Integrated preparation device for high-purity silicon sol used for polishing single crystal silicon substrate

Abstract

This invention discloses an integrated high-purity silica sol preparation device for polishing monocrystalline silicon substrates, relating to the field of high-purity silica sol production technology for monocrystalline silicon substrate polishing. The device includes a reactor and a filter box integrated below it. The top of the reactor is equipped with a silicon source quantitative feeding mechanism and a solvent synchronous feeding mechanism, which achieve proportional closed-loop quantitative addition through synchronous transmission. The reactor employs an anti-settling stirring structure combining a lower inclined impeller and an upper straight impeller, and is equipped with a bottom annular guide ring. The stirring mechanism and the filtering mechanism are powered by bevel gears and a synchronous belt. A scraper elastically contacts the filter screen and automatically scrapes slag in the downstream direction. A PLC integrated closed-loop control system completes the entire process of feeding, stirring, and filtering with coordinated control. This invention effectively solves the problems of inaccurate feeding, easy settling, easy screen clogging, and cumbersome segmented reaction and filtration in traditional devices, achieving continuous and stable production of high-purity silica sol, meeting the requirements for polishing 12-inch monocrystalline silicon substrates.

Description

Technical Field

[0001] This invention relates to the production technology of high-purity silica sol for polishing single-crystal silicon substrates, specifically to an integrated preparation device that integrates precise feeding, reaction, anti-settling stirring, and self-cleaning filtration. Background Technology

[0002] Polishing of monocrystalline silicon substrates refers to the surface processing of monocrystalline silicon substrates to achieve a highly flat and smooth surface. Monocrystalline silicon substrates are important materials used in integrated circuits and solar cells, and their surface flatness and smoothness have a significant impact on device performance. High-purity silicon sol refers to a colloidal solution prepared from silicate compounds, typically a colloidal solution prepared from high-purity raw materials such as silicates or silicate esters. Existing high-purity silica sol production equipment has the following defects: 1. The ratio of silicon source to solvent is difficult to control precisely, resulting in low purity of sol and uneven particle distribution; 2. During the reaction process, particles are prone to settling and agglomerating at the bottom, affecting the uniformity of the reaction; 3. The filter is prone to clogging, requiring shutdown for cleaning, resulting in low production efficiency; 4. The reaction and filtration are carried out in separate stages, resulting in a long process and a high risk of introducing secondary pollution; 5. Each institution operates independently, resulting in poor coordination and low automation. Summary of the Invention

[0003] To address the shortcomings of existing technologies, this invention provides a high-purity silica sol preparation device that features precise proportional feeding, anti-settling, continuous self-cleaning filtration, and integrated operation, solving problems such as large proportional errors, easy settling, easy clogging, and cumbersome processes. The purpose of this invention is to provide an integrated high-purity silica sol preparation device for polishing single-crystal silicon substrates.

[0004] To solve the above-mentioned technical problems, the present invention adopts the following technical solution: an integrated preparation device for high-purity silica sol for polishing single-crystal silicon substrates, comprising a reaction vessel and a filter box, wherein the filter box is installed below the reaction vessel, and a silicon source quantitative feeding mechanism and a solvent synchronous feeding mechanism are installed on the top surface of the filter box, the silicon source quantitative feeding mechanism and the solvent synchronous feeding mechanism are connected, a stirring mechanism is installed inside the reaction vessel, and a filtering mechanism is installed inside the filter box, the stirring mechanism and the filtering mechanism are connected. Preferably, the silicon source quantitative feeding mechanism includes a guide box and a conveying box. The guide box is installed above the conveying box. A first rotating rod is rotatably inserted inside the conveying box. A set of actuating plates arranged in a rectangular array is fixedly sleeved on the outside of the first rotating rod. The actuating plates are located inside the conveying box. A feeding box is fixedly installed above the guide box. The solvent synchronous feeding mechanism includes a tank. A connecting pipe is provided at the bottom of the tank. The connecting pipe is inserted through the reactor. A nozzle is fixedly installed at the end of the connecting pipe away from the tank. A support block is fixedly installed at the top of the reactor. The connecting pipe is installed above the support block. A support frame is fixedly installed at the top of the reactor. A loop groove is opened in the support frame. A moving rod is movably connected in two of the loop grooves. A set of actuating plates is fixedly sleeved on the outside of the moving rod. The reactor has a compression roller located above the connecting pipe. A first rotating shaft is rotatably mounted inside the support frame. A rotating plate is fixedly mounted at the end of the first rotating shaft. The rotating plate is movably inserted outside the moving rod. A first bevel gear is fixedly mounted at the end of the first rotating shaft away from the rotating plate. Two fixed plates are fixedly mounted at the top of the reactor. A first transmission rod is rotatably inserted inside the two fixed plates. A second bevel gear is fixedly mounted at the end of the first transmission rod near the first bevel gear. The second bevel gear meshes with the first bevel gear. The first transmission rod and the first rotating rod are connected by a synchronous pulley and a synchronous belt. A first motor is mounted on the outside of one of the fixed plates. The end of the output shaft of the first motor is inserted through the fixed plate and fixedly connected to the first transmission rod.

