A hybrid intake device and semiconductor manufacturing apparatus

Abstract

This invention relates to the field of semiconductor manufacturing equipment technology, and more specifically, to a mixing gas intake device. The mixing gas intake device provided by this invention includes an upper cover plate and an intake cavity: the upper cover plate includes a first fluid channel extending from top to bottom through the middle of the upper cover plate for introducing a first gas into the intake cavity; several intake channels are formed on the sidewalls of the upper cover plate, distributed along the circumference of the upper cover plate, for introducing a second gas; several diversion grooves are formed circumferentially inside the upper cover plate for diverting the second gas introduced through the intake channels; each intake channel is connected to at least one diversion groove, and the second gas enters the intake cavity through the intake channel and the diversion groove; the intake cavity outputs the mixed gas formed by mixing the first and second gases. This invention can ensure a uniform and thorough mixing effect of the two process gases within the device, thereby guaranteeing the uniformity and efficiency of the semiconductor process.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing equipment technology, and more specifically, to a mixed air intake device and semiconductor manufacturing equipment. Background Technology

[0002] Low-pressure epitaxy (EPI) processes have extremely stringent requirements for wafer surface quality, ensuring the wafer surface is in optimal condition and avoiding any oxide film formation or impurity residue. Therefore, a pre-cleaning process is typically required before EPI to thoroughly remove oxide films and impurities from the wafer surface. Commonly used process gases in this process include NF3 and NH3. NF3 gas is first ionized to generate plasma, then thoroughly mixed with NH3 gas before entering the pre-cleaning chamber for efficient wafer surface cleaning.

[0003] To ensure uniform mixing of process gases before they enter the pre-cleaning chamber, a mixing inlet device is necessary. Current mixing inlet devices are typically designed to be quite simple, which can easily lead to unsatisfactory mixing of process gases and an inability to achieve uniform distribution on the wafer surface, thus adversely affecting the pre-cleaning effect on the wafer surface. Summary of the Invention

[0004] The purpose of this invention is to provide a mixing and inlet device to solve the problem of poor gas mixing uniformity before entering the reaction chamber in existing semiconductor manufacturing equipment.

[0005] To achieve the above objectives, the present invention provides a mixing air intake device, comprising an upper cover plate and an air intake chamber:

[0006] The upper cover plate is fixedly connected to the upper part of the air intake cavity;

[0007] The upper cover plate includes a first fluid channel that extends from top to bottom through the middle of the upper cover plate and is used to introduce a first gas into the air intake chamber.

[0008] The air intake cavity includes a second fluid channel, which runs from top to bottom through the middle of the air intake cavity and is connected to the first fluid channel.

[0009] The upper cover plate has several air intake channels on its side wall. The air intake channels are distributed along the periphery of the upper cover plate. One end of each air intake channel is located on the side wall, and the other end extends towards the center and is located inside the upper cover plate. The air intake channels are used to introduce a second gas.

[0010] The upper cover plate has several diversion grooves in its inner circumferential direction. The several diversion grooves form a ring layout relative to the circumference of the upper cover plate, which is used to divert the second gas introduced into the air intake channel.

[0011] Each of the air intake channels is connected to at least one of the flow dividers, and the second gas enters the second fluid channel of the air intake cavity through the air intake channel and the flow divider;

[0012] The second fluid channel outputs the mixed gas formed by mixing the first gas and the second gas.

[0013] In some embodiments, the upper cover is fastened to the air intake cavity.

[0014] In some embodiments, the plurality of diversion channels include a plurality of stages of diversion channels opened along a plurality of circumferential directions;

[0015] Different stages of the flow divider correspond to different circumferential radii;

[0016] The same level of distribution channels are arranged on the same circumference.

[0017] In some embodiments, the upper cover plate also has several levels of internal connecting channels:

[0018] The internal connecting channel of each stage is set between the corresponding two adjacent stages of the diversion channel to connect the gas between the two adjacent stages of the diversion channel.

[0019] In some embodiments, the number of internal interconnecting channels at the same level is multiple.

[0020] In some embodiments, the internal connecting channels corresponding to the same intake channel in the same level are symmetrically distributed with respect to the corresponding intake channel.

[0021] In some embodiments, the plurality of air intake channels are evenly distributed along the circumferential direction of the upper cover plate.

[0022] In some embodiments, the number of internal connecting channels at each level corresponds to the number of diversion channels at the downstream level;

[0023] The internal connecting channel of each stage is located in the middle of the diversion channel of the downstream stage.

[0024] In some embodiments, the air intake cavity includes an air intake cavity body portion and an upper annular protrusion portion:

[0025] The upper annular protrusion is fixedly connected to the upstream side of the air intake chamber body.

[0026] The air intake chamber body is provided with a docking part, which protrudes from the upper surface of the upper annular protrusion.

[0027] The upper surface of the docking part abuts against the upper cover plate;

[0028] Each of the air intake channels and the diversion groove in fluid communication with the air intake channel constitute an air intake path; the diversion groove is formed by the upper surface of the upper annular protrusion or by the upper surface of the upper annular protrusion and the outer peripheral wall of the docking part.

