Antireflection member, polarizing plate, image display device, and antireflection article using the antireflection member, and selection method of antireflection member

Abstract

This invention relates to anti-reflective components, polarizers, image display devices, and anti-reflective articles using the aforementioned anti-reflective components, as well as a method for selecting anti-reflective components. An anti-reflective component capable of improving scratch resistance is provided. An anti-reflective component has a low-refractive-index layer comprising an adhesive resin and hollow particles on a light-transmitting substrate, and satisfies the following condition 1. <Condition 1> Using the aforementioned light-transmitting substrate as a reference, spatial frequency analysis of the elevation is performed in a 5μm × 5μm region on the surface of the anti-reflective component on the side having the aforementioned low-refractive-index layer, thereby calculating the power spectral intensity of the elevation at each wavelength. After calculating the sum of the power spectral intensities of the elevation at each wavelength, when the sum is normalized to 1, the power spectral intensity P1 of the elevation at a wavelength of 1.25μm shows 0.015 or higher.

Description

[0001] This application is a divisional application of Chinese Patent Application No. 202180056486.9, filed on July 13, 2021, entitled "Anti-reflective component, polarizer, image display device and anti-reflective article using the above-mentioned anti-reflective component, and method for selecting anti-reflective component". Technical Field

[0002] The present invention relates to anti-reflective components, polarizers, image display devices and anti-reflective articles using the aforementioned anti-reflective components, and methods for selecting anti-reflective components. Background Technology

[0003] In display devices such as liquid crystal displays, organic EL displays, and micro LED displays, as well as display cases, anti-reflective components are known to be installed on the device surface to improve visibility. In recent years, touch panel-type image display devices, such as in-vehicle displays for car navigation systems, tablet computers, and smartphones, which are operated by users directly touching the screen, have become increasingly popular. Anti-reflective components are also incorporated into these touch panel-type image display devices.

[0004] Anti-reflective components are manufactured, for example, by forming an anti-reflective layer on a light-transmitting substrate. Regarding anti-reflective layers, dry methods such as sputtering to form inorganic thin films with different refractive indices and wet methods such as coating to form a resin layer containing microparticles are known.

[0005] Generally, compared to antireflective components with inorganic thin films, antireflective components with resin layers have advantages such as less variation in oblique reflection hue, excellent chemical stability (e.g., alkali resistance), and lower cost, resulting in superior versatility. However, compared to antireflective components with inorganic thin films, antireflective components with resin layers tend to have poorer mechanical properties, such as scratch resistance. Therefore, for antireflective components with resin layers, improved scratch resistance is required.

[0006] In antireflective components with resin layers, such as in Patent Documents 1 and 2, the low-refractive-index layer contains both hollow and solid inorganic nanoparticles, such as silicon dioxide. Furthermore, the solid inorganic nanoparticles are positioned biased towards the interface with the hard film, while the hollow inorganic nanoparticles are biased towards the opposite side of the interface. This achieves a balance between high scratch resistance and low reflectivity.

[0007] Patent document 3 discloses the following: the active silica particles in the low refractive index layer are biased at the interface on the hard coating side and / or the interface on the opposite side of the hard coating, forming a state in which hollow silica particles are densely filled in the low refractive index layer, thereby improving the surface hardness.

[0008] Patent document 4 discloses the following: an antireflective film is formed on an optical substrate, wherein hollow silica microparticles and fine silica particles are dispersed in an adhesive mainly composed of active silanes.

[0009] Existing technical documents

[0010] Patent documents

[0011] Patent Document 1: Japanese Patent Publication No. 2018-533068

[0012] Patent Document 2: Japanese Patent Publication No. 2018-533762

[0013] Patent Document 3: Japanese Patent No. 6011527

[0014] Patent Document 4: Japanese Patent Application Publication No. 2007-078711 Summary of the Invention

[0015] The problem that the invention aims to solve

[0016] However, the anti-reflective components with resin layers in Patent Documents 1-4 cannot achieve the same resistance to steel wool as anti-reflective components with inorganic thin films. To achieve low reflectivity, the anti-reflective components in Patent Documents 1-4 include hollow particles in the low-refractive-index layer. While hollow particles easily achieve low reflectivity, they also have weak strength. Therefore, it is considered that the anti-reflective components in Patent Documents 1-4, which contain hollow particles, are unlikely to achieve excellent resistance to steel wool.

[0017] Anti-reflective components are mostly used in touch panels and other areas frequently touched by hands. Therefore, anti-reflective components with poor resistance to steel wool cannot be considered highly versatile.

[0018] This invention relates to an anti-reflective member having a low-refractive-index layer containing hollow particles, and to polarizers, image display devices, and anti-reflective articles using the same anti-reflective member, with the objective of improving scratch resistance. Furthermore, this invention relates to an anti-reflective member having a low-refractive-index layer containing hollow particles, with the objective of providing a method for selecting an anti-reflective member capable of improving scratch resistance.

[0019] Methods for solving problems

[0020] The present invention provides the following [1] to [5].

[0021] [1] An anti-reflective component having a low refractive index layer comprising an adhesive resin and hollow particles on a light-transmitting substrate, which satisfies the following condition 1.

[0022] <Condition 1>

[0023] Using the aforementioned translucent substrate as a reference, spatial frequency analysis of the elevation was performed on a 5μm × 5μm region on the surface of the antireflective member on the side having the aforementioned low refractive index layer, thereby calculating the power spectral intensity of the elevation at each wavelength. After calculating the sum of the power spectral intensities of the elevations at all measured wavelengths, the sum was normalized to 1. When the power spectral intensity of the elevation at a wavelength of 1.25μm relative to the sum of the power spectral intensities of the elevations normalized to 1 is defined as P1, P1 shows a value of 0.015 or higher.

[0024] [2] A polarizer having: a polarizing element; a first transparent protective plate disposed on one side of the polarizing element; and a second transparent protective plate disposed on the other side of the polarizing element, wherein either the first transparent protective plate or the second transparent protective plate is an anti-reflective member as described in [1], and the anti-reflective member is disposed such that the surface of the light-transmitting substrate side faces the polarizing element side.

[0025] [3] An image display device, wherein on a display element, the low refractive index layer side of the anti-reflective member described above [1] faces the side opposite to the display element, and the anti-reflective member is disposed on the outermost surface.

[0026] [4] An anti-reflective article, wherein, on a member, the side of the low refractive index layer of the anti-reflective member described above [1] faces the side opposite to the member, and the anti-reflective member is disposed on the outermost surface.

[0027] [5] A method for selecting an anti-reflective component, wherein the method evaluates an anti-reflective component having a low refractive index layer comprising an adhesive resin and hollow particles on a light-transmitting substrate under the following condition 1, and selects an anti-reflective component that satisfies the following condition 1.

[0028] <Condition 1>

[0029] Using the aforementioned translucent substrate as a reference, spatial frequency analysis of the elevation was performed on a 5μm × 5μm region on the surface of the antireflective member on the side having the aforementioned low refractive index layer, thereby calculating the power spectral intensity of the elevation at each wavelength. After calculating the sum of the power spectral intensities of the elevations at all measured wavelengths, the sum was normalized to 1. When the power spectral intensity of the elevation at a wavelength of 1.25μm relative to the sum of the power spectral intensities of the elevations normalized to 1 is defined as P1, P1 shows a value of 0.015 or higher.

[0030] The effects of the invention

[0031] The anti-reflective component of the present invention, as well as the polarizer, image display device, and anti-reflective article using the anti-reflective component, can improve scratch resistance. The method for selecting the anti-reflective component of the present invention can select an anti-reflective component with excellent scratch resistance without performing scratch resistance tests. Attached Figure Description

[0032] Figure 1 This is a schematic cross-sectional view illustrating one embodiment of the anti-reflective component of the present invention.

[0033] Figure 2 This is a schematic cross-sectional view showing one embodiment of an existing anti-reflective component.

[0034] Figure 3 This is an image of the surface of the low refractive index layer side of the antireflective component of Example 1, taken using an atomic force microscope.

[0035] Figure 4 This is an image of the surface of the low-refractive-index layer side of the antireflective component of Comparative Example 1, taken using an atomic force microscope.

[0036] Figure 5 This is a diagram illustrating the calculation method for the power spectral intensity at various wavelengths on the surface of the low-refractive-index layer.

[0037] Figure 6 This is a diagram illustrating the calculation method for the power spectral intensity at various wavelengths on the surface of the low-refractive-index layer.

[0038] Figure 7 This is a cross-sectional view illustrating one embodiment of the image display device of the present invention.

[0039] Figure 8 This is a graph showing the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities relative to the elevations of all measured wavelengths for the antireflective component of Example 1 (where the sum is normalized to 1).

[0040] Figure 9 This is a graph showing the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations relative to all measured wavelengths for the antireflective component of Example 2 (where the sum is normalized to 1).

[0041] Figure 10 This is a graph showing the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations relative to all measured wavelengths for the antireflective component of Example 3 (where the sum is normalized to 1).

[0042] Figure 11This is a graph showing the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities relative to the elevations of all measured wavelengths for the antireflective component of Example 4 (where the sum is normalized to 1).

[0043] Figure 12 This is a graph showing the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations relative to all measured wavelengths for the antireflective component of Comparative Example 1 (where the sum is normalized to 1).

[0044] Figure 13 The graph shows the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations relative to all measured wavelengths for the antireflective component of Comparative Example 2 (where the sum is normalized to 1).

[0045] Figure 14 The graph shows the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations relative to all measured wavelengths for the antireflective component of Comparative Example 3 (where the sum is normalized to 1).

[0046] Figure 15 The graph shows the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations relative to all measured wavelengths for the antireflective component of Comparative Example 4 (where the sum is normalized to 1). Detailed Implementation

[0047] The embodiments of the present invention are described below.

[0048] [Anti-reflective components]

[0049] The anti-reflective component of the present invention is an anti-reflective component having a low refractive index layer comprising an adhesive resin and hollow particles on a light-transmitting substrate, which satisfies the following condition 1.

[0050] <Condition 1>

[0051] Using the aforementioned translucent substrate as a reference, spatial frequency analysis of the elevation was performed on a 5μm × 5μm region on the surface of the antireflective member on the side having the aforementioned low refractive index layer, thereby calculating the power spectral intensity of the elevation at each wavelength. After calculating the sum of the power spectral intensities of the elevations at all measured wavelengths, the sum was normalized to 1. When the power spectral intensity of the elevation at a wavelength of 1.25μm relative to the sum of the power spectral intensities of the elevations normalized to 1 is defined as P1, P1 shows a value of 0.015 or higher.

[0052] Figure 1 This is a schematic cross-sectional view of the cross-sectional shape of the anti-reflective member 100 of the present invention.

[0053] Figure 1The antireflective component 100 has a low refractive index layer 40 comprising an adhesive resin 41 and hollow particles 42 on a light-transmitting substrate 10. Figure 1 The anti-reflective component 100 has a hard coating 20 and a high refractive index layer 30 between the light-transmitting substrate 10 and the low refractive index layer 40.

[0054] Figure 1 This is a schematic cross-sectional view. That is, the scales of each layer and each material constituting the anti-reflective component 100 are stylized for ease of illustration and differ from the actual scales. Figure 2 , Figure 5 and Figure 7 The same.

[0055] exist Figure 1 In the anti-reflective component 100, Figure 1 The upper surface is equivalent to "the surface of an anti-reflective component with a low refractive index layer on one side based on a light-transmitting substrate".

[0056] In this specification, the term "the surface of an anti-reflective component having a low-refractive-index layer on the side based on a light-transmitting substrate" is sometimes referred to as "the surface on the low-refractive-index layer side".

[0057] The antireflective component of the present invention is not limited to any particular type, as long as it has a low refractive index layer comprising adhesive resin and hollow particles on a light-transmitting substrate and satisfies condition 1. Figure 1 The structure is composed of layers. For example, anti-reflective components can also be made from... Figure 1 The laminated structure is a composite structure excluding at least one of the hard coating layer and the high refractive index layer. A preferred embodiment of the laminated structure of the antireflective member is a composite structure having a hard coating layer, a high refractive index layer, and a low refractive index layer sequentially on a light-transmitting substrate. Figure 1 The layered structure.

