Registering device, register method and evaporation machine

Abstract

The application discloses a registration device, a registration method and an evaporation machine. The registration device is used for registering a substrate and a mask plate, and comprises a conveyor, a light signal transmitter and a position adjuster. The conveyor is used for conveying the substrate to a preset position parallel to the mask plate. The light signal transmitter is used for emitting a first light beam to the mask plate through a first position of the substrate and receiving a first reflected light beam reflected by the mask plate, and is also used for emitting a second light beam to the mask plate through a second position of the substrate and receiving a second reflected light beam reflected by the mask plate. The first light beam and the second light beam are both perpendicular to the substrate. The mask plate is provided with light reflecting material at the first position and the second position. The position adjuster is used for adjusting the position of the mask plate, so that the first light beam is projected to the first position of the mask plate or the second light beam is projected to the second position of the mask plate. According to the embodiment, the registration precision of the substrate and the mask plate can be improved.

Description

Technical Field

[0001] This application belongs to the field of device manufacturing technology, and in particular relates to a registration device, a registration method, and a vapor deposition machine. Background Technology

[0002] Evaporation machines, commonly used for material deposition, heat device materials to their evaporation point in a vacuum environment, converting them into gaseous particles that then condense and deposit on a substrate, forming devices such as organic light-emitting diodes (OLEDs). During the evaporation process, the cutout areas of the mask allow the device material to pass through and deposit at predetermined locations on the substrate, resulting in a device with a predetermined morphology.

[0003] Film deposition accuracy is one of the important indicators for evaluating the performance of a vapor deposition machine, and the positioning accuracy of the substrate and mask during film deposition has a decisive impact on the film quality. Only when the substrate and mask are precisely aligned can the device material accurately pass through the cutout area of ​​the mask and be deposited on the preset position of the substrate, thereby forming a device that meets the requirements. However, related technologies suffer from the problem of low registration accuracy between the substrate and mask. Summary of the Invention

[0004] This application provides a registration apparatus, a registration method, and a vapor deposition machine, which can improve the registration accuracy between the substrate and the mask.

[0005] In a first aspect, embodiments of this application provide a registration apparatus for registering a substrate and a mask plate. The registration apparatus includes:

[0006] A conveyor is used to transport a substrate to a predetermined position parallel to the mask.

[0007] An optical signal transmitter is used to emit a first light beam toward a mask through a first position on a substrate and receive a first reflected light beam reflected by the mask. The optical signal transmitter is also used to emit a second light beam toward the mask through a second position on a substrate and receive a second reflected light beam reflected by the mask. The first light beam and the second light beam are both perpendicular to the substrate. Light reflective material is provided at both the first position and the second position of the mask.

[0008] A position adjuster is used to adjust the position of a mask so that a first beam is projected onto a first position of the mask, or a second beam is projected onto a second position of the mask.

[0009] In one possible embodiment of the first aspect, a light-transmitting material is provided at a first location on the substrate.

[0010] In one possible embodiment of the first aspect, an opening is provided at a first position of the substrate; an optical signal transmitter is used to emit a first light beam to a mask through the opening at the first position of the substrate and to receive a first reflected light beam reflected by the mask.

[0011] In one possible embodiment of the first aspect, a light-transmitting material is provided at a second location on the substrate.

[0012] In one possible embodiment of the first aspect, an opening is provided at a second position of the substrate; the optical signal transmitter is used to emit a second light beam to the mask through the opening at the second position of the substrate and to receive a second reflected light beam reflected by the mask.

[0013] In one possible embodiment of the first aspect, the optical signal transmitter includes a first optical signal transmitter and a second optical signal transmitter;

[0014] The first optical signal transmitter is used to emit a first light beam toward the mask through a first position on the substrate and to receive a first reflected light beam reflected by the mask.

[0015] The second optical signal transmitter is used to emit a second light beam toward the mask through a second position on the substrate and to receive a second reflected light beam reflected by the mask.

[0016] In one possible embodiment of the first aspect, the second optical signal transmitter is used to emit a second light beam toward the mask through a second position of the substrate and receive the second reflected light beam reflected by the mask when the light intensity of the first reflected light beam is greater than or equal to a preset light intensity threshold.

[0017] In one possible embodiment of the first aspect, the registration device is further configured to:

[0018] If the light intensity of the second reflected beam is greater than or equal to the preset light intensity threshold, a registration success signal is output.

[0019] In one possible embodiment of the first aspect, the optical signal transmitter is used to emit a laser beam; laser reflective material is provided at both a first position and a second position of the mask.

[0020] In one possible embodiment of the first aspect, the position adjuster is used for:

[0021] When the optical signal transmitter emits a first beam of light to the mask through the first position of the substrate, the position of the mask is adjusted so that the first beam of light is projected onto the first position of the mask;

[0022] And / or, if the light intensity of the first reflected beam is less than a preset light intensity threshold, adjust the position of the mask so that the light intensity of the first reflected beam is greater than or equal to the preset light intensity threshold.

