leveling agent, and 1.5 parts wax emulsion. The additive is prepared by the following method: S1: Preparation of Additive A, the raw materials of Additive A include the first mixture, the second mixture, nano silica, deionized water and BYK190; Additive A is prepared by the following method: Deionized water and glacial acetic acid are mixed and added to a mixer. KH560 is added to the mixer, and the mixer is set to 50 rpm for 25 min. After mixing, the mixture is allowed to stand for 1.5 h to obtain the first mixture, which is set aside for later use. Amino resin and propylene glycol methyl ether are added to the mixer at a mass ratio of 1:0.35, and the mixer is set to 50 rpm for 50 min to obtain the second mixture, which is set aside for later use. Nano silica, deionized water, and BYK190 are added to the mixer at a mass ratio of 1:22:2.5, and the mixer is set to 150 rpm for 15 min. Then, the first mixture is added to the mixer, and the mixing is continued for 10 min. The second mixture is added, and the mixing is continued for 25 min to obtain additive A. The mass ratio of deionized water, glacial acetic acid, and KH560 is 20:0.8:4.

[0027] The mass of the first mixture is 5 times that of the nano-silica, and the mass of the second mixture is 60% of the mass of the first mixture. S2: Preparation of Additive B. The raw materials for Additive B include deionized water, ethylene glycol ethyl ether acetate, triethanolamine, nano boron nitride, KH550, and silicone emulsion. The mass of Additive B is 25-40% of the mass of Additive A. Additive B was prepared by the following method: Deionized water and ethylene glycol ethyl ether acetate were added to a mixer at a mass ratio of 30:12. The mixer was set to 55 rpm and stirred for 8 minutes to mix evenly, resulting in a solution. Triethanolamine was added to the solution, and the mixture was stirred at 55 rpm for 4 minutes. The pH of the product was adjusted to 8. Nano boron nitride with a mass of 2.5 times that of triethanolamine was added. The mixture was stirred and dispersed at 200 rpm for 25 minutes. Then, the stirring speed was reduced to 70 rpm, and KH550 was slowly added dropwise. After the dropwise addition was completed, an organosilicon emulsion was added, and the mixture was stirred at 70 rpm for 30 minutes. The resulting product was placed at 40°C and allowed to stand for 2.2 hours. After cooling to room temperature, additive B was obtained. The mass of triethanolamine was 4% of the mass of deionized water, the mass of KH550 was 3.5 times the mass of triethanolamine, and the mass of the organosilicon emulsion was 18 times the mass of triethanolamine. S3: Mixing treatment, additive A and additive B are mixed to obtain the additive.

[0028] The mixing process is as follows: Additive A and Additive B are added to a reaction vessel, the temperature is set to 38℃, the stirring speed is 180rpm, and the mixture is stirred at a constant temperature for 30 minutes to complete the mixing process and obtain the additive.

[0029] The cosolvent is propylene glycol methyl ether, and the wetting agent is Surfynol 104E.

[0030] The defoamer used is BYK-024, and the leveling agent used is BYK381.

[0031] A method for preparing a high-temperature resistant, stable water-based ink includes the following steps: Weigh out pigments, wetting agents, 20% by weight of acrylic resin emulsion, and 30% by weight of deionized water as needed, add them to a mixer, and stir at 700 rpm for 30 minutes to obtain a color paste. Add the color paste, 80% by weight of acrylic resin emulsion, 70% by weight of deionized water, cosolvent, additives, defoamer, leveling agent, and wax emulsion to the mixer, and stir at 300 rpm for 50 minutes. Filter the resulting product through a 100-mesh filter to obtain the high-temperature resistant, stable water-based ink. Example 3:

[0032] A high-temperature resistant and stable water-based ink comprises the following raw materials in parts by weight: 70 parts acrylic resin emulsion, 20 parts pigment, 25 parts deionized water, 8 parts cosolvent, 8 parts additive, 1.5 parts wetting agent, 0.8 parts defoamer, 1.5 parts leveling agent, and 2 parts wax emulsion. The additive is prepared by the following method: S1: Preparation of Additive A, the raw materials of Additive A include the first mixture, the second mixture, nano silica, deionized water and BYK190; Additive A is prepared by the following method: Deionized water and glacial acetic acid are mixed and added to a mixer. KH560 is added to the mixer, and the mixer is set to 60 rpm for 30 min. After mixing, the mixture is allowed to stand for 2 h to obtain the first mixture, which is set aside for later use. Amino resin and propylene glycol methyl ether are added to the mixer at a mass ratio of 1:0.4, and the mixer is set to 60 rpm for 60 min to obtain the second mixture, which is set aside for later use. Nano silica, deionized water, and BYK190 are added to the mixer at a mass ratio of 1:25:3, and the mixer is set to 200 rpm for 20 min. Then, the first mixture is added to the mixer, and the mixture is stirred for another 10 min. The second mixture is added, and the mixture is stirred for another 30 min to obtain additive A. The mass ratio of deionized water, glacial acetic acid, and KH560 is 20:1:5.

[0033] The mass of the first mixture is 6 times that of the nano-silica, and the mass of the second mixture is 80% of the mass of the first mixture. S2: Preparation of Additive B. The raw materials for Additive B include deionized water, ethylene glycol ethyl ether acetate, triethanolamine, nano boron nitride, KH550, and silicone emulsion. The mass of Additive B is 40% of the mass of Additive A. Additive B was prepared by the following method: Deionized water and ethylene glycol ethyl ether acetate were added to a mixer at a mass ratio of 30:15. The mixer was set to 60 rpm and stirred for 10 min to mix evenly to obtain a solution. Triethanolamine was added to the solution and stirred for another 5 min at 60 rpm. The pH of the product was adjusted to 8.5. Nano boron nitride with a mass of 3 times that of triethanolamine was added and stirred and dispersed at 220 rpm for 30 min. Then the stirring speed was reduced to 80 rpm and KH550 was slowly added dropwise. After the dropwise addition was completed, an organosilicon emulsion was added and stirred at 80 rpm for 35 min. The product obtained after stirring was placed at 45°C and allowed to stand for 3 h. After cooling to room temperature, additive B was obtained. The mass of triethanolamine was 5% of the mass of deionized water, the mass of KH550 was 4 times the mass of triethanolamine, and the mass of organosilicon emulsion was 20 times the mass of triethanolamine. S3: Mixing treatment, additive A and additive B are mixed to obtain the additive.

[0034] The mixing process is as follows: Additive A and Additive B are added to a reaction vessel, the temperature is set to 40℃, the stirring speed is 200rpm, and the mixture is stirred at a constant temperature for 40min to complete the mixing process and obtain the additive.

[0035] The cosolvent is propylene glycol methyl ether, and the wetting agent is Surfynol 104E.

[0036] The defoamer used is BYK-024, and the leveling agent used is BYK381.

[0037] A method for preparing a high-temperature resistant, stable water-based ink includes the following steps: Weigh out pigments, wetting agents, 20% by weight of acrylic resin emulsion, and 30% by weight of deionized water as needed, add them to a mixer, and stir at 800 rpm for 40 minutes to obtain a color paste. Add the color paste, 80% by weight of acrylic resin emulsion, 70% by weight of deionized water, cosolvent, additives, defoamer, leveling agent, and wax emulsion to the mixer, and stir at 400 rpm for 60 minutes. Filter the resulting product through a 100-mesh filter to obtain the high-temperature resistant, stable water-based ink.

[0038] Comparative Example 1: The difference between this comparative example and Example 1 is that this comparative example does not contain additive A.

[0039] Comparative Example 2 differs from Example 1 in that it does not contain additive B.

[0040] Comparative Example 3: The difference between this comparative example and Example 1 is that this comparative example does not contain any additives.

[0041] Performance testing: The stable water-based inks prepared in Examples 1-3 and Comparative Examples 1-3 were subjected to performance testing.

[0042] Adhesion fastness test: Samples were prepared using melamine resin as the base material. The adhesion fastness of the ink was determined by tape method according to GB / T13217.7-2009 standard and recorded in Table 1. The samples were then placed in a 200℃ drying oven and heated for 60 minutes. The high temperature adhesion fastness was determined again and recorded in Table 1. Storage stability: The viscosity change rate was measured according to GB / T 6753.3-1986 and recorded in Table 1.