[0058] <Transparent substrate>

[0059] The preferred light-transmitting substrate possesses light transmittance, smoothness, heat resistance, and excellent mechanical strength. Examples of such light-transmitting substrates include polyester, triacetyl cellulose (TAC), cellulose diacetate, cellulose acetate butyrate, polyamide, polyimide, polyethersulfone, polysulfone, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl alcohol acetal, polyetherketone, polymethyl methacrylate, polycarbonate, polyurethane, and amorphous olefins (Cyclo-Olefin-Polymer: COP). The light-transmitting substrate can be a substrate formed by laminating two or more plastic films together.

[0060] Of the above, from the perspective of mechanical strength and dimensional stability, polyesters such as polyethylene terephthalate and polyethylene naphthalate that have undergone stretching, especially biaxial stretching, are preferred. From the perspective of light transmittance and optical isotropy, TAC and acrylic are preferred. From the perspective of excellent weather resistance, COP and polyester are preferred.

[0061] The thickness of the light-transmitting substrate is preferably 5 μm or more and 300 μm or less, more preferably 20 μm or more and 200 μm or less, and even more preferably 30 μm or more and 120 μm or less.

[0062] When it is desired to thin the anti-reflective component, the preferred upper limit for the thickness of the light-transmitting substrate is 60 μm, and a more preferred upper limit is 50 μm. When the light-transmitting substrate is a low-moisture-permeable substrate such as polyester, COP, or acrylic, the preferred upper limit for the thickness of the light-transmitting substrate used for thin-film formation is 40 μm, and a more preferred upper limit is 20 μm. Even in the case of large screens, as long as the upper limit of the thickness of the light-transmitting substrate is within the above range, it is difficult for strain to occur, which is also preferable from this perspective.

[0063] The thickness of the translucent substrate can be measured using a digital standard outside micrometer (Mitutoyo, part number "MDC-25SX"). The thickness of the translucent substrate can be determined by averaging the values ​​at any 10 points as described above.

[0064] Examples of preferred ranges for the thickness of the light-transmitting substrate include 5 μm to 300 μm, 5 μm to 200 μm, 5 μm to 120 μm, 5 μm to 60 μm, 5 μm to 50 μm, 5 μm to 40 μm, 5 μm to 20 μm, 20 μm to 300 μm, 20 μm to 200 μm, 20 μm to 120 μm, 20 μm to 60 μm, 20 μm to 50 μm, 20 μm to 40 μm, 30 μm to 300 μm, 30 μm to 200 μm, 30 μm to 120 μm, 30 μm to 60 μm, 30 μm to 50 μm, and 30 μm to 40 μm.

[0065] To improve adhesion, physical or chemical treatments such as corona discharge can be applied to the surface of the translucent substrate, or an easy-to-adhere layer can be formed.

[0066] The anti-reflective component of the present invention needs to meet condition 1.

[0067] <Condition 1>

[0068] Using the aforementioned translucent substrate as a reference, spatial frequency analysis of the elevation was performed on a 5μm × 5μm region on the surface of the antireflective member on the side having the aforementioned low refractive index layer, thereby calculating the power spectral intensity of the elevation at each wavelength. After calculating the sum of the power spectral intensities of the elevations at all measured wavelengths, the sum was normalized to 1. When the power spectral intensity of the elevation at a wavelength of 1.25μm relative to the sum of the power spectral intensities of the elevations normalized to 1 is defined as P1, P1 shows a value of 0.015 or higher.

[0069] In this instruction manual, the number of data acquisition points (= number of pixels) for each row and column in the 5μm×5μm measurement area is set to 512pt×512pt. Therefore, in this instruction manual, the wavelengths (μm) for obtaining the power spectral intensity of the elevation are the 256 points: "5 / 1, 5 / 2, 5 / 3, 5 / 4, ..., 5 / 255, 5 / 256".

[0070] If there are no other layers on the low-refractive-index layer of the anti-reflective component, spatial frequency analysis of the elevation on the surface of the low-refractive-index layer is sufficient. If there are other layers such as anti-fouling and antistatic layers on the low-refractive-index layer, spatial frequency analysis of the elevation on the surface of those other layers is sufficient.

[0071] In this specification, "elevation" refers to "the elevation of the surface on the low-refractive-index layer side." Specifically, "the elevation of the surface on the low-refractive-index layer side" refers to the straight-line distance (refer to reference) between any point P on the surface of the antireflective member having the low-refractive-index layer on the side with the light-transmitting substrate as a reference, and an imaginary plane M having the average height of the aforementioned surface, in the direction of the normal V of the antireflective member. Figure 5 The elevation of the imaginary plane M is based on 0 μm. The direction of the normal V is the normal direction of the imaginary plane M. The elevation is positive when the elevation of any point P is higher than the average elevation, and negative when the elevation of any point P is lower than the average elevation.

[0072] The power spectral intensity at wavelength and elevation can be obtained by performing a Fourier transform on the three-dimensional coordinate data of the surface on the low-refractive-index layer side. The method for calculating the power spectral intensity at wavelength and elevation from the three-dimensional coordinate data of the surface on the low-refractive-index layer side is described below.

[0073] Unless otherwise stated, statements containing the word "elevation" in this manual refer to the elevation based on the above average height.

[0074] In Condition 1, spatial frequency analysis of the elevation of the surface on the low-refractive-index layer side is performed in a 5μm × 5μm region, thereby calculating the power spectral intensity of the elevation at each wavelength. Furthermore, in Condition 1, after calculating the sum of the power spectral intensities of the elevations for all measured wavelengths, this sum is normalized to 1. As described above, the number of data points (= number of pixels) obtained in each row and column of the 5μm × 5μm measurement region is 512pt × 512pt. Therefore, the measured wavelengths (μm) are 256 points: “5 / 1, 5 / 2, 5 / 3, 5 / 4, ..., 5 / 255, 5 / 256”. Moreover, in Condition 1, it is necessary that when the power spectral intensity of the elevation at wavelength 1.25μm, relative to the sum of the power spectral intensities of the elevations normalized to 1, is defined as P1, P1 shows a value of 0.015 or higher.

[0075] The wavelength is roughly related to the interval between convex parts (the period of the convex part). The power spectral intensity of the elevation is roughly related to the change in elevation of convex parts with a specified interval. In condition 1, the measurement area is 5μm × 5μm, therefore the wavelength is in the range of more than 0μm and less than 5μm.

[0076] That is, the "calculation of the power spectral intensity of the elevation at each wavelength" in Condition 1 can be roughly described as "calculating the change in elevation of the convex surface on the low refractive index layer side according to the period of each convex." Furthermore, "P1" in Condition 1, which represents "the power spectral intensity of the elevation at wavelength 1.25 μm relative to the sum of the power spectral intensities of the elevations normalized to 1," can be roughly described as "the proportion of the change in elevation of the convex with a period of 1.25 μm relative to the sum of the changes in elevation of the convex with various periods."

[0077] Therefore, the condition 1 "P1 is 0.015 or more" can be said to mean "the proportion of protrusions with a period of 1.25 μm on the surface of the low refractive index layer is above a specified value".

[0078] Generally, the average primary particle size of hollow particles is approximately 50 nm to 100 nm. Therefore, it is believed that the "protrusions with a period of 1.25 μm" on the surface of the low-refractive-index layer are formed based on the aggregation of hollow particles. Figure 1 In the middle, although the hollow particles 42 near the very center did not agglomerate, the hollow particles 42 agglomerated on the left and right sides, forming convexities from the agglomerated hollow particles 42. On the other hand, in Figure 2 In existing anti-reflective components, hollow particles 42 are dispersed rather than agglomerated, and are neatly arranged on the surface of the low-refractive-index layer 40. Although Figure 1 The anti-reflective component 100 has a large periodicity of protrusions and concaves, but Figure 2 The anti-reflective component 100 does not have a large periodicity of concavity and convexity.

[0079] Figure 3 and Figure 4 These are images of the low-refractive-index layer surface of the antireflective components of Example 1 and Comparative Example 1, taken using an atomic force microscope (AFM). Figure 3 and Figure 4 In this context, regions of high concentration are considered to represent the locations where hollow particles are present. That is, Figure 3 The anti-reflective component of Embodiment 1 has a region in which hollow particles are aggregated in-plane, while Figure 4 In Comparative Example 1, the hollow particles in the anti-reflective component are uniformly dispersed in the plane. Thus, AFM imaging results also demonstrate that the hollow particles in the anti-reflective component of the present invention are aggregated, while the hollow particles in the existing anti-reflective component are dispersed. Figure 3 and Figure 4 The AFM image is a 5μm × 5μm region.

[0080] That is, it can be said that a P1 value of 0.015 or higher indicates that a large proportion of hollow particles in the low-refractive-index layer agglomerate to form protrusions.

[0081] The reasons for achieving good scratch resistance by setting P1 to 0.015 or higher can be considered as follows.

[0082] Compare Figure 1 and Figure 2 Compared to Figure 2 , Figure 1 The hollow particles 42 are covered by adhesive resin 41. Figure 2 Hollow particles 42 sometimes also protrude from the surface of the low-refractive-index layer 40. Figure 2 In the case of the anti-reflective member 100, the hollow particles 42 do not agglomerate but accumulate near the surface of the low refractive index layer 40. The adhesive resin covering the hollow particles near the surface is insufficient, therefore it is considered that a portion of the hollow particles 42 is exposed from the surface of the low refractive index layer 40. On the other hand, in Figure 1 In the case of the anti-reflective component 100, since hollow particles 42 exist at various locations in the thickness direction of the low refractive index layer, the adhesive resin covering the low refractive index particles 42 near the surface of the low refractive index layer 40 will not be insufficient. Therefore, it is assumed that the hollow particles 42 are covered by the adhesive resin and will not be exposed from the surface of the low refractive index layer 40.

[0083] That is, by making P1 0.015 or higher (by increasing the proportion of protrusions formed by the aggregation of hollow particles within the low-refractive-index layer), the surface of the hollow particles is easily covered by the binder resin, thus reducing the number of hollow particles exposed from the surface of the low-refractive-index layer. Furthermore, by covering the surface of the hollow particles with binder resin, and reducing the number of exposed hollow particles, when rubbing the surface of the low-refractive-index layer with steel wool or similar materials, the steel wool or similar materials will not directly contact the weak hollow particles, thus improving scratch resistance. It should be noted that when a resin with good sliding properties is used as the binder resin for the low-refractive-index layer, or when the low-refractive-index layer contains additives with good sliding properties such as leveling agents, the surface of the hollow particles is covered by the binder resin with good sliding properties, thus also improving scratch resistance.

[0084] Furthermore, by making P1 greater than 0.015 (by increasing the proportion of protrusions formed by the aggregation of hollow particles in the low refractive index layer), when steel wool and the like come into contact with the anti-reflective component, it becomes a state of near-point contact rather than surface contact, thus it is believed to be easy to improve scratch resistance.

[0085] Previously, from the perspective of surface smoothing, it was considered preferable for hollow particles to be dispersed without agglomeration within a low-refractive-index layer. The inventors of this invention have completely deviated from existing concepts, discovering that agglomeration of hollow particles can improve scratch resistance. Furthermore, they found that the degree of agglomeration of hollow particles can be represented by the power spectral intensity of the elevation, thus completing this invention.

[0086] On the other hand, when P1 is less than 0.015, such as Figure 2 A portion of the hollow particle 42 shown is exposed from the surface of the low refractive index layer 40, which does not improve scratch resistance.

[0087] When P1 is less than 0.015, it is considered to be a configuration where hollow particles are sunk below the low-refractive-index layer. When hollow particles are sunk below the low-refractive-index layer, the refractive index near the surface of the low-refractive-index layer cannot be reduced, thus the reflectivity cannot be sufficiently reduced.

[0088] P1 is more preferably 0.017 or more, more preferably 0.020 or more, more preferably 0.025 or more, more preferably 0.028 or more, more preferably 0.030 or more, more preferably 0.032 or more, and more preferably 0.035 or more.

[0089] If P1 is too large, due to the aggregated structure of the particles, there is a tendency for the SCE (Specular Component Exclude) to increase. Therefore, P1 is preferably 0.075 or less, more preferably 0.070 or less, more preferably 0.060 or less, more preferably 0.055 or less, more preferably 0.050 or less, and more preferably 0.045 or less.

[0090] When multiple upper and lower limit options for numerical values ​​are shown in the technical features described in this specification, one of the upper limit options can be combined with one of the lower limit options as an implementation of the numerical range.

