Gas bath device and semiconductor production apparatus

By designing an air bath device with multi-plane air outlet walls and guide plates, the problem of contaminant retention during hot annealing was solved, achieving high cleanliness and low pollution in the process chamber, which is suitable for semiconductor manufacturing equipment.

CN122180333APending Publication Date: 2026-06-09AMIES TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
AMIES TECHNOLOGY CO LTD
Filing Date
2024-11-29
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

In semiconductor manufacturing, contaminants volatilized during thermal annealing cause contaminants to remain in the process chamber. Existing air bath devices cannot effectively prevent the formation of eddies, which affects the cleanliness of the workpiece.

Method used

Design an air bath device, including multiple air outlet walls, each on a different plane and intersecting each other, with air outlet holes, and through the cooperation of a guide plate and a suction device, form laminar flow to avoid eddies and improve cleanliness.

Benefits of technology

It effectively avoids eddies within the process chamber, improves the cleanliness of the process chamber and working area, reduces contaminant pollution of the workpiece, and maintains the cleanliness of the process chamber at ISO class 1 level.

✦ Generated by Eureka AI based on patent content.

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    Figure CN122180333A_ABST
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Abstract

The application provides a gas bath device and a semiconductor production equipment, the gas bath device comprises a plurality of air outlet walls, the plurality of air outlet walls are sequentially connected, and the length directions of the air outlet walls are the same; different air outlet walls are located in different planes, the planes where any two air outlet walls are located intersect, and each air outlet wall is provided with an air outlet hole; the gas bath device is applied to the semiconductor production equipment, the semiconductor production equipment further comprises a process cavity and a suction device, and the process cavity has a working area; the gas bath device is arranged in the process cavity and located at one side of the working area, and the gas bath device is higher than the working area; the suction device has a suction port, the suction port is arranged at the side of the working area away from the gas bath device, and the suction port is lower than the working area; the gas bath device blows the process cavity in different directions, avoids the formation of vortex of blowing gas in the process cavity, prevents the retention of pollutants in the process cavity, improves the cleanliness of the working area, and reduces the pollution of pollutants to the workpiece located in the working area.
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