A method for maintaining a process environment of an etching apparatus, an electronic device, and a readable storage medium

By collecting characteristic signal data during the etching process to calculate the etching rate, the problem of wasted control chips and time during the maintenance of etching equipment is solved, achieving high efficiency, stability and economic savings for the equipment.

CN122455618APending Publication Date: 2026-07-24GEKKO SEMICON (SHANGHAI) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
GEKKO SEMICON (SHANGHAI) CO LTD
Filing Date
2025-01-22
Publication Date
2026-07-24

AI Technical Summary

Technical Problem

In the maintenance of existing etching equipment, the wafer running control process requires a lot of wafer control and time, but the equipment may have already reached its optimal state, resulting in wasted equipment capacity and increased economic costs, and there is a lack of scientific monitoring standards.

Method used

By collecting characteristic signal data during the etching process, the etching rate is calculated and compared with the preset rate to determine whether the etching equipment has reached the optimal stable state, thereby reducing the number of control wafers and the time required.

Benefits of technology

This approach achieves the goal of reducing the number of control wafers and time, saving machine occupancy time, increasing production capacity, and reducing economic costs while ensuring the stable operation of the etching equipment.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a kind of process environment maintenance methods of etching equipment, electronic equipment and readable storage medium, the process environment maintenance methods of etching equipment include: S1, etching is carried out to control piece by etching equipment;S2, the data of characteristic signal in etching process is collected;S3, etching speed in this etching process is calculated based on the data of characteristic signal, if etching speed in this etching process reaches preset etching speed, end maintenance process.Its advantages are: based on the method, while guaranteeing that etching equipment reaches expected stable state, the required control piece quantity and the time required in running control piece link are reduced, help to save machine occupation time, improve capacity, also help to reduce economic cost.
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