A method of manufacturing a patterned anti-glare glass sheet

Abstract

This invention relates to a method for manufacturing a patterned anti-glare glass sheet, comprising the following steps: S1, depositing a barrier film on a first surface of a glass substrate; S2, patterning the barrier film to form a first pattern and a second pattern, wherein the first pattern includes alternating barrier portions and cutout portions at the micrometer level, and the second pattern is an alignment mark pattern; S3, using the barrier film as a mask, etching the first surface of the glass substrate with a glass etchant to form a concave-convex structure layer corresponding to the first pattern; the portion of the first surface of the glass substrate corresponding to the second pattern is etched by the glass etchant to form an alignment mark; S4, precisely positioning based on the alignment mark, cutting the glass substrate to form a cutting contour, thereby obtaining a patterned anti-glare glass sheet. The patterned anti-glare glass sheet produced here, after lamination, ensures precise alignment between its pattern and the display area of ​​the display, thereby improving overall display quality and manufacturing yield.

Description

Technical Field

[0001] This invention relates to a method for manufacturing glass sheets, and more specifically to a method for manufacturing a patterned anti-glare glass sheet. Background Technology

[0002] To achieve anti-glare (AG) effects in monitors, reduce light pollution, improve visual comfort, and enhance the tactile feel of the monitor surface, an anti-glare glass sheet can be bonded to the monitor surface. This glass sheet has a densely distributed pattern of coarse particles on its surface, thus eliminating specular reflections. However, the light emitted by the monitor's pixels or sub-pixels (such as R, G, and B sub-pixels) may be affected by the random refraction of these coarse particles. When displaying certain images (especially mid-grayscale or monochrome images), this can produce randomly distributed and flickering color noise, a phenomenon known in the industry as AG flicker (AGSparkle).

[0003] To address the aforementioned AG flicker problem, a solution has been proposed: patterned anti-glare glass sheets. This involves pre-setting a patterned barrier film on the surface of the glass sheet, followed by etching to create a patterned particle distribution. Typically, the patterned particle distribution can be designed as periodic patches that overlap with the pixels or sub-pixels of the display (e.g., each pixel or sub-pixel overlaps with a patch of unit particle distribution), thereby reducing AG flicker caused by the random refraction of light emitted from pixels or sub-pixels by coarse particles.

[0004] However, since glass sheets are generally made by cutting, the patterned particle distribution often has an angular deviation from the cutting contour during the cutting process. After cutting, the glass sheet usually does not have a matching point, and the bonding with the display often relies on the contour of the glass sheet for alignment. Therefore, after bonding, the particle distribution pattern on the glass sheet often has an angular deviation from the pixels or sub-pixels of the display, resulting in a slight difference between the particle distribution and the periodic arrangement of the display pixels. This leads to moiré patterns (i.e., uneven brightness of the image, especially showing a grid-like brightness variation) in the display screen. Summary of the Invention

[0005] The technical problem to be solved by this invention is to provide a method for manufacturing a patterned anti-glare glass sheet, which, after lamination, ensures precise alignment of the pattern with the display area of ​​the monitor, thereby improving overall display quality and manufacturing yield. The technical solution adopted is as follows: A method for manufacturing a patterned anti-glare glass sheet includes the following steps: S1. Provide a glass substrate, and deposit a barrier film on the first surface of the glass substrate; Its characteristic is that it further includes the following steps: S2. The barrier film is patterned to form a first pattern and a second pattern. The first pattern includes barrier portions and hollow portions distributed alternately at the micron level, and the second pattern is an alignment mark pattern. S3. Using the patterned barrier film as a mask, the first surface of the glass substrate is etched with a glass etchant. Within the area of ​​the first pattern, the portion of the first surface of the glass substrate corresponding to the hollow part is etched deeper by the glass etchant to form a recess, and the portion of the first surface of the glass substrate corresponding to the barrier part is etched shallower by the glass etchant to form a convex part. Thus, a concave-convex structure layer corresponding to the first pattern is formed on the first surface of the glass substrate. The concave-convex structure layer is composed of multiple convex parts and multiple recesses arranged alternately. The portion of the first surface of the glass substrate corresponding to the second pattern is etched with a glass etchant to form an alignment mark. S4. Based on the alignment marks, the glass substrate is precisely positioned and cut to form a cutting contour that has a precise alignment relationship with the concave-convex structure layer, thereby obtaining the patterned anti-glare glass sheet.

