Wafer spin-drying assembly
By using the weight detection device and processor in the wafer rotary drying assembly to detect and calibrate the weight difference of the cradle, ensuring that the crystal basket reaches balance and starts the assembly after it reaches balance, solving the problem of excessive centripetal force caused by weight imbalance and improving the component's Service life and operating efficiency.
Patent Information
- Application Number
- CN202420338360.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-02-23
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2034-02-23
AI Technical Summary
During the start of the existing wafer rotary drying assembly, due to the unbalanced weight of the crystal basket, the rotating frame may be damaged, and it is impossible to effectively confirm whether the crystal basket has achieved the best weight balance, which affects the service life and operating efficiency.
A wafer rotary drying assembly consisting of a rotating frame, at least two cradles, a weight detection device and a processor is designed. The weight detection device measures the weight value in the cradle and calculates the difference by the processor to ensure that the weight value is preset. Within the range, ensure that the crystal basket reaches optimal weight balance before starting the assembly.
It effectively avoids the problem of excessive centripetal force caused by excessive weight gap, extends the service life of the components, and improves the convenience and efficiency of operation through independent weight detection.
Smart Images
Figure CN222214118U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a wafer spin-drying component. Background Art
[0002] As people's living standards continue to improve, electronic products are becoming more and more important in people's lives. Faced with the huge demand for electronic products, major manufacturers are also committed to improving the market competitiveness of their brands.
[0003] In addition to strengthening the research and development of the functions and performance of electronic products, how to effectively improve the operational efficiency during the production process of electronic products, thereby reducing the production costs of electronic products, is undoubtedly a topic that all manufacturers attach great importance to. Utility Model Content
[0004] One of the purposes of the utility model is to provide a wafer spin-drying assembly, which can simply and easily allow the user to reliably know whether the wafer basket has achieved a better weight balance before starting the wafer spin-drying assembly, thereby bringing convenience and efficiency to the user in operation.
[0005] According to one embodiment of the utility model, a wafer spin drying assembly includes a rotating frame, at least two cradles, at least two weight detection devices and a processor. The rotating frame is configured to rotate around a first axis. The cradles are respectively pivotally connected to the rotating frame and configured to accommodate the wafer baskets. The weight detection device is separated from the rotating frame, and the weight detection device is respectively configured to at least partially support a corresponding one of the cradles, so as to measure the weight value respectively. The processor signal is connected to the weight detection device and is configured to calculate the difference between the weight values.
[0006] In one or more embodiments of the present invention, the above-mentioned cradles are arranged along a direction and located on opposite sides of a first axis, each of the cradles is pivotally connected to a rotating frame around a second axis, the second axis is perpendicular to the first axis, each of the cradles has at least one support point, each of the weight detection devices is configured to support the support point of a corresponding one of the cradles, each of the support points has a first vertical distance from the first axis in the above-mentioned direction, and a second vertical distance is provided between the first axis and each of the second axes, and the first vertical distance is smaller than the second vertical distance.
[0007] In one or more embodiments of the present invention, the second axes mentioned above are parallel to each other, and the support point is located between the second axes in the above direction.
[0008] In one or more embodiments of the present invention, each of the above-mentioned cradles includes a frame and at least one cantilever. The frame surrounds and defines a first space therein, and the first space is configured to accommodate the crystal basket. The cantilever has a first end and a second end opposite to each other, the first end is connected to the outer wall of the frame, and the second end defines a support point.
[0009] In one or more embodiments of the present invention, the cradles are symmetrical in structure.
[0010] In one or more embodiments of the present invention, the first vertical distances are the same as each other, and the second vertical distances are the same as each other.
[0011] In one or more embodiments of the present invention, the rotating frame comprises a bottom plate, a top ring and a plurality of support plates. The top ring is configured to allow the cradle to at least partially pass through. The support plates are connected between the bottom plate and the top ring, and each of the cradles is pivotally connected between two adjacent ones of the support plates around a corresponding one of the second axes.
[0012] In one or more embodiments of the present invention, the weight detecting device is at least partially located between the bottom plate and the top ring.
