Artwork differentiation processing method and system based on cultural area

Abstract

The application relates to the technical field of differential processing control, and particularly discloses an artistic product differential processing method and system based on a cultural area, which comprises the following steps: obtaining a cultural sample of a target cultural area, extracting cultural elements in the cultural sample, and creating a pattern library according to the cultural elements; any pattern in the pattern library is split into pattern units, and each pattern unit is expressed as a parameter set corresponding to the processing parameters of a processing device; the pattern library is rearranged based on the parameter set, and a processing control instruction is generated based on the rearranged pattern library; the cultural sample is obtained, the pattern library is constructed based on the cultural sample, the processing parameters corresponding to each pattern in the pattern library are synchronously determined, the processing parameters are compared, the patterns in the pattern library are rearranged, and the processing sequence is determined; a plurality of patterns can be processed under the condition of small changes, the efficiency is high, and the degree of differentiation of artistic products is greatly improved.

Description

Technical Field

[0001] This invention relates to the field of differentiated processing control technology, specifically a method and system for differentiated processing of artworks based on cultural regions. Background Technology

[0002] Against the backdrop of the rapid development of the cultural and creative industries, how to effectively transform regional cultural resources into competitive art products has become a focus of industry attention. Currently, there are many technical bottlenecks in the development of cultural artworks. In terms of extracting cultural elements, existing methods are often limited to the simple replication of superficial symbols, resulting in fragmented and homogenized cultural connotations of products. With the development of AI, this problem is gradually being improved, leading to an increasing variety of innovative patterns generated based on cultural content. In other words, the design stage can actually be completed by computer equipment. However, some minor problems still exist in the actual application of design content. These minor problems are mainly at the production and manufacturing level. When producing artworks, even with multiple innovative patterns, traditional production equipment is difficult to apply to artworks. How to provide a specific production framework from innovative patterns to artworks to reduce the homogenization of artworks is the technical problem that this invention aims to solve. Summary of the Invention

[0003] The purpose of this invention is to provide a method and system for differentiated processing of artworks based on cultural regions, so as to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: A method and system for differentiated processing of artworks based on cultural regions, the method comprising: Obtain cultural samples from the target cultural region, extract cultural elements from the cultural samples, and create a pattern library based on the cultural elements. For any pattern in the pattern library, it is broken down into pattern units, and each pattern unit is represented as a set of parameters corresponding to the processing parameters of the processing equipment. Based on the capability constraints of the processing equipment, the parameter set is randomly updated a preset number of times, and the pattern unit corresponding to the randomly updated parameter set is determined synchronously and in reverse to obtain the extended pattern corresponding to the original pattern. The extended patterns are filtered based on the pattern library. Once the filtered pattern passes the filter, it is inserted into the pattern library. For a pattern library containing extended patterns, the pattern library is rearranged based on the parameter set, and processing control instructions are generated based on the rearranged pattern library; In the screening and rearrangement processes, the similarity obtained from the pattern comparison process is used as the execution control parameter.

[0005] As a further aspect of the present invention: the steps of obtaining cultural samples of the target cultural region, extracting cultural elements from the cultural samples, and creating a pattern library based on the cultural elements include: Information on material remains, traditional crafts, and cultural narratives of the target cultural region is acquired; the data structure of the material remains, traditional crafts, and cultural narratives is text, audio, and images; Content extraction is performed on material remains, traditional techniques, and humanistic narratives to obtain cultural elements; the data structure of these cultural elements consists of text and images. Based on a preset conversion path, the cultural elements are converted into patterns and sent to the verification terminal; Receive verification information from the verification end, count the patterns that have passed verification, and build a pattern library.

[0006] As a further aspect of the present invention: the step of dividing any pattern in the pattern library into pattern units and representing each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment includes: Patterns are read sequentially from the pattern library, identified, and their constituent units and positional information are determined as pattern units. The pattern unit is parameterized to obtain the numerical information of the image unit; Based on the pattern unit, the corresponding processing parameters are located in the processing equipment. Based on the numerical information, the parameter values ​​of the processing parameters are determined, and the parameter set corresponding to the pattern unit is obtained. The pattern unit includes at least lines and geometric prototypes; the numerical information is as follows: when the pattern unit is a line, the curve is expressed in the form of a function, and the geometric prototype is expressed in the form of a set of vertex coordinates.

[0007] As a further aspect of the present invention: the step of randomly updating the parameter set a preset number of times based on the capability constraints of the processing equipment, and synchronously and inversely determining the pattern unit corresponding to the randomly updated parameter set to obtain the extended pattern corresponding to the original pattern includes: Obtain the boundary conditions of each processing parameter of the processing equipment as capability constraints; For the parameter set, query the capability constraints of each parameter in the parameter set, and randomly determine the number of parameters to be updated and the amount of updated parameters within the capability constraints; Execute the loop a preset number of times to obtain an updated set of parameters for the preset number of iterations. The corresponding pattern unit and its position information are determined in reverse based on the updated parameter set, and the pattern unit is statistically analyzed based on the position information to obtain the extended pattern.

