Fixing device for evaporation substrate and evaporation apparatus
The design of the ring support frame and detachable support platform solves the problem of the vapor deposition substrate fixing device occupying the vapor deposition area, realizes a larger effective layout area and higher alignment accuracy, and reduces equipment operating costs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- BOE TECHNOLOGY GROUP CO LTD
- Filing Date
- 2026-04-20
- Publication Date
- 2026-06-19
AI Technical Summary
Existing vapor deposition substrate fixing devices occupy the vapor deposition area, resulting in a reduction in the effective area for vapor deposition substrate layout, large sagging, and affecting alignment accuracy and yield.
The evaporation substrate is supported by a ring support frame, eliminating the need for a crossbeam design and completely exposing the evaporation area. The detachable connection structure of the support platform and base increases the effective layout area of the evaporation substrate, and the electrostatic chuck is eliminated by using a cooling plate to reduce operating costs.
It increases the effective layout area of the vapor-deposited substrate, reduces sagging, improves alignment accuracy, increases yield, and reduces equipment operating costs.
Smart Images
Figure CN122235672A_ABST
Abstract
Description
Technical Field
[0001] This article relates to vapor deposition technology, and more particularly to a device for fixing vapor deposition substrates and vapor deposition equipment. Background Technology
[0002] Organic light-emitting diodes (OLEDs) are active-matrix display devices with advantages such as self-illumination, wide viewing angle, high contrast, low power consumption, and extremely fast response speed. With the continuous development of display technology, display devices that use OLEDs as light-emitting devices and thin-film transistors (TFTs) for signal control have become the mainstream products in the display field.
[0003] In OLED panel manufacturing, vapor deposition is a critical process. Vapor deposition is a precision coating technology that uses heat to evaporate a material in a vacuum environment, causing it to deposit as atoms or molecules onto the surface of a substrate (such as silicon wafers or glass), thus forming a thin film. The vapor deposition process directly determines the precision of the pixel pattern and the panel yield. Related substrate fixing devices are used to position the vapor deposition substrate and reduce its sagging. However, these devices occupy the vapor deposition area, reducing the effective area available for substrate layout. Summary of the Invention
[0004] This application provides a fixing device for a vapor-deposited substrate. The vapor-deposited substrate has a vapor deposition area and an edge area surrounding the vapor deposition area. The fixing device for the vapor-deposited substrate includes a support frame, which is configured to be parallel to a first plane and form a ring along the extending direction of the edge area. The support frame forms a first opening to expose the vapor deposition area, and the support frame has a bearing surface on one side in a first direction to support the edge area, the first direction being perpendicular to the first plane.
[0005] In some exemplary embodiments, the support frame includes a plurality of support units, which are arranged sequentially around the first opening and are detachably connected.
[0006] In some exemplary embodiments, any of the support units includes a base and a support platform disposed on the base; The bases of the plurality of support units are arranged circumferentially around the first opening, and the support platforms of adjacent support units are connected.
[0007] In some exemplary embodiments, the support platform is configured as a first support surface on one end face in the first direction, and the first support surfaces of the support platforms of the plurality of support units constitute the annular bearing surface.
[0008] In some exemplary embodiments, the support platform includes multiple support modules, one of which is fixedly mounted on the base, and the multiple support modules are movably connected. The support platform has an unfolded state and a retracted state. In the unfolded state, the plurality of support modules are arranged in a circumferential straight line along the first opening, and the end face of the plurality of support modules on one side of the first direction forms the first support surface. In the retracted state, at least two of the support modules are stacked in the first direction.
[0009] In some exemplary embodiments, the support platform is located on the side of the base closer to the first opening in a direction parallel to the first plane; Multiple support modules are connected in sequence, and adjacent support modules are connected by electric hinges.
[0010] In some exemplary embodiments, the support platform is configured to be movably connected to the base, and the support platform has a working position and a storage position relative to the base; In the working position, the support platform is configured to extend beyond the base to support the vapor-deposited substrate; In the storage position, the support platform is housed on or inside the base.
[0011] In some exemplary embodiments, the support platform is disposed on one side of the base in the first direction, and the base and the support platform are slidably connected; The base is provided with a guide rail, and the support platform is configured to slide along the guide rail to switch between the working position and the storage position.
