Planar magnetron sputtering target rotating device and magnetron sputtering coating machine

Abstract

The utility model discloses a planar magnetron sputtering target rotating device and a magnetron sputtering coating machine. The planar magnetron sputtering target rotating device comprises a first fluted disc and a second fluted disc, the second fluted disc is matched and meshed with the first fluted disc, the first fluted disc and the second fluted disc are respectively provided with a plane target, and the two plane targets are both located on the same side of the first fluted disc and the second fluted disc; the driving mechanism is connected with the second fluted disc, and when the driving mechanism drives the second fluted disc to rotate, the second fluted disc drives the first fluted disc to rotate reversely; when the driving mechanism drives the second fluted disc to rotate by 180 degrees in the first direction, the first fluted disc is driven by the second fluted disc to rotate by 180 degrees in the opposite direction, so that the two plane targets can face or back to a product to be coated at the same time. When the plane target is cleaned, the plane target is driven by the driving mechanism to rotate, so that the target surface is opposite to a product to be coated, the product pollution in the target cleaning process is avoided, and the coating quality is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of coating equipment, and further relates to a planar magnetron sputtering target rotating device and a magnetron sputtering coating machine. Background Art

[0002] At present, magnetron sputtering coating technology is widely used due to its advantages such as simple processing, convenient installation, dense coating layer, high bonding strength, and long-term mass production. The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying toward the substrate under the action of the electric field E, causing them to ionize and produce Ar positive ions and new electrons; new electrons fly toward the substrate, and Ar ions are accelerated to fly toward the cathode target under the action of the electric field, and bombard the target surface with high energy, causing the target material to be sputtered. Among the sputtered particles, neutral target atoms or molecules are deposited on the substrate to form a thin film.

[0003] The coating machine can automatically and continuously perform low vacuum exhaust, arc ion bombardment pre-treatment, high vacuum exhaust, aluminum evaporation, anti-oxidation film coating and other processes in a vacuum. Among them, the product hanger to be coated is fixed on the tooling plate of the rotating cage. The product hanger can rotate on its own and co-rotate, and the rotation speed can be adjusted. After the coating program is started, the sputtered atoms escaping from the target material can be directly sputtered onto the product to be coated on the outer wall of the rotating cage, so that a film can be deposited on the surface of the product to be coated. However, the planar magnetron sputtering target will absorb impurities in the air, so it is necessary to wash the target before coating, but the target washing process is likely to cause product contamination and affect the coating quality.

[0004] Therefore, it is necessary to design a planar magnetron sputtering target rotating device and a magnetron sputtering coating machine to solve the above problems. Summary of the invention

[0005] In response to the above technical problems, the purpose of the utility model is to provide a planar magnetron sputtering target rotation device and a magnetron sputtering coating machine, which can drive the planar target to rotate through a driving mechanism when cleaning the planar target, so that the target surface is facing away from the product to be coated, thereby avoiding product contamination caused by the target washing process and improving the coating quality.

[0006] In order to achieve the above object, the utility model provides a planar magnetron sputtering target rotating device, comprising:

[0007] First toothed disc;

[0008] A second toothed disc, wherein the second toothed disc is adapted to mesh with the first toothed disc, and the first toothed disc and the second toothed disc are respectively provided with plane targets, and the two plane targets are both located on the same side of the first toothed disc and the second toothed disc;

[0009] A driving mechanism connected to the second toothed disc, wherein when the driving mechanism drives the second toothed disc to rotate, the second toothed disc drives the first toothed disc to rotate in the opposite direction;

[0010] When the driving mechanism drives the second toothed disc to rotate 180° in the first direction, the first toothed disc is driven by the second toothed disc to rotate 180° in the opposite direction, so that the two planar targets can face or back to the product to be coated at the same time.

[0011] In some embodiments, a transmission ratio between the first toothed disc and the second toothed disc is 1:1, and a diameter of the first toothed disc is the same as a diameter of the second toothed disc.

[0012] In some embodiments, the first toothed disc and the second toothed disc have the same structure.

[0013] In some embodiments, the planar target is a square structure, and the bottoms of the two planar targets are respectively fixed on the first toothed disc and the second toothed disc, and the first toothed disc and the second toothed disc are respectively rotatably disposed on the magnetron sputtering coating machine.

[0014] In some embodiments, the width of the planar target is substantially the same as the diameter of the first toothed disc, the two planar targets are respectively located at the middle of the first toothed disc and the middle of the second toothed disc, and the two planar targets are located in the same axial direction.