[0008] As a further aspect of the present invention: the step of filtering extended patterns based on a pattern library, and inserting the extended pattern into the pattern library after the filtering is successful, includes: The pattern library is traversed based on extended patterns; the traversal process is a pattern comparison process, and the output of the pattern similarity obtained from the comparison is the matching degree. When the matching degree reaches the preset matching degree threshold, it is determined that the screening is passed and the extended pattern is inserted into the pattern library.

[0009] As a further aspect of the present invention: the step of rearranging the pattern library containing extended patterns based on a parameter set, and generating processing control instructions based on the rearranged pattern library includes: For a pattern library containing extended patterns, pair the patterns in the pattern library together. By comparing the parameter sets of the paired patterns, the pattern similarity is obtained; A pattern is randomly selected from the pattern library as the initial pattern, and the pattern with the highest similarity to the initial pattern is selected as the next pattern. The next pattern is used as the reference pattern. The pattern with the highest similarity to the reference pattern is selected as the next pattern. This process is repeated to rearrange the pattern library. Read the parameter set corresponding to each pattern in the rearranged pattern library, and generate processing control instructions based on the parameter set.

[0010] The present invention also provides a system for differentiated processing of artworks based on cultural regions, the system comprising: The pattern library creation module is used to acquire cultural samples of the target cultural region, extract cultural elements from the cultural samples, and create a pattern library based on the cultural elements. The parameter set mapping module is used to break down any pattern in the pattern library into pattern units and represent each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment. The extended pattern generation module is used to randomly update the parameter set a preset number of times based on the capability constraints of the processing equipment, and synchronously reverse-determine the pattern unit corresponding to the randomly updated parameter set to obtain the extended pattern corresponding to the original pattern. The pattern library update module is used to filter extended patterns based on the pattern library. Once the pattern passes the filter, it is inserted into the pattern library. The control instruction generation module is used to rearrange the pattern library containing extended patterns based on the parameter set, and generate processing control instructions based on the rearranged pattern library. In the screening and rearrangement processes, the similarity obtained from the pattern comparison process is used as the execution control parameter.

[0011] As a further aspect of the present invention: the pattern library creation module includes: The information acquisition unit is used to acquire information on material remains, traditional techniques, and humanistic narratives of the target cultural area; the data structure of the material remains, traditional techniques, and humanistic narratives is text, audio, and images; The content extraction unit is used to extract content from material remains information, traditional craft information, and humanistic narrative information to obtain cultural elements; the data structure of the cultural elements is text and images. The pattern conversion unit is used to convert the cultural elements into patterns based on a preset conversion path and send them to the verification terminal. The verification statistics unit is used to receive verification information from the verification end, count the patterns that have passed verification, and build a pattern library.

[0012] As a further aspect of the present invention: the parameter set mapping module includes: The pattern unit generation unit is used to sequentially read patterns from the pattern library, identify the patterns, determine the constituent units of the patterns and their position information, and use them as pattern units. The parameterized representation unit is used to parameterize the pattern unit and obtain the numerical information of the image unit. The parameter value determination unit is used to locate the corresponding processing parameters in the processing equipment based on the pattern unit, determine the parameter values ​​of the processing parameters based on numerical information, and obtain the parameter set corresponding to the pattern unit. The pattern unit includes at least lines and geometric prototypes; the numerical information is as follows: when the pattern unit is a line, the curve is expressed in the form of a function, and the geometric prototype is expressed in the form of a set of vertex coordinates.

[0013] As a further aspect of the present invention: the extended pattern generation module includes: The capability constraint determination unit is used to obtain the boundary conditions of each processing parameter of the processing equipment as capability constraints. The random update unit is used to query the capability constraints of each parameter in the parameter set, and randomly determine the number and quantity of updated parameters within the capability constraints. The loop execution unit is used to execute the loop a preset number of times to obtain an updated set of parameters for the preset number of times. The data statistics unit is used to reversely determine the corresponding pattern unit and its position information based on the updated parameter set, and to obtain the extended pattern based on the position information to count the pattern units.

[0014] Compared with the prior art, the beneficial effects of the present invention are: This invention obtains cultural samples, constructs a pattern library based on the cultural samples, simultaneously determines the processing parameters corresponding to each pattern in the pattern library, compares the processing parameters, rearranges the patterns in the pattern library, determines the processing order, and processes the pattern library based on the processing order. This allows for the processing of multiple patterns with minimal changes, achieving high efficiency while greatly improving the differentiation of artworks. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention.

[0016] Figure 1 The flowchart illustrates the overall process of differentiating artworks based on cultural regions.

[0017] Figure 2 A structural diagram of an art differentiation processing system based on a cultural district is shown. Detailed Implementation

[0018] To make the technical problems to be solved, the technical solutions, and the beneficial effects of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and are not intended to limit the present invention.

