Aluminum alloy etching treatment device for antenna oscillator processing

Abstract

The utility model discloses an aluminum alloy etching treatment device for antenna oscillator processing, which comprises an etching tank, one side of the etching tank is connected with a standing assembly, and the standing assembly comprises a standing tank and a mesh enclosure plate; the standing assembly is arranged at one end of the etching tank, after parts in the etching tank are taken out, the parts can be directly placed on the surface of a mesh enclosure plate in the standing assembly for standing, residual solvent can automatically flow down, meanwhile, through the designed supporting assembly, the standing assembly can be supported, and the etching efficiency is improved. The high-pressure spray head on the back plate can spray water mist to wash the solvent, under the action of the structure, the residual solvent can be cleaned, and the etching treatment device has the advantages that a structure capable of treating the solvent is directly arranged on one side of the etching tank, so that the etching treatment device has a solvent treatment function, and the service life of the etching tank is prolonged. No extra cleaning structure needs to be arranged, and the problem of solvent dripping caused by accessory transferring is solved.

Description

Technical Field

[0001] The utility model belongs to the technical field of antenna accessory processing, and in particular relates to an aluminum alloy etching processing device for antenna vibrator processing. Background Art

[0002] The vibrator is one of the essential parts of the antenna. During the processing of the vibrator, it needs to be treated with aluminum alloy etching. The so-called etching refers to the process of removing metal oxides from the surface of electroplated parts. Etching includes general etching and weak etching. General etching can remove the oxide scale and rust on the surface of metal parts. Weak etching can remove the thin oxide film produced in the pretreatment. Etching is the last process before electroplating. When the vibrator is subjected to aluminum alloy etching, the vibrator needs to be immersed in a special etching tank to complete the etching treatment.

[0003] The etching tank is filled with a special solvent for etching. After the vibrator is taken out of the etching tank, a certain amount of solvent will inevitably remain on its surface. Most of these solvents are corrosive. Therefore, after etching, the solvent needs to be cleaned. The existing cleaning structure is mostly used for cleaning, but this design has certain shortcomings. First, the additional cleaning structure is not only costly, but also needs to consider the compatibility with the etching device. Secondly, in the process of transferring the vibrator from the etching tank to the cleaning structure, the residual solvent is easy to drip down. Therefore, it is necessary to design a new etching processing device to solve this problem. Utility Model Content

[0004] The utility model aims to provide an aluminum alloy etching treatment device for antenna vibrator processing, so as to solve the problem that the existing etching device mentioned in the background technology is inconvenient to clean the residual solvent on the vibrator surface.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an aluminum alloy etching treatment device for antenna vibrator processing, comprising an etching tank, a stationary component connected to one side of the etching tank, the stationary component comprising a stationary tank and a mesh cover plate, the end of the stationary tank is connected to the etching tank, the mesh cover plate is arranged inside the stationary tank, the end of the stationary tank away from the etching tank is provided with a drain port, the bottom of the stationary component is provided with a support component, the support component comprises a support frame, a back plate and a high-pressure nozzle, the support frame is supported at the bottom of the stationary tank, the back plate is fixed to the rear end top of the support frame, and the high-pressure nozzle is distributed on the back plate and faces the inside of the stationary tank.

[0006] Preferably, the stationary component further comprises a spacer, and a spacer is formed between the mesh cover plate and the bottom of the stationary tank.

[0007] Preferably, the support assembly further comprises a mounting hole, mounting plates are symmetrically fixed on both sides of the static groove, and the mounting hole and the mounting plate are fixedly connected by bolts.

[0008] Preferably, the support assembly further comprises a rubber pad, and the rubber pad is fixed on the top surface of the support frame.

[0009] Preferably, the support assembly further comprises a roller, and the roller is connected to the bottom of the support frame.

[0010] Preferably, a side notch is formed at one end of the etching tank facing the stationary component, and the side notch is consistent in height with the stationary component.