[0015] In some embodiments, the driving mechanism comprises:

[0016] A transmission shaft, wherein a first gear and a second gear are respectively disposed at both ends of the transmission shaft, and the first gear is adapted to mesh with the second gear disc;

[0017] A driving motor, wherein a driving gear is disposed on a driving shaft of the driving motor, and the driving gear and the second gear are located in the same plane and separated by a preset distance;

[0018] A transmission chain is adapted to be mounted on the driving gear and the second gear, so that the driving motor can drive the transmission shaft to rotate through the transmission chain.

[0019] In some embodiments, the driving mechanism further comprises:

[0020] A mounting plate is used to be fixed on the magnetron sputtering coating machine, the mounting plate is located on one side of the transmission chain, a first sensor and a second sensor arranged at intervals are arranged on the mounting plate, a sensing bar is arranged on the transmission chain, the sensing bar is located between the first sensor and the second sensor, and when the sensing bar moves to the first sensor or the second sensor, the driving motor stops working.

[0021] In some embodiments, the driving mechanism further comprises:

[0022] A mounting seat, used to be fixed on a magnetron sputtering coating machine, wherein the mounting plate is fixed on one side of the mounting seat;

[0023] The driving motor is fixed with a connecting plate, one end of the connecting plate is provided with a U-shaped groove, and the other end of the connecting plate is provided with a connecting hole;

[0024] The mounting seat is provided with a mounting hole and a connecting block, the connecting block is provided with a through hole, the first bolt passes through the mounting hole, the U-shaped groove and is threadedly connected with the first nut in sequence, the second bolt passes through the connecting hole, the through hole and is threadedly connected with the second nut in sequence, so as to fix the connecting plate on the mounting seat, wherein the first bolt and the second bolt are vertically arranged.

[0025] In some embodiments, the driving mechanism further comprises:

[0026] A shaft sleeve, wherein a bearing is arranged in the shaft sleeve, the bearing sleeve is arranged on the transmission shaft, and the shaft sleeve is used to be fixed on the magnetron sputtering coating machine;

[0027] The first gear and the second gear plate are located on the same plane, and the first gear is located on a side of the second gear plate away from the first gear plate.

[0028] According to another aspect of the utility model, the utility model further provides a magnetron sputtering coating machine, comprising the planar magnetron sputtering target rotating device described in any one of the above, and further comprising:

[0029] The tooling plate is used to fix the product to be coated, and the tooling plate is spaced apart from the planar target.

[0030] Compared with the prior art, the planar magnetron sputtering target rotating device and magnetron sputtering coating machine provided by the utility model have the following beneficial effects:

[0031] In the utility model, a rotating mechanism is arranged at the bottom of the plane target. When it is necessary to coat the product, the driving mechanism drives the toothed disc to drive the plane target to rotate so as to direct the plane target toward the product to be coated. When it is necessary to clean the plane target, the driving mechanism drives the toothed disc to drive the plane target to rotate so as to direct the plane target away from the product to be coated, thereby avoiding product contamination during the target washing process and improving the coating quality. The driving mechanism can drive the synchronous rotation of the two plane targets, and a chain is used to drive the transmission shaft to achieve the drive. The driving motor and the chain mechanism can be installed on the outside of the bottom of the frame without occupying the internal space, thereby avoiding impurities generated by the driving mechanism during operation to contaminate the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] The preferred implementation modes will be described below in a clear and understandable manner with reference to the accompanying drawings to further illustrate the above-mentioned characteristics, technical features, advantages and implementation methods of the present utility model.

[0033] Figure 1 It is a structural schematic diagram of a planar magnetron sputtering target rotating device according to a preferred embodiment of the utility model;

[0034] Figure 2 It is a partial structural diagram of a planar magnetron sputtering target rotating device according to a preferred embodiment of the utility model;

[0035] Figure 3 It is a front view of a planar magnetron sputtering target rotating device according to a preferred embodiment of the utility model;

[0036] Figure 4 It is a side view of a planar magnetron sputtering target rotating device according to a preferred embodiment of the utility model;

[0037] Figure 5 It is a structural schematic diagram of a driving mechanism of a preferred embodiment of the utility model;

[0038] Figure 6 It is a structural schematic diagram of the driving mechanism of the preferred embodiment of the utility model from another perspective.