[0091] For example, in the case of P1, examples include 0.015 and above, 0.017 and above, 0.020 and above, 0.025 and above, 0.028 and above, 0.030 and above, 0.032 and above, 0.035 and above, 0.015 and below 0.075, 0.015 and below 0.070, 0.015 and below 0.060, 0.015 and below 0.055, 0.015 and below 0.050, 0.015 and below 0.045, 0.017 and below 0.075, 0.017 and below 0.070, and 0.0 17 or higher, 0.060 or lower; 0.017 or higher, 0.055 or lower; 0.017 or higher, 0.050 or lower; 0.017 or higher, 0.045 or lower; 0.020 or higher, 0.075 or lower; 0.020 or higher, 0.070 or lower; 0.020 or higher, 0.060 or lower; 0.020 or higher, 0.055 or lower; 0.020 or higher, 0.050 or lower; 0.020 or higher, 0.045 or lower; 0.025 or higher, 0.075 or lower; 0.025 or higher, 0.070 or lower; 0.025 or higher, 0.0 Below 55, 0.025 to 0.050, 0.025 to 0.045, 0.028 to 0.075, 0.028 to 0.070, 0.028 to 0.060, 0.028 to 0.055, 0.028 to 0.050, 0.028 to 0.045, 0.030 to 0.075, 0.030 to 0.070, 0.030 to 0.060, 0.030 to 0.055, 0.030 to 0.050, 0. Implementation methods with numerical ranges of 0.30 to 0.045, 0.032 to 0.075, 0.032 to 0.070, 0.032 to 0.060, 0.032 to 0.055, 0.032 to 0.050, 0.032 to 0.045, 0.035 to 0.075, 0.035 to 0.070, 0.035 to 0.060, 0.035 to 0.055, 0.035 to 0.050, and 0.035 to 0.045.

[0092] Unless otherwise stated, in this manual, the power spectral intensity values ​​of P1 and P2 related to elevation, as well as various parameters such as haze, total light transmittance, and light reflectance Y value, refer to the average values ​​of 16 measurements.

[0093] In this specification, the preferred method for determining the 16 measurement sites is to remove the area 0.5 cm from the outer edge of the sample as a blank, and then, for the remaining area, draw lines that divide the longitudinal and transverse directions into 5 equal parts, using the 16 intersection points as the measurement centers. For example, when the sample is rectangular, it is preferable to remove the area 0.5 cm from the outer edge of the rectangle as a blank, divide the remaining area into 5 equal parts along the longitudinal and transverse directions, and use the 16 intersection points of the 5-part dashed lines as the centers for measurement, calculating the parameter based on the average value. When the sample is a shape other than a rectangle, such as a circle, ellipse, triangle, or pentagon, it is preferable to draw a rectangle inscribed within these shapes, and for such rectangles, perform the 16 measurements using the method described above.

[0094] Unless otherwise stated, the power spectral intensities of P1 and P2 related to elevation, as well as various optical properties such as haze, total light transmittance, and light reflectance Y-value, are measured at a temperature of 23±5℃ and a relative humidity of 40% to 65%. Before each measurement, the sample should be exposed to the above atmosphere for at least 30 minutes.

[0095] The anti-reflective component of the present invention preferably also satisfies the following condition 2.

[0096] <Condition 2>

[0097] Similar to condition 1 above, after calculating the sum of the power spectral intensities of all measured wavelengths, the sum is normalized to 1. When P2 is defined as the power spectral intensities of the elevation at wavelength 0.075 μm relative to the sum of the power spectral intensities of the elevations normalized to 1, P1 / P2 shows a value greater than 4.0.

[0098] As stated above, in this specification, the number of data acquisition points (= number of pixels) for each row and column in the 5μm×5μm measurement area is set to 512pt×512pt. Therefore, the "0.075μm" in condition 2 is more accurately described as "5 / 67[μm] (0.0746[μm])".

[0099] The average primary particle size of typical hollow particles is between 50 nm and 100 nm. Therefore, the "power spectral intensity of the elevation at a wavelength of 0.075 μm" in condition 2 can be roughly equivalent to the "power spectral intensity of the elevation of the primary particles based on hollow particles." On the other hand, as mentioned above, the "power spectral intensity of the elevation at a wavelength of 1.25 μm" can be roughly equivalent to the "power spectral intensity of the elevation of the convex portion formed by agglomerated hollow particles." Therefore, it can be said that the larger the value of "P1 / P2" in condition 2, the higher the proportion of agglomerated hollow particles.

[0100] A P1 / P2 ratio of 4.0 or higher indicates that the surface of the hollow particles is easily covered by the adhesive resin, and fewer hollow particles are exposed from the surface of the low-refractive-index layer. Therefore, by making P1 / P2 4.0 or higher, it is easier to improve the scratch resistance of the anti-reflective component.

[0101] P1 / P2 is more preferably 4.5 or higher, and even more preferably 5.0 or higher.

[0102] There is no particular limit to the upper limit of P1 / P2, but it is preferably 20.0 or less, more preferably 15.0 or less, and even more preferably 12.0 or less.

[0103] Examples of preferred implementations of the range of P1 / P2 include 4.0 or more and 20.0 or less, 4.0 or more and 15.0 or less, 4.0 or more and 12.0 or less, 4.5 or more and 20.0 or less, 4.5 or more and 15.0 or less, 4.5 or more and 12.0 or less, 5.0 or more and 20.0 or less, 5.0 or more and 15.0 or less, and 5.0 or more and 12.0 or less.

[0104] The anti-reflective component of the present invention preferably also satisfies the following condition 3A.

[0105] <Condition 3A>

[0106] Similar to condition 1 above, after calculating the sum of the power spectral intensities of all measured wavelengths at the elevation, the sum is normalized to 1. When P3 is defined as the power spectral intensities of the elevation at a wavelength of 5 μm relative to the sum of the power spectral intensities of the elevations normalized to 1, P3 shows a value below 0.050.

[0107] Satisfying condition 3A means that there are fewer protrusions based on the excessively condensed hollow particles. Therefore, by satisfying condition 3A, it is easy to reduce reflectivity.

[0108] P3 is more preferably 0.045 or less, and even more preferably 0.040 or less. There is no particular limitation on the lower limit of P3, but it is preferably 0.010 or more, and more preferably 0.015 or more.

[0109] Examples of preferred ranges for P3 include 0.010 to 0.050, 0.010 to 0.045, 0.010 to 0.040, 0.015 to 0.050, 0.015 to 0.045, and 0.015 to 0.040.

[0110] With the same principle as condition 3A above, the anti-reflective component preferably satisfies conditions 3B and 3C below.

[0111] <Condition 3B>

[0112] Similar to condition 1 above, after calculating the sum of the power spectral intensities of all measured wavelengths, the sum is normalized to 1. When the power spectral intensities of the elevation at wavelength 2.5 μm relative to the sum of the power spectral intensities of the elevations normalized to 1 are defined as P4, P4 shows a value below 0.050.

[0113] <Condition 3C>

[0114] Similar to condition 1 above, after calculating the sum of the power spectral intensities of all measured wavelengths, the sum is normalized to 1. When the power spectral intensities of the elevation at wavelength 1.67 μm relative to the sum of the power spectral intensities of the elevations normalized to 1 are defined as P5, P5 shows a value below 0.050.

[0115] The preferred range of P4 in condition 3B and the preferred range of P5 in condition 3C are implemented in the same way as the preferred range of P3 in condition 3A.

[0116] The "1.67μm" in condition 3C is more accurately described as "5 / 3 [μm] (1.666 [μm])".

[0117] -Calculation method of power spectral intensity at elevation-

[0118] The following explains how to calculate the power spectral intensity at each wavelength elevation.

[0119] First, as stated above, in this specification, "the elevation of the surface on the low-refractive-index layer side" refers to the straight-line distance (refer to) between any point P on the surface of the antireflective member having the low-refractive-index layer on the side with the light-transmitting substrate as a reference, and an imaginary plane M having the average height of the aforementioned surface, in the direction of the normal V of the antireflective member. Figure 5 The elevation of the imaginary plane M is based on 0 μm. The direction of the normal V is the normal direction of the imaginary plane M.

[0120] If (x,y) represents the orthogonal coordinates on the surface of the low-refractive-index layer side of the anti-reflective component, then the elevation of the surface of the low-refractive-index layer side of the anti-reflective component can be expressed as a two-dimensional function h(x,y) of the coordinates (x,y).

[0121] The elevation of the surface on the low-refractive-index layer side is preferably measured using an atomic force microscope (AFM). Examples of AFMs include the NanoScope V manufactured by Bruker.

[0122] The required resolution of the measuring device is preferably less than 0.01 μm in both the horizontal and vertical directions, and more preferably less than 0.005 μm.

[0123] The area for measuring elevation was set to 5μm×5μm.

[0124] Next, the method for obtaining the amplitude spectrum of the elevation using the two-dimensional function h(x,y) will be explained. First, the two-dimensional function H(fx,fy) is obtained by using the two-dimensional function h(x,y) through the two-dimensional Fourier transform defined by the following equation (1).

[0125] <Formula (1)>

[0126] [Number 1]

[0127] Here, fx and fy are the frequencies in the x and y directions, respectively, and have dimensions that are the reciprocals of their lengths. In equation (1), π represents pi, and i is the imaginary unit. By squared the resulting two-dimensional function H(fx,fy), the two-dimensional power spectrum H can be obtained. 2 (fx,fy). The two-dimensional power spectrum H 2 (fx, fy) represents the spatial frequency distribution on the surface of the low-refractive-index layer of the anti-reflective component. The spatial frequency is the reciprocal of the wavelength.

[0128] The method for determining the amplitude spectrum H(f) of the elevation of the low-refractive-index layer side of the antireflective component is explained in more detail below. The three-dimensional information of the surface shape actually measured by the AFM is usually obtained as discrete values. That is, the three-dimensional information of the surface shape actually measured by the AFM is obtained as the elevation corresponding to multiple measurement points.

[0129] Figure 6 This is a schematic diagram illustrating the discrete acquisition of the state of the function h(x,y) representing the elevation. For example... Figure 6 As shown, if (x,y) represents the orthogonal coordinates in the plane of the surface on the low refractive index layer side, and dashed lines represent the lines that divide the projection plane Sp at intervals of Δx along the x-axis and Δy along the y-axis, then in actual measurement, the elevation of the surface on the low refractive index layer side is obtained as the discrete elevation value of each intersection point of the dashed lines on the projection plane Sp.

[0130] The number of elevation values ​​obtained is determined by the measurement range and Δx and Δy. For example... Figure 6 As shown, if the measurement range in the x-axis direction is set to X=(M-1)Δx and the measurement range in the y-axis direction is set to Y=(N-1)Δy, then the number of elevation values ​​obtained is M×N.

[0131] like Figure 6As shown, if the coordinates of the eyepoint A on the projection plane Sp are set as (jΔx, kΔy), then the elevation of point P on the surface of the low-refractive-index layer corresponding to the eyepoint A can be expressed as h(jΔx, kΔy). Here, j is 0 or higher than M-1, and k is 0 or higher than N-1.

[0132] Here, the measurement intervals Δx and Δy depend on the horizontal resolution of the measuring device. In order to evaluate the fine uneven surface with high accuracy, as mentioned above, Δx and Δy are preferably 0.01 μm or less, more preferably 0.005 μm or less.

[0133] The measurement ranges X and Y, as described above, are both 5 μm.

[0134] Thus, in actual measurements, the function representing the elevation of the surface on the low-refractive-index layer side is obtained as a discrete function h(x,y) with M×N values. The discrete function h(x,y) obtained from the measurement is subjected to a discrete Fourier transform as defined in equation (2) to obtain the discrete function H(fx,fy). The discrete function H(fx,fy) is then squared to obtain the discrete function H of the two-dimensional power spectrum. 2 (fx, fy). In this invention, M=N and Δx=Δy. In the following equation (2), "l" is an integer greater than or equal to -M / 2 and less than M / 2, and "m" is an integer greater than or equal to -N / 2 and less than N / 2. Δfx and Δfy are the frequency intervals in the x and y directions, respectively, defined by the following equations (3) and (4).

[0135] <Formula (2)>

[0136] [Number 2]

[0137] <Formula (3)>

[0138] [Number 3]

[0139] <Formula (4)>

[0140] [Number 4]

[0141] The discrete function H of the two-dimensional power spectrum calculated as described above 2 (fx, fy) represents the spatial frequency distribution of the uneven surface of the anti-reflective component. If the reciprocal of the spatial frequency is taken, it can be converted into wavelength.