[0013] In one or more embodiments of the present invention, the wafer spin drying assembly further comprises a cavity having a second space and at least two through holes connected to each other, the rotating frame is located in the second space, and the weight detection device passes through a corresponding one of the through holes.
[0014] In one or more embodiments of the present invention, the number of the cradles is an even number, and the cradles are evenly distributed around the first axis.
[0015] In one or more embodiments of the present invention, the number of the cradles is an odd number, and the cradles are evenly distributed around the first axis.
[0016] The above-mentioned embodiment of the utility model has at least the following advantages:
[0017] (1) To prevent the wafer spin-drying assembly from being damaged due to excessive centripetal force generated by the rotating frame when rotating around the first axis due to a large weight difference between the two crystal baskets, the user can first confirm whether the difference between the weight values calculated by the processor is within a preset range before starting the wafer spin-drying assembly. If so, the two crystal baskets have achieved a better weight balance, and the user can choose to start the wafer spin-drying assembly to spin the wafers. If not, the user can choose to readjust the number of wafers in at least one of the two crystal baskets to ensure that the difference between the weight values calculated by the processor falls within the preset range, and then start the wafer spin-drying assembly again. In this way, the service life of the wafer spin-drying assembly can be effectively improved.
[0018] (2) Through the weight detection device and processor of the wafer spin-drying assembly, the user can reliably know whether the wafer basket has achieved an optimal weight balance before starting the wafer spin-drying assembly. This process does not rely on other work areas to provide data on the weight of the wafer basket, so it can bring convenience and efficiency to the user in operation. BRIEF DESCRIPTION OF THE DRAWINGS
[0019] Figure 1 The figure is a three-dimensional schematic diagram of a wafer spin-drying assembly according to an embodiment of the present invention.
[0020] Figure 2 To illustrate Figure 1 A three-dimensional schematic diagram of a wafer spin drying assembly, in which the cavity is omitted and the crystal basket is not placed in the cradle.
[0021] Figure 3 To illustrate Figure 2 A three-dimensional schematic diagram of a wafer spin drying assembly from another perspective, in which only a set of cradles and weight detection devices are shown.
[0022] Figure 4 To draw the Figure 2 Cross-sectional view of line segment AA.
[0023] Figure 5 To draw the Figure 2 Cross-sectional view of line segment BB.
[0024] Figure 6 The figure is a schematic diagram showing an arrangement of cradles according to another embodiment of the present invention, wherein the number of cradles is an even number.
[0025] Figure 7 The figure is a schematic diagram showing an arrangement of cradles according to yet another embodiment of the present invention, wherein the number of cradles is an odd number. DETAILED DESCRIPTION
[0026] The following will disclose multiple embodiments of the utility model with the accompanying drawings. For the purpose of clear description, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the utility model. That is to say, in some embodiments of the utility model, these practical details are not necessary. In addition, in order to simplify the drawings, some existing conventional structures and elements will be illustrated in a simple schematic manner in the drawings, and in all drawings, the same reference numerals will be used to represent the same or similar elements. And if it is possible in practice, the features of different embodiments can be applied interchangeably.
[0027] Unless otherwise defined, all words (including technical and scientific terms) used herein have their usual meanings, which can be understood by those skilled in the art. Furthermore, the definitions of the above words in commonly used dictionaries should be interpreted in the content of this specification as consistent with the meanings of the relevant fields of the utility model. Unless otherwise clearly defined, these words will not be interpreted as idealized or overly formal.
[0028] Please refer to Figure 1-2 . Figure 1FIG. 1 is a three-dimensional schematic diagram of a wafer spin-drying assembly 100 according to an embodiment of the present invention. Figure 2 To illustrate Figure 1 1 is a perspective schematic diagram of a wafer spin drying assembly 100, wherein the cavity 150 is omitted and the crystal basket 200 is not placed in the cradle 120. In this embodiment, Figure 1-2 As shown, a wafer spin-drying assembly 100 includes a rotating frame 110 and at least two cradles 120. The rotating frame 110 is configured to rotate around a first axis X1. The cradles 120 are respectively pivotally connected to the rotating frame 110 and configured to accommodate a crystal basket 200. In practical applications, the crystal baskets 200 are respectively configured to accommodate a plurality of wafers 300, and the wafers 300 have water on them after other operation steps. When the wafer spin-drying assembly 100 is started, the rotating frame 110 drives the cradle 120 to rotate around the first axis X1, so that the water on the wafer 300 is thrown away as the crystal basket 200 accommodated in the cradle 120 rotates, thereby spinning the wafer 300.