[0019] Figure 1 As shown in the overall flowchart of the method and system for differentiated processing of artworks based on cultural districts, in this embodiment of the invention, a method for differentiated processing of artworks based on cultural districts includes: Step S100: Obtain cultural samples of the target cultural area, extract cultural elements from the cultural samples, and create a pattern library based on the cultural elements; The target cultural region is a specific area where artworks need to be produced. These artworks must conform to the characteristics of that region and reference its cultural content, referred to as cultural samples. Information is extracted from these cultural samples to obtain cultural elements, which are then used to create a pattern library. In this process, cultural samples are multi-source data and need to be manually pre-collected and stored in a library. For the implementer of this method, it is only necessary to read data from the library, which is assumed to contain known data. Cultural elements refer to keywords or image units extracted from cultural samples. These image units may be patterns, etc. Using cultural elements as a benchmark, existing automatic pattern design schemes are introduced to obtain the pattern library. Automatic pattern design schemes are very common in existing technologies. Inputting a text will output a design drawing, and inputting an image unit will output a design drawing. Various AI services provided by various entities have similar functions, not to mention professional image generation service providers. Therefore, this part will not be elaborated further.

[0020] Specifically, the process of constructing a cultural sample database (not part of the technical solution of this invention, which assumes the database has already been constructed) can be as follows: A professional cultural research team is organized to conduct a comprehensive and in-depth collection of the cultural area's material remains, intangible cultural heritage, historical anecdotes, folk tales, and regional features through methods such as field investigations, literature reviews, and oral history interviews. For example, for a cultural area renowned for its ceramic craftsmanship, information such as the shapes, decorations, glazes, firing tools, clay sources, and artisan stories of its traditional ceramics can be collected. This collected raw material is then organized, classified, and digitally stored to form a readily searchable and accessible resource database. The establishment of this database provides a solid foundation for subsequent creative transformation, preventing product designs from becoming superficial or detached from their cultural roots.

[0021] Step S200: For any pattern in the pattern library, split it into pattern units, and represent each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment; For any pattern in the pattern library, the pattern is identified to obtain pattern units. This process uses image segmentation algorithms, which generally extract the constituent units of the pattern. The simplest way is to divide the pattern into multiple components according to the connectivity relationship, thereby dividing the pattern into multiple units. In existing automated processing equipment, each part of the pattern unit corresponds to a pose of the processing equipment, and each pose corresponds to a processing parameter. By statistically analyzing the processing parameters corresponding to each part, the parameter set corresponding to the pattern unit is obtained.

[0022] Step S300: Based on the capability constraints of the processing equipment, the parameter set is randomly updated a preset number of times, and the pattern unit corresponding to the randomly updated parameter set is determined synchronously in reverse to obtain the extended pattern corresponding to the original pattern; Each processing parameter of the processing equipment has a corresponding boundary condition, such as the maximum movement distance in a certain direction. These are collectively called capability constraints. Within the capability constraints, the processing parameters are updated to obtain new processing parameters. The new processing parameters correspond to new poses, and the new poses correspond to new pattern units. Thus, an extended pattern corresponding to the original pattern is obtained. This is the pattern extension process from the perspective of the processing equipment.

[0023] Step S400: Filter the extended patterns based on the pattern library. Once the pattern passes the filter, insert the extended pattern into the pattern library. The process of generating extended patterns is random. It only requires randomly determining the processing parameters within the capability constraints. There are many ways to extend patterns, which may result in invalid extended patterns. Therefore, screening is necessary. The screening method is to screen extended patterns based on a pattern library. When an extended pattern is sufficiently similar to one or more patterns in the pattern library, it is considered to be a pattern that conforms to the cultural characteristics of the target cultural region. Only then will it be inserted into the pattern library.

[0024] Step S500: For the pattern library containing extended patterns, rearrange the pattern library based on the parameter set, and generate processing control instructions based on the rearranged pattern library; After the pattern library is expanded, the number of patterns becomes very large. Pairwise comparisons are performed on the patterns in the library, specifically comparing the parameter sets of two patterns. This process can determine the extent to which the processing parameters need to be changed when processing one pattern to process another pattern. Based on the pattern similarity, the patterns in the pattern library are rearranged. By continuously changing the processing parameters according to the rearranged order, different patterns can be obtained, and the changes to the processing parameters are gradual.

[0025] As can be seen from the above, the similarity obtained from the pattern comparison process is used as the execution control parameter in both the screening and rearrangement processes.

[0026] Furthermore, the overall process of the technical solution of this invention is described as follows: In the mass production of artworks, the main focus is on the surface patterns. First, a pattern library defined by cultural elements of a cultural region is constructed. Lines or elements in the pattern library are then updated and replaced within the range achievable by the processing equipment. For example, a module for drawing curves can randomly determine different curvatures; the maximum adjustment range is the update range. Alternatively, a circular module can be replaced with a polygonal module, and the update range is determined by the processing equipment. For the updated pattern, it is determined whether it is included in the pattern library. "Included" means whether it is similar to an existing pattern in the library. If similar, it is inserted into the pattern library to expand it. Then, for the expanded pattern library, an initial pattern is randomly selected or preset, and the closest pattern is found as the next pattern. This next pattern is then used as a reference pattern to check the next most similar pattern, thus sorting the pattern library.

