Semiconductor detection device
By introducing a adjusting mechanism for height, level and angle adjustment components into the semiconductor detection device, the problem of fixed position of traditional microscopes being irrelevant and small observation range is solved, and high-precision detection of semiconductors is achieved.
Patent Information
- Application Number
- CN202420248193.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-31
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2034-01-31
AI Technical Summary
The microscope position of the traditional semiconductor detection device is fixed and unadjustable, with a small observation range and a poor viewing angle, resulting in low detection accuracy.
An adjustment mechanism including a height adjustment assembly, a horizontal adjustment assembly and an angle adjustment assembly is designed. The microscope can adjust its vertical position, horizontal position and observation angle with the combination of these components, thereby adapting to semiconductors of different sizes and improving detection. Accuracy.
By adjusting the spatial position and observation angle of the microscope, the visual range and viewing angle of semiconductor detection are significantly improved, and the detection accuracy is improved.
Smart Images
Figure CN222213057U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of semiconductor technology, and more specifically, to a semiconductor detection device. Background Art
[0002] In the semiconductor production process, a microscope is needed to inspect the product after the semiconductor preparation is completed.
[0003] Traditional microscopes used for semiconductor inspection are usually fixed on a fixed bracket. Their position is fixed and the observation angle cannot be adjusted. The microscope has a small visual range and a limited viewing angle, making it impossible to fully and accurately inspect semiconductor products. In addition, manual adjustment of the position of the object to be observed on the measuring platform is required, which increases the workload of personnel. Utility Model Content
[0004] The technical problem to be solved by the embodiments of the present application is that the microscope position of a traditional semiconductor detection device is fixed and cannot be adjusted, the visual range is small and the visual angle is poor, and the detection accuracy of the semiconductor is poor.
[0005] In order to solve the above technical problems, the present application provides a semiconductor detection device, which adopts the following technical solution:
[0006] A semiconductor detection device comprises an adjustment mechanism and a microscope, wherein the microscope is mounted on the adjustment mechanism;
[0007] The adjustment mechanism includes a mounting base, a height adjustment component, a horizontal adjustment component and an angle adjustment component. The height adjustment component is mounted on the mounting base and is used to adjust the vertical position of the microscope; the horizontal adjustment component is mounted on the height adjustment component and is used to adjust the horizontal position of the microscope; the angle adjustment component is mounted on the horizontal adjustment component and is used to adjust the observation angle of the microscope;
[0008] The microscope is mounted on the angle adjustment component.
[0009] Furthermore, the mounting base is provided with a guide groove, and the guide groove is provided with at least one locking hole along the vertical direction;
[0010] The height adjustment assembly includes a guide rod and a first locking member. The guide rod is movably mounted on the guide groove. The first locking member passes through the guide rod and cooperates with the locking hole.
[0011] Furthermore, a limit seat is provided at the top of the guide rod, and the limit seat has a first side wall and a second side wall, and a first set angle is formed between the first side wall and the second side wall;
[0012] The horizontal adjustment component is rotatably mounted on the limiting seat, and the first side wall cooperates with the second side wall to limit the rotation angle of the horizontal adjustment component.
[0013] Furthermore, the first set angle is 120° to 180°.
[0014] Furthermore, a buffer component is also provided on the limiting seat, and the buffer component is installed on the first side wall and / or the second side wall.
[0015] Further, the horizontal adjustment assembly includes a cantilever, a second locking member and an XY adjustment assembly;
[0016] The second locking member passes through the end of the cantilever and is connected to the top of the height adjustment assembly, and the cantilever rotates relative to the height adjustment assembly around the second locking member;
[0017] The XY adjustment component is slidably mounted on one end of the cantilever away from the height adjustment component.
[0018] Further, the XY adjustment assembly includes an X-axis slide, a Y-axis slide rail and a Y-axis slide;
[0019] The X-direction slide is movably mounted on the cantilever, the Y-direction slide rail is mounted on the X-direction slide, and the Y-direction slide is movably mounted on the X-direction slide, wherein the moving direction of the X-direction slide is perpendicular to the moving direction of the Y-direction slide;
[0020] The angle adjustment component is installed on the Y-axis slide seat.
