A raw material mixing device for photoresist production and processing

Abstract

The application discloses a raw material mixing device for photoresist production and processing, which can not introduce pollution sources, ensure that the last batch of residues do not affect the precision of the next batch, and ensure that the raw materials can be fully mixed and dissolved without causing the molecular chain of the raw materials to break. The application adopts a mixing main pipe with a two-dimensional / three-dimensional wave-shaped mixing and dissolving section. Upstream connecting liquid inlet pipes and slurry inlet pipes are respectively connected with quantitative liquid raw materials and solid slurry. The mixing and dissolving section uniformly distributes multiple uniform mixing lifting units, including a dome-shaped protruding part, a stud in line with the protruding part, a reset elastic element and a locking mechanism. In the mixing stage, the stud is locked, and the protruding part is tightly attached to the inner wall of the main pipe. In the cleaning stage, the locking is released, the liquid flow impacts the spiral protruding ribs to drive the protruding part to rotate and axially displace, the reset elastic element accumulates potential energy, and the liquid flow stops and reverses back to the original position.

Description

Technical Field

[0001] This invention relates to a raw material mixing device for photoresist production and processing. Background Technology

[0002] In semiconductor integrated circuit manufacturing processes, photoresist, as a key material for pattern transfer, directly determines the yield and resolution of chip manufacturing. As advanced processes move towards smaller feature sizes, photoresist formulations are becoming increasingly complex, with near-stringent requirements for the uniformity of raw material mixing and the purity of the system (metal impurities must be controlled at the ppt level, and particulate matter at the ppb level). Therefore, to meet these requirements, strict control of material precision is necessary during mixing; mixing must be carried out in a sealed chamber under nitrogen protection; high-frequency vibration must be avoided to prevent molecular chain breakage; stirring speed must not be too fast, and sufficient dissolution time is required; and air bubbles must not be introduced into the mixture.

[0003] Currently, batch mixing reactors are widely used in the industry for photoresist production. A typical equipment structure usually includes: a mixing chamber with jacketed temperature control, a mechanical stirring paddle extending into the chamber, an opening for solid feed, and various motors and sealing components for drive. While this type of equipment meets basic production needs to some extent, its inherent structural defects create insurmountable technical bottlenecks when preparing high-end photoresists, mainly in the following aspects: 1. Metal ion and micro-dust contamination caused by mechanical friction: Traditional mixing vessels rely on high-speed rotating mechanical agitators to provide shear force. A dynamic mechanical seal (such as a rotating ring and a stationary ring) must be installed between the agitator shaft and the cavity. During long-term frictional operation, not only are micron-sized mechanical wear particles easily generated, falling into the high-purity photoresist and causing fatal defects; but also, wear of the motor brushes and aging of the bearings can release trace amounts of metal ions (such as Fe, Cu, Zn, etc.). In high-end photoresists, even a few ppb-level metal impurities can cause chip leakage or even render the chip unusable.

[0004] 2. The complex cavity structure leads to dead corners and cross-contamination. To achieve stirring and temperature control, the mixing vessel inevitably contains numerous discontinuous structures, such as material inlets, baffles, and mounting grooves for various sensors. These structures create a large number of "dead corners." High-viscosity photoresist resin easily accumulates, cross-links, and cures in these dead corners. Residues in these dead corners are difficult to clean completely, becoming new sources of micro-dust contamination and causing cross-contamination between different batches of products.

[0005] 3. Batch-to-batch consistency fluctuations: Due to the large volume of the mixing vessel, the shear forces experienced by the fluid at different locations vary significantly, easily leading to slight fluctuations in uniformity within and between batches. With continuous flow processes becoming increasingly mainstream, the traditional batch mixing vessel's "one-pot" approach is no longer sufficient to meet the demands of large-scale, high-consistency production.

[0006] In summary, there is an urgent need for a new type of raw material mixing device that does not introduce pollution sources, ensures that residues from the previous batch do not affect the accuracy of the next batch, and ensures thorough mixing and dissolution without causing breakage of the raw material molecular chains. Summary of the Invention

[0007] The purpose of this invention is to provide a raw material mixing device for photoresist production and processing, which can avoid introducing pollution sources and ensure that the residue of the previous batch will not affect the accuracy of the next batch, and ensure that it can be fully mixed and dissolved without causing the raw material molecular chain to break.

