Mixed tail gas separation equipment and semiconductor process system

Abstract

The utility model relates to mixed tail gas separation equipment and a semiconductor process system. The mixed tail gas separation equipment comprises a condensation part, a first gas filtering part and a second gas filtering part, the device has the advantages that the condensation part is communicated with the upstream semiconductor process equipment, the condensation part can liquefy gaseous trichlorosilane / gaseous dichlorosilane in the mixed gas, trichlorosilane / dichlorosilane in the mixed gas is removed, and the gas purity is improved; the first gas filtering part is communicated with the condensing part, and the first gas filtering part can remove PH3 gas / B2H6 gas / GeH4 gas in condensed gas, so that the gas purity is improved; the first gas filtering part is communicated with the second gas filtering part, the second gas filtering part can remove acid gas in the first filtered gas, H2 with the purity of 2N-4N is obtained, the purity of hydrogen is improved, and therefore operation of the follow-up process is facilitated.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor process gas treatment, in particular to mixed tail gas separation equipment and a semiconductor process system. Background Art

[0002] The most widely used and largest amount of gas in semiconductor technology is hydrogen. This system is a recovery system for H2 tail gas in semiconductors. At present, in the production of semiconductor processes, the residual gases after these processes come out of the clean room through the vacuum tube, and need to be treated by tail gas treatment equipment through combustion or water washing, condensation, adsorption and other methods before being discharged into the central exhaust gas treatment system. This treatment method causes great waste.

[0003] At present, the most common way for semiconductor factories to treat hydrogen is to directly discharge it into the atmosphere after burning and washing. However, the existing hydrogen treatment method of direct combustion will cause a huge waste of hydrogen; in addition, the tail gas of semiconductor factories is a mixed tail gas, which also contains other toxic, harmful and highly corrosive gases, and the combustion method will pollute the environment; in addition, in the process of direct combustion of the mixed tail gas, if the concentration of hydrogen in the mixed tail gas is not well controlled, an explosion may occur, posing a safety hazard.

[0004] Currently, no effective solution has been proposed to address the problems of hydrogen waste, environmental pollution, and safety hazards caused by the mixed tail gas treatment methods existing in related technologies. Utility Model Content

[0005] The purpose of the utility model is to provide a mixed tail gas separation device and a semiconductor process system to address the deficiencies in the prior art, so as to solve the problems of hydrogen waste, environmental pollution and potential safety hazards caused by the mixed tail gas treatment method existing in the related technology.

[0006] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0007] In a first aspect, the utility model provides a mixed tail gas separation device, comprising:

[0008] A condensation component, the condensation component is connected to an upstream semiconductor process device and is used to condense the mixed gas to remove dichlorosilane and / or trichlorosilane to obtain a condensed gas;

[0009] a first gas filtering component, the first gas filtering component being in communication with the condensing component and being located downstream of the condensing component, and being used for filtering the condensed gas to remove phosphine and / or diborane and / or germanium hydride to obtain filtered gas;

[0010] The second gas filter component is communicated with the first gas filter component and is located downstream of the first gas filter component, and is used for filtering the filtered gas to remove acidic gas to obtain H2 with a purity of 2N to 4N.

[0011] In some of the embodiments, it also includes:

[0012] A gas analysis component is connected to the first gas filter component and the second gas filter component respectively, and is used to detect whether the first filtered gas, the second filtered gas, and the third filtered gas meet the standards.

[0013] In some of the embodiments, it also includes:

[0014] A purge component is connected to the condensation component, the first gas filter component and the second gas filter component respectively, and is used to purge the condensation component, the first gas filter component and the second gas filter component.

[0015] In some of the embodiments, it also includes:

[0016] A vacuum component is connected to the condensation component, the first gas filter component and the second gas filter component respectively, and is used to discharge the gas inside the condensation component, the first gas filter component and the second gas filter component.

[0017] In some of the embodiments, it also includes:

[0018] A pressure relief component is connected to the condensation component, the first gas filter component and the second gas filter component respectively, and is used to relieve pressure on the condensation component, the first gas filter component and the second gas filter component.

[0019] In a second aspect, the utility model further provides a semiconductor process system, comprising:

[0020] The mixed tail gas separation equipment as described in the first aspect.

[0021] The utility model adopts the above technical solution, and compared with the prior art, has the following technical effects:

[0022] The utility model discloses a mixed tail gas separation device and a semiconductor process system. By connecting a condensation component with an upstream semiconductor process device, the condensation component can liquefy gaseous trichlorosilane / gaseous dichlorosilane in the mixed gas, thereby removing the trichlorosilane / dichlorosilane in the mixed gas and improving the gas purity; by connecting a first gas filter component with the condensation component, the first gas filter component can remove PH3 gas / B2H6 gas / GeH4 gas in the condensed gas and improve the gas purity; by connecting the first gas filter component with the second gas filter component, the second gas filter component can remove acidic gas in the first filtered gas and obtain H2 with a purity of 2N to 4N, thereby improving the purity of hydrogen and facilitating the operation of subsequent processes. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 is a schematic diagram of a mixed tail gas separation device according to an embodiment of the utility model (I);

[0024] Figure 2 is a schematic diagram of a condensing component, a first gas filtering component and a second gas filtering component according to an embodiment of the utility model (I);

[0025] Figure 3 is a schematic diagram of a condensing component according to an embodiment of the utility model (II);

[0026] Figure 4 is a schematic diagram of a first gas filter component according to an embodiment of the utility model (II);

[0027] Figure 5 is a schematic diagram of a first gas filter component according to an embodiment of the utility model (III);

[0028] Figure 6 is a schematic diagram of a mixed tail gas separation device according to an embodiment of the utility model (II);

[0029] Figure 7 It is a schematic diagram of a gas analysis component, a purge component, a vacuum component and a pressure relief component according to an embodiment of the utility model;

[0030] Figure 8 It is a schematic diagram of a specific implementation of the mixed tail gas separation device according to an embodiment of the utility model.