[0039] Description of Figure Numbers:

[0040] First toothed disc 1, second toothed disc 2, driving mechanism 3, transmission shaft 31, first gear 311, second gear 312, driving motor 32, driving gear 321, connecting plate 322, U-shaped groove 323, transmission chain 33, induction strip 331, mounting plate 34, first sensor 341, second sensor 342, mounting seat 35, connecting block 351, first bolt 352, first nut 353, second bolt 354, second nut 355, bushing 36, plane target 4. DETAILED DESCRIPTION

[0041] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the specific implementation methods of the utility model will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings and other implementation methods can be obtained based on these drawings without creative work.

[0042] In order to simplify the drawings, only the parts related to the utility model are schematically shown in each figure, and they do not represent the actual structure of the product. In addition, in order to simplify the drawings and facilitate understanding, in some figures, only one of the parts with the same structure or function is schematically drawn or marked. In this article, "one" not only means "only one", but also means "more than one".

[0043] It should be further understood that the term “and / or” used in the specification and appended claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes these combinations.

[0044] In this article, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this utility model can be understood according to specific circumstances.

[0045] In addition, in the description of the present application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0046] In one embodiment, the reference specification Figure 1 , Figure 2 The utility model provides a planar magnetron sputtering target rotating device, comprising: a first toothed disc 1, a second toothed disc 2 and a driving mechanism 3, wherein the second toothed disc 2 is adapted to mesh with the first toothed disc 1, and the first toothed disc 1 and the second toothed disc 2 are respectively provided with a planar target 4, and the two planar targets 4 are both located on the same side of the first toothed disc 1 and the second toothed disc 2. The driving mechanism 3 is connected to the second toothed disc 2, and when the driving mechanism 3 drives the second toothed disc 2 to rotate, the second toothed disc 2 drives the first toothed disc 1 to rotate in the opposite direction; when the driving mechanism 3 drives the second toothed disc 2 to rotate 180° in the first direction, the first toothed disc 1 is driven by the second toothed disc 2 to rotate 180° in the opposite direction, so that the two planar targets 4 can simultaneously face or back to the product to be coated.

[0047] Specifically, Figure 2As shown, when the driving mechanism 3 drives the second toothed disc 2 to rotate 180° in the counterclockwise direction, the second toothed disc 2 drives the first toothed disc 1 to rotate 180° in the clockwise direction, and the two plane targets 4 face away from the front; the driving mechanism 3 then drives the second toothed disc 2 to rotate 180° in the clockwise direction, and the second toothed disc 2 drives the first toothed disc 1 to rotate 180° in the counterclockwise direction, and the two plane targets 4 face the front. Of course, the driving mechanism 3 can also be connected to the first toothed disc 1, and the second toothed disc 2 can be driven to rotate by driving the first toothed disc 1 to rotate. The driving method is similar to the above, and no further description is given here.

[0048] In this embodiment, a rotating mechanism is provided at the bottom of the planar target 4. When the product needs to be coated, the driving mechanism 3 drives the toothed disc to drive the planar target 4 to rotate so that the target surface of the planar target 4 faces the product to be coated. When the planar target 4 needs to be cleaned, the driving mechanism 3 drives the toothed disc to drive the planar target 4 to rotate 180° so that the target surface of the planar target 4 faces away from the product to be coated, thereby avoiding product contamination caused by the target washing process and improving the coating quality.

[0049] In one embodiment, the reference specification Figure 1 , Figure 2 The transmission ratio of the first toothed disc 1 to the second toothed disc 2 is 1:1, and the diameter of the first toothed disc 1 is the same as the diameter of the second toothed disc 2. Preferably, the first toothed disc 1 and the second toothed disc 2 have the same structure, so that the first toothed disc 1 and the second toothed disc 2 can be used interchangeably, and the types of required parts are reduced. The planar target 4 is a square structure, and the bottoms of the two planar targets 4 are respectively fixed on the first toothed disc 1 and the second toothed disc 2, and the first toothed disc 1 and the second toothed disc 2 are respectively rotatably set on the magnetron sputtering coating machine.

[0050] Furthermore, the width of the planar target 4 is substantially the same as the diameter of the first toothed disc 1 , and the two planar targets 4 are respectively located in the middle of the first toothed disc 1 and the middle of the second toothed disc 2 , and the two planar targets 4 are located in the same axial direction.