[0008] The technical solution of the present invention is as follows: The raw material mixing device for photoresist production and processing includes: The mixing main section includes a wavy mixing and dissolving section in two or three-dimensional space; The inlet pipe is connected to the upstream end of the mixing main pipe and is used to introduce a fixed amount of liquid raw material into the mixing main pipe. The slurry inlet pipe is connected to the upstream end of the mixing main pipe and is used to introduce a slurry-like raw material, which is a mixture of a fixed amount of solid raw material and solvent, into the mixing main pipe. Multiple mixing and lifting units are evenly distributed on the mixing and dissolving section. Each unit includes a protrusion, a stud, a reset elastic element, and a locking mechanism. The outer contour of the protrusion includes a dome-shaped main body. The bottom edge of the dome-shaped main body connects to the inner wall of the mixing main pipe via an arc-shaped chamfer on the protrusion. The outer surface of the main body has multiple spiral ribs arranged in the same direction, with the extension trajectory of the spiral ribs forming an angle with the circumferential edge of the protrusion. This allows the liquid flowing through the spiral ribs to generate a tangential driving torque that causes the protrusion to rotate around its axis. The stud is connected to the side of the protrusion away from the main body, and the stud's axis is collinear with the axis of the protrusion. A circular plate is provided on the mixing and dissolving section. A threaded hole is provided at the center of the circular plate corresponding to the stud. The stud is screwed into the threaded hole. A locking groove is provided at the outer end of the stud. A mounting plate is provided on the outer side of the circular plate. A locking mechanism is installed on the mounting plate. The locking mechanism includes a pin for inserting into the locking groove to limit the spiral rotation of the stud. When the pin is pulled out, the stud is released. A reset elastic element is provided between the mounting plate and the stud. When the spiral rib is driven to rotate by the liquid scouring, the reset elastic element undergoes elastic deformation to accumulate reset potential energy. When the liquid flow stops or the scouring force is insufficient to maintain the rotation, the reset elastic element releases the reset potential energy and drives the protrusion to rotate in the opposite direction to the initial set position.

[0009] Based on the above scheme, the following improvements are made: the stud and the circular plate are made of ceramic.

[0010] Based on the above scheme, the following improvements are made: the reset elastic element is a coil spring and is sleeved on the stud. The outer end of the coil spring is fixed on the mounting plate. The stud is provided with a long groove extending along the axial direction of the stud, corresponding to the inner end of the coil spring. The inner end of the coil spring is slidably assembled in the long groove. The length of the long groove is equal to the maximum axial displacement of the protrusion.

[0011] Based on the above scheme, the following improvements are made: the reset elastic element is a coil spring and is sleeved on the stud. The inner end of the coil spring is fixed on the stud. A long groove extending along the axial direction of the stud is provided on the mounting plate corresponding to the outer end of the coil spring. The outer end of the coil spring is slidably assembled in the long groove. The length of the long groove is equal to the maximum axial displacement of the protrusion.

[0012] Based on the above scheme, the following improvements are made: the locking mechanism includes a push-pull electromagnet.

[0013] Based on the above scheme, the following improvements are made: the spiral rib is arc-shaped, and the height of the spiral rib is the same at all points.

[0014] Based on the above scheme, the following improvements are made: there are multiple spiral ribs, which are evenly distributed along the circumference of the protrusion.

[0015] Based on the above scheme, the following improvements are made: the protrusion is a hollow shell structure.

