Base station and cleaning device

Abstract

The present disclosure relates to a base station and a cleaning device. The base station comprises a base and a cleaning disc. The base is used for the cleaning host to dock. The cleaning disc is arranged on the base. The cleaning disc is provided with a cleaning groove facing the cleaning host. The cleaning groove can accommodate a cleaning element of the cleaning host. The inner wall of the cleaning groove is provided with a contoured arc surface matched with the outer contour of the cleaning element. The contoured arc surface is in abutment with the cleaning element. When the cleaning element rotates at the cleaning groove, the rotating cleaning element can rub and scrub the contoured arc surface to clean the cleaning groove. This structure can effectively reduce the problem of time-consuming and labor-consuming for users to frequently clean and maintain the cleaning disc.

Description

[0001] This application claims priority to Chinese Patent Application No. 202610667022.6, filed on May 14, 2026, entitled "Cleaning Disk and Base Station", the whole or part of which is incorporated herein by reference. Technical Field

[0002] This disclosure relates to the field of cleaning equipment technology, and more particularly to a base station and a cleaning device. Background Technology

[0003] Intelligent cleaning equipment such as robotic vacuum cleaners can be used to automatically or assistedly clean surfaces. These cleaning devices reduce the physical exertion of manual cleaning through mechanization and automation, while also improving cleaning efficiency and convenience.

[0004] The cleaning equipment includes a cleaning host and a base station. After completing its cleaning task, the cleaning host can return to the base station. The cleaning components of the cleaning host can be cleaned on the cleaning tray of the base station to restore its cleaning capabilities and prevent secondary contamination. However, in existing technologies, during the cleaning process, the cleaning tray becomes contaminated with stains and wastewater (referred to as dirt) generated by the cleaning components, resulting in dirt accumulation and odor on the surface of the cleaning tray, requiring regular cleaning and maintenance by the user. Summary of the Invention

[0005] In view of this, the present disclosure provides a base station and a cleaning device to solve the problem of users frequently cleaning and maintaining cleaning trays, which is time-consuming and labor-intensive.

[0006] On the one hand, according to some embodiments of this disclosure, a base station is provided, comprising:

[0007] A base for the cleaning unit to enter, exit, and dock;

[0008] A cleaning tray is disposed on the base. The cleaning tray has a cleaning groove facing the cleaning host. The cleaning groove can accommodate the cleaning parts of the cleaning host. The inner wall of the cleaning groove has a contoured arc surface that matches the outer contour of the cleaning parts. The contoured arc surface abuts against the cleaning parts.

[0009] When the cleaning component rotates in the cleaning tank, the rotating cleaning component can rub and scrape the contoured arc surface to self-clean the cleaning tank.

[0010] In one possible implementation, the base station has a direction for the cleaning host to enter and exit, and the contoured arc surface includes a first contoured surface and a second contoured surface disposed opposite to each other;

[0011] At least one of the first contoured surface and the second contoured surface abuts against the cleaning component.

[0012] In one possible implementation, the cleaning disc is provided with a scraping structure disposed on the contoured arc surface, and the scraping structure abuts against the cleaning component.

[0013] In one possible implementation, the scraping structure is in interference fit with the cleaning component, and the interference between the scraping structure and the cleaning component is less than or equal to 4 mm.

[0014] In one possible implementation, the cleaning unit moves along the direction in which it enters, via the first contoured surface and the second contoured surface, with the scraping structure disposed on the first contoured surface.

[0015] In one possible implementation, the cleaning tray is provided with a drain channel that communicates with the cleaning tank and is used to drain dirt from the cleaning tank.

[0016] In one possible implementation, the cleaning tank includes a bottom receiving tank along the direction for the cleaning host to enter and exit, the bottom receiving tank being located between the first contoured surface and the second contoured surface, and the bottom receiving tank communicating with the sewage discharge channel.

[0017] In one possible implementation, the scraping structure is disposed on the edge of the second contoured surface near the bottom receiving groove (120c), and the scraping structure extends toward the cleaning groove.

[0018] In one possible implementation, the bottom receiving groove extends along the width direction of the base station, and the sewage discharge channel is located in the middle area of ​​the bottom receiving groove;

[0019] Along the width direction of the base station, the bottom receiving tank is provided with cleaning ports at both ends. The cleaning ports are used to flush the dirt in the bottom receiving tank from both ends toward the middle area, so as to flush the dirt into the sewage channel.

[0020] In one possible implementation, the cleaning tray includes a support platform and cleaning pipelines, the support platform being used to support the cleaning host, and the cleaning tank being disposed on the support platform;

[0021] The cleaning pipeline is disposed on the support platform along the direction for the cleaning host to enter and exit. The cleaning pipeline is provided at least one end of the cleaning tank. The cleaning pipeline is used to rinse the first contoured surface and / or the second contoured surface.

[0022] In one possible implementation, the cleaning tray is further provided with a main unit drain trough, which is connected to the drain channel. A spray assembly is provided at the end of the main unit drain trough away from the drain channel, and the spray assembly is used to rinse the bottom wall of the main unit drain trough.

[0023] In one possible implementation, the spray assembly is a fluid oscillator, which is fixed to the cleaning tray and connected to the clean water tank. The outlet of the fluid oscillator faces the main unit's drain trough.

[0024] The fluid oscillator is configured to generate a periodically oscillating sweeping stream through the outlet under the drive of a pressurized fluid, so as to flush the bottom wall of the main unit's sewage tank.

[0025] In one possible implementation, the cleaning tray is detachably connected to the base; or, the cleaning tray is integrally formed into the base.

[0026] In one possible implementation, a filter element is also included, which is disposed at the inlet of the sewage discharge channel.

[0027] The technical solutions provided by the embodiments of this disclosure may include the following beneficial effects:

[0028] By providing a contoured arc surface on the inner wall of the cleaning tank that matches the outer contour of the cleaning component, and ensuring that the arc surface abuts against the cleaning component, the rotating cleaning component can simultaneously rub and scrape the arc surface to remove accumulated dirt as it rotates and self-cleans within the tank. Therefore, cleaning of the cleaning tank can be completed simultaneously while ensuring the cleaning component itself is thoroughly cleaned, achieving an integrated cleaning effect for both the cleaning component and the cleaning tank. The base station in this embodiment eliminates the need for users to periodically disassemble the cleaning tray for cleaning, thus improving the automation and intelligence of the cleaning equipment and enhancing the user experience.

[0029] Furthermore, by matching the contour of the curved surface with the outer contour of the cleaning component, the cleaning component and the curved surface can make full contact, thereby improving the uniformity of the frictional pressure between the cleaning component and the curved surface, reducing the possibility of uneven force between the curved surface and the cleaning component, which could lead to inadequate local scraping or excessive friction, thus improving the self-cleaning effect of the cleaning tank.

[0030] Specifically, dirt generated during the self-cleaning process of the cleaning component will splash onto the contoured curved surface. When the contoured curved surface does not match the outer contour of the cleaning component, on the one hand, there will be local lack of contact between the cleaning component and the contoured curved surface, resulting in cleaning dead zones and affecting the self-cleaning effect on the cleaning tank. On the other hand, excessive contact between the cleaning component and the contoured curved surface will increase the frictional force between them, leading to increased rotational load on the cleaning component and increased energy consumption. Furthermore, it can easily damage the lint on the cleaning component, affecting its service life. Therefore, by ensuring that the contoured curved surface matches the outer contour of the cleaning component, the above technical problems can be effectively solved.

[0031] In this embodiment, since the cleaning component can clean the cleaning tank simultaneously during the self-cleaning process on the cleaning tank, it is not necessary to add additional structures such as cleaning brushes to clean the inner wall of the cleaning tank. Furthermore, it is not necessary to add drive structures, transmission structures, or other structures to drive the cleaning brushes to clean the cleaning tank. This helps to reduce the number of components in the base station, thereby reducing the possibility that an increase in the number of components will lead to an increase in the size, cost, and energy consumption of the base station.