[0006] In the above-mentioned method for manufacturing patterned anti-glare glass sheets, in step S1, the glass substrate can be made of transparent ordinary glass or tempered glass, with a thickness typically ranging from 0.1 to 5 mm. In step S2, to achieve the construction of micron-level patterns, a photolithography process is generally used to pattern the barrier film, forming a first pattern and a second pattern on the barrier film. The first pattern is usually located in the main area of ​​the glass substrate (such as a large area in the middle), while the second pattern is located at the edge of the glass substrate. The two are formed synchronously using the same mask pattern and have a definite relative positional relationship. The "barrier portion" in the first pattern corresponds to the part of the barrier film retained after photolithography, while the "cutout portion" is the part of the barrier film that is removed. The second pattern is generally designed as a cutout pattern with alignment marks (such as a cross shape, dots, etc.), so that after step S3, the alignment marks exist as recessed grooves on the first surface of the glass substrate. In step S3, the glass etchant can be hydrofluoric acid or buffered oxide etchant (BOE, i.e., a solution prepared by mixing ammonium bifluoride with hydrofluoric acid or other acidic solutions in a specific ratio). In the first pattern area, the barrier film can prevent the glass etchant from directly corroding the first surface of the glass substrate, allowing the glass etchant to penetrate vertically only through the cutouts of the barrier film, forming a deeper etching. Subsequently, a shallower etching is formed below the barrier through lateral erosion, while the barrier film in this area is removed, ultimately forming a concave-convex structure layer consistent with the first pattern of the barrier film. The concave-convex structure layer has preset patterned features, and the distribution of the convex parts of the concave-convex structure layer is determined by the first pattern, not randomly generated during the etching process. In the second pattern area, the cutouts of the barrier film allow the glass etchant to accurately transfer the pattern of the alignment mark to the first surface of the glass substrate. In step S4, the glass substrate is precisely positioned according to the alignment marks on its surface (alignment can be achieved through lens image recognition). The glass substrate is contour-cut using methods such as precision engraving or laser cutting to obtain a glass sheet with a specific shape. This ensures that the cutting contour and the alignment marks maintain a predetermined geometric relationship, thereby maintaining precise alignment consistency between the cutting contour and the concave-convex structure layer. This ensures accurate alignment between the pattern and the display area of ​​the display, preventing moiré patterns from appearing in the display image and improving the overall display quality and manufacturing yield.

[0007] To achieve the construction of micron-level patterns, as a preferred embodiment of the present invention, the photolithography process used in step S2 is as follows: first, photoresist is uniformly coated on the surface of the barrier film, then exposure is performed using a mask with micron-level patterns, then development is performed to etch the barrier film, and finally the remaining photoresist is removed, thereby forming the barrier portion and the cutout portion on the barrier film.

[0008] In a preferred embodiment of the present invention, in step S1, the barrier film is a silicon nitride (Si3N4) thin film, which is formed on the first surface of the glass substrate by physical vapor deposition (PVD) or chemical vapor deposition (CVD). The thickness of the barrier film is generally controlled to be about 1 μm. When the barrier film is a silicon nitride thin film, in step S2, wet etching can be performed using phosphoric acid (H3PO4), or dry etching can be performed using plasma containing fluorine gases (such as CF4, CHF3, SF6, NF3, etc.).

[0009] The patterned anti-glare glass sheet is typically designed for use with specific dot matrix displays. As a preferred embodiment of the invention, the first pattern is composed of at least one two-dimensionally tiled sample block, each sample block comprising multiple of the aforementioned blocking portions and multiple of the aforementioned hollow portions arranged in the same manner. Specifically, the size ratio of the sample block corresponds one-to-one with the pixels or sub-pixels of the display, and its tiling method also matches the array structure of the pixels or sub-pixels. For example, in a specific application: when the anti-glare glass sheet is used in a color TFT liquid crystal display, the aspect ratio of the sample block is consistent with the aspect ratio of the sub-pixels (e.g., 3:1), and the array direction and spacing are precisely corresponding.

[0010] To adapt to mainstream dot-matrix displays, as a further preferred embodiment of the present invention, the two-dimensional tiling is a square tiling. The essence of two-dimensional tiling is to repeatedly cover the entire plane through two linearly independent translational directions, which can be defined as a first axis and a second axis; the square tiling means that the first axis and the second axis are orthogonal to each other, thus forming a regular rectangular or square grid structure. Based on the above design, the periodic characteristics of the first pattern are continued in subsequent processes. In step S3, the formed convex distribution also presents as repeating units of the two-dimensional tiling, i.e., sample blocks; in step S4, the cutting contour of the glass substrate is aligned with the first or second axis of the tiling structure. For example, when the cutting edge is a straight line, the straight edge remains parallel to the first or second axis, thereby ensuring precise alignment of the pattern and the display area, improving overall display quality and manufacturing yield.