[0051] In one embodiment, the reference specification Figures 3 to 6 The driving mechanism 3 includes: a transmission shaft 31, a driving motor 32 and a transmission chain 33. The first gear 311 and the second gear 312 are respectively provided at both ends of the transmission shaft 31. The first gear 311 is adapted to mesh with the second gear disc 2. The first gear 311 and the second gear disc 2 are located on the same plane, and the first gear 311 is located on the side of the second gear disc 2 away from the first gear disc 1. A driving gear 321 is provided on the driving shaft of the driving motor 32. The driving gear 321 and the second gear 312 are located on the same plane and are separated by a preset distance; the transmission chain 33 is adapted to be arranged on the driving gear 321 and the second gear 312, so that the driving motor 32 can drive the transmission shaft 31 to rotate through the transmission chain 33.

[0052] Furthermore, the driving mechanism also includes a sleeve 36, in which a bearing is arranged. The bearing sleeve is arranged on the transmission shaft 31, and the sleeve 36 is used to be fixed on the bottom of the frame of the magnetron sputtering coating machine, so that the transmission shaft 31 passes through the bottom of the frame and maintains a rotational connection with the bottom of the frame.

[0053] In this embodiment, the driving mechanism 3 can drive the synchronous rotation of the two planar targets 4, and the driving is achieved by using a transmission chain 33 to drive the transmission shaft 31. The driving motor 32 and the transmission chain 33 can be installed on the outside of the bottom of the frame without occupying the internal space, while avoiding the generation of impurities by the driving mechanism 3 during operation to contaminate the product.

[0054] In one embodiment, the reference specification Figures 3 to 6 The driving mechanism 3 also includes: a mounting plate 34, which is used to be fixed on the magnetron sputtering coating machine. The mounting plate 34 is located on one side of the transmission chain 33. The mounting plate 34 is provided with a first sensor 341 and a second sensor 342 arranged at intervals. The transmission chain 33 is provided with a sensing bar 331, which is located between the first sensor 341 and the second sensor 342. When the sensing bar 331 moves to the first sensor 341, the target surfaces of the two planar targets 4 face the front, and the driving motor 32 stops working at this time; when the sensing bar 331 moves to the second sensor 342 with the transmission chain 33, the two planar targets 4 rotate 180°, and the target surfaces of the two planar targets 4 face away from the front, and the driving motor 32 stops working at this time. The first sensor 341 and the second sensor 342 are provided to control the rotation angle of the two planar targets 4, and the control accuracy is high.

[0055] Furthermore, the driving mechanism 3 also includes: a mounting seat 35, the mounting seat 35 is used to be fixed on the magnetron sputtering coating machine, and the mounting plate 34 is fixed on one side of the mounting seat 35. The driving motor 32 is fixed with a connecting plate 322, one end of the connecting plate 322 is provided with a U-shaped groove 323, and the other end of the connecting plate 322 is provided with a connecting hole. The mounting seat 35 is provided with a mounting hole and a connecting block 351, and the connecting block 351 is provided with a through hole. The first bolt 352 passes through the mounting hole and the U-shaped groove 323 in sequence and is threadedly connected with the first nut 353, and the second bolt 354 passes through the connecting hole and the through hole in sequence and is threadedly connected with the second nut 355 to fix the connecting plate 322 on the mounting seat 35, wherein the first bolt 352 and the second bolt 354 are arranged vertically. This structure can realize a stable connection between the driving motor 32 and the mounting seat 35, and is easy to install, can improve the shear resistance in the horizontal and vertical directions, and effectively avoid the situation where the bolts are broken due to excessive force.

[0056] According to another aspect of the utility model, the utility model further provides a magnetron sputtering coating machine, including the planar magnetron sputtering target rotating device described in any one of the above items, and also including: a tooling plate for fixing the product to be coated, the tooling plate and the planar target 4 are arranged at intervals.

[0057] In this embodiment, a rotating mechanism is provided at the bottom of the planar target 4. When the product needs to be coated, the driving mechanism 3 drives the gear disc to drive the planar target 4 to rotate so that the target surface of the planar target 4 faces the product to be coated. When the planar target 4 needs to be cleaned, the driving mechanism 3 drives the gear disc to drive the planar target 4 to rotate 180° so that the target surface of the planar target 4 faces away from the product to be coated, thereby avoiding product contamination caused by the target washing process and improving the coating quality. The driving mechanism 3 can drive the synchronous rotation of the two planar targets 4, and the transmission chain 33 is used to drive the transmission shaft 31 to achieve the drive. The driving motor 32 and the transmission chain 33 can be installed on the outside of the bottom of the frame without occupying the internal space, and at the same time avoid the impurities generated by the driving mechanism 3 during operation to contaminate the product.