[0032] Furthermore, by setting a contoured arc surface that matches the outer contour of the cleaning component, when the cleaning unit is positioned on the base and the cleaning component is in the cleaning tank, the contoured arc surface can be used to limit the positioning of the cleaning component, ensuring that the cleaning component can be precisely embedded into the cleaning tank after the cleaning unit is in place. This prevents the cleaning component from easily shifting or jamming during rotation, thereby improving the stability and reliability of the cleaning component's scraping action on the cleaning tank.

[0033] Furthermore, according to some embodiments of this disclosure, a cleaning device is provided, comprising:

[0034] Clean the main unit;

[0035] In any of the above embodiments, the cleaning host can enter and exit the base station.

[0036] The beneficial effects can be found in the relevant descriptions of the above embodiments, and will not be repeated here.

[0037] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit this disclosure. Attached Figure Description

[0038] The accompanying drawings, which are incorporated in and form a part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure.

[0039] Figure 1 This is a partial three-dimensional structural schematic diagram of a base station according to some embodiments of the present disclosure;

[0040] Figure 2 This is a partial side view structural diagram of a base station according to some embodiments of the present disclosure;

[0041] Figure 3 yes Figure 2 Enlarged view of point A in the middle;

[0042] Figure 4 This is a three-dimensional structural schematic diagram of a base according to some embodiments of the present disclosure;

[0043] Figure 5 yes Figure 4 A schematic diagram of the cross-sectional structure along the BB direction;

[0044] Figure 6 yes Figure 5 Enlarged view of point D in the middle;

[0045] Figure 7 yes Figure 4 A cross-sectional view of the structure along the CC direction;

[0046] Figure 8 yes Figure 7 Enlarged diagram of point E in the middle.

[0047] Explanation of reference numerals in the attached figures

[0048] 100-base station;

[0049] 110 - Base;

[0050] 120 - Cleaning tray; 120a - Cleaning tank; 120b - Drainage channel; 120c - Bottom receiving tank; 120d - Main unit drainage tank; 120e - Drainage inlet; 120f - Drainage outlet; 120g - Cleaning outlet; 1201 - Rounded transition surface;

[0051] 121-Following curved surface; 1211-First following surface; 1212-Second following surface;

[0052] 122-Scraping structure;

[0053] 123 - Support platform;

[0054] 124 - Clean the piping;

[0055] 125 - Spray assembly;

[0056] 130 - Filter element;

[0057] 200-Clean parts;

[0058] X - direction of entry / exit; Y - width direction; Z - height direction. Detailed Implementation

[0059] Some embodiments of this disclosure will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings denote the same or similar elements. Various changes, modifications, and equivalents of the methods, apparatus, and / or systems described herein will become apparent upon understanding this disclosure. For example, the order of operations described herein is merely illustrative and is not limited to those orders set forth herein, but can be changed as will become apparent upon understanding this disclosure, except for operations that must be performed in a particular order. Furthermore, for clarity and brevity, descriptions of features known in the art may be omitted.

[0060] The embodiments described in the following examples of this disclosure are not representative of all embodiments consistent with this disclosure. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this disclosure as detailed in the appended claims.

[0061] This application provides a cleaning device. For example, the cleaning device can be a robotic vacuum cleaner, an automatic sweeping vehicle, etc. Taking a robotic vacuum cleaner as an example, a cleaning device is an intelligent device used for automatically or assisted cleaning of floors. The cleaning device can reduce the physical exertion of manual cleaning through mechanization and automation technologies, improving cleaning efficiency and convenience. The cleaning device of this application embodiment can be applied to home or industrial environments, and is not limited thereto.

[0062] Cleaning equipment typically consists of a cleaning unit and a base station. The cleaning unit is primarily used to clean and store dirt on the surface to be cleaned. After cleaning the surface, the cleaning unit moves to the base station. The base station can then extract the dirt stored in the cleaning unit and clean the cleaning components, thus completing the cleaning of the cleaning unit.

[0063] In the existing technology, during the cleaning process of the cleaning components, the cleaning tray will be contaminated by the dirt of the cleaning components, resulting in stains and odors on the surface of the cleaning tray, which requires users to clean and maintain it regularly.

[0064] To address the aforementioned issues, this application provides a base station that utilizes a cleaning groove with a contoured arc surface on a cleaning tray. This contoured arc surface is adapted to and abuts against the outer contour of the cleaning component of the cleaning host, enabling the cleaning groove to self-clean. When the cleaning component rotates within the cleaning groove, it directly rubs and scrapes the contoured arc surface, removing dirt, lint, and other contaminants. This eliminates the tedious manual cleaning process, reducing the frequency and workload for users.

[0065] The base station and cleaning equipment according to embodiments of this application are described below with reference to the accompanying drawings.

[0066] See Figures 1 to 3 As shown, the base station 100 in this embodiment includes a base 110 and a cleaning tray 120. The base 110 allows the cleaning host to enter and dock.

[0067] A cleaning tray 120 is disposed on the base 110. The cleaning tray 120 has a cleaning groove 120a facing the cleaning unit. The cleaning groove 120a can accommodate the cleaning component 200 of the cleaning unit. The inner wall of the cleaning groove 120a has a contoured arc surface 121 that conforms to the outer contour of the cleaning component 200. The contoured arc surface 121 abuts against the cleaning component 200.

[0068] When the cleaning component 200 rotates at the cleaning tank 120a, the rotating cleaning component 200 can rub and scrape the contoured arc surface 121 to self-clean the cleaning tank 120a.

[0069] In this embodiment, a contoured arc surface 121 adapted to the outer contour of the cleaning component 200 is provided on the inner wall of the cleaning tank 120a, and the contoured arc surface 121 abuts against the cleaning component 200. When the cleaning component 200 rotates and performs self-cleaning in the cleaning tank 120a, the rotating cleaning component 200 can simultaneously rub and scrape the contoured arc surface 121 to remove the dirt accumulated on the contoured arc surface 121. Therefore, the cleaning tank 120a can be cleaned simultaneously while ensuring that the cleaning component 200 itself is cleaned, achieving an integrated cleaning effect of cleaning the cleaning component 200 and cleaning the cleaning tank 120a. The base station 100 in this embodiment does not require the user to periodically disassemble the cleaning tray 120 for cleaning, which is beneficial to improving the automation and intelligence capabilities of the cleaning equipment and improving the user experience.

[0070] Furthermore, by matching the contour of the arc surface 121 with the outer contour of the cleaning component 200, the cleaning component 200 and the arc surface 121 can make full contact, thereby improving the uniformity of the frictional pressure between the cleaning component 200 and the arc surface 121, reducing the possibility of uneven force between the arc surface 121 and the cleaning component 200, which could lead to inadequate local scraping or excessive friction, thus improving the self-cleaning effect of the cleaning tank 120a.

[0071] Specifically, dirt generated during the self-cleaning process of the cleaning component 200 will splash onto the contoured arc surface 121. When the contoured arc surface 121 does not match the outer contour of the cleaning component 200, on the one hand, there will be partial lack of contact between the cleaning component 200 and the contoured arc surface 121, resulting in cleaning dead zones and affecting the self-cleaning effect on the cleaning tank 120a. On the other hand, excessive contact between the cleaning component 200 and the contoured arc surface 121 will increase the frictional force between them, leading to increased rotational load on the cleaning component 200 and increased energy consumption. Furthermore, it can easily damage the fibers of the cleaning component 200, affecting its service life. Therefore, by matching the contoured arc surface 121 with the outer contour of the cleaning component 200, the above-mentioned technical problems can be effectively solved.