[0011] The present invention also provides another method for manufacturing a patterned anti-glare glass sheet, comprising the following steps: S1. Provide a glass substrate, and deposit a barrier film on the first surface of the glass substrate; Its characteristic is that it further includes the following steps: S2. The barrier film is patterned using photolithography to form a barrier pattern. The barrier pattern is formed by laying at least two types of samples in a two-dimensional direction. Each sample contains micron-sized alternating barrier portions and hollow portions. The barrier pattern contains at least one alignment region. The alignment region is divided into four quadrant regions by a first axis and a second axis through the alignment point set inside it. These are the first quadrant region, the second quadrant region, the third quadrant region, and the fourth quadrant region. The same sample is present in the same quadrant region, while the sample in adjacent quadrant regions is different from each other. S3. Using the barrier film as a mask, the first surface of the glass substrate is etched with a glass etchant. In the area of ​​the barrier pattern, the part of the first surface of the glass substrate corresponding to the barrier part is etched shallowly by the glass etchant to form a convex part, while the part of the first surface of the glass substrate corresponding to the hollow part is etched deeper by the glass etchant to form a concave part. Thus, a concave-convex structure layer corresponding to the barrier pattern is formed on the first surface of the glass substrate. The concave-convex structure layer is formed by periodically laying multiple concave-convex distribution blocks in a two-dimensional direction. Each concave-convex distribution block includes multiple convex parts and multiple concave parts arranged alternately. S4. By identifying the differences in the uneven distribution of the uneven structural layer, the four quadrants of the alignment region are distinguished, and the alignment point is accurately located; S5. Based on the alignment points, the glass substrate is precisely aligned, and the glass substrate is cut to form a cutting contour with a precise alignment relationship with the concave-convex structure layer, thereby obtaining the patterned anti-glare glass sheet.

[0012] In the above-mentioned method for manufacturing patterned anti-glare glass sheets, in step S1, the glass substrate can be made of transparent ordinary glass or tempered glass, and its thickness range is usually 0.1 to 5 mm; in step S2, in order to realize the construction of micron-level patterns, the barrier film is patterned by photolithography to form a barrier pattern on the barrier film. The barrier pattern is formed by periodically laying multiple samples in a two-dimensional direction. The "barrier part" in the sample corresponds to the part of the barrier film retained after photolithography, and the "cutout part" is the part of the barrier film that is removed. In step S3, the glass etchant can be hydrofluoric acid or buffered oxide etching solution (BOE, i.e., a solution prepared by mixing ammonium bifluoride with hydrofluoric acid or other acidic solutions in a specific ratio). In the barrier pattern area, the barrier portion of the barrier film can prevent the glass etchant from directly corroding the first surface of the glass substrate, allowing the glass etchant to penetrate vertically only through the cutouts to form a deeper etching. Subsequently, a shallower etching is formed below the barrier portion through lateral erosion, while the barrier film in this area is removed, ultimately forming a concave-convex structure layer consistent with the barrier pattern of the barrier film. This concave-convex structure layer is patterned, and its distribution characteristics are consistent with the original barrier pattern, thereby synchronously forming the alignment region. The alignment region is also divided into four quadrant regions, each quadrant region has the same concave-convex distribution sample block, and the concave-convex distribution sample blocks between adjacent quadrant regions are different. The intersection point of each quadrant region is defined as the alignment point. In step S4, the internal structure of each concave-convex distribution sample block can be magnified and identified by the alignment lens. The concave and convex parts are distributed, and by moving the glass substrate or lens, the lens eventually finds the positioning point. When the positioning point is found, the lens recognizes that the four quadrant areas are within the field of view and can be further adjusted to further align their intersection point (e.g., making the intersection point at the center of the field of view, this intersection point is the alignment point). This allows for precise positioning of the alignment point. Since the alignment point is hidden in the concave and convex structure layer, it does not occupy the edge of the glass substrate, thus improving the utilization rate of the glass substrate. In step S5, based on the alignment point located in step S4, the glass substrate can be contour-cut by means of precision carving or laser cutting, thereby obtaining the patterned anti-glare glass sheet with a specific shape, and ensuring that the cutting contour and the alignment point maintain a predetermined geometric relationship, thereby maintaining precise alignment consistency between the cutting contour and the concave and convex structure layer, thus ensuring precise alignment between the pattern and the display area of ​​the display, improving the overall display quality and manufacturing yield.

[0013] In a preferred embodiment of the present invention, in step S2, the blocking pattern includes two alignment regions, which are located in the diagonal regions of the blocking pattern.

[0014] As another preferred embodiment of the present invention, in step S2, the blocking pattern includes four alignment regions, which are respectively located in the four corner regions of the blocking pattern.