[0029] In some embodiments, there are two external connecting channels that connect the same distribution channel, which are symmetrically distributed relative to the middle position of the corresponding distribution channel.

[0030] In some embodiments, the docking portion is provided with multiple external communication channels:

[0031] The external connecting channel connects the innermost diversion groove to the second fluid channel of the air intake cavity.

[0032] In some embodiments, within the same branch gas path, the total flow area of ​​the plurality of external connecting channels is smaller than the total flow area of ​​the inner connecting channel located in the last stage upstream; and / or

[0033] In at least one adjacent two-stage internal connecting channel within the same intake air path, the total flow area of ​​the internal connecting channel at the downstream stage is less than the total flow area of ​​the internal connecting channel at the upstream stage.

[0034] In some embodiments, the air intake chamber body portion includes a first body portion and a second body portion:

[0035] The first body part is a cylindrical structure;

[0036] The upper annular protrusion is fixedly connected to the outer periphery of the first body portion;

[0037] The docking portion is disposed on the upper part of the first body portion;

[0038] The second body part is fixedly connected to the bottom of the first body part.

[0039] In some embodiments, the second body portion is a hollow frustum-shaped structure, and the top surface of the second body portion is connected to the first body portion.

[0040] In some embodiments, the second fluid channel extends through a portion of the first body portion and has the same shape as the first body portion;

[0041] The second fluid channel extends through the portion of the second body portion and has the same shape as the second body portion.

[0042] In some embodiments, the air intake cavity further includes a lower annular protrusion:

[0043] The lower annular protrusion is fixedly connected to the downstream side of the second body portion.

[0044] In some embodiments, the air intake chamber body further includes a plurality of flow equalizers:

[0045] The flow equalizer plate is provided with multiple flow equalizer holes;

[0046] The plurality of flow equalization plates are respectively disposed inside the air intake chamber body.

[0047] In some embodiments, the plurality of flow equalizers includes a first flow equalizer:

[0048] The first flow equalizer is disposed between the first body part and the second body part;

[0049] The first flow equalization plate is provided with multiple flow equalization holes.

[0050] In some embodiments, the intake chamber body portion further includes a third body portion:

[0051] The third body part is a cylindrical structure and is fixedly connected to the bottom of the second body part;

[0052] The plurality of flow equalizers also includes a second flow equalizer;

[0053] The second flow equalizer is disposed inside the third body section;

[0054] The second flow equalization plate is provided with multiple flow equalization holes.

[0055] In some embodiments, the uniform flow hole forms a certain inclined angle with the central axis of the air intake chamber body.

[0056] In some embodiments, the uniform flow hole forms a certain outward tilt angle with the central axis of the air intake chamber body.

[0057] To achieve the above objectives, the present invention provides a semiconductor manufacturing apparatus comprising the mixing air intake device as described above;

[0058] The semiconductor manufacturing equipment includes a reaction chamber, and the lower end of the mixing inlet device is fixedly connected to the reaction chamber; and / or

[0059] The semiconductor manufacturing equipment includes a remote plasma source, and the upper end of the mixing air intake device is fixedly connected to the remote plasma source.

[0060] The mixing gas inlet device proposed in this invention can ensure a uniform and thorough mixing effect of the two process gases within the device, thereby guaranteeing the uniformity and efficiency of the semiconductor process. Semiconductor manufacturing equipment incorporating this mixing gas inlet device has the same advantages, which will not be elaborated further here. Attached Figure Description

[0061] The above and other features, properties and advantages of the present invention will become more apparent from the following description taken in conjunction with the accompanying drawings and embodiments, in which the same reference numerals always denote the same features, wherein:

[0062] Figure 1 An overall isometric schematic diagram of a hybrid air intake device according to an embodiment of the present invention is shown;

[0063] Figure 2 A cross-sectional schematic diagram of a mixing air intake device according to an embodiment of the present invention is disclosed;

[0064] Figure 3 An isometric schematic diagram of an air intake cavity according to an embodiment of the present invention is shown;

[0065] Figure 4 A cross-sectional structural schematic diagram of a mixing air intake device according to an embodiment of the present invention is disclosed;

[0066] Figure 5 A cross-sectional structural schematic diagram of a hybrid air intake device according to another embodiment of the present invention is disclosed;

[0067] Figure 6 A cross-sectional schematic diagram of a mixing air intake device according to an embodiment of the present invention is disclosed;

[0068] Figure 7a A cross-sectional schematic diagram of a mixed air intake device according to yet another embodiment of the present invention is disclosed;

[0069] Figure 7b A top view of a first flow equalization plate according to yet another embodiment of the present invention is disclosed;

[0070] Figure 8a A cross-sectional schematic diagram of a mixed air intake device according to yet another embodiment of the present invention is disclosed;

[0071] Figure 8b A top view of a second flow equalizer according to yet another embodiment of the present invention is shown.