[0142] Figures 8-15The antireflective components of Examples 1-4 and Comparative Examples 1-4 are shown as the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities at the elevations of all measured wavelengths (wherein the sum is normalized to 1). Figures 8-15 In the figure, the horizontal axis represents the wavelength (in "μm"), and the vertical axis represents the ratio of the power spectral intensity of each wavelength relative to the sum (in dimensionless units).

[0143] <Low Refractive Index Layer>

[0144] The low-refractive-index layer contains at least a binder resin and hollow particles.

[0145] The low refractive index layer is preferably located on the outermost surface of the antireflective component on the side with the low refractive index layer based on the light-transmitting substrate.

[0146] Although the anti-reflective component of the present invention contains hollow particles with weak strength in the low refractive index layer, it can improve scratch resistance because it satisfies condition 1.

[0147] As a means to easily satisfy condition 1, examples (a) to (g) can be given below. By appropriately combining these means, an anti-reflective component that satisfies condition 1 can be easily obtained.

[0148] (a) Treating the surface of hollow particles with methacryloyl groups.

[0149] (b) The content of solid particles relative to hollow particles is a certain amount or more.

[0150] (c) Use a solvent with a slow evaporation rate as the solvent.

[0151] (d) Improve the wettability of the low-refractive-index layer to the underlying low-refractive-index layer.

[0152] (e) The content of hollow particles relative to the binder resin is a certain amount or more.

[0153] (f) Slow down the initial drying.

[0154] (g) The proportion of acrylate resin in the adhesive resin is above a certain value.

[0155] Adhesive Resins

[0156] The low refractive index layer preferably comprises a cured product of a curable resin composition as the binder resin. The proportion of the cured product of the curable resin composition relative to the total binder resin of the low refractive index layer is preferably 50% by mass or more, more preferably 70% by mass or more, more preferably 90% by mass or more, and most preferably 100% by mass.

[0157] Examples of curable resin compositions that serve as low-refractive-index layers include thermosetting resin compositions and ionizing radiation-curable resin compositions, with ionizing radiation-curable resin compositions being preferred. That is, the low-refractive-index layer preferably comprises a cured product of an ionizing radiation-curable resin composition as an adhesive resin.

[0158] Thermosetting resin composition is a composition containing at least a thermosetting resin, and is a resin composition that is cured by heating.

[0159] Examples of thermosetting resins include acrylic resins, urethane resins, phenolic resins, urea-melamine resins, epoxy resins, unsaturated polyester resins, and silicone resins. In thermosetting resin compositions, curing agents are added to these curing resins as needed.

[0160] An ionizing radiation-curable resin composition is a composition containing a compound having an ionizing radiation-curable functional group (hereinafter also referred to as an "ionizing radiation-curable compound"). Examples of ionizing radiation-curable functional groups include olefinic unsaturated groups such as (meth)acryloyl, vinyl, and allyl, as well as epoxy and oxetyl groups. Preferably, the ionizing radiation-curable compound has two or more ionizing radiation-curable functional groups.

[0161] As a ionizing radiation curable compound, a compound having an olefinic unsaturated bond group is preferred. Among these, (meth)acrylate compounds having a (meth)acryloyl group are more preferred.

[0162] Hereinafter, (meth)acrylate compounds having four or more olefinic unsaturated groups are referred to as "polyfunctional (meth)acrylate compounds". Furthermore, (meth)acrylate compounds having two to three olefinic unsaturated groups are referred to as "low-functional (meth)acrylate compounds".

[0163] Both monomers and oligomers can be used as (meth)acrylate compounds.

[0164] From the perspective of easily satisfying condition 1, the cured product containing 50% by mass or more of a (meth)acrylate compound relative to the total amount of adhesive resin is preferred, and more preferably 70% by mass or more. The (meth)acrylate compound is preferably an acrylate compound.

[0165] Examples of difunctional (meth)acrylate compounds include di(meth)acrylate isocyanurate, ethylene glycol di(meth)acrylate, polyethylene glycol diacrylate, polybutylene glycol di(meth)acrylate, polyalkylene glycol di(meth)acrylate, bisphenol A tetraethoxydiacrylate, bisphenol A tetrapropoxydiacrylate, and 1,6-hexanediol diacrylate.

[0166] Examples of trifunctional (meth)acrylate compounds include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and isocyanuric acid-modified tri(meth)acrylate.

[0167] Examples of polyfunctional (meth)acrylate compounds with four or more functions include pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and dipentaerythritol tetra(meth)acrylate.

[0168] These (meth)acrylate compounds can be modified as described below.

[0169] Examples of (meth)acrylate oligomers include urethane (meth)acrylates, epoxy (meth)acrylates, polyester (meth)acrylates, polyether (meth)acrylates, and other acrylate polymers.

[0170] Carbamate (meth)acrylates are obtained, for example, by reacting polyols and organic diisocyanates with hydroxy (meth)acrylates.

[0171] Preferred epoxy (meth)acrylates are (meth)acrylates obtained by reacting trifunctional or higher aromatic epoxy resins, alicyclic epoxy resins, and aliphatic epoxy resins with (meth)acrylate; (meth)acrylates obtained by reacting difunctional or higher aromatic epoxy resins, alicyclic epoxy resins, and aliphatic epoxy resins with polybasic acids and (meth)acrylate; and (meth)acrylates obtained by reacting difunctional or higher aromatic epoxy resins, alicyclic epoxy resins, and aliphatic epoxy resins with phenols and (meth)acrylate.

[0172] From the perspective of suppressing uneven shrinkage caused by crosslinking, the above-mentioned (meth)acrylate compounds can modify a portion of their molecular backbone. For example, substances modified with ethylene oxide, propylene oxide, caprolactone, isocyanuric acid, alkyl groups, cyclic alkyl groups, aromatic compounds, bisphenols, etc., can also be used.

[0173] The above-mentioned ionizing radiation curable resins can be used alone or in combination of two or more.

[0174] When the ionizing radiation curing resin is an ultraviolet curing resin, the coating liquid for the low refractive index layer preferably contains additives such as photopolymerization initiators or photopolymerization accelerators.

[0175] As photopolymerization initiators, one or more can be selected from acetophenone, benzophenone, α-hydroxyalkyl phenyl ketone, michleilone, benzoin, benzoyl dimethyl ether, benzoylbenzoate, α-acyl oxime ester, α-aminoalkyl phenyl ketone, thioxanone, etc.

[0176] Photopolymerization accelerators can reduce polymerization hindrance caused by air during curing and increase the curing speed. For example, one or more of the following can be selected: isoamyl p-dimethylaminobenzoate, ethyl p-dimethylaminobenzoate, etc.

[0177] Hollow Particles

[0178] Hollow particles are particles that have an outer shell, and the interior of the particle surrounded by the outer shell is hollow, containing air. Hollow particles are particles in which the refractive index decreases proportionally to the gas occupancy compared to the refractive index of the outer shell by containing air.

[0179] The outer shell of the hollow particles can be made of any of the inorganic or organic compounds, such as silicon dioxide and magnesium fluoride. Silicon dioxide is preferred from the perspectives of low refractive index and strength. That is, the low refractive index layer preferably contains hollow silicon dioxide particles as the hollow particles.

[0180] Considering optical properties and mechanical strength, the lower limit of the average primary particle size of hollow particles is preferably 50 nm or more, more preferably 65 nm or more, and the upper limit is preferably 100 nm or less, more preferably 80 nm or less.

[0181] Examples of preferred ranges for the average primary particle size of hollow particles include 50 nm to 100 nm, 50 nm to 80 nm, 65 nm to 100 nm, and 65 nm to 80 nm.

[0182] The average primary particle size of hollow particles, solid particles (described later), and high-refractive-index particles (described later) can be calculated by the following operations (A1) to (A3).

[0183] (A1) Take a cross-section of the anti-reflective component using TEM or STEM. Preferably, the accelerating voltage of the TEM or STEM is 10kV or higher and 30kV or lower, and the magnification is 50,000x or higher and 300,000x or lower.

[0184] (A2) Extract any 10 particles from the observed image and calculate the particle size of each particle. The particle size is determined as follows: when the cross-section of the particle is held between any two parallel straight lines, the distance between the two straight lines that maximizes the distance between them is used for measurement.

[0185] (A3) Perform the same operation 5 times in another image of the same sample, and use the average value obtained by the total of 50 particle sizes as the average first particle size.

[0186] From the perspective of reducing the refractive index, the lower limit of the porosity of the hollow particles is preferably 5% or more, more preferably 10% or more, and even more preferably 20% or more. From the perspective of strength, the upper limit is preferably 80% or less, more preferably 70% or less, and even more preferably 60% or less.

[0187] The porosity of hollow particles can be calculated as follows: Measure the diameter of the hollow particle and the thickness of the outer shell (excluding the void portion) by STEM observation of its cross-section. Assuming the hollow particle is a sphere, calculate the volume of the void portion and the volume of the hollow particle assuming no void portion. The volume is calculated as {(volume of the void portion of the hollow particle) / (volume of the hollow particle assuming no void portion)} × 100.

[0188] Examples of preferred ranges for the porosity of hollow particles include 5% to 80%, 5% to 70%, 5% to 60%, 10% to 80%, 10% to 70%, 10% to 60%, 20% to 80%, 20% to 70%, and 20% to 60%.

[0189] The higher the content of hollow particles, the lower the refractive index of the low-refractive-index layer. Therefore, the content of hollow particles relative to 100 parts by weight of the binder resin is preferably 100 parts by weight or more, more preferably 150 parts by weight or more, and even more preferably 175 parts by weight or more. Furthermore, by increasing the content of hollow particles, the hollow particles are easier to aggregate, thus easily satisfying condition 1.

[0190] On the other hand, if the content of hollow particles relative to the binder resin is too high, the hollow particles are prone to protrusion from the binder resin, and the amount of binder resin between the hollow particles is reduced, thus tending to reduce the mechanical strength, such as the scratch resistance, of the low-refractive-index layer. Therefore, the content of hollow particles relative to 100 parts by weight of binder resin is preferably 400 parts by weight or less, more preferably 300 parts by weight or less, and even more preferably 250 parts by weight or less.

[0191] Examples of preferred ranges for the content of hollow particles relative to 100 parts by weight of the adhesive resin include 100 parts by weight to 400 parts by weight, 100 parts by weight to 300 parts by weight, 100 parts by weight to 250 parts by weight, 150 parts by weight to 400 parts by weight, 150 parts by weight to 300 parts by weight, 150 parts by weight to 250 parts by weight, 175 parts by weight to 400 parts by weight, 175 parts by weight to 300 parts by weight, and 175 parts by weight to 250 parts by weight.

[0192] The hollow particles are preferably coated with a silane coupling agent. The silane coupling agent preferably has a (meth)acryloyl group or an epoxy group, more preferably a methacryloyl group.

[0193] By surface-treating hollow particles with a silane coupling agent, the affinity between the hollow particles and the binder resin is improved, making it easier to suppress excessive aggregation of the hollow particles. To suppress excessive aggregation, the solid particles described later are also preferably coated with a silane coupling agent.

[0194] Solid Granules

[0195] From the perspective of further improving scratch resistance, the low refractive index layer preferably contains solid particles.

[0196] The solid particles are preferably made of inorganic compounds such as silicon dioxide and magnesium fluoride, with silicon dioxide being a more preferred material.

[0197] The average primary particle size of solid particles is preferably smaller than that of hollow particles. The lower limit of the average primary particle size of solid particles is preferably 5 nm or more, more preferably 10 nm or more, and the upper limit is preferably 20 nm or less, more preferably 15 nm or less.

[0198] Examples of preferred ranges for the average primary particle size of solid particles include 5 nm to 20 nm, 5 nm to 15 nm, 10 nm to 20 nm, and 10 nm to 15 nm.

[0199] From the perspective of further improving scratch resistance, the content of solid particles is preferably 10 parts by weight or more, more preferably 50 parts by weight or more, more preferably 70 parts by weight or more, and more preferably 100 parts by weight or more relative to 100 parts by weight of the binder resin.

[0200] On the other hand, if the content of solid particles is too high, the solid particles are prone to agglomeration, and the amount of binder resin covering the hollow particles is reduced, which may sometimes decrease the scratch resistance. Therefore, the content of solid particles relative to 100 parts by weight of binder resin is preferably 200 parts by weight or less, more preferably 150 parts by weight or less.