[0021] Further, the XY adjustment assembly also includes a third locking member and a damping plate;
[0022] The damping plate is rotatably mounted on the X-axis slide, and one end of the damping plate is located below the Y-axis slide;
[0023] The third locking member passes through the X-axis slide seat and abuts against an end of the damping plate away from the Y-axis slide seat;
[0024] The third locking member moves toward one side of the cantilever, and the third locking member pushes the damping plate to rotate, so that one end of the damping plate abuts against the cantilever to limit the movement of the X-axis slide relative to the cantilever; and the other end of the damping plate abuts against the bottom of the Y-axis slide to limit the movement of the Y-axis slide relative to the X-axis slide.
[0025] Furthermore, the angle adjustment assembly includes a base, a mounting seat and an angle adjustment member;
[0026] The base is mounted on the level adjustment assembly;
[0027] The mounting seat is rotatably mounted on the base via a rotating shaft, the mounting seat rotates vertically around the rotating shaft, and a mounting groove for mounting a microscope is provided on the mounting seat;
[0028] The angle adjustment member is movably installed between the base and the mounting seat;
[0029] The angle adjustment member moves relative to the mounting seat, pushing the mounting seat to rotate vertically relative to the base, so as to adjust the observation angle of the microscope.
[0030] Furthermore, a guide surface is formed on one side of the mounting seat in contact with the angle adjustment member, and a second set angle is formed between the guide surface and the horizontal plane, and the second set angle is 10° to 20°;
[0031] The angle adjustment member has a rotation axis, and the angle adjustment member is rotatably mounted on the base via the rotation axis, and the top surface of the angle adjustment member contacts the guide surface; the angle adjustment member rotates around the rotation axis to push the mounting seat to rotate vertically relative to the base to adjust the observation angle of the microscope; or
[0032] The angle adjustment member is slidably mounted on the base, and the top surface of the angle adjustment member contacts the guide surface; the angle adjustment member slides along the surface of the base to push the mounting seat to rotate vertically relative to the base to adjust the observation angle of the microscope.
[0033] Compared with the prior art, the embodiments of the present application have the following beneficial effects:
[0034] The semiconductor detection device provided in the present application installs a microscope on an adjustment mechanism, and adjusts the spatial position of the microscope through a height adjustment component and a horizontal adjustment component to adapt to semiconductors of different sizes; at the same time, the observation angle of the microscope is adjusted through an angle adjustment component to facilitate the detection of the side of the semiconductor. The coordination of the height adjustment component, the horizontal adjustment component and the angle adjustment component can improve the visual range and visual angle of the microscope, thereby improving the detection accuracy of the semiconductor. BRIEF DESCRIPTION OF THE DRAWINGS
[0035] In order to more clearly illustrate the scheme of the present application, a brief introduction is given below to the drawings required for use in the description of the embodiments. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0036] Figure 1 is a schematic structural diagram of a semiconductor detection device according to an embodiment of the present application;
[0037] Figure 2 is a top view of a semiconductor detection device according to an embodiment of the present application;
[0038] Figure 3 is an exploded schematic diagram of a height adjustment assembly and a mounting base of an embodiment of the present application;
[0039] Figure 4 is a structural schematic diagram of a level adjustment assembly according to an embodiment of the present application (without a second locking member);
[0040] Figure 5 is a cross-sectional schematic diagram of a level adjustment assembly according to an embodiment of the present application;
[0041] Figure 6 is a schematic diagram of the structure of the angle adjustment assembly of an embodiment of the present application;
[0042] Figure 7 It is a cross-sectional schematic diagram of the angle adjustment component of an embodiment of the present application.