[0031] The accompanying drawings are marked as follows: 100, condensation component; 110, first condensation component; 120, first liquid storage component; 130, first valve body; 140, second valve body; 150, second condensation component; 160, second liquid storage component; 170, third valve body; 200, first gas filter component; 210, first filter component; 220, fourth valve body; 230, third monitoring component; 240, second filter component; 250, fifth valve body; 260, fourth monitoring component; 270, third filter component; 280, sixth valve body; 290, fifth monitoring component; 300, second gas filter component; 310, first filter component; 320, fourth filter component; 330, fifth monitoring component; 340, second filter component; 350, fifth valve body; 360, fourth monitoring component; 370, third filter component; 380, sixth valve body; 390, fifth monitoring component; 400, second gas filter component; 410, first filter component; 420, third filter component; 430, fifth monitoring component; 440, second filter component; 450, fifth valve body; 460, fourth monitoring component; 470, third filter component; 480, sixth valve body; 490, fifth monitoring component; 400, second gas filter component; 411, first filter component; 421, first filter component; 432, fourth monitoring component; 440, second filter component; 450, fifth valve body; 460, fourth monitoring component; 470, third filter component; 480, sixth valve body; 490, fifth monitoring component; 400, second gas filter component; 4 body filter component; 310, the fourth filter component; 320, the seventh valve body; 330, the sixth monitoring component; 400, the gas analysis component; 410, the first gas analysis component; 420, the second gas analysis component; 430, the third gas analysis component; 500, the purge component; 510, the purge component; 520, the ninth valve body; 530, the seventh monitoring component; 600, the vacuum component; 610, the vacuum component; 620, the tenth valve body; 630, the eighth monitoring component; 700, the pressure relief component; 710, the first pressure relief component; 720, the second pressure relief component; 730, the third pressure relief component. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is described and illustrated below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0033] Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. In addition, it can also be understood that although the efforts made in this development process may be complicated and lengthy, for ordinary technicians in this field related to the content disclosed in this application, some changes in design, manufacturing or production based on the technical content disclosed in this application are just conventional technical means, and should not be understood as insufficient content disclosed in this application.

[0034] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those of ordinary skill in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0035] Unless otherwise defined, the technical terms or scientific terms involved in this application should be understood by people with ordinary skills in the technical field to which this application belongs. The words "one", "a", "a", "the" and the like involved in this application do not indicate a quantitative limitation, and may represent the singular or plural. The terms "include", "comprise", "have" and any of their variations involved in this application are intended to cover non-exclusive inclusions; for example, a process, method, system, product or device that includes a series of steps or modules (components) is not limited to the listed steps or components, but may also include steps or components that are not listed, or may also include other steps or components inherent to these processes, methods, products or devices. The words "connect", "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "multiple" involved in this application refers to two or more. "And / or" describes the association relationship of associated objects, indicating that there can be three relationships, for example, "A and / or B" can mean: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific ordering of the objects.

[0036] Example 1

[0037] This embodiment relates to the mixed tail gas separation equipment in the utility model.

[0038] like Figure 1 As shown, a mixed tail gas separation device includes a condensation component 100, a first gas filter component 200 and a second gas filter component 300. The condensation component 100 is connected to the upstream semiconductor process equipment, and is used to condense the mixed gas to remove dichlorosilane and / or trichlorosilane to obtain condensed gas; the first gas filter component 200 is connected to the condensation component 100 and is located downstream of the condensation component 100, and is used to filter the condensed gas to remove phosphine and / or diborane and / or germanium hydride to obtain filtered gas; the second gas filter component 300 is connected to the first gas filter component 200 and is located downstream of the first gas filter component 200, and is used to filter the filtered gas to remove acidic gas to obtain H2 with a purity of 2N to 4N.

[0039] like Figure 2As shown, the condensation component 100 includes a first condensation component 110 and a first liquid storage component 120. The first condensation component 110 is respectively connected to the upstream semiconductor process equipment and the first gas filter component 200, and is located downstream of the upstream semiconductor process equipment and upstream of the first gas filter component 200, and is used to condense the mixed gas to remove trichlorosilane to obtain the first condensed gas, and to transport the first condensed gas to the first gas filter component 200; the first liquid storage component 120 is connected to the first condensation component 110 and the waste liquid treatment equipment, and is used to store trichlorosilane.

[0040] Specifically, the first condensation member 110 includes a first condenser, a first condensation pipeline, a second condensation pipeline, a third condensation pipeline, a first water bath, a first water bath pipeline and a second water bath pipeline. The first end of the first condensation pipeline is connected to the upstream semiconductor process equipment, and the second end of the first condensation pipeline is connected to the condenser for conveying the mixed gas; the first end of the second condensation pipeline is connected to the first condenser, and the second end of the second condensation pipeline is connected to the first liquid storage member 120 for conveying liquid trichlorosilane; the first end of the third condensation pipeline is connected to the first condenser, and the second end of the third condensation pipeline is connected to the first gas filter component 200 for conveying the first condensed gas; the first end of the first water bath pipeline is connected to the first water bath, and the second end of the first water bath pipeline is connected to the first condenser for conveying the coolant; the first end of the second water bath pipeline is connected to the first condenser, and the second end of the second water bath pipeline is connected to the first water bath for conveying the coolant.

[0041] More specifically, the first condenser includes a first condenser body, a first condensation port, a second condensation port, a third condensation port, a fourth condensation port, and a fifth condensation port. The first condensation port is formed in the first condenser body for communicating with the second end of the first condensation pipeline; the second condensation port is formed in the first condenser body for communicating with the first end of the second condensation pipeline; the third condensation port is formed in the first condenser body for communicating with the first end of the third condensation pipeline; the fourth condensation port and the fifth condensation port are formed in the first condenser body for communicating with the first water bath.

[0042] More specifically, the first water bath includes a first water bath body, a first water bath port, and a second water bath port. The first water bath port is formed in the first water bath body for communicating with the first water bath pipeline; the second water bath port is formed in the first water bath body for communicating with the second water bath pipeline.

[0043] More specifically, the first end of the first water bath pipeline is communicated with the first water bath port of the first water bath body, and the second end of the first water bath pipeline is communicated with the fourth condensation port of the first condenser body.