[0072] The meanings of the labels in the figures are as follows:

[0073] 1. Top cover plate;

[0074] 11 intake channels;

[0075] 111 Upper cover plate body part;

[0076] 112 Upper cover plate protrusion;

[0077] 113 Abutting plane;

[0078] 12. First-stage diversion channel;

[0079] 13 Second-stage diversion channel;

[0080] 14. First-level internal connectivity channels;

[0081] 15 annular grooves;

[0082] 2. Intake chamber;

[0083] 21. Intake chamber body section;

[0084] 211The first body part;

[0085] 2111 Docking Section;

[0086] 2112 External connection channel;

[0087] 212 Second Body Section;

[0088] 213 Third Body Section;

[0089] 214 First flow equalizer;

[0090] 215 Second flow equalizer;

[0091] 22. Upper annular protrusion;

[0092] 221 flat section;

[0093] 23. Lower annular protrusion. Detailed Implementation

[0094] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the invention.

[0095] In the description of this specification, references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0096] The present invention provides a mixing air intake device and a semiconductor manufacturing apparatus using the mixing air intake device. The mixing air intake device can be used for pre-cleaning the cavity, thereby improving the problem of uneven air mixing in the prior art.

[0097] Figure 1 An overall isometric schematic diagram of a hybrid air intake device according to an embodiment of the present invention is shown. Figure 2 A cross-sectional schematic diagram of a mixing intake device according to an embodiment of the present invention is shown, such as... Figure 1 and Figure 2 As shown, the present invention proposes a mixed air intake device, comprising an upper cover plate 1 and an air intake chamber 2:

[0098] The upper cover plate 1 is fixedly connected to the upper part of the air intake chamber 2;

[0099] The upper cover plate 1 includes a first fluid channel 10, which runs from top to bottom through the middle of the upper cover plate 1 and is used to introduce a first gas into the air intake chamber 2.

[0100] The air intake chamber 2 includes a second fluid channel 20, which runs from top to bottom through the middle of the air intake chamber 2 and is connected to the first fluid channel 10.

[0101] The upper cover plate 1 has a plurality of air intake channels 11 on its side wall. The plurality of air intake channels 11 are distributed along the periphery of the upper cover plate 1. One end of the air intake channel 11 is located on the side wall of the upper cover plate 1, and the other end extends toward the center and is located inside the upper cover plate 1. The air intake channel 11 is used to introduce a second gas.

[0102] The upper cover plate 1 has several diversion grooves in its inner circumferential direction. The several diversion grooves form a ring layout relative to the circumferential direction of the upper cover plate 1, which is used to divert the second gas introduced into the air intake channel 11.

[0103] Each of the air intake channels 11 is connected to at least one of the flow dividers, and the second gas enters the second fluid channel 20 of the air intake cavity through the air intake channel 11 and the flow divider;

[0104] The second fluid channel 20 outputs a mixed gas formed by mixing the first gas and the second gas.

[0105] The diversion groove is an arc-shaped groove that is recessed upward from the lower surface of the upper cover plate 1 and extends circumferentially along the upper cover plate 1. Therefore, after the second gas enters the diversion groove along the radially arranged air intake channel 11, it will be diverted circumferentially and then enter the air intake cavity 2.

[0106] In this embodiment, the first gas is NF3 and the second gas is NH3.

[0107] Furthermore, the upper cover plate 1 is fastened to the air intake chamber 2.

[0108] like Figure 1 and Figure 2 As shown, the upper cover plate 1 includes an upper cover plate body portion 111 and an upper cover plate protrusion portion 112. The protrusion portion 112 protrudes outward from the outer periphery of the upper cover plate body portion 111, and the air intake channel 11 passes through the upper cover plate protrusion portion 112 along the radial direction of the upper cover plate 1.

[0109] At least a portion of the lower surface of the upper cover plate protrusion 112 is lower than the lower surface of the upper cover plate body portion 111. The upper cover plate protrusion 112 also has an abutting plane 113, which abuts against the flat section 221 when the upper cover plate 1 is fastened to the air intake cavity 2 (this technical feature will be described below).

[0110] The upper end face of the upper cover plate 1 is directly or indirectly fixedly connected to an upstream component, such as an RPS (Remote Plasma Source).

[0111] The upper cover plate 1 can be fastened to the upstream component with screws and sealed with an O-ring.

[0112] The lower end face of the air intake chamber 2 is directly or indirectly fixed to a downstream component, such as the cover assembly of the reaction chamber. In one embodiment, the reaction chamber is a cleaning chamber.

[0113] The intake chamber 2 and downstream components can be fastened with screws and sealed with O-rings.

[0114] Furthermore, the upper cover plate 1 is also provided with a channel for installing a temperature sensor.

[0115] It should be understood that this channel is fluidly isolated from the fluid channel described above, which includes structures such as the air intake channel and the flow divider. The temperature measuring end of the aforementioned temperature sensor is close to the aforementioned air intake channel or flow divider or other fluid channel to accurately reflect the fluid temperature.

[0116] Preferably, the temperature sensor is a thermocouple.

