Rotary double-point-source evaporation equipment

Abstract

The utility model belongs to the technical field of evaporation, and relates to rotary double-point-source evaporation equipment with stable coating rate, which comprises an evaporation cavity, a rotary mechanism, a plurality of evaporation point sources, a carrier plate conveying mechanism and a baffle plate, and the carrier plate conveying mechanism supports two sides of a carrier plate so as to expose the lower surface of the carrier plate. The baffle is provided with two evaporation holes allowing the two evaporation point sources to conduct upward evaporation correspondingly, the two evaporation holes are in mirror symmetry with the conveying center face of the carrier plate as the symmetry plane and in central symmetry with the center point of the rotating mechanism as the circle center, the evaporation holes are located at the evaporation positions, and the baffle is further provided with two preheating positions. And each preheating position is located at the position with the included angle of 180 degrees / n of the evaporation position. According to the equipment, the next pair of evaporation point sources can be preheated in advance when one pair of evaporation point sources is about to reach the use end point, and the next pair of evaporation point sources are seamlessly switched after the previous pair of evaporation point sources reaches the preset evaporation time, so that the change of the evaporation point sources does not influence the stability of the coating speed, and the evaporation quality is ensured.

Description

Technical Field

[0001] The utility model relates to the technical field of evaporation, in particular to a rotating double-point source evaporation device. Background Art

[0002] Vacuum evaporation, referred to as evaporation, refers to the evaporation or sublimation of traditional deposition materials to form gaseous particles under vacuum conditions by means of electric current heating, electron beam bombardment or laser heating. The gaseous particles are deposited on the substrate through basically collisionless linear motion under high vacuum conditions. When the number of aggregated particles exceeds a certain critical value, they become stable nuclei, and then continue to adsorb and diffuse particles and gradually grow, and finally form a continuous film through the contact and merging of adjacent stable nuclei. Inline (linear) evaporation equipment structure is usually used in the field of mass production of perovskite evaporation. For low-temperature materials (such as electron transport layer materials C60, etc.), linear evaporation source design is usually used, and for high-temperature materials (such as modification layer materials LiF / MgF2, etc.), multi-point evaporation source co-evaporation design is usually used.

[0003] Chinese patent CN207567335U discloses a linear evaporation source evaporation equipment that can use two linear evaporation sources on the left and right to perform evaporation at the same time. However, high-temperature materials (such as modified layer materials LiF / MgF2, etc.) usually cannot adopt a linear evaporation source structure design, and can only adopt a point-type evaporation source design. The capacity of the point-type evaporation source is often small, and the continuous evaporation production time is limited. In order to speed up the production cycle, it is usually necessary to increase the number of point source groups, which greatly increases the equipment cost and process difficulty. In addition, for substrates with larger substrate sizes (above 300mm×300mm), a single point source is difficult to ensure the uniformity of the film layer even with a correction plate. Therefore, for Inline evaporation equipment with larger substrate sizes, a dual point source structure is usually required.

[0004] Chinese patent CN220057002U discloses a vapor deposition device, which has both vapor deposition line sources and vapor deposition point sources. The vapor deposition power source rotates on a power switching mechanism, so that after a group of vapor deposition point sources reaches the end of use, another group of vapor deposition points is used to replace them, thereby maintaining continuous vapor deposition. However, there is a problem here: the former group of vapor deposition point sources can evaporate the vapor deposition material because the heating temperature has reached the boiling point of the vapor deposition material, while the latter group of vapor deposition point sources is at room temperature and needs to wait for heating to the boiling point, which will cause the vapor deposition to be terminated, which is not conducive to the uniformity of vapor deposition.

[0005] Therefore, it is necessary to improve the evaporation structure to solve the above problems. Utility Model Content

[0006] The main purpose of the utility model is to provide a rotating double-point source evaporation device with a stable coating rate, which can prolong the evaporation time under the premise of ensuring the uniformity of evaporation.

[0007] The utility model achieves the above-mentioned purpose through the following technical scheme: a rotating double-point source evaporation device with a stable coating rate, comprising an evaporation chamber, a rotating mechanism located at the lower part of the evaporation chamber, a plurality of evaporation point sources that are evenly distributed on the rotating mechanism, a carrier conveying mechanism located at the upper part of the evaporation chamber, and a baffle located between the rotating mechanism and the carrier conveying mechanism, wherein the carrier conveying mechanism supports both sides of the carrier so that the lower surface of the carrier is exposed, the number of the evaporation point sources is 2n, n is a positive integer not less than 2, two evaporation holes are arranged on the baffle for two evaporation point sources to evaporate upward respectively, the two evaporation holes are both mirror-symmetrical with the carrier conveying center plane as the symmetry plane and centrally symmetrical with the center point of the rotating mechanism as the center of the circle, the evaporation holes are located at the evaporation position, and two preheating positions are also arranged on the baffle, each preheating position is located at a position with an angle of 180° / n between the evaporation positions.