[0072] In this embodiment, since the cleaning component 200 can simultaneously clean the cleaning tank 120a during the self-cleaning process on the cleaning tank 120a, it is not necessary to add additional structures such as cleaning brushes to clean the inner wall of the cleaning tank 120a. Furthermore, it is not necessary to add drive structures, transmission structures, or other structures to drive the cleaning brush to clean the cleaning tank 120a. This helps to reduce the number of components in the base station 100, thereby reducing the possibility that an increase in the number of components will lead to an increase in the size, cost, and energy consumption of the base station 100.

[0073] Furthermore, by adapting the contoured arc surface 121 to the outer contour of the cleaning component 200, when the cleaning unit is positioned on the base 110 and the cleaning component 200 is located in the cleaning tank 120a, the contoured arc surface 121 can be used to limit the cleaning component 200, ensuring that the cleaning component 200 can be precisely embedded in the cleaning tank 120a after the cleaning unit is in position. This prevents the cleaning component 200 from easily shifting or jamming during rotation, thereby improving the stability and reliability of the scraping action of the cleaning component 200 on the cleaning tank 120a.

[0074] In some examples, the cleaning unit 200 of the cleaning host may have at least a lifting function. When the cleaning host drives into and docks at the base station 100 to perform self-cleaning on the cleaning unit 200, the cleaning unit 200 may be in a lowered position, and at least a portion of the cleaning unit 200 may be located in the cleaning tank 120a.

[0075] In some examples, after the self-cleaning of cleaning component 200 and cleaning tank 120a is completed, cleaning component 200 can be raised to the raised position. The cleaning host can then exit base station 100.

[0076] In some examples, the cleaning component 200 in this application embodiment may be, but is not limited to, a roller cleaning component 200, a disc cleaning component 200, a track cleaning component 200, etc.

[0077] For example, when the cleaning component 200 is a roller brush type cleaning component, the cleaning component 200 includes a roller brush spindle and cleaning bristles disposed on the outer periphery of the roller brush spindle. The cleaning groove 120a may be an elongated arc-shaped groove adapted to the outer contour of the cleaning bristles.

[0078] When the cleaning unit is docked at the base station 100, at least a portion of the cleaning component 200 is housed in the cleaning tank 120a, and the free ends of the cleaning bristles abut against the contoured arc surface 121. When the cleaning component 200 rotates, the cleaning bristles can sweep across and scrape the contoured arc surface 121 to remove dirt adhering to the contoured arc surface 121.

[0079] When the cleaning component 200 is a disc-shaped cleaning component, it may include a disc base and a cleaning cloth disposed on the disc base. The cleaning groove 120a is a circular or polygonal groove that matches the shape of the disc base. The radius of curvature of the contoured arc surface 121 is adapted to the radius of the disc base.

[0080] When the cleaning host is docked at base station 100, at least a portion of the cleaning component 200 can be located within the cleaning tank 120a. The outer edge or bottom surface of the cleaning cloth abuts against the contoured arc surface 121. As the disc substrate rotates in the horizontal plane, the cleaning cloth rubs and scrapes the contoured arc surface 121 to wipe away dirt from the inner wall of the cleaning tank 120a.

[0081] When the cleaning component 200 is a tracked cleaning component, it includes a driving wheel, a driven wheel, and an annular cleaning belt wound between the driving wheel and the driven wheel. The outer surface of the annular cleaning belt is provided with a cleaning felt layer. The cleaning groove 120a can be an arc-shaped elongated groove adapted to the outer contour of the descending section of the annular cleaning belt. The contoured arc surface 121 can correspond to the bottom surface of the descending section of the annular cleaning belt.

[0082] When the cleaning host is docked at the base station 100, the downlink section of the annular cleaning belt is contained within the cleaning trough 120a, and the cleaning lint layer abuts against the contoured arc surface 121. When the drive wheel drives the annular cleaning belt to rotate, the cleaning lint layer slides and scrapes along the contoured arc surface 121 to push the dirt on the contoured arc surface 121 toward one end of the cleaning trough 120a for discharge.

[0083] The following embodiments of this application use a roller-type cleaning component 200 as an example for description.

[0084] See also some of the possible implementation methods. Figures 3 to 8 As shown, the base station 100 has a direction X for the cleaning host to enter and exit, and the contoured arc surface 121 includes a first contoured surface 1211 and a second contoured surface 1212 disposed opposite to each other. At least one of the first contoured surface 1211 and the second contoured surface 1212 abuts against the cleaning component 200.

[0085] In this embodiment, when the cleaning component 200 abuts against one of the first contoured surface 1211 and the second contoured surface 1212, the contact area between the cleaning component 200 and the contoured arc surface 121 is small. Therefore, the frictional resistance experienced by the cleaning component 200 on the contoured arc surface 121 during rotation is small, which is beneficial for reducing the load and energy consumption. Furthermore, the gap formed between the cleaning component 200 and the non-contacting component allows water to flow through, further improving the cleaning effect on the contoured arc surface 121. This gap also allows airflow to facilitate drying of the self-cleaned contoured arc surface 121.

[0086] In some examples, the gap formed between the cleaning component 200 and the non-contacting component can also allow water to flow through, so that cleaning fluid can be flushed onto the surface of the non-contacting component to clean the non-contacting surface.

[0087] When the cleaning component 200 abuts against both the first contoured surface 1211 and the second contoured surface 1212, the contact area between the cleaning component 200 and the contoured arc surface 121 is relatively large. The rotation of the cleaning component 200 enables simultaneous scraping and cleaning of the first contoured surface 1211 and the second contoured surface 1212, thereby improving the cleaning efficiency of the cleaning tank 120a. Furthermore, the first contoured surface 1211 and the second contoured surface 1212 provide more stable support for the cleaning component 200, allowing at least a portion of the cleaning component 200 to rotate stably within the cleaning tank 120a. This reduces the possibility of uneven contact between the cleaning component 200 and the contoured arc surface 121 due to offset or swaying, which could lead to inadequate scraping or excessive friction.

[0088] The cleaning component 200 can achieve simultaneous cleaning of the first contour surface 1211 and the second contour surface 1212 by rotating in either the forward or reverse direction.

[0089] See also some of the possible implementation methods. Figure 3 As shown, the cleaning tray 120 is provided with a scraping structure 122. The scraping structure 122 is disposed on the contoured arc surface 121. The scraping structure 122 abuts against the cleaning component 200.

[0090] In this embodiment, by providing a scraping structure 122, when the cleaning component 200 rotates within the cleaning tank 120a, the scraping structure 122 can extend into the root of the bristles or the interior of the fibers of the cleaning component 200 to forcibly scrape away and remove deep-seated dirt such as hair, fibrous material, and stubborn particles entangled or embedded within the cleaning component 200. This improves the cleaning depth and cleanliness of the cleaning component 200, reducing the possibility that the cleaning component 200 will accumulate dirt over long-term use, leading to a decrease in cleaning ability and making the surface to be cleaned dirtier with each cleaning. Furthermore, it also reduces the possibility that dirt on the cleaning component 200 will affect the cleaning effect on the cleaning tank 120a.

[0091] In some examples, a scraper structure may be provided at the bottom of the cleaning unit. The scraper structure is correspondingly located on the outer periphery of the cleaning component 200. The scraper structure and the cleaning component 200 are press-fitted together. The scraper structure and the dirt-scraping structure 122 can be used together to clean the cleaning component 200.

[0092] Specifically, when the rotating cleaning component 200 passes the scraping structure, the scraping structure can extend into the base of the bristles or the gaps between the fibers of the cleaning component 200 to remove long hairs, lint, and large particles of dirt entangled on the bristles from the cleaning component 200. Similarly, when the rotating cleaning component 200 passes the dirt-scraping structure 122, the dirt-scraping structure 122 abuts against and scrapes the cleaning component 200 to deeply remove dirt from the cleaning component 200.

