Disassembly-free automatic cleaning anti-blocking device capable of being used for photoresist coating machine pipeline

Abstract

The utility model relates to the technical field of photoresist coating, in particular to a disassembly-free automatic cleaning anti-blocking device for a photoresist coating machine pipeline, which comprises a base, a photoresist feeding pipe, a nozzle, a raw material tank and a cleaning liquid storage tank, the nozzle is connected to a discharge port of the photoresist feeding pipe, two weight reduction scales are arranged at the top end of the base, and the cleaning liquid storage tank is connected with the nozzle. The raw material tank and the cleaning liquid storage tank are installed at the top ends of the two weight reduction scales respectively, a drainage pipe set is arranged among the photoresist feeding pipe, the raw material tank and the cleaning liquid storage tank, and a supporting structure used for fixing the photoresist feeding pipe is arranged at the top end of the base. The automatic cleaning device is provided with a disassembly-free automatic cleaning structure for the pipeline of the photoresist coating machine, reduces the labor cost, is provided with an automatic collecting structure for used cleaning liquid, is more convenient to use, and is provided with an alarm structure for the residual amount of photoresist raw materials and the residual amount of the cleaning liquid.

Description

Technical Field

[0001] The utility model relates to the technical field of photoresist coating, in particular to a disassembly-free automatic cleaning and anti-blocking device which can be used for a pipeline of a photoresist coating machine. Background Art

[0002] Photoresist coater is a widely used equipment in the semiconductor manufacturing process. It is mainly used to evenly coat photoresist on the surface of silicon wafers or other substrates for subsequent photolithography process. When the photoresist coater is in use, after a period of photoresist coating, photoresist will remain and agglomerate on the pipeline and nozzle cavity wall of the photoresist coater, which will cause pipeline blockage. At the same time, agglomerated photoresist will be sprayed onto the wafer, causing defects, and regular cleaning is required.

[0003] During use, the pipes and nozzles of existing photoresist coating machines are generally cleaned after the relevant parts are disassembled manually, resulting in insufficient cleaning efficiency, a waste of manpower costs, and even the risk of installation errors and damage to the device. Utility Model Content

[0004] In order to solve the above problems existing in the prior art, the utility model provides a disassembly-free automatic cleaning and anti-blocking device which can be used for the pipeline of a photoresist coating machine.

[0005] The purpose of the utility model can be achieved through the following technical solutions:

[0006] A disassembly-free automatic cleaning and anti-blocking device for a photoresist coating machine pipeline comprises a base, a photoresist feeding pipe, a nozzle, a raw material tank and a cleaning liquid storage tank, wherein the nozzle is connected to the discharge port of the photoresist feeding pipe, two weight loss scales are arranged on the top of the base, the raw material tank and the cleaning liquid storage tank are respectively installed on the top of the two weight loss scales, a drainage pipe group is arranged between the photoresist feeding pipe, the raw material tank and the cleaning liquid storage tank, and a supporting structure for fixing the photoresist feeding pipe is arranged on the top of the base;

[0007] The support structure includes a support shaft, which is fixedly installed on the top of the base, a U-shaped frame is arranged on the top of the support shaft, the photoresist feeding pipe passes through the opposite sides of the U-shaped frame, a support plate is rotatably sleeved on the support shaft, a support platform is arranged on the side wall of the support shaft, the bottom end of the support plate is arranged flush with the top of the support platform, a collecting cylinder for collecting cleaning liquid is arranged on the top of the support shaft, the distance from the center line of the collecting cylinder to the center line of the support shaft is equal to the distance from the center line of the nozzle to the center line of the support shaft, a driving mechanism for adjusting the position of the collecting cylinder is arranged between the support plate and the support shaft, and two alarm lights are arranged on the top of the base.

[0008] Preferably, the photoresist feeding tube is provided in two sections, and a liquid pump is provided between the two sections of the photoresist feeding tube.

[0009] Preferably, the drainage pipe group includes a three-way pipe, the feed port of the photoresist feeding pipe is connected to two delivery pipes through the three-way pipe, the two delivery pipes are respectively connected to the discharge ports of the raw material tank and the cleaning liquid storage tank, and the two delivery pipes are both provided with a first solenoid valve.

[0010] Preferably, a through hole is provided at the bottom end of the support plate, and a bearing is provided between the through hole wall of the support plate and the support shaft.