[0012] In some exemplary embodiments, at least one of the bases is configured as a first base, the first base extending along a second direction, the first opening being located at one end of the first base in the second direction, and a guide rail on the first base being configured to extend along the second direction; At least one of the support platforms is configured as a first support platform, which extends along a third direction and is slidably disposed on the first base, wherein the second direction and the third direction are both parallel to the first plane and perpendicular to each other.
[0013] In some exemplary embodiments, the base is provided with a storage slot, and two support platforms are provided, which are rotatably connected to the base to switch between the working position and the storage position; At the storage location, two support platforms are disposed within the storage slot; In the working position, the two support platforms are respectively located on both sides of the base in the circumferential direction of the first opening.
[0014] In some exemplary embodiments, the support frame includes a plurality of support units, which are configured to be connected end to end on a plane parallel to the first plane, and the plurality of support units are configured as a single piece.
[0015] In some exemplary embodiments, a cooling plate is also included, which is disposed on one side of the support frame in the first direction and spaced apart from the support frame, and the cooling plate and the support frame are configured to clamp the vapor-deposited substrate.
[0016] This application provides a vapor deposition apparatus, including the aforementioned device for fixing the vapor deposition substrate.
[0017] In some exemplary embodiments, a mask template is also included, the mask template having a mounting groove, and the support frame is disposed on the mask template and located within the mounting groove.
[0018] The fixing device for the vapor-deposited substrate in this embodiment of the application uses an annular support frame to support the vapor-deposited substrate, eliminating the need for a crossbeam. The first opening completely exposes the vapor-deposited area, increasing the effective area for layout of the vapor-deposited substrate and improving production capacity.
[0019] The fixing device for the vapor-deposited substrate in this application embodiment can significantly reduce the sag of the vapor-deposited substrate, improve alignment accuracy, and increase yield.
[0020] The fixing device for the vapor-deposited substrate in this embodiment of the application can eliminate the need for an electrostatic chuck (ESC), significantly reducing equipment operating costs.
[0021] Other features and advantages of this application will be set forth in the following description, and will be apparent in part from the description, or may be learned by practicing the application. Other advantages of this application can be realized and obtained by means of the embodiments described in the description and the accompanying drawings. Attached Figure Description
[0022] The accompanying drawings are used to provide an understanding of the technical solutions of this application and constitute a part of the specification. They are used together with the embodiments of this application to explain the technical solutions of this application and do not constitute a limitation on the technical solutions of this application.
[0023] Figure 1 Here is a schematic diagram of the relevant vapor deposition equipment; Figure 2 for Figure 1 AA-direction section diagram; Figure 3 This is a schematic diagram of a fixing device according to an exemplary embodiment of the present invention; Figure 4 for Figure 3 A schematic diagram of the fixing device and the vapor-deposited substrate installation; Figure 5 for Figure 3 A schematic diagram of the support frame in the diagram; Figure 6 for Figure 5 A magnified view of section B in the diagram; Figure 7 for Figure 6 Side view of the supporting unit in the middle; Figure 8 for Figure 6 A schematic diagram of the retracted state of the support platform; Figure 9 A schematic diagram of another fixing device for this exemplary embodiment; Figure 10 for Figure 9 A three-dimensional view of the first supporting unit in the middle; Figure 11 for Figure 9 A magnified view of part D in the diagram; Figure 12 for Figure 11 A diagram showing the storage location of the support platform; Figure 13 This is a schematic diagram of a support unit in an exemplary embodiment of the present invention; Figure 14 for Figure 13 A schematic diagram of the working position of the support platform in the diagram; Figure 15 A schematic diagram of yet another fixing device for this exemplary embodiment; Figure 16 A schematic diagram of another fixing device for this exemplary embodiment; Figure 17 This is a schematic diagram of a vapor deposition apparatus according to an exemplary embodiment of the present invention; Figure 18 for Figure 17 A disassembled diagram of the vapor deposition equipment. Detailed Implementation
[0024] The embodiments of this disclosure will now be described in detail with reference to the accompanying drawings. The implementation can be carried out in many different forms. Those skilled in the art will readily understand that the methods and content can be transformed into other forms without departing from the spirit and scope of this disclosure. Therefore, this disclosure should not be construed as limited to the content described in the following embodiments. Unless otherwise specified, the embodiments and features in the embodiments of this disclosure can be arbitrarily combined with each other.