[0043] Reference numerals:
[0044] 1. Mounting base; 11. Guide groove; 12. Locking hole; 2. Height adjustment assembly; 21. Guide rod; 22. Limit seat; 221. First side wall; 222. Second side wall; 23. Buffer; 24. Gasket; 3. Horizontal adjustment assembly; 31. Cantilever; 32. Second locking member; 33. XY adjustment assembly; 331. X-axis slide; 332. Y-axis slide; 333. Y-axis slide; 334. Third locking member; 335. Damping plate; 4. Angle adjustment assembly; 41. Base; 42. Angle adjustment member; 421. Rotating axis; 422. Handle; 43. Mounting seat; 431. Mounting groove; 432. Rotating axis; 5. Microscope. DETAILED DESCRIPTION
[0045] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by technicians in the technical field of this application; the terms used in the specification of the application herein are only for the purpose of describing specific embodiments and are not intended to limit this application; the terms "including" and "having" and any variations thereof in the specification and claims of this application and the above-mentioned drawings are intended to cover non-exclusive inclusions. The terms "first", "second", etc. in the specification and claims of this application or the above-mentioned drawings are used to distinguish different objects, not to describe a specific order.
[0046] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.
[0047] See also Figure 1 As shown, an embodiment of the present application provides a semiconductor detection device, including an adjustment mechanism and a microscope 5, wherein the microscope 5 is mounted on the adjustment mechanism.
[0048] In some embodiments, the adjustment mechanism includes a mounting base 1, a height adjustment component 2, a horizontal adjustment component 3 and an angle adjustment component 4. The height adjustment component 2 is installed on the mounting base 1, and is used to adjust the vertical position of the microscope 5; the horizontal adjustment component 3 is installed on the height adjustment component 2, and is used to adjust the horizontal position of the microscope 5; the angle adjustment component 4 is installed on the horizontal adjustment component 3, and is used to adjust the observation angle of the microscope 5. In this embodiment, the microscope 5 is installed on the angle adjustment component 4.
[0049] The semiconductor detection device provided in the present application installs a microscope 5 on an adjustment mechanism, and adjusts the spatial position of the microscope 5 through a height adjustment component 2 and a horizontal adjustment component 3 to adapt to semiconductors of different sizes; at the same time, the observation angle of the microscope 5 is adjusted through an angle adjustment component 4 to facilitate the detection of the side of the semiconductor. The coordination of the height adjustment component 2, the horizontal adjustment component 3 and the angle adjustment component 4 can improve the visual range and visual angle of the microscope 5, thereby improving the detection accuracy of the semiconductor.
[0050] See also Figure 3 As shown, in some embodiments, a guide groove 11 is provided on the mounting base 1, and at least one locking hole 12 is provided on the guide groove 11 along the vertical direction. In this embodiment, the number of the locking holes 12 is two.
[0051] The height adjustment assembly 2 includes a guide rod 21 and a first locking member (not shown in the figure). The guide rod 21 is movably mounted on the guide groove 11 , and the first locking member passes through the guide rod 21 and cooperates with the locking hole 12 .
[0052] The embodiment of the present application sets a first locking member so that when the guide rod 21 vertically slides along the guide groove 11 to a set position, the first locking member is used to fix the guide rod 21 in a specified position, thereby fixing the microscope 5 at a set height, thereby improving the detection accuracy of the microscope 5.
[0053] In this embodiment, the height adjustment component 2 also includes a gasket 24, and a groove is provided on the height adjustment component 2. The gasket 24 is installed in the groove. The first locking member passes through the gasket 24, the guide rod 21 and the locking hole 12 in sequence. The embodiment of the present application further arranges a gasket 24 to increase the contact area between the first locking member and the guide rod 21, thereby increasing the locking degree of the first locking member on the guide rod 21.
[0054] See also Figure 2 , Figure 3 As shown, in some embodiments, a limit seat 22 is provided at the top of the guide rod 21 , and the limit seat 22 has a first side wall 221 and a second side wall 222 , and a first set angle α is formed between the first side wall 221 and the second side wall 222 .
[0055] In some embodiments, the first set angle α is 120° to 180°. Specifically, the first set angle α can be set to any value of 120°, 130°, 140°, 150°, 160°, 170°, 180° or a range formed between any two values.