[0011] Preferably, a connecting assembly is provided between the end of the static tank and the surface of the etching tank, and the connecting assembly includes a threaded pile, a side block, a threaded connecting ring and a rotating handle, the side block is symmetrically fixed on both sides of one end of the static tank, the threaded pile is fixed on the surface of the etching tank and passes through the side block, the threaded connecting ring is threadedly connected to the threaded pile, and the rotating handle is symmetrically fixed on the surface of the threaded connecting ring.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] By arranging a stationary component at one end of the etching tank, after the components inside the etching tank are taken out, they can be directly placed on the surface of the mesh plate inside the stationary tank to stand, so that the residual solvent can flow down by itself. At the same time, the designed support component can not only support the stationary component, but also the high-pressure nozzle on the back plate can spray water mist to flush the solvent. Under the action of the above structure, the residual solvent can be cleaned. The advantage of this design is that a structure that can process the solvent is directly arranged on one side of the etching tank, so that the etching processing device has a solvent processing function, there is no need to be additionally equipped with a cleaning structure, and there will be no problem of solvent dripping due to the transfer of accessories. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a three-dimensional schematic diagram of the utility model;

[0015] Figure 2 It is a side sectional view of the stationary component of the utility model;

[0016] Figure 3 It is a three-dimensional schematic diagram of the support assembly of the utility model;

[0017] Figure 4 It is a top cross-sectional view of the connection assembly of the utility model;

[0018] In the figure: 100, etching tank; 200, static assembly; 201, static tank; 202, mesh cover plate; 203, interval; 300, drain port; 400, support assembly; 401, support frame; 402, back plate; 403, high-pressure nozzle; 404, mounting hole; 405, rubber pad; 406, roller; 500, side notch; 600, connection assembly; 601, threaded pile; 602, side block; 603, threaded connection ring; 604, rotary handle. DETAILED DESCRIPTION

[0019] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0020] Example

[0021] See also Figures 1 to 4 , is an embodiment of the utility model, and this embodiment provides a technical solution: an aluminum alloy etching treatment device for antenna vibrator processing, including an etching tank 100, a stationary component 200 is connected to one side of the etching tank 100, and the stationary component 200 includes a stationary tank 201 and a mesh plate 202. The end of the stationary tank 201 is connected to the etching tank 100, and the mesh plate 202 is arranged inside the stationary tank 201. After the accessories are taken out of the inside of the etching tank 100, they can be placed on the surface of the mesh plate 202 for standing, so that the solvent can stand and flow down. The end of the stationary tank 201 away from the etching tank 100 is provided with a drain port 300 for discharging waste liquid. The bottom of the stationary component 200 is provided with a support component 400, and the support component 400 includes a support frame 401, a back plate 402 and a high The high-pressure nozzle 403 and the support frame 401 are supported at the bottom of the static tank 201 to support the etching tank 100. The back plate 402 is fixed to the top of the rear end of the support frame 401. The high-pressure nozzle 403 is distributed on the back plate 402 and faces the inside of the static tank 201. The high-pressure nozzle 403 can be connected to an external water pipe to spray water mist and rinse the solvent on the accessories. The static component 200 also includes a spacer 203. The spacer 203 is formed between the mesh plate 202 and the bottom of the static tank 201 for the solvent and the cleaning liquid to flow down and converge. The support component 400 also includes a mounting hole 404. The mounting plates are symmetrically fixed on both sides of the static tank 201. The mounting hole 404 and the mounting plate are fixedly connected by bolts to complete the fixed connection between the etching tank 100 and the support frame 401.

[0022] In this embodiment, preferably, the support assembly 400 further includes a rubber pad 405 , and the rubber pad 405 is fixed on the top surface of the support frame 401 to play a supporting and buffering role.