[0058] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described or recorded in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0059] It should be noted that the above embodiments can be freely combined as needed. The above are only preferred implementations of the utility model. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principle of the utility model, and these improvements and modifications should also be regarded as the protection scope of the utility model.

Claims

1. A planar magnetron sputtering target rotating device, characterized in that: include: First toothed disc; A second toothed disc, wherein the second toothed disc is adapted to mesh with the first toothed disc, and the first toothed disc and the second toothed disc are respectively provided with plane targets, and the two plane targets are both located on the same side of the first toothed disc and the second toothed disc; A driving mechanism connected to the second toothed disc, wherein when the driving mechanism drives the second toothed disc to rotate, the second toothed disc drives the first toothed disc to rotate in the opposite direction; When the driving mechanism drives the second toothed disc to rotate 180° in the first direction, the first toothed disc is driven by the second toothed disc to rotate 180° in the opposite direction, so that the two planar targets can face or back to the product to be coated at the same time.

2. The planar magnetron sputtering target rotating device according to claim 1, characterized in that: The transmission ratio of the first toothed disc to the second toothed disc is 1:1, and the diameter of the first toothed disc is the same as the diameter of the second toothed disc.

3. The planar magnetron sputtering target rotating device according to claim 2, characterized in that: The first gear disc and the second gear disc have the same structure.

4. The planar magnetron sputtering target rotating device according to claim 3, characterized in that: The planar target is a square structure. The bottoms of the two planar targets are respectively fixed on the first toothed disc and the second toothed disc. The first toothed disc and the second toothed disc are respectively rotatably arranged on the magnetron sputtering coating machine.

5. The planar magnetron sputtering target rotating device according to claim 4, characterized in that: The width of the planar target is substantially the same as the diameter of the first toothed disc. The two planar targets are respectively located in the middle of the first toothed disc and the middle of the second toothed disc, and the two planar targets are located in the same axial direction.

6. The planar magnetron sputtering target rotating device according to any one of claims 1 to 5, characterized in that: The driving mechanism comprises: A transmission shaft, wherein a first gear and a second gear are respectively disposed at both ends of the transmission shaft, and the first gear is adapted to mesh with the second gear disc; A driving motor, wherein a driving gear is disposed on a driving shaft of the driving motor, and the driving gear and the second gear are located in the same plane and separated by a preset distance; A transmission chain is adapted to be mounted on the driving gear and the second gear, so that the driving motor can drive the transmission shaft to rotate through the transmission chain.

7. The planar magnetron sputtering target rotating device according to claim 6, characterized in that: The driving mechanism further comprises: A mounting plate is used to be fixed on the magnetron sputtering coating machine, the mounting plate is located on one side of the transmission chain, a first sensor and a second sensor arranged at intervals are arranged on the mounting plate, a sensing bar is arranged on the transmission chain, the sensing bar is located between the first sensor and the second sensor, and when the sensing bar moves to the first sensor or the second sensor, the driving motor stops working.

8. The planar magnetron sputtering target rotating device according to claim 7, characterized in that: The driving mechanism further comprises: A mounting seat, used to be fixed on a magnetron sputtering coating machine, wherein the mounting plate is fixed on one side of the mounting seat; The driving motor is fixed with a connecting plate, one end of the connecting plate is provided with a U-shaped groove, and the other end of the connecting plate is provided with a connecting hole; The mounting seat is provided with a mounting hole and a connecting block, the connecting block is provided with a through hole, the first bolt passes through the mounting hole, the U-shaped groove and is threadedly connected with the first nut in sequence, the second bolt passes through the connecting hole, the through hole and is threadedly connected with the second nut in sequence, so as to fix the connecting plate on the mounting seat, wherein the first bolt and the second bolt are vertically arranged.

9. The planar magnetron sputtering target rotating device according to claim 6, characterized in that: The driving mechanism further comprises: A shaft sleeve, wherein a bearing is arranged in the shaft sleeve, the bearing sleeve is arranged on the transmission shaft, and the shaft sleeve is used to be fixed on the magnetron sputtering coating machine; The first gear and the second gear plate are located on the same plane, and the first gear is located on a side of the second gear plate away from the first gear plate.

10. A magnetron sputtering coating machine, characterized in that: The planar magnetron sputtering target rotating device according to any one of claims 1 to 9 further comprises: The tooling plate is used to fix the product to be coated, and the tooling plate is spaced apart from the planar target.

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