[0025] In the accompanying drawings, the size of one or more constituent elements, the thickness of layers, or areas are sometimes exaggerated for clarity. Therefore, this disclosure is not necessarily limited to these dimensions, and the shape and size of one or more parts in the drawings do not reflect true proportions. Furthermore, the drawings schematically illustrate ideal examples, and this disclosure is not limited to the shapes or values shown in the drawings.
[0026] The ordinal numbers such as "first," "second," and "third" used in this specification are used to avoid confusion among the constituent elements, not to limit the quantity. The term "multiple" in this disclosure refers to two or more quantities.
[0027] In this specification, for convenience, terms such as "middle," "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer" are used to indicate orientation or positional relationships in conjunction with the accompanying drawings. This is solely for the purpose of facilitating the description and simplification, and does not imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this disclosure. The positional relationships of the constituent elements may be appropriately varied depending on the orientation of the constituent elements being described. Therefore, the use of terms not limited to those described in the specification may be appropriately replaced as needed.
[0028] In this specification, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they may refer to a fixed connection, a detachable connection, or an integral connection; a mechanical connection or joint; a direct connection, an indirect connection via an intermediate component, or a connection within two components. Those skilled in the art will understand the meaning of these terms in this disclosure as appropriate.
[0029] In this specification, "electrical connection" includes the situation where components are connected together by elements that have a certain electrical function. There are no particular limitations on what constitutes an "electrical function," as long as it allows for the transmission of electrical signals between the connected components. Examples of "electrical functions" include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other elements with various functions.
[0030] In this specification, a transistor is a device that includes at least three terminals: a gate, a drain, and a source. A transistor has a channel region between its drain (drain terminal, drain region, or drain electrode) and its source (source terminal, source region, or source electrode), and current can flow through the drain, the channel region, and the source. In this specification, the channel region refers to the region through which current primarily flows.
[0031] In this specification, the first terminal can be the drain and the second terminal can be the source, or vice versa. In cases where transistors with opposite polarities are used or where the current direction changes during circuit operation, the functions of the "source" and "drain" are sometimes interchanged. Therefore, in this specification, the "source" and "drain" can be interchanged. Additionally, the gate can also be called the control terminal.
[0032] In this specification, "parallel" refers to the state where the angle formed by two straight lines is greater than or equal to -10° and less than 10°, and therefore also includes the state where the angle is greater than or equal to -5° and less than 5°. Similarly, "perpendicular" refers to the state where the angle formed by two straight lines is greater than or equal to 80° and less than 100°, and therefore also includes the state where the angle is greater than or equal to 85° and less than 95°.
[0033] In this specification, circles, ellipses, triangles, rectangles, trapezoids, pentagons, or hexagons are not strictly defined. They can be approximate circles, ellipses, triangles, rectangles, trapezoids, pentagons, or hexagons. Small deformations due to tolerances are possible, such as chamfers, curved edges, and other variations.
[0034] In this disclosure, "approximately" and "roughly" refer to situations where the limits are not strictly defined, allowing for errors in the process and measurement. In this disclosure, "roughly the same" means that the values differ by no more than 10%. In this disclosure, "symmetric" refers to situations where the limits are not strictly defined, allowing for approximately symmetry within the range of errors in the process and measurement.
[0035] In this disclosure, "A extends along the direction of B" means that A may include a base portion and a secondary portion connected to the base portion. The base portion is a line, line segment, or strip-shaped body. The base portion extends along the direction of B, and the length of the base portion extending along the direction of B is greater than the length of the secondary portion extending along other directions. In this disclosure, "A extends along the direction of B" refers to "the base portion of A extends along the direction of B." In this disclosure, "A and B are an integral structure" means that A and B are interconnected and formed as a single unit.
[0036] Currently, during the alignment of evaporation equipment and the evaporation substrate, the substrate often sags excessively in the middle after being received, making direct alignment and evaporation processing impossible. The evaporation substrate can be any sheet material used for evaporation, and the material can be glass or silicon. Related evaporation equipment includes... Figure 1 and Figure 2 As shown, the fixing device for the vapor deposition substrate can use multiple crossbeams 20 to support the vapor deposition substrate 10, thereby reducing the sag of the vapor deposition substrate 10. The support position of the crossbeams 20 is located in the vapor deposition area of the vapor deposition substrate 10. A blank area needs to be reserved on the vapor deposition area of the vapor deposition substrate 10 for the crossbeams 20 to support it, which reduces the effective area of the vapor deposition substrate 10 that can be arranged.
