Supporting pin and substrate supporting structure for liquid crystal panel dry etching machine

Abstract

The utility model provides a liquid crystal panel dry etching machine's support pin and base plate support structure, said support pin includes base, ball and bush, base is composed of first threaded section and is provided the seat body of first threaded section top, the top of seat body is provided with the holding groove, the ball is held in the holding groove, the bush is equipped with the first threaded section, and the first threaded section is equipped with the first threaded section and the second threaded section is equipped with the second threaded section. The lining is detachably connected to the top of the base, a round hole is formed in the middle of the lining, the diameter of the round hole is smaller than that of the ball, the upper portion of the ball penetrates through the round hole to be located outside the containing groove, and a plurality of steel balls are further arranged in the containing groove and filled in gaps between the ball and the side wall of the containing groove. The supporting pin is of a universal rolling type, when the base plate is corrected through the positioning air cylinder, resistance between the base plate and the supporting pin can be greatly reduced, abrasion of the supporting pin is reduced, the service life of the supporting pin is prolonged, and therefore the operation rate of a machine table is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of dry etching machines, in particular to a supporting pin and a substrate supporting structure used for a liquid crystal panel dry etching machine. Background Art

[0002] The substrate support structure of the existing liquid crystal panel dry etching machine vacuum preparation chamber is as follows Figure 1 As shown, it includes a base 10, and six rows of support pin assemblies are arranged on the top of the base 10, and each row of support pin assemblies includes 8 support pins 20. Therefore, the vacuum preparation chamber of the liquid crystal panel dry etching machine has a total of 48 support pins. The support pins 20 are made of anti-static Teflon material. The structure of the existing support pins is as follows Figure 2 As shown, the lower part of the support pin is a threaded section 21 with threads, which is used to be screwed into the base 10, and the top of the support pin 20 is an arc surface.

[0003] A positioning cylinder 30 is arranged at each corner of the base. The substrate is first transferred in by the atmospheric arm and placed on the support pins, and then the positioning cylinders 30 around it are moved to align the substrate (the positioning cylinder 30 on the right side of the base is moved first, and the positioning cylinder 30 on the left side is moved later), and then the arm of the vacuum transport chamber takes it out and puts it into the substrate processing chamber for etching.

[0004] During use, the support pin rubs against the back of the substrate, and the arc surface is gradually worn into a flat surface. As the support pin wears more, the force applied by the cylinder when returning the substrate will gradually increase, which can easily cause the substrate to break, causing the machine to be shut down for processing, seriously affecting the progress of the production line and causing significant losses.

[0005] In order to reduce fragments, the current method is to shorten the replacement cycle of the support pins, but this greatly increases the cost, and the production line must be stopped when replacing the support pins, which affects the machine utilization rate and the progress of the production line. Utility Model Content

[0006] The technical problem to be solved by the utility model is to provide a support pin and a substrate support structure for a liquid crystal panel dry etching machine, which can extend the replacement cycle of the support pin and reduce the breakage rate of the substrate to improve the utilization rate of the machine.

[0007] The utility model is achieved in this way:

[0008] In the first aspect, the utility model provides a support pin for a liquid crystal panel dry etching machine, comprising a base, a ball and a bushing, wherein the base consists of a first threaded segment and a seat body arranged on the top of the first threaded segment, the top of the seat body is provided with a receiving groove, the ball is accommodated in the receiving groove, the bushing is detachably connected to the top of the base, a circular hole is provided in the middle of the bushing, the diameter of the circular hole is smaller than the diameter of the ball, the upper part of the ball passes through the circular hole and is located outside the receiving groove, and a plurality of steel balls are also arranged in the receiving groove, and the plurality of steel balls fill the gap between the ball and the side wall of the receiving groove.

[0009] Furthermore, the ball is made of polyimide material, the bushing is made of plastic material, and the base is made of metal material.

[0010] Furthermore, a clamping groove is provided on the outer side wall of the seat body, a clamping protrusion is provided on the inner side of the bushing, and the seat body is detachably connected to the bushing via the clamping groove and the clamping protrusion.

[0011] Furthermore, the outer side wall of the seat body is provided with two first planes, and the two first planes are arranged below the card slot.

[0012] Furthermore, the bottom wall of the accommodating groove is an arc-shaped surface.

[0013] In a second aspect, the utility model provides a substrate support structure for a liquid crystal panel dry etching machine, comprising a base and the support pins described in the first aspect, wherein the number of the support pins is set to 40, and the base is provided with six columns of holes, each column of the holes including eight mounting holes;

[0014] The substrate support structure also includes eight support columns, which are divided into two groups. The two groups of support columns are respectively installed in two columns of holes located at the edge; and the two groups of support columns are respectively located in the middle of the corresponding columns of holes;

[0015] The remaining mounting holes on the base are respectively installed with supporting pins.

