A multi-contact point conductive electrolytic cell current distribution equalization method

By setting up a backup conductive component in the copper electrolytic cell to construct a dual-contact-point structure, the current is monitored in real time and automatically compensated, which solves the contact problems caused by the single-contact-point structure, realizes balanced current distribution and production continuity and stability, significantly reduces energy consumption and improves product quality.

CN122105536APending Publication Date: 2026-05-29CHIFENG YUNTONG NON FERROUS METAL CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHIFENG YUNTONG NON FERROUS METAL CO LTD
Filing Date
2026-01-19
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

The single-contact structure of existing copper electrolytic cells is prone to poor contact or open circuit, resulting in reduced current efficiency and increased energy consumption. Furthermore, existing monitoring and alarm systems cannot automatically repair contact faults, failing to meet the requirements of continuity and stability in industrial production.

Method used

A backup conductive component is installed on the insulating side of the electrode plate of the original conductive busbar in the electrolytic cell to form a double contact point structure with the same polarity in parallel. The voltage drop data is monitored in real time. When the contact is poor, the backup conductive component automatically compensates for the current and adjusts the contact pressure by adjusting the fastening mechanism of the insulating mounting kit to maintain the conductivity efficiency.

Benefits of technology

The dual-contact structure eliminates the risk of single-point contact failure, reduces contact resistance, improves current distribution uniformity, reduces tank voltage, significantly saves energy, improves current efficiency, enhances product quality, and enables online dynamic adjustment without shutdown.

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Abstract

The present application relates to non-ferrous smelting technical field, specifically to a kind of electrolytic cell current distribution equalization method of multiple contact point conduction, spare conduction component is set in the insulating side of the polar plate of electrolytic cell original intercell conduction row, and double contact point conduction structure of same polarity parallel is formed with original conduction row, so that the two ends of the polar plate in electrolytic cell are contacted with same polarity conduction structure;In the process of electrolytic production, the voltage drop data of each contact point in electrolytic cell is monitored in real time;When original conduction row and polar plate contact badly or open circuit leads to voltage drop data exceed preset threshold range, spare conduction component is used as current compensation path to shunt current;According to the monitored voltage drop data, the contact pressure between spare conduction component and polar plate is adjusted by adjusting the fastening mechanism on the insulating mounting kit.The present application eliminates the risk of single point contact failure, when main channel contact is poor, spare channel automatically assumes current compensation, and production continuity is guaranteed.
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