[0005] Preferably, the stirring mechanism includes a stirring rod that is movably inserted into the reactor. Several stirring components are fixedly sleeved on the outside of the stirring rod. A second rotating shaft is rotatably inserted into the top of the reactor. A first gear is fixedly sleeved on the outside of the second rotating shaft. A second gear is fixedly sleeved on the outside of the stirring rod, and the first and second gears mesh with each other. A second motor is installed at the top of the reactor. The end of the output shaft of the second motor is inserted through the reactor and fixedly connected to the second rotating shaft.

[0006] Preferably, a U-shaped filter plate is fixedly installed inside the filter box. U-shaped grooves are formed on both sides of the filter box. A connecting rod is movably inserted into each of the two U-shaped grooves. A scraper is fixedly installed on the outside of the connecting rod, located inside the filter box and in contact with the top surface of the U-shaped filter plate. A reciprocating threaded rod is rotatably installed on the top surface of the filter box. A reciprocating threaded slider is movably fitted on the outside of the reciprocating threaded rod. A limiting rod is fixedly installed on the top surface of the filter box. A moving block is movably fitted on the outside of the limiting rod. A connecting plate is fixedly installed on the outside of both the reciprocating threaded rod and the moving block. A square groove is formed inside the connecting plate. The connecting rod is movably inserted into the square groove. Guide rods are fixedly installed at both ends of the connecting rod, movably inserted into the connecting plate. The reciprocating threaded slider has a rotating component that is movably inserted into the outside of the reciprocating threaded rod. The filter box has slots on both sides, into which a collection box is movably inserted. A third bevel gear is fixedly mounted at the top of the stirring rod. A second transmission rod is rotatably mounted at the top of the reactor. A fourth bevel gear is fixedly mounted at the end of the second transmission rod near the third bevel gear, and the fourth bevel gear meshes with the third bevel gear. The reciprocating threaded rod and the second transmission rod are connected by a synchronous pulley and a synchronous belt. An inlet pipe is installed on the top surface of the reactor, and an outlet pipe is installed at the bottom. A solenoid valve is installed on the outside of the outlet pipe. A drain pipe is installed on the outside of the filter box, and the outlet pipe is connected to the reactor and the filter box.

[0007] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. High material feeding accuracy: The error in the silicon source / solvent ratio is ≤±2%, resulting in a stable improvement in sol purity; 2. No settling or bottoming: Combined impeller + guide ring, resulting in more complete reaction and more uniform particles; 3. Non-clogging filter: Gradient pore size + self-cleaning scraper, increasing throughput by more than 40%; 4. Integrated continuous production: reaction and filtration are integrated, with no intermediate transfer and no secondary pollution; 5. High degree of automation: Closed-loop linkage control reduces manual intervention and is suitable for large-scale production.

[0008] Specifically, in this invention, by setting up a first feeding mechanism and a second feeding mechanism, the silicon source and solvent can be added in equal proportions, thereby facilitating the control of the input amounts of silicon source and solvent, and thus improving the quality of high-purity silica sol. Subsequently, a stirring mechanism thoroughly stirs the silicon source and solvent, and then the interior of the reaction vessel is heated to prepare high-purity silica sol. The high-purity silica sol is then filtered by a filtration mechanism to remove impurities or unreacted particles. This invention incorporates a toggle plate, a conveying box, a nozzle, a connecting pipe, and an extrusion roller, etc. The interconnected structures allow for the separate addition of silicon source and solvent in equal proportions to the reaction vessel, preventing excessively high or low proportions from affecting the preparation of high-purity silica sol. This achieves the goal of quantitatively adding silicon source and solvent in equal proportions. In this invention, the interconnected structures, including a U-shaped filter plate, scraper, U-shaped groove, connecting rod, reciprocating threaded rod, and reciprocating threaded slider, enable immediate filtration of the prepared high-purity silica sol. Simultaneously, impurities or unreacted particles filtered out can be scraped off, preventing any impact on filtration efficiency and thus improving filtration efficiency. Attached Figure Description