[0201] Examples of preferred ranges for the content of solid particles relative to 100 parts by weight of adhesive resin include 10 to 200 parts by weight, 10 to 150 parts by weight, 50 to 200 parts by weight, 50 to 150 parts by weight, 70 to 200 parts by weight, 70 to 150 parts by weight, 100 to 200 parts by weight, and 100 to 150 parts by weight.

[0202] The content of solid particles relative to 100 parts by mass of hollow particles is preferably 30 parts by mass or more, and more preferably 40 parts by mass or more. By including solid particles relative to the hollow particles within the above range, the hollow particles are less likely to flow, thus making it easier for the hollow particles to aggregate and easily satisfy condition 1.

[0203] If the content of solid particles relative to hollow particles is too high, there is a tendency for increased reflectivity. Therefore, the content of solid particles relative to 100 parts by mass of hollow particles is preferably 80 parts by mass or less, more preferably 70 parts by mass or less.

[0204] Examples of preferred ranges for the content of solid particles relative to 100 parts by mass of hollow particles include 30 to 80 parts by mass, 30 to 70 parts by mass, 40 to 80 parts by mass, and 40 to 70 parts by mass.

[0205] The lower limit of the refractive index of the low refractive index layer is preferably 1.10 or higher, more preferably 1.20 or higher, more preferably 1.26 or higher, more preferably 1.28 or higher, more preferably 1.30 or higher, and the upper limit is preferably 1.48 or lower, more preferably 1.45 or lower, more preferably 1.40 or lower, more preferably 1.38 or lower, more preferably 1.35 or lower.

[0206] In this specification, the refractive index of the layers constituting the antireflective layer, such as the low-refractive-index layer and the high-refractive-index layer, refers to the value at a wavelength of 589.3 nm.

[0207] Examples of preferred ranges for the refractive index of the low-refractive-index layer include 1.10 to 1.48, 1.10 to 1.45, 1.10 to 1.40, 1.10 to 1.38, 1.10 to 1.35, 1.20 to 1.48, 1.20 to 1.45, 1.20 to 1.40, 1.20 to 1.38, 1.20 to 1.35, 1.26 to 1.48, and 1.26 to 1. Below 45, 1.26 to 1.40, 1.26 to 1.38, 1.26 to 1.35, 1.28 to 1.48, 1.28 to 1.45, 1.28 to 1.40, 1.28 to 1.38, 1.28 to 1.35, 1.30 to 1.48, 1.30 to 1.45, 1.30 to 1.40, 1.30 to 1.38, 1.30 to 1.35.

[0208] The lower limit of the thickness of the low refractive index layer is preferably above 80 nm, more preferably above 85 nm, more preferably above 90 nm, and the upper limit is preferably below 150 nm, more preferably below 110 nm, more preferably below 105 nm.

[0209] Examples of preferred ranges for the thickness of the low refractive index layer include 80 nm to 150 nm, 80 nm to 110 nm, 80 nm to 105 nm, 85 nm to 150 nm, 85 nm to 110 nm, 85 nm to 105 nm, 90 nm to 150 nm, 90 nm to 110 nm, and 90 nm to 105 nm.

[0210] The low-refractive-index layer may further contain additives such as leveling agents, antistatic agents, antioxidants, surfactants, dispersants, and ultraviolet absorbers.

[0211] In particular, when the low-refractive-index layer contains leveling agents such as fluorine-based and silicone-based leveling agents, the surface lubrication of the low-refractive-index layer is improved, making it easier to further improve scratch resistance. The content of the leveling agent relative to 100 parts by weight of the adhesive resin of the low-refractive-index layer is preferably 0.1 parts by weight or more and 20 parts by weight or less, more preferably 1 part by weight or more and 15 parts by weight or less. The content of the leveling agent relative to 100 parts by weight of the adhesive resin of the low-refractive-index layer can be 0.1 parts by weight or more and 15 parts by weight or more and 1 part by weight or more and 20 parts by weight or less.

[0212] A low refractive index layer can be formed by coating a low refractive index layer coating liquid containing the components and solvents that constitute the low refractive index layer, drying it, and then curing it by irradiating it with ionizing rays as needed.

[0213] Solvent

[0214] Solvents can include, for example: ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), and cyclohexanone; ethers such as dioxane and tetrahydrofuran; aliphatic hydrocarbons such as hexane; alicyclic hydrocarbons such as cyclohexane; aromatic hydrocarbons such as toluene and xylene; carbon halogens such as dichloromethane and dichloroethane; esters such as methyl acetate, ethyl acetate, and butyl acetate; alcohols such as isopropanol, butanol, and cyclohexanol; cellosolves such as methyl cellosolve and ethyl cellosolve; glycol ethers such as propylene glycol monomethyl ether acetate; acetic acid cellosolves; sulfoxides such as dimethyl sulfoxide; amides such as dimethylformamide and dimethylacetamide; etc., or mixtures thereof.

[0215] The solvent for the low-refractive-index layer preferably contains a solvent with a slow evaporation rate. By including a solvent with a slow evaporation rate, the hollow particles can be agglomerated, making it easier to satisfy condition 1.

[0216] In this specification, a slow-evaporating solvent refers to a solvent whose evaporation rate is less than 100 when the evaporation rate of butyl acetate is set to 100. The evaporation rate of a slow-evaporating solvent is preferably 20 to 60, more preferably 40 to 50.

[0217] Examples of solvents with slow evaporation rates include cyclohexanone (evaporation rate 32) and 1-methoxy-2-propylacetate (evaporation rate 44).

[0218] The content of the solvent with a slow evaporation rate is preferably 20% by mass or more, and more preferably 25% by mass or more, relative to the total amount of solvent in the low refractive index layer.

[0219] On the other hand, if the content of a solvent with a slow evaporation rate is too high, the hollow particles will excessively aggregate, tending to increase reflectivity. Therefore, the solvent for the low refractive index layer is preferably a combination of solvents with slow evaporation rates and solvents with fast evaporation rates.

[0220] In this specification, a solvent with a fast evaporation rate refers to a solvent whose evaporation rate is 100 or higher when the evaporation rate of butyl acetate is set to 100. The evaporation rate of a solvent with a fast evaporation rate is preferably 120 to 300, and more preferably 130 to 180.

[0221] Examples of solvents with fast evaporation rates include methyl isobutyl ketone (160 evaporation rate), toluene (200 evaporation rate), and methyl ethyl ketone (370 evaporation rate).

[0222] The mass ratio of the solvent with a fast evaporation rate to the solvent with a slow evaporation rate is preferably 50:50 to 80:20, more preferably 60:40 to 75:25.

[0223] Drying conditions

[0224] The drying temperature of the coating liquid for the low refractive index layer is preferably 45°C to 60°C, more preferably 47°C to 53°C. By drying at such a relatively low temperature, the hollow particles are easily aggregated, thus easily satisfying condition 1.

[0225] The wind speed of the drying air for the coating liquid of the low refractive index layer is preferably 0.1 m / s to 10 m / s, more preferably 0.3 m / s to 7 m / s.

[0226] The coating liquid for the low refractive index layer can be dried in two stages. Examples of two-stage drying include (1) and (2) below, as well as combinations thereof. By drying in two stages, the initial drying of the low refractive index layer is slower, thereby facilitating the aggregation of hollow particles and making it easier to meet condition 1. The drying temperatures in (1) and (2) below are preferably within the temperature range described above.

[0227] (1) Change the wind speed of the drying air in the first stage of drying and the second stage of drying. Preferably, "the wind speed in the first stage is less than the wind speed in the second stage".

[0228] (2) The drying temperature is changed in the first stage of drying and the second stage of drying. Preferably, the drying temperature of the first stage is less than that of the second stage.

[0229] <Other Layers>

[0230] The anti-reflective component preferably has one or more layers selected from a hard coating layer and a high refractive index layer between the light-transmitting substrate and the low refractive index layer, and more preferably has both a hard coating layer and a high refractive index layer. The hard coating layer easily improves the scratch resistance of the anti-reflective component. The high refractive index layer easily reduces the reflectivity of the anti-reflective component.

[0231] In the case where there are two layers, a hard coating and a high refractive index layer, between the light-transmitting substrate and the low refractive index layer, the anti-reflective component preferably has a light-transmitting substrate, a hard coating, a high refractive index layer and a low refractive index layer in sequence.

[0232] Hard coating

[0233] The hard coating preferably contains a cured product of a curable resin composition, such as a thermosetting resin composition or an ionizing radiation curable resin composition, as its main component. The main component refers to 50% or more by mass of the resin component constituting the hard coating, preferably 70% or more by mass, and more preferably 90% or more by mass.

[0234] Thermosetting resin compositions or ionizing radiation curable resin compositions, etc., can include substances similar to the curable resin compositions exemplified in low refractive index layers.

[0235] The lower limit of the thickness of the hard coating is preferably 0.5 μm or more, more preferably 1 μm or more, and the upper limit is preferably 30 μm or less, more preferably 10 μm or less. By making the thickness of the hard coating within the above range, scratch resistance can be improved, and cracks generated during processing such as cutting can be easily suppressed.

[0236] Examples of preferred ranges for the thickness of the hard coating include 0.5 μm to 30 μm, 0.5 μm to 10 μm, 1 μm to 30 μm, and 1 μm to 10 μm.

[0237] Hard coatings may also contain additives such as leveling agents, antistatic agents, antioxidants, surfactants, dispersants, and UV absorbers.

[0238] High Refractive Index Layer

[0239] The high refractive index layer can be formed, for example, by a coating liquid for forming a high refractive index layer comprising a binder resin composition and high refractive index particles. That is, the high refractive index layer preferably comprises a binder resin and high refractive index particles.

[0240] The adhesive resin of the high refractive index layer preferably comprises a cured product of a curable resin composition. The proportion of the cured product of the curable resin composition relative to the total adhesive resin of the high refractive index layer is preferably 50% by mass or more, more preferably 70% by mass or more, more preferably 90% by mass or more, and most preferably 100% by mass.

[0241] Examples of curable resin compositions that can be used as high-refractive-index layers include thermosetting resin compositions and ionizing radiation-curable resin compositions. Examples of such curable resin compositions include substances similar to those exemplified in low-refractive-index layers.

[0242] Examples of high-refractive-index particles include antimony pentoxide (1.79), zinc oxide (1.90), titanium oxide (2.3 to 2.7), cerium oxide (1.95), tin-doped indium oxide (1.95 to 2.00), antimony-doped tin oxide (1.75 to 1.85), yttrium oxide (1.87), and zirconium oxide (2.10). The values ​​in parentheses represent the refractive indices of each high-refractive-index particle.

[0243] The average primary particle size of the high refractive index particles is preferably 2 nm or more, more preferably 5 nm or more, and more preferably 10 nm or more. From the perspective of suppressing whitening and transparency, the average primary particle size of the high refractive index particles is preferably 200 nm or less, more preferably 100 nm or less, more preferably 80 nm or less, more preferably 60 nm or less, and more preferably 30 nm or less.

[0244] Examples of preferred ranges for the average primary particle size of high-refractive-index particles include 2 nm to 200 nm, 2 nm to 100 nm, 2 nm to 80 nm, 2 nm to 60 nm, 2 nm to 30 nm, 5 nm to 200 nm, 5 nm to 100 nm, 5 nm to 80 nm, 5 nm to 60 nm, 5 nm to 30 nm, 10 nm to 200 nm, 10 nm to 100 nm, 10 nm to 80 nm, 10 nm to 60 nm, and 10 nm to 30 nm.

[0245] The content of high refractive index particles relative to 100 parts by weight of the binder resin is preferably 100 parts by weight or more, more preferably 150 parts by weight or more, and even more preferably 250 parts by weight or more, and the upper limit is preferably 500 parts by weight or less, more preferably 400 parts by weight or less, and even more preferably 350 parts by weight or less.

[0246] Examples of preferred ranges for the content of high refractive index particles relative to 100 parts by weight of the binder resin include 100 parts by weight or more and 500 parts by weight, 100 parts by weight or more and 400 parts by weight, 100 parts by weight or more and 350 parts by weight, 150 parts by weight or more and 500 parts by weight, 150 parts by weight or more and 400 parts by weight, 150 parts by weight or more and 350 parts by weight, 250 parts by weight or more and 500 parts by weight, 250 parts by weight or more and 400 parts by weight, and 250 parts by weight or more and 350 parts by weight.

[0247] The lower limit of the refractive index of the high refractive index layer is preferably 1.53 or higher, more preferably 1.54 or higher, more preferably 1.55 or higher, more preferably 1.56 or higher, and the upper limit is preferably 1.85 or lower, more preferably 1.80 or lower, more preferably 1.75 or lower, more preferably 1.70 or lower.