[0015] The anti-glare glass sheet is typically designed for use with a specific dot matrix display. Therefore, the size ratio of the sample block or the unevenly distributed sample block corresponds one-to-one with the pixels or sub-pixels of the display, and the tiling method also matches the array structure of the pixels or sub-pixels. Since the pixels or sub-pixels of the display are generally arranged in a square array, as a preferred embodiment of the present invention, the unevenly distributed sample block is tiled in a square, having a first axis and a second axis that are perpendicular to each other. When the sample block is tiled in a square, each quadrant corresponds to a quadrant of an orthogonal coordinate system (with the alignment point as the origin).

[0016] As a preferred embodiment of the present invention, the concave-convex distribution sample block has concave and convex portions distributed without rotational symmetry, and different sample blocks are formed by rotating the same sample block by 180°. Thus, different concave-convex distribution sample blocks have the same anti-glare performance relative to the pixels of the display, avoiding the boundary between adjacent quadrant areas being visible to the naked eye (in S4, different quadrant areas can only be distinguished by magnification through a positioning lens).

[0017] As another preferred embodiment of the present invention, the concave-convex distribution sample block has a non-axisymmetric distribution of concave and convex portions, and different concave-convex distribution sample blocks are formed by folding the same block. Thus, different concave-convex distribution sample blocks have the same anti-glare performance relative to the pixels of the display, avoiding the boundary between adjacent quadrants being visible to the naked eye (in step S4, different quadrants need to be distinguished by magnification through a positioning lens).

[0018] As a preferred embodiment of the present invention, the convex-concave distribution sample block includes a middle area and an edge area. The concave and convex portions of the edge area of ​​different convex-concave distribution sample blocks are distributed in the same way, while the concave and convex portions of the middle area of ​​different convex-concave distribution sample blocks are distributed differently. Thus, the convex-concave distribution sample blocks can be naturally connected, avoiding sample block misalignment at the quadrant boundary, thereby preventing the boundary between adjacent quadrant areas from being visible to the user.

[0019] As a preferred embodiment of the present invention, the first and third quadrant regions use one type of sample block, while the second and fourth quadrant regions use another type of sample block. This reduces the variety of sample blocks and helps to reduce the visual perception of the boundaries between adjacent quadrants.

[0020] As a preferred embodiment of the present invention, the sample blocks in the first quadrant, second quadrant, third quadrant, and fourth quadrant are all different. Therefore, in step S4, when the lens deviates from the center point, pattern recognition can be used to determine which quadrant the lens is pointing at, thereby guiding the lens movement according to the quadrant number and finally finding the alignment point.

[0021] In a preferred embodiment of the present invention, in step S5, during the cutting process of the glass substrate, the alignment point is retained within the cutting contour. Thus, after cutting, the alignment point is retained on the glass sheet, which can also serve as alignment for subsequent processes (e.g., after attaching it to a display, further assembling the display into a display module, this alignment point can be used for alignment).

[0022] Compared with the prior art, the present invention has the following advantages: The manufacturing method provided by this invention is not only simple and low-cost, but also produces patterned anti-glare glass sheets that, when bonded to a display, can reduce AG flicker caused by random refraction of light emitted from pixels or subpixels by rough particles. Furthermore, it can ensure that the cutting contour and alignment marks or points maintain a predetermined geometric relationship, thereby maintaining precise alignment consistency between the cutting contour and the concave-convex structure layer. This ensures accurate alignment between the pattern and the display area of ​​the display, prevents moiré patterns from appearing in the display image, and improves the overall display quality and manufacturing yield. Attached Figure Description

[0023] Figure 1 This is a schematic diagram of the manufacturing method provided in the preferred embodiment of the present invention, Example 1.

[0024] Figure 2 This is a schematic diagram of the structure of a patterned anti-glare glass sheet manufactured according to a preferred embodiment of the present invention.

[0025] Figure 3 This is a schematic diagram of the structure of the first pattern of the barrier film in the preferred embodiment of the present invention.

[0026] Figure 4 yes Figure 3 A schematic diagram of the structure of the sample block in the first pattern shown.

[0027] Figure 5 This is a schematic diagram of the structure of the patterned anti-glare glass sheet produced according to the preferred embodiment of the present invention, Example 2.

[0028] Figure 6 This is a schematic diagram of the alignment region of the barrier film in the preferred embodiment of the present invention, Example 2.

[0029] Figure 7 This is a schematic diagram of the structure of the convex-concave distribution sample block in the preferred embodiment of the present invention, Example 2.