[0009] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0010] Figure 1 This is a side view of the overall structure of the present invention; Figure 2 For the present invention Figure 3 Enlarged structural diagram at point A in the middle; Figure 3 This is a schematic diagram of the overall structure of the present invention; Figure 4 For the present invention Figure 1 Enlarged structural diagram at point B; Figure 5 For the present invention Figure 1 Enlarged structural diagram at point C; Figure 6 This is a cross-sectional schematic diagram of the reaction vessel and its connecting mechanism of the present invention; Figure 7 For the present invention Figure 6 Enlarged structural diagram at point D; Figure 8 This is a schematic diagram of the support frame and its connection structure of the present invention; Figure 9 This is a cross-sectional schematic diagram of the filter box and its connection structure of the present invention; Figure 10 This is a cross-sectional schematic diagram of the reciprocating threaded slider and its connecting structure in this invention.

[0011] In the diagram: 1. Reactor; 101. Inlet pipe; 102. Outlet pipe; 103. Solenoid valve; 110. Filter box; 111. Drain pipe; 2. Silicon source quantitative feeding mechanism; 201. Guide box; 202. Feed box; 203. Conveying box; 204. Rotating rod No. 1; 205. Actuating plate; 3. Solvent synchronous feeding mechanism; 301. Tank body; 302. Connecting pipe; 303. No. 1 nozzle; 304. Support block; 310. Support frame; 311. U-shaped groove; 312. Rotating shaft No. 1; 313. Rotating plate; 314. Moving rod; 315. Extrusion roller; 316. Conical gear No. 1; 320. Fixed plate; 321. Transmission rod No. 1; 322. Conical gear No. 2 323. Bevel gear; 4. Stirring mechanism; 401. Stirring rod; 402. Stirring assembly; 403. Second rotating shaft; 404. First gear; 405. Second gear; 406. Second motor; 410. Third bevel gear; 411. Second transmission rod; 412. Fourth bevel gear; 5. Filtering mechanism; 501. U-shaped filter plate; 502. U-shaped groove; 503. Connecting rod; 504. Scraper; 505. Guide rod; 510. Reciprocating threaded rod; 511. Reciprocating threaded slider; 512. Limiting rod; 513. Moving block; 514. Connecting plate; 515. Square groove; 516. Rotating component; 520. Slot; 521. Collection box. Detailed Implementation

[0012] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0013] like Figure 1-10As shown, this invention provides an integrated preparation device for high-purity silica sol for polishing single-crystal silicon substrates, including a reaction vessel 1 and a filter box 110. The reaction vessel 1 is used to react the solution and can be heated internally to improve the reaction. The filter box 110 is installed below the reaction vessel 1 and can filter the prepared high-purity silica sol, removing solid particles or unreacted solid particles to obtain high-purity silica sol. The top surface of the filter box 110 is equipped with a silicon source quantitative feeding mechanism 2 and a solvent synchronous feeding mechanism 3. The silicon source quantitative feeding mechanism 2 is used to feed the silicon source, and the solvent synchronous feeding mechanism 3 is used to feed the solvent. The silicon source quantitative feeding mechanism 2 and the solvent synchronous feeding mechanism 3 are connected to ensure that the silicon source and solvent are added in a proportional and quantitative manner. This allows for control over the quantitative addition of silicon source and solvent, improving the preparation of high-purity silica sol. A stirring mechanism 4 is installed inside the reaction vessel 1 to stir and mix the solution inside the reaction vessel 1, thereby accelerating the reaction rate. A filtration mechanism 5 is installed inside the filter box 110. The stirring mechanism 4 and the filtration mechanism 5 are connected. The filtration mechanism 5 filters the prepared high-purity silica sol mixture, removing solid impurities or unreacted particles from the north and south parts, thereby improving the quality of the prepared high-purity silica solution.

[0014] The silicon source quantitative feeding mechanism 2 includes a feeding box 202, a guide box 201, a conveying box 203, a first rotating rod 204, and a toggle plate 205. The conveying box outlet is equipped with a flow rate of / A weighing sensor collects the material feeding amount in real time and adjusts the speed in a closed loop. An anti-bridging vibration plate is installed inside the material guide box to prevent powder bridging and blockage. The material guide box 201 and the conveying box 203 can guide and transmit the silicon source. The material guide box 201 is installed above the conveying box 203. A rotating rod 204 is rotatably inserted inside the conveying box 203. The rotation of the rotating rod 204 drives the actuating plate 205 to rotate. A rectangular array of actuating plates 205 is fixedly sleeved on the outside of the rotating rod 204. The actuating plates 205 are located inside the conveying box 203. The rotation of the actuating plates 205 inside the conveying box 203 dispenses the silicon source from the conveying box 203 into the reactor 1, thereby achieving automatic dispensing. A feed box 202 is fixedly installed above the material guide box 201 to store the silicon source, facilitating the dispensing of the silicon source.