[0093] Therefore, the scraping structure and the smearing structure 122 can achieve two deep cleanings of the cleaning component 200. Specifically, the rotating cleaning component 200 can pass through the scraping structure first and then the smearing structure 122. Alternatively, the rotating cleaning component 200 can pass through the smearing structure 122 first and then the scraping structure; this is not limited in the embodiments of this application.

[0094] It is easy to understand that, since the scraping structure 122 abuts against the cleaning component 200, the scraping structure 122 can at least partially extend into the root of the bristles or the gap between the fibers of the cleaning component 200. Therefore, by rotating the cleaning component 200, the bristles or fibers of the cleaning component 200 can contact the scraping structure 122 while achieving self-cleaning of the cleaning component 200 and the cleaning tank 120a. The cleaning component 200 can then clean the scraping structure 122 to achieve self-cleaning of the scraping structure 122.

[0095] In some examples, the scraping structure and the smear scraping structure 122 can be the same structure or different structures, which is not limited in the embodiments of this application.

[0096] For example, the scraper structure may be, but is not limited to, scraper bars, comb teeth, etc.

[0097] For example, the scraping structure 122 may be, but is not limited to, a scraper bar, comb teeth, etc.

[0098] For example, when the scraping structure 122 is a scraper strip, the thickness of the scraper strip can be greater than or equal to 2 mm and less than or equal to 4 mm. For example, the thickness of the scraper strip can be 2.5 mm, 2.9 mm, 3.2 mm, etc.

[0099] In some examples, the portion of the scraper base that connects to the cleaning disc 120 has rounded corners. The corner radius may be, but is not limited to, 0.5 mm, 0.6 mm, 0.8 mm, etc.

[0100] In some examples, since the cleaning component 200 can self-clean the scraping structure 122, the cleaning component 200 can be cleaned without disassembly. The scraping structure 122 can be integrally molded onto the cleaning disc 120 to reduce the number of parts and assembly steps, thereby reducing production costs.

[0101] In other examples, the smearing structure 122 is detachable from the cleaning tray 120 to improve the cleaning effect of the smearing structure 122 and reduce the sanitary dead spots of the smearing structure 122 and the cleaning tray 120.

[0102] See also some of the possible implementation methods. Figure 3 As shown, the scraping structure 122 and the cleaning component 200 are in an interference fit. The interference fit between the scraping structure 122 and the cleaning component 200 is less than or equal to 4 mm.

[0103] In this embodiment, by setting the interference between the scraping structure 122 and the cleaning component 200 to be less than or equal to 4 mm, the scraping structure 122 and the cleaning component 200 can form a pre-pressure contact, so that the scraping structure 122 can always apply a stable scraping pressure to the surface of the cleaning component 200 when the cleaning component 200 rotates, thereby scraping away the dirt inside the cleaning component 200.

[0104] By setting the interference fit to be less than or equal to 4mm, on the one hand, the scraping structure 122 can effectively penetrate into the bristle roots or fiber gaps of the cleaning component 200 to thoroughly scrape away embedded stubborn dirt, tangled hair, etc. On the other hand, it prevents the cleaning component 200 from experiencing a sharp increase in rotational resistance due to excessive interference fit, which could lead to jamming, overpressure deformation, wear, and increased energy consumption of the cleaning unit. Therefore, it is possible to reduce drive power consumption and extend the lifespan of the cleaning component 200 while ensuring effective scraping.

[0105] In some examples, the interference fit between the scraping structure 122 and the cleaning component 200 may be, but is not limited to, 1 mm, 2 mm, 3 mm, etc.

[0106] In some examples, interference fit can refer to the radial compression gap between the cleaning component 200 and the scraping structure 122 when they are in their natural state. In other words, the distance between the end of the scraping structure 122 near the center of the cleaning component 200 and the center of the cleaning component 200 is less than the diameter of the cleaning component 200. The distance from the end of the scraping structure 122 near the center of the cleaning component 200 to the outer diameter of the cleaning component 200 is the interference fit.

[0107] In other examples, with the mounting reference plane of the cleaning component 200 as the reference plane, the interference can refer to the difference between the top of the scraping structure 122 and the distance from the outer contour of the cleaning component 200 to the rotation axis of the cleaning component 200.

[0108] In some other examples, with reference to the virtual reference arc surface of the contoured arc surface 121, the interference can refer to the difference between the protrusion height of the scraping structure 122 and the overhang dimension of the cleaning component 200.

[0109] See also some of the possible implementation methods. Figure 3 , Figure 6 and Figure 8 As shown, the cleaning unit moves from the first contour surface 1211 to the second contour surface 1212 in the direction in which it enters. The scraping structure 122 is disposed on the first contour surface 1211.

[0110] In this embodiment, by setting the scraping structure 122 on the first contoured surface 1211, and arranging the brush structure and the scraping structure 122 at different positions along the circumference of the cleaning component 200, the unidirectional rotation of the cleaning component 200 allows both the brush structure and the scraping structure 122 of the cleaning host to act on the cleaning component 200 during self-cleaning. During self-cleaning, the cleaning component 200 passes through the brush structure and the scraping structure 122 sequentially through unidirectional rotation. In other words, the brush structure and the scraping structure 122 can sequentially apply abutment to the cleaning component 200 in the same rotational direction, thereby improving the cleaning effect on the cleaning component 200.

[0111] In some examples, the cleaning process for base station 100 may include water supply, circulating cleaning of cleaning component 200, deep cleaning, and resetting and shutdown.

[0112] First, the system is started by pre-filling water and continuously pumping out sludge. The cleaning tray 120 can create a clean environment before cleaning begins, so that the cleaning parts 200 can be fully wetted and softened when they enter the cleaning tank 120a, improving the efficiency of subsequent scraping and washing of sludge.

[0113] Then, a three-stage cyclic cleaning process is employed. In each cycle, the water inlet solenoid valve operates with an intermittent water replenishment rhythm of "open for 4 seconds and close for 8 seconds." This ensures that there is always an appropriate amount of cleaning fluid in the cleaning tank 120a to suspend and remove the scraped dirt, reducing the possibility of problems such as excessively high liquid level, liquid overflow, or excessive rotational resistance of the cleaning component 200 caused by continuous water intake, thus balancing water supply efficiency and cleaning effect.

[0114] The cleaning component 200 operates in three cycles, alternating between a 70% duty cycle, rotating counterclockwise for 12 seconds, and a 50% duty cycle, rotating clockwise for 11 seconds. It should be noted that the duty cycle refers to the parameter when the power unit (e.g., a drive motor) driving the cleaning component 200 uses pulse width modulation (PWM) speed control. Within a complete pulse cycle, it represents the percentage of time the power unit is energized and operating within the total pulse cycle. For example, a 70% duty cycle could mean that within a single cycle, the power unit is energized for 70% of the time and de-energized for 30% of the time, operating at approximately 70% of its rated speed. A 50% duty cycle means that within a single cycle, the energized and de-energized periods are equal, with the power unit operating at approximately 50% of its rated speed.

[0115] By employing a composite drive mode that combines high and low rotation speeds and alternating forward and reverse rotation, the cleaning component 200 can perform relatively high-speed scraping within the cleaning tank 120a, while simultaneously applying scraping force at different angles through relatively low-speed reverse rotation. This reduces the likelihood of cleaning dead zones and dirt redeposition occurring in a single direction or at a single rotation speed. Therefore, while achieving highly efficient self-cleaning of the cleaning component 200, the contoured arc surface 121 of the cleaning tank 120a can also be thoroughly scraped.

[0116] The sewage pump continuously pumps out sludge throughout the cleaning process, enabling simultaneous washing and drainage. This allows for the timely removal of scraped dirt and sewage from the cleaning tray 120, reducing the likelihood of dirt re-adhering to the cleaning component 200 or the contoured surface 121 within the cleaning tank 120a.