[0029] It is worth noting that in this embodiment, if Figure 1-2 As shown, the wafer spin drying assembly 100 also includes at least two weight detection devices 130 and a processor 140 (see the processor 140). Figure 2 The weight detection device 130 is separated from the rotating frame 110, and the weight detection device 130 is respectively configured to at least partially support a corresponding one of the cradles 120, so as to measure the weight value respectively. Figure 2 As shown, each of the weight detection devices 130 includes a weight detector 131 and a bracket 132. The bracket 132 is configured to support the cradle 120. The weight detector 131 is disposed on the bracket 132 and configured to measure the above-mentioned weight value. The processor 140 is signal-connected to the weight detector 131 and configured to calculate the difference between the weight values.
[0030] Specifically, in order to prevent the wafer spin-drying assembly 100 from being damaged due to excessive centripetal force generated when the rotating frame 110 rotates around the first axis X1 due to the large weight difference between the two crystal baskets 200, the user can confirm whether the difference between the weight values calculated by the processor 140 falls within the preset range before starting the wafer spin-drying assembly 100. If so, that is, the two crystal baskets 200 have achieved a better weight balance, and the user can choose to start the wafer spin-drying assembly 100 to spin the wafers 300. If not, the user can choose to readjust the number of wafers 300 in at least one of the two crystal baskets 200, so as to make the difference between the weight values calculated by the processor 140 fall within the preset range, and then start the wafer spin-drying assembly 100 again. In this way, the service life of the wafer spin-drying assembly 100 can be effectively improved.
[0031] Through the weight detection device 130 and the processor 140 of the wafer spin drying assembly 100, the user can reliably know whether the wafer basket 200 has achieved a better weight balance before starting the wafer spin drying assembly 100. This process does not rely on other work areas to provide data on the weight of the wafer basket 200, so it can bring convenience and efficiency to the user in operation.
[0032] Structurally, if Figure 1-2 As shown, the rotating frame 110 includes a bottom plate 111, a top ring 112, and a plurality of support plates 113. The top ring 112 is configured to allow the cradles 120 to at least partially pass through. The support plates 113 are connected between the bottom plate 111 and the top ring 112, and each of the cradles 120 is located between two adjacent ones of the support plates 113. Furthermore, the weight detection device 130 is at least partially located between the bottom plate 111 and the top ring 112. More specifically, the weight detector 131 is located between the bottom plate 111 and the top ring 112.
[0033] Furthermore, the cradles 120 are arranged along the direction D and located on opposite sides of the first axis X1 , and the cradles 120 are symmetrical in structure.
[0034] In addition, if Figure 1 As shown, the wafer spin drying assembly 100 further includes a cavity 150. The cavity 150 has a second space SP2 and at least two through holes H (another through hole H is located at Figure 1 The rotating frame 110 is located in the second space SP2, and the brackets 132 of the weight detecting device 130 pass through corresponding ones of the through holes H respectively.
[0035] Please refer to Figure 3 . Figure 3 To illustrate Figure 2 FIG. 1 is a perspective view of the wafer spin drying assembly 100 from another perspective, wherein only one set of cradles 120 and weight detection devices 130 are shown. Figure 3 As shown, the cradle 120 is pivoted between two adjacent support plates 113 of the rotating frame 110 about a second axis X2, and the second axis X2 is perpendicular to the first axis X1. Furthermore, the cradle 120 has at least one supporting point P, and the bracket 132 of the weight detection device 130 is configured to support the supporting point P of the cradle 120.
[0036] More specifically, if Figure 3 As shown, the cradle 120 includes a frame 121 and at least one cantilever 122. The frame 121 surrounds and defines a first space SP1 therein, and the first space SP1 is configured to accommodate the crystal basket 200 (see the crystal basket 200). Figure 1-2The cantilever 122 has a first end 122a and a second end 122b opposite to each other. The first end 122a is connected to the outer wall of the frame 121, and the second end 122b defines a supporting point P.