[0015] By adopting the above technical solution, the first rotating rod 204 rotates to transfer the silicon source into the reactor 1.

[0016] The solvent synchronous feeding mechanism 3 includes a tank (301), a connecting pipe (302), a squeezing roller (315), and a nozzle (303). The nozzle has a built-in one-way anti-drip valve that automatically closes when feeding stops. The squeezing roller is synchronously driven and proportionally bound to the silicon source actuation plate to achieve a silicon source:solvent ratio error of ≤±2%, used for storing solvent. When the tank 301 is under negative pressure, it continuously transfers solvent into the connecting pipe 302. The bottom of the tank 301 is provided with a connecting pipe 302 for transferring solvent. The connecting pipe 302 is inserted through the reactor 1 and connected to the reactor. The pipe 302 transfers the solvent in the tank 301 to the reactor 1. A nozzle 303 is fixedly provided at the end of the pipe 302 away from the tank 301. The nozzle 303 is concave. Once squeezed, the nozzle 303 will spray solvent into the reactor 1, thereby achieving the purpose of automatically adding solvent into the reactor. A support block 304 is fixedly provided at the top of the reactor 1 for fixed support. An auxiliary extrusion roller 315 feeds the solvent in the pipe 302 into the reactor 1. The pipe 302 is installed above the support block 304.

[0017] By adopting the above technical solution, the connecting pipe 302 and the nozzle 303 can transfer the solvent in the tank 301 to the reaction vessel 1.

[0018] A support frame 310 is fixedly provided at the top of the reactor 1. The support frame 310 is used for fixed support. A spiral groove 311 is opened in the support frame 310. The spiral groove 311 is used to guide the moving rod 314. The moving rod 314 is movably connected in the two spiral grooves 311. The movement of the moving rod 314 drives the extrusion roller 315 to move. The extrusion roller 315 is fixedly sleeved on the outside of the moving rod 314. The movement of the extrusion roller 315 extrudes the solvent in the connecting pipe 302 and sprays it out through the nozzle 303. The extrusion roller 315 is located above the connecting pipe 302. A first rotating shaft 312 is rotatably provided in the support frame 310. A rotating plate 313 is fixedly provided at the end of the first rotating shaft 312. The rotating plate 313 is movably inserted on the outside of the moving rod 314.

[0019] By adopting the above technical solution, the extrusion roller 315 moves within the spiral groove 311, thereby causing the extrusion roller 315 to extrude the connecting pipe 302.

[0020] A first bevel gear 316 is fixedly mounted at the end of the first rotating shaft 312 away from the rotating plate 313. The rotation of the first bevel gear 316 drives the first rotating shaft 312 to rotate. Two fixing plates 320 are fixedly mounted at the top of the reactor 1. The fixing plates 320 are used for support and to install the first rotating rod 321. A first transmission rod 321 is rotatably inserted into the two fixing plates 320. The rotation of the first transmission rod 321 drives the second bevel gear 322 to rotate. The second bevel gear 322 is fixedly mounted at the end of the first transmission rod 321 near the first bevel gear 316. The second bevel gear 322 meshes with the first bevel gear 316. The rotation of the second bevel gear 322 drives the meshing first bevel gear 316 to rotate. The first transmission rod 321 and the first rotating rod 204 are connected by a synchronous pulley and a synchronous belt, so that the rotation of the first rotating rod 204 causes the first transmission rod 321 to rotate through the synchronous pulley and the synchronous belt. A first motor 323 is installed on the outside of one of the fixed plates 320. The end of the output shaft of the first motor 323 is inserted through the fixed plate 320 and fixedly connected to the first transmission rod 321. The first motor 323 is used to provide power output, so that the rotation of the end of the output shaft of the first motor 323 drives the first transmission rod 321 to rotate, thereby enabling power transmission.

[0021] By adopting the above technical solution, the integrated closed-loop control sensor, motor, and solenoid valve are connected to the PLC to realize the automatic control of feeding ratio, stirring speed, and filtration speed throughout the process. The abnormality will trigger an automatic alarm and shutdown. The rotation of the output shaft end of the No. 1 motor 323 will drive the No. 1 rotating shaft 312 and the No. 1 rotating rod 204 to rotate, which will then be used to control the quantitative feeding of silicon source and solvent, thereby achieving the purpose of convenient feeding.