[0030] Figure 8 This is a schematic diagram of the alignment region of the barrier film in the preferred embodiment of the present invention, Example 3. Detailed Implementation

[0031] Example 1: As Figures 1-4 As shown, the method for manufacturing patterned anti-glare glass sheets provided in this embodiment includes the following steps: S1. Provide a glass substrate 1, and deposit a barrier film 2 on the first surface of the glass substrate 1; S2. The barrier film 2 is patterned using photolithography to form a first pattern and a second pattern. The first pattern includes barrier portions 21 and hollow portions 22 distributed in alternating micrometer scale (the “barrier portion 21” in the first pattern corresponds to the part of the barrier film 2 retained after photolithography, and the “hollow portion 22” is the part of the barrier film 2 that is removed). The second pattern is the alignment mark 13 pattern. S3. Using the patterned barrier film 2 as a mask, the first surface of the glass substrate 1 is etched with glass etchant 3. Within the area of ​​the first pattern, the portion of the first surface of the glass substrate 1 corresponding to the hollow portion 22 is etched deeper by glass etchant 3 to form a recess 11, and the portion of the first surface of the glass substrate 1 corresponding to the barrier portion 21 is etched shallower by glass etchant 3 to form a protrusion 12. Thus, a concave-convex structure layer 10 corresponding to the first pattern is formed on the first surface of the glass substrate 1. The concave-convex structure layer 10 is composed of multiple recesses 11 and multiple protrusions 12 arranged alternately. The portion of the first surface of the glass substrate 1 corresponding to the second pattern is etched with glass etchant 3 to form an alignment mark 13. S4. Based on the alignment mark 13, the glass substrate 1 is precisely positioned and cut to form a cutting contour 14 that has a precise alignment relationship with the concave-convex structure layer 10, thereby obtaining a patterned anti-glare glass sheet.

[0032] In this embodiment, in step S1, the glass substrate 1 is made of transparent ordinary glass or tempered glass with a thickness ranging from 0.1 to 5 mm; the barrier film 2 is a silicon nitride (Si3N4) thin film, which is formed on the first surface of the glass substrate 1 by physical vapor deposition (PVD) or chemical vapor deposition (CVD). The thickness of the barrier film 2 is controlled to be about 1 μm. When the barrier film 2 is a silicon nitride thin film, in step S2, wet etching can be performed using phosphoric acid (H3PO4), or dry etching can be performed using plasma containing fluorine gases (such as CF4, CHF3, SF6, NF3, etc.).

[0033] To achieve the construction of micron-level patterns, in this embodiment, the photolithography process used in step S2 is as follows: first, photoresist is uniformly coated on the surface of the barrier film 2; then, exposure is performed using a mask with a micron-level pattern; next, development is performed to etch the barrier film 2; and finally, the remaining photoresist is removed, thereby forming a barrier portion 21 and a cutout portion 22 on the barrier film 2. The first pattern is located in the main area of ​​the glass substrate 1 (such as the large area in the middle), while the second pattern is set at the edge of the glass substrate 1; the two are formed synchronously through the same mask pattern and have a definite relative positional relationship; the second pattern is designed as a cutout pattern of alignment mark 13 (such as a cross shape), so that after step S3 is completed, the alignment mark 13 exists in the form of a recessed groove on the first surface of the glass substrate 1.

[0034] Patterned anti-glare glass sheets can be designed for use with specific dot matrix displays. In this embodiment, the first pattern is composed of at least two types of two-dimensional tiling of sample blocks 20, each sample block 20 including the same arrangement of blocking portions 21 and cutout portions 22. Specifically, the size ratio of the sample blocks 20 corresponds one-to-one with the sub-pixels 60 of the display, and its tiling method also matches the array structure of the sub-pixels 60. Taking a specific application as an example: when the anti-glare glass sheet is used in a color TFT liquid crystal display, the aspect ratio of the sample blocks 20 is consistent with the aspect ratio of the sub-pixels 60 (e.g., 3:1), and the array direction and spacing are precisely corresponding. The essence of two-dimensional tiling is to repeatedly cover the entire plane through two linearly independent translation directions, which can be defined as the first axis and the second axis. In order to adapt to mainstream dot matrix displays, the two-dimensional tiling is square tiling, which means that the first axis and the second axis are orthogonal to each other, thereby forming a regular rectangular or square grid structure. Based on the above design, the periodic characteristics of the first pattern are continued in subsequent processes. In step S3, the formed protrusions 12 are also distributed as repeating units in a two-dimensional flat pattern, i.e., sample blocks 20; in step S4, the cutting contour 14 of the glass substrate 1 is aligned with the first or second axis of the flat structure. For example, when the cutting edge is a straight line, the straight edge 15 remains parallel to the first or second axis, thereby ensuring accurate alignment of the pattern and the display area, improving the overall display quality and manufacturing yield.

[0035] In this embodiment, in step S3, the glass etchant 3 is hydrofluoric acid or buffered oxide etching solution (BOE, i.e., a solution prepared by mixing ammonium bifluoride with hydrofluoric acid or other acidic solutions in a specific ratio).