[0044] More specifically, the first end of the second water bath pipeline is communicated with the fifth condensation port of the first condenser body, and the second end of the second water bath pipeline is communicated with the second water bath port of the first water bath body.

[0045] It should be noted that the temperature of the coolant in the first condenser body is 10° C. to 20° C. Preferably, the temperature of the coolant in the first condenser body is 15° C.

[0046] In some of the embodiments, the first condenser includes but is not limited to a water-cooled condenser; the first condensation pipeline includes but is not limited to a stainless steel pipe; the third condensation pipeline includes but is not limited to a stainless steel pipe; the first water bath includes but is not limited to a heat exchanger; the first water bath pipeline includes but is not limited to a stainless steel pipe; the second water bath pipeline includes but is not limited to a stainless steel pipe.

[0047] Specifically, the first liquid storage member 120 includes a first liquid storage tank, a first liquid storage pipeline, a second liquid storage pipeline and a first thermostat. The first end of the first liquid storage pipeline is connected to the second end of the second condensation pipeline, and the second end of the first liquid storage pipeline is connected to the first liquid storage tank for conveying liquid trichlorosilane; the first end of the second liquid storage pipeline is connected to the first liquid storage tank, and the second end of the second liquid storage pipeline is connected to the waste liquid treatment equipment for conveying liquid trichlorosilane; the cooling coil of the first thermostat is coiled on the outer wall of the first liquid storage tank, and the temperature inside the first liquid storage tank can be kept constant through heat exchange between the cooling coil and the first liquid storage tank.

[0048] It should be noted that there are at least two first liquid storage members 120 , and several first liquid storage members 120 are respectively connected to the first condensing member 110 .

[0049] In some embodiments, there are two first liquid storage members 120, and the two first liquid storage members 120 are respectively connected to the first condensing member 110. When the liquid level in one first liquid storage member 120 exceeds a preset threshold, the other first liquid storage member 120 may be switched.

[0050] More specifically, the first liquid storage tank includes a first liquid storage tank body, a first liquid storage port, a second liquid storage port, and a third liquid storage port. The first liquid storage port is formed in the first liquid storage tank body for communicating with the first liquid storage pipeline; the second liquid storage port is formed in the first liquid storage tank body for communicating with the second liquid storage pipeline; the third liquid storage port is formed in the first liquid storage tank body for communicating with the sensor.

[0051] In some of the embodiments, the first liquid storage tank includes but is not limited to a stainless steel tank; the first liquid storage pipeline includes but is not limited to a stainless steel pipe; the second liquid storage pipeline includes but is not limited to a stainless steel pipe; the first constant temperature component includes but is not limited to a constant temperature refrigerator compressor.

[0052] Furthermore, the condensing component 100 further includes a first valve body 130 and a second valve body 140. The first valve body 130 is disposed on a pipeline connecting the first condensing component 110 with upstream semiconductor process equipment and the first liquid storage component 120, and is used to control the flow of the pipeline; the second valve body 140 is disposed on a pipeline connecting the first liquid storage component 120 with the first condensing component 110 and the waste liquid treatment equipment, and is used to control the flow of the pipeline.

[0053] Specifically, the first valve body 130 includes a first regulating valve, a first non-return valve, a first pneumatic diaphragm valve, a first ball valve and a second ball valve. Among them, the first regulating valve is arranged in the first condensation pipeline, and is used to regulate the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation equipment to prevent excessive pressure from affecting the subsequent process; the first non-return valve is arranged in the first condensation pipeline, and is located downstream of the first regulating valve, and is used to prevent the gas inside the first condensation pipeline from backflow; the first pneumatic diaphragm valve is arranged in the first condensation pipeline, and is located downstream of the first filter, and is used to control the circulation of the first condensation pipeline; the first ball valve is arranged in the first condenser body, and is connected to the fourth condensation port, and is used to control the circulation between the first condenser body and the first water bath pipeline; the second ball valve is arranged in the first condenser body, and is connected to the fifth condensation port, and is used to control the circulation between the first condenser body and the second water bath pipeline.

[0054] Specifically, the second valve body 140 includes a second pneumatic diaphragm valve, a first manual diaphragm valve, a second manual diaphragm valve and a third manual diaphragm valve. The second pneumatic diaphragm valve is arranged on the first liquid storage pipeline to control the circulation of the first liquid storage pipeline; the first manual diaphragm valve is arranged on the top of the first liquid storage tank body and is connected to the first liquid storage port to control the circulation between the first liquid storage tank body and the first liquid storage pipeline; the second manual diaphragm valve is arranged on the top of the first liquid storage tank body and is connected to the third liquid storage port to control the circulation between the first liquid storage tank body and the sensor; the third manual diaphragm valve is arranged on the side wall at the bottom of the first liquid storage tank body and is connected to the second liquid storage port to control the circulation between the first liquid storage tank body and the second liquid storage pipeline.

[0055] Furthermore, the condensing component 100 further includes a first monitoring component, wherein the first monitoring component is in communication with the first liquid storage component 120 and is used to monitor the pressure, temperature and liquid level inside the first liquid storage component 120 .

[0056] Specifically, the first monitoring component includes a first pressure sensor, a first temperature sensor and a first liquid level sensor. The first pressure sensor is connected to the first liquid storage tank body through a pipeline and is located downstream of the second manual diaphragm valve, and is used to monitor the pressure inside the first liquid storage tank body; the first temperature sensor is arranged inside the first liquid storage tank body, and is used to monitor the temperature of the liquid inside the first liquid storage tank body; the first liquid level sensor is arranged inside the first liquid storage tank body, and is used to monitor the liquid level height inside the first liquid storage tank body.

[0057] Furthermore, the condensation component 100 further includes a first filter, wherein the first filter is disposed on the first condensation member 110 and is located downstream of the first valve body 130, and is used to filter particulate matter in the mixed gas.

[0058] Specifically, the first filter is arranged in the first condensation pipeline and is located downstream of the first one-way valve.

[0059] In some of these embodiments, the first filter includes, but is not limited to, a gas particulate filter.