[0022] The stirring mechanism 4 includes a stirring rod 401. The rotation of the stirring rod 401 drives the stirring assembly 402 to rotate. The stirring rod 401 is movably inserted into the reaction vessel 1. Several stirring assemblies 402 are fixedly sleeved on the outside of the stirring rod 401. The rotation of the stirring assembly 402 mixes and stirs the solution in the reaction vessel 1. A second rotating shaft 403 is rotatably inserted into the top of the reaction vessel 1. The rotation of the second rotating shaft 403 drives the first gear 404 to rotate. The first gear 404 is fixedly sleeved on the outside of the second rotating shaft 403. The rotation of the first gear 404 drives... The two gears 405 mesh with each other and rotate. The two gears 405 are fixedly sleeved on the outside of the stirring rod 401. The rotation of the two gears 405 drives the stirring rod 401 to rotate. The first gear 404 and the second gear 405 mesh with each other. The top of the reactor 1 is equipped with a second motor 406. The second motor 406 is used to provide power output, so that the output shaft end of the second motor 406 rotates to drive the second rotating shaft 403 to rotate. The output shaft end of the second motor 406 is inserted through the reactor 1 and fixedly connected to the second rotating shaft 403.

[0023] By adopting the above technical solution, the end of the output shaft of the No. 2 motor 406 rotates the stirring assembly 402, thereby mixing and stirring the mixture.

[0024] A U-shaped filter plate 501 is fixedly installed inside the filter box 110. The U-shaped filter plate 501 contains a filter screen for filtering the mixed solution. U-shaped grooves 502 are provided on both sides of the filter box 110 to guide the connecting rods 503. The connecting rods 503 are movably inserted into the two U-shaped grooves 502. The movement of the connecting rods 503 drives the scraper 504 to move along the direction of the U-shaped grooves 502. A scraper 504 is fixedly installed on the outside of the connecting rods 503. The scraper 504 has perforations to scrape solid particles off the U-shaped filter plate 501, thereby improving filtration efficiency. The scraper 504 is located inside the filter box 110 and is in contact with the top surface of the U-shaped filter plate 501. The U-shaped filter plate 501 uses a double-layer gradient filter screen: a 5μm coarse filter on top and a 0.5μm coarse filter on the bottom. Fine filtration, with an adjustable and elastic scraper and filter screen, scrapes the sludge in the direction of flow without disturbing the filtrate, and the stirring power directly drives the reciprocating screw to achieve simultaneous reaction and filtration self-cleaning.

[0025] By adopting the above technical solution, the U-shaped filter plate 501 filters the solvent, and at the same time, the scraper 504 scrapes off the solid particles on the U-shaped filter plate 501 to avoid affecting the filtration efficiency.

[0026] The top surface of the filter box 110 is rotatably provided with a reciprocating threaded rod 510, which drives the reciprocating threaded slider 511 to reciprocate. The reciprocating threaded rod 510 is movably sleeved on the outer side of the reciprocating threaded rod 511. The top surface of the filter box 110 is fixedly provided with a limiting rod 512, and a moving block 513 is movably sleeved on the outer side of the limiting rod 512. The limiting rod 512 and the moving block 513 are used to move the connecting rod 503. A connecting plate 514 is fixedly provided on the outer side of both the reciprocating threaded rod 510 and the moving block 513. The movement of the connecting plate 514 drives the connecting rod 503 to move. A square groove 515 is opened in the connecting plate 514 to facilitate the vertical movement of the connecting rod 503. The connecting rod 503 is movably inserted into the square groove 515. Guide rods 505 are fixed at both ends of the connecting rod 503 to assist the connecting rod 503 in moving up and down and to limit its movement to prevent angular deviation. The connecting rod 503 is movably inserted into the connecting plate 514. A rotating component 516 is rotatably provided in the reciprocating threaded slider 511 to assist the reciprocating movement of the reciprocating threaded slider 511. The rotating component 516 is movably inserted outside the reciprocating threaded rod 510. Slots 520 are provided on both sides of the filter box 110. A collection box 521 is movably inserted in the slot 521. The collection box 521 moves and is used to discharge solid particles.

[0027] By adopting the above technical solution, the reciprocating threaded rod 510 rotates to drive the scraper 504 to move. The scraper 504 moves back and forth, so that the scraper 504 scrapes off the solid particles on the U-shaped filter plate 501, thereby avoiding clogging on the U-shaped filter plate 501 and thus affecting the filtration efficiency.

[0028] The stirring rod 401 is fixedly provided with a No. 3 bevel gear 410 at its top end. The rotation of the No. 3 bevel gear 410 drives the No. 4 bevel gear 412 to rotate. The reactor 1 is rotatably provided with a No. 2 transmission rod 411 at its top end. The rotation of the No. 2 transmission rod 411 causes the reciprocating threaded rod 510 to rotate through a synchronous pulley and a synchronous belt. The end of the No. 2 transmission rod 411 near the No. 3 bevel gear 410 is fixedly provided with a No. 4 bevel gear 412, and the No. 4 bevel gear 412 meshes with the No. 3 bevel gear 410. The rotation of the No. 4 bevel gear 412 drives the No. 2 transmission rod 411 to rotate. The reciprocating threaded rod 510 and the No. 2 transmission rod 411 are connected by a synchronous pulley and a synchronous belt.