[0037] The technical solutions of the embodiments of this application are described in detail below through specific examples.
[0038] Figure 3 This is a schematic diagram of a fixing device according to an exemplary embodiment of the present invention. Figure 4 for Figure 3 The diagram illustrates the fixing device and the installation of the vapor-deposited substrate. This application provides a fixing device for the vapor-deposited substrate, such as... Figure 3 and Figure 4 As shown, the vapor deposition substrate 10 has a vapor deposition area C1 and an edge area C2 surrounding the vapor deposition area C1. The fixing device for the vapor deposition substrate 10 may include a support frame 30, which is configured to be parallel to the first plane 50 and form an annular shape along the extending direction of the edge area C2. The support frame 30 forms a first opening 40 for exposing the vapor deposition area C1, and the support frame 30 has a bearing surface 60 for supporting the edge area C2 on one side of the first direction, which is perpendicular to the first plane 50. Thus, the fixing device for the vapor deposition substrate 10 in this example uses the annular support frame 30 to support the vapor deposition substrate 10, eliminating the need for a crossbeam. The first opening 40 completely exposes the vapor deposition area C1, increasing the effective area that can be arranged on the vapor deposition substrate 10 and improving production capacity.
[0039] In some exemplary embodiments, such as Figure 3 and Figure 4 As shown, the vapor deposition substrate 10 can be a rectangular plate. The vapor deposition area C1 is used for the attachment of the vapor deposition material, and the edge area C2 does not contact the vapor deposition material. The edge area C2 surrounds the outer periphery of the vapor deposition area C1, making the edge area C2 a rectangular ring. Thus, the extension direction of the edge area C2 can be a rectangular ring on a plane parallel to the first plane 50. The support frame 30 can support the edge area C2 of the vapor deposition substrate 10, so that the circumferential edge of the vapor deposition substrate 10 is supported. At the same time, the first opening 40 completely exposes the vapor deposition area C1 of the vapor deposition substrate 10, so that the vapor deposition area C1 is not obstructed by the fixing device. The orthographic projection of the edge area C2 on the first plane 50 and the orthographic projection of the support frame 30 on the first plane 50 overlap, while the orthographic projection of the vapor deposition area C1 on the first plane 50 and the orthographic projection of the support frame 30 on the first plane 50 do not overlap. Meanwhile, the fixing device of the vapor deposition substrate 10 can significantly reduce the sagging of the vapor deposition substrate 10, improve the alignment accuracy, and increase the yield.
[0040] Figure 5 for Figure 3 A schematic diagram of the support frame in the diagram. Figure 6 for Figure 5 A magnified view of part B in the diagram. Figure 7 for Figure 6 Side view of the support unit in the middle. Figure 8 for Figure 6 A diagram showing the retracted state of the support platform. Figures 5 to 7 The support platform 312 is in the unfolded state. Figure 8 The support platform 312 is in a retracted state, as in some exemplary embodiments, such as Figures 3 to 8 As shown, the support frame 30 may include multiple support units 31, which are arranged sequentially around the first opening 40 and are detachably connected. Each support unit 31 includes a base 311 and a support platform 312 disposed on the base 311. The bases 311 of the multiple support units 31 are arranged at intervals around the first opening 40, and the support platforms 312 of adjacent support units 31 are connected. The connection method may be abutment, and the first opening 40 formed may be a rectangular opening.
[0041] In some exemplary embodiments, such as Figures 3 to 8 As shown, a support platform 312 is disposed on one side of the base 311 in the first direction. In some exemplary embodiments, the support platform 312 includes multiple support modules 3121, one support module 3121 is fixedly disposed on the base 311, and the multiple support modules 3121 are movably connected. The support platform 312 has an unfolded state and a retracted state. In the unfolded state, the multiple support modules 3121 are arranged in a straight line along the circumference of the first opening 40, and the end faces of the multiple support modules 3121 on one side in the first direction form a first support surface 61. The support platforms 312 of the multiple support units 31 can form a rectangular ring, and the first support surfaces 61 of the support platforms 312 of the multiple support units 31 constitute an annular bearing surface 60. In the retracted state, at least two support modules 3121 are stacked in the first direction.