[0043] Table 1

[0044] In performance testing, the adhesion strength, high-temperature adhesion strength, and viscosity change rate of Examples 1-3 were significantly better than those of Comparative Examples 1-3. Examples 1-3 exhibited high adhesion strength, indicating that the resin and additives in the ink formed a strong bond with the substrate. In particular, Additive A, through its silane coupling agent and other components, established a solid bridge between the ink resin and the substrate, effectively improving adhesion. Its excellent high-temperature adhesion retention rate is mainly due to the heat insulation barrier constructed by the layered nanomaterials in Additive B in the ink film, which effectively inhibits the thermal degradation and excessive softening of the resin under high-temperature conditions of 200°C, thereby maintaining strong adhesion in high-temperature application scenarios. The extremely low viscosity change rate of Examples 1-3 demonstrates that the water-based ink system of the present invention has excellent storage stability. The three-dimensional network structure formed by the compounding of Additive A and Additive B can effectively prevent the sedimentation and flocculation of pigments and functional fillers, ensuring the performance stability of the product during storage. Further analysis revealed that the performance of Comparative Examples 1-3 decreased to varying degrees compared to Examples 1-3. Comparative Example 1 showed a significant decline in all performance aspects. This is because the absence of additive A means the water-based ink system loses its crucial coupling enhancement effect, resulting in insufficient adhesion to the substrate. Simultaneously, the system lacks effective steric hindrance to prevent particle agglomeration, thus deteriorating both adhesion and storage stability. In Comparative Example 2, the absence of additive B significantly weakens its high-temperature resistance. While its adhesion at room temperature is acceptable, it drops drastically at high temperatures. This is because additive B is a core component contributing to heat resistance; its absence means the absence of a heat insulation barrier, preventing the ink layer from being protected at high temperatures. The increased movement of resin molecular chains leads to a rapid loss of adhesive force, while its adhesion at room temperature remains acceptable. This is because additive A continues to function at room temperature, and the viscosity change is small, indicating that even without additive B, additive A can still make a significant contribution to storage stability. In contrast, Comparative Example 3, lacking the entire additive, means that both additives A and B are lost simultaneously, resulting in the worst performance across all indicators. This demonstrates that without the additive system, the ink returns to its basic level, proving that the superior performance of this invention is not achieved solely by basic components such as acrylic resin, but rather relies on the synergistic effect of additives A and B. Both are indispensable, and together they solve the problems of adhesion degradation and storage instability at high temperatures.

[0045] By comparing and analyzing the relevant data in the table, it can be seen that the stable water-based ink prepared by this invention not only exhibits good stability under high-temperature conditions but also good storage stability. This indicates that the high-temperature resistant stable water-based ink provided by this invention has a broader market prospect and is more suitable for widespread application.

[0046] In the description of this specification, references to terms such as "an embodiment," "example," "specific example," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0047] The preferred embodiments of the present invention disclosed above are merely illustrative of the invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the invention to the specific implementations described. Clearly, many modifications and variations can be made based on the content of this specification. This specification selects and specifically describes these embodiments to better explain the principles and practical applications of the invention, thereby enabling those skilled in the art to better understand and utilize the invention. The invention is limited only by the claims and their full scope and equivalents.

Claims

1. A high-temperature resistant, stable water-based ink, characterized in that: The raw materials include the following parts by weight: 60-70 parts acrylic resin emulsion, 10-20 parts pigment, 15-25 parts deionized water, 4-8 parts cosolvent, 4-8 parts additive, 0.5-1.5 parts wetting agent, 0.2-0.8 parts defoamer, 0.5-1.5 parts leveling agent, and 1-2 parts wax emulsion; The additive is prepared by the following method: S1: Preparation of Additive A, wherein the raw materials of Additive A include a first mixture, a second mixture, nano-silica, deionized water and BYK190; S2: Preparation of Additive B, wherein the raw materials for Additive B include deionized water, ethylene glycol ethyl ether acetate, triethanolamine, nano boron nitride, KH550 and organosilicon emulsion, and the mass of Additive B is 25-40% of the mass of Additive A; S3: Mixing treatment, additive A and additive B are mixed to obtain the additive.