[0036] In this embodiment, in step S4, the alignment mark 13 on the surface of the glass substrate 1 is accurately positioned by lens image recognition, and then the glass substrate 1 is contour cut by means of fine carving or laser cutting to obtain a patterned anti-glare glass sheet with a cutting contour 14.

[0037] Example 2: Reference Figures 5-7 Another method for manufacturing a patterned anti-glare glass sheet provided in this embodiment includes the following steps: S1. Provide a glass substrate 1, and deposit a barrier film 2 on the first surface of the glass substrate 1; S2. The barrier film 2 is patterned using photolithography to form a barrier pattern 200. The barrier pattern 200 is formed by periodically tiling at least two types of sample blocks 20 in a two-dimensional direction. Each sample block 20 contains micron-sized alternating barrier portions 21 and hollow portions 22. The barrier pattern 200 contains at least one alignment region 201. The alignment region 201 is divided into four quadrant regions by the first axis 203 and the second axis 204 of the alignment point 202 set inside it. These are the first quadrant region 2011, the second quadrant region 2012, the third quadrant region 2013, and the fourth quadrant region 2014. The same sample block 20 is present in the same quadrant region, while the sample blocks 20 in adjacent quadrant regions are different from each other. S3. Using the barrier film 2 as a mask, the first surface of the glass substrate 1 is etched with glass etchant 3. In the area of ​​the barrier pattern 200, the part of the first surface of the glass substrate 1 corresponding to the hollow part 22 is etched deeper by glass etchant 3 to form a concave part 11, and the part of the first surface of the glass substrate 1 corresponding to the barrier part 21 is etched shallower by glass etchant 3 to form a convex part 12. Thus, a concave-convex structure layer 10 corresponding to the barrier pattern 200 is formed on the first surface of the glass substrate 1. The concave-convex structure layer 10 is formed by periodically laying multiple concave-convex distribution blocks 100 in a two-dimensional direction. Each concave-convex distribution block 100 includes multiple concave parts 11 and multiple convex parts 12 arranged alternately. S4. By identifying the differences in the concave-convex distribution sample block 100 of the concave-convex structure layer 10, the four quadrant regions of the alignment region 201 are distinguished, and the alignment point 202 is accurately located. S5. Based on the alignment point 202, the glass substrate 1 is precisely aligned, and the glass substrate 1 is cut to form a cutting contour 14 that has a precise alignment relationship with the concave-convex structure layer 10, thereby obtaining a patterned anti-glare glass sheet.

[0038] In the area of ​​the barrier pattern 200, the barrier portion 21 of the barrier film 2 can block the glass etchant 3 from directly corroding the first surface of the glass substrate 1, so that the glass etchant 3 can only penetrate vertically through the cutout portion 22 to form a deeper etching. Then, a shallower etching is formed below the barrier portion 21 by lateral erosion, and the barrier film 2 in this area is removed at the same time, and finally a concave-convex structure layer 10 consistent with the barrier pattern 200 of the barrier film 2 is formed. The concave-convex structure layer 10 is patterned and its distribution characteristics are consistent with the original barrier pattern 200, thereby synchronously forming the alignment region 201. The alignment region 201 is also divided into four quadrant regions, each quadrant region has the same concave-convex distribution sample block 100, and the concave-convex distribution sample blocks 100 between adjacent quadrant regions are different. The intersection point of each quadrant region is defined as the alignment point 202.

[0039] In this embodiment, in step S1, the glass substrate 1 is made of transparent ordinary glass or tempered glass, and its thickness ranges from 0.1 to 5 mm.

[0040] In this embodiment, in step S3, the glass etchant 3 is hydrofluoric acid or buffered oxide etching solution (BOE, i.e., a solution prepared by mixing ammonium bifluoride with hydrofluoric acid or other acidic solutions in a specific ratio).

[0041] In this embodiment, in step S4, the concave portions 11 and convex portions 12 inside each concave-convex distribution sample block 100 are identified by magnification using a positioning lens. By moving the glass substrate 1 or the lens, the lens eventually finds the positioning point. When the positioning point is found, the lens identifies that the four quadrant areas are within the field of view and can be further adjusted to align their intersection point (e.g., making the intersection point at the center of the field of view, which is the alignment point 202). This allows for precise positioning of the alignment point 202. Since the alignment point 202 is hidden in the concave-convex structure layer 10, it does not occupy the edge of the glass substrate 1, thus improving the utilization rate of the glass substrate 1. In step S5, based on the alignment point 202 located in step S4, the glass substrate 1 can be contour-cut by precision carving or laser cutting, thereby obtaining a patterned anti-glare glass sheet with a specific shape.