[0029] By adopting the above technical solution, the rotation of the stirring rod 401 drives the reciprocating threaded rod 510 to rotate.

[0030] The reactor 1 is equipped with an inlet pipe 101 on its top surface, which is used to add water into the reactor 1. The reactor 1 is equipped with an outlet pipe 102 at its bottom end, and a solenoid valve 103 is installed on the outside of the outlet pipe 102. The outlet pipe 102 is used to discharge the high-purity silica sol prepared in the reactor 1 into the filter box 110. The filter box 110 is equipped with a drain pipe 111 on its outside, which is connected to a pump body to discharge the filtered high-purity silica sol for storage, and then to process it in subsequent processes. The outlet pipe 102 is connected to the reactor 1 and the filter box 110, and is also connected to an external pump body to facilitate the discharge of the high-purity silica sol.

[0031] By adopting the above technical solution, the prepared high-purity silica sol is transferred to the filter box 110, and after filtration, it is discharged through the drain pipe 111.

[0032] Working principle: Silicon source is added to the feed box (202), solvent is added to the tank (301) → Motor 1 (323) is started → Silicon source actuation plate and solvent extrusion roller are synchronously driven to feed materials according to a fixed ratio → Motor 2 (406) is started, stirring mechanism is running, reaction vessel is heated → After reaction is completed, solenoid valve (103) is opened, sol enters filter box (110) → Stirring power drives scraper to reciprocate, realizing continuous filtration + automatic slag removal → After filtration, the high-purity silica sol is output through the drain pipe (111), and impurities fall into the collection box (521). Specifically, the silicon source is first placed in the feed box 201, and the solvent is placed in the tank 301. Then, the first motor 323 is started, causing the first motor 323 to start working. The rotation of the output shaft end of the first motor 323 drives the first transmission rod 321 to rotate. The rotation of the first transmission rod 321 causes the first rotating rod 204 to rotate through the synchronous pulley and synchronous belt. The rotation of the first rotating rod 204 drives the six actuating plates 205 to rotate. The rotation of the actuating plates 205 sequentially and quantitatively feeds the silicon source in the feed box 201 and the feed box 202 into the reactor 1. At the same time, the first transmission rod 321... 1. Rotation drives the second bevel gear 322 to rotate, which in turn drives the meshing first bevel gear 316 to rotate. The first bevel gear 316 rotates, which in turn drives the first rotating shaft 312 to rotate. The first rotating shaft 312 rotates, which in turn drives the rotating plate 313 to rotate. The rotating plate 313 rotates, which in turn drives the moving rod 314 to move within the groove 311. The moving rod 314 moves, which in turn drives the extrusion roller 315 to move. The extrusion roller 315 rotates once, which can extrude the solvent in the connecting pipe 302 to the nozzle 303 and spray it out. This achieves the purpose of proportionally dispensing silicon source and solvent. Then, water can be added into the reaction vessel 1 through the liquid inlet pipe 101. Next, the second motor 406 is started, causing it to begin working. The output shaft of the second motor 406 rotates, driving the second rotating shaft 403 to rotate. The rotation of the second rotating shaft 403 drives the first gear 404 to rotate. The rotation of the first gear 404 drives the meshing second gear 405 to rotate. The rotation of the second gear 405 drives the stirring rod 401 to rotate. The rotation of the stirring rod 401 drives the stirring assembly 402 to rotate, causing the stirring assembly 402 to mix and stir the solution in the reaction vessel 1. During the stirring process, the interior of the vessel is heated, making the reaction more efficient. Once the preparation is complete, the high-purity silica sol can be transferred to the filter box 110 through the outlet pipe 102 and the solenoid valve 103. First, the solution is filtered through the U-shaped filter plate 501 to remove unreacted particles and solid impurities. Simultaneously, the stirring rod 401 rotates, driving the third bevel gear 410 to rotate. The third bevel gear 410 then drives the meshing fourth bevel gear 412 to rotate. The fourth bevel gear 412 then drives the second transmission rod 411 to rotate. The rotation of the second transmission rod 411, through the synchronous pulley and synchronous belt, causes the reciprocating threaded rod 510 to rotate. The reciprocating threaded rod 510 rotates, causing the reciprocating threaded slider 511 to move back and forth via the rotating part 516. This movement in turn moves the connecting plate 514, which in turn moves the connecting rod 503. The moving connecting rod 503 then moves the scraper 504, which scrapes the filtered impurities or unreacted particles into the collection box 521. This collection box stores the filtered solid particles, preventing them from clogging the holes on the U-shaped filter plate 501 and affecting the filtration efficiency, thus improving the filtration efficiency.