[0023] And / or, when the optical signal transmitter emits a second beam toward the mask through the second position of the substrate, the mask is controlled to rotate around the first position of the mask as the origin, so that the second beam is projected onto the second position of the mask;

[0024] And / or, if the light intensity of the second reflected beam is less than a preset light intensity threshold, control the mask to rotate around the first position of the mask as the origin, so that the light intensity of the second reflected beam is greater than or equal to the preset light intensity threshold.

[0025] In one possible embodiment of the first aspect, when the position adjuster adjusts the position of the mask, the mask and the substrate remain parallel.

[0026] In one possible embodiment of the first aspect, position marking information is provided at the first position of the substrate, the second position of the substrate, the first position of the mask, and the second position of the mask.

[0027] Based on the same inventive concept, in a second aspect, embodiments of this application also provide a registration method applied to the registration apparatus as described in any embodiment of the first aspect.

[0028] Based on the same inventive concept, in a third aspect, embodiments of this application also provide a vapor deposition machine, including the registration apparatus as described in any embodiment of the first aspect.

[0029] According to the registration apparatus, registration method, and evaporation machine provided in the embodiments of this application, the registration apparatus is used to register a substrate and a mask. The registration apparatus includes a transmitter, a light signal transmitter, and a position adjuster. The transmitter is used to transport the substrate to a preset position parallel to the mask and fix it, ensuring the parallel positional accuracy between the substrate and the mask, providing a solid foundation for the registration process. The light signal transmitter is used to emit a first light beam towards the mask through a first position on the substrate and receive a first reflected light beam reflected by the mask. The light signal transmitter is also used to emit a second light beam towards the mask through a second position on the substrate and receive a second reflected light beam reflected by the mask. Both the emitted first and second light beams are perpendicular to the substrate, ensuring that the beams can be reflected back along their original path, improving measurement accuracy. Light-reflecting materials are provided at both the first and second positions on the mask. Therefore, by emitting a perpendicular light beam towards the mask through the substrate and receiving the reflected beam, the light signal transmitter achieves high-precision measurement of the relative position between the substrate and the mask. The position adjuster is used to adjust the position of the mask, so that the first beam is projected onto a first position of the mask, or the second beam is projected onto a second position of the mask, ensuring that the first or second beam is accurately projected onto the corresponding position of the mask. Through the coordinated work of the transmitter, the optical signal transmitter, and the position adjuster, high-precision registration between the substrate and the mask is achieved, thereby ensuring that the device material can accurately pass through the cutout area of ​​the mask and be deposited onto the preset position of the substrate to form a device that meets the requirements. Attached Figure Description

[0030] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings, in which the same or similar reference numerals denote the same or similar features, and the drawings are not drawn to scale.

[0031] Figure 1 This is a schematic diagram of a registration device provided in an embodiment of this application;

[0032] Figure 2 This is a schematic diagram of the registration device provided in this application performing a registration operation;

[0033] Figure 3 This is a schematic flowchart of a registration method provided in an embodiment of this application;

[0034] Figure 4 This is another structural schematic diagram of the registration method provided in the embodiments of this application;

[0035] Figure 5 This is another structural schematic diagram of the registration method provided in the embodiments of this application;

[0036] Figure 6This is another structural schematic diagram of the registration method provided in the embodiments of this application;

[0037] Figure 7 This is another structural schematic diagram of the registration method provided in the embodiments of this application;

[0038] Figure 8 This is another structural schematic diagram of the registration method provided in the embodiments of this application. Detailed Implementation

[0039] The features and exemplary embodiments of various aspects of this application will now be described in detail. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain this application and are not configured to limit this application. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples of this application.

[0040] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.

[0041] It should be understood that the term "and / or" used in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.

[0042] Various modifications and variations can be made to this application without departing from its spirit or scope, which will be apparent to those skilled in the art. Therefore, this application is intended to cover modifications and variations falling within the scope of the corresponding claims (the claimed technical solutions) and their equivalents. It should be noted that the embodiments provided in this application can be combined with each other without contradiction.

[0043] Before describing the technical solutions provided in the embodiments of this application, in order to facilitate understanding of the embodiments of this application, this application first specifically explains the problems existing in the related technologies:

[0044] Evaporation machines, commonly used for material deposition, heat device materials to their evaporation point in a vacuum environment, converting them into gaseous particles that then condense and deposit on a substrate, forming devices such as organic light-emitting diodes (OLEDs). During the evaporation process, the cutout areas of the mask allow the device material to pass through and deposit at predetermined locations on the substrate, resulting in a device with a predetermined morphology.

[0045] Film deposition accuracy is one of the important indicators for evaluating the performance of a vapor deposition machine, and the positioning accuracy of the substrate and mask during film deposition has a decisive impact on the film quality. Only when the substrate and mask are precisely aligned can the device material accurately pass through the cutout area of ​​the mask and be deposited on the preset position of the substrate, thereby forming a device that meets the requirements. However, related technologies suffer from the problem of low registration accuracy between the substrate and mask.