[0042] In some exemplary embodiments, such as Figures 3 to 8 As shown, the plurality of support units 31 may include a first support unit 32, wherein the base 311 of the first support unit 32 extends along a second direction, and both the second direction and the third direction are parallel to the first plane and perpendicular to each other. The first support unit 32 may have five support modules 3121, but is not limited thereto; for example, the support modules 3121 may have three, seven, etc. The five support modules 3121 may include a first module 3122, a second module 3123, a third module 3124, a fourth module 3125, and a fifth module 3126, wherein the second module 3123, the third module 3124, the first module 3122, the fourth module 3125, and the fifth module 3126 are connected in sequence, and the first module 3122 is fixedly mounted on the base 311.
[0043] In some exemplary embodiments, such as Figures 3 to 8As shown, the support platform 312 is located on the side of the base 311 closer to the first opening 40 in the second direction. Adjacent support modules 3121 are connected by electric hinges 313, which can drive the two connected modules to rotate relative to each other, thereby enabling the support platform 312 to switch between an extended state and a retracted state. For example, the two ends of the third module 3124 are connected to the second module 3123 and the first module 3122 respectively via electric hinges 313, and the two ends of the fourth module 3125 are connected to the fifth module 3126 and the first module 3122 respectively via electric hinges 313.
[0044] In some exemplary embodiments, such as Figures 3 to 8 As shown, in the unfolded state, the second module 3123, the third module 3124, the first module 3122, the fourth module 3125, and the fifth module 3126 are arranged sequentially along the third direction and form a flat plate parallel to the first plane. The end faces of the multiple support modules 3121 that are away from the base 311 in the first direction form the first support surface 61.
[0045] In some exemplary embodiments, such as Figures 3 to 8 As shown, in the retracted state, the third module 3124 and the second module 3123 are stacked on the first module 3122, and the fourth module 3125 and the fifth module 3126 are also stacked on the first module 3122.
[0046] Figure 9 This is a schematic diagram of another fixing device for this exemplary embodiment. Figure 10 for Figure 9 A three-dimensional view of the first support unit in the middle. Figure 11 for Figure 9 A magnified view of part D in the diagram. Figure 12 for Figure 11 The diagram shows the support platform in its storage location. Figures 9 to 11 The support platform 312 is in the working position. Figure 12 The support platform 312 is in a retracted position, as in some exemplary embodiments, such as Figures 9 to 12 As shown, the support platform 312 is movably connected to the base 311, and the support platform 312 has a working position and a storage position relative to the base 311. In the working position, the support platform 312 extends out of the base 311 to support the vapor-deposited substrate 10; in the storage position, the support platform 312 is housed on or within the base 311. The support platform 312 and the base 311 are slidably connected.
[0047] In some exemplary embodiments, such as Figures 9 to 12As shown, the support platform 312 is located on one side of the base 311 in the first direction, and the base 311 and the support platform 312 are slidably connected. The base 311 is provided with a guide rail 314, and the support platform 312 is configured to slide along the guide rail 314 to switch between a working position and a storage position. Either guide rail 314 extends in a direction parallel to the first plane and away from the first opening 40, and either support platform 312 extends in a straight line along the circumference of the first opening 40.
[0048] In some exemplary embodiments, such as Figures 9 to 12 As shown, the plurality of support units 31 may include a first support unit 32. The second direction and the third direction are both parallel to the first plane and perpendicular to each other. The base 311 of the first support unit 32 is configured as a first base 3111, extending along the second direction. The first opening may be located at one end of the first base 3111 in the second direction. Guide rails 314 on the first base 3111 extend along the second direction. Multiple guide rails 314 may be provided on the first base 3111, all extending along the second direction and spaced apart in the third direction. The support platform 312 of the first base 3111 is configured as a first support platform 3120, extending along the third direction and slidably mounted on the first base 3111.
[0049] In some exemplary embodiments, such as Figures 9 to 12 As shown, when the first support platform 3120 is located at one end of the first base 3111 in the second direction and close to the first opening 40, it is in the working position. When the first support platform 3120 is located at the other end of the first base 3111 in the second direction and away from the first opening 40, it is in the storage position.