[0016] The beneficial effects of this application are as follows: In the photoresist production and processing raw material mixing device, liquid raw materials enter the mixing main pipe through the inlet pipe, while solid raw materials are pre-mixed with a metered amount of solvent to form a slurry, which is then metered into the mixing main pipe through the slurry inlet pipe. The raw materials flowing into the mixing main pipe pass through a wave-shaped mixing and dissolving section. On the one hand, the wave-shaped structure extends the dissolving time, allowing sufficient time for dissolution; on the other hand, the wave-shaped bending structure promotes mixing and tumbling during the flow. More importantly, the evenly distributed multiple mixing and lifting units on the mixing and dissolving section form a locally raised structure, which encourages the raw materials to change direction and position more frequently, breaking the regular flow and creating a chaotic flow pattern, thus making the raw material mixing more uniform. However, since each batch needs to be rinsed with solvent and cleaned and dried with high-purity water after preparation, the side of the raised section facing the solvent can be rinsed more thoroughly, but the side facing away from the solvent is prone to residue due to limited impact force. Therefore, the raised section is designed as a rotatable structure. The stud is released only during solvent and high-purity water rinsing, controlled by a locking mechanism. The tangential driving torque generated by the liquid impact and the spiral ribs drives the protrusion to rotate, so that each side edge of the protrusion can rotate to the side facing the liquid flow for a cleaner tilt. Since the protrusion is rotatable, a split structure must be set, which will inevitably create a gap between it and the inner wall of the mixing main tube. To prevent a small amount of residue in the gap, a matching structure between the stud and the threaded hole is set. The rotational motion of the protrusion is converted into axial motion, so that the gap between the protrusion and the mixing main tube can be opened to form a flow channel, so that the solvent and high-purity water can fully rinse the residue accumulated in the gap. This avoids the residue in the gap between the protrusion and the mixing main tube affecting the preparation of the next batch of photoresist. After rinsing, the spiral ribs are no longer under force, and the reset potential energy accumulated by the reset elastic element can drive the protrusion to rotate in the opposite direction, so that the protrusion returns to its initial position, and the locking mechanism can lock the stud in the subsequent mixing stage.

[0017] It is easy to see from the above working process that, compared with the existing technology where the stirring paddle stirs and dissolves in the mixing vessel, this application: 1. Residue from the previous batch will not contaminate the next batch because the residue in the gap between the protrusion and the mixing main pipe will be thoroughly cleaned during the cleaning stage. The liquid flow will cause the protrusion to rotate and move axially. During the rotation of the protrusion, it is ensured that all parts of the protrusion edge can rotate to face the liquid flow, thus rinsing more thoroughly. The axial displacement of the protrusion can turn the originally narrow gap between it and the mixing main pipe into a large channel, so that the liquid flow can pass through the channel and rinse and dissolve the residue, thereby avoiding the presence of residue in the gap between the protrusion and the mixing main pipe. 2. No source of contamination will be introduced because the structure of this application does not introduce a friction part that can directly contact the raw material in the mixing main pipe. Instead, it relies on the wave-shaped structure of the mixing and dissolving section and the structure of multiple evenly distributed protrusions to change the flow state of the raw material, thereby achieving full mixing during the flow process. Although the protrusions can rotate and move axially, they only move during the rinsing stage between the completion of mixing and the next batch mixing. Moreover, their movement makes it easier for the solvent and high-purity water to wash away contaminants, thus ensuring that there is no residue at any part of the protrusions or even at the gap between them and the mixing main pipe. During the mixing stage, the protrusions are in a state of close contact with the mixing main pipe, and the raw material cannot enter the mating area between the stud and the threaded hole. Only a small amount remains in the gap between the protrusions and the mixing main pipe. That is, during the mixing stage, the friction area between the stud and the threaded hole does not come into contact with the raw material, so the raw material will not be contaminated. 3. No stirring structure is used in the wavy mixing and dissolving section. The raw materials are mixed by relying solely on the shape of the wavy tube and the shape of the protrusions and the force of the material flow itself. There is no high-frequency vibration or rapid stirring process in the whole process, and there is no problem of molecular chain breakage in the raw materials, which ensures that the photoresist film thickness is uniform. 4. To prevent external contamination, the entire mixing main pipe is a sealed space, and the mixing main pipe can be placed in a sealed space filled with nitrogen to prevent outside air from contacting and contaminating the raw materials. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of a specific embodiment of a raw material mixing device for photoresist production and processing according to the present invention; Figure 2 for Figure 1 A magnified view of a section at point A in the middle; Figure 3 for Figure 1 A magnified view of a portion of point B (during the mixing and dissolution of raw materials); Figure 4 for Figure 3 A magnified view of a section at point C; Figure 5 This is the front view of the protrusion; Figure 6 for Figure 3 A schematic diagram showing the state during rinsing; Figure 7 This is a partial enlarged view of the coil spring in another embodiment; In the diagram: 1-Mixing main pipe, 11-Mixing and dissolving section, 12-Circular plate section, 121-Threaded hole, 13-Mounting plate, 2-Liquid inlet pipe, 3-Slurry inlet pipe, 4-Mixing and lifting unit, 41-Protrusion, 411-Main body section, 412-Arc chamfer, 413-Spiral rib, 42-Stud, 421-Locking groove, 43-Coil spring, 44-Locking mechanism, 441-Pin, 45-Long groove. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only for explaining the invention and are not intended to limit the invention; that is, the described embodiments are merely some embodiments of the invention, and not all embodiments. The components of the embodiments of the invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0020] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0021] It should be noted that relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0022] The features and performance of the present invention will be further described in detail below with reference to embodiments.