[0023] In this embodiment, preferably, the support component 400 also includes a roller 406, which is connected to the bottom of the support frame 401. After the static tank 201 is fixed on the support frame 401, the roller 406 can be used to push the support frame 401 to allow the end of the static tank 201 to be connected to the etching tank 100. The etching tank 100 is provided with a side notch 500 at one end facing the static component 200. The side notch 500 is consistent in height with the static component 200, which makes it easy to take the accessories out of the etching tank 100 and place them inside the static tank 201.

[0024] In this embodiment, preferably, a connecting assembly 600 is provided between the end of the static tank 201 and the surface of the etching tank 100, which can complete the fixed connection between the static tank 201 and the etching tank 100. The connecting assembly 600 includes a threaded pile 601, a side block 602, a threaded connection ring 603 and a rotary handle 604. The side block 602 is symmetrically fixed on both sides of one end of the static tank 201. The threaded pile 601 is fixed on the surface of the etching tank 100 and passes through the side block 602 to complete the positioning connection between the static tank 201 and the etching tank 100. The threaded connection ring 603 is threadedly connected to the threaded pile 601, and the threaded connection ring 603 can be tightened to fix the etching tank 100 and the static tank 201. The rotary handle 604 is symmetrically fixed on the surface of the threaded connection ring 603 to facilitate the screwing of the threaded connection ring 603.

[0025] Although the embodiments of the present invention have been shown and described (see the above detailed description for details), it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An aluminum alloy etching treatment device for antenna oscillator processing, comprising an etching tank (100), characterized in that: A stationary component (200) is connected to one side of the etching tank (100), the stationary component (200) comprising a stationary tank (201) and a screen plate (202), the end of the stationary tank (201) being connected to the etching tank (100), the screen plate (202) being arranged inside the stationary tank (201), the end of the stationary tank (201) being away from the etching tank (100) being provided with a liquid discharge port (300), and the stationary component ( A support assembly (400) is provided at the bottom of the static tank (200), and the support assembly (400) includes a support frame (401), a back plate (402) and a high-pressure nozzle (403), the support frame (401) is supported at the bottom of the static tank (201), the back plate (402) is fixed to the top of the rear end of the support frame (401), and the high-pressure nozzle (403) is distributed on the back plate (402) and faces the inside of the static tank (201).

2. The aluminum alloy etching treatment device for antenna vibrator processing according to claim 1 is characterized in that: The stationary component (200) further comprises a spacer (203), and the spacer (203) is formed between the mesh cover plate (202) and the bottom of the stationary tank (201).

3. The aluminum alloy etching treatment device for antenna vibrator processing according to claim 1 is characterized in that: The support assembly (400) further comprises a mounting hole (404), and mounting plates are symmetrically fixed on both sides of the static groove (201), and the mounting hole (404) and the mounting plate are fixedly connected by bolts.

4. The aluminum alloy etching treatment device for antenna vibrator processing according to claim 1, characterized in that: The support assembly (400) further comprises a rubber pad (405), wherein the rubber pad (405) is fixed on the top surface of the support frame (401).

5. The aluminum alloy etching treatment device for antenna vibrator processing according to claim 1, characterized in that: The support assembly (400) further comprises a roller (406), wherein the roller (406) is connected to the bottom of the support frame (401).

6. The aluminum alloy etching treatment device for antenna vibrator processing according to claim 1, characterized in that: A side notch (500) is provided at one end of the etching tank (100) facing the stationary component (200), and the side notch (500) is at the same height as the stationary component (200).

7. The aluminum alloy etching treatment device for antenna vibrator processing according to claim 1 is characterized in that: A connection assembly (600) is provided between the end of the static tank (201) and the surface of the etching tank (100), and the connection assembly (600) comprises a threaded pile (601), a side block (602), a threaded connection ring (603) and a rotary handle (604), wherein the side block (602) is symmetrically fixed on both sides of one end of the static tank (201), the threaded pile (601) is fixed on the surface of the etching tank (100) and passes through the side block (602), the threaded connection ring (603) is threadedly connected to the threaded pile (601), and the rotary handle (604) is symmetrically fixed on the surface of the threaded connection ring (603).

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