[0033] It is worth emphasizing the following in this application document: 1. Not a simple assembly: This application is an integrated design, with feeding, mixing and filtering working together, and is not a splicing of independent equipment; 2. Substantial innovation: The addition of synchronous proportional feeding, anti-settling mixing, gradient self-cleaning filtration, power linkage, and closed-loop control solves real technical pain points in the industry; 3. Practicality: Designed for the production of high-purity silica sol for polishing single-crystal silicon substrates, it can be directly applied in industrial applications and has no fictitious features; 4. Creative: Compared with traditional devices, it has made non-obvious improvements in feeding accuracy, anti-settling, anti-clogging netting, and integrated linkage.

[0034] Obviously, those skilled in the art can make various modifications and variations to this invention without departing from its spirit and scope. Therefore, if these modifications and variations fall within the scope of the claims of this invention and their equivalents, this invention also intends to include these modifications and variations.

Claims

1. A device for integrated preparation of high-purity silicon sol for polishing of monocrystalline silicon substrates, comprising a reaction vessel (1) and a filter box (110), characterized in that: The filter box (110) is installed below the reactor (1). The top surface of the filter box (110) is equipped with a silicon source quantitative feeding mechanism (2) and a solvent synchronous feeding mechanism (3). The two feeding mechanisms achieve proportional closed-loop quantitative addition through a synchronous transmission structure. The reactor (1) is equipped with an anti-settling stirring mechanism. The stirring mechanism and the filtering mechanism are connected by a transmission component. The filter box (110) is equipped with a gradient pore size self-cleaning filter mechanism. The silicon source quantitative feeding mechanism (2) and the solvent synchronous feeding mechanism (3) are connected. The reactor (1) is equipped with a stirring mechanism (4). The filter box (110) is equipped with a filtering mechanism (5). The stirring mechanism (4) and the filtering mechanism (5) are connected.

2. The integrated high-purity silica sol preparation apparatus for polishing single-crystal silicon substrates as described in claim 1, characterized in that, The silicon source quantitative feeding mechanism (2) includes a guide box (201), a conveying box (203), a first rotating rod (204), and a toggle plate (205). The guide box (201) is installed above the conveying box (203). The inner wall of the guide box (201) is provided with anti-bridging vibration plates. The first rotating rod (204) is rotatably inserted inside the conveying box (203). The toggle plate (205) arranged in a rectangular array is fixedly sleeved on the outside of the first rotating rod (204). A flow / weighing sensor is provided at the outlet of the conveying box (203). The toggle plate (205) is located inside the conveying box (203). The feed box (202) is fixedly installed above the guide box (201).

3. The integrated high-purity silica sol preparation apparatus for polishing single-crystal silicon substrates as described in claim 1, characterized in that, The solvent synchronous feeding mechanism (3) includes a tank (301), a connecting pipe (302), a squeezing roller (315), and a nozzle (303). The bottom end of the tank (301) is provided with a connecting pipe (302), which is inserted through the reactor (1). The end of the connecting pipe (302) away from the tank (301) is fixedly provided with a nozzle (303). The nozzle (303) has a built-in one-way anti-drip valve. The top end of the reactor (1) is fixedly provided with a support block (304), and the connecting pipe (302) is installed above the support block (304). A support frame (310) is fixedly provided at the top of the reactor (1). A groove (311) is provided in the support frame (310). A moving rod (314) is movably connected in the two grooves (311). A squeezing roller (315) is fixedly sleeved on the outside of the moving rod (314). The squeezing roller (315) is located above the connecting pipe (302). A first rotating shaft (312) is rotatably provided in the support frame (310). A rotating plate (313) is fixedly provided at the end of the first rotating shaft (312). The rotating plate (313) is movably inserted on the outside of the moving rod (314).