[0117] Figure 3 An isometric schematic diagram of an intake cavity according to an embodiment of the present invention is shown, as follows: Figure 2 and Figure 3 As shown, in the mixed air intake device proposed in this invention, the air intake chamber 2 includes an air intake chamber body 21 and an upper annular protrusion 22.

[0118] The upper annular protrusion 22 is fixedly connected to the upstream side of the air intake chamber body 21;

[0119] The air intake chamber body 21 is provided with a docking part 2111;

[0120] The docking portion 2111 protrudes from the upper surface of the upper annular protrusion 22;

[0121] The docking part 2111 is a circular structure, and its upper surface abuts against the upper cover plate 1;

[0122] Each air intake channel and the diversion groove that is in fluid communication with the air intake channel constitute an air intake path. The diversion groove is formed by the upper surface of the upper annular protrusion 22 or by the upper surface of the upper annular protrusion 22 and the outer peripheral wall of the docking part 2111 to form a closed air passage.

[0123] Furthermore, the upper surface of the docking part 2111 abuts against the annular groove 15 of the upper cover plate 1.

[0124] The annular groove 15 extends from the annular side of the first fluid channel 10 toward the center of the upper cover plate 1, and the cavity of the annular groove 15 extends downward through the lower surface of the upper cover plate body 111. As an important structural feature of the upper cover plate 1, the annular groove 15 utilizes the geometric characteristics of an annular shape to provide a stable support surface for the mating part 2111, and its specific shape and size ensure a tight fit and precise positioning between the two. Simultaneously, it can also be used as a sealing surface.

[0125] As the component that directly contacts the annular groove 15, the shape, size, and material selection of the mating part 2111 require strict consideration. During the manufacturing process, high-precision machining equipment and strict quality control procedures ensure the flatness and dimensional accuracy of the upper surface of the mating part 2111, enabling it to accurately abut against the annular groove 15.

[0126] In this embodiment, the upper cover plate 1 and the air intake cavity 2 are designed separately, which facilitates the formation of a flow divider during the processing to meet the corresponding air mixing function requirements.

[0127] like Figure 2 As shown, the air intake chamber body 21 includes a first body 211 and a second body 212:

[0128] The first body part 211 has a cylindrical structure;

[0129] The second body part 212 is a hollow frustum-shaped structure and is fixedly connected to the bottom of the first body part 211.

[0130] The first body part 211 and the second body part 212 can be either independent separate structures or integral molded structures.

[0131] The flared mouth design with a frustum-shaped structure is intended to slow down the flow rate and expand the cross-sectional area of ​​the gas, promoting uniform diffusion of the gas into a larger cross-sectional area.

[0132] A frustum is a geometric solid formed by rotating a right trapezoid around the line containing its leg perpendicular to the base, with the other sides forming curved surfaces. The axis of rotation is called the axis of the frustum. The circular surfaces formed by rotating the upper and lower bases of the right trapezoid are called the upper and lower bases of the frustum, and the curved surface formed by rotating the other leg is called the lateral surface of the frustum. In some embodiments, the upper base is also called the top surface.

[0133] The connection between the second body part 212 and the first body part 211 is the top surface (upper bottom surface) of a frustum, and the radius of the lower bottom surface of the second body part 212 is greater than that of the top surface.

[0134] In this embodiment, the second fluid channel 20 penetrates the portion of the first body part 211 and has the same shape as the first body part 211. The second fluid channel 20 penetrates the portion of the second body part 212 and has the same shape as the second body part 212. This means that the cross-sectional area of ​​the second fluid channel 20 gradually increases from the upper bottom surface to the lower bottom surface. The mixed gas continues to flow downward along the funnel-shaped channel with gradually increasing diameter, and finally enters the downstream component and the reaction chamber.

[0135] Furthermore, the air intake cavity 2 also includes a lower annular protrusion 23:

[0136] The lower annular protrusion 23 is fixedly connected to the downstream side of the intake chamber body 21.

[0137] Preferably, the lower end face of the air intake chamber body 21 is coplanar with the lower end face of the lower annular protrusion 23.

[0138] Furthermore, the upper annular protrusion 22 is fixedly connected to the outer periphery of the first body portion 211, and the lower annular protrusion 23 is fixedly connected to the downstream side of the second body portion 212.

[0139] Furthermore, such as Figure 3 As shown, the upper annular protrusion 22 has two opposing flat surfaces 221, which are used to engage with the abutting plane 113 mentioned above for positioning.

[0140] Furthermore, the docking portion 2111 is the part of the first body portion 211 that protrudes from the upper surface of the upper annular protrusion 22.

[0141] In the gas mixing device proposed in this invention, the layout of the air inlet channel and the diversion channel of the upper cover plate 1 exhibits a high degree of flexibility and diversity.

[0142] More specifically, the upper cover plate 1 proposed in this invention has a plurality of air intake channels 11 evenly distributed along the circumferential direction of the upper cover plate 1.

[0143] There is no limit to the number of air intake channels; they can be either odd or even.

