Silicon optical chip, wafer and test method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 武汉钧恒科技有限公司
- Filing Date
- 2025-12-19
- Publication Date
- 2026-05-12
AI Technical Summary
Existing technologies waste a significant amount of usable area on silicon photonic chip wafers, leading to increased costs and hindering efficient use of wafer space.
A groove is formed on the edge of the fourth side surface of the silicon photonic chip. When the groove is rotated 90° counterclockwise, it covers the input waveguide and the output waveguide. The silicon photonic chips are arranged in a multi-row, multi-column array in groups of four. The input waveguide and output waveguide of adjacent silicon photonic chips correspond to the groove. The test light probe is coupled in the dicing channel and the groove to reduce the design of photolithography grooves.
This effectively reduces wasted wafer area, improves wafer utilization, and lowers production costs.
Smart Images

Figure CN122018085A_ABST