[0248] Examples of preferred ranges for the refractive index of the high refractive index layer include 1.53 to 1.85, 1.53 to 1.80, 1.53 to 1.75, 1.53 to 1.70, 1.54 to 1.85, 1.54 to 1.80, 1.54 to 1.75, 1.54 to 1.70, 1.55 to 1.85, 1.55 to 1.80, 1.55 to 1.75, 1.55 to 1.70, 1.56 to 1.85, 1.56 to 1.80, 1.56 to 1.75, and 1.56 to 1.70.

[0249] The upper limit of the thickness of the high refractive index layer is preferably below 200 nm, more preferably below 180 nm, and even more preferably below 150 nm, while the lower limit is preferably above 50 nm and more preferably above 70 nm.

[0250] Examples of preferred ranges for the thickness of the high refractive index layer include 50 nm to 200 nm, 50 nm to 180 nm, 50 nm to 150 nm, 70 nm to 200 nm, 70 nm to 180 nm, and 70 nm to 150 nm.

[0251] The high refractive index layer may further contain additives such as leveling agents, antistatic agents, antioxidants, surfactants, dispersants, and ultraviolet absorbers.

[0252] From the perspective of improving the wettability of the low refractive index layer, the content of leveling agent in the high refractive index layer is preferably 3 parts by mass or less, more preferably 1 part by mass or less, relative to 100 parts by mass of the binder resin.

[0253] The anti-reflective component may further have layers other than the aforementioned layers, such as an anti-fouling layer and an anti-static layer.

[0254] <Optical Properties>

[0255] The total light transmittance of the anti-reflective component according to JIS K7361-1:1997 is preferably 70% or more, more preferably 80% or more, and even more preferably 85% or more.

[0256] The total light transmittance and the light incident surface when measuring the haze (described later) are the opposite side of the surface of the low refractive index layer.

[0257] The haze of the anti-reflective component according to JIS K7136:2000 is preferably 1.0% or less, more preferably 0.7% or less, and even more preferably 0.5% or less. By keeping the haze below 1.0%, the resolution of the screen image can be easily improved. There is no particular limitation on the lower limit of the haze, which is usually 0.1% or more.

[0258] Examples of preferred implementations of the haze range for the anti-reflective component include 0.1% to 1.0%, 0.1% to 0.7%, and 0.1% to 0.5%.

[0259] For anti-reflective components, the light reflectance Y value, measured from the side with the low refractive index layer at a light incident angle of 5 degrees with a light-transmitting substrate as a reference, is preferably 1.0% or less, more preferably 0.7% or less, and even more preferably 0.5% or less. There is no particular limitation on the lower limit of the light reflectance Y value, which is typically 0.1% or more.

[0260] Examples of preferred ranges for the light reflectance Y value of the anti-reflective component include 0.1% to 1.0%, 0.1% to 0.7%, and 0.1% to 0.5%.

[0261] When measuring the light reflectance Y value, a sample with a black plate bonded to the light-transmitting substrate side of the anti-reflective component through a transparent adhesive layer is used. Light is incident from the low-refractive-index layer side of the sample at an incident angle of 5°, and the measurement is performed. The preferred light source for calculating reflectance is a C-type light source.

[0262] The refractive index difference between the component (e.g., a light-transmitting substrate) in contact with the transparent adhesive layer of the sample and the transparent adhesive layer is preferably within 0.15, more preferably within 0.10, and even more preferably within 0.05. The black sheet preferably has a total light transmittance of 1% or less, more preferably 0%, according to JIS K7361-1:1997. The refractive index difference between the resin constituting the black sheet and the transparent adhesive layer is preferably within 0.15, more preferably within 0.10, and even more preferably within 0.05.

[0263] <Steel Wool Resistance>

[0264] For anti-reflective components, the steel wool resistance of the surface on the low refractive index layer side under fluorescent lamp illumination is preferably 750g or more, more preferably 900g or more, further preferably 1000g or more, and even more preferably 1200g or more. There is no particular upper limit to the steel wool resistance, but it is approximately 2000g or less.

[0265] Examples of preferred ranges for the resistance of anti-reflective components to steel wool include 750g to 2000g, 900g to 2000g, 1000g to 2000g, and 1200g to 2000g.

[0266] In this specification, regarding the resistance to steel wool, the surface of the low-refractive-index layer of the anti-reflective component was rubbed with steel wool while applying a load under the following conditions. Observations were then conducted while changing the angle between the fluorescent lamp and the anti-reflective component. The maximum load was measured when no scratches were visible to the naked eye and the number of scratches was zero. Observations were conducted under illumination from a fluorescent lamp with an illuminance of 200 Lx to 2000 Lx, and the distance from the emitting part of the fluorescent lamp to the anti-reflective component was 10 cm to 300 cm. Examples of fluorescent lamps used for observation include, for instance, a 3-wavelength fluorescent lamp (model: FHF32EX-NH) manufactured by Panasonic Corporation.

[0267] The contact area between the steel wool and the low-refractive-index layer of the anti-reflective component is 0.5 cm². 2 Above 5.0cm 2 Within the following range, the shape of the surface where the steel wool meets the low-refractive-index layer of the anti-reflective component can be circular, triangular, polygonal, etc., preferably circular. During the test, the steel wool is moved back and forth at the same location with a single-trip distance of 30mm or more (a single round trip distance of 60mm or more). The single-trip distance is appropriately set according to the size of the device to which the anti-reflective component is applied.

[0268] <Experimental Conditions>

[0269] Steel wool: Manufactured by Nippon Steel Wool Co., Ltd., Product Name: BON STAR, Part Number: #0000

[0270] Movement speed: 100mm / second

[0271] Number of round trips: 10

[0272] <Surface Shape>

[0273] Regarding the surface of the low-refractive-index layer side of the antireflective component, the arithmetic mean roughness Ra of JIS B0601:1994 at a sampling length of 0.8 mm is preferably 0.05 μm or less, more preferably 0.03 μm or less. There is no particular limitation on the lower limit of Ra, but it is preferably 0.005 μm or more.

[0274] Examples of preferred ranges for Ra include 0.005 μm and 0.05 μm or less, and 0.005 μm and 0.03 μm or less.

[0275] <Size, shape, etc.>

[0276] Anti-reflective components can be cut into single-leaf shapes of specified dimensions, or they can be rolled up from long pieces. There is no particular limitation on the size of the single leaf, with a maximum diameter of approximately 2 inches to 500 inches. "Maximum diameter" refers to the maximum length when connecting any two points of the anti-reflective component. For example, in the case of a rectangular anti-reflective component, the diagonal of the rectangle is the maximum diameter. In the case of a circular anti-reflective component, the diameter of the circle is the maximum diameter.

[0277] There are no particular limitations on the width and length of the roll; generally, the width is between 500mm and 3000mm, and the length is between 500m and 5000m. The roll-shaped anti-reflective component can be cut into single-leaf shapes according to the size of the image display device, etc., except for the unstable ends of the roll.

[0278] The shape of the leaf is not particularly limited; for example, it can be a polygon such as a triangle, rectangle, or pentagon, or it can be a circle or a random amorphous shape. More specifically, when the anti-reflective component is rectangular, the aspect ratio is not particularly limited as long as it is not problematic for use as a display screen. Examples include aspect ratios of 1:1, 4:3, 16:10, 16:9, and 2:1. However, in design-oriented automotive applications and digital signage, such aspect ratios are not limited.

[0279] There are no particular limitations on the surface shape of the opposite side of the uneven surface of the anti-reflective component, but it is preferred to be generally smooth. Generally smooth means that the arithmetic mean roughness Ra of JIS B0601:1994 at a sampling length of 0.8 mm is less than 0.03 μm, preferably less than 0.02 μm.

[0280] [Polarizing filter]

[0281] The polarizer of the present invention includes: a polarizing element; a first transparent protective plate disposed on one side of the polarizing element; and a second transparent protective plate disposed on the other side of the polarizing element, wherein either the first transparent protective plate or the second transparent protective plate is an anti-reflective member of the present invention, and the anti-reflective member is disposed such that the surface of the light-transmitting substrate side faces the polarizing element side.

[0282] Polarizers are used, for example, to impart antireflective properties by combining with a λ / 4 retardation plate. In this case, a λ / 4 retardation plate is disposed on the display element of an image display device, and a polarizer is disposed on the side closer to the observer than the λ / 4 retardation plate.

[0283] When a polarizer is used in a liquid crystal display device, it functions as a light valve for the liquid crystal. In this case, the liquid crystal display device is arranged in the order of a lower polarizer, a liquid crystal display element, and an upper polarizer, with the absorption axis of the polarizing element of the lower polarizer orthogonal to the absorption axis of the polarizing element of the upper polarizer. In the above configuration, it is preferable to use the polarizer of the present invention as the upper polarizer.

[0284] <Transparent Protective Panel>

[0285] The polarizer of the present invention includes the anti-reflective component of the present invention as at least one of a first transparent protective plate and a second transparent protective plate. In a preferred embodiment, both the first transparent protective plate and the second transparent protective plate include the anti-reflective component of the present invention.

[0286] When one of the first and second transparent protective plates includes the anti-reflective component of the present invention, the other transparent protective plate is not particularly limited, but preferably an optically isotropic transparent protective plate.

[0287] In this specification, optical isotropy refers to an in-plane phase difference of 20 nm or less, preferably 10 nm or less, and more preferably 5 nm or less. Acrylic films and triacetyl cellulose (TAC) films readily impart optical isotropy.

[0288] When one of the first transparent protective plate and the second transparent protective plate includes the anti-reflection member of the present invention described above, it is preferable that the transparent protective plate on the light emitting side includes the anti-reflection member of the present invention described above.

[0289] <Polarization element>

[0290] Examples of polarizing elements include sheet-type polarizing elements such as polyvinyl alcohol films dyed and stretched with iodine, polyvinyl alcohol formal films, polyvinyl alcohol acetal films, and ethylene-vinyl acetate copolymer saponified films; wire grid-type polarizing elements composed of a large number of parallel metal lines; coated polarizing elements coated with lyotropic liquid crystals or dichroic host-guest materials; and multilayer thin film polarizing elements. These polarizing elements can also be reflective polarizing elements that have the function of reflecting polarizing components while not transmitting them.

[0291] The polarizing element is preferably configured such that the direction of its absorption axis is substantially parallel or substantially perpendicular to the direction of the slow axis of the optical plastic film. "Substantially parallel" means within 0° ± 5°, preferably within 0° ± 3°, and more preferably within 0° ± 1°. "Substantially perpendicular" means within 90° ± 5°, preferably within 90° ± 3°, and more preferably within 90° ± 1°.

[0292] [Image display device]

[0293] In the image display device of the present invention, the surface of the low refractive index layer of the antireflective member of the present invention is disposed on the display element such that the surface faces the side opposite to the display element, and the antireflective member is disposed on the outermost surface (see reference). Figure 7 ).

[0294] Examples of display elements include liquid crystal displays (LCDs), organic EL displays, inorganic EL displays, plasma displays, and LED displays such as micro LED displays. These display elements can have touch panel functionality within their internal components.

[0295] Liquid crystal displays (LCDs) can be displayed using various methods, including IPS, VA, multi-domain, OCB, STN, and TSTN. When the display element is a liquid crystal display (LCD), a backlight is required. The backlight is positioned on the side of the LCD opposite to the side where the anti-reflective element is located.

[0296] The image display device of the present invention can be an image display device with a touch panel having a touch panel between the display element and the anti-reflective member. In this case, the anti-reflective member is disposed on the outermost surface of the image display device with the touch panel, and the surface of the low refractive index layer side of the anti-reflective member is disposed facing the side opposite to the display element.

[0297] There is no particular limitation on the size of the image display device, but the maximum diameter of the effective display area is between 2 inches and 500 inches.

[0298] The effective display area of ​​an image display device refers to the area capable of displaying an image. For example, in the case where the image display device has a housing surrounding the display element, the area inside the housing becomes the effective display area.

[0299] The maximum diameter of the effective display area refers to the maximum length that can be connected to any two points within the effective display area. For example, if the effective display area is rectangular, the diagonal of the rectangle is the maximum diameter. If the effective display area is circular, the diameter of the circle is the maximum diameter.

[0300] [Anti-reflective items]

[0301] The antireflective article of the present invention is configured on a component such that the low refractive index layer side of the antireflective component of the present invention faces the side opposite to the component, and the antireflective component is disposed on the outermost surface.

