Device for producing photovoltaic cell

Abstract

The utility model discloses a device for producing photovoltaic cells, which comprises a feeding machine, the feeding machine is connected with a sheet feeding chamber, the sheet feeding chamber is connected with a heating chamber, the heating chamber is connected with a process chamber I, the process chamber I is connected with a process chamber IB, the process chamber IB is connected with a first buffer cavity, the first buffer cavity is connected with a process chamber N, and the process chamber N is connected with a second buffer cavity. The process chamber N is connected with a second buffer cavity, the second buffer cavity is connected with a process chamber P, the process chamber P is connected with a cooling chamber, the cooling chamber is connected with a sheet discharging chamber, and the sheet discharging chamber is connected with a blanking machine. The utility model has the advantages that the double-sided coating of the I layer, the N layer, the IB layer and the P layer of the battery piece can be completed through the straight-through type online continuous PECVD coating mode, only one atmosphere-vacuum-atmosphere process is needed, and the whole PECVD coating INP film layer can be completed without turning over.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaics, in particular to equipment for producing photovoltaic cells. Background Art

[0002] In the process of producing HJT solar cells, PECVD equipment is the key core equipment. Under certain vacuum and temperature conditions, in order to meet the PECVD process coating conditions, PECVD equipment requires vacuum chambers with different functions, including the wafer inlet / outlet chambers for atmosphere-vacuum exchange, the heating chamber / cooling chamber for heating and cooling the carrier / silicon wafer, and the process chamber for process coating.

[0003] At present, the PECVD equipment for producing heterojunction (HJT) batteries at home and abroad is mainly of segmented structure. The first stage is to coat the IB layer of the battery cell. 1) The process flow is that the loader swings the textured silicon wafer onto the carrier; 2) The carrier is transferred to the inlet chamber and enters the vacuum part; 3) The heating chamber heats the carrier silicon wafer; 4) The process IB chamber coats the IB layer of the battery cell (depending on the process conditions, there are several process IB chambers); 5) The cooling chamber cools the carrier and the battery cell; 6) The discharge chamber passes the vacuum part to the flipping mechanism, and each battery cell is flipped over in the atmospheric state. The second stage is to coat the I and N layers of the cell. 1) The process flow is that the flipping mechanism completes the flipping of the cell and places it on the carrier; 2) The carrier is passed into the cell inlet chamber and enters the vacuum part; 3) The heating chamber heats the carrier cell; 4) Process chamber I coats the I layer of the cell (depending on the process conditions, there are several process chambers I); 5) The buffer chamber isolates the I and N layer coating of the cell; 6) Process chamber N coats the N layer of the cell (depending on the process conditions, there are several process chambers N); 7) The cooling chamber cools the carrier and the cell; 8) The cell outlet chamber passes the vacuum part out to the flipping mechanism, and each cell is flipped under atmospheric conditions. The third section is to coat the P layer of the cell. 1) The flipping mechanism completes the flipping of the cell and places it on the carrier; 2) The carrier enters and exits the feeding chamber and enters the vacuum part; 3) The heating chamber heats the carrier cell; 4) The process P chamber coats the P layer of the cell (several process P chambers according to process conditions); 5) The cooling chamber cools the carrier and the cell; 6) The carrier passes from the discharge chamber to the vacuum part to the unloader. Its significant disadvantage is that the coating is from top to bottom, and the process coating INP is in different sections. The entire PECVD equipment coating process is divided into three sections, all of which are coated from top to bottom. A flipping machine is required between sections. Each section must have the process of feeding-heating-process coating-cooling-discharging to complete the PECVD coating of the entire HJT solar cell. Due to the three atmospheric-vacuum-atmospheric evacuation / breaking processes, the PECVD equipment uses a large number of vacuum chambers, a long production line, and a flipping process for the cell. Summary of the invention

[0004] The utility model provides a device for producing photovoltaic cells, which solves the technical problems existing in the above-mentioned prior art.

[0005] According to one aspect of the utility model, there is provided an equipment for producing photovoltaic cells, characterized in that it can coat the I layer, N layer, IB layer and P layer of the cell on both sides, and comprises: a loader, wherein the loader is connected to a cell feeding chamber, the cell feeding chamber is connected to a heating chamber, the heating chamber is connected to a process I chamber, the process I chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process N chamber, the process N chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process P chamber, the process P chamber is connected to a cooling chamber, the cooling chamber is connected to a cell discharge chamber, the cell discharge chamber is connected to a feeder, wherein the I layer is on the front side, the IB layer is on the back side, the N layer is on the front side, and the P layer is on the back side.