[0011] Preferably, a communicating discharge pipe is provided at the bottom end of the collecting cylinder, the discharge pipe passes through the supporting shaft, and a second solenoid valve is provided on the side wall of the discharge pipe.

[0012] Preferably, a limiting tube is provided at the bottom end of the support plate, and an annular groove matching the limiting tube is provided at the top end of the support platform.

[0013] Preferably, the driving mechanism includes a motor, a gear ring is fixedly sleeved on the outer wall of the support platform, the motor is fixedly installed on the top of the support plate, the output shaft of the motor passes through the support plate, a gear is arranged at the end of the output shaft of the motor, and the gear is meshed with the motor.

[0014] The beneficial effects of the utility model are:

[0015] 1. By setting up a raw material tank and a cleaning liquid storage tank, two weight loss scales cooperate with the PLC controller to monitor the liquid usage in the raw material tank and the cleaning liquid storage tank. When the cumulative usage of the photoresist raw material reaches the preset value, the first solenoid valve on the delivery pipe connected to the raw material tank is closed, and the first solenoid valve on the delivery pipe connected to the cleaning liquid storage tank is opened, and a quantitative cleaning liquid is pumped to clean the photoresist feeding pipe and nozzle. It has a disassembly-free automatic cleaning structure for the photoresist coating machine pipeline, which reduces labor costs and is more convenient to use.

[0016] 2. By setting up a support plate and a collecting tube, when the cumulative amount of photoresist raw materials reaches a preset value, the driving mechanism drives the support plate to rotate 180° around the support axis, and the collecting tube rotates to the bottom of the nozzle. The collecting tube collects the cleaning liquid sprayed from the nozzle for subsequent processing, and has an automatic collection structure for the used cleaning liquid.

[0017] 3. By setting up alarm lights and weight loss scales, the two weight loss scales monitor the remaining amount in the raw material tank and the cleaning liquid storage tank respectively. When it is lower than the preset value, the corresponding alarm lights flash in conjunction with the PLC controller, which has an alarm structure for the remaining amount of photoresist raw materials and cleaning liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to facilitate understanding by those skilled in the art, the present invention is further described below in conjunction with the accompanying drawings.

[0019] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0020] Figure 2 It is a front view of the utility model;

[0021] Figure 3 This is an installation structure diagram of the driving mechanism in the utility model;

[0022] Figure 4 This is a diagram of the installation structure of the support platform in the utility model.

[0023] Description of main component symbols:

[0024] In the figure: 1. base; 2. photoresist feed pipe; 201. liquid pump; 3. nozzle; 4. weight loss scale; 5. raw material tank; 6. cleaning liquid storage tank; 7. three-way pipe; 8. delivery pipe; 9. first solenoid valve; 10. support shaft; 101. U-shaped frame; 102. support platform; 103. bearing; 11. support plate; 12. collection cylinder; 13. feed pipe; 14. second solenoid valve; 15. limit tube; 16. gear ring; 17. motor; 18. gear; 19. alarm light. DETAILED DESCRIPTION

[0025] In order to further explain the technical means and effects adopted by the utility model to achieve the predetermined utility model purpose, the specific implementation methods, structures, features and effects of the utility model are clearly and completely described below in combination with the accompanying drawings and preferred embodiments. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0026] In the description of the present application, it should be understood that the orientation or position relationship indicated by "inside" or "outside" etc. is based on the orientation or position described in the drawings, and is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, a specific orientation structure and operation, and therefore cannot be understood as a limitation on the present application.