[0008] Specifically, the baffle is provided with an outwardly inclined evaporation guide tube at the preheating position, a film thickness detection probe is provided in the evaporation chamber at a position directly opposite to the outlet of the evaporation guide tube, and the outlet of the evaporation guide tube does not face the carrier plate.

[0009] Furthermore, each evaporation point source is provided with a heating mechanism, and the working states of all heating mechanisms are controlled by a timing controller.

[0010] The beneficial effects of the technical solution of the utility model are:

[0011] This equipment can preheat the next pair of evaporation point sources in advance when one pair of evaporation point sources is about to reach the end of use, and seamlessly switch to the next pair of evaporation point sources after the previous pair of evaporation point sources reaches the preset evaporation time, so that the replacement of the evaporation point sources does not affect the stability of the coating speed, thereby ensuring the evaporation quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 is the layout diagram of the rotating mechanism in the evaporation chamber;

[0013] Figure 2 It is the evaporation principle diagram of rotating double point source evaporation;

[0014] Figure 3 This is the preheating principle diagram of rotating double point source evaporation;

[0015] Figure 4 This is the temperature control schematic.

[0016] The numbers in the figure represent:

[0017] 1- Rotating dual point source evaporation equipment,

[0018] 11-evaporation chamber, 12-rotation mechanism, 13-carrier conveying mechanism, 14-evaporation point source, 141-heating mechanism, 15-baffle, 151-evaporation hole, 152-evaporation guide cylinder, 16-timing controller, 17-film thickness detection probe;

[0019] 2- Carrier board. DETAILED DESCRIPTION

[0020] The utility model is further described in detail below in conjunction with specific embodiments.

[0021] Example:

[0022] like Figures 1 to 3 As shown, the rotating dual-point source evaporation device with a stable coating rate of the utility model comprises an evaporation chamber 11, a rotating mechanism 12 located at the lower part of the evaporation chamber 11, a plurality of evaporation point sources 14 rotating and uniformly distributed on the rotating mechanism 12, a carrier conveying mechanism 13 located at the upper part of the evaporation chamber 11, and a baffle 15 located between the rotating mechanism 12 and the carrier conveying mechanism 13. The carrier conveying mechanism 13 supports both sides of the carrier 2 so that the lower surface of the carrier 2 is exposed. The baffle 15 is provided with two evaporation holes 151 for the two evaporation point sources 14 to evaporate upward respectively. The two evaporation holes 151 are both mirror-symmetrical with the conveying center plane of the carrier 2 as the symmetry plane and centrally symmetrical with the center point of the rotating mechanism as the center of the circle. The evaporation holes 151 are located at the evaporation position. The baffle 15 is also provided with two preheating positions, each of which is located at a position with an angle of 180° / n between the evaporation positions.