[0023] Specific embodiments of the raw material mixing apparatus for photoresist production and processing of the present invention: as follows Figure 1-6 As shown, the raw material mixing device for photoresist production and processing includes a mixing main pipe 1, a liquid inlet pipe 2, and a slurry inlet pipe 3. In order to avoid the introduction of metal powder, a non-metallic layer can be provided on the inner wall of each pipe, and electrochemical polishing treatment can be performed to improve the smoothness and reduce residue as much as possible.

[0024] The mixing main tube 1 includes a wavy mixing and dissolving section 11 in two-dimensional or three-dimensional space. In this embodiment, the mixing and dissolving section 11 is wavy in two-dimensional space. In order to improve the dissolution time and reduce the volume occupation, the mixing and dissolving section 11 also needs to be folded as a whole.

[0025] like Figure 2As shown, the liquid inlet pipe 2 is connected to the upstream end of the mixing main pipe 1 and is used to introduce a quantitative amount of liquid raw material into the mixing main pipe 1. The slurry inlet pipe 3 is connected to the upstream end of the mixing main pipe 1 and is used to introduce a slurry-like raw material composed of a quantitative amount of solid raw material and solvent into the mixing main pipe 1.

[0026] There are multiple mixing and lifting units 4, evenly distributed on the mixing and dissolving section 11, including those evenly distributed along the extension direction of the mixing and dissolving section 11 and those evenly distributed along its circumference, such as... Figure 3 As shown, the mixing and lifting unit 4 includes a protrusion 41, a stud 42, a reset elastic element, and a locking mechanism 44. The outer contour of the protrusion 41 includes a dome-shaped main body 411. The bottom edge of the dome-shaped main body 411 is connected to the inner wall of the mixing main pipe 1 by an arc-shaped chamfer 412 provided on the protrusion 41. The outer surface of the main body 411 is provided with a plurality of spiral ribs 413 arranged in the same direction and inclined. The spiral ribs 413 extend along the outer surface of the main body 411 and follow the shape of the main body 411. The extension trajectory of the spiral ribs 413 has an angle with the circumferential edge of the protrusion 41, so that the liquid flowing through the spiral ribs 413 can generate a tangential driving torque that causes the protrusion 41 to rotate about its axis. The stud 42 is connected to the side of the protrusion 41 away from the main body 411, and the axis of the stud 42 is parallel to the protrusion. The axes of the sections 41 and 42 are collinear. A circular plate section 12 is correspondingly provided on the mixing and dissolving section 11. A threaded hole 121 is provided at the center of the circular plate section 12 corresponding to the stud 42. The stud 42 is screwed into the threaded hole 121. A locking groove 421 is provided at the outer end of the stud 42. A mounting plate 13 is provided on the outer side of the circular plate section 12. A locking mechanism 44 is installed on the mounting plate 13. The locking mechanism 44 includes a pin 441 for inserting into the locking groove 421 to restrict the spiral rotation of the stud 42. When the pin 441 is pulled out, the stud 42 is released. A reset elastic element is provided between the mounting plate 13 and the stud 42. When the spiral rib 413 is driven by the liquid to rotate the protrusion 41, the reset elastic element undergoes elastic deformation to accumulate reset potential energy. When the liquid flow stops or the flushing force is insufficient to maintain the rotation, the reset elastic element releases the reset potential energy, driving the protrusion 41 to rotate in the opposite direction to the initial set position. The stud 42 and the circular plate section 12 are made of ceramic. The protrusion 41 has a hollow shell structure.

[0027] like Figure 4 As shown, the reset elastic element is a coil spring 43 and is sleeved on the stud 42. The outer end of the coil spring 43 is fixed on the mounting plate 13. The stud 42 is provided with a long groove 45 extending along the axial direction of the stud 42 corresponding to the inner end of the coil spring 43. The inner end of the coil spring 43 is slidably assembled in the long groove 45. The length of the long groove 45 is equal to the maximum axial displacement of the protrusion 41.