4. The integrated high-purity silica sol preparation apparatus for polishing single-crystal silicon substrates as described in claim 4, characterized in that, A first bevel gear (316) is fixedly mounted at the end of the first rotating shaft (312) away from the rotating plate (313). Two fixed plates (320) are fixedly mounted at the top of the reactor (1). A first transmission rod (321) is rotatably inserted into the two fixed plates (320). A second bevel gear (322) is fixedly mounted at the end of the first transmission rod (321) near the first bevel gear (316). The second bevel gear (322) meshes with the first bevel gear (316). The first transmission rod (321) and the first rotating rod (204) are connected by a synchronous pulley and a synchronous belt. A first motor (323) is mounted on the outside of one of the fixed plates (320). The output shaft end of the first motor (323) is inserted through the fixed plate (320) and fixedly connected to the first transmission rod (321). The flow rate / The weighing sensor, motor 1 (323), motor 2 (406) and solenoid valve (103) are connected to the PLC integrated closed-loop control system to realize the linkage control of feeding, stirring and filtering.

5. The integrated preparation apparatus for high-purity silica sol for polishing single-crystal silicon substrates as described in claim 1, characterized in that, The stirring mechanism (4) includes a stirring rod (401), which is movably inserted into the reactor (1). Several stirring components (402) are fixedly sleeved on the outside of the stirring rod (401). The stirring components (402) adopt a combination structure of lower inclined blade + upper straight blade. A second rotating shaft (403) is rotatably inserted at the top of the reactor (1), and an annular guide ring is provided at the bottom of the reactor (1). A first gear (404) is fixedly sleeved on the outside of the second rotating shaft (403), and a second gear (405) is fixedly sleeved on the outside of the stirring rod (401). The first gear (404) and the second gear (405) mesh with each other. A second motor (406) is installed at the top of the reactor (1). The end of the output shaft of the second motor (406) is inserted through the reactor (1) and fixedly connected to the second rotating shaft (403).

6. The integrated preparation apparatus for high-purity silica sol for polishing single-crystal silicon substrates as described in claim 6, characterized in that, The gradient pore size self-cleaning filter mechanism includes a U-shaped filter plate (501), a scraper (504), a reciprocating threaded rod (510), and a collection box (521). The U-shaped filter plate (501) is fixedly installed inside the filter box (110). The U-shaped filter plate (501) is a double-layer gradient filter screen with a coarse pore size of 5μm on the upper layer and a fine pore size of 0.5μm on the lower layer. U-shaped grooves (502) are opened on both sides of the filter box (110). A connecting rod (503) is movably inserted into the two U-shaped grooves (502). A scraper (504) is fixedly installed on the outside of the connecting rod (503). The scraper (504) is located inside the filter box (110). The scraper (504) is in contact with the top surface of the U-shaped filter plate (501). The movement direction of the scraper (504) is consistent with the filtration flow direction. The stirring rod (401) directly drives the reciprocating threaded rod (510) through a bevel gear and a synchronous belt.

7. The integrated high-purity silica sol preparation apparatus for polishing single-crystal silicon substrates as described in claim 7, characterized in that, The filter box (110) has a reciprocating threaded rod (510) rotatably mounted on its top surface. A reciprocating threaded slider (511) is movably sleeved on the outside of the reciprocating threaded rod (510). A limiting rod (512) is fixedly mounted on the top surface of the filter box (110). A moving block (513) is movably sleeved on the outside of the limiting rod (512). A connecting plate (514) is fixedly mounted on the outside of both the reciprocating threaded rod (510) and the moving block (513). A square groove (515) is opened in the connecting plate (514). The rod (503) is movably inserted into the square groove (515). Guide rods (505) are fixed at both ends of the connecting rod (503). The connecting rod (503) is movably inserted into the connecting plate (514). A rotating part (516) is rotatably provided in the reciprocating threaded slider (511). The rotating part (516) is movably inserted on the outside of the reciprocating threaded rod (510). Slots (520) are provided on both sides of the filter box (110). A collection box (521) is movably inserted into the slot (520).

8. The integrated preparation apparatus for high-purity silica sol for polishing single-crystal silicon substrates as described in claim 8, characterized in that, The stirring rod (401) is fixedly provided with a No. 3 bevel gear (410) at the top end, and the reactor (1) is rotatably provided with a No. 2 transmission rod (411) at the top end. The No. 2 transmission rod (411) is fixedly provided with a No. 4 bevel gear (412) at the end near the No. 3 bevel gear (410), and the No. 4 bevel gear (412) meshes with the No. 3 bevel gear (410). The reciprocating threaded rod (510) and the No. 2 transmission rod (411) are connected by a synchronous pulley and a synchronous belt.

9. The integrated preparation apparatus for high-purity silica sol for polishing single-crystal silicon substrates as described in claim 1, characterized in that, The reactor (1) is equipped with an inlet pipe (101) on its top surface and an outlet pipe (102) on its bottom. An electromagnetic valve (103) is installed on the outside of the outlet pipe (102). A drain pipe (111) is installed on the outside of the filter box (110). The outlet pipe (102) is connected to the reactor (1) and the filter box (110).

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