[0144] By using multiple intake channels in the circumferential direction, compared with a single intake channel, the advantage is that it can cause gas to enter the intake cavity 2 from multiple angles along the circumferential direction at the same time, thereby significantly improving the uniformity of gas distribution in the circumferential direction and avoiding the generation of dead zones.

[0145] More specifically, inside the upper cover plate 1, several levels of diversion grooves are formed along several circumferences from the outside to the inside;

[0146] Different stages of the flow divider correspond to different circumferential radii;

[0147] The same level of distribution channels are arranged on the same circumference.

[0148] The different stages of the distribution channels can be arranged in a sequential stacked manner or in an alternating manner in order to achieve more effective uniform gas distribution.

[0149] More specifically, the interior of the upper cover plate 1 may also be provided with several levels of internal connecting channels 14:

[0150] The internal connecting channel of each stage is set between the corresponding two adjacent diversion channels to connect the gas between the two adjacent diversion channels.

[0151] There are multiple internal connecting channels at the same level. The internal connecting channels corresponding to the same air intake channel at the same level are symmetrically distributed with respect to the corresponding air intake channel, that is, they are symmetrically distributed with respect to the central axis of the air intake channel.

[0152] Furthermore, the docking part 2111 is provided with multiple external communication channels 2112:

[0153] The external communication channel 2112 connects the diversion groove corresponding to the intake air path with the intake cavity 2.

[0154] Furthermore, the external connecting channel 2112 connects the innermost diversion groove with the second fluid channel of the air intake cavity.

[0155] Correspondingly, the external communication channel 2112 of the docking part 2111 of the air intake cavity 2 also has multiple distribution configurations.

[0156] The various layout options for the air intake channel, the flow divider, and the internal and external connecting channels can be combined into a variety of different configurations to achieve the corresponding uniform gas distribution effect.

[0157] To more clearly illustrate the above features of the present invention, the following detailed description will be provided through specific embodiments.

[0158] Figure 4 for Figure 2 A schematic cross-sectional view of the mixing intake device along the AA direction of one embodiment is shown below. Figure 4 In the embodiment shown, two air intake channels 11 are radially opened on the side wall of the upper cover plate 1. The two air intake channels 11 are symmetrical along the circumference of the upper cover plate 1 and are arranged symmetrically with respect to each other around the center.

[0159] The second gas enters the upper cover plate 1 through the air intake channel 11.

[0160] The upper cover plate 1 has 6 diversion channels inside, namely 2 first-stage diversion channels 12 and 4 second-stage diversion channels 13;

[0161] Along the radial direction of the upper cover plate 1, the second-stage diversion channel 13 is located inside the first-stage diversion channel 12.

[0162] Two first-stage diversion channels 12 are arranged on the same circumference and are centrally symmetrically distributed along the center of the upper cover plate body 111.

[0163] Four secondary diversion channels 13 are arranged on the same circumference and are centrally symmetrically distributed along the center of the upper cover body 111.

[0164] Each intake channel 11 is connected to one first-stage diversion groove 12 and two second-stage diversion grooves 13 to form an intake air passage. The upper surface of the upper annular protrusion 22 and the outer peripheral wall of the docking part 2111 cooperate with the first-stage diversion groove 12 and the second-stage diversion groove 13 to form a sealed air passage.

[0165] Furthermore, a plurality of first-stage internal connecting channels 14 are provided between the first-stage diversion channel 12 and the second-stage diversion channel 13 to connect the gas between the first-stage diversion channel 12 and the second-stage diversion channel 13.

[0166] The second gas enters the first-stage diversion channel 12 through the intake channel 11, and then enters the second-stage diversion channel 13 through the first-stage internal connecting channel 14.

[0167] Multiple first-stage internal connecting channels 14 are symmetrically distributed relative to their corresponding intake channels 11.

[0168] In this embodiment, two air intake channels 11 are distributed on both sides of the upper cover plate 1, and the number of first-level internal connecting channels 14 corresponding to the air intake channels 11 on each side is 10; the first-level internal connecting channels 14 are divided into two groups of the same number, then each group has 5 first-level internal connecting channels 14, and the two groups of first-level internal connecting channels 14 are symmetrically distributed relative to the corresponding air intake channels 11.

[0169] In this embodiment, the docking part 2111 is provided with a plurality of external communication channels 2112, which connect the fluid to the second-stage diversion groove 13 located on the innermost side of the air intake channel 11 and the second fluid channel 20 of the air intake cavity 2.

[0170] In this embodiment, there are 6 external connecting channels 2112 corresponding to the air intake channel 11 on each side, and the external connecting channels 2112 on each side are divided into two groups of the same number, with 3 in each group.

[0171] The two sets of external connecting channels 2112 are symmetrically distributed relative to the corresponding air intake channels 11. Meanwhile, the air intake channels 11 are located in the middle of the first-stage diversion channel 12.

[0172] The first-stage internal connecting channels 14 corresponding to the two air intake channels 11 are also centrally symmetrically arranged along the center.

[0173] The external connecting channels 2112 corresponding to the two air intake channels 11 are also centrally symmetrically arranged along the center.