[0056] In some embodiments, the end of the horizontal adjustment component 3 is rotatably mounted on the limit seat 22, and the first side wall 221 cooperates with the second side wall 222 to limit the rotation angle of the horizontal adjustment component 3. In this embodiment, the horizontal adjustment component 3 includes a cantilever 31, and the end of the cantilever 31 of the horizontal adjustment component 3 is rotatably mounted on the limit seat 22, and the side shape of the cantilever 31 close to the first side wall 221 is matched with the shape of the first side wall 221, and the side shape of the cantilever 31 close to the second side wall 222 is matched with the shape of the second side wall 222.
[0057] In some embodiments, a buffer member 23 is also provided on the limit seat 22. The buffer member 23 is installed on the first side wall 221 and / or the second side wall 222, and is used to buffer the cantilever 31 of the horizontal adjustment assembly 3 to avoid damage to the cantilever 31 due to excessive rotation force during rotation adjustment in the horizontal plane, thereby increasing the service life of the cantilever 31.
[0058] See also Figure 2 to Figure 4 As shown, in some embodiments, the horizontal adjustment assembly 3 further includes a second locking member 32 and an XY adjustment assembly 33;
[0059] The second locking member 32 passes through the end of the cantilever 31 and is connected to the top of the height adjustment assembly 2. The cantilever 31 rotates relative to the height adjustment assembly 2 around the second locking member 32. In this embodiment, the second locking member 32 passes through the end of the cantilever 31 and is connected to the center of the limit seat 22. The cantilever 31 rotates around the second locking member 32 between the first side wall 221 and the second side wall 222.
[0060] The XY adjustment component 33 is slidably mounted on an end of the cantilever 31 away from the height adjustment component 2 .
[0061] In the embodiment of the present application, the cantilever 31 is rotatably mounted on the top of the guide rod 21 to increase the visual range of the microscope 5. At the same time, the second locking member 32 is set to lock the microscope 5 when it is rotated to a set position, thereby improving the stability of the microscope 5 and improving the detection accuracy.
[0062] In this embodiment, a bending portion is provided on the cantilever 31 , and the moving distance of the XY adjustment component 33 along the cantilever 31 is limited by providing the bending portion.
[0063] See also Figure 4 As shown, the XY adjustment assembly 33 includes an X-axis slide 331 , a Y-axis slide rail 332 and a Y-axis slide 333 .
[0064] The X-axis slide 331 is movably mounted on the cantilever 31, the Y-axis slide rail 332 is mounted on the X-axis slide 331, and the Y-axis slide 333 is movably mounted on the X-axis slide 331, wherein the moving direction of the X-axis slide 331 is perpendicular to the moving direction of the Y-axis slide 333; the angle adjustment component 4 is mounted on the Y-axis slide 333.
[0065] In the embodiment of the present application, the XY adjustment component 33 is provided to further adjust the horizontal position of the microscope 5, thereby increasing the visible distance of the microscope 5, so as to adapt to semiconductors of different sizes and improve the adaptability of the semiconductor detection device.
[0066] See also Figure 4 , Figure 5 As shown, the XY adjustment assembly 33 further includes a third locking member 334 and a damping plate 335 .
[0067] The damping plate 335 is rotatably mounted on the X-axis slide 331 , and one end of the damping plate 335 is located below the Y-axis slide 333 ; the third locking member 334 passes through the X-axis slide 331 and abuts against one end of the damping plate 335 away from the Y-axis slide 333 .
[0068] When the microscope 5 completes the horizontal position adjustment, the third locking member 334 is screwed. When the third locking member 334 moves toward the side of the cantilever 31, the third locking member 334 pushes the damping plate 335 to rotate, so that one end of the damping plate 335 abuts against the cantilever 31 to limit the movement of the X-axis slide 331 relative to the cantilever 31; the other end of the damping plate 335 abuts against the bottom of the Y-axis slide 333 to limit the movement of the Y-axis slide 333 relative to the X-axis slide 331.
[0069] In the embodiment of the present application, the third locking member 334 is used to push the damping plate 335 to rotate, so that the two ends of the damping plate 335 are respectively pressed against the cantilever 31 and the Y-axis slide 333, thereby achieving simultaneous fixation of the microscope 5 in the X-axis and the Y-axis. The locking method is simple and improves the stability of the microscope 5 and the detection accuracy.