[0117] After the three cycles are completed, a deep cleaning is performed for 30 seconds counterclockwise and 29 seconds clockwise. By extending the unidirectional continuous rotation time, the cleaning component 200 and the cleaning tank 120a are given an enhanced final wash to further remove stubborn stains that were not completely removed during the previous cleaning cycles, thus ensuring the final cleanliness of the cleaning component 200 and the cleaning tank 120a.

[0118] After cleaning is completed, the cleaning component 200 is reset, the water inlet valve of the base station 100 is opened for 8 seconds, and the sewage pump stops pumping sewage, so that the cleaning component 200 stops rotating and returns to its original position.

[0119] Therefore, the above cleaning process can achieve automated and standardized full-process control while ensuring that the cleaning component 200 and the cleaning tray 120 are thoroughly cleaned, thereby improving the intelligence level of the base station 100 and the consistency of its self-cleaning effect.

[0120] See also some of the possible implementation methods. Figure 4 As shown, the cleaning tray 120 is provided with a drain channel 120b. The drain channel 120b is connected to the cleaning tank 120a. The drain channel 120b is used to drain the dirt in the cleaning tank 120a.

[0121] In this embodiment, the mixed dirt such as hair, lint, and sewage that is peeled off by the cleaning component 200 during the rotation and scraping process in the cleaning tank 120a can be discharged from the cleaning tank 120a in a timely and directional manner through the sewage discharge channel 120b under the action of gravity and negative pressure suction. This reduces the possibility of secondary pollution caused by the scraped dirt remaining in the cleaning tank 120a for a long time and being redeposited on the cleaning component 200 and the contoured arc surface 121. This ensures that the cleaning tank 120a can always be in a relatively clean working environment during the cleaning process.

[0122] In some examples, the sewage discharge channel 120b can be located in the middle area along the width direction Y of the base station. The dirt scraped off in the cleaning tank 120a can be discharged from the middle position in the extension direction of the cleaning tank 120a, so that the dirt on both sides of the cleaning tank 120a can converge to the sewage discharge channel 120b in the middle area under the action of gravity, water flow and other forces, so as to shorten the migration distance and residence time of dirt in the cleaning tank 120a and improve the uniformity and thoroughness of sewage discharge.

[0123] In some examples, the drain channel 120b may extend along the direction X for the cleaning unit to enter and exit. The extension length of the drain channel 120b in the direction X for the cleaning unit to enter and exit covers the main scraping area of ​​the cleaning component 200 in the docked state, so that dirt scraped by the cleaning component 200 at any position in the direction X (e.g., the first contour surface 1211 and the second contour surface 1212) can enter the drain channel 120b with the shortest path and be removed in time.

[0124] See also some of the possible implementation methods. Figures 4 to 6 As shown, the cleaning tank 120a includes a bottom receiving tank 120c. Along the direction X for the cleaning unit to enter and exit, the bottom receiving tank 120c is located between the first contoured surface 1211 and the second contoured surface 1212. The bottom receiving tank 120c communicates with the drain channel 120b.

[0125] In this embodiment, the hair, lint, sewage, and other dirt shed by the cleaning component 200 during its rotational scraping within the cleaning tank 120a settles naturally under gravity and collects in the bottom receiving groove 120c of the cleaning tank 120a. The bottom receiving groove 120c serves as a temporary buffer and accumulation area for dirt, allowing it to be concentrated and temporarily stored before entering the drain channel 120b. This reduces the likelihood of dirt scattering throughout the cleaning tray 120 and failing to be completely absorbed by the drain channel 120b, thereby improving the efficiency of dirt collection and the thoroughness of drainage.

[0126] Furthermore, the bottom receiving groove 120c is located at the bottom position between the first contour surface 1211 and the second contour surface 1212. When the cleaning component 200 rotates forward or backward, the scraped dirt can be thrown into or fall into the bottom receiving groove 120c under the action of centrifugal force and gravity, without the need to set different dirt guiding paths for different rotation directions.

[0127] In addition, the bottom receiving groove 120c, as a recessed structure at the bottom of the cleaning groove 120a, can provide clearance space for the scraping contact area between the contoured arc surface 121 and the cleaning component 200, so that when the cleaning component 200 rotates, at least a portion of the lower end of the cleaning component 200 can extend into the bottom receiving groove 120c, increasing the contact scraping area between the cleaning component 200 and the inner wall of the cleaning groove 120a, and further improving the self-cleaning effect.

[0128] In some examples, the cleaning tank 120a is lowered along the height direction Z of the base station 100.

[0129] In some examples, the cleaning tank 120a may extend along the width direction Y of the base station 100.

[0130] See also some of the possible implementation methods. Figure 6 As shown, the scraping structure 122 is disposed on the edge of the second contoured surface 1212 near the bottom receiving groove 120c, and the scraping structure 122 extends toward the cleaning groove 120a.

[0131] In this embodiment, the scraping structure 122 is located at the end of the second contoured surface 1212 and extends protrudes towards the cleaning groove 120a. This allows the scraping structure 122 to scrape the surface of the cleaning component when the cleaning component 200 rotates within the cleaning groove 120a to a position close to the edge of the bottom receiving groove 120c, with the scraping structure 122 extending into the cleaning groove 120a. The dirt cleaned by the cleaning component 200 by the scraping structure 122 can easily enter the adjacent bottom receiving groove 120a, and is less likely to remain on the second contoured surface 1212, thereby reducing the possibility of secondary contamination of the second contoured surface 1212.

[0132] See also some of the possible implementation methods. Figure 4 As shown, the bottom receiving tank 120c extends along the width direction Y of the base station 100. The sewage discharge channel 120b is located in the middle region of the bottom receiving tank 120c. Along the width direction Y of the base station 100, cleaning ports 120g are provided at both ends of the bottom receiving tank 120c. The cleaning ports 120g are used to flush the dirt in the bottom receiving tank 120c from both ends toward the middle region, so as to flush the dirt into the sewage discharge channel 120b.

[0133] In this embodiment, the cleaning port 120g can spray and guide the cleaning liquid from both ends of the bottom receiving tank 120c toward the middle area, thereby directionally flushing the bottom and sidewalls of the bottom receiving tank 120c. This effectively washes away dirt deposited at both ends and sidewalls of the bottom receiving tank 120c toward the drainage channel 120b in the middle area, solving the problem that dirt tends to accumulate at the ends because the bottom receiving tank 120c extends along the width Y direction of the base station 100, resulting in the ends being far from the drainage channel 120b. Furthermore, the convective flushing method of the cleaning ports 120g at both ends toward the middle can form a water flow and airflow converging from both ends toward the middle within the bottom receiving tank 120c, carrying away dirt suspended in the bottom receiving tank 120c and stubborn stains deposited on the bottom wall toward the drainage channel 120b in the middle area, thus improving the cleaning effect of the bottom receiving tank 120c.

[0134] It is easy to understand that the setting of the cleaning ports 120g at both ends can effectively flush all sections of the bottom receiving tank 120c in the width direction Y of the base station 100, so as to further improve the sewage discharge efficiency and the self-cleaning ability of the cleaning tank 120a.

[0135] In some examples, the cleaning port 120g can be connected to the clean water tank of the base station 100. The clean water tank can provide clean water or cleaning fluid to the bottom receiving tank 120c.

[0136] In some examples, the bottom wall of the bottom receiving groove 120c may be provided with a guide slope. The guide slope can be used to guide the dirt scraped off from the cleaning component 200 to the drain channel 120b in the middle area.

[0137] In some examples, there may be one or more cleaning ports 120g. The shape of the cleaning ports 120g may be, but is not limited to, circular holes, oval holes, etc.