[0050] Figure 13 This is a schematic diagram of a support unit in this exemplary embodiment. Figure 14 for Figure 13 A schematic diagram of the working position of the support platform. Figure 13 The support platform at position 312 is located in the storage area. Figure 14 The support platform 312 is in the working position, as in some exemplary embodiments, such as Figure 13 and Figure 14 As shown, the base 311 has a storage slot 3112 on one side in the first direction, and two support platforms 312 are provided. Both support platforms 312 are rotatably connected to the base 311 to switch between a working position and a storage position. In the storage position, the two support platforms 312 are disposed in the storage slot 3112; in the working position, the two support platforms 312 are respectively located on both sides of the base 311 in the circumferential direction of the first opening 40.
[0051] In some exemplary embodiments, such as Figure 13 and Figure 14As shown, the two support platforms 312 can be a first support platform 3127 and a second support platform 3128, respectively. The first support platform 3127 can be rotatably connected to the base 311 via a first rotating shaft 3151, and can be driven to rotate around the first rotating shaft 3151, which extends along a first direction. The second support platform 3128 can be rotatably connected to the base 311 via a second rotating shaft 3152, and can be driven to rotate around the second rotating shaft 3152, which extends along the first direction. Furthermore, the second support platform 3128 can be moved along the second rotating shaft 3152 in the first direction.
[0052] In some exemplary embodiments, such as Figure 13 and Figure 14 As shown, in the storage position, the first support platform 3127 and the second support platform 3128 are stacked in a first direction, with the second support platform 3128 located below the first support platform 3127 in the first direction. Both the first support platform 3127 and the second support platform 3128 are located within the storage slot 3112. When switching to the working position, the first rotating shaft 3151 rotates the first support platform 3127 to one side of the base 311 in a third direction, the third direction being parallel to the first plane and potentially parallel to the extension direction of one edge of the first opening; simultaneously, the second rotating shaft 3152 rotates the second support platform 3128 to the other side of the base 311 in the third direction, and the first direction side moves, causing the first support platform 3127 and the second support platform 3128 to be coplanar.
[0053] In some exemplary embodiments, such as Figure 13 and Figure 14 As shown, in the working position, the end faces of the first support platform 3127 and the second support platform 3128 on the same side in the first direction can be a first end face 611 and a second end face 612, and the first end face 611 and the second end face 612 are coplanar. The base 611 located between the first support platform 3127 and the second support platform 3128 has a third end face 613 that is coplanar with the first end face 611. Thus, the first end face 611, the second end face 612, and the third end face 613 together constitute the first support surface 61, and the first support surfaces 61 of multiple support units together form the aforementioned bearing surface.
[0054] Figure 15 This is a schematic diagram of another fixing device in this exemplary embodiment. In some exemplary embodiments, such as Figure 15 As shown, the support frame 30 includes multiple support units 31. Any support unit 31 can be a straight-extending profile. The multiple support units 31 are connected end to end on a plane parallel to the first plane 50 to form a rectangular frame. The multiple support units 31 are configured as a single piece.
[0055] Figure 16 This is a schematic diagram of another fixing device for this exemplary embodiment. In some exemplary embodiments, such as Figure 16 As shown, the fixing device also includes a cooling plate 70, which is disposed on one side of the support frame 30 in the first direction and spaced apart from the support frame 30. The cooling plate 70 and the support frame 30 are configured to clamp the vapor-deposited substrate 10. The fixing device of this example eliminates the need for an electrostatic chuck (ESC), and the cooling plate 70 has no maintenance costs, which significantly reduces equipment operating costs.
[0056] Figure 17 This is a schematic diagram of a vapor deposition apparatus according to an exemplary embodiment of the present invention. Figure 18 for Figure 17 A split diagram of the vapor deposition equipment in the diagram, in some exemplary embodiments, such as Figure 17 and Figure 18 As shown, this embodiment provides a vapor deposition apparatus, which may include the above-described fixing device for the vapor deposition substrate 10.
[0057] In some exemplary embodiments, such as Figure 17 and Figure 18 As shown, the vapor deposition equipment also includes a mask 80, which may have a mounting groove 81. The mounting groove 81 may be annular and may match the rectangular annular shape of the support frame 30. The support frame 30 may be mounted on the mask 80 and located within the mounting groove 81, so that the support frame 30 may be attached to the surface of the mask 80, and the mask 80 supports and positions the support frame 30.