2. The high-temperature resistant, stable water-based ink according to claim 1, characterized in that, The additive A is prepared by the following method: Deionized water and glacial acetic acid are mixed and added to a mixer. KH560 is added to the mixer, and the mixer is set to 40-60 rpm for 20-30 minutes. After mixing, the mixture is allowed to stand for 1-2 hours to obtain a first mixture, which is then set aside. Amino resin and propylene glycol methyl ether are added to the mixer, and the mixer is set to 40-60 rpm for 40-60 minutes to obtain a second mixture, which is then set aside. Nano-silica, deionized water, and BYK190 are added to the mixer, and the mixer is set to 100-200 rpm for 10-20 minutes. Then, the first mixture is added to the mixer, and the mixture is stirred for another 10 minutes. Finally, the second mixture is added, and the mixture is stirred for another 20-30 minutes to obtain additive A.

3. The high-temperature resistant, stable water-based ink according to claim 2, characterized in that, The mass ratio of deionized water, glacial acetic acid, and KH560 is 20:0.5-1:3-5; the mass ratio of amino resin to propylene glycol methyl ether is 1:0.3-0.4; and the mass ratio of nano-silica, deionized water, and BYK190 is 1:20-25:2-3.

4. The high-temperature resistant, stable water-based ink according to claim 2, characterized in that, The mass of the first mixture is 4 to 6 times the mass of the nano-silica, and the mass of the second mixture is 40 to 80% of the mass of the first mixture.

5. The high-temperature resistant, stable water-based ink according to claim 1, characterized in that, The additive B is prepared by the following method: Deionized water and ethylene glycol ethyl ether acetate are added to a mixer, the speed is set to 50-60 rpm, and the mixture is stirred for 5-10 minutes to obtain a solution. Triethanolamine is added to the solution, and the mixture is stirred for 3-5 minutes at 50-60 rpm. The pH of the product is adjusted to 7.5-8.

5. Nano boron nitride is added, and the mixture is stirred and dispersed at 180-220 rpm for 20-30 minutes. Then the speed is reduced to 60-80 rpm, and KH550 is slowly added dropwise. After the addition is complete, an organosilicon emulsion is added, and the mixture is stirred at 60-80 rpm for 25-35 minutes. The product obtained after stirring is placed at 35-45℃ and allowed to stand for 1.5-3 hours. After cooling to room temperature, additive B is obtained.

6. The high-temperature resistant, stable water-based ink according to claim 5, characterized in that, The mass ratio of deionized water to ethylene glycol ethyl ether acetate is 30:10-15, the mass of triethanolamine is 3-5% of the mass of deionized water, the mass of nano boron nitride is 2-3 times the mass of triethanolamine, the mass of KH550 is 3-4 times the mass of triethanolamine, and the mass of organosilicon emulsion is 15-20 times the mass of triethanolamine.

7. The high-temperature resistant, stable water-based ink according to claim 1, characterized in that, The mixing process is as follows: Additive A and Additive B are added to a reaction vessel, the temperature is set to 35-40℃, the stirring speed is 150-200 rpm, and the mixture is stirred at a constant temperature for 20-40 minutes to complete the mixing process and obtain the additive.

8. The high-temperature resistant, stable water-based ink according to claim 1, characterized in that, The cosolvent is propylene glycol methyl ether, and the wetting agent is Surfynol 104E.

9. The high-temperature resistant, stable water-based ink according to claim 1, characterized in that, The defoamer used is BYK-024, and the leveling agent used is BYK381.

10. The method for preparing the high-temperature resistant, stable water-based ink according to any one of claims 1 to 9, characterized in that, The process includes the following steps: Weigh out pigments, wetting agents, 20% by weight of acrylic resin emulsion, and 30% by weight of deionized water as needed and add them to a mixer. Set the mixer to 600-800 rpm and stir for 20-40 minutes to obtain a color paste. Add the color paste, 80% by weight of acrylic resin emulsion, 70% by weight of deionized water, cosolvent, additives, defoamer, leveling agent, and wax emulsion to a mixer and stir for 200-400 rpm for 40-60 minutes. Filter the resulting product through a 100-mesh filter to remove impurities and obtain a high-temperature resistant, stable water-based ink.

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