[0016] Furthermore, the support column is composed of a second thread segment and a main body arranged on the top of the second thread segment, the top of the main body is an arc surface, and the side wall of the main body is provided with two second planes.

[0017] The advantages of the utility model are that the support pin in the utility model is a universal rolling type. When the positioning cylinder aligns the substrate, the resistance between the substrate and the support pin can be greatly reduced, the wear of the support pin is reduced, the service life of the support pin is extended, and the utilization rate of the machine is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present invention will be further described below in conjunction with the embodiments with reference to the accompanying drawings.

[0019] Figure 1 This is a schematic diagram of the substrate support structure of the vacuum preparation chamber of an existing liquid crystal panel dry etching machine.

[0020] Figure 2 Schematic diagram of the existing support pin structure.

[0021] Figure 3 This is a schematic diagram of the support pin structure of the utility model.

[0022] Figure 4 for Figure 3 Cross-sectional view shown.

[0023] Figure 5 for Figure 4 A partial enlarged view of point A in the middle.

[0024] Figure 6 for Figure 3 An exploded view of the support pin (steel ball omitted) is shown.

[0025] Figure 7 This is a schematic diagram of the substrate support structure of the utility model.

[0026] Figure 8 This is a schematic diagram of the support column structure of the utility model.

[0027] Description of the numbers in the figure:

[0028] 100, support pin; 1, base; 11, first threaded section; 12, seat body; 121, slot; 122, first plane; 13, receiving groove; 2, ball bearing; 3, bushing; 31, round hole; 32, snap-on protrusion; 4, steel ball; 200, base; 300, support column; 5, second threaded section; 6, main body; 7, second plane. DETAILED DESCRIPTION

[0029] Embodiment 1

[0030] See also Figures 3 to 6The utility model provides a support pin 100 for a liquid crystal panel dry etching machine, comprising a base 1, a ball 2 and a bushing 3. The base 1 is composed of a first threaded section 11 and a seat body 12 arranged on the top of the first threaded section 11. The seat body 12 is a cylindrical structure. A receiving groove 13 is provided on the top of the seat body 12. The ball 2 is accommodated in the receiving groove 13. The ball 2 can roll in the receiving groove 13. The bushing 3 is detachably connected to the top of the base 1. The bushing 3 is used to limit the ball 2 in the receiving groove 13. A circular hole 31 is provided in the middle of the bushing 3. The diameter of the circular hole 31 is smaller than the diameter of the ball 2. The upper part of the ball 2 passes through the circular hole 31 and is located outside the receiving groove 13. When the substrate is placed on the support pin 100, the bottom of the substrate contacts the ball 2. When the positioning cylinder pushes the substrate to return to the right position, the movement of the substrate drives the ball 2 to roll. Since there is rolling friction between the substrate and the ball 2, the resistance between the substrate and the support pin 100 can be greatly reduced when the substrate moves. At the same time, the wear of the support pin 100 can be reduced, the service life of the support pin 100 is extended, and the utilization rate of the machine is improved.

[0031] A plurality of steel balls 4 are also arranged in the receiving groove 13. The diameter of the steel balls 4 is smaller than the diameter of the ball 2. The plurality of steel balls 4 fill the gap between the ball 2 and the side wall of the receiving groove 13. When the bushing 3 is installed on the top of the seat 12, the bushing 3 can also prevent the steel balls 4 from falling out of the receiving groove 13.

[0032] Specifically, the ball 2 is made of polyimide, the bushing 3 is made of plastic, and the base 1 is made of metal. The ball 2 made of polyimide has the characteristics of wear resistance and anti-static, so it can further extend the service life of the support pin 100 and extend the replacement cycle.

[0033] Specifically, the outer wall of the seat body 12 is provided with a slot 121, and the inner side of the bushing 3 is provided with a snap-on protrusion 32, and the seat body 12 is detachably connected to the bushing 3 through the slot 121 and the snap-on protrusion 32. When the bushing is detachable, only the ball 2 needs to be replaced, which can reduce the replacement cost of the support pin 100.

[0034] Specifically, the outer side wall of the seat body 12 is provided with two first planes 122, and the two first planes 122 are provided below the slot 121. The provision of the two first planes 122 facilitates screwing the support pin 100 into the base 200 using a wrench.

[0035] Specifically, the bottom wall of the receiving groove 13 is an arc-shaped surface, the middle of which is concave downward, and the lowest point of the ball 2 is in contact with the lowest point of the arc-shaped surface.