[0070] In some embodiments, the damping plate 335 is made of a soft and plastic material, and the embodiment of the present application uses Saigang.
[0071] See also Figure 6 As shown, in some embodiments, the angle adjustment assembly 4 includes a base 41 , a mounting seat 43 and an angle adjustment member 42 .
[0072] The base 41 is installed on the horizontal adjustment component 3; the mounting seat 43 is rotatably installed on the base 41 through a rotating shaft 432, and the mounting seat 43 rotates in a vertical plane around the rotating shaft 432. The mounting seat 43 is provided with a mounting groove 431 for mounting the microscope 5; the angle adjustment member 42 is movably installed between the base 41 and the mounting seat 43.
[0073] When adjusting the angle of the microscope 5 , the angle adjusting member 42 moves relative to the mounting seat 43 , pushing the mounting seat 43 to rotate vertically relative to the base 41 , so as to adjust the observation angle of the microscope 5 .
[0074] The embodiment of the present application promotes the mounting seat 43 to rotate in the vertical direction through the cooperation between the angle adjustment member 42 and the mounting seat 43, so that the microscope 5 can be at the best observation angle, thereby improving the detection accuracy of the semiconductor; at the same time, after the angle adjustment member 42 completes the action of pushing the mounting seat 43, it supports the mounting seat 43, thereby improving the stability of the microscope 5 during detection.
[0075] See also Figure 7 As shown, in this embodiment, the mounting seat 43 forms a guide surface on one side in contact with the angle adjustment member 42, and a second set angle β is formed between the guide surface and the horizontal plane, and the range of the second set angle β is 10° to 20°.
[0076] The angle adjustment member 42 has a rotation shaft 421 . The angle adjustment member 42 is rotatably mounted on the base 41 via the rotation shaft 421 , and a top surface of the angle adjustment member 42 contacts the guide surface.
[0077] During operation, the angle adjustment member 42 rotates around the rotation axis 421 , and the highest point of the angle adjustment member 42 moves forward or backward along the guide surface, thereby pushing the mounting seat 43 to rotate upward or downward relative to the base 41 to adjust the observation angle of the microscope 5 .
[0078] In other embodiments, the angle adjustment member 42 may also be slidably mounted on the base 41 , and the top surface of the angle adjustment member 42 is in contact with the guide surface.
[0079] During operation, the angle adjustment member 42 slides along the surface of the base 41 , and the highest point of the angle adjustment member 42 moves forward or backward along the guide surface, thereby pushing the mounting seat 43 to rotate upward or downward relative to the base 41 to adjust the observation angle of the microscope 5 .
[0080] See also Figure 6 As shown, the angle adjustment member 42 extends to both sides to form handles 422 , so that the staff can adjust the rotation or sliding of the angle adjustment member 42 to adjust the observation angle of the microscope 5 .
[0081] Obviously, the embodiments described above are only some embodiments of the present application, rather than all embodiments. The preferred embodiments of the present application are given in the accompanying drawings, but they do not limit the patent scope of the present application. The present application can be implemented in many different forms. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present application more thorough and comprehensive. Although the present application is described in detail with reference to the aforementioned embodiments, for those skilled in the art, it is still possible to modify the technical solutions recorded in the aforementioned specific implementation methods, or to perform equivalent replacement of some of the technical features therein. Any equivalent structure made using the contents of the specification and drawings of this application, directly or indirectly used in other related technical fields, is similarly within the scope of patent protection of this application.
Claims
1. A semiconductor testing device, characterized in that: It comprises an adjustment mechanism and a microscope, wherein the microscope is mounted on the adjustment mechanism; The adjustment mechanism includes a mounting base, a height adjustment component, a horizontal adjustment component and an angle adjustment component. The height adjustment component is mounted on the mounting base and is used to adjust the vertical position of the microscope; the horizontal adjustment component is mounted on the height adjustment component and is used to adjust the horizontal position of the microscope; the angle adjustment component is mounted on the horizontal adjustment component and is used to adjust the observation angle of the microscope; The microscope is mounted on the angle adjustment component.