[0006] According to one aspect of the utility model, there is provided an equipment for producing photovoltaic cells, characterized in that it can coat the I layer, N layer, IB layer and P layer of the cell on both sides, and comprises: a loader, the loader is connected to a cell feeding chamber, the cell feeding chamber is connected to a heating chamber, the heating chamber is connected to a process I chamber, the process I chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process P chamber, the process P chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process N chamber, the process N chamber is connected to a cooling chamber, the cooling chamber is connected to a cell discharge chamber, the cell discharge chamber is connected to a feeder, wherein the I layer is on the front side, the IB layer is on the back side, the P layer is on the back side, and the N layer is on the front side.

[0007] According to one aspect of the utility model, there is provided an equipment for producing photovoltaic cells, characterized in that it can coat the I layer, N layer, IB layer and P layer of the cell on both sides, and comprises: a loader, the loader is connected to a cell feeding chamber, the cell feeding chamber is connected to a heating chamber, the heating chamber is connected to a process IB chamber, the process IB chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process N chamber, the process N chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process P chamber, the process P chamber is connected to a cooling chamber, the cooling chamber is connected to a cell discharge chamber, the cell discharge chamber is connected to a feeder, wherein the IB layer is on the reverse side, the I layer is on the front side, the N layer is on the front side, and the P layer is on the reverse side.

[0008] According to one aspect of the utility model, there is provided an equipment for producing photovoltaic cells, characterized in that it can coat the I layer, N layer, IB layer and P layer of the cell on both sides, and comprises: a loader, the loader is connected to a cell feeding chamber, the cell feeding chamber is connected to a heating chamber, the heating chamber is connected to a process IB chamber, the process IB chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process P chamber, the process P chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process N chamber, the process N chamber is connected to a cooling chamber, the cooling chamber is connected to a cell discharge chamber, the cell discharge chamber is connected to a feeder, wherein the IB layer is on the reverse side, the I layer is on the front side, the P layer is on the reverse side, and the N layer is on the front side.

[0009] According to one aspect of the utility model, there is provided an equipment for producing photovoltaic cells, characterized in that it can coat the I layer, N layer, IB layer and P layer of the cell on both sides, and comprises: a loader, the loader is connected to a sheet feeding chamber, the sheet feeding chamber is connected to a heating chamber, the heating chamber is connected to a process I chamber, the process I chamber is connected to a first buffer cavity, the first buffer cavity is connected to a process N chamber, the process N chamber is connected to a second buffer cavity, the second buffer cavity is connected to a process IB chamber, the process IB chamber is connected to a third buffer cavity, the third buffer cavity is connected to a process P chamber, the process P chamber is connected to a cooling chamber, the cooling chamber is connected to a sheet discharge chamber, the sheet discharge chamber is connected to a feeder, wherein the I layer is on the front side, the N layer is on the front side, the IB layer is on the back side, and the P layer is on the back side.

[0010] According to one aspect of the utility model, there is provided an equipment for producing photovoltaic cells, characterized in that it can coat the I layer, N layer, IB layer and P layer of the cell on both sides, and comprises: a loader, the loader is connected to a cell feeding chamber, the cell feeding chamber is connected to a heating chamber, the heating chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process P chamber, the process P chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process I chamber, the process I chamber is connected to a third buffer chamber, the third buffer chamber is connected to a process N chamber, the process N chamber is connected to a cooling chamber, the cooling chamber is connected to a cell discharge chamber, the cell discharge chamber is connected to a feeder, wherein the IB layer is on the reverse side, the P layer is on the reverse side, the I layer is on the front side, and the N layer is on the front side.

[0011] It can be seen from the technical solution provided by the above-mentioned utility model that by adopting the utility model, through the straight-through online continuous PECVD coating method, only one atmosphere-vacuum-atmosphere process is needed, and the online double-sided coating can be completed without turning over to complete the entire PECVD coating INP film layer.

[0012] The above description is only an overview of the technology of the utility model. In order to more clearly understand the technical means of the utility model, it can be implemented according to the contents of the specification. In order to make the above and other purposes, features and advantages of the utility model more obvious and easy to understand, the specific implementation methods of the utility model are listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] By reading the detailed description of the preferred embodiment below, various other advantages and benefits will become clear to those of ordinary skill in the art. The accompanying drawings are only used for the purpose of illustrating the preferred embodiment and are not considered to be limitations of the present invention. In addition, the same reference symbols are used to represent the same components throughout the accompanying drawings.

