Photoresist waste liquid recovery processing device and process

By combining a liquid collection module, a pretreatment module, a deep purification module, and a residue treatment module, the problem of high-value solvents in photoresist waste liquid cannot be recovered, achieving full resource recovery and environmentally harmless treatment, and reducing processing costs and risks.

CN122144967APending Publication Date: 2026-06-05ZHEJIANG ICSPROUT SEMICONDUCTOR CO LTD
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Patent Information

Application Number
CN202610481460.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-04-13
Publication Date
2026-06-05

AI Technical Summary

Technical Problem

In existing technologies, high-value recyclable solvents in photoresist waste liquid cannot be directly recycled, resulting in resource waste and economic losses. At the same time, existing treatment processes are difficult to completely separate highly corrosive substances, leading to environmental pollution and high equipment maintenance costs.

Method used

A photoresist waste liquid recycling and treatment device was designed, including a liquid collection module, a pretreatment module, a deep purification module, and a residue treatment module. Through steps such as acid precipitation, heavy metal capture, adsorption tower, and multi-stage vacuum distillation, the device achieves the recovery of high-value solvents and the harmless treatment of pollutants.

Benefits of technology

It achieves zero discharge and full resource recovery of photoresist waste liquid, significantly reducing treatment costs and environmental risks, with a recovery rate of over 95%.

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Abstract

According to the photoresist waste liquid recovery treatment device and process provided by the invention, hydrochloric acid is added into the photoresist waste liquid in the acidification sedimentation tank in the pretreatment module to adjust the pH value, so that the precipitation rate of linear phenolic resin reaches 95% or above, and the linear phenolic resin can be reused in the production stage of photoresist after being centrifugally separated; a compound coagulant containing sulfide and polyaluminum chloride is added into a heavy metal capturing pool in the pretreatment module, and the heavy metal ion removal rate of 99.5% is achieved; the method comprises the following steps: firstly, preparing photoresist waste liquid, then separating photoresist fragments by adopting an ultrafiltration device, carrying out adsorption decoloration by utilizing diatomite modified by NaOH and polyetherimide, then recycling a high-purity solvent in the photoresist waste liquid through a two-stage reduced pressure distillation process, and finally, polymerizing and curing residual residues through ultraviolet radiation to prepare solid fuel with a high calorific value. Therefore, zero emission of the photoresist waste liquid and full resource recovery are realized, and the treatment cost and the environmental risk are remarkably reduced.
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