[0028] In other embodiments, such as Figure 7As shown, the reset elastic element is a coil spring 43 and is sleeved on the stud 42. The inner end of the coil spring 43 is fixed on the stud 42. The mounting plate 13 is provided with a long groove 45 extending axially along the stud 42 corresponding to the outer end of the coil spring 43. The outer end of the coil spring 43 is slidably assembled in the long groove 45. The length of the long groove 45 is equal to the maximum axial displacement of the protrusion 41.

[0029] In this embodiment, the locking mechanism 44 includes a push-pull electromagnet, which drives the pin 441 to extend and retract.

[0030] like Figure 5 As shown, the spiral rib 413 is arc-shaped, and the height of the spiral rib 413 is the same at all points. There are multiple spiral ribs 413; this embodiment shows six, which are evenly distributed along the circumference of the protrusion 41.

[0031] In the photoresist production and processing raw material mixing device, liquid raw materials enter the mixing main pipe 1 through the liquid inlet pipe 2, while solid raw materials are pre-mixed with a quantitative solvent to form a slurry, which is then quantitatively introduced into the mixing main pipe 1 through the slurry inlet pipe 3. The raw materials entering the mixing main pipe 1 flow through a wavy mixing and dissolving section 11. This wavy structure extends the dissolving time, allowing sufficient time for dissolution. Furthermore, the wavy bending structure promotes mixing and tumbling during the flow. More importantly, the evenly distributed multiple mixing and lifting units 4 on the mixing and dissolving section 11 form a locally raised structure, which causes the raw materials to change direction and position more frequently, breaking the regular flow and creating a chaotic flow pattern, thus making the raw material mixing more uniform. However, since each batch needs to be rinsed with solvent and cleaned and dried with high-purity water after preparation, the side of the raised part 41 facing the solvent can be rinsed relatively clean, but the side facing away from the solvent is prone to residue due to limited impact force. Therefore, the raised part 41 is designed as a rotatable structure, and controlled by the locking mechanism 44, only... During solvent and high-purity water rinsing, the stud 42 is released. The tangential driving torque generated by the liquid impact and the interaction of the spiral rib 413 drives the protrusion 41 to rotate, so that each side edge of the protrusion 41 can rotate to the side facing the liquid flow for a more thorough cleaning. Since the protrusion 41 is rotatable, a separate structure is required, inevitably creating a gap between it and the inner wall of the mixing main pipe 1. To prevent any residue from remaining in the gap, a mating structure between the stud 42 and the threaded hole 121 is provided, converting the rotational motion of the protrusion 41 into axial motion. The movement of the spiral rib 41 allows the gap between the protrusion 41 and the mixing main tube 1 to open, forming a flow channel so that the solvent and high-purity water can fully rinse the residue accumulated in the gap. This prevents the residue in the gap between the protrusion 41 and the mixing main tube 1 from affecting the configuration of the next batch of photoresist. After rinsing, the spiral rib 413 is no longer under force, and the reset potential energy accumulated by the reset elastic element can drive the protrusion 41 to rotate in the opposite direction, so that the protrusion 41 returns to its initial position, so that the stud 42 can be locked by the locking mechanism 44 in the subsequent mixing stage.

[0032] Compared to the existing technology where the stirring paddle is used to stir and dissolve in the mixing vessel, the residue from the previous batch in this application will not contaminate the next batch. This is because the residue in the gap between the protrusion 41 and the mixing main pipe 1 will be thoroughly cleaned during the cleaning stage. The liquid flow will cause the protrusion 41 to rotate and axially displace. During the rotation of the protrusion 41, it can be ensured that all edges of the protrusion 41 can rotate to face the liquid flow, thereby rinsing more thoroughly. The axial displacement of the protrusion 41 can turn the originally narrow gap between it and the mixing main pipe 1 into a large channel, so that the liquid flow can pass through the channel and rinse and dissolve the residue, thereby avoiding the presence of residue in the gap between the protrusion 41 and the mixing main pipe 1.

[0033] Secondly, this application does not introduce a source of contamination because the mixing main pipe 1 does not have a friction part that can directly contact the raw material. Instead, it relies on the wave-shaped structure of the mixing and dissolving section 11 and the structure of multiple evenly distributed protrusions 41 to change the flow state of the raw material, thereby achieving full mixing during the flow process. Although the protrusions 41 can rotate and move axially, they only move during the rinsing stage between the completion of mixing and the next batch of mixing. Moreover, their movement makes it easier for solvents and high-purity water to wash away contaminants, thus ensuring that there are no residues at any part of the protrusions 41 or even at the gap between them and the mixing main pipe 1. During the mixing stage, the protrusions 41 are in a state of close contact with the mixing main pipe 1, and the raw material cannot enter the mating area between the stud 42 and the threaded hole 121. Only a small amount remains in the gap between the protrusions 41 and the mixing main pipe 1. That is, during the mixing stage, the mating friction area between the stud 42 and the threaded hole 121 does not come into contact with the raw material, and therefore will not contaminate the raw material.