[0058] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0059] Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first," "second," etc., may explicitly or implicitly include at least one of those features.
[0060] In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise expressly and specifically limited.
[0061] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," "fixing," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral part; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0062] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.
[0063] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.
[0064] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.
Claims
1. A fixing device for a vapor-deposited substrate, the vapor-deposited substrate having a vapor-deposited area and an edge area surrounding the vapor-deposited area, characterized in that, The fixing device for the vapor-deposited substrate includes a support frame, which is configured to be parallel to the first plane and form a ring along the extension direction of the edge region; The support frame forms a first opening to expose the vapor deposition area, and the support frame has a bearing surface on one side in a first direction to support the edge area, the first direction being perpendicular to the first plane.
2. The fixing device for vapor-deposited substrate according to claim 1, characterized in that, The support frame includes multiple support units, which are arranged sequentially around the first opening and are detachably connected.
3. The fixing device for vapor-deposited substrate according to claim 2, characterized in that, Each of the aforementioned support units includes a base and a support platform disposed on the base; The bases of the plurality of support units are arranged circumferentially around the first opening, and the support platforms of adjacent support units are connected.
4. The fixing device for vapor-deposited substrate according to claim 3, characterized in that, The support platform is configured as a first support surface on one end face in the first direction, and the first support surfaces of the support platforms of the plurality of support units constitute the annular bearing surface.
5. The fixing device for vapor-deposited substrate according to claim 4, characterized in that, The support platform includes multiple support modules, one of which is fixedly mounted on the base, and the multiple support modules are movably connected. The support platform has an unfolded state and a retracted state. In the unfolded state, the plurality of support modules are arranged in a circumferential straight line along the first opening, and the end face of the plurality of support modules on one side of the first direction forms the first support surface. In the retracted state, at least two of the support modules are stacked in the first direction.
6. The fixing device for vapor-deposited substrate according to claim 5, characterized in that, The support platform is located on the side of the base that is close to the first opening in a direction parallel to the first plane; Multiple support modules are connected in sequence, and adjacent support modules are connected by electric hinges.
7. The fixing device for vapor-deposited substrate according to claim 3, characterized in that, The support platform is configured to be movably connected to the base, and the support platform has a working position and a storage position relative to the base; In the working position, the support platform is configured to extend beyond the base to support the vapor-deposited substrate; In the storage position, the support platform is housed on or inside the base.
8. The fixing device for vapor-deposited substrate according to claim 7, characterized in that, The support platform is disposed on one side of the base in the first direction, and the base and the support platform are slidably connected. The base is provided with a guide rail, and the support platform is configured to slide along the guide rail to switch between the working position and the storage position.
9. The fixing device for vapor-deposited substrate according to claim 8, characterized in that, At least one of the bases is configured as a first base, the first base extends along a second direction, the first opening is located at one end of the first base in the second direction, and the guide rail on the first base is configured to extend along the second direction; At least one of the support platforms is configured as a first support platform, which extends along a third direction and is slidably disposed on the first base, wherein the second direction and the third direction are both parallel to the first plane and perpendicular to each other.
10. The fixing device for vapor-deposited substrate according to claim 7, characterized in that, The base is provided with a storage slot, and there are two support platforms. The two support platforms are rotatably connected to the base to switch between the working position and the storage position. At the storage location, two support platforms are disposed within the storage slot; In the working position, the two support platforms are respectively located on both sides of the base in the circumferential direction of the first opening.
11. The fixing device for vapor-deposited substrate according to claim 1, characterized in that, The support frame includes multiple support units, which are connected end to end on a plane parallel to the first plane, and the multiple support units are configured as a single piece.
12. The fixing device for vapor-deposited substrates according to any one of claims 1 to 11, characterized in that, It also includes a cooling plate, which is disposed on one side of the support frame in the first direction and spaced apart from the support frame. The cooling plate and the support frame are configured to clamp the vapor-deposited substrate.
13. A vapor deposition apparatus, characterized in that, Includes a fixing device for vapor-deposited substrates as described in any one of claims 1 to 12.
14. The vapor deposition equipment according to claim 13, characterized in that, It also includes a mask template, which has a mounting groove, and the support frame is disposed on the mask template and located in the mounting groove.