[0042] In this embodiment, in step S5, during the cutting process of the glass substrate 1, the alignment point 202 is retained within the cutting contour 14. Thus, after cutting, the alignment point 202 is retained on the glass sheet, which can also be used for alignment in subsequent processes (for example, after attaching it to the display, further assembling the display into the display module, this alignment point 202 can be used for alignment).

[0043] In this embodiment, in step S2, the barrier pattern 200 includes four alignment regions 201, which are located at the four corners of the barrier pattern 200.

[0044] The patterned anti-glare glass sheet can be designed to be used with a specific dot matrix display. The size ratio of the sample block 20 or the concave-convex distributed sample block 100 corresponds one-to-one with the sub-pixels 60 of the display, and the tiling method also matches the array structure of the sub-pixels 60. Since the sub-pixels 60 of the display are generally arranged in a square array, in this embodiment, the concave-convex distributed sample block 100 is tiled in a square, and it has a first axis and a second axis that are perpendicular to each other. When the sample block 20 is tiled in a square, each quadrant corresponds to a quadrant of the orthogonal coordinate system (with the alignment point 202 as the origin).

[0045] In this embodiment, the concave-convex distribution sample block 100 has a non-rotationally symmetric distribution of concave portions 11 and convex portions 12, and different sample blocks 20 are formed by rotating the same sample block 20 by 180°. As a result, different concave-convex distribution sample blocks 100 have the same anti-glare performance relative to the pixels of the display, avoiding the boundary between adjacent quadrant areas being visible to the user (in S4, different quadrant areas can only be distinguished by magnification through a positioning lens).

[0046] In this embodiment, the convex-concave distribution sample block 100 includes a middle region 101 and an edge region 102. The concave portions 11 and convex portions 12 of the edge regions 102 of different convex-concave distribution sample blocks 100 are distributed in the same way, while the concave portions 11 and convex portions 12 of the middle regions 101 of different convex-concave distribution sample blocks 100 are distributed differently. As a result, the convex-concave distribution sample blocks 100 can be naturally connected, avoiding misalignment of sample blocks 20 at the quadrant boundaries, thereby preventing the boundaries between adjacent quadrant regions from being visible to the user.

[0047] In this embodiment, the sample blocks 20 of the first quadrant region 2011, the second quadrant region 2012, the third quadrant region 2013, and the fourth quadrant region 2014 are all different. Therefore, in step S4, when the lens deviates from the center point, pattern recognition can be used to determine which quadrant region the lens is pointing at, thereby guiding the lens movement according to the quadrant region number, and finally finding the alignment point 202.

[0048] Example 3: Reference Figure 8 While all other parts are the same as in Embodiment 2, the difference lies in the following: In this embodiment, the concave-convex distribution sample block 100 has a non-axisymmetric distribution of concave portions 11 and convex portions 12. Specifically, different concave-convex distribution sample blocks 100 are formed by folding the same block. Thus, different concave-convex distribution sample blocks 100 have the same anti-glare performance relative to the pixels of the display, avoiding the boundary between adjacent quadrants being visible to the user (in S4, different quadrants can only be distinguished by magnification using a positioning lens).

[0049] Furthermore, it should be noted that the names of the various parts of the specific embodiments described in this specification may differ. All equivalent or simple variations made to the structure, features, and principles of this invention are included within the scope of protection of this invention. Those skilled in the art can make various modifications or additions to the described specific embodiments or use similar methods to replace them, as long as they do not deviate from the structure of this invention or exceed the scope defined by the claims, all of which should fall within the scope of protection of this invention.

Claims

1. A method for manufacturing a patterned anti-glare glass sheet, comprising the following steps: S1. Provide a glass substrate, and deposit a barrier film on the first surface of the glass substrate; Its features It also includes the following steps: S2. The barrier film is patterned to form a first pattern and a second pattern. The first pattern includes barrier portions and hollow portions distributed alternately at the micron level, and the second pattern is an alignment mark pattern. S3. Using the patterned barrier film as a mask, the first surface of the glass substrate is etched with a glass etchant. Within the area of ​​the first pattern, the portion of the first surface of the glass substrate corresponding to the hollow part is etched deeper by the glass etchant to form a recess, and the portion of the first surface of the glass substrate corresponding to the barrier part is etched shallower by the glass etchant to form a convex part. Thus, a concave-convex structure layer corresponding to the first pattern is formed on the first surface of the glass substrate. The concave-convex structure layer is composed of multiple convex parts and multiple recesses arranged alternately. The portion of the first surface of the glass substrate corresponding to the second pattern is etched with a glass etchant to form an alignment mark. S4. Based on the alignment marks, the glass substrate is precisely positioned and cut to form a cutting contour that has a precise alignment relationship with the concave-convex structure layer, thereby obtaining the patterned anti-glare glass sheet.