[0046] In some related technologies, alignment marks are placed on the substrate and mask when adjusting their relative positions. These marks are photographed, and the relative positions of the substrate and mask are adjusted based on the images, allowing for a preliminary, rough adjustment of their separation. Then, the substrate and mask are brought into contact to measure the positional deviation, allowing for more precise adjustment. If the deviation is outside the desired range, the substrate and mask are isolated, repositioned, and then brought back into contact, repeating the same process until the misalignment falls within the required range. Repeatedly performing this contact and isolation process not only increases the alignment time but also increases the amount of dust that may be generated during contact, negatively impacting product quality.

[0047] Based on this, embodiments of this application provide a registration device, a registration method, and a vapor deposition machine, which can improve the registration accuracy between the substrate and the mask, and eliminate the need for repeated contact and isolation between the substrate and the mask, thereby avoiding an increase in dust and ensuring product quality.

[0048] The registration apparatus provided in the embodiments of this application will now be described in detail with reference to the accompanying drawings.

[0049] Figure 1 This is a schematic diagram of the structure of a registration device provided in an embodiment of this application, as shown below. Figure 1 As shown, the registration device 100 is used to register the substrate 200 and the mask 300. The registration device 100 may include a transmitter 10, an optical signal transmitter 20, and a position adjuster 30.

[0050] The transmitter 10 is used to transport the substrate 200 to a preset position parallel to the mask 300.

[0051] Specifically, the transmitter 10 can transport the substrate 200 to a preset position parallel to the mask 300 and fix it, ensuring that the substrate 200 and the mask 300 maintain parallel positional accuracy, providing a solid foundation for the registration process.

[0052] The optical signal transmitter 20 is used to emit a first light beam toward the mask 300 through a first position of the substrate 200 and receive a first reflected light beam reflected by the mask 300. The optical signal transmitter 20 is also used to emit a second light beam toward the mask 300 through a second position of the substrate 200 and receive a second reflected light beam reflected by the mask 300. The first light beam and the second light beam are both perpendicular to the substrate 200. Light reflective material is provided at both the first position and the second position of the mask 300.

[0053] In this design, the first and second beams emitted by the optical signal transmitter 20 are both perpendicular to the substrate 200, ensuring that the beams can be reflected back along the original path, thus improving measurement accuracy.

[0054] For example, if the first beam can be reflected back (the optical signal transmitter 20 receives the first reflected beam), it indicates that the first position of the substrate 200 is aligned with the first position of the mask 300.

[0055] For example, if the second beam can be reflected back (the optical signal transmitter 20 receives the second reflected beam), it means that the second position of the substrate 200 is aligned with the second position of the mask 300.

[0056] Both the first and second positions of the mask plate 300 are provided with light-reflecting materials. Therefore, after the optical signal transmitter 20 emits a vertical beam of light through the substrate 200 to the mask plate 300, it receives the beam of light (first reflected beam or second reflected beam) reflected back by the mask plate 300 through the substrate 200.

[0057] Specifically, the optical signal transmitter 20 can emit a first beam of light to the mask 300 through the first position of the substrate 200 and receive the first reflected beam of light reflected back from the mask 300 through the first position of the substrate 200. The optical signal transmitter 20 can also emit a second beam of light to the mask 300 through the second position of the substrate 200 and receive the second reflected beam of light reflected back from the mask 300 through the second position of the substrate 200.

[0058] The position adjuster 30 is used to adjust the position of the mask plate 300 so that the first beam is projected onto the first position of the mask plate 300, or the second beam is projected onto the second position of the mask plate 300.

[0059] Specifically, the position adjuster 30 can adjust the position of the mask 300 so that the first beam is projected onto the first position of the mask 300, or the second beam is projected onto the second position of the mask 300, so that the first beam or the second beam is accurately projected onto the corresponding position of the mask 300.

[0060] According to the registration apparatus provided in this application embodiment, the registration apparatus is used to register a substrate and a mask. The registration apparatus includes a transmitter, an optical signal transmitter, and a position adjuster. The transmitter is used to transport the substrate to a preset position parallel to the mask and fix it, ensuring the parallel positional accuracy between the substrate and the mask, providing a solid foundation for the registration process. The optical signal transmitter is used to emit a first light beam towards the mask through a first position on the substrate and receive a first reflected light beam reflected by the mask. The optical signal transmitter is also used to emit a second light beam towards the mask through a second position on the substrate and receive a second reflected light beam reflected by the mask. Both the emitted first and second light beams are perpendicular to the substrate, ensuring that the beams can be reflected back along their original path, improving measurement accuracy. Both the first and second positions on the mask are provided with light-reflecting materials. Therefore, by emitting a perpendicular light beam towards the mask through the substrate and receiving the reflected beam, the optical signal transmitter achieves high-precision measurement of the relative position between the substrate and the mask. The position adjuster is used to adjust the position of the mask, so that the first beam is projected onto a first position of the mask, or the second beam is projected onto a second position of the mask, ensuring that the first or second beam is accurately projected onto the corresponding position of the mask. Through the coordinated work of the transmitter, the optical signal transmitter, and the position adjuster, high-precision registration between the substrate and the mask is achieved, thereby ensuring that the device material can accurately pass through the cutout area of ​​the mask and be deposited onto the preset position of the substrate to form a device that meets the requirements.