[0060] like Figure 2 As shown, the first gas filter component 200 includes a first filter element 210. The first filter element 210 is communicated with the condensation component 100 and the second gas filter component 300 respectively, and is located downstream of the condensation component 100 and upstream of the second gas filter component 300, and is used to filter the condensed gas to remove phosphine to obtain the first filtered gas, and to transport the first filtered gas to the second gas filter component 300.

[0061] Specifically, the first filter element 210 includes a phosphine removal reactor, a first phosphine removal pipeline, a second phosphine removal pipeline, a third phosphine removal pipeline, a fourth phosphine removal pipeline and a temperature controller. The first end of the first phosphine removal pipeline is connected to the second end of the fifth condensation pipeline, and the second end of the first phosphine removal pipeline is connected to the phosphine removal reactor for conveying the second condensed gas; the first end of the second phosphine removal pipeline is connected to the phosphine removal reactor, and the second end of the second phosphine removal pipeline is connected to the acid gas removal unit for conveying the first filtered gas; the first end of the third phosphine removal pipeline is connected to the iron powder feeding device, and the second end of the third phosphine removal pipeline is connected to the phosphine removal reactor for conveying iron powder; the first end of the fourth phosphine removal pipeline is connected to the phosphine removal reactor, and the second end of the fourth phosphine removal pipeline is connected to the waste collection device; the temperature controller is arranged inside the phosphine removal reactor, and is used to control the temperature inside the phosphine removal reactor.

[0062] More specifically, the phosphine removal reactor comprises a phosphine removal reactor body, a first reactor port, a second reactor port, a third reactor port, a fourth reactor port and a fifth reactor port. The first reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the second end of the first phosphine removal pipeline; the second reactor port is formed at the bottom of the phosphine removal reactor body, and is used to communicate with the first end of the second phosphine removal pipeline; the third reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the second end of the third phosphine removal pipeline; the fourth reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the first end of the fourth phosphine removal pipeline; the fifth reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the sensor.

[0063] It should be noted that the PH3 gas in the second condensed gas flowing into the phosphine removal reactor can react with iron powder under high temperature conditions to generate solid FeP and hydrogen, thereby achieving the removal of the PH3 gas in the second condensed gas.

[0064] In some of the embodiments, the phosphine removal reactor includes but is not limited to a high-temperature reactor; the first phosphine removal pipeline includes but is not limited to a stainless steel pipe; the second phosphine removal pipeline includes but is not limited to a stainless steel pipe; the third phosphine removal pipeline includes but is not limited to a stainless steel pipe; the first end and the second end of the fourth phosphine removal pipeline are respectively the two ends in its length direction.

[0065] Furthermore, the first gas filter component 200 further includes a fourth valve body 220. The fourth valve body 220 is disposed on a pipeline connecting the first filter element 210, the condensation component 100 and the second gas filter component 300, and is used to control the flow of the pipeline.

[0066] Specifically, the fourth valve body 220 includes a fourth pneumatic diaphragm valve, a seventh manual diaphragm valve, a fifth pneumatic diaphragm valve, an eighth manual diaphragm valve, a fifth ball valve, and a sixth ball valve. Among them, the fourth pneumatic diaphragm valve is arranged on the first phosphine removal pipeline to control the circulation of the first phosphine removal pipeline; the seventh manual diaphragm valve is arranged on the phosphine removal reactor body and is connected to the first reactor port to control the circulation between the phosphine removal reactor body and the first phosphine removal pipeline; the fifth pneumatic diaphragm valve is arranged on the second phosphine removal pipeline to control the circulation of the second phosphine removal pipeline; the eighth manual diaphragm valve is arranged on the phosphine removal reactor body and is connected to the second reactor port to control the circulation between the phosphine removal reactor body and the second phosphine removal pipeline; the fifth ball valve is arranged on the phosphine removal reactor body and is connected to the third reactor port to control the circulation between the phosphine removal reactor body and the third phosphine removal pipeline; the sixth ball valve is arranged on the phosphine removal reactor body and is connected to the fourth reactor port to control the circulation between the phosphine removal reactor body and the fourth phosphine removal pipeline.

[0067] Furthermore, the first gas filter component 200 further includes a third monitoring component 230 . The third monitoring component 230 is communicated with the first filter component 210 and is used to monitor the temperature inside the first filter component 210 .

[0068] Specifically, the third monitoring component 230 includes a third temperature sensor, which is connected to the phosphine removal reactor body through a pipeline and is located on the top of the phosphine removal reactor body to monitor the temperature inside the phosphine removal reactor body.

[0069] like Figure 2 As shown, the second gas filter component 300 includes a fourth filter component 310. The fourth filter component 310 is connected to the first gas filter component 200, the downstream gas processing equipment, and the waste liquid processing equipment, and is located downstream of the first gas filter component 200 and upstream of the downstream gas processing equipment, and is used to filter the filtered gas to remove acidic gas to obtain H2 with a purity of 2N to 4N.

[0070] Specifically, the fourth filter element 310 includes a first reaction water tank, a first acid gas removal pipeline, a second acid gas removal pipeline, a third acid gas removal pipeline and a fourth acid gas removal pipeline. The first end of the first acid gas removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first acid gas removal pipeline is connected to the first reaction water tank for conveying the first filtered gas; the first end of the second acid gas removal pipeline is connected to the first reaction water tank, and the second end of the second acid gas removal pipeline is connected to the downstream gas treatment equipment for conveying H2 with a purity of 2N to 4N; the first end of the third acid gas removal pipeline is connected to the NaOH solution source, and the second end of the third acid gas removal pipeline is connected to the first reaction water tank; the first end of the fourth acid gas removal pipeline is connected to the first reaction water tank, and the second end of the fourth acid gas removal pipeline is connected to the waste liquid treatment equipment.

[0071] More specifically, the first reaction water tank includes a first reaction water tank body, a first reaction interface, a second reaction interface, a third reaction interface, a fourth reaction interface and a fifth reaction interface. The first reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the second end of the first acid gas removal pipeline; the second reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the first end of the second acid gas removal pipeline; the third reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the sensor; the fourth reaction interface is formed at the top of the side wall of the first reaction water tank body, and is used to communicate with the second end of the third acid gas removal pipeline; the fifth reaction interface is formed at the bottom of the side wall of the first reaction water tank body, and is used to communicate with the first end of the fourth acid gas removal pipeline.