[0027] In actual processing, the changes in the processing equipment are determined based on the rearranged pattern library, and automated processing is performed. When processing the last pattern, the processing is reversed. The changes in the processing equipment during this process are very small, and the operation is not complicated. The number of processed products is greater. However, despite the small changes, adjustment time is still required. When the processing volume is large, the efficiency is very low. It is only suitable for processing artworks, so that each artwork has only a few duplicates. For example, if there are 10,000 artworks and the pattern library has 2,000 patterns, then each pattern can only correspond to five pieces. Compared with the traditional 10,000 identical artworks, the homogeneity is significantly reduced. On the other hand, if 2,000 different devices are used to process each piece five times, the cost is actually higher. Therefore, the technical solution of this invention is suitable for some products that require differentiation, such as artworks.

[0028] Regarding step S100, the steps of obtaining cultural samples of the target cultural region, extracting cultural elements from the cultural samples, and creating a pattern library based on the cultural elements include: Information on material remains, traditional crafts, and cultural narratives of the target cultural region is acquired; the data structure of the material remains, traditional crafts, and cultural narratives is text, audio, and images; Content extraction is performed on material remains, traditional techniques, and humanistic narratives to obtain cultural elements; the data structure of these cultural elements consists of text and images. Based on a preset conversion path, the cultural elements are converted into patterns and sent to the verification terminal; Receive verification information from the verification end, count the patterns that have passed verification, and build a pattern library.

[0029] The target cultural area is a region where information on material remains, traditional crafts, and humanistic narratives is stored in a pre-defined database, which is continuously updated. For the purposes of this invention, this database is considered known data. The material remains, traditional crafts, and humanistic narratives within this database are multi-source data, stored as text, audio, and images. By retrieving the material remains, traditional crafts, and humanistic narratives from the database and applying existing keyword extraction techniques (including those for text, images, and audio), keywords or key image features, termed cultural elements, can be extracted. The data structure of these cultural elements consists of text and images. Based on this, the cultural elements are converted into patterns according to a pre-defined transformation path and sent to a verification terminal. The verification terminal can be a human or an AI-powered terminal, requiring only recognition and verification capabilities. For the entity executing this method, only data interaction with the verification terminal is required.

[0030] Furthermore, regarding the transformation path, in terms of transformation path design, designers, artists, and cultural scholars can participate together to explore various possibilities of integrating cultural elements into artwork design based on the characteristics of cultural genes and market demands. For example, one could consider abstracting a certain traditional pattern or transforming the form of a certain traditional tool into structural elements of modern daily necessities. This process can be similar to converting text into patterns, which has already been mentioned above and is a basic function of intelligent image generation software.

[0031] Regarding step S200, the step of splitting any pattern in the pattern library into pattern units and representing each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment includes: Patterns are read sequentially from the pattern library, identified, and their constituent units and positional information are determined as pattern units. The pattern unit is parameterized to obtain the numerical information of the image unit; Based on the pattern unit, the corresponding processing parameters are located in the processing equipment. Based on the numerical information, the parameter values ​​of the processing parameters are determined, and the parameter set corresponding to the pattern unit is obtained. The pattern unit includes at least lines and geometric prototypes; the numerical information is as follows: when the pattern unit is a line, the curve is expressed in the form of a function, and the geometric prototype is expressed in the form of a set of vertex coordinates.

[0032] In one example of the technical solution of this invention, patterns are sequentially read from a pattern library, identified, and their constituent units and positional information are determined as pattern units. Since the pattern itself is an image, pixel analysis is performed to extract connected contours, which then serve as pattern units. If the pattern itself contains color, a tolerance can be set; this process is analogous to the magic wand tool in Photoshop and is not complex. The pattern units are parameterized to obtain numerical information about the image units. Based on the pattern units, corresponding processing parameters are located in the processing equipment. The parameter values ​​of the processing parameters are determined based on the numerical information, resulting in a parameter set corresponding to the pattern unit. The pattern unit includes at least lines and geometric prototypes. The numerical information is as follows: when the pattern unit is a line, the curve is expressed as a function, and the geometric prototype is expressed as a set of vertex coordinates.

[0033] In the above content, the parameterization process of pattern unit is to convert the elements in the image into numerical form. In fact, it can also be converted into a coordinate set, but in the form of a function, which is equivalent to a vector line. Each coordinate corresponds to a pose parameter of a processing device, and the coordinate set corresponds to a sequence of pose parameters, which is called a parameter set. Regarding step S300, the step of randomly updating the parameter set a preset number of times based on the capability constraints of the processing equipment, and synchronously and inversely determining the pattern unit corresponding to the randomly updated parameter set to obtain the extended pattern corresponding to the original pattern includes: Obtain the boundary conditions of each processing parameter of the processing equipment as capability constraints; For the parameter set, query the capability constraints of each parameter in the parameter set, and randomly determine the number of parameters to be updated and the amount of updated parameters within the capability constraints; Execute the loop a preset number of times to obtain an updated set of parameters for the preset number of iterations. The corresponding pattern unit and its position information are determined in reverse based on the updated parameter set, and the pattern unit is statistically analyzed based on the position information to obtain the extended pattern.