[0027] Reference Figure 1-Figure 3, which is a disassembly-free automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine disclosed in the utility model, comprising a base 1, a photoresist feeding pipe 2, a nozzle 3, a raw material tank 5 and a cleaning liquid storage tank 6, the nozzle 3 is connected to the discharge port of the photoresist feeding pipe 2, the photoresist feeding pipe 2 is arranged in two sections, a liquid pump 201 is arranged between the two sections of the tube body of the photoresist feeding pipe 2, which has the function of pumping liquid, two weight loss scales 4 are arranged on the top of the base 1, the raw material tank 5 and the cleaning liquid storage tank 6 are respectively installed on the top of the two weight loss scales 4, which have the function of monitoring the liquid usage in the raw material tank 5 and the cleaning liquid storage tank 6, a drainage pipe group is arranged between the photoresist feeding pipe 2, the raw material tank 5 and the cleaning liquid storage tank 6, the drainage pipe group includes a three-way pipe 7, the feed port of the photoresist feeding pipe 2 is connected to two delivery pipes 8 through the three-way pipe 7, and the two delivery pipes 8 are respectively connected to the raw material tank 5 and The discharge ports of the cleaning liquid storage tank 6 are connected, and the two conveying pipes 8 are each provided with a first solenoid valve 9. Two alarm lights 19 are provided on the top of the base 1. A PLC controller is provided on the outer wall of the raw material tank 5. The two weight loss scales 4 are electrically connected to the input end of the PLC controller. The first solenoid valve 9, the second solenoid valve 14, and the motor 17 are all connected to the output end of the PLC controller. The two weight loss scales 4 cooperate with the PLC controller to monitor the liquid usage in the raw material tank 5 and the cleaning liquid storage tank 6. The alarm light 19 cooperates with the PLC controller to monitor and prompt the liquid in the raw material tank 5 and the cleaning liquid storage tank 6. When the accumulated amount of photoresist raw material reaches a preset value, the first solenoid valve 9 on the conveying pipe 8 connected to the raw material tank 5 is closed, and the first solenoid valve 9 on the conveying pipe 8 connected to the cleaning liquid storage tank 6 is opened, and a quantitative cleaning liquid is pumped to clean the photoresist feeding pipe 2 and the nozzle 3.

[0028] Reference Figure 1-Figure 4A support structure for fixing the photoresist feeding tube 2 is provided at the top of the base 1, and the support structure includes a support shaft 10, and the support shaft 10 is fixedly installed on the top of the base 1, and has a supporting function. A U-shaped frame 101 is provided at the top of the support shaft 10, and the photoresist feeding tube 2 passes through the opposite sides of the U-shaped frame 101. The support shaft 10 is rotatably sleeved with a support plate 11, and has a supporting function. A support platform 102 is provided on the side wall of the support shaft 10, and the bottom end of the support plate 11 is connected to the support The top of the platform 102 is flush with the support plate 11, and has a supporting function. A through hole is provided at the bottom of the support plate 11, and a bearing 103 is provided between the through hole wall of the support plate 11 and the support shaft 10. A collecting cylinder 12 for collecting cleaning liquid is provided at the top of the support shaft 10, and the distance from the center line of the collecting cylinder 12 to the center line of the support shaft 10 is equal to the distance from the center line of the nozzle 3 to the center line of the support shaft 10. A communicating discharge pipe 13 is provided at the bottom of the collecting cylinder 12, and the discharge pipe 13 passes through the support shaft. 10, a second solenoid valve 14 is provided on the side wall of the discharge pipe 13, which has the function of discharging the cleaning liquid in the collection tube 12, a limit tube 15 is provided at the bottom end of the support plate 11, and a ring groove matching the limit tube 15 is provided on the top of the support platform 102, so as to improve the stability of the support plate 11 during the rotation process, and a driving mechanism for adjusting the position of the collection tube 12 is provided between the support plate 11 and the support shaft 10, the driving mechanism includes a motor 17, a gear ring 16 is fixedly sleeved on the outer wall of the support platform 102, and the motor 17 is fixedly installed on the top of the support plate 11, the output shaft of the motor 17 passes through the support plate 11, and a gear 18 is provided on the end of the output shaft of the motor 17, and the gear 18 is meshed with the motor 17, and the motor 17 drives the gear 18 to mesh with the gear ring 16 for transmission, so as to drive the support plate 11 to rotate 180 degrees around the support shaft 10, when the pipeline is cleaned, the collection tube 12 is located directly below the nozzle 3, and when the photoresist is coated, the collection tube 12 is located away from the nozzle 3.