2. The semiconductor detection device according to claim 1, characterized in that: The mounting base is provided with a guide groove, and the guide groove is provided with at least one locking hole along the vertical direction; The height adjustment assembly includes a guide rod and a first locking member. The guide rod is movably mounted on the guide groove. The first locking member passes through the guide rod and cooperates with the locking hole.
3. The semiconductor detection device according to claim 2, characterized in that: A limit seat is provided on the top of the guide rod, and the limit seat has a first side wall and a second side wall, and a first set angle is formed between the first side wall and the second side wall; The horizontal adjustment component is rotatably mounted on the limiting seat, and the first side wall cooperates with the second side wall to limit the rotation angle of the horizontal adjustment component.
4. The semiconductor detection device according to claim 3, characterized in that: The first set angle is 120° to 180°.
5. The semiconductor testing device according to claim 3, characterized in that: The limiting seat is also provided with a buffer component, and the buffer component is installed on the first side wall and / or the second side wall.
6. The semiconductor detection device according to any one of claims 1 to 5, characterized in that: The horizontal adjustment assembly includes a cantilever, a second locking member and an XY adjustment assembly; The second locking member passes through the end of the cantilever and is connected to the top of the height adjustment assembly, and the cantilever rotates relative to the height adjustment assembly around the second locking member; The XY adjustment component is slidably mounted on one end of the cantilever away from the height adjustment component.
7. The semiconductor testing device according to claim 6, characterized in that: The XY adjustment assembly includes an X-axis slide, a Y-axis slide rail and a Y-axis slide; The X-direction slide is movably mounted on the cantilever, the Y-direction slide rail is mounted on the X-direction slide, and the Y-direction slide is movably mounted on the X-direction slide, wherein the moving direction of the X-direction slide is perpendicular to the moving direction of the Y-direction slide; The angle adjustment component is installed on the Y-axis slide seat.
8. The semiconductor testing device according to claim 7, characterized in that: The XY adjustment assembly also includes a third locking member and a damping plate; The damping plate is rotatably mounted on the X-axis slide, and one end of the damping plate is located below the Y-axis slide; The third locking member passes through the X-axis slide seat and abuts against an end of the damping plate away from the Y-axis slide seat; The third locking member moves toward one side of the cantilever, and the third locking member pushes the damping plate to rotate, so that one end of the damping plate abuts against the cantilever to limit the movement of the X-axis slide relative to the cantilever; and the other end of the damping plate abuts against the bottom of the Y-axis slide to limit the movement of the Y-axis slide relative to the X-axis slide.
9. The semiconductor testing device according to claim 1, wherein: The angle adjustment assembly includes a base, a mounting seat and an angle adjustment member; The base is mounted on the level adjustment assembly; The mounting seat is rotatably mounted on the base via a rotating shaft, the mounting seat rotates vertically around the rotating shaft, and a mounting groove for mounting a microscope is provided on the mounting seat; The angle adjustment member is movably installed between the base and the mounting seat; The angle adjustment member moves relative to the mounting seat, pushing the mounting seat to rotate vertically relative to the base, so as to adjust the observation angle of the microscope.
10. The semiconductor testing device according to claim 9, characterized in that: A guide surface is formed on one side of the mounting seat in contact with the angle adjustment member, and a second set angle is formed between the guide surface and the horizontal plane, and the second set angle is 10° to 20°; The angle adjustment member has a rotation axis, and the angle adjustment member is rotatably mounted on the base via the rotation axis, and the top surface of the angle adjustment member contacts the guide surface; the angle adjustment member rotates around the rotation axis to push the mounting seat to rotate vertically relative to the base to adjust the observation angle of the microscope; or, the angle adjustment member is slidably mounted on the base, and the top surface of the angle adjustment member contacts the guide surface; The angle adjustment member slides along the surface of the base, pushing the mounting seat to rotate vertically relative to the base, so as to adjust the observation angle of the microscope.