[0034] The above describes the expansion process. The boundary conditions of each processing parameter of the processing equipment are obtained as capability constraints. These capability constraints are parameter ranges. For the parameter set, the capability constraints of each parameter in the parameter set are queried. Within the capability constraint range, the number and quantity of updated parameters are randomly determined. Two values ​​are randomly determined: one is which parameter is randomly determined, and the other is how many parameters need to be randomly determined for that parameter. This random process is repeated until a preset number of times, resulting in a preset number of updated parameter sets. The parameter set is the pose parameter sequence. The pose parameters correspond one-to-one with the positions in the pattern. Therefore, the pose parameter sequence actually corresponds to a pattern, meaning what kind of pattern can be obtained based on the new parameter set. Since a parameter set corresponds to a pattern unit, the pattern units are combined based on the position information of the original pattern units to obtain the expanded pattern.

[0035] It is worth mentioning that a pattern can be directly regarded as a pattern unit. In this case, the pattern and the pattern unit correspond to the same subject in the above scheme, which simplifies the whole scheme a lot.

[0036] Regarding step S400, the step of filtering extended patterns based on the pattern library, and inserting the extended pattern into the pattern library after the filtering is successful, includes: The pattern library is traversed based on extended patterns; the traversal process is a pattern comparison process, and the output of the pattern similarity obtained from the comparison is the matching degree. When the matching degree reaches the preset matching degree threshold, it is determined that the screening is passed and the extended pattern is inserted into the pattern library.

[0037] In one example of the technical solution of the present invention, the screening process of the extended pattern is described. The extended pattern is used to traverse the pattern library. The traversal process refers to comparing the extended pattern with each pattern in the pattern library in turn. Each time a pattern is compared, a similarity is obtained. The similarity is output as the matching degree. When the matching degree is high enough, it is determined that the screening is passed and the extended pattern is inserted into the pattern library.

[0038] Regarding step S500, the step of rearranging the pattern library containing extended patterns based on the parameter set, and generating processing control instructions based on the rearranged pattern library includes: For a pattern library containing extended patterns, pair the patterns in the pattern library together. By comparing the parameter sets of the paired patterns, the pattern similarity is obtained; A pattern is randomly selected from the pattern library as the initial pattern, and the pattern with the highest similarity to the initial pattern is selected as the next pattern. The next pattern is used as the reference pattern. The pattern with the highest similarity to the reference pattern is selected as the next pattern. This process is repeated to rearrange the pattern library. Read the parameter set corresponding to each pattern in the rearranged pattern library, and generate processing control instructions based on the parameter set.

[0039] In one example of the technical solution of this invention, the processing control process is described. For a pattern library containing extended patterns, patterns in the pattern library are paired one by one, and the parameter sets of the paired patterns are compared to obtain pattern similarity. The parameter set itself is a numerical set, which can be represented by a multidimensional matrix. Matrix similarity is used for comparison. After the pairwise comparison process of patterns in the pattern library is completed, a rearrangement process is performed. During rearrangement, an initial pattern is determined, which can be specified or random. Only one pattern needs to be read from the rearranged pattern library. The pattern with the highest pattern similarity to the initial pattern is selected as the next pattern. This next pattern is used as the reference pattern, and the pattern with the highest pattern similarity to the reference pattern is selected as the next pattern. This process is repeated cyclically to rearrange the pattern library, resulting in a rearranged pattern library.

[0040] The parameter set corresponding to each pattern in the rearranged pattern library is read. The parameter set is used to characterize the pose of the processing part of the processing equipment at each time. Based on this parameter, processing control commands can be generated to control the equipment.