[0061] In some embodiments, a light-transmitting material is provided at a first location on the substrate 200.

[0062] In this embodiment, the first position of the substrate 200 is made of a light-transmitting material. This allows the first light beam emitted by the optical signal transmitter 20 to penetrate the substrate 200 without obstruction and directly illuminate the mask 300. It also ensures that the first reflected light beam can smoothly pass back through the mask 300 from the first position of the substrate 200 and be accurately received by the optical signal transmitter 20. Through the transmission and reflection of the light beam, it is possible to verify whether the first position of the substrate 200 and the first position of the mask 300 are aligned, improving the accuracy and reliability of the registration process.

[0063] In some embodiments, an opening is provided at a first position of the substrate 200; the optical signal transmitter 20 is used to emit a first light beam to the mask 300 through the opening at the first position of the substrate 200 and to receive a first reflected light beam reflected by the mask 300.

[0064] This embodiment of the application provides an unobstructed beam path by providing an opening at a first location on the substrate 200. The optical signal transmitter 20 can directly emit a first beam to the mask 300 through this opening and receive the first reflected beam reflected by the mask 300 through the opening. This avoids light loss and path complexity that may be caused by refraction, scattering, or absorption of the beam in the light-transmitting material, thus improving the efficiency and accuracy of the registration process. Furthermore, the opening can be implemented through a simple manufacturing process, reducing costs.

[0065] In some embodiments, a light-transmitting material is provided at a second location on the substrate 200.

[0066] In this embodiment, the second position of the substrate 200 is made of a light-transmitting material. This allows the second beam emitted by the optical signal transmitter 20 to penetrate the substrate 200 without obstruction and directly illuminate the mask 300. It also ensures that the second reflected beam can smoothly pass back through the mask 300 from the second position of the substrate 200 and be accurately received by the optical signal transmitter 20. Through the transmission and reflection of the beam, it is possible to verify whether the second position of the substrate 200 and the second position of the mask 300 are aligned, improving the accuracy and reliability of the registration process.

[0067] In some embodiments, an opening is provided at a second position of the substrate 200; the optical signal transmitter 20 is used to emit a second light beam to the mask 300 through the opening at the second position of the substrate 200 and to receive a second reflected light beam reflected by the mask 300.

[0068] This embodiment of the application provides an unobstructed beam path by providing an opening at a second location on the substrate 200. The optical signal transmitter 20 can directly emit a second beam to the mask 300 through this opening and receive the second reflected beam reflected by the mask 300 through the opening. This avoids light loss and path complexity that may be caused by refraction, scattering, or absorption of the beam in the light-transmitting material, thus improving the efficiency and accuracy of the registration process. Furthermore, the opening can be implemented through a simple manufacturing process, reducing costs.

[0069] Figure 2 This is a schematic diagram of the registration device provided in this application performing a registration operation.

[0070] In some embodiments, such as Figure 2 As shown, the optical signal transmitter 20 includes a first optical signal transmitter 21 and a second optical signal transmitter 22.

[0071] The first optical signal transmitter 21 is used to emit a first light beam toward the mask 300 through a first position of the substrate 200 and to receive a first reflected light beam reflected by the mask 300.

[0072] The second optical signal transmitter 22 is used to emit a second light beam toward the mask 300 through the second position of the substrate 200 and to receive the second reflected light beam reflected by the mask 300.

[0073] This embodiment of the application sets up two optical signal transmitters (first optical signal transmitter 21 and second optical signal transmitter 22), which are respectively responsible for emitting and receiving reflected light beams from different positions of the substrate 200 to the mask 300, thereby realizing multi-point high-precision measurement of the relative position of the substrate 200 and the mask 300, thus improving the overall accuracy and reliability of the registration process.

[0074] In some embodiments, see [link to relevant documentation]. Figure 2 The second optical signal transmitter 20 is used to emit a second beam toward the mask plate 300 through the second position of the substrate 200 and receive the second reflected beam reflected by the mask plate 300 when the light intensity of the first reflected beam is greater than or equal to a preset light intensity threshold.

[0075] Specifically, after the first optical signal transmitter 20 receives the first reflected beam, it needs to determine whether the light intensity of the first reflected beam meets the requirements, thereby determining whether the first position of the substrate 200 and the first position of the mask 300 are aligned. If the light intensity of the first reflected beam is greater than or equal to a preset light intensity threshold, it is considered to meet the requirements. Then, the second position of the substrate 200 and the second position of the mask 300 are aligned, that is, the second optical signal transmitter 20 emits a second beam through the second position of the substrate 200 to the mask 300 and receives the second reflected beam reflected by the mask 300. If the light intensity of the first reflected beam is less than the preset light intensity threshold, it indicates that the first position of the substrate 200 and the first position of the mask 300 are not yet aligned. The position of the mask can then be adjusted by the position adjuster 30 until the light intensity of the first reflected beam is greater than or equal to the preset light intensity threshold.