[0014] Figure 1 It is a schematic structural diagram of the photovoltaic cell of the present utility model.

[0015] Figure 2 This is a schematic diagram of a first embodiment of the equipment for producing photovoltaic cells according to the utility model.

[0016] Figure 3 This is a schematic diagram of a second embodiment of the equipment for producing photovoltaic cells according to the utility model.

[0017] Figure 4 This is a schematic diagram of a third embodiment of the equipment for producing photovoltaic cells according to the utility model.

[0018] Figure 5 This is a schematic diagram of a fourth embodiment of the equipment for producing photovoltaic cells according to the utility model.

[0019] Figure 6 This is a schematic diagram of a fifth embodiment of the equipment for producing photovoltaic cells according to the utility model.

[0020] Figure 7 This is a schematic diagram of a fifth embodiment of the equipment for producing photovoltaic cells according to the utility model.

[0021] Figure 8 It is a schematic diagram of an embodiment of the above coating of the present utility model.

[0022] Fig. 9 It is a schematic diagram of the following coating embodiment of the present utility model. DETAILED DESCRIPTION

[0023] The exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present invention are shown in the accompanying drawings, it should be understood that the present invention can be implemented in various forms and should not be limited by the embodiments described herein. On the contrary, these embodiments are provided to enable a more thorough understanding of the present invention and to fully convey the scope of the present invention to those skilled in the art.

[0024] The following is a detailed description of a photovoltaic cell production device provided by the utility model. The contents not described in detail in the embodiments of the utility model belong to the prior art known to professional and technical personnel in the field. If no specific conditions are specified in the embodiments of the utility model, the conventional conditions in the field or the conditions recommended by the manufacturer shall be followed.

[0025] Please refer to, Figures 1 to 9 The structure of the HJT solar cell of the utility model is as follows Figure 1 As shown in the figure, under certain vacuum and temperature conditions, double I layers (I layer and IB layer), N layer and P layer are coated on both sides of the textured silicon wafer. These layers are deposited by PECVD equipment. The N layer and P layer of the battery are doped with phosphorus and boron elements respectively. In order to prevent the coating layers from contaminating each other, the PECVD equipment must use an independent vacuum chamber for coating each layer, and the vacuum chambers need to be isolated between the process chambers for coating different layers to prevent cross-gas contamination.

[0026] As a specific example, Figure 2 As shown, the utility model is a device for producing photovoltaic cells, comprising: a loader, the loader is connected to a film feeding chamber, the film feeding chamber is connected to a heating chamber, the heating chamber is connected to a process I chamber, the process I chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process N chamber, the process N chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process P chamber, the process P chamber is connected to a cooling chamber, the cooling chamber is connected to a film discharge chamber, and the film discharge chamber is connected to a feeder.

[0027] This embodiment is positive I-negative IB-positive N-negative P, and the process flow is as follows: 1) the loader 11 swings the textured silicon wafer onto the carrier; 2) the carrier is passed into the wafer inlet chamber 1 and enters the vacuum part; 3) the heating chamber 2 heats the carrier silicon wafer; 4) the process I chamber 3 processes the I layer of the cell to be coated; 5) the process IB chamber 4 processes the IB layer of the cell to be coated; 6) the buffer chamber 5 isolates the IB layer from the N layer coating; 7) the process N chamber 6 processes the N layer of the cell to be coated; 8) the buffer chamber 7 isolates the N layer from the P layer coating; 9) the process P chamber 8 processes the P layer of the cell to be coated; 10) the cooling chamber 9 cools the carrier and the cell; 11) the carrier is passed out of the vacuum part from the wafer outlet chamber 10 to the unloader 12 for unloading; 12) the carrier is returned to the loader through the lower return conveyor for the next process cycle.

[0028] According to the improvement of the beat and process conditions, several process I chambers, several process IB chambers, several process N chambers, and several process P chambers can be connected in series.

[0029] The PECVD equipment performs double-sided coating, with the I and N layers of the cell being coated from the top, and the IB and P layers of the cell being coated from the bottom. During the entire process, the coated cell is always in a vacuum state to complete all PECVD coatings.

[0030] Please refer to Figure 8 The coating method is as follows: the process gas is sprayed downward from the spray electrode 31, the carrier plate 32 carrying the battery cell is under the spray electrode, and a film layer is deposited on the battery cell 33 (front side).