[0041] As a preferred embodiment of the technical solution of the present invention, when screening patterns, the patterns themselves are compared. The above solution provides an image-based comparison scheme. In fact, features can also be extracted from the patterns first, and then the parameters after feature extraction can be compared. On the one hand, the comparison process can be completed and made more accurate. On the other hand, feature items can be inserted into the screened pattern library to characterize the specific information of each pattern, outputting a more comprehensive pattern database. Specifically, a feasible feature extraction process is as follows: Define and quantify four feedback factors for assessing users' identification with the product's cultural connotations: Cultural awareness: This measures a user's perception of the explicitness of cultural elements in a product and the ease with which they can identify these elements. It can be achieved by designing a series of identification questions targeting the product's cultural elements, such as "Can you identify the XX cultural symbol in the product?", and using a 7-point Likert scale for scoring. The average score of all questions is then normalized to the 0-1 range. Emotional resonance: This assesses the strength of the emotional response and memory associations a product evokes in users. It can be achieved by designing a composite questionnaire that allows users to select emotional keywords related to the product and rate their intensity. Simultaneously, real-time monitoring of physiological indicators such as skin conductance and heart rate variability is used to objectively verify users' emotional fluctuations, ultimately normalizing the overall score to a 0-1 range. Value recognition: This reflects users' judgment on the rationality of a product's cultural premium and its alignment with their personal values. It can be achieved through a trade-off experiment, allowing users to choose from products with different combinations of price and cultural attributes, thereby inferring their acceptance of the cultural premium; simultaneously, it can be combined with a willingness-to-pay survey, directly asking users how much extra they are willing to pay for the product's cultural value, ultimately normalizing the results to the 0-1 range. Intention to Spread: Intention to spread measures the probability that a user is inclined to recommend the product to others or showcase it on social media. It can be measured through a questionnaire that includes scenario simulation questions and a review of past behavior, and calibrated using actual product reposts, likes, and comments on social media, ultimately normalizing the results to the 0-1 range.

[0042] S42. Generate the comprehensive cultural identity index using the following fitting formula: ; in This is a cultural perception index. As an emotional resonance index, As a value recognition index, To measure the willingness to spread information, As a comprehensive cultural identity index; Base layer adjustment coefficient, This is the adjustment coefficient for the driving layer. ,and , All greater than , , These represent the relative importance of the "cognitive-emotional" foundational layer and the "value-behavior" driving layer, respectively. The cultural perception influence coefficient. The coefficient representing the influence of emotional resonance. , Regression analysis of initial user test data was used to determine the non-linear synergistic or compensatory effect between cultural perception and emotional resonance. The item reflects the multiplicative effect of value recognition and willingness to spread, indicating that the two complement each other, but their overall contribution follows the law of diminishing marginal utility; Specifically, the above content is used to integrate the four feedback factors into a single, representative comprehensive cultural identity index. This provides a holistic evaluation index. The formula is designed to consider the non-linear relationships and relative importance among different factors. , , , , These represent the cultural perception index, emotional resonance index, value recognition index, willingness to spread index, and comprehensive cultural identity index, respectively. They are the normalized values ​​of the measurement results in step S41, serving as the input and output of the formula. , These two moderating coefficients are used to balance the "cognitive-affective" base layer (based on cultural perception). and emotional resonance Composition) and the "value-behavior" driving layer (driven by value recognition) and willingness to spread The relative importance of components in the comprehensive index. For example, some cultural products may place more emphasis on the user's emotional experience. The value can be set higher; while for other products, the emphasis may be more on their social value and potential for dissemination. The value can be increased accordingly. , These two influence coefficients are used to characterize cultural perception. With emotional resonance There are non-linear synergistic or compensatory effects between them. For example, when cultural awareness is low, a higher level of emotional resonance may be needed to compensate, and vice versa. These coefficients can be determined through regression analysis of initial user testing data to reflect the complex relationships in actual user behavior. The project aims to reflect the degree of value recognition. With willingness to spread The product effect between them means that they complement each other and jointly drive user behavior. At the same time, the logarithmic function is introduced to reflect the law of diminishing marginal utility, that is, when value recognition and willingness to spread reach a certain level, their additional contribution to the overall recognition index will gradually decrease, making the model more consistent with reality.

[0043] Furthermore, the generated comprehensive cultural identity index The changing trends of these and their constituent factors serve as the basis for product optimization and iteration. Their role is to transform evaluation results into concrete action guidelines, ensuring the accuracy and effectiveness of the product development process. This can be achieved by establishing a data visualization dashboard to display changes in various indices in real time, and setting up an early warning mechanism that automatically triggers optimization suggestions when an index falls below a preset threshold.

[0044] Successful product development cases that have consistently maintained a high and stable overall cultural identity index after iterative optimization will be summarized and refined into a brand-specific cultural transformation methodology. Its purpose is to systematize and theorize scattered successful experiences and disseminate them publicly, thereby forming a unique technological and cognitive barrier for the brand. This can be achieved through an internal knowledge management system, which archives and structures successful case analyses, design processes, evaluation criteria, etc., forming a knowledge base that can be used for internal learning and reuse.

[0045] Figure 2 A structural diagram of an art differentiation processing system based on a cultural region is shown. In a preferred embodiment of the technical solution of the present invention, an art differentiation processing system based on a cultural region is also provided, the system 10 comprising: The pattern library creation module 11 is used to obtain cultural samples of the target cultural area, extract cultural elements from the cultural samples, and create a pattern library based on the cultural elements. The parameter set mapping module 12 is used to split any pattern in the pattern library into pattern units and represent each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment. The extended pattern generation module 13 is used to randomly update the parameter set a preset number of times based on the capability constraints of the processing equipment, and synchronously reverse-determine the pattern unit corresponding to the randomly updated parameter set to obtain the extended pattern corresponding to the original pattern. The pattern library update module 14 is used to filter extended patterns based on the pattern library, and insert the extended pattern into the pattern library after the filter is passed. The control instruction generation module 15 is used to rearrange the pattern library containing extended patterns based on the parameter set, and generate processing control instructions based on the rearranged pattern library. In the screening and rearrangement processes, the similarity obtained from the pattern comparison process is used as the execution control parameter.