[0076] This application embodiment introduces a light intensity judgment mechanism, so that the second optical signal transmitter 20 can perform the second position registration operation only after confirming that the light intensity of the first reflected beam reaches a preset threshold (i.e., confirming the initial alignment of the substrate 200 and the mask 300). This ensures the accuracy and reliability of the registration process, effectively avoids errors caused by misalignment, and improves the overall registration efficiency.

[0077] In some embodiments, the registration device 100 can also be used to output a registration success signal when the light intensity of the second reflected beam is greater than or equal to a preset light intensity threshold.

[0078] Specifically, when the second optical signal transmitter 20 emits a second beam of light to the mask 300 through the second position of the substrate 200 and receives the second reflected beam of light reflected by the mask 300, if the light intensity of the second reflected beam is greater than or equal to a preset light intensity threshold, it indicates that the second position of the substrate 200 and the second position of the mask 300 have been aligned. At this time, a registration success signal can be output, indicating that the substrate 200 and the mask 300 have been successfully registered.

[0079] In this embodiment, the registration device 100 can accurately determine whether the second position of the substrate 200 and the second position of the mask 300 are aligned by detecting whether the light intensity of the second reflected beam reaches a preset threshold. Once the light intensity reaches the threshold, it automatically outputs a registration success signal, ensuring the accuracy and efficiency of the registration process and providing a reliable guarantee for subsequent manufacturing or processing steps.

[0080] In some embodiments, the optical signal transmitter 20 is used to emit a laser beam; laser reflective material is provided at both the first position and the second position of the mask 300.

[0081] This embodiment of the application emits a laser beam through an optical signal transmitter 20 and coats key locations (first and second locations) of the mask 300 with laser reflective material. Compared to ordinary laser beams, it fully utilizes the unique advantages of high directionality, high brightness, and high monochromaticity of lasers. This not only significantly improves the efficiency of the beam during transmission and the accuracy during reflection, but also greatly enhances the accuracy and stability of the registration operation, thereby enabling more precise and reliable registration between the substrate 200 and the mask 300.

[0082] In some embodiments, the position adjuster 30 is used to adjust the position of the mask 300 when the optical signal transmitter 20 emits a first beam of light to the mask 300 through the first position of the substrate 200, so that the first beam of light is projected onto the first position of the mask 300.

[0083] In this embodiment, when the optical signal transmitter 20 emits a first beam of light to the mask 300 through the first position of the substrate 200, the position adjuster 30 can adjust the position of the mask 300 in real time to ensure that the first beam of light can be accurately projected onto the preset first position on the mask 300, thereby significantly improving the accuracy and efficiency of the entire registration process.

[0084] In some embodiments, the position adjuster 30 is used to adjust the position of the mask 300 when the light intensity of the first reflected beam is less than a preset light intensity threshold, so that the light intensity of the first reflected beam is greater than or equal to the preset light intensity threshold.

[0085] In this embodiment, the position adjuster 30 can automatically adjust the position of the mask 300 when the light intensity of the first reflected beam is insufficient to reach a preset threshold, so as to ensure that the light intensity of the first reflected beam reaches or exceeds the preset standard, effectively improving the automation and accuracy of the registration process and reducing errors caused by position deviation.

[0086] In some embodiments, the position adjuster 30 is used to control the mask 300 to rotate around the first position of the mask 300 as the origin when the optical signal transmitter 20 emits a second beam of light to the mask 300 through the second position of the substrate 200, so that the second beam of light is projected onto the second position of the mask 300.

[0087] In this embodiment, the position adjuster 30 can control the mask 300 to rotate around the first position, thereby ensuring that the first position of the substrate 200 is aligned with the first position of the mask, while accurately projecting the second beam emitted by the optical signal transmitter 20 from the second position of the substrate 200 to the designated second position of the mask 300, which greatly improves the flexibility, accuracy and speed of the registration operation.

[0088] In some embodiments, the position adjuster 30 is used to control the mask 300 to rotate around the first position of the mask 300 as the origin when the light intensity of the second reflected beam is less than a preset light intensity threshold, so that the light intensity of the second reflected beam is greater than or equal to the preset light intensity threshold.

[0089] Specifically, when the position adjuster 30 controls the mask plate 300 to rotate around the first position of the mask plate 300 as the origin, if the light intensity of the second reflected beam is less than the preset light intensity threshold, the rotation continues until the light intensity of the second reflected beam reaches or exceeds the preset standard and then stops.