[0138] See also some of the possible implementation methods. Figure 5 and Figure 6 As shown, the cleaning tray 120 includes a support platform 123 and a cleaning conduit 124. The support platform 123 is used to support the cleaning unit. A cleaning tank 120a is disposed on the support platform 123. The cleaning conduit 124 is disposed on the support platform 123, and at least one end of the cleaning tank 120a is provided with the cleaning conduit 124 along the direction X for the cleaning unit to enter and exit. The cleaning conduit 124 is used to rinse the first contoured surface 1211 and / or the second contoured surface 1212.

[0139] In this embodiment, the cleaning pipeline 124 can deliver cleaning fluid to the contoured arc surface 121 to perform directional spray rinsing on residual dirt adhering to the first contoured surface 1211 and / or the second contoured surface 1212. This can effectively remove stubborn stains, sticky residues, and other dirt that were not removed by the rotating scraping of the cleaning component 200 or accumulated after long-term use on the contoured arc surface 121, so that the contoured arc surface 121 can maintain a near-perfect state for a long time.

[0140] The cleaning conduit 124 and the cleaning ports 120g at both ends of the bottom receiving tank 120c can form a spatial complement. The cleaning conduit 124 can be used to spray and rinse the contoured curved surface 121. The cleaning ports 120g can be used to rinse the bottom receiving tank 120c. Therefore, the cleaning conduit 124 and the cleaning ports 120g can thoroughly clean the inner wall of the cleaning tank 120a from different directions and positions.

[0141] In some examples, along the direction X for the cleaning host to enter and exit, the cleaning pipe 124 is provided at at least one end of the cleaning tank 120a, which allows the cleaning pipe 124 to dynamically flush the area of ​​the contoured arc surface 121 that the cleaning host passes through during the process of entering or exiting the base station 100, so as to realize real-time cleaning of the contoured arc surface 121 during the process of the cleaning host entering and exiting.

[0142] In some examples, the cleaning conduit 124 may be located at one end of the cleaning tank 120a along the direction X for the cleaning unit to enter and exit. Alternatively, the cleaning conduit 124 may be located at both ends of the cleaning tank 120a. This is not limited in the embodiments of this application.

[0143] See also some of the possible implementation methods. Figure 4 As shown, the cleaning tray 120 also includes a main unit drain trough 120d. The main unit drain trough 120d is connected to the drain channel 120b. A spray assembly 125 is provided at the end of the main unit drain trough 120d away from the drain channel 120b. The spray assembly 125 is used to rinse the bottom wall of the main unit drain trough 120d.

[0144] It is easy to understand that the main unit drain tank 120d is used to receive the wastewater discharged from the cleaning unit. This allows the wastewater discharged from the cleaning unit to first pass through the main unit drain tank 120d before entering the drain channel 120b. This reduces the possibility of high-concentration wastewater discharged from the cleaning unit directly impacting the drain channel 120b and backflowing into the cleaning tank 120a, causing dirt to contaminate the already cleaned cleaning tank 120a and the contoured arc surface 121, and resulting in secondary contamination of the cleaning tank 120a and the cleaning component 200.

[0145] In this embodiment, the spray assembly 125 can perform directional spraying to rinse the bottom wall of the main unit drain tank 120d, thereby washing away residual dirt adhering to the bottom and side walls of the main unit drain tank 120d. The spray assembly 125 can provide water flow thrust to push the aforementioned dirt along the bottom wall of the main unit drain tank 120d towards the drain channel 120b, and finally discharge it through the drain channel 120b. Therefore, it can effectively solve the problem of insufficient drainage power and easy dirt accumulation and blockage in the end area caused by the long extension distance of the main unit drain tank 120d.

[0146] Specifically, the spray assembly 125 is located at the end of the main unit drain tank 120d away from the drain channel 120b. The spray direction of the spray assembly 125 is towards the drain channel 120b, which can perform full-length flushing and cleaning of the entire extension path of the main unit drain tank 120d. Since the spray assembly 125 can provide spray flushing, the force of the spray flushing can ensure the unobstructed flow of the main unit drain tank 120d in the extension path, and can also wash away stubborn stains on the inner wall of the main unit drain tank 120d through the flushing force, thereby improving the cleanliness of the main unit drain tank 120d.

[0147] Furthermore, the main unit drain trough 120d, cleaning trough 120a and drain channel 120b are all connected. Therefore, there is no need to add an additional drain structure for the main unit drain trough 120d and cleaning trough 120a, so as to simplify the structure of the cleaning tray 120, reduce processing and production costs, and reduce the difficulty of cleaning the cleaning tray 120.

[0148] In some examples, the main unit drain 120d can be connected to the drain channel 120b via the cleaning tank 120a. In other words, dirt in the main unit drain 120d can first enter the cleaning tank 120a, and then enter the drain channel 120b via the cleaning tank 120a.

[0149] For example, the main unit drain trough 120d can extend along the direction X for the cleaning main unit to enter and exit. One end of the main unit drain trough 120d is connected to the cleaning trough 120a.

[0150] In other examples, the main unit drain 120d and the cleaning tank 120a are not directly connected. Dirt in the main unit drain 120d and the cleaning tank 120a can enter the drain channel 120b respectively.

[0151] For example, along the direction X for the cleaning unit to enter and exit, the main unit's drain trough 120d and cleaning trough 120a can be located at opposite ends of the drain channel 120b. The dirt in the main unit's drain trough 120d and cleaning trough 120a can flow into different areas of the drain channel 120b, thereby reducing the possibility of a large amount of dirt flowing into a local area of ​​the drain channel 120b, causing dirt overflow.

[0152] In some examples, the bottom wall of the main unit drain 120d can be tilted to direct dirt to the drain channel 120b.

[0153] In some examples, the spray assembly 125 may be connected to the clean water tank of the base station 100. The clean water tank can provide clean water or cleaning fluid to the spray assembly 125.

[0154] In some examples, the spray assembly 125 may be, but is not limited to, a water nozzle, a flat fan-shaped nozzle, a pulse nozzle, an oscillating nozzle, etc., and is not limited in the embodiments of this application.

[0155] In some examples, the spray assembly 125 can be connected to a water pump on the base station 100 to control the spray assembly 125 to spray cleaning fluid onto the bottom wall of the host drain tank 120d.

[0156] See also some of the possible implementation methods. Figure 4 , Figure 7 and Figure 8 As shown, the spray assembly 125 can be a fluid oscillator. The fluid oscillator is fixed to the cleaning tray 120. The fluid oscillator is connected to the clean water tank. The outlet of the fluid oscillator faces the main unit drain tank 120d. The fluid oscillator is configured to generate a periodically oscillating sweeping flow through the outlet under the drive of pressurized fluid to rinse the bottom wall of the main unit drain tank 120d.

[0157] In this embodiment, the fluid oscillator can automatically generate a periodically oscillating sweeping flow based on the fluid's own pressure to forcefully flush the bottom wall of the main unit's drain tank 120d. The fluid oscillator can thoroughly disperse and clean stubborn stains such as sludge and hair residue deposited on the bottom wall of the main unit's drain tank 120d, and can reduce the possibility of dirt accumulating and adhering to the tank wall for a long time, making it difficult to clean.

[0158] The sweeping jet generated by the fluid oscillator can reciprocate and sweep the bottom wall of the main unit's sewage tank 120d. The spray coverage of the fluid oscillator is much larger than that of a fixed nozzle. Under the same water pressure and flow rate, the sweeping jet of the fluid oscillator can cover a larger area in the width direction and a longer distance in the length direction of the main unit's sewage tank 120d. Therefore, it can effectively avoid the problems of concentrated flushing area, narrow coverage, and flushing dead corners at the ends and sides of the fixed nozzle, and can achieve uniform flushing of the entire width of the main unit's sewage tank 120d.

