Laser self-adaptive etching method and device for to-be-etched member

By determining the initial and compensation parameters based on the target etching depth during laser etching, the problem of requiring a large number of experiments in laser etching is solved, and an efficient and precise etching process is achieved.

CN122400816APending Publication Date: 2026-07-17RAYCUS FIBER LASER TECH CO LTD
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Patent Information

Application Number
CN202610551941.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-04-24
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

When performing laser etching on new parts to be etched, a large number of experiments are required to find suitable process parameters, which involves a large workload and high costs.

Method used

By obtaining the target etching depth of the workpiece to be etched, the initial parameters of the laser are determined, and etching is performed using the initial parameters to obtain the actual etching depth. The error is calculated, and when the error exceeds a preset threshold, compensation parameters are determined, and the laser parameters are adjusted to achieve the target etching depth.

Benefits of technology

Quickly determine laser compensation parameters to improve etching accuracy, reduce experimental workload, and lower costs.

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Abstract

本申请公开了一种待刻蚀件的激光自适应刻蚀方法及装置，该方法包括：获取待刻蚀的待刻蚀件，以及，对待刻蚀件的目标刻蚀深度；根据目标刻蚀深度确定激光的初始参数；使用具有初始参数的激光对待刻蚀件进行刻蚀；获取对待刻蚀件的实际刻蚀深度；确定目标刻蚀深度和实际刻蚀深度的误差；在目标刻蚀深度大于实际刻蚀深度，且目标刻蚀深度和实际刻蚀深度的误差大于或等于预设阈值的情况下，根据目标刻蚀深度和实际刻蚀深度的差值确定激光的补偿参数，并使用具有补偿参数的激光对待刻蚀件进行刻蚀。本申请实施例能够解决相关技术中在对新的待刻蚀件进行激光刻蚀时，需要进行大量的实验找到合适的工艺参数，工作量较大、成本较高的技术问题。
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