Air blocking flashboard mechanism for silicon wafer cleaning equipment

Abstract

The utility model belongs to the technical field of liquid conveying, and relates to an air blocking flashboard mechanism for silicon wafer cleaning equipment, which comprises a power unit, an air blocking flashboard and a guide mechanism, the power unit comprises a servo motor, a linear module and a connecting plate, the servo motor provides power for the linear module, and the linear module drives the connecting plate to vertically ascend and descend; the air blocking gate plate is connected with the connecting plate; the guide mechanism comprises a guide sliding groove and a shell located outside the guide sliding groove, the guide sliding groove and the power unit are located on the two opposite sides of the gate plate, and the side edge of the gate plate moves up and down under the guide of the guide sliding groove. The length direction of the linear module in the mechanism is consistent with the moving direction of the gas blocking gate plate, so that the linear module only occupies a small width of the side of the gas blocking gate plate, and excessive occupation of the side space of a channel of the silicon wafer cleaning equipment is avoided.

Description

Technical Field

[0001] The utility model relates to the technical field of liquid transportation, in particular to an air damper mechanism for silicon wafer cleaning equipment. Background Art

[0002] With the rapid development of solar silicon wafer cell technology, the demand for heterojunction cells is increasing, and the requirements for cleaning technology of heterojunction cells are getting higher and higher. In the process of cleaning cells, it is inevitable that there will be gas cross-talk between process tanks, and the cross-talk of acid and alkaline gases in the process tank will affect the cleaning process of the cell, resulting in the cleanliness and yield of the cell cleaning not meeting the standards.

[0003] In the current heterojunction battery cleaning equipment, the industry mostly uses PP roller curtains for retracting and extending air blocks or PVC transverse partitions for air blocks; when using PP roller curtains, the entire mechanism is a flexible mechanism, which is limited by the PP cloth, resulting in an inability to seal the corners, and the original standard frame needs to be modified, resulting in an increase in the types of frames and an increase in the workload of drawings; when using PVC transverse partitions, the problem of corner sealing is solved, but modifications are still required to the standard frame, increasing the types of frames, and the workload of drawings has not been reduced.

[0004] Chinese patent CN206844067U discloses a self-sealing gate, in which the power mechanism is a cylinder located in the opening and closing direction of the gate mechanism, which occupies a large space on one side of the gate and is not conducive to the layout of the equipment.

[0005] Therefore be necessary to improve the air damper mechanism to solve the above problems. Utility Model Content

[0006] The main purpose of the utility model is to provide an air damper mechanism for silicon wafer cleaning equipment, which can reduce the space occupied by a driving mechanism in one direction of the silicon wafer cleaning equipment.

[0007] The utility model achieves the above-mentioned purpose through the following technical scheme: an air damper mechanism for silicon wafer cleaning equipment, comprising a power unit, an air damper and a guide mechanism; the power unit comprises a servo motor, a linear module and a connecting plate, the servo motor provides power for the linear module, and the linear module drives the connecting plate to rise and fall vertically; the air damper is connected to the connecting plate; the guide mechanism comprises a guide slot and a shell located outside the guide slot, the guide slot and the power unit are located on opposite sides of the gate plate, and the side of the gate plate moves up and down under the guidance of the guide slot.

[0008] Specifically, the air damper comprises a damper plate and a cantilever, the cantilever is in a strip shape, one end of the cantilever is fixed to the connecting plate, and the front side of the cantilever is connected to the damper plate by a plurality of screws.

[0009] Specifically, it also includes an installation shell, which includes a protective shell and a window plate arranged on one side of the protective shell, the power unit is located in the protective shell, the air damper is located outside the window plate, and the fixed baffle is connected between the lower part of the protective shell and the lower part of the outer shell and keeps close contact with one side of the damper.

[0010] Furthermore, the sealing strip is fixed on the mounting shell, and the length direction of the sealing strip is parallel to the moving direction of the air damper plate; when there is a pressure difference between the two sides of the air damper plate, the air damper plate and the mounting shell clamp the sealing strip to achieve a sealing effect.

[0011] The beneficial effects of the technical solution of the utility model are:

[0012] The length direction of the linear module in this equipment is consistent with the moving direction of the air damper, so the linear module only occupies a small width on the side of the air damper, avoiding excessive occupation of the side space of the silicon wafer cleaning equipment channel. The servo motor can control the driving direction of the linear module to realize the opening and closing of the air damper. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 A three-dimensional diagram of a silicon wafer cleaning device with an air damper mechanism closed;

[0014] Figure 2 A three-dimensional view of the air damper mechanism of the silicon wafer cleaning equipment when it is opened.

[0015] The numbers in the figure represent:

[0016] 1-installation housing, 11-protection housing, 12-window plate;

[0017] 2-power unit, 21-servo motor, 22-linear module, 23-connecting plate;

[0018] 3- air damper plate, 31- damper plate, 32- screw;

[0019] 4-guiding mechanism, 41-guiding chute, 42-housing;

[0020] 5- Sealing strip;

[0021] 6-Fix the baffle. DETAILED DESCRIPTION

[0022] The utility model is further described in detail below in conjunction with specific embodiments.

[0023] Example:

[0024] like Figure 1 and Figure 2As shown, the air damper mechanism for silicon wafer cleaning equipment of the utility model comprises a mounting housing 1, a power unit 2, an air damper 3, a guide mechanism 4, a sealing strip 5 and a fixed baffle 6.

