Turntable mechanism for silicon wafer processing
Patent Information
- Application Number
- CN202422541559.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-21
- Publication Date
- 2024-12-10
- Estimated Expiration
- 2034-10-21
AI Technical Summary
The existing silicon wafer processing turntables are prone to data chaos and shaking when rotating, resulting in angle errors and affecting processing quality and working efficiency.
A rotating mechanism including a rotating rod, belt, gear, movable ring, mechanical gripper and drive motor is designed. The movable ring is moved by the teeth of the gear and the movable ring, clamping the rotating rod to prevent shaking, and passing through the wire The combination of the rod and the movable plate drives the placement plate and lift plate to move to fix the product, ensuring accuracy and stability.
It effectively improves the accuracy of the rotary rotating angle, prevents shaking, and ensures the quality and working efficiency of silicon wafer processing.
Smart Images

Figure CN222146188U_ABST