[0159] Furthermore, the periodic oscillation of the sweeping stream can create dynamically changing hydraulic impact angles on the bottom wall surface. Compared to the single-direction impact of a fixed-angle jet, the alternating impact at multiple angles has a better peeling effect on stubborn dirt adhering to the bottom wall.

[0160] Furthermore, since the fluid oscillator can periodically oscillate the bottom wall of the main unit's drain tank 120d using the fluid's own pressure, there is no need to add external drive mechanisms or oscillation mechanisms, which helps reduce the possibility of mechanical jamming, abnormal noise, or other problems during the operation of mechanical structures. It also reduces the space occupied by mechanical structures on the cleaning tray 120, potentially increasing the size of the base station 100.

[0161] In some examples, when the main unit drain tank 120d is directly connected to the cleaning tank 120a, the fluid oscillator can also clean the second contoured surface 1212 of the cleaning tank 120a that is close to the main unit drain tank 120d during the cleaning process of the main unit drain tank 120d, so as to further improve the cleaning effect of the second contoured surface 1212.

[0162] In some examples, the main unit drain tank 120d may also have an arc-shaped transition surface connected to the second contour surface 1212. During the cleaning process of the main unit drain tank 120d by the fluid oscillator, the flushing cleaning fluid may also flow through the arc-shaped transition surface to clean it.

[0163] In some examples, the fluid oscillator can achieve mechanically non-mechanically oscillating reciprocating sweeping flushing based on the fluid adhesion effect and the feedback channel pressure switching principle. Under continuous high-pressure water input, the working process of a single complete reciprocating oscillation cycle can be as follows:

[0164] First, high-pressure water is continuously fed into the main cavity of the fluid oscillator from the clean water tank. After the water enters the main cavity, it automatically adheres to the left arc-shaped cavity wall of the fluid oscillator due to the fluid adhesion effect and the negative pressure adsorption effect inside the cavity. The water flow deflects to the left and is sprayed out through the left area of ​​the outlet, thus rinsing the left area of ​​the bottom wall of the main unit's 120d sewage tank.

[0165] During the left-side jetting operation, some water flow within the fluid oscillator is guided along the end of the left-side arc-shaped cavity wall into the left-side feedback channel, forming a high-pressure backflow that flows in the opposite direction to the jet inlet of the main cavity. The feedback backflow continuously exerts lateral pressure on the main jet, gradually offsetting the adhesion force between the main jet and the left-side cavity wall, causing the main jet to detach from the left-side arc-shaped cavity wall.

[0166] After the main jet detaches from the left cavity wall, it quickly changes direction under the combined action of negative pressure and fluid pressure difference in the right cavity, automatically adhering to the right arc-shaped cavity wall for stable flow. The water flow deflects to the right and is sprayed out through the right side of the outlet, thus rinsing the right side of the bottom wall of the main unit's 120d drain tank.

[0167] Similarly, during the process of water jetting against the right wall, part of the water flow flows into the right feedback channel along the end of the right arc-shaped cavity wall, forming a reverse high-pressure backflow that acts on the main jet inlet. Through pressure impact, the main jet that is attached to the right side is pushed back to the initial working position on the left side, thus completing a complete left-right reciprocating oscillation cycle.

[0168] During the self-cleaning operation of the cleaning equipment, the clean water tank continuously supplies high-pressure fluid to the fluid oscillator, so that the oscillation process of wall-attachment switching and feedback reversal is carried out continuously, and the outlet continuously outputs a fan-shaped sweeping water mist that swings back and forth in an S-shape.

[0169] Compared to traditional fixed single-hole direct-fire nozzles, the single-spray coverage width of this embodiment can be increased by at least 2 times, effectively reducing the possibility of problems such as narrow coverage of fixed-point direct-fire water flow, inability to flush local areas of the sewage tank, and easy occurrence of residual stains in dry areas, reducing the flushing blind spots of the main unit sewage tank 120d, and improving the overall cleanliness of the base station 100 self-cleaning.

[0170] In some feasible ways, the cleaning disc 120 is detachably attached to the base 110.

[0171] In this embodiment, the user can remove the cleaning tray 120 from the base 110 according to usage needs to perform deep manual cleaning and maintenance on the internal structures of the cleaning tray 120, such as the cleaning groove 120a, the contoured arc surface 121, the bottom receiving groove 120c, the drain channel 120b, and the main unit drain groove 120d. This improves the cleaning effect of the cleaning tray 120 and reduces or even eliminates stubborn dirt and scale that accumulate in the dead corners inside the cleaning tray 120 after long-term use.

[0172] Furthermore, the detachable cleaning disc 120 can be replaced and maintained as an independent component. When the cleaning disc 120 becomes worn, aged, or damaged due to long-term use, the user does not need to replace the entire base 110; only the cleaning disc 120 needs to be replaced to restore the normal self-cleaning function of the base station 100, which helps reduce product maintenance costs and the replacement burden on users.

[0173] Furthermore, the detachable cleaning tray 120 can be modularly designed. Matching cleaning components 200 can be configured according to different application scenarios to meet product requirements and market iterations. The detachable cleaning tray 120 exhibits high adaptability and versatility.

[0174] In some examples, the cleaning disc 120 may be connected to the base 110 by means of snap-fit, magnetic connection, fastener connection, etc.

[0175] In some other possible implementations, the cleaning disc 120 is integrally molded into the base 110.

[0176] In this embodiment of the application, by setting a structure such as the contoured arc surface 121, the cleaning tank 120a can be self-cleaned while the cleaning component 200 is self-cleaning. Users do not need to frequently manually clean the cleaning tray 120. Therefore, the cleaning tray 120 and the base 110 can be an integral structure to reduce the possibility of increased costs and dead corners caused by separate processing, assembly, sealing and other processes.

[0177] Specifically, the cleaning tray 120 is integrally formed on the base 110, and there is no gap between the cleaning tray 120 and the base 110. Therefore, there are no gaps between the parts, and dirt and sewage will not be hidden in the assembly gap between the base 110 and the cleaning tray 120, thereby reducing the possibility of problems such as dirt accumulation and mold growth, odor generation, and blockage of water passages in the gaps.

[0178] See also some of the possible implementation methods. Figure 7 and Figure 8 As shown, the base station 100 also includes a filter element 130. The filter element 130 is disposed at the sewage inlet 120e of the sewage discharge channel 120b.

[0179] In this embodiment, the dirt in the cleaning tank 120a and the main unit's sewage discharge channel 120b can undergo solid-liquid separation via the filter element 130 before entering the sewage discharge channel 120b. Wastewater and fine particulate matter can pass through the filter element 130 and be discharged into the sewage discharge channel 120b, while solid impurities such as hair, large particles, and flocculent matter can be intercepted upstream of the filter element 130. Therefore, the likelihood of these solid contaminants entering the sewage discharge channel 120b and causing blockage of the discharge port 120f, affecting the sewage discharge performance of the base station 100, and consequently impacting the self-cleaning effect of the cleaning element 200 and the cleaning tank 120a, is significantly reduced. This significantly lowers the risk of blockage and maintenance frequency of the base station 100's sewage discharge system.

[0180] In some examples, there is a gap between the filter element 130 and the bottom wall of the drain channel 120b along the height direction Z of the base station 100. The drain outlet 120f of the drain channel 120b is located between the filter element 130 and the bottom wall of the drain channel 120b.

[0181] In some examples, the filter element 130 may be detachable from the cleaning disc 120 by means of snap-fit, fastener connection, etc., to facilitate users to clean the filter element 130 regularly.

[0182] In some examples, filter element 130 may be, but is not limited to, a filter screen, a filter basket, a grid plate, etc.

[0183] This application also provides a cleaning device. The cleaning device may include a cleaning host and the base station 100 in any of the above embodiments.

[0184] The cleaning host can enter and exit the base station 100. This beneficial effect can be found in the relevant description of the above embodiments, and will not be repeated here.