[0046] Furthermore, the pattern library creation module 11 includes: The information acquisition unit is used to acquire information on material remains, traditional techniques, and humanistic narratives of the target cultural area; the data structure of the material remains, traditional techniques, and humanistic narratives is text, audio, and images; The content extraction unit is used to extract content from material remains information, traditional craft information, and humanistic narrative information to obtain cultural elements; the data structure of the cultural elements is text and images. The pattern conversion unit is used to convert the cultural elements into patterns based on a preset conversion path and send them to the verification terminal. The verification statistics unit is used to receive verification information from the verification end, count the patterns that have passed verification, and build a pattern library.

[0047] Specifically, the parameter set mapping module 12 includes: The pattern unit generation unit is used to sequentially read patterns from the pattern library, identify the patterns, determine the constituent units of the patterns and their position information, and use them as pattern units. The parameterized representation unit is used to parameterize the pattern unit and obtain the numerical information of the image unit. The parameter value determination unit is used to locate the corresponding processing parameters in the processing equipment based on the pattern unit, determine the parameter values ​​of the processing parameters based on numerical information, and obtain the parameter set corresponding to the pattern unit. The pattern unit includes at least lines and geometric prototypes; the numerical information is as follows: when the pattern unit is a line, the curve is expressed in the form of a function, and the geometric prototype is expressed in the form of a set of vertex coordinates.

[0048] Furthermore, the extended pattern generation module 13 includes: The capability constraint determination unit is used to obtain the boundary conditions of each processing parameter of the processing equipment as capability constraints. The random update unit is used to query the capability constraints of each parameter in the parameter set, and randomly determine the number and quantity of updated parameters within the capability constraints. The loop execution unit is used to execute the loop a preset number of times to obtain an updated set of parameters for the preset number of times. The data statistics unit is used to reversely determine the corresponding pattern unit and its position information based on the updated parameter set, and to obtain the extended pattern based on the position information to count the pattern units.

[0049] The above are merely preferred embodiments of the present invention and do not limit the scope of the patent. Any equivalent structural or procedural transformations made based on the description and drawings of the present invention, or direct or indirect applications in other related technical fields, are similarly included within the scope of patent protection of the present invention.

Claims

1. A method for differentiated processing of artworks based on cultural regions, characterized in that, The method includes: Obtain cultural samples from the target cultural region, extract cultural elements from the cultural samples, and create a pattern library based on the cultural elements. For any pattern in the pattern library, it is broken down into pattern units, and each pattern unit is represented as a set of parameters corresponding to the processing parameters of the processing equipment. Based on the capability constraints of the processing equipment, the parameter set is randomly updated a preset number of times, and the pattern unit corresponding to the randomly updated parameter set is determined synchronously and in reverse to obtain the extended pattern corresponding to the original pattern. The extended patterns are filtered based on the pattern library. Once the filtered pattern passes the filter, it is inserted into the pattern library. For a pattern library containing extended patterns, the pattern library is rearranged based on the parameter set, and processing control instructions are generated based on the rearranged pattern library; In the screening and rearrangement processes, the similarity obtained from the pattern comparison process is used as the execution control parameter.

2. The method for differentiated processing of artworks based on cultural regions according to claim 1, characterized in that, The steps of obtaining cultural samples of the target cultural region, extracting cultural elements from the cultural samples, and creating a pattern library based on the cultural elements include: Information on material remains, traditional crafts, and cultural narratives of the target cultural region is acquired; the data structure of the material remains, traditional crafts, and cultural narratives is text, audio, and images; Content extraction is performed on material remains, traditional techniques, and humanistic narratives to obtain cultural elements; the data structure of these cultural elements consists of text and images. Based on a preset conversion path, the cultural elements are converted into patterns and sent to the verification terminal; Receive verification information from the verification end, count the patterns that have passed verification, and build a pattern library.

3. The method for differentiated processing of artworks based on cultural regions according to claim 1, characterized in that, The step of taking any pattern in the pattern library, dividing it into pattern units, and representing each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment includes: Patterns are read sequentially from the pattern library, identified, and their constituent units and positional information are determined as pattern units. The pattern unit is parameterized to obtain the numerical information of the image unit; Based on the pattern unit, the corresponding processing parameters are located in the processing equipment. Based on the numerical information, the parameter values ​​of the processing parameters are determined, and the parameter set corresponding to the pattern unit is obtained. The pattern unit includes at least lines and geometric prototypes; the numerical information is as follows: when the pattern unit is a line, the curve is expressed in the form of a function, and the geometric prototype is expressed in the form of a set of vertex coordinates.