[0029] The working principle and use process of the utility model are as follows: two weight loss scales 4 cooperate with the PLC controller to monitor the liquid usage in the raw material tank 5 and the cleaning liquid storage tank 6, and the alarm light 19 cooperates with the PLC controller to monitor and prompt the liquid in the raw material tank 5 and the cleaning liquid storage tank 6. When the accumulated amount of photoresist raw material reaches the preset value, the motor 17 drives the gear 18 and the gear ring 16 to engage and transmit, driving the support plate 11 to rotate 180° around the support shaft 10, and the collecting cylinder 12 rotates to the bottom of the nozzle 3 to collect the used cleaning liquid. The first solenoid valve 9 on the delivery pipe 8 connected to the raw material tank 5 is closed, and the first solenoid valve 9 on the delivery pipe 8 connected to the cleaning liquid storage tank 6 is opened, and a quantitative cleaning liquid is pumped to clean the photoresist feeding pipe 2 and the nozzle 3.

[0030] The above description is only a preferred embodiment of the present invention and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as a preferred embodiment as above, it is not intended to limit the present invention. Any technical personnel in this field can make some changes or modify the technical contents disclosed above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any brief modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of the technical solution of the present invention.

Claims

1. A non-disassembly automatic cleaning and anti-blocking device for a photoresist coating machine pipeline, comprising a base (1), a photoresist feeding pipe (2), a nozzle (3), a raw material tank (5) and a cleaning liquid storage tank (6), characterized in that: The nozzle (3) is connected to the discharge port of the photoresist feeding pipe (2); two weight loss scales (4) are arranged at the top of the base (1); the raw material tank (5) and the cleaning liquid storage tank (6) are respectively installed at the top of the two weight loss scales (4); a drainage pipe group is arranged between the photoresist feeding pipe (2), the raw material tank (5) and the cleaning liquid storage tank (6); a supporting structure for fixing the photoresist feeding pipe (2) is arranged at the top of the base (1); and two warning lights (19) are arranged at the top of the base (1); The support structure comprises a support shaft (10), wherein the support shaft (10) is fixedly mounted on the top of the base (1), a U-shaped frame (101) is arranged at the top of the support shaft (10), the photoresist feeding tube (2) passes through the two opposite sides of the U-shaped frame (101), the support shaft (10) is rotatably sleeved with a support plate (11), a support platform (102) is arranged on the side wall of the support shaft (10), the bottom end of the support plate (11) is arranged flush with the top end of the support platform (102), a collecting cylinder (12) for collecting cleaning liquid is arranged at the top of the support shaft (10), the distance from the center line of the collecting cylinder (12) to the center line of the support shaft (10) is equal to the distance from the center line of the nozzle (3) to the center line of the support shaft (10), and a driving mechanism for adjusting the position of the collecting cylinder (12) is arranged between the support plate (11) and the support shaft (10).

2. The non-disassembly automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine according to claim 1 is characterized in that: The photoresist feeding tube (2) is arranged in two sections, and a liquid pump (201) is arranged between the two sections of the photoresist feeding tube (2).

3. The non-disassembly automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine according to claim 1 is characterized in that: The drainage pipe group includes a three-way pipe (7), and the feed port of the photoresist feed pipe (2) is connected to two delivery pipes (8) through the three-way pipe (7). The two delivery pipes (8) are respectively connected to the discharge ports of the raw material tank (5) and the cleaning liquid storage tank (6), and the two delivery pipes (8) are both provided with a first solenoid valve (9).

4. The non-disassembly automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine according to claim 1 is characterized in that: A through hole is provided at the bottom end of the support plate (11), and a bearing (103) is provided between the through hole wall of the support plate (11) and the support shaft (10).

5. The non-disassembly automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine according to claim 1 is characterized in that: The bottom end of the collecting cylinder (12) is provided with a communicating discharge pipe (13), the discharge pipe (13) passes through the supporting shaft (10), and a second solenoid valve (14) is provided on the side wall of the discharge pipe (13).

6. The non-disassembly automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine according to claim 1 is characterized in that: A limiting tube (15) is arranged at the bottom end of the support plate (11), and an annular groove matching the limiting tube (15) is arranged at the top end of the support platform (102).

7. The non-disassembly automatic cleaning and anti-blocking device for the pipeline of a photoresist coating machine according to claim 1 is characterized in that: The driving mechanism comprises a motor (17); a gear ring (16) is fixedly sleeved on the outer wall of the support platform (102); the motor (17) is fixedly mounted on the top of the support plate (11); an output shaft of the motor (17) passes through the support plate (11); a gear (18) is arranged at the end of the output shaft of the motor (17); and the gear (18) is meshed with the motor (17).

Images