Crystal grain high voltage detection module and device thereof

By using a pressure chamber structure composed of a fixed ring, a movable ring, and a substrate, the problems of poor contact and electric arc in high-voltage testing of bare grains are solved, achieving stable high-voltage testing and reducing costs and energy consumption.

CN122307280APending Publication Date: 2026-06-30CHROMA ATE (SUZHOU) CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHROMA ATE (SUZHOU) CO LTD
Filing Date
2024-12-30
Publication Date
2026-06-30

AI Technical Summary

Technical Problem

In semiconductor manufacturing, arcing is prone to occur during high-voltage detection of bare dies. Probe wear leads to poor contact, and providing a high-pressure environment is complex and difficult to maintain, resulting in high costs and increased energy consumption.

Method used

The pressure chamber structure consists of a fixed ring, a movable ring, and a substrate. The probe height is automatically adjusted by the relative movement of the movable ring and the stage to maintain a stable high-pressure environment, avoid contact between the probe and the die, and prevent the generation of electric arc.

Benefits of technology

It achieves stable maintenance of gas pressure during high-pressure detection, reduces probe wear, avoids grain damage, and lowers detection costs and energy consumption.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN122307280A_ABST
    Figure CN122307280A_ABST
Patent Text Reader

Abstract

This invention discloses a high-voltage testing module and device for a die. The high-voltage testing device includes a high-voltage testing module and a stage. The high-voltage testing module includes a fixed ring, a movable ring, and a substrate. The movable ring is coupled to the fixed ring, and the substrate is coupled to the fixed ring. The fixed ring, movable ring, and substrate form a pressure chamber, and multiple probes on the substrate are located within the pressure chamber. The stage is located below the movable ring, and the downward force exerted by the movable ring on the stage is greater than the gas pressure reaction force provided by the gas pressure within the pressure chamber. The movable ring abuts against the stage. Therefore, the movable ring can abut against the stage to form a sealed chamber for high-voltage testing, thereby maintaining the pressure within the chamber.
Need to check novelty before this filing date? Find Prior Art