[0037] Please refer to Figure 4 . Figure 4 To draw the Figure 2 In this embodiment, as shown in FIG. Figure 4 As shown, the second axes X2 are parallel to each other, and the support point P is located between the second axes X2 in the direction D. Moreover, there is a first vertical distance Z1 between each of the support points P and the first axis X1 in the direction D, and there is a second vertical distance Z2 between the first axis X1 and each of the second axes X2. It is worth noting that in this embodiment, the first vertical distance Z1 is smaller than the second vertical distance Z2.
[0038] Furthermore, if Figure 4 As shown, the first vertical distances Z1 are the same as each other, and the second vertical distances Z2 are also the same as each other. That is, the third vertical distances Z3 between the support point P and the adjacent second axis X2 in the direction D are also the same as each other, which is conducive to improving the reliability of the difference calculated by the processor 140. It should be understood that the third vertical distance Z3 is the difference between the second vertical distance Z2 and the first vertical distance Z1.
[0039] Please refer to Figure 5 . Figure 5 To draw the Figure 2 As described above, in this embodiment, as Figure 5 As shown, the bracket 132 of the weight detection device 130 abuts against the second end 122b of the cantilever 122. However, according to actual conditions, the bracket 132 of the weight detection device 130 may also abut against other positions of the cradle 120, such as but not limited to the bottom of the cradle 120 closer to the first axis X1 relative to the second axis X2, such as Figure 5 shown.
[0040] Please refer to Figure 6 . Figure 6 The following is a schematic diagram of the arrangement of cradles 120 according to another embodiment of the present invention, wherein the number of cradles 120 is an even number. In this embodiment, the number of cradles 120 is also an even number as in the above embodiment. Figure 6As shown, there are four cradles 120, and the cradles 120 are evenly distributed around the first axis X1. More specifically, the two cradles 120 facing each other are mirror-symmetrical. In this case, before starting the wafer spin-drying assembly 100, the processor 140 can first calculate the weight values measured by the weight detection devices 130 supporting the four cradles 120 to confirm whether the difference between these weight values falls within a preset range. To make the drawings simple, the weight detection device 130 and the processor 140 are not shown in the figure. Figure 6 middle.
[0041] Please refer to Figure 7 . Figure 7 The following is a schematic diagram of the arrangement of cradles 120 according to another embodiment of the present invention, wherein the number of cradles 120 is an odd number. In this embodiment, the number of cradles 120 is an odd number. According to actual conditions, for example, Figure 7 As shown, the number of cradles 120 is three, and the cradles 120 are evenly distributed around the first axis X1. More specifically, the angle formed by two adjacent cradles 120 on the first axis X1 is 120 degrees. In this case, before starting the wafer spin-drying assembly 100, the processor 140 can first calculate the weight values measured by the weight detection devices 130 that respectively support the three cradles 120 to confirm whether the difference between these weight values falls within a preset range. To make the drawings simple, the weight detection device 130 and the processor 140 are not shown in the figure. Figure 7 middle.
[0042] In summary, the technical solution disclosed in the above embodiments of the present invention has at least the following advantages:
[0043] (1) To prevent the wafer spin-drying assembly from being damaged due to excessive centripetal force generated by the rotating frame when rotating around the first axis due to a large weight difference between the two crystal baskets, the user can first confirm whether the difference between the weight values calculated by the processor is within a preset range before starting the wafer spin-drying assembly. If so, the two crystal baskets have achieved a better weight balance, and the user can choose to start the wafer spin-drying assembly to spin the wafers. If not, the user can choose to readjust the number of wafers in at least one of the two crystal baskets to ensure that the difference between the weight values calculated by the processor falls within the preset range, and then start the wafer spin-drying assembly again. In this way, the service life of the wafer spin-drying assembly can be effectively improved.
[0044] (2) Through the weight detection device and processor of the wafer spin-drying assembly, the user can reliably know whether the wafer basket has achieved an optimal weight balance before starting the wafer spin-drying assembly. This process does not rely on other work areas to provide data on the weight of the wafer basket, so it can bring convenience and efficiency to the user in operation.