[0031] Please refer to Fig. 9 The coating method below is as follows: the process gas is sprayed upward from the spray electrode 31, the carrier plate 32 carrying the battery cell is above the spray electrode, and the film layer is deposited under the battery cell 33 (on the reverse side).

[0032] As a specific example, Figure 3 As shown, the utility model is a device for producing photovoltaic cells, comprising: a loader, the loader is connected to a film feeding chamber, the film feeding chamber is connected to a heating chamber, the heating chamber is connected to a process I chamber, the process I chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process P chamber, the process P chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process N chamber, the process N chamber is connected to a cooling chamber, the cooling chamber is connected to a film discharge chamber, and the film discharge chamber is connected to a feeder.

[0033] This embodiment is positive I-negative IB-negative P-positive N, and the process flow is as follows: 1) the loader 11 swings the textured silicon wafer onto the carrier; 2) the carrier is passed into the wafer inlet chamber 1 and enters the vacuum part; 3) the heating chamber 2 heats the carrier silicon wafer; 4) the process I chamber 3 processes the I layer of the cell to be coated; 5) the process IB chamber 4 processes the IB layer of the cell to be coated; 6) the buffer chamber 5 isolates the IB layer from the N layer of coating; 7) the process P chamber 8 processes the P layer of the cell to be coated; 8) the buffer chamber 7 isolates the P layer from the N layer of coating; 9) the process N chamber 6 processes the N layer of the cell to be coated; 10) the cooling chamber 9 cools the carrier and the cell; 11) the carrier is passed from the vacuum part of the wafer outlet chamber 10 to the unloader 12 for unloading; 12) the carrier is returned to the loader through the lower return conveyor for the next process cycle.

[0034] As a specific example, Figure 4 As shown, the utility model is a device for producing photovoltaic cells, comprising: a loader, the loader is connected to a film feeding chamber, the film feeding chamber is connected to a heating chamber, the heating chamber is connected to a process IB chamber, the process IB chamber is connected to a process I chamber, the process I chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process N chamber, the process N chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process P chamber, the process P chamber is connected to a cooling chamber, the cooling chamber is connected to a film discharge chamber, and the film discharge chamber is connected to a feeder.

[0035] This embodiment is reverse IB-positive I-positive N-reverse P, and the process flow is as follows: 1) The loader 11 swings the textured silicon wafer onto the carrier; 2) The carrier is passed into the wafer inlet chamber 1 and enters the vacuum part; 3) The heating chamber 2 heats the carrier silicon wafer; 4) The process IB chamber 4 processes the IB layer of the cell under the process coating; 5) The process I chamber 3 processes the I layer of the cell above the process coating; 6) The buffer chamber 5 isolates the I layer from the N layer coating; 7) The process N chamber 6 processes the N layer of the cell above; 8) The buffer chamber 7 isolates the N layer from the P layer coating; 9) The process P chamber 8 processes the P layer of the cell under the process coating; 10) The cooling chamber 9 cools the carrier and the cell; 11) The carrier is transferred from the vacuum part of the wafer outlet chamber 10 to the unloader 12 for unloading; 12) The carrier is transferred back to the loader through the lower return conveyor for the next process cycle.

[0036] As a specific example, Figure 5 As shown, the utility model is a device for producing photovoltaic cells, comprising: a loader, the loader is connected to a sheet feeding chamber, the sheet feeding chamber is connected to a heating chamber, the heating chamber is connected to a process IB chamber, the process IB chamber is connected to a process I chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process P chamber, the process P chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process N chamber, the process N chamber is connected to a cooling chamber, the cooling chamber is connected to a sheet discharge chamber, the sheet discharge chamber is connected to a feeder, wherein the IB layer is on the reverse side, the I layer is on the front side, the P layer is on the reverse side, and the N layer is on the front side.

[0037] This embodiment is reverse IB-positive I-reverse P-positive N, and the process flow is as follows: 1) The loader 11 swings the textured silicon wafer onto the carrier; 2) The carrier is passed into the wafer inlet chamber 1 and enters the vacuum part; 3) The heating chamber 2 heats the carrier silicon wafer; 4) The process IB chamber 4 processes the IB layer of the cell under the process coating; 5) The process I chamber 3 processes the I layer of the cell above the process coating; 6) The buffer chamber 5 isolates the I layer from the P layer coating; 7) The process P chamber 8 processes the P layer of the cell under the process coating; 8) The buffer chamber 7 isolates the P layer from the N layer coating; 9) The process N chamber 6 processes the N layer of the cell above; 10) The cooling chamber 9 cools the carrier and the cell; 11) The carrier is passed from the vacuum part of the wafer outlet chamber ⑩ to the unloader 12 for unloading; 12) The carrier is returned to the loader through the lower return conveyor for the next process cycle.