2. The method for manufacturing a patterned anti-glare glass sheet according to claim 1, characterized in that: The photolithography process used in step S2 is as follows: first, photoresist is uniformly coated on the surface of the barrier film; then, a mask with a micron-scale pattern is used for exposure; then, a development process is performed to etch the barrier film; finally, the remaining photoresist is removed, thereby forming the barrier portion and the cutout portion on the barrier film.

3. The method for manufacturing a patterned anti-glare glass sheet according to claim 1, characterized in that: In step S1, the barrier film is a silicon nitride (Si3N4) thin film, which is formed on the first surface of the glass substrate by physical vapor deposition (PVD) or chemical vapor deposition (CVD).

4. The method for manufacturing a patterned anti-glare glass sheet according to claim 1, characterized in that: The first pattern is composed of at least one two-dimensional tiled sample block, each sample block including multiple of the aforementioned blocking portions and multiple of the aforementioned hollow portions arranged in the same manner.

5. The method for manufacturing a patterned anti-glare glass sheet according to claim 4, characterized in that: The two-dimensional tiling is a square tiling.

6. A method for manufacturing a patterned anti-glare glass sheet, comprising the following steps: S1. Provide a glass substrate, and deposit a barrier film on the first surface of the glass substrate; Its features It also includes the following steps: S2. The barrier film is patterned using photolithography to form a barrier pattern. The barrier pattern is formed by laying at least two types of samples in a two-dimensional direction. Each sample contains micron-sized alternating barrier portions and hollow portions. The barrier pattern contains at least one alignment region. The alignment region is divided into four quadrant regions by a first axis and a second axis through the alignment point set inside it. These are the first quadrant region, the second quadrant region, the third quadrant region, and the fourth quadrant region. The same sample is present in the same quadrant region, while the sample in adjacent quadrant regions is different from each other. S3. Using the barrier film as a mask, the first surface of the glass substrate is etched with a glass etchant. Within the area of ​​the barrier pattern, the portion of the first surface of the glass substrate corresponding to the barrier portion is etched shallowly by the glass etchant to form a convex portion, while the portion of the first surface of the glass substrate corresponding to the hollow portion is etched deeper by the glass etchant to form a concave portion, thereby forming a concave-convex structure layer corresponding to the barrier pattern on the first surface of the glass substrate. The concave-convex structure layer is formed by periodically tiling multiple concave-convex distribution blocks in a two-dimensional direction, and each concave-convex distribution block includes multiple convex portions and multiple concave portions arranged alternately. S4. By identifying the differences in the uneven distribution of the uneven structural layer, the four quadrants of the alignment region are distinguished, and the alignment point is accurately located; S5. Based on the alignment points, the glass substrate is precisely aligned, and the glass substrate is cut to form a cutting contour with a precise alignment relationship with the concave-convex structure layer, thereby obtaining the patterned anti-glare glass sheet.

7. The method for manufacturing a patterned anti-glare glass sheet according to claim 6, characterized in that: In step S2, the blocking pattern includes two alignment regions, which are located in the diagonal regions of the blocking pattern; or, the blocking pattern includes four alignment regions, which are located in the four corner regions of the blocking pattern.

8. The method for manufacturing a patterned anti-glare glass sheet according to claim 6, characterized in that: The convex-concave distribution sample block includes a middle area and an edge area. The concave and convex parts of the edge area of ​​different convex-concave distribution sample blocks are the same, while the concave and convex parts of the middle area of ​​different convex-concave distribution sample blocks are different.

9. The method for manufacturing a patterned anti-glare glass sheet according to claim 8, characterized in that: The concave-convex distribution sample block has concave and convex portions without rotational symmetry, and different sample blocks are formed by rotating the same sample block by 180°.

10. The method for manufacturing a patterned anti-glare glass sheet according to claim 8, characterized in that: The concave-convex distribution sample block has a non-axisymmetric distribution of concave and convex parts, and different concave-convex distribution sample blocks are formed by folding the same block.

11. The method for manufacturing a patterned anti-glare glass sheet according to claim 6, characterized in that: The first and third quadrants use one type of sample block, while the second and fourth quadrants use another type of sample block.

12. The method for manufacturing a patterned anti-glare glass sheet according to claim 6, characterized in that: The samples in the first quadrant, second quadrant, third quadrant, and fourth quadrant are all different.

13. The method for manufacturing a patterned anti-glare glass sheet according to claim 6, characterized in that: In step S5, during the cutting process of the glass substrate, the alignment point is kept within the cutting contour.

Images