4. The method for differentiated processing of artworks based on cultural regions according to claim 1, characterized in that, The steps of randomly updating the parameter set a preset number of times based on the capability constraints of the processing equipment, and synchronously and inversely determining the pattern unit corresponding to the randomly updated parameter set to obtain the extended pattern corresponding to the original pattern include: Obtain the boundary conditions of each processing parameter of the processing equipment as capability constraints; For the parameter set, query the capability constraints of each parameter in the parameter set, and randomly determine the number of parameters to be updated and the amount of updated parameters within the capability constraints; Execute the loop a preset number of times to obtain an updated set of parameters for the preset number of iterations. The corresponding pattern unit and its position information are determined in reverse based on the updated parameter set, and the pattern unit is statistically analyzed based on the position information to obtain the extended pattern.

5. The method for differentiated processing of artworks based on cultural regions according to claim 1, characterized in that, The step of filtering extended patterns based on a pattern library, and inserting the extended pattern into the pattern library after the filtering is successful, includes: The pattern library is traversed based on extended patterns; the traversal process is a pattern comparison process, and the output of the pattern similarity obtained from the comparison is the matching degree. When the matching degree reaches the preset matching degree threshold, it is determined that the screening is passed and the extended pattern is inserted into the pattern library.

6. The method for differentiated processing of artworks based on cultural regions according to claim 1, characterized in that, The steps of rearranging the pattern library containing extended patterns based on a parameter set, and generating machining control instructions based on the rearranged pattern library include: For a pattern library containing extended patterns, pair the patterns in the pattern library together. By comparing the parameter sets of the paired patterns, the pattern similarity is obtained; A pattern is randomly selected from the pattern library as the initial pattern, and the pattern with the highest similarity to the initial pattern is selected as the next pattern. The next pattern is used as the reference pattern. The pattern with the highest similarity to the reference pattern is selected as the next pattern. This process is repeated to rearrange the pattern library. Read the parameter set corresponding to each pattern in the rearranged pattern library, and generate processing control instructions based on the parameter set.

7. A system for differentiated processing of artworks based on cultural districts, characterized in that, The system includes: The pattern library creation module is used to acquire cultural samples of the target cultural region, extract cultural elements from the cultural samples, and create a pattern library based on the cultural elements. The parameter set mapping module is used to break down any pattern in the pattern library into pattern units and represent each pattern unit as a set of parameters corresponding to the processing parameters of the processing equipment. The extended pattern generation module is used to randomly update the parameter set a preset number of times based on the capability constraints of the processing equipment, and synchronously reverse-determine the pattern unit corresponding to the randomly updated parameter set to obtain the extended pattern corresponding to the original pattern. The pattern library update module is used to filter extended patterns based on the pattern library. Once the pattern passes the filter, it is inserted into the pattern library. The control instruction generation module is used to rearrange the pattern library containing extended patterns based on the parameter set, and generate processing control instructions based on the rearranged pattern library. In the screening and rearrangement processes, the similarity obtained from the pattern comparison process is used as the execution control parameter.

8. The art differentiation processing system based on cultural districts according to claim 7, characterized in that, The pattern library creation module includes: The information acquisition unit is used to acquire information on material remains, traditional techniques, and humanistic narratives of the target cultural area; the data structure of the material remains, traditional techniques, and humanistic narratives is text, audio, and images; The content extraction unit is used to extract content from material remains information, traditional craft information, and humanistic narrative information to obtain cultural elements; the data structure of the cultural elements is text and images. The pattern conversion unit is used to convert the cultural elements into patterns based on a preset conversion path and send them to the verification terminal. The verification statistics unit is used to receive verification information from the verification end, count the patterns that have passed verification, and build a pattern library.

9. The art differentiation processing system based on cultural districts according to claim 7, characterized in that, The parameter set mapping module includes: The pattern unit generation unit is used to sequentially read patterns from the pattern library, identify the patterns, determine the constituent units of the patterns and their position information, and use them as pattern units. The parameterized representation unit is used to parameterize the pattern unit and obtain the numerical information of the image unit. The parameter value determination unit is used to locate the corresponding processing parameters in the processing equipment based on the pattern unit, determine the parameter values ​​of the processing parameters based on numerical information, and obtain the parameter set corresponding to the pattern unit. The pattern unit includes at least lines and geometric prototypes; the numerical information is as follows: when the pattern unit is a line, the curve is expressed in the form of a function, and the geometric prototype is expressed in the form of a set of vertex coordinates.

10. The art differentiation processing system based on cultural districts according to claim 7, characterized in that, The extended pattern generation module includes: The capability constraint determination unit is used to obtain the boundary conditions of each processing parameter of the processing equipment as capability constraints. The random update unit is used to query the capability constraints of each parameter in the parameter set, and randomly determine the number and quantity of updated parameters within the capability constraints. The loop execution unit is used to execute the loop a preset number of times to obtain an updated set of parameters for the preset number of times. The data statistics unit is used to reversely determine the corresponding pattern unit and its position information based on the updated parameter set, and to obtain the extended pattern based on the position information to count the pattern units.

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