[0090] In this embodiment, the position adjuster 30 adjusts the position of the mask 300 by rotating around the first position of the mask 300 as the origin, and stops rotating only when the light signal transmitter 20 receives the second reflected beam and the light intensity of the second reflected beam is greater than or equal to the preset light intensity threshold. This improves the automation and intelligence of the registration process and ensures the accuracy of the registration results.

[0091] In some embodiments, when the position adjuster 30 adjusts the position of the mask 300, the mask 300 and the substrate 200 remain parallel.

[0092] In this embodiment, when adjusting the position of the mask 300, the position adjuster 30 can ensure that the mask 300 and the substrate 200 remain parallel at all times, which greatly simplifies the alignment process and makes it easier and faster for the two (mask 300 and substrate 200) to achieve precise alignment, thereby improving the overall registration efficiency and accuracy.

[0093] In some embodiments, position marking information is provided at the first position of the substrate 200, the second position of the substrate 200, the first position of the mask 300, and the second position of the mask 300.

[0094] This application embodiment provides clear reference points for the registration process by setting position marker information at key positions (first position and second position) on the substrate 200 and key positions (first position and second position) on the mask 300, which can greatly simplify and accelerate the registration process and improve the accuracy and efficiency of alignment.

[0095] Figure 3 This is a schematic flowchart of a registration method provided in an embodiment of this application.

[0096] Based on the same inventive concept, this application also provides a registration method, applied to the registration device 100 in any of the above embodiments. For example... Figure 3 As shown, the registration method may include steps S110 to S150.

[0097] S110, the control transmitter 10 transmits the substrate 200 to a preset position parallel to the mask 300.

[0098] S120, control the optical signal transmitter 20 to emit a first beam of light to the mask 300 through the first position of the substrate 200 and receive the first reflected beam of light reflected by the mask 300.

[0099] S130, the position adjuster 30 adjusts the position of the mask 300 so that the first beam is projected onto the first position of the mask 300.

[0100] S140, control the optical signal transmitter 20 to emit a second beam of light to the mask 300 through the second position of the substrate 200 and receive the second reflected beam of light reflected by the mask 300.

[0101] The first beam and the second beam are both perpendicular to the substrate 200, and light-reflecting materials are provided at the first position and the second position of the mask 300.

[0102] S150, the position adjuster 30 adjusts the position of the mask 300 so that the second beam is projected onto the second position of the mask 300.

[0103] Specifically, firstly, the transmitter 10 precisely transports the substrate 200 to a preset position parallel to the mask 300. Then, the optical signal transmitter 20 emits a first beam perpendicularly towards the mask 300 through a first position on the substrate 200, and the position adjuster 30 adjusts the position of the mask 300, enabling the optical signal transmitter 20 to receive the first reflected beam reflected back from the mask 300 through the first position on the substrate 200. Next, the optical signal transmitter 20 emits a second beam perpendicularly towards the mask 300 through a second position on the substrate 200, and the position adjuster 30 adjusts the position of the mask 300, enabling the optical signal transmitter 20 to receive the second reflected beam reflected back from the mask 300 through the second position on the substrate 200. Light-reflecting material is provided at key positions (the first and second positions) on the mask 300 to ensure effective reflection of the beam.

[0104] The embodiments of this application not only simplify the registration process and reduce reliance on manual operation, but also ensure precise alignment between the substrate 200 and the mask 300 through high-precision beam control and position adjustment, significantly improving the automation and accuracy of the registration process.

[0105] Figure 4 This is another flowchart illustrating the registration method provided in the embodiments of this application.

[0106] In one embodiment, such as Figure 4 As shown, the optical signal transmitter 20 includes a first optical signal transmitter 21 and a second optical signal transmitter 22. Step S120 controls the optical signal transmitter 20 to emit a first light beam toward the mask 300 through a first position on the substrate 200 and to receive a first reflected light beam reflected by the mask 300, which may include step S121.

[0107] S121, control the first optical signal transmitter 21 to emit a first light beam to the mask 300 through the first position of the substrate 200 and receive the first reflected light beam reflected by the mask 300.

[0108] Step S140 controls the optical signal transmitter 20 to emit a second beam of light to the mask 300 through the second position of the substrate 200 and to receive the second reflected beam of light reflected by the mask 300, which may include step S141.

[0109] S141, control the second optical signal transmitter 22 to emit a second beam of light to the mask plate 300 through the second position of the substrate 200 and receive the second reflected beam of light reflected by the mask plate 300.

[0110] This embodiment of the application sets up two optical signal transmitters (first optical signal transmitter 21 and second optical signal transmitter 22), which are respectively responsible for emitting and receiving reflected light beams from different positions of the substrate 200 to the mask 300, thereby realizing multi-point high-precision measurement of the relative position of the substrate 200 and the mask 300, thus improving the overall accuracy and reliability of the registration process.

[0111] Figure 5 This is another flowchart illustrating the registration method provided in the embodiments of this application.