[0174] Optionally, the number of external connection channels 2112 can be 6, 8, 10, etc., to adapt to different needs.

[0175] Preferably, the multiple external connecting channels 2112 are evenly arranged in the circumferential direction, which helps to improve the gas mixing effect.

[0176] In one implementation, in the same split gas path, the total flow area of ​​multiple external connecting channels 2112 is smaller than the total flow area of ​​the last-stage internal connecting channel 14 located upstream, thereby further promoting the improvement of the gas mixing effect.

[0177] The split-flow path refers to all the gas flow channels corresponding to the intake channel after one split. Figure 4 In the dashed box shown, the air intake channel 11 enters all the gas flow channels in the dashed box after being diverted by the first-stage diversion channel 12, which is the diversion gas path.

[0178] like Figure 4 Within the dashed box shown, the total flow area of ​​the three external connecting channels 2112 is less than the total flow area of ​​the five first-level internal connecting channels 14 located upstream.

[0179] When multiple internal connecting channels exist, in at least one adjacent two-level internal connecting channels within the same split gas path, the total flow area of ​​the downstream internal connecting channels is smaller than the total flow area of ​​the upstream internal connecting channels, thereby further promoting the improvement of gas mixing effect.

[0180] In order to ensure that the flow path of the second gas through the inlet channel, the inner connecting channel, the diversion slot, and the outer connecting channel is consistent, and to make the gas diversion more uniform, in one embodiment, the number of the inner connecting channels of each stage corresponds to (i.e. equal to) the number of diversion slots of the downstream stage, and the inner connecting channels of each stage are located in the middle position of the diversion slots of the downstream stage.

[0181] Furthermore, there are two external connecting channels that connect to the same distribution channel, which are symmetrically distributed relative to the middle position of the corresponding distribution channel.

[0182] To illustrate the above technical solution, for example, in another embodiment of the present invention, two air intake channels 11 are symmetrically distributed on the periphery of the upper cover plate 1. The number of second-stage diversion grooves 13 of each side air intake channel 11 is 2, and the number of corresponding first-stage internal connecting channels 14 is 2. The two first-stage internal connecting channels 14 are symmetrical with respect to the air intake channels 11, and each first-stage internal connecting channel 14 is located in the middle position of the corresponding second-stage diversion groove 13.

[0183] Specifically, two first-stage internal communication channels 14 are respectively connected to the two ends of the first-stage diversion channel 12 in the circumferential direction. The first-stage internal communication channels 14 extend radially along the upper cover plate 1 (it should be understood that, in this application, the radial direction of the upper cover plate 1 refers to the radial direction of the upper cover plate body portion 111).

[0184] Furthermore, there are two external connecting channels 2112 that connect to the same second-level diversion channel 13, which are symmetrically distributed relative to the middle position of the corresponding second-level diversion channel 13.

[0185] Thus, each first-level internal connecting channel 14 corresponds to two external connecting channels 2112. The second-level diversion channel 13, which is connected to the first-level internal connecting channel 14, is symmetrical about the first-level internal connecting channel 14 (that is, axially symmetrical about the first-level internal connecting channel 14). The two external connecting channels 2112 are also symmetrical with respect to the first-level internal connecting channel 14, thereby making the fluid flow path consistent and thus making the gas diversion more uniform.

[0186] Specifically, two external connecting channels 2112 are respectively connected to the two ends of the second-stage flow divider 13 in the circumferential direction. The external connecting channels 2112 extend radially along the intake chamber 2.

[0187] Furthermore, multiple external connecting channels 2112 are evenly distributed along the circumference. This arrangement allows the fluid reaching the second flow channel 20 to be more evenly distributed within the second fluid channel 20.

[0188] Figure 5 for Figure 2 A cross-sectional structural schematic diagram of the mixing intake device of another embodiment shown at position AA, as follows: Figure 5 In the embodiment shown, the number of air intake channels 11 radially opened on the side wall of the upper cover plate 1 is 4, and they are evenly distributed along the circumferential direction.

[0189] Each air intake channel 11 is connected to a first-stage diversion groove 12. The upper surface of the upper annular protrusion 22 and the outer peripheral wall of the docking part 2111 cooperate with the first-stage diversion groove 12 to form an air intake path.

[0190] In this embodiment, the docking part 2111 is provided with a plurality of external communication channels 2112, which connect the first-stage diversion groove 12 of the air intake channel 11 with the second fluid channel 20 of the air intake cavity 2.

[0191] Preferably, the multiple external connecting channels 2112 are evenly arranged in the circumferential direction, which helps to improve the circumferential uniformity of the gas in the second fluid channel 20.

[0192] In this embodiment, only the first-stage diversion channel 12 is provided in the upper cover plate 1, and the second-stage diversion channel 13 is no longer provided, thereby simplifying the structure and improving the simplicity of the overall design.

[0193] In some embodiments, the number of external connecting channels 2112 connecting the same first-stage diversion channel 12 is two (different from...). Figure 5 The three channels (3 in the middle) are symmetrically distributed relative to the middle position of the corresponding first-stage diversion channel 12. The second gas flows through the intake channel 11, the first-stage diversion channel 12 and the external connecting channel 2112 in the same way, which can make the gas diversion more uniform.