[0023] In this embodiment, there are four pairs of evaporation point sources 14, which are divided into Group A, Group B, Group C and Group D. The two evaporation point sources 14 in each group are centrally symmetrically arranged on the rotating mechanism 12. A certain amount of evaporation material is placed in the evaporation point source 14. The evaporation point source 14 at the evaporation position can heat and melt the evaporation material (codenamed A in the figure, i.e. Group A), and then evaporate it into a gaseous state. The gaseous evaporation material passes through the evaporation hole 151 to reach the lower surface of the carrier 2. The evaporation material and amount in each group of evaporation point sources 14 are the same, but the order is different. The carrier conveying mechanism 13 can drive the carrier 2 to move back and forth in the upper part of the evaporation chamber 11, and the symmetry plane of the carrier 2 is always maintained in a position coplanar with the axis of the rotating mechanism 12, so that the thickness of the evaporation is uniform. The evaporation material in each evaporation point source 14 will not be completely evaporated, because the remaining depth of the evaporation material decreases during the evaporation process, so the stability of evaporation is not good. At this time, it is necessary to switch the evaporation point source 14 (codenamed B in the figure, i.e., group B) in the preheating position to the evaporation position. The two evaporation materials codenamed B will be preheated in advance before the change. Taking the specific working conditions as an example, if the evaporation time is 40 hours, the evaporation material codenamed B will be heated at the 39th hour of evaporation. After the evaporation material of group A is used up, the evaporation material of group B has also reached the boiling point. By analogy, when the evaporation of group B is about to end, group C starts preheating; when the evaporation of group C is about to end, group D starts preheating. Therefore, after the previous pair of evaporation point sources 14 reaches the preset evaporation time, the next pair of evaporation point sources 14 are seamlessly switched, so that the replacement of the evaporation point source 14 does not affect the stability of the coating speed, ensuring the evaporation quality. Because in this technical solution, one group of evaporation point sources 14 must be in the evaporation position and the other group of evaporation point sources 14 must be in the preheating position, so the number of evaporation point sources 14 here is 2n, where n is a positive integer not less than 2. The number of evaporation point sources 14 can be increased while ensuring that the evaporation point sources 14 do not crosstalk with each other. This device can preheat the next pair of evaporation point sources in advance when a pair of evaporation point sources is about to reach the end of use, so that the next pair of evaporation point sources can be seamlessly switched after the previous pair of evaporation point sources are used up, so that the replacement of the evaporation point sources does not affect the stability of the coating speed, ensuring the evaporation quality.

[0024] like Figure 1 As shown, the baffle 15 is provided with an outwardly inclined evaporation guide tube 152 at the preheating position, and a film thickness detection probe 17 is provided in the evaporation chamber 152 at a position directly opposite to the outlet of the evaporation guide tube 152 , and the outlet of the evaporation guide tube 152 is not facing the carrier 2 .

[0025] In order to control the evaporation rate of the preheated evaporation material to be stable, it is necessary to use the evaporation guide tube 152 to detect the evaporation material evaporated from the preheating position using the film thickness detection probe 17, so that the evaporation efficiency of each group of evaporation materials is consistent when entering the evaporation position.

[0026] like Figure 4As shown, each evaporation point source 14 is provided with a heating mechanism 141 , and the working states of all heating mechanisms 141 are controlled by a timing controller 16 .

[0027] In order to prevent the preheating from being delayed for too long and wasting heat energy, the timing controller 16 can control the temperature of the evaporation material more accurately. For example, starting from the 39th hour of evaporation, the evaporation material is first heated to the intermediate temperature and kept at a constant temperature. This intermediate temperature is lower than the evaporation temperature of the material, ensuring uniform temperature without wasting raw materials; after 39.5 hours of evaporation, the evaporation material continues to be heated to the evaporation temperature, at which time evaporation will begin. After the evaporation rate measured with a small amount of material reaches the standard and reaches the preset 40 hours of evaporation, the evaporation point source 14 can be replaced.

[0028] The above are only some embodiments of the present invention. For those skilled in the art, several modifications and improvements can be made without departing from the inventive concept of the present invention, which all belong to the protection scope of the present invention.

Claims

1. A rotating dual-point source evaporation device, comprising an evaporation chamber, a rotating mechanism located at the bottom of the evaporation chamber, a plurality of evaporation point sources that are evenly distributed on the rotating mechanism, a carrier conveying mechanism located at the top of the evaporation chamber, and a baffle located between the rotating mechanism and the carrier conveying mechanism, wherein the carrier conveying mechanism supports both sides of the carrier so that the lower surface of the carrier is exposed, characterized in that: The number of the evaporation point sources is 2n, where n is a positive integer not less than 2. The baffle is provided with two evaporation holes for two evaporation point sources to evaporate upward respectively. The two evaporation holes are both mirror-symmetrical with the conveying center plane of the carrier plate as the symmetry plane and centrally symmetrical with the center point of the rotating mechanism as the center of the circle. The evaporation holes are located at the evaporation position. The baffle is also provided with two preheating positions, each of which is located at a position with an angle of 180° / n between the evaporation positions.

2. The rotating dual-point source evaporation device according to claim 1, characterized in that: The baffle is provided with an outwardly inclined evaporation guide tube at the preheating position, and a film thickness detection probe is provided in the evaporation chamber at a position directly opposite to the outlet of the evaporation guide tube, and the outlet of the evaporation guide tube does not face the carrier plate.

3. The rotating dual-point source evaporation device according to claim 2, characterized in that: A heating mechanism is arranged in each evaporation point source, and the working states of all heating mechanisms are controlled by a timing controller.

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