[0112] In one embodiment, such as Figure 5 As shown, step S141 controls the second optical signal transmitter 22 to emit a second beam of light to the mask 300 through the second position of the substrate 200 and receive the second reflected beam of light reflected by the mask 300, which may include step S1411.

[0113] S1411, the second optical signal transmitter 20 is controlled to emit a second beam toward the mask plate 300 through the second position of the substrate 200 and receive the second reflected beam reflected by the mask plate 300 when the light intensity of the first reflected beam is greater than or equal to a preset light intensity threshold.

[0114] Specifically, after the first optical signal transmitter 20 receives the first reflected beam, it needs to determine whether the light intensity of the first reflected beam meets the requirements, thereby determining whether the first position of the substrate 200 and the first position of the mask 300 are aligned. If the light intensity of the first reflected beam is greater than or equal to a preset light intensity threshold, it is considered to meet the requirements. Then, the second position of the substrate 200 and the second position of the mask 300 are aligned, that is, the second optical signal transmitter 20 is controlled to emit a second beam through the second position of the substrate 200 to the mask 300 and receive the second reflected beam reflected by the mask 300. If the light intensity of the first reflected beam is less than the preset light intensity threshold, it indicates that the first position of the substrate 200 and the first position of the mask 300 are not yet aligned. The position adjuster 30 can then continue to adjust the position of the mask until the light intensity of the first reflected beam is greater than or equal to the preset light intensity threshold.

[0115] This application embodiment introduces a light intensity judgment mechanism, so that the second optical signal transmitter 20 can perform the second position registration operation only after confirming that the light intensity of the first reflected beam reaches a preset threshold (i.e., confirming the initial alignment of the substrate 200 and the mask 300). This ensures the accuracy and reliability of the registration process, effectively avoids errors caused by misalignment, and improves the overall registration efficiency.

[0116] Figure 6 This is another flowchart illustrating the registration method provided in the embodiments of this application.

[0117] In one embodiment, such as Figure 6 As shown, the registration method may further include step S160.

[0118] S160, the registration device 100 outputs a registration success signal when the light intensity of the second reflected beam is greater than or equal to a preset light intensity threshold.

[0119] In this embodiment, the registration device 100 can accurately determine whether the second position of the substrate 200 and the second position of the mask 300 are aligned by detecting whether the light intensity of the second reflected beam reaches a preset threshold. Once the light intensity reaches the threshold, it automatically outputs a registration success signal, ensuring the accuracy and efficiency of the registration process and providing a reliable guarantee for subsequent manufacturing or processing steps.

[0120] Figure 7 This is another flowchart illustrating the registration method provided in the embodiments of this application.

[0121] In one embodiment, such as Figure 7 As shown, step S130 controls the position adjuster 30 to adjust the position of the mask plate 300 so that the first beam is projected onto the first position of the mask plate 300, which may include steps S131 and S132.

[0122] S131, when the optical signal transmitter 20 emits a first beam toward the mask 300 through the first position of the substrate 200, the position adjuster 30 adjusts the position of the mask 300 so that the first beam is projected onto the first position of the mask 300.

[0123] S132, when the light intensity of the first reflected beam is less than the preset light intensity threshold, the position adjuster 300 adjusts the position of the mask 300 so that the light intensity of the first reflected beam is greater than or equal to the preset light intensity threshold.

[0124] Step S150 controls the position adjuster 30 to adjust the position of the mask plate 300 so that the second beam is projected onto the second position of the mask plate 300, which may include steps S151 and S152.

[0125] S151, when the optical signal transmitter 20 emits a second beam toward the mask 300 through the second position of the substrate 200, the control position adjuster 30 controls the mask 300 to rotate around the first position of the mask 300 as the origin, so that the second beam is projected onto the second position of the mask 300.

[0126] S152, when the light intensity of the second reflected beam is less than the preset light intensity threshold, the control position adjuster 30 controls the mask plate 300 to rotate around the first position of the mask plate 300 as the origin, so that the light intensity of the second reflected beam is greater than or equal to the preset light intensity threshold.

[0127] It should be noted that when the position adjuster 30 adjusts the position of the mask 300, the mask 300 and the substrate 200 remain parallel.

[0128] In this embodiment, the position of the mask 300 is adjusted by a fine-control position adjuster 30 to ensure that the first and second beams can be accurately projected onto the designated position of the mask through the designated position on the substrate. Furthermore, the mask automatically adjusts to meet the requirements when the intensity of the reflected beam does not meet a preset threshold. Throughout this process, the mask and substrate remain parallel, thereby improving the accuracy and efficiency of registration.

[0129] Figure 8 This is another flowchart illustrating the registration method provided in the embodiments of this application.

[0130] In one embodiment, such as Figure 8 As shown, before step S110 controls the transmitter 10 to transfer the substrate 200 to a preset position parallel to the mask 300, the registration method may also include step S170.

[0131] S170, position marking information is applied at the first position of the substrate 200, the second position of the substrate 200, the first position of the mask 300, and the second position of the mask 300.