[0194] Figure 6 A cross-sectional schematic diagram of a mixing intake device according to an embodiment of the present invention is shown, such as... Figure 6 As shown, the intake chamber 2 outputs a mixed gas formed by mixing the first gas and the second gas.

[0195] In order to further mix the first gas and the second gas evenly in the inlet chamber 2, the inlet chamber 2 of the gas mixing device proposed in this invention may also be provided with a first flow equalizer 214 and / or a second flow equalizer 215.

[0196] Figure 7a A cross-sectional schematic diagram of a mixing intake device according to another embodiment of the present invention is shown. Figure 7b A top view of a first flow equalization plate according to yet another embodiment of the present invention is disclosed, as shown below. Figure 7a In the embodiment shown, the air intake chamber body 21 further includes a first flow equalizer 214:

[0197] The first flow equalization plate 214 is disposed between the first body part 211 and the second body part 212.

[0198] like Figure 7b As shown, the first flow equalization plate 214 is provided with a plurality of flow equalization holes.

[0199] When the first gas encounters the first flow uniform plate 214, its flow velocity decreases and its distribution becomes more uniform, providing more favorable mixing conditions for the second gas entering from the side. Against the backdrop of the low-velocity and uniform first gas, the second gas can more easily penetrate, diffuse, and interact with the first gas, thereby achieving a more thorough and uniform mixture.

[0200] Figure 8a A cross-sectional schematic diagram of a mixing intake device according to another embodiment of the present invention is shown. Figure 8b A top view of a second flow equalizer according to yet another embodiment of the present invention is disclosed, as shown below. Figure 8a In the illustrated embodiment, the intake chamber body 21 further includes a third body 213 and a second flow equalizer 215.

[0201] The third body part 213 is a cylindrical structure and is fixedly connected to the bottom of the second body part 212;

[0202] Similarly, the third body part 213 and the second body part 212 can be either independent structures fixed together or integral molded structures.

[0203] In this embodiment, the lower annular protrusion 23 is fixedly connected to the outer periphery of the third body portion 213.

[0204] The second flow equalization plate 215 is disposed inside the third body part 213.

[0205] like Figure 8b As shown, the second flow equalization plate 215 is provided with a plurality of flow equalization holes.

[0206] Furthermore, in this embodiment, the flow equalization holes of the first flow equalization plate 214 or the second flow equalization plate 215 are inclined at a certain angle to the central axis of the air inlet cavity body. Preferably, when viewed from top to bottom, the angle is inclined outward, which helps the gas to diffuse to a larger cross-sectional area, thereby achieving a more uniform gas distribution.

[0207] In other embodiments, the flow-regulating hole may also be arranged vertically downwards.

[0208] Based on the above-described mixing and inlet device, the present invention provides a semiconductor manufacturing apparatus, comprising at least a reaction chamber and the above-described mixing and inlet device:

[0209] The lower end of the mixing air intake device is fixed to the reaction chamber;

[0210] In one embodiment, the reaction chamber is a pre-cleaning chamber.

[0211] Furthermore, the semiconductor manufacturing equipment also includes a remote plasma source, with the upper end of the mixing air intake device fixed to the remote plasma source.

[0212] Since the specific structure of the mixing air intake device has been described in detail previously, the content related to the mixing air intake device in the semiconductor manufacturing equipment proposed in this invention will not be repeated here.

[0213] Verification using flow field simulation technology shows that the mixing intake device and semiconductor manufacturing equipment proposed in this invention improve the mixing uniformity by about 15% compared to related equipment in the prior art.

[0214] In addition, the surface quality of the processed wafer was tested using specialized measurement equipment. The results showed that after using the mixed air intake device disclosed in this patent, the oxide film and impurities on the wafer surface could be removed more uniformly, thus providing a strong prerequisite for the subsequent EPI process.

[0215] The mixed gas inlet device proposed in this invention can be used in pre-cleaning equipment (including the pre-cleaning chamber mentioned above), which can ensure that the two process gases achieve a uniform and thorough mixing effect in the device, thereby ensuring the uniformity and efficiency of the pre-cleaning effect on the wafer surface.

[0216] As indicated in this application and claims, unless the context clearly indicates otherwise, the words "a," "an," "an," and / or "the" are not specifically singular and may include plural forms. Generally speaking, the terms "comprising" and "including" only indicate the inclusion of explicitly identified steps and elements, which do not constitute an exclusive list, and the method or apparatus may also include other steps or elements.

[0217] In the description of this invention, it should be noted that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0218] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0219] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0220] Other embodiments of the invention will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of the invention that follow the general principles of the invention and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of the invention are indicated by the following claims.

[0221] The above embodiments are provided for those skilled in the art to implement or use the present invention. Those skilled in the art can make various modifications or changes to the above embodiments without departing from the inventive concept of the present invention. Therefore, the protection scope of the present invention is not limited to the above embodiments, but should be the maximum scope that conforms to the innovative features mentioned in the claims.