[0302] The components and anti-reflective components are preferably laminated with an adhesive layer in between.

[0303] Examples of components include dashboards, clocks, display cases, shop windows, and windows. Components can be transparent or opaque, and there are no particular restrictions on color.

[0304] [Method for selecting anti-reflective components]

[0305] The method for selecting an anti-reflective component of the present invention evaluates an anti-reflective component having a low refractive index layer comprising an adhesive resin and hollow particles on a light-transmitting substrate under the following condition 1, and selects an anti-reflective component that satisfies the following condition 1.

[0306] <Condition 1>

[0307] Using the aforementioned translucent substrate as a reference, spatial frequency analysis of the elevation was performed on a 5μm × 5μm region on the surface of the antireflective member on the side having the aforementioned low refractive index layer, thereby calculating the power spectral intensity of the elevation at each wavelength. After calculating the sum of the power spectral intensities of the elevations at all measured wavelengths, the sum was normalized to 1. When the power spectral intensity of the elevation at a wavelength of 1.25μm relative to the sum of the power spectral intensities of the elevations normalized to 1 is defined as P1, P1 shows a value of 0.015 or higher.

[0308] The method for selecting anti-reflective components of the present invention can efficiently select anti-reflective components with good scratch resistance by selecting anti-reflective components that meet condition 1.

[0309] The preferred embodiment of condition 1 is based on the preferred embodiment of the anti-reflective member of the present invention described above.

[0310] For example, in condition 1, P1 is preferably 0.017 or more, more preferably 0.020 or more, more preferably 0.025 or more, more preferably 0.028 or more, more preferably 0.030 or more, more preferably 0.032 or more, and more preferably 0.035 or more. Furthermore, for example, P1 is preferably 0.075 or less, more preferably 0.070 or less, more preferably 0.060 or less, more preferably 0.055 or less, more preferably 0.050 or less, and more preferably 0.045 or less.

[0311] The method for selecting the anti-reflective component of the present invention preferably includes additional determination conditions. Examples of these additional determination conditions can be found in the preferred embodiments of the anti-reflective component of the present invention described above.

[0312] Specific examples of additional determination conditions can be given as follows. That is, the method for selecting the anti-reflective member of the present invention preferably has one or more of the following additional determination conditions.

[0313] <Additional Judgment Condition 1>

[0314] Similar to condition 1 above, after calculating the sum of the power spectral intensities of all measured wavelengths, the sum is normalized to 1. When P2 is defined as the power spectral intensities of the elevation at wavelength 0.075 μm relative to the sum of the power spectral intensities of the elevations normalized to 1, P1 / P2 shows a value greater than 4.0.

[0315] <Additional Judgment Condition 2>

[0316] The total light transmittance of anti-reflective components according to JIS K7361-1:1997 is above 70%.

[0317] <Additional Judgment Condition 3>

[0318] The light reflectance Y value, measured from the side with the low refractive index layer at a light incident angle of 5 degrees with a light-transmitting substrate as a reference, is less than 1.0%.

[0319] <Additional Judgment Condition 4>

[0320] The surface of the low refractive index layer has a steel wool resistance of over 750g under fluorescent lamp illumination.

[0321] <Additional Judgment Condition 4>

[0322] The surface roughness Ra of the low refractive index layer side is less than 0.05 μm according to JIS B0601:1994 at a sampling length of 0.8 mm.

[0323] Example

[0324] The invention will now be described in more detail by way of examples, but the invention is not limited to these examples in any way. Unless otherwise stated, “parts” and “%” are based on mass.

[0325] 1. Measurement and evaluation

[0326] The antireflective components of the Examples and Comparative Examples were measured and evaluated as follows. The atmosphere for each measurement and evaluation was set to a temperature of 23±5°C and a relative humidity of 40% to 65%. Before each measurement and evaluation, the sample was exposed to the above atmosphere for at least 30 minutes before the measurement and evaluation were performed.

[0327] 1-1. Power spectral intensity at elevation

[0328] The antireflective components of the examples and comparative examples were cut into 5mm × 5mm pieces. After visually confirming that there were no abnormalities such as dust or scratches at the cut locations, random locations were selected. The light-transmitting substrate side of the cut antireflective component was adhered to the metal disc used for AFM measurement using double-sided tape to create sample A.

[0329] Using an atomic force microscope (manufactured by Bruker, trade name of the AFM main body "MultiMode8", trade name of the AFM controller "NanoScopeV"), the shape of the surface on the low refractive index layer side of sample A was measured. The measurement conditions are shown below. After that, slope correction processing and power spectrum conversion processing were performed using the analysis software (NanoScope Analysis) attached to the above atomic force microscope.

[0330] <AFM Measurement Conditions>

[0331] AFM main body: Trade name "MultiMode8" manufactured by Bruker

[0332] AFM controller: Trade name "NanoScopeV" manufactured by Bruker

[0333] Mode: Tapping mode

[0334] Probe: "Part number: RTESP300" manufactured by Bruker (resonance frequency: 300 kHz, spring constant: 40 N / m)

[0335] Number of pixels: 512×512

[0336] Scanning speed: 0.6 Hz or more and 1 Hz or less

[0337] Scanning range: 5 μm×5 μm

[0338] <AFM Analysis Conditions>

[0339] Slope correction: Surface fitting

[0340] In Table 1, P1 for Condition 1 and P1 / P2 for Condition 2 are shown.

[0341] Figures 8-15 For the antireflection members of Examples 1 to 4 and Comparative Examples 1 to 4, the ratio of the power spectral intensity of the elevation at each wavelength to the sum of the power spectral intensities of the elevation at all measured wavelengths (where the sum is normalized to 1) is shown. Figures 8-15 In this case, the horizontal axis represents the wavelength (unit: "μm"), and the vertical axis represents the ratio of the power spectral intensity of each wavelength to the sum (unit: dimensionless).

[0342] 1-2. Light reflectance Y value

[0343] The anti-reflective components of the examples and comparative examples were cut into 5mm × 5mm pieces. After visually confirming that there were no abnormalities such as dust or scratches at the cut locations, random locations were selected. Using Panac's optically clear adhesive sheet (trade name: Panaclean PD-S1), the light-transmitting substrate side of the cut anti-reflective component was bonded to a black board (manufactured by KURARAY, trade name: COMOGLAS DFA2CG 502K (black) series, 2mm thick) measuring 5cm × 5cm, to create sample B.

[0344] When the direction perpendicular to the surface of the low-refractive-index layer of sample B is set to 0 degrees, incident light on sample B from a direction of 5 degrees is used, and the reflectance (light reflectance Y value) of the sample is determined based on the positive reflection of the incident light.

[0345] Reflectance was measured using a spectrophotometer (Shimadzu Corporation, trade name: UV-2450) within a wavelength range of 380 nm to 780 nm. The reflectance value was then calculated using software that converts the light to human-perceived brightness (device built-in UVPC color measurement version 3.12; conditions for reflectance calculation: C light source, viewing angle 2 degrees). The results are shown in Table 1.

[0346] 1-3. Total light transmittance (Tt) and haze (Hz)

[0347] The anti-reflective components of the examples and comparative examples were cut into 10cm square pieces. After visually confirming that there were no abnormalities such as dust or scratches at the cut locations, random locations were selected. Using a haze meter (HM-150, manufactured by Murakami Color Technology Research Institute), the total light transmittance of each sample according to JIS K7361-1:1997 and the haze according to JIS K7136:2000 were measured under the following conditions. The results are shown in Table 1.

[0348] To stabilize the light source, the device was powered on and allowed to stand for at least 15 minutes beforehand. Afterward, no adjustments were made to the inlet opening (where the sample is placed) for calibration. The sample was then placed at the inlet opening, and the total light transmittance and haze were measured. The light incident surface during measurement was the translucent substrate side.

[0349] 1-4. Scratch resistance

[0350] The PET film (manufactured by Toyobo Co., Ltd., trade name "Cosmoshine A4300") was fixed at both ends to the base of the vibration abrasion testing machine (manufactured by SAM JEE TECH, trade name "SJTR-053") using clamps. Steel wool #0000 (manufactured by Nippon Steel Wool Co., Ltd., trade name "BON STAR B-204") was placed in contact with the surface of the PET film. A 500g load was applied while the steel wool was moved back and forth 200 times at a speed of 100 mm / s and a round trip distance of 200 mm (100 mm per pass). This operation is typically performed to suppress deviations in each test. The contact area between the steel wool and the PET film was 4 cm². 2 .

[0351] Next, the PET film was removed, leaving the surface of the low-refractive-index layer as the top surface. The anti-reflective components of the examples and comparative examples were similarly fixed to the base of the vibration abrasion tester. The steel wool was moved back and forth 10 times while a load was applied at a moving speed of 100 mm / s and a round trip distance of 200 mm (100 mm for one pass). Unless otherwise specified, the test environment was set at a temperature of 23 ± 1 °C and a relative humidity of 50 ± 5%. The BON STAR B-204 described above is a commercial size with a width of approximately 390 mm, a length of approximately 75 mm, and a thickness of approximately 110 mm.

[0352] Subsequently, the number of scratches on each anti-reflective component was evaluated by visual inspection under fluorescent illumination. A Panasonic 3-wavelength fluorescent lamp (model: FHF32EX-NH) was used. The illuminance on the samples was between 800 Lx and 1200 Lx. The observation distance was 30 cm. Steel wool resistance was expressed as the maximum load (g) per unit area when no scratches were observed or when there were 0 scratches after the test. For both the examples and comparative examples, tests were conducted with n=3, and the average value was used as the steel wool resistance for each example and comparative example.

[0353] 2. Fabrication of anti-reflective components

[0354] [Example 1]

[0355] After coating a triacetyl cellulose membrane with the following formulation of hard coating solution 1 onto a membrane with a thickness of 80 μm, it was dried at 70 °C for 1 minute to allow the solvent to evaporate. Then, the membrane was subjected to a cumulative light intensity of 100 mJ / cm². 2 The material is then exposed to ultraviolet light, which forms a hard coating with a dry thickness of 10 μm.

[0356] Next, after applying the high refractive index coating solution 1 of the following formulation to the hard coating layer, it is dried at 70°C for 1 minute to allow the solvent to evaporate. Then, the cumulative light intensity is measured at 100 mJ / cm². 2 Ultraviolet irradiation is applied to form a dry, high-refractive-index layer with a thickness of 150 nm.

[0357] Next, after coating the high-refractive-index layer with the low-refractive-index coating solution 1 of the following formulation, it is dried at 50°C for 30 seconds (drying air velocity 0.5 m / s), and then further dried at 50°C for 30 seconds (drying air velocity 5 m / s) to allow the solvent to evaporate. Then, a cumulative light intensity of 200 mJ / cm² is applied. 2 By subjecting the material to ultraviolet irradiation, a dry, low-refractive-index layer with a thickness of 100 nm is formed, resulting in the anti-reflective component of Example 1.

[0358] <Coating solution for hard coating 1>

[0359] • 22 parts by weight of a composition containing UV-curable acrylate

[0360] (Manufactured by Toa Synthetic Co., Ltd., trade name "Aronix M-450", 100% solids)

[0361] • 17 parts by weight of a composition containing UV-curable acrylate

[0362] (Daiichi Kogyo Pharmaceutical Co., Ltd., trade name "New Frontier R-1403MB", 80% solid content)

[0363] · 1 part by weight of fluorine leveling agent

[0364] (DIC Corporation, product name "MEGAFACE F-568")

[0365] · 1 part by weight of photopolymerization initiator

[0366] (IGM Resins, product name "Omnirad184")

[0367] 15 parts by weight of methyl isobutyl ketone

[0368] 44 parts by weight of methyl ethyl ketone

[0369] <Coating solution for forming high refractive index layers 1>

[0370] · PETA 1.5 parts by weight

[0371] (Manufactured by Toa Synthetic Co., Ltd., trade name "Aronix M-305", 100% solids)

[0372] 4.5 parts by weight of high refractive index particles

[0373] (Nippon Shokubai Co., Ltd., product name "ZIRCOSTAR", 70% solid content)

[0374] · 0.01 parts by weight of fluorinated leveling agent

[0375] (DIC Company, product name "MEGAFACE F251")

[0376] • 0.14 parts by weight of photopolymerization initiator

[0377] (Manufactured by IGM Resins under the brand name "Omnirad 127")

[0378] 47.6 parts by weight of methyl isobutyl ketone

[0379] 47.6 parts by weight of propylene glycol monomethyl ether

[0380] <Coating solution for forming low refractive index layer 1>

[0381] 100 parts by weight of a multifunctional acrylate composition

[0382] (Manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd., trade name "New Frontier MF-001")

[0383] · 200 parts by weight of hollow silica particles

[0384] (Particles with an average primary particle size of 75 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0385] 110 parts by weight of solid silica granules

[0386] (Particles with an average primary particle size of 12.5 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0387] · 13 parts by weight of silicone leveling agent

[0388] (Shin-Etsu Chemical Co., Ltd., trade name "X-22-164E")

[0389] · 4.3 parts by weight of photopolymerization initiator

[0390] (IGM Resins, product name "Omnirad127")

[0391] • Solvent 14,867 parts by weight

[0392] (A mixed solvent of methyl isobutyl ketone and 1-methoxy-2-propyl acetate. Mass ratio = 68 / 32)

[0393] [Example 2]

[0394] By changing the coating liquid 1 for the low refractive index layer to the coating liquid 2 for the low refractive index layer described below, the anti-reflective component of Example 2 is obtained in the same manner as in Example 1.