[0036] Embodiment 2

[0037] See also Figures 3 to 8 The utility model provides a substrate support structure for a liquid crystal panel dry etching machine, including a base 200 and the support pins 100 described in the first embodiment, the number of the support pins 100 is 40, the base 200 is provided with six columns of holes, each column of the holes includes eight mounting holes;

[0038] The substrate support structure also includes eight support columns 300, the eight support columns 300 are divided into two groups, the two groups of support columns 300 are respectively installed in two columns of holes located at the edge; and the two groups of support columns 300 are respectively located in the middle of the corresponding columns of holes;

[0039] The remaining mounting holes on the base 200 are respectively mounted with support pins 100 .

[0040] When the substrate is aligned, the positioning cylinder on the right side of the base 200 moves first, and the positioning cylinder on the left side moves later. If the support structure on the base 200 all uses the support pins 100 in Example 1, since the structure of the support pins 100 is a universal ball type 2, the friction between it and the back of the substrate during use is very small. When the positioning cylinder positions the right side of the substrate, the substrate will be over-adjusted, causing the substrate to shift. Therefore, by installing support columns 300 made of Teflon material in the two rows of holes at the edge, the friction between the substrate and the substrate support structure can be controlled within a set range. When the substrate is aligned, the substrate will not be over-adjusted due to the small friction between the substrate and the substrate support structure, causing the substrate to shift. At the same time, by providing forty universally rolling support pins 100 and eight support columns 300, when the positioning cylinder aligns the substrate, the resistance between the substrate and the support pins 100 can be greatly reduced, the wear of the support pins 100 is reduced, and the service life of the support pins 100 is extended, thereby improving the utilization rate of the machine.

[0041] The support column 300 is composed of a second threaded segment 5 and a main body 6 arranged on the top of the second threaded segment 5. The support column 300 is an integrally formed structure, and the support column 300 is made of Teflon material. The specifications of the first threaded segment 11 and the second threaded segment 5 are both M8×1. The top of the main body 6 is an arc surface, and the middle part of the arc surface bulges upward. The highest point of the support column 300 is consistent with the height of the highest point of the support pin 100. When the substrate is placed on the substrate support structure of the present application, the substrate is in contact with the arc surface of the support column 300 and the ball 2 of the support pin 100 at the same time.

[0042] The side wall of the main body 6 is provided with two second planes 7. The provision of the two second planes 7 facilitates the use of a wrench to screw the support column 300 into the base 200.

[0043] Although the specific implementation methods of the present invention are described above, those skilled in the art should understand that the specific embodiments described are only illustrative and are not intended to limit the scope of the present invention. Equivalent modifications and changes made by those skilled in the art in accordance with the spirit of the present invention should be included in the scope of protection of the claims of the present invention.

Claims

1. A support pin for a liquid crystal panel dry etching machine, Features: It includes a base, a ball and a bushing, wherein the base is composed of a first threaded section and a seat body arranged on the top of the first threaded section, the top of the seat body is provided with a receiving groove, the ball is accommodated in the receiving groove, the bushing is detachably connected to the top of the base, a circular hole is provided in the middle of the bushing, the diameter of the circular hole is smaller than the diameter of the ball, the upper part of the ball passes through the circular hole and is located outside the receiving groove, a plurality of steel balls are also arranged in the receiving groove, and the plurality of steel balls fill the gap between the ball and the side wall of the receiving groove.

2. A support pin for a liquid crystal panel dry etching machine as claimed in claim 1, Features: The ball is made of polyimide material, the bushing is made of plastic material, and the base is made of metal material.

3. A support pin for a liquid crystal panel dry etching machine as claimed in claim 1, Features: The outer wall of the seat body is provided with a clamping groove, the inner side of the bushing is provided with a clamping protrusion, and the seat body is detachably connected with the bushing through the clamping groove and the clamping protrusion.

4. A support pin for a liquid crystal panel dry etching machine as claimed in claim 1, Features: The outer side wall of the seat body is provided with two first planes, and the two first planes are arranged below the card slot.

5. A support pin for a liquid crystal panel dry etching machine as claimed in claim 1, Features: The bottom wall of the accommodating groove is an arc-shaped surface.

6. A substrate support structure for a liquid crystal panel dry etching machine, Features: It comprises a base and the support pins according to any one of claims 1 to 5, wherein the number of the support pins is 40, the base is provided with six columns of holes, and each column of the holes comprises eight mounting holes; The substrate support structure also includes eight support columns, which are divided into two groups. The two groups of support columns are respectively installed in two columns of holes located at the edge; and the two groups of support columns are respectively located in the middle of the corresponding columns of holes; The remaining mounting holes on the base are respectively installed with supporting pins.

7. A substrate supporting structure for a liquid crystal panel dry etching machine as claimed in claim 6, Features: The support column is composed of a second thread segment and a main body arranged on the top of the second thread segment. The top of the main body is an arc surface, and the side wall of the main body is provided with two second planes.

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