[0025] like Figure 1 and Figure 2 As shown, the mounting housing 1 includes a protective shell 11 and a window plate 12 arranged on one side of the protective shell 11 .

[0026] The mounting housing 1 can protect the power unit 2 and serve as a fixing base for fixing the baffle 6. The window plate 12 is used for connecting the power unit 2 and the air damper plate 3.

[0027] like Figure 1 and Figure 2 As shown, the power unit 2 is located in the protective shell 11 and includes a servo motor 21, a linear module 22 and a connecting plate 23. The servo motor 21 provides power for the linear module 22, and the linear module 22 drives the connecting plate 23 to rise and fall vertically.

[0028] The length direction of the linear module 22 is consistent with the moving direction of the air damper 3, so the linear module 22 only occupies a small width on the side of the air damper 3, avoiding excessive occupation of the side space of the silicon wafer cleaning equipment channel. The servo motor 21 can control the driving direction of the linear module 22, thereby realizing the opening and closing of the air damper 3.

[0029] like Figure 1 and Figure 2 As shown, the air damper 3 is located outside the window plate 12 and connected to the connecting plate 23, including a damper 31 and a cantilever (not exposed). The cantilever is strip-shaped, one end of the cantilever is fixed to the connecting plate 23, and the front side of the cantilever is connected to the damper 31 by a plurality of screws 32.

[0030] The length direction of the cantilever 32 is perpendicular to the movement direction of the gate plate 31 and is fixed to the gate plate 31 with multiple screws. When transmitting the power of the power unit 2 to the gate plate 31, the rigidity of the gate plate 31 structure can be maintained to avoid deformation and poor sealing.

[0031] like Figure 1 and Figure 2 As shown, the guide mechanism 4 includes a guide slot 41 and a shell 42 located outside the guide slot 41 . The guide slot 41 and the power unit 2 are located on opposite sides of the gate plate 31 . The side of the gate plate 31 moves up and down under the guidance of the guide slot 41 .

[0032] One side of the gate plate 31 maintains a linear lifting motion under the drive of the power unit 2, and the other side moves under the limit of the guide slot 41, thereby maintaining the vertical state of the gate plate 31. When there is a pressure difference between the inside and outside of the gate plate 31, the edge of the gate plate 31 is pressed against the inside of the guide slot 41, thereby producing a sealing effect.

[0033] like Figure 1 and Figure 2 As shown, the sealing strip 5 is fixed on the mounting shell 1, and the length direction of the sealing strip 5 is parallel to the moving direction of the air damper plate 3; when there is a pressure difference between the two sides of the air damper plate 3, the air damper plate 3 and the mounting shell 1 clamp the sealing strip 5 to achieve a sealing effect.

[0034] When the silicon wafer cleaning device is working, the sealing strip 5 prevents the inside and outside of the chamber from being connected, thereby preventing acid and alkali gases from entering the protective shell 11 during cleaning and corroding the components in the power unit 2.

[0035] like Figure 1 and Figure 2 As shown, the fixed baffle 6 is connected between the lower portion of the protective shell 11 and the lower portion of the outer shell 42 and is kept in close contact with one side of the gate plate 31 .

[0036] The fixed baffle 6 will block the lower half of the device channel. The greater the distance between the gate plate 31 and the fixed baffle 6, the smaller the device channel will be until it is completely closed. Conversely, the more the gate plate 31 overlaps with the fixed baffle 6, the larger the device channel will be.

[0037] The above are only some embodiments of the present invention. For those skilled in the art, several modifications and improvements can be made without departing from the inventive concept of the present invention, which all belong to the protection scope of the present invention.

Claims

1. An air damper mechanism for a silicon wafer cleaning device, comprising a power unit, an air damper and a guide mechanism; characterized in that: The power unit includes a servo motor, a linear module and a connecting plate, the servo motor provides power for the linear module, and the linear module drives the connecting plate to rise and fall vertically; the air damper is connected to the connecting plate; the guide mechanism includes a guide slot and a shell located outside the guide slot, the guide slot and the power unit are located on opposite sides of the gate plate, and the side edges of the gate plate move up and down under the guidance of the guide slot.

2. The air damper mechanism for silicon wafer cleaning equipment according to claim 1, characterized in that: The air damper comprises a damper plate and a cantilever, wherein the cantilever is in a strip shape, one end of the cantilever is fixed to the connecting plate, and the front side of the cantilever is connected to the damper plate via a plurality of screws.

3. The air damper mechanism for silicon wafer cleaning equipment according to claim 1, characterized in that: It also includes an installation shell and a fixed baffle, the installation shell includes a protective shell and a window plate arranged on one side of the protective shell, the power unit is located in the protective shell, the air damper is located outside the window plate, and the fixed baffle is connected between the lower part of the protective shell and the lower part of the outer shell and keeps close contact with one side of the damper.

4. The air damper mechanism for silicon wafer cleaning equipment according to claim 3, characterized in that: It also includes a sealing strip, which is fixed on the mounting shell, and the length direction of the sealing strip is parallel to the moving direction of the air damper plate; when there is a pressure difference between the two sides of the air damper plate, the air damper plate and the mounting shell clamp the sealing strip to achieve a sealing effect.

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