[0395] <Coating solution for forming low refractive index layer 2>

[0396] 100 parts by weight of a multifunctional acrylate composition

[0397] (Manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd., trade name "New Frontier MF-001")

[0398] · 200 parts by weight of hollow silica particles

[0399] (Particles with an average primary particle size of 75 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0400] · 85 parts by weight of solid silica granules

[0401] (Particles with an average primary particle size of 12.5 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0402] · 13 parts by weight of silicone leveling agent

[0403] (Shin-Etsu Chemical Co., Ltd., trade name "X-22-164E")

[0404] · 4.3 parts by weight of photopolymerization initiator

[0405] (IGM Resins, product name "Omnirad127")

[0406] • Solvent 14,867 parts by weight

[0407] (A mixed solvent of methyl isobutyl ketone and 1-methoxy-2-propyl acetate. Mass ratio = 68 / 32)

[0408] [Example 3]

[0409] The hollow silica particles in coating liquid 1 for the low refractive index layer were replaced with hollow silica particles with an average primary particle size of 60 nm and surface-treated with a silane coupling agent having a methacrylamide group. Otherwise, the antireflective component of Example 3 was obtained in the same manner as in Example 1.

[0410] [Example 4]

[0411] The silicone-based leveling agent in the coating liquid 1 for the low refractive index layer was changed to a fluorosilicone-based leveling agent (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name "X-71-1203M", solid content 20% by mass, solvent: methyl isobutyl ketone), otherwise the antireflective component of Example 4 was obtained in the same manner as in Example 1.

[0412] [Comparative Example 1]

[0413] By changing the coating liquid 1 for the low refractive index layer to the coating liquid 4 for the low refractive index layer described below, the antireflective component of Comparative Example 1 was obtained in the same manner as in Example 1.

[0414] <Coating solution for forming low refractive index layer 4>

[0415] · PETA 10 parts by weight

[0416] (Manufactured by Nippon Kayaku Co., Ltd., trade name "KAYARAD PET-30", 100% solid content)

[0417] • 90 parts by mass of a fluorinated compound having a (meth)acryloyl group, a reactive silane unit, and a silane unit having a perfluoropolyether group.

[0418] (Manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name "X-71-1203M"), solids 20% by mass, solvent: methyl isobutyl ketone

[0419] 140 parts by weight of hollow silica particles

[0420] (Particles with an average primary particle size of 75 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0421] · 25 parts by weight of solid silica granules

[0422] (Particles with an average primary particle size of 12.5 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0423] · 4.3 parts by weight of photopolymerization initiator

[0424] (IGM Resins, product name "Omnirad127")

[0425] · Solvent 10,684 parts by weight

[0426] (A mixed solvent of methyl isobutyl ketone and propylene glycol monomethyl ether. Mass ratio = 68 / 32)

[0427] [Comparative Example 2]

[0428] The high refractive index layer coating liquid 1 was changed to the high refractive index layer coating liquid 2 described below. Furthermore, the low refractive index layer coating liquid 1 was changed to the low refractive index layer coating liquid 5 described below, and the drying conditions for coating the low refractive index layer were 50°C × 1 minute (drying wind speed 5 m / s). Otherwise, the anti-reflective component of Comparative Example 2 was obtained in the same manner as in Example 1.

[0429] <Coating solution for forming high refractive index layers 2>

[0430] 0.68 parts by weight of PETA

[0431] (Manufactured by Nippon Kayaku Co., Ltd., trade name "KAYARAD PET-30", 100% solid content)

[0432] · 6.71 parts by mass of high refractive index particles

[0433] (Manufactured by Nippon Chemicals Co., Ltd., trade name "ELCOM V-4564" (contains antimony pentoxide particles), solid content 40.5%)

[0434] · Fluorine leveling agent 2.03 parts by weight

[0435] (Manufactured by DIC Corporation, trade name "MEGAFACE F251")

[0436] • 0.05 parts by weight of photopolymerization initiator

[0437] (Manufactured by IGM Resins, trade name "Omnirad127")

[0438] 46.3 parts by weight of methyl isobutyl ketone

[0439] 44.23 parts by weight of propylene glycol monomethyl ether

[0440] <Coating solution for forming low refractive index layer 5>

[0441] ·PETA 50 parts by weight

[0442] (Manufactured by Nippon Kayaku Co., Ltd., trade name "KAYARAD PET-30", 100% solid content)

[0443] • 50 parts by mass of a fluorinated compound having a (meth)acryloyl group, a reactive silane unit, and a silane unit having a perfluoropolyether group.

[0444] (Manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name "X-71-1203M"), solids 20% by mass, solvent: methyl isobutyl ketone

[0445] · 200 parts by weight of hollow silica particles

[0446] (Particles with an average primary particle size of 65 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0447] · 30 parts by weight of solid silica granules

[0448] (Particles with an average primary particle size of 12.5 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0449] · 4.3 parts by weight of photopolymerization initiator

[0450] (IGM Resins, product name "Omnirad127")

[0451] • Solvent 12,870 parts by weight

[0452] (Mixed solvent of methyl isobutyl ketone and 1-methoxy-2-propyl acetate. Mass ratio = 89 / 11)

[0453] [Comparative Example 3]

[0454] The high refractive index layer coating liquid 1 was changed to the high refractive index layer coating liquid 2 described above. Furthermore, the low refractive index layer coating liquid 1 was changed to the low refractive index layer coating liquid 6 described below, and the drying conditions for coating the low refractive index layer were set to 50°C for 1 minute (drying wind speed 5 m / s). Otherwise, the anti-reflective component of Comparative Example 3 was obtained in the same manner as in Example 1.

[0455] <Coating solution for forming low refractive index layers 6>

[0456] ·PETA 70 parts by weight

[0457] (Manufactured by Nippon Kayaku Co., Ltd., trade name "KAYARAD PET-30", 100% solid content)

[0458] • 30 parts by mass of a fluorinated compound having a (meth)acrylyl group, a reactive silane unit, and a silane unit having a perfluoropolyether group.

[0459] (Manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name "X-71-1203M"), solids 20% by mass, solvent: methyl isobutyl ketone

[0460] 135 parts by weight of hollow silica particles

[0461] (Particles with an average primary particle size of 75 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0462] 10 parts by weight of solid silica granules

[0463] (Particles with an average primary particle size of 12.5 nm, surface-treated with a silane coupling agent containing methacrylyl groups)

[0464] · 4.3 parts by weight of photopolymerization initiator

[0465] (IGM Resins, product name "Omnirad127")

[0466] · 9,746 parts by weight of solvent

[0467] (Mixed solvent of methyl isobutyl ketone and 1-methoxy-2-propyl acetate. Mass ratio = 89 / 11)

[0468] [Comparative Example 4]

[0469] The content of hollow silica particles in the low refractive index layer coating liquid 4 was changed to 200 parts by mass, and the anti-reflective component of Comparative Example 4 was obtained in the same manner as Comparative Example 1.

[0470] [Table 1]

[0471] Table 1

[0472] The results in Table 1 confirm that the anti-reflective component of the embodiment that satisfies condition 1 has good scratch resistance despite containing weak hollow particles.

[0473] In the anti-reflective components of Examples 1 to 4, the content of solid silica is higher than that of hollow silica, and the initial drying of the low refractive index layer is slower. Therefore, it is considered that condition 1 is easily satisfied.

[0474] On the other hand, in the antireflective components of Comparative Examples 1 and 4, the content of acrylate resin as the binder resin for the low refractive index layer is low, and the content of solid silica is also low, so it is considered difficult to meet condition 1. In Comparative Examples 2 and 3, the low content of solid silica results in rapid initial drying of the low refractive index layer, so it is also considered difficult to meet condition 1.

[0475] Symbol Explanation

[0476] 10: Translucent substrate

[0477] 20: Hard coating

[0478] 30: High Refractive Index Layer

[0479] 40: Low Refractive Index Layer

[0480] 41: Adhesive resin

[0481] 42: Hollow Particles

[0482] 100: Anti-reflective components

[0483] 110: Display element

[0484] 120: Image display device.

Claims

1. An anti-reflective component, comprising a low-refractive-index layer containing an adhesive resin and hollow particles on a light-transmitting substrate, wherein, The average primary particle size of the hollow particles is between 50 nm and 100 nm. With the light-transparent substrate as a reference, the light reflectance Y value measured from the side having the low refractive index layer at a light incident angle of 5 degrees is 1.0% or less. The anti-reflective component satisfies the following condition 1. <Condition 1> Using the light-transparent substrate as a reference, spatial frequency analysis of the elevation is performed in a 5μm × 5μm region on the surface of the antireflective member on the side having the low refractive index layer. The power spectral intensity of the elevation at each wavelength is calculated. After calculating the sum of the power spectral intensities of the elevation at all measured wavelengths, the sum is normalized to 1. When the power spectral intensity of the elevation at wavelength 1.25μm relative to the sum of the power spectral intensities of the elevation normalized to 1 is defined as P1, P1 shows a value greater than or equal to 0.

015.

2. The anti-reflective component as described in claim 1, wherein, Under condition 1, P1 shows a value greater than 0.

025.

3. The anti-reflective component as described in claim 1 or 2, further satisfying condition 2 below. <Condition 2> Similar to condition 1, after calculating the sum of the power spectral intensities of all measured wavelengths, the sum is normalized to 1. When the power spectral intensities of the elevation at wavelength 0.075 μm relative to the sum of the power spectral intensities of the elevations normalized to 1 are defined as P2, P1 / P2 shows a value greater than 4.

0.

4. The anti-reflective component as described in claim 1 or 2, wherein, Between the light-transparent substrate and the low-refractive-index layer, there is one or more layers selected from hard coating and high-refractive-index layers.

5. The anti-reflective component as described in claim 1 or 2, wherein, JIS K7136:2000 specifies a haze level of 1.0% or less.

6. An anti-reflective component having a low-refractive-index layer comprising an adhesive resin and hollow particles on a light-transmitting substrate, satisfying the following condition 3A, <Condition 3A> Using the light-transparent substrate as a reference, spatial frequency analysis of the elevation is performed in a 5μm × 5μm region on the surface of the antireflective member on the side having the low refractive index layer. The power spectral intensity of the elevation at each wavelength is calculated. After calculating the sum of the power spectral intensities of the elevation at all measured wavelengths, the sum is normalized to 1. When the power spectral intensity of the elevation at a wavelength of 5μm relative to the sum of the power spectral intensities of the elevation normalized to 1 is defined as P3, P3 shows a value of 0.050 or less.

7. The anti-reflective component as described in claim 6, wherein, Under condition 3A, P3 shows a value below 0.

045.

8. The anti-reflective member as described in claim 6 or 7, wherein, The average primary particle size of the hollow particles is between 50 nm and 100 nm.

9. The anti-reflective member as described in claim 6 or 7, wherein, Between the light-transparent substrate and the low-refractive-index layer, there is one or more layers selected from hard coating and high-refractive-index layers.

10. The anti-reflective member as claimed in claim 6 or 7, wherein, JIS K7136:2000 specifies a haze level of 1.0% or less.

11. The anti-reflective member as claimed in claim 6 or 7, wherein, The light reflectance Y value, measured from the side having the low refractive index layer at a light incident angle of 5 degrees with the light-transmitting substrate as a reference, is less than 1.0%.

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