[0038] As a specific example, Figure 6As shown, the utility model is a device for producing photovoltaic cells, comprising: a loader, the loader is connected to a film feeding chamber, the film feeding chamber is connected to a heating chamber, the heating chamber is connected to a process I chamber, the process I chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process N chamber, the process N chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process IB chamber, the process IB chamber is connected to a third buffer chamber, the third buffer chamber is connected to a process P chamber, the process P chamber is connected to a cooling chamber, the cooling chamber is connected to a film discharge chamber, and the film discharge chamber is connected to a feeder.

[0039] This embodiment is positive I-positive N-negative IB-negative P, and the process flow is as follows: 1) The loader 11 swings the textured silicon wafer onto the carrier; 2) The carrier is passed into the wafer inlet chamber 1 and enters the vacuum part; 3) The heating chamber 2 heats the carrier silicon wafer; 4) The process I chamber 3 processes the I layer of the cell; 5) The buffer chamber 5 isolates the I layer and the N layer of the coating; 6) The process N chamber 6 processes the N layer of the cell; 7) The buffer chamber ⑬ isolates the N layer and the IB layer of the coating; 8) The process IB chamber 4 processes the IB layer of the cell; 9) The buffer chamber 7 isolates the IB layer and the P layer of the coating; 10) The process P chamber 8 processes the P layer of the cell; 11) The cooling chamber 9 cools the carrier and the cell; 12) The carrier is passed out of the vacuum part from the wafer outlet chamber 10 to the unloader 12 for unloading; 13) The carrier is returned to the loader through the lower return for the next process cycle.

[0040] As a specific example, Figure 7 As shown, the utility model is a device for producing photovoltaic cells, comprising: a loader, the loader is connected to a film feeding chamber, the film feeding chamber is connected to a heating chamber, the heating chamber is connected to a process IB chamber, the process IB chamber is connected to a first buffer chamber, the first buffer chamber is connected to a process P chamber, the process P chamber is connected to a second buffer chamber, the second buffer chamber is connected to a process I chamber, the process I chamber is connected to a third buffer chamber, the third buffer chamber is connected to a process N chamber, the process N chamber is connected to a cooling chamber, the cooling chamber is connected to a film discharge chamber, and the film discharge chamber is connected to a feeder.

[0041] This embodiment is reverse IB-reverse P-positive I-positive N, and the process flow is as follows: 1) The loader 11 swings the textured silicon wafer onto the carrier; 2) The carrier is passed into the wafer inlet chamber 1 and enters the vacuum part; 3) The heating chamber 2 heats the carrier silicon wafer; 4) The process IB chamber 4 processes the IB layer of the cell under the process coating; 5) The buffer chamber 5 isolates the IB layer and the P layer coating; 6) The process P chamber 8 processes the P layer of the cell under the process coating; 7) The buffer chamber 13 isolates the P layer and the I layer coating; 8) The process I chamber 3 processes the I layer of the cell above; 9) The buffer chamber 7 isolates the I layer and the N layer coating; 10) The process N chamber 6 processes the N layer of the cell above; 11) The cooling chamber 9 cools the carrier and the cell; 12) The carrier is passed out of the vacuum part from the wafer outlet chamber 10 to the unloader 12 for unloading; 13) The carrier is returned to the loader through the lower return for the next process cycle.

[0042] Compared with multi-stage PECVD process coating equipment, the utility model reduces multiple sheet feeding, heating chambers, cooling chambers, sheet discharging chambers, and flipping mechanisms, thereby reducing the cost of the equipment. The entire equipment reduces the vacuum chamber to make the length shorter, thereby reducing the operating cost.

[0043] It should be clear that the present invention is not limited to the specific configurations and processes described above and shown in the figures. For the sake of simplicity, a detailed description of the known methods is omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present invention is not limited to the specific steps described and shown, and those skilled in the art can make various changes, modifications and additions, or change the order between the steps after understanding the spirit of the present invention.