[0185] In the above detailed description, reference has been made to the accompanying drawings, which illustrate specific aspects of this disclosure by way of illustration. In this regard, terms indicating direction or positional relationship, such as “center,” “longitudinal,” “lateral,” “length,” “width,” “thickness,” “upper,” “lower,” “front,” “rear,” “left,” “right,” “vertical,” “horizontal,” “top,” “bottom,” “inner,” “outer,” “clockwise,” “counterclockwise,” “axial,” “radial,” and “circumferential,” are used with reference to the orientation of the described figures. Since components of the described device can be positioned in multiple different orientations, directional terms are used for illustrative purposes and not for limitation. It should be understood that other aspects can be utilized and structural or logical changes can be made without departing from the concept of this disclosure. Therefore, the following detailed description should not be considered limiting.

[0186] It should be understood that, unless otherwise expressly specified and limited, the terms "joining," "attaching," "installing," "connecting," "linking," "fixing," etc., used in the embodiments of this disclosure should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms herein based on the specific circumstances.

[0187] Furthermore, the term "above" as used herein with respect to components, elements, or material layers formed or located "above" a surface may be used to indicate that the component, element, or material layer is "indirectly" positioned (e.g., placed, formed, deposited, etc.) on the surface such that one or more additional components, elements, or layers are arranged between the surface and the component, element, or material layer. However, the term "above" as used with respect to components, elements, or material layers formed or located "above" a surface may also optionally have a specific meaning: that the component, element, or material layer is "directly" positioned (e.g., placed, formed, deposited, etc.) on the surface, for example, in direct contact with the surface.

[0188] Although terms such as “first,” “second,” and “third” may be used herein to describe various components, parts, regions, layers, or sections, these components, parts, regions, layers, or sections are not limited to these terms. Rather, these terms are used only to distinguish one component, part, region, layer, or section from another. Therefore, without departing from the teachings of the examples described herein, the first component, part, region, layer, or section mentioned in the examples may also be referred to as the second component, part, region, layer, or section. Furthermore, the terms “first” and “second” are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as “first” or “second” may explicitly or implicitly include at least one of that feature. In the description herein, “a plurality” means at least two, such as two, three, etc., unless otherwise explicitly specified.

Claims

1. A base station, characterized in that, include: A base (110) is provided for the cleaning unit to enter and exit and dock. A cleaning tray (120) is disposed on the base (110). The cleaning tray (120) has a cleaning groove (120a) facing the cleaning host. The cleaning groove (120a) can accommodate the cleaning component (200) of the cleaning host. The inner wall of the cleaning groove (120a) is provided with a contoured arc surface (121) that matches the outer contour of the cleaning component (200). The contoured arc surface (121) abuts against the cleaning component (200). When the cleaning component (200) rotates in the cleaning tank (120a), the rotating cleaning component (200) can rub and scrape the contoured arc surface (121) to self-clean the cleaning tank (120a).

2. The base station according to claim 1, characterized in that, The base station has a direction (X) for the cleaning host to enter and exit, and the contoured arc surface (121) includes a first contoured surface (1211) and a second contoured surface (1212) arranged opposite to each other. At least one of the first contoured surface (1211) and the second contoured surface (1212) abuts against the cleaning element (200).

3. The base station according to claim 2, characterized in that, The cleaning tray (120) is provided with a scraping structure (122), which is disposed on the contoured arc surface (121) and abuts against the cleaning component (200).

4. The base station according to claim 3, characterized in that, The scraping structure (122) and the cleaning component (200) are in an interference fit, and the interference fit between the scraping structure (122) and the cleaning component (200) is less than or equal to 4 mm.

5. The base station according to claim 3, characterized in that, Along the direction in which the cleaning host enters, the cleaning host moves from the first contoured surface (1211) to the second contoured surface (1212), and the scraping structure (122) is disposed on the first contoured surface (1211).

6. The base station according to claim 5, characterized in that, The cleaning tray (120) is provided with a drain channel (120b), which is connected to the cleaning tank (120a). The drain channel (120b) is used to discharge dirt from the cleaning tank (120a).

7. The base station according to claim 6, characterized in that, The cleaning tank (120a) includes a bottom receiving tank (120c) along the direction (X) for the cleaning host to enter and exit. The bottom receiving tank (120c) is located between the first contoured surface (1211) and the second contoured surface (1212). The bottom receiving tank (120c) is connected to the sewage discharge channel (120b).

8. The base station according to claim 7, characterized in that, The scraping structure (122) is disposed on the edge of the second contoured surface (1212) near the bottom receiving groove (120c), and the scraping structure (122) extends toward the cleaning groove (120a).

9. The base station according to claim 7, characterized in that, The bottom receiving groove (120c) extends along the width direction (Y) of the base station, and the sewage discharge channel (120b) is located in the middle area of ​​the bottom receiving groove (120c); Along the width direction (Y) of the base station, the bottom receiving groove (120c) is provided with cleaning ports (120g) at both ends. The cleaning ports (120g) are used to flush the dirt in the bottom receiving groove (120c) from both ends toward the middle area, so as to flush the dirt into the sewage channel (120b).

10. The base station according to claim 7, characterized in that, The cleaning tray (120) is also provided with a main unit drain trough (120d), which is connected to the drain channel (120b). A spray assembly (125) is provided at the end of the main unit drain trough (120d) away from the drain channel (120b). The spray assembly (125) is used to rinse the bottom wall of the main unit drain trough (120d).

11. The base station according to claim 10, characterized in that, The spray assembly (125) is a fluid oscillator, which is fixed to the cleaning tray (120). The fluid oscillator is connected to the clean water tank, and the outlet of the fluid oscillator faces the main unit's drain trough (120d). The fluid oscillator is configured to generate a periodically oscillating sweeping flow through the outlet under the drive of a pressurized fluid to flush the bottom wall of the main unit drain tank (120d).

12. The base station according to claim 6, characterized in that, The cleaning tray (120) is detachably connected to the base (110); or, the cleaning tray (120) is integrally formed into the base (110); and / or, The base station also includes a filter (130), which is disposed at the inlet (120e) of the sewage discharge channel (120b).

13. The base station according to claim 2, characterized in that, The cleaning tray (120) includes a support platform (123) and a cleaning pipeline (124). The support platform (123) is used to support the cleaning host, and the cleaning tank (120a) is disposed on the support platform (123). The cleaning pipe (124) is provided on the support platform (123) along the direction (X) for the cleaning host to enter and exit. At least one end of the cleaning tank (120a) is provided with the cleaning pipe (124), and the cleaning pipe (124) is used to rinse the first contoured surface (1211) and / or the second contoured surface (1212).

14. The base station (100) according to claim 6, characterized in that, The cleaning tray (120) is also provided with a main unit drain trough (120d), which is connected to the drain channel (120b). A spray assembly (125) is provided at the end of the main unit drain trough (120d) away from the drain channel (120b). The spray assembly (125) is used to rinse the bottom wall of the main unit drain trough (120d).

15. The base station (100) according to claim 14, characterized in that, The spray assembly (125) is a fluid oscillator, which is fixed to the cleaning tray (120). The fluid oscillator is connected to the clean water tank, and the outlet of the fluid oscillator faces the main unit's drain trough (120d). The fluid oscillator is configured to generate a periodically oscillating sweeping flow through the outlet under the drive of a pressurized fluid to flush the bottom wall of the main unit drain tank (120d).

16. The base station (100) according to claim 15, characterized in that, The cleaning tray (120) is detachably connected to the base (110); or the cleaning tray (120) is integrally formed on the base (110).

17. The base station (100) according to claim 15, characterized in that, It also includes a filter element (130), which is disposed at the inlet (120e) of the sewage channel (120b).

18. A cleaning device, characterized in that, include: Clean the main unit; The cleaning host can enter and exit the base station as described in any one of claims 1-17.

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