A dual-axis multi-jet OVD deposition apparatus and deposition method
By using a biaxial multi-torch OVD deposition device with a closed annular guide rail and clamping mechanism below the mandrel, the problem of non-uniform preform diameter was solved, achieving uniformity in the diameter of the porous body and the preform, and improving the production yield.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ZHUHAI YIYUAN TECHNOLOGY CO LTD
- Filing Date
- 2026-05-22
- Publication Date
- 2026-07-17
AI Technical Summary
In the existing technology, the single-core rod multi-torch array causes uneven diameter of the preform during the deposition process, resulting in large fluctuations in the diameter of the preform after sintering and low yield.
The dual-axis multi-torch OVD deposition device uses a closed annular guide rail set below the mandrel to make the torch mechanism circulate along the annular guide rail. A clamping mechanism is set on the mandrel to realize rotation and vertical movement. With the adjustment of the jet flow rate, the deposition uniformity is ensured.
It effectively reduced the diameter fluctuation of the loose material and preform, improved the production yield of the preform, ensured the diameter uniformity of the deposited loose material in the axial and radial directions, and reduced the defect rate.
Smart Images

Figure CN122406187A_ABST