Claims

1. A device for producing photovoltaic cells, characterized in that: The double-sided coating of the I layer, N layer, IB layer and P layer of the battery cell includes: a loader, the loader is connected to the sheet feeding chamber, the sheet feeding chamber is connected to the heating chamber, the heating chamber is connected to the process I chamber, the process I chamber is connected to the process IB chamber, the process IB chamber is connected to the first buffer chamber, the first buffer chamber is connected to the process N chamber, the process N chamber is connected to the second buffer chamber, the second buffer chamber is connected to the process P chamber, the process P chamber is connected to the cooling chamber, the cooling chamber is connected to the sheet discharge chamber, and the sheet discharge chamber is connected to the unloader, wherein the I layer is on the front side, the IB layer is on the back side, the N layer is on the front side, and the P layer is on the back side.

2. A device for producing photovoltaic cells, characterized in that: The double-sided coating of the I layer, N layer, IB layer and P layer of the battery cell includes: a loader, the loader is connected to the sheet feeding chamber, the sheet feeding chamber is connected to the heating chamber, the heating chamber is connected to the process I chamber, the process I chamber is connected to the process IB chamber, the process IB chamber is connected to the first buffer chamber, the first buffer chamber is connected to the process P chamber, the process P chamber is connected to the second buffer chamber, the second buffer chamber is connected to the process N chamber, the process N chamber is connected to the cooling chamber, the cooling chamber is connected to the sheet discharge chamber, and the sheet discharge chamber is connected to the unloader, wherein the I layer is on the front side, the IB layer is on the back side, the P layer is on the back side, and the N layer is on the front side.

3. A device for producing photovoltaic cells, characterized in that: The double-sided coating of the I layer, N layer, IB layer and P layer of the battery cell includes: a loader, the loader is connected to the sheet feeding chamber, the sheet feeding chamber is connected to the heating chamber, the heating chamber is connected to the process IB chamber, the process IB chamber is connected to the process I chamber, the process IB chamber is connected to the first buffer chamber, the first buffer chamber is connected to the process N chamber, the process N chamber is connected to the second buffer chamber, the second buffer chamber is connected to the process P chamber, the process P chamber is connected to the cooling chamber, the cooling chamber is connected to the sheet discharge chamber, and the sheet discharge chamber is connected to the unloader, wherein the IB layer is on the back, the I layer is on the front, the N layer is on the front, and the P layer is on the back.

4. A device for producing photovoltaic cells, characterized in that: The double-sided coating of the I layer, N layer, IB layer and P layer of the battery cell includes: a loader, the loader is connected to the sheet feeding chamber, the sheet feeding chamber is connected to the heating chamber, the heating chamber is connected to the process IB chamber, the process IB chamber is connected to the process I chamber, the process IB chamber is connected to the first buffer chamber, the first buffer chamber is connected to the process P chamber, the process P chamber is connected to the second buffer chamber, the second buffer chamber is connected to the process N chamber, the process N chamber is connected to the cooling chamber, the cooling chamber is connected to the sheet discharge chamber, and the sheet discharge chamber is connected to the unloader, wherein the IB layer is on the back, the I layer is on the front, the P layer is on the back, and the N layer is on the front.

5. A device for producing photovoltaic cells, characterized in that: The double-sided coating of the I layer, N layer, IB layer and P layer of the battery cell includes: a loader, the loader is connected to the sheet feeding chamber, the sheet feeding chamber is connected to the heating chamber, the heating chamber is connected to the process I chamber, the process I chamber is connected to the first buffer cavity, the first buffer cavity is connected to the process N chamber, the process N chamber is connected to the second buffer cavity, the second buffer cavity is connected to the process IB chamber, the process IB chamber is connected to the third buffer cavity, the third buffer cavity is connected to the process P chamber, the process P chamber is connected to the cooling chamber, the cooling chamber is connected to the sheet discharge chamber, the sheet discharge chamber is connected to the unloader, wherein the I layer is on the front side, the N layer is on the front side, the IB layer is on the back side, and the P layer is on the back side.

6. A device for producing photovoltaic cells, characterized in that: The double-sided coating of the I layer, N layer, IB layer and P layer of the battery cell includes: a loader, the loader is connected to the sheet feeding chamber, the sheet feeding chamber is connected to the heating chamber, the heating chamber is connected to the process IB chamber, the process IB chamber is connected to the first buffer chamber, the first buffer chamber is connected to the process P chamber, the process P chamber is connected to the second buffer chamber, the second buffer chamber is connected to the process I chamber, the process I chamber is connected to the third buffer chamber, the third buffer chamber is connected to the process N chamber, the process N chamber is connected to the cooling chamber, the cooling chamber is connected to the sheet discharge chamber, the sheet discharge chamber is connected to the unloader, wherein the IB layer is on the back, the P layer is on the back, the I layer is on the front, and the N layer is on the front.

Images