[0132] For example, see Figure 2 Hollow circles can be drawn at the first and second positions of the substrate 200 and holes can be made inside the circles. Solid circles can be drawn at the first and second positions of the mask 300 and laser reflective material can be coated inside the circles.

[0133] This application embodiment provides clear reference points for the registration process by setting position marker information at key positions (first position and second position) on the substrate 200 and key positions (first position and second position) on the mask 300, which can greatly simplify and accelerate the registration process and improve the accuracy and efficiency of alignment.

[0134] Based on the same inventive concept, this application also provides a vapor deposition machine 1000, including the registration device 100 as provided in any of the above embodiments.

[0135] The vapor deposition machine 1000 provided in this application embodiment, by integrating the registration device 100 as described in any of the above embodiments, ensures the alignment accuracy between the mask plate 300 and the substrate 200 during the vapor deposition process, thereby improving the efficiency of the vapor deposition operation and the product quality.

[0136] The vapor deposition machine 1000 includes the registration device 100 provided in any of the above embodiments, and therefore the vapor deposition machine 1000 has all the beneficial effects of the registration device 100.

[0137] It should be understood that in the embodiments of this application, "B corresponding to A" means that B is associated with A, and B can be determined based on A. However, it should also be understood that determining B based on A does not mean that B is determined solely based on A; B can also be determined based on A and / or other information.

[0138] The above are merely specific embodiments of this application, but the scope of protection of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A registration device, characterized in that, For registering a substrate and a mask, the registration device includes: A conveyor for transporting the substrate to a predetermined position parallel to the mask plate; An optical signal transmitter is configured to emit a first light beam toward a mask through a first position on the substrate and receive a first reflected light beam reflected by the mask. The optical signal transmitter is also configured to emit a second light beam toward the mask through a second position on the substrate and receive a second reflected light beam reflected by the mask. Both the first light beam and the second light beam are perpendicular to the substrate. Light-reflecting materials are provided at both the first and second positions of the mask. A position adjuster is used to adjust the position of the mask so that the first beam is projected onto a first position of the mask, or the second beam is projected onto a second position of the mask.

2. The registration device according to claim 1, characterized in that, A light-transmitting material is provided at the first position of the substrate; Preferably, an opening is provided at a first position of the substrate; the optical signal transmitter is used to emit a first light beam to the mask through the opening at the first position of the substrate and to receive a first reflected light beam reflected by the mask. Preferably, a light-transmitting material is provided at the second position of the substrate; Preferably, an opening is provided at the second position of the substrate; the optical signal transmitter is used to emit a second light beam to the mask through the opening at the second position of the substrate and to receive the second reflected light beam reflected by the mask.

3. The registration device according to claim 1, characterized in that, The optical signal transmitter includes a first optical signal transmitter and a second optical signal transmitter; The first optical signal transmitter is used to emit a first light beam toward the mask through a first position on the substrate and to receive a first reflected light beam reflected by the mask; The second optical signal transmitter is used to emit a second light beam toward the mask through a second position on the substrate and to receive a second reflected light beam reflected by the mask.

4. The registration device according to claim 3, characterized in that, The second optical signal transmitter is used to emit a second light beam toward the mask through a second position on the substrate and receive the second reflected light beam reflected by the mask when the light intensity of the first reflected light beam is greater than or equal to a preset light intensity threshold.

5. The registration device according to claim 1, characterized in that, The registration device is also used for: If the light intensity of the second reflected beam is greater than or equal to a preset light intensity threshold, a registration success signal is output.

6. The registration device according to claim 1, characterized in that, The optical signal transmitter is used to emit a laser beam; laser reflective material is provided at both the first position and the second position of the mask.

7. The registration device according to claim 1, characterized in that, The position adjuster is used for: When the optical signal transmitter emits a first beam of light towards the mask through a first position on the substrate, the position of the mask is adjusted so that the first beam of light is projected onto the first position of the mask; And / or, if the light intensity of the first reflected beam is less than a preset light intensity threshold, adjust the position of the mask so that the light intensity of the first reflected beam is greater than or equal to the preset light intensity threshold; And / or, when the optical signal transmitter emits a second beam toward the mask through the second position of the substrate, the mask is controlled to rotate around the first position of the mask as the origin, so that the second beam is projected onto the second position of the mask; And / or, if the light intensity of the second reflected beam is less than a preset light intensity threshold, control the mask to rotate around the first position of the mask as the origin, so that the light intensity of the second reflected beam is greater than or equal to the preset light intensity threshold. Preferably, when the position adjuster adjusts the position of the mask, the mask and the substrate remain parallel.

8. The registration apparatus according to any one of claims 1 to 7, characterized in that, Position marking information is provided at the first position of the substrate, the second position of the substrate, the first position of the mask, and the second position of the mask.

9. A registration method, characterized in that, Applied to the registration apparatus as described in any one of claims 1 to 8.

10. A vapor deposition machine, characterized in that, Includes the registration apparatus as described in any one of claims 1 to 8.

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