[0034] Furthermore, the wave-shaped mixing and dissolving section 11 does not employ a stirring structure. Instead, it relies solely on the shape of the wave-shaped tube and the protrusions 41 to utilize the inherent flow of the raw materials to promote uniform mixing. The entire process does not involve high-frequency vibration or rapid stirring, and there is no issue of molecular chain breakage in the raw materials, ensuring uniform photoresist film thickness. Moreover, it can prevent external contamination. The entire mixing main tube 1 is a sealed space, and the mixing main tube 1 can be placed in a sealed space filled with nitrogen to prevent external air from contacting and contaminating the raw materials.

[0035] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. The scope of patent protection of the present invention shall be determined by the claims. Similarly, any equivalent structural changes made based on the description and drawings of the present invention shall also be included within the scope of protection of the present invention.

Claims

1. A raw material mixing device for photoresist production and processing, characterized in that, include: The mixing main section includes a wavy mixing and dissolving section in two or three-dimensional space; The inlet pipe is connected to the upstream end of the mixing main pipe and is used to introduce a fixed amount of liquid raw material into the mixing main pipe. The slurry inlet pipe is connected to the upstream end of the mixing main pipe and is used to introduce a slurry-like raw material, which is a mixture of a fixed amount of solid raw material and solvent, into the mixing main pipe. Multiple mixing and lifting units are evenly distributed on the mixing and dissolving section. Each unit includes a protrusion, a stud, a reset elastic element, and a locking mechanism. The outer contour of the protrusion includes a dome-shaped main body. The bottom edge of the dome-shaped main body connects to the inner wall of the mixing main pipe via an arc-shaped chamfer on the protrusion. The outer surface of the main body has multiple spiral ribs arranged in the same direction, with the extension trajectory of the spiral ribs forming an angle with the circumferential edge of the protrusion. This allows the liquid flowing through the spiral ribs to generate a tangential driving torque that causes the protrusion to rotate around its axis. The stud is connected to the side of the protrusion away from the main body, and the stud's axis is collinear with the axis of the protrusion. A circular plate is provided on the mixing and dissolving section. A threaded hole is provided at the center of the circular plate corresponding to the stud. The stud is screwed into the threaded hole. A locking groove is provided at the outer end of the stud. A mounting plate is provided on the outer side of the circular plate. A locking mechanism is installed on the mounting plate. The locking mechanism includes a pin for inserting into the locking groove to limit the spiral rotation of the stud. When the pin is pulled out, the stud is released. A reset elastic element is provided between the mounting plate and the stud. When the spiral rib is driven to rotate by the liquid scouring, the reset elastic element undergoes elastic deformation to accumulate reset potential energy. When the liquid flow stops or the scouring force is insufficient to maintain the rotation, the reset elastic element releases the reset potential energy and drives the protrusion to rotate in the opposite direction to the initial set position.

2. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, The stud and the circular plate are made of ceramic.

3. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, The reset elastic element is a coil spring and is sleeved on a stud. The outer end of the coil spring is fixed to the mounting plate. A long groove extending along the axial direction of the stud is provided on the stud corresponding to the inner end of the coil spring. The inner end of the coil spring is slidably assembled in the long groove. The length of the long groove is equal to the maximum axial displacement of the protrusion.

4. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, The reset elastic element is a coil spring and is sleeved on a stud. The inner end of the coil spring is fixed on the stud. A long groove extending along the axial direction of the stud is provided on the mounting plate corresponding to the outer end of the coil spring. The outer end of the coil spring is slidably assembled in the long groove. The length of the long groove is equal to the maximum axial displacement of the protrusion.

5. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, The locking mechanism includes a push-pull electromagnet.

6. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, The spiral rib is arc-shaped, and the height of the spiral rib is the same at all points.

7. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, There are multiple spiral ribs, which are evenly distributed along the circumference of the protrusion.

8. The raw material mixing apparatus for photoresist production and processing according to claim 1, characterized in that, The protrusion is a hollow shell structure.

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