[0072] It should be noted that the acidic gas in the first filtered gas flowing into the first reaction water tank can react with the NaOH solution inside the first reaction water tank at room temperature, that is, the NaOH solution can absorb the acidic gas in the first filtered gas to achieve the effect of removing the acidic gas in the first filtered gas.

[0073] In some of the embodiments, the first reaction water tank includes but is not limited to a stainless steel water tank; the first acid gas removal pipeline includes but is not limited to a stainless steel pipe; the second acid gas removal pipeline includes but is not limited to a stainless steel pipe; the third acid gas removal pipeline includes but is not limited to a stainless steel pipe; the fourth acid gas removal pipeline includes but is not limited to a stainless steel pipe.

[0074] Furthermore, the second gas filter component 300 further includes a seventh valve body 320. The seventh valve body 320 is disposed on a pipeline connecting the fourth filter element 310 with the first gas filter component 200 and the downstream gas processing equipment to control the flow of the pipeline.

[0075] Specifically, the seventh valve body 320 includes a sixth pneumatic diaphragm valve, a ninth manual diaphragm valve, a seventh pneumatic diaphragm valve, a tenth manual diaphragm valve, an eleventh manual diaphragm valve, a seventh ball valve, and an eighth ball valve. Among them, the sixth pneumatic diaphragm valve is arranged on the first acid gas removal pipeline to control the circulation of the first acid gas removal pipeline; the ninth manual diaphragm valve is arranged on the first reaction water tank body and is connected to the first reaction interface to control the circulation between the first reaction water tank body and the first acid gas removal pipeline; the seventh pneumatic diaphragm valve is arranged on the second acid gas removal pipeline to control the circulation of the second acid gas removal pipeline; the tenth manual diaphragm valve is arranged on the first reaction water tank body and is connected to the second reaction interface to control the circulation between the first reaction water tank body and the second acid gas removal pipeline; the eleventh manual diaphragm valve is arranged on the first reaction water tank body and is connected to the third reaction interface to control the circulation between the first reaction water tank body and the sensor; the seventh ball valve is arranged on the first reaction water tank body and is connected to the fourth reaction interface to control the circulation between the first reaction water tank body and the NaOH solution source; the eighth ball valve is arranged on the first reaction water tank body and is connected to the fifth reaction interface to control the circulation between the first reaction water tank body and the waste liquid treatment equipment.

[0076] Furthermore, the second gas filter component 300 further includes a sixth monitoring component 330 , wherein the sixth monitoring component 330 is in communication with the fourth filter component 310 and is used to monitor the pressure and liquid level inside the fourth filter component 310 .

[0077] Specifically, the sixth monitoring component 330 includes a third pressure sensor and a third liquid level sensor. The third pressure sensor is connected to the first reaction water tank body and is located downstream of the eleventh manual diaphragm valve, and is used to monitor the pressure inside the first reaction water tank body; the third liquid level sensor is arranged inside the first reaction water tank body, and is used to monitor the liquid level inside the first reaction water tank body.

[0078] The method of using this embodiment is as follows:

[0079] (1) Open the first ball valve, the second ball valve, the third ball valve, and the fourth ball valve so that the first water bath and the second water bath are connected to the first condenser and the second condenser respectively, so that the coolant in the first water bath and the second water bath can flow to the first condenser and the second condenser, thereby making the internal temperatures of the first condenser and the second condenser meet the requirements;

[0080] (2) opening the first pneumatic diaphragm valve and the first manual diaphragm valve, and adjusting the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation device through the first regulating valve, so that the mixed gas generated by the upstream semiconductor process equipment flows to the first condenser, so that the first condenser liquefies the gaseous trichlorosilane in the mixed gas, and obtains liquid trichlorosilane and the first condensed gas;

[0081] (3) opening the second pneumatic diaphragm valve and the first manual diaphragm valve so that the first condenser is connected to the first liquid storage tank, thereby allowing liquid trichlorosilane to be stored in the first liquid storage tank;

[0082] (4) opening the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve to connect the phosphine removal reactor to the first condenser. The phosphine removal reactor removes the PH3 gas (phosphine gas) in the first condensed gas by reacting with iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain a first filtered gas, thereby removing the PH3 gas in the first condensed gas.

[0083] (5) Opening the eleventh pneumatic diaphragm valve, the sixteenth manual diaphragm valve, the sixth pneumatic diaphragm valve, and the ninth manual diaphragm valve, so that the phosphine removal reactor is connected to the first reaction tank, and the NaOH solution inside the first reaction tank can absorb the acidic gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N;

[0084] (6) Open the seventh pneumatic diaphragm valve and the tenth manual diaphragm valve to connect the first reaction tank with the downstream gas processing equipment, so that H2 with a purity of 2N to 4N can be passed to the downstream gas processing equipment.

[0085] The advantage of this embodiment is that by connecting the condensation component with the upstream semiconductor process equipment, the condensation component can liquefy the gaseous trichlorosilane / gaseous dichlorosilane in the mixed gas, thereby removing the trichlorosilane / dichlorosilane in the mixed gas and improving the gas purity; by connecting the first gas filter component with the condensation component, the first gas filter component can remove the PH3 gas / B2H6 gas / GeH4 gas in the condensed gas and improve the gas purity; by connecting the first gas filter component with the second gas filter component, the second gas filter component can remove the acidic gas in the first filtered gas and obtain H2 with a purity of 2N to 4N, thereby improving the purity of the hydrogen, thereby facilitating the operation of subsequent processes.

[0086] Example 2

[0087] This embodiment is a variation of Embodiment 1.

[0088] like Figure 3As shown, the condensation component 100 further includes a second condensation component 150 and a second liquid storage component 160. The second condensation component 150 is respectively connected to the upstream semiconductor process equipment and the first gas filter component 200, and is located downstream of the upstream semiconductor process equipment and upstream of the first gas filter component 200, and is used to condense the mixed gas to remove dichlorosilane to obtain a second condensed gas, and to transport the second condensed gas to the first gas filter component 200; the second liquid storage component 160 is respectively connected to the second condensation component 150 and the waste liquid treatment equipment, and is used to store dichlorosilane.