Claims

1. A mixing air intake device, characterized in that, Including the top cover and air intake chamber: The upper cover plate is fixedly connected to the upper part of the air intake cavity; The upper cover plate includes a first fluid channel that extends from top to bottom through the middle of the upper cover plate and is used to introduce a first gas into the air intake chamber. The air intake cavity includes a second fluid channel, which runs from top to bottom through the middle of the air intake cavity and is connected to the first fluid channel. The upper cover plate has several air intake channels on its side wall. The air intake channels are distributed along the periphery of the upper cover plate. One end of each air intake channel is located on the side wall, and the other end of each air intake channel extends towards the center and is located inside the upper cover plate. The air intake channels are used to introduce a second gas. The upper cover plate has several diversion grooves in its inner circumferential direction. The several diversion grooves form a ring layout relative to the circumference of the upper cover plate, which is used to divert the second gas introduced into the air intake channel. Each of the air intake channels is connected to at least one of the flow dividers, and the second gas enters the second fluid channel of the air intake cavity through the air intake channel and the flow divider; The second fluid channel outputs the mixed gas formed by mixing the first gas and the second gas.

2. The mixing intake device according to claim 1, characterized in that, The plurality of diversion channels include a plurality of stages of diversion channels opened along a plurality of circumferential directions: Different levels of flow dividers correspond to different circumferential radii, while flow dividers of the same level are arranged on the same circumference; The upper cover plate also has several levels of internal connecting channels: The internal connecting channel of each stage is set between the corresponding two adjacent stages of the diversion channel to connect the gas between the two adjacent stages of the diversion channel.

3. The mixing intake device according to claim 2, characterized in that, In the same level of internal communication channels, the internal communication channels corresponding to the same air intake channel are symmetrically distributed with respect to the corresponding air intake channel; The plurality of air intake channels are evenly distributed along the circumference of the upper cover plate.

4. The mixing intake device according to claim 3, characterized in that, The number of internal connecting channels at each level corresponds to the number of diversion channels at the downstream level; The internal connecting channel of each stage is located in the middle of the diversion channel of the downstream stage.

5. The mixing intake device according to claim 2, characterized in that, The air intake cavity includes an air intake cavity body and an upper annular protrusion: The upper annular protrusion is fixedly connected to the upstream side of the air intake chamber body. The air intake chamber body is provided with a docking part, which protrudes from the upper surface of the upper annular protrusion. The docking part is provided with multiple external communication channels, which connect the innermost diversion groove to the second fluid channel of the air intake cavity; The upper surface of the docking part abuts against the upper cover plate; Each of the air intake channels and the diversion groove in fluid communication with the air intake channel constitute an air intake path; the diversion groove is formed by the upper surface of the upper annular protrusion or by the upper surface of the upper annular protrusion and the outer peripheral wall of the docking part.

6. The mixing intake device according to claim 5, characterized in that, There are two external connecting channels that connect to the same distribution channel, which are symmetrically distributed relative to the middle position of the corresponding distribution channel.

7. The mixing intake device according to claim 5, characterized in that, Within the same branch gas path, the total flow area of ​​the multiple external connecting channels is smaller than the total flow area of ​​the last internal connecting channel located upstream; and / or In at least one adjacent two-stage internal connecting channel within the same branch gas path, the total flow area of ​​multiple internal connecting channels at the downstream stage is less than the total flow area of ​​the internal connecting channels at the upstream stage.

8. The mixing intake device according to claim 5, characterized in that, The air intake chamber body includes a first body part and a second body part: The first body part is a cylindrical structure; The upper annular protrusion is fixedly connected to the outer periphery of the first body portion; The docking portion is disposed on the upper part of the first body portion; The second body part is fixedly connected to the bottom of the first body part; The second body part is a hollow frustum-shaped structure, and the top surface of the second body part is connected to the first body part.

9. The mixing intake device according to claim 8, characterized in that, The intake chamber body also includes several flow equalizers: The flow equalizer plate is provided with multiple flow equalizer holes; The plurality of flow equalization plates are respectively disposed inside the air intake chamber body.

10. The mixing intake device according to claim 9, characterized in that, The plurality of flow equalizers includes a first flow equalizer: The first flow equalizer is disposed between the first body part and the second body part; And / or, The air intake chamber body also includes a cylindrical third body, and the plurality of flow equalizers include a second flow equalizer. The third body is fixedly connected to the bottom of the second body, and the second flow equalizer is disposed inside the third body.

11. The mixing intake device according to claim 9, characterized in that, The uniform flow hole forms a certain inclined angle with the central axis of the air intake chamber body.

12. A semiconductor manufacturing apparatus, characterized in that, Includes a mixing intake device as described in any one of claims 1 to 11; The semiconductor manufacturing equipment includes a reaction chamber, and the lower end of the mixing inlet device is fixedly connected to the reaction chamber; and / or The semiconductor manufacturing equipment includes a remote plasma source, and the upper end of the mixing air intake device is fixedly connected to the remote plasma source.

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