[0045] Although the present invention has been disclosed in the form of implementation modes as above, it is not intended to limit the present invention. Any person skilled in the art may make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the definition of the attached claims.
[0046]
Explanation of symbols
[0047] 100: Wafer spin drying assembly
[0048] 110: Rotating rack
[0049] 111: Chassis
[0050] 112: Top ring
[0051] 113: Support plate
[0052] 120: Cradle
[0053] 121:Frame
[0054] 122: Cantilever
[0055] 122a: First end
[0056] 122b: Second end
[0057] 130:Weight detection device
[0058] 131:Weight detector
[0059] 132: Bracket
[0060] 140: Processor
[0061] 150: Cavity
[0062] 200: Crystal Basket
[0063] 300: Wafer
[0064] AA,BB: Line segment
[0065] D: Direction
[0066] H: Perforation
[0067] M: Range
[0068] P: Support point
[0069] SP1: First Space
[0070] SP2: Second Space
[0071] X1: First axis
[0072] X2: Second axis
[0073] Z1: First vertical distance
[0074] Z2: Second vertical distance
[0075] Z3: The third vertical distance.
Claims
1. A wafer spin drying assembly, characterized in that: Include: a rotating frame configured to rotate about a first axis; At least two cradles, respectively pivotally connected to the rotating frame and configured to accommodate crystal baskets; at least two weight detection devices, separated from the rotating frame, the plurality of weight detection devices are respectively configured to at least partially support a corresponding one of the plurality of cradles, so as to measure the weight value respectively; as well as A processor is signal-connected to the plurality of weight sensing devices and configured to calculate differences between the plurality of weight values.
2. The wafer spin drying assembly according to claim 1, characterized in that: The multiple cradles are arranged along a direction and are located on opposite sides of the first axis, each of the multiple cradles is pivotally connected to the rotating frame around a second axis, the multiple second axes are perpendicular to the first axis, each of the multiple cradles has at least one supporting point, each of the multiple weight detection devices is configured to support the supporting point of a corresponding one of the multiple cradles, the supporting point has a first vertical distance from the first axis in the direction, the first axis has a second vertical distance from each of the multiple second axes, and the first vertical distance is smaller than the second vertical distance.
3. The wafer spin drying assembly according to claim 2, characterized in that: The plurality of second axes are parallel to each other, and the supporting point is located between the plurality of second axes in this direction.
4. The wafer spin drying assembly according to claim 2, characterized in that: Each of the plurality of cradles comprises: a frame body, surrounding and defining a first space therein, wherein the first space is configured to accommodate the crystal basket; and At least one cantilever has a first end and a second end opposite to each other, wherein the first end is connected to the outer wall of the frame, and the second end defines the supporting point.
5. The wafer spin drying assembly according to claim 4, characterized in that: The plurality of cradles are structurally symmetrical to each other.
6. The wafer spin drying assembly according to claim 4, characterized in that: The plurality of first vertical distances are the same as one another, and the plurality of second vertical distances are the same as one another.
7. The wafer spin drying assembly according to claim 2, characterized in that: The rotating frame includes: Chassis; a top ring configured to allow the plurality of cradles to at least partially pass therethrough; and A plurality of support plates are connected between the bottom plate and the top ring. Each of the plurality of cradles is pivotally connected between two adjacent ones of the plurality of support plates around a corresponding one of the plurality of second axes.
8. The wafer spin drying assembly according to claim 7, characterized in that: The plurality of weight detection devices are at least partially located between the bottom plate and the top ring.
9. The wafer spin drying assembly according to claim 1, characterized in that: Also includes: The cavity has a second space and at least two through holes that are connected to each other. The rotating frame is located in the second space. The multiple weight detection devices respectively pass through a corresponding one of the multiple through holes.
10. The wafer spin drying assembly according to claim 1, characterized in that: The number of the cradles is an even number, and the cradles are evenly distributed around the first axis.
11. The wafer spin drying assembly according to claim 1, characterized in that: The number of the cradles is an odd number, and the cradles are evenly distributed around the first axis.