[0089] Specifically, the second condensing member 150 includes a second condenser, a fourth condensing line, a fifth condensing line, a second water bath, a third water bath line and a fourth water bath line. The first end of the fourth condensing line is connected to the second condenser, and the second end of the fourth condensing line is connected to the second liquid storage member 160 for conveying liquid dichlorosilane; the first end of the fifth condensing line is connected to the second condenser, and the second end of the fifth condensing line is connected to the phosphine removal unit for conveying the second condensed gas; the first end of the third water bath line is connected to the second water bath, and the second end of the third water bath line is connected to the second condenser for conveying coolant; the first end of the fourth water bath line is connected to the second condenser, and the second end of the fourth water bath line is connected to the second water bath for conveying coolant.

[0090] More specifically, the second condenser includes a second condenser body, a sixth condensation port, a seventh condensation port, an eighth condensation port, a ninth condensation port, and a tenth condensation port. The sixth condensation port is formed on the second condenser body for communicating with the second end of the third condensation pipeline; the seventh condensation port is formed on the second condensation body for communicating with the first end of the fourth condensation pipeline; the eighth condensation port is formed on the second condensation body for communicating with the first end of the fifth condensation pipeline; the ninth condensation port and the tenth condensation port are formed on the second condenser body for communicating with the second water bath.

[0091] It should be noted that the temperature of the coolant in the second condenser body is 1° C. to 10° C. Preferably, the temperature of the coolant in the second condenser body is 5° C.

[0092] More specifically, the second water bath includes a second water bath body, a third water bath port and a fourth water bath port. The third water bath port is formed in the second water bath body for communicating with the third water bath pipeline; the fourth water bath port is formed in the second water bath body for communicating with the fourth water bath pipeline.

[0093] More specifically, a first end of the third water bath pipeline is communicated with the third water bath port of the second water bath body, and a second end of the third water bath pipeline is communicated with the ninth condensation port of the second condenser body.

[0094] More specifically, the first end of the fourth water bath pipeline is communicated with the tenth condensation port of the second condenser body, and the second end of the fourth water bath pipeline is communicated with the fourth water bath port of the second water bath body.

[0095] In some of the embodiments, the first condenser includes but is not limited to a water-cooled condenser; the fourth condensation pipeline includes but is not limited to a stainless steel pipe; the fifth condensation pipeline includes but is not limited to a stainless steel pipe; the second water bath includes but is not limited to a heat exchanger; the third water bath pipeline includes but is not limited to a stainless steel pipe; the fourth water bath pipeline includes but is not limited to a stainless steel pipe.

[0096] Specifically, the second liquid storage member 160 includes a second liquid storage tank, a third liquid storage pipeline and a fourth liquid storage pipeline. The first end of the third liquid storage pipeline is connected to the second end of the fourth condensation pipeline, and the second end of the third liquid storage pipeline is connected to the second liquid storage tank for conveying liquid dichlorosilane; the first end of the fourth liquid storage pipeline is connected to the second liquid storage tank, and the second end of the fourth liquid storage pipeline is connected to the waste liquid treatment equipment for conveying liquid dichlorosilane.

[0097] It should be noted that there are at least two second liquid storage members 160 , and several second liquid storage members 160 are respectively connected to the second condensing member 150 .

[0098] In some of the embodiments, there are two second liquid storage components 160, and the two second liquid storage components 160 are respectively connected to the second condensing component 150; when the liquid level height inside a second liquid storage component 160 exceeds a preset threshold, it can be switched to another second liquid storage component 160.

[0099] More specifically, the second liquid storage tank includes a second liquid storage tank body, a fourth liquid storage port, a fifth liquid storage port, a sixth liquid storage port and a second thermostat. The fourth liquid storage port is formed in the second liquid storage tank body for communicating with the third liquid storage pipeline; the fifth liquid storage port is formed in the second liquid storage tank body for communicating with the fourth liquid storage pipeline; the sixth liquid storage port is formed in the second liquid storage tank body for communicating with the sensor. The cooling coil of the second thermostat is coiled on the outer wall of the second liquid storage tank, and the temperature inside the second liquid storage tank can be kept constant through heat exchange between the cooling coil and the second liquid storage tank.

[0100] In some of the embodiments, the second liquid storage tank includes but is not limited to a stainless steel tank; the third liquid storage pipeline includes but is not limited to a stainless steel pipe; the fourth liquid storage pipeline includes but is not limited to a stainless steel pipe; the second water bath includes but is not limited to a constant temperature refrigerator compressor.

[0101] Furthermore, the condensing component 100 further includes a third valve body 170. The third valve body 170 is disposed on a pipeline connecting the second condensing component 150 with the second liquid storage component 160, the first gas filtering component 200, and the waste liquid treatment device, and is used to control the flow of the pipeline.

[0102] Specifically, the third valve member includes a third ball valve, a fourth ball valve, a third pneumatic diaphragm valve, a fourth manual diaphragm valve, a fifth manual diaphragm valve and a sixth manual diaphragm valve. Among them, the third ball valve is arranged on the second condenser body and communicated with the ninth condensation port, and is used to control the flow between the second condenser body and the third water bath pipeline; the fourth ball valve is arranged on the second condenser body and communicated with the tenth condensation port, and is used to control the flow between the second condenser body and the fourth water bath pipeline; the third pneumatic diaphragm valve is arranged on the third liquid storage pipeline, and is used to control the flow of the third liquid storage pipeline; the fourth manual diaphragm valve is arranged on the top of the second liquid storage tank body, and is communicated with the fourth liquid storage port, and is used to control the flow between the second liquid storage tank body and the third liquid storage pipeline; the fifth manual diaphragm valve is arranged on the top of the second liquid storage tank body, and is communicated with the sixth liquid storage port, and is used to control the flow between the second liquid storage tank and the sensor; the sixth manual diaphragm valve is arranged on the side wall at the bottom of the second liquid storage tank body, and is communicated with the fifth liquid storage port, and is used to control the flow between the second liquid storage tank body and the fourth liquid storage pipeline.

[0103] Furthermore, the condensing component 100 further includes a second monitoring component, wherein the second monitoring component is in communication with the second liquid storage component 160 and is used to monitor the pressure, temperature and liquid level inside the second liquid storage component 160 .

[0104] Specifically, the second monitoring component includes a second pressure sensor, a second temperature sensor and a second liquid level sensor. The second pressure sensor is connected to the second liquid storage tank body through a pipeline and is located downstream of the fifth manual diaphragm valve, and is used to monitor the pressure inside the second liquid storage tank body; the second temperature sensor is arranged inside the second liquid storage tank body, and is used to monitor the temperature of the liquid inside the second liquid storage tank body; the second liquid level sensor is arranged inside the second liquid storage tank body, and is used to monitor the liquid level height inside the second liquid storage tank body.

[0105] The method of using this embodiment is as follows:

[0106] (1) The first condensed gas flows to the second condenser through the pipeline, and the second condenser can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and the second condensed gas;

[0107] (2) Open the third pneumatic diaphragm valve and the fourth manual diaphragm valve to connect the second condenser to the second liquid storage tank, so that liquid dichlorosilane is stored in the first liquid storage tank.

[0108] The advantage of this embodiment is that, by arranging the second condensing element downstream of the first condensing element, the gaseous dichlorosilane in the first condensed gas can be liquefied, thereby removing the gaseous dichlorosilane and improving the purity of the gas.

[0109] Example 3

[0110] This embodiment is a variation of Embodiments 1 to 2.

[0111] like Figure 4 As shown, the first gas filter component 200 includes a second filter component 240. The second filter component 240 is respectively connected to the condensation component 100 and the second gas filter component 300, and is located downstream of the condensation component 100 and upstream of the second gas filter component 300, and is used to filter the condensed gas to remove diborane to obtain the second filtered gas, and to transport the second filtered gas to the second gas filter component 300.

[0112] Specifically, the second filter element 240 includes a second reaction water tank, a first diborane removal pipeline, a second diborane removal pipeline, a third diborane removal pipeline and a fourth diborane removal pipeline. The first end of the first diborane removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first diborane removal pipeline is connected to the second reaction water tank for conveying the first filtered gas; the first end of the second diborane removal pipeline is connected to the second reaction water tank, and the second end of the second diborane removal pipeline is connected to the first end of the first acid gas removal pipeline for conveying the second filtered gas; the first end of the third diborane removal pipeline is connected to a water source, and the second end of the third diborane removal pipeline is connected to the second reaction water tank for conveying water; the first end of the fourth diborane removal pipeline is connected to the second reaction water tank, and the second end of the fourth diborane removal pipeline is connected to a waste liquid treatment device for conveying waste liquid.

[0113] More specifically, the second reaction water tank includes a second reaction water tank body, a sixth reaction interface, a seventh reaction interface, an eighth reaction interface, a ninth reaction interface and a tenth reaction interface. The sixth reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the second end of the first diborane removal pipeline; the seventh reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the first end of the second diborane removal pipeline; the eighth reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the sensor; the ninth reaction interface is formed at the top of the side wall of the second reaction water tank body, and is used to communicate with the second end of the third diborane removal pipeline; the tenth reaction interface is formed at the bottom of the side wall of the second reaction water tank body, and is used to communicate with the first end of the fourth diborane removal pipeline.

[0114] It should be noted that the borane gas in the first filtered gas flowing into the second reaction water tank can react with the aqueous solution inside the second reaction water tank at room temperature, that is, the aqueous solution can absorb the borane gas in the first filtered gas to achieve the effect of removing the borane gas in the first filtered gas.

[0115] In some of the embodiments, the second reaction water tank includes but is not limited to a stainless steel water tank; the first diborane removal pipeline includes but is not limited to a stainless steel pipe; the second diborane removal pipeline includes but is not limited to a stainless steel pipe; and the third diborane removal pipeline includes but is not limited to a stainless steel pipe.

[0116] Furthermore, the first gas filter component 200 further includes a fifth valve body 250. The fifth valve body 250 is disposed on a pipeline connecting the second filter element 240, the condensation component 100 and the second gas filter component 300, and is used to control the flow of the pipeline.

[0117] Specifically, the fifth valve body 250 includes an eighth pneumatic diaphragm valve, a twelfth manual diaphragm valve, a ninth pneumatic diaphragm valve, a thirteenth manual diaphragm valve, a fourteenth manual diaphragm valve, a ninth ball valve, and a tenth ball valve. Among them, the eighth pneumatic diaphragm valve is arranged on the first diborane removal pipeline to control the circulation of the first diborane removal pipeline; the twelfth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the sixth reaction interface to control the circulation between the second reaction water tank body and the first diborane removal pipeline; the ninth pneumatic diaphragm valve is arranged on the second diborane removal pipeline to control the circulation of the second diborane removal pipeline; the thirteenth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the seventh reaction interface to control the circulation between the second reaction water tank body and the second diborane removal pipeline; the fourteenth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the eighth reaction interface to control the circulation between the second reaction water tank body and the sensor; the ninth ball valve is arranged on the second reaction water tank body and is connected to the ninth reaction interface to control the circulation between the second reaction water tank body and the aqueous solution source; the tenth ball valve is arranged on the second reaction water tank body and is connected to the tenth reaction interface to control the circulation between the second reaction water tank body and the waste liquid treatment equipment.

[0118] Furthermore, the first gas filter component 200 further includes a fourth monitoring component 260 , wherein the fourth monitoring component 260 is in communication with the second filter component 240 and is used to monitor the pressure and liquid level inside the second filter component 240 .

[0119] Specifically, the fourth monitoring component 260 includes a fourth pressure sensor and a fourth liquid level sensor. The fourth pressure sensor is connected to the second reaction water tank body and is located downstream of the fourteenth manual diaphragm valve, and is used to monitor the pressure inside the second reaction water tank body; the fourth liquid level sensor is arranged inside the second reaction water tank body, and is used to monitor the liquid level inside the second reaction water tank body.

[0120] The method of using this embodiment is as follows:

[0121] (1) Open the fifth pneumatic diaphragm valve, the eighth manual diaphragm valve, the eighth pneumatic diaphragm valve, and the twelfth manual diaphragm valve to connect the phosphine removal reactor and the second reaction tank. The aqueous solution inside the second reaction tank allows the B2H6 gas (borane gas) in the first filtered gas to react with water at room temperature, thereby obtaining the second filtered gas.

[0122] The advantage of this embodiment is that by arranging the second filter element between the first filter element and the fourth filter element, the B2H6 gas in the first filtered gas can be removed, thereby further improving the gas purity.

[0123] Example 4

[0124] This embodiment is a variation of Embodiments 1 to 3.

[0125] like Figure 5 As shown, the first gas filter component 200 includes a third filter component 270. The third filter component 270 is communicated with the condensation component 100 and the second gas filter component 300 respectively, and is located downstream of the condensation component 100 and the second gas filter component 300, and is used to filter the condensed gas to remove germanium hydride to obtain the third filtered gas, and to transport the third filtered gas to the second gas filter component 300.

[0126] Specifically, the third filter element 270 includes a third reaction water tank, a first germanium hydride removal pipeline, a second germanium hydride removal pipeline, a third germanium hydride removal pipeline, and a fourth germanium hydride removal pipeline. The first end of the first germanium hydride removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first germanium hydride removal pipeline is connected to the third reaction water tank for conveying the first filtered gas; the first end of the second germanium hydride removal pipeline is connected to the third reaction water tank, and the second end of the second germanium hydride removal pipeline is connected to the first end of the first acid gas removal pipeline for conveying the third filtered gas; the first end of the third germanium hydride removal pipeline is connected to the silver nitrate solution source, and the second end of the third germanium hydride removal pipeline is connected to the third reaction water tank for conveying the silver nitrate solution source; the first end of the fourth germanium hydride removal pipeline is connected to the third reaction water tank, and the second end of the fourth germanium hydride removal pipeline is connected to the waste liquid treatment equipment for conveying waste liquid.

[0127] More specifically, the third reaction water tank includes a third reaction water tank body, an eleventh reaction interface, a twelfth reaction interface, a thirteenth reaction interface, a fourteenth reaction interface and a fifteenth reaction interface. Among them, the eleventh reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the second end of the first germanium hydride removal pipeline; the twelfth reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the first end of the second germanium hydride removal pipeline; the thirteenth reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the sensor; the fourteenth reaction interface is formed at the top of the side wall of the third reaction water tank body, and is used to communicate with the second end of the third germanium hydride removal pipeline; the fifteenth reaction interface is formed at the bottom of the side wall of the third reaction water tank body, and is used to communicate with the first end of the fourth germanium hydride removal pipeline.

[0128] It should be noted that the germane gas in the first filtered gas flowing into the third reaction water tank can react with the silver nitrate solution inside the third reaction water tank at room temperature, that is, the silver nitrate solution can absorb the germane gas in the first filtered gas to achieve the effect of removing the germane gas in the first filtered gas.

[0129] In some of the embodiments, the third reaction water tank includes but is not limited to a stainless steel water tank; the first germanium hydride removal pipeline includes but is not limited to a stainless steel pipe; the second germanium hydride removal pipeline includes but is not limited to a stainless steel pipe; the third germanium hydride removal pipeline includes but is not limited to a stainless steel pipe; the fourth germanium hydride removal pipeline includes but is not limited to a stainless steel pipe.

[0130] Furthermore, the first gas filter component 200 further includes a sixth valve body 280. The sixth valve body 280 is disposed on the pipeline between the third filter element 270, the condensation component 100 and the second gas filter component 300 to control the flow of the pipeline.

[0131] Specifically, the sixth valve body 280 includes a tenth pneumatic diaphragm valve, a fifteenth manual diaphragm valve, an eleventh pneumatic diaphragm valve, a sixteenth manual diaphragm valve, a seventeenth manual diaphragm valve, an eleventh ball valve, and a twelfth ball valve. Among them, the tenth pneumatic diaphragm valve is arranged on the first germanium hydride removal pipeline to control the circulation of the first germanium hydride removal pipeline; the fifteenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the eleventh reaction interface to control the circulation between the third reaction water tank body and the first germanium hydride removal pipeline; the eleventh pneumatic diaphragm valve is arranged on the second germanium hydride removal pipeline to control the circulation of the second germanium hydride removal pipeline; the sixteenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the twelfth reaction interface to control the circulation between the third reaction water tank body and the second germanium hydride removal pipeline; the seventeenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the thirteenth reaction interface to control the circulation between the third reaction water tank body and the sensor; the eleventh ball valve is arranged on the third reaction water tank body and is connected to the fourteenth reaction interface to control the circulation between the third reaction water tank body and the silver nitrate solution source; the twelfth ball valve is arranged on the third reaction water tank body and is connected to the fifteenth reaction interface to control the circulation between the third reaction water tank body and the waste liquid treatment equipment.

[0132] Furthermore, the first gas filter component 200 further includes a fifth monitoring component 290 , wherein the fifth monitoring component 290 is in communication with the third filter component 270 and is used to monitor the pressure and liquid level inside the third filter component 270 .

[0133] Specifically, the fifth monitoring component 290 includes a fifth pressure sensor and a fifth liquid level sensor. The fifth pressure sensor is connected to the third reaction water tank body and is located downstream of the seventeenth manual diaphragm valve, and is used to monitor the pressure inside the third reaction water tank body; the fifth liquid level sensor is arranged inside the third reaction water tank body, and is used to monitor the liquid level inside the third reaction water tank body.

[0134] The method of using this embodiment is as follows:

[0135] (1) Open the ninth pneumatic diaphragm valve, the thirteenth manual diaphragm valve, the tenth pneumatic diaphragm valve and the fifteenth manual diaphragm valve to connect the second reaction tank and the third reaction water tank. The silver nitrate solution in the third reaction water tank can react with the GeH4 gas (germane gas) in the second filtered gas at room temperature to obtain the third filtered gas.

[0136] The advantage of this embodiment is that, by arranging the third filter element between the first filter element and the fourth filter element, the GeH 4 gas in the first filtered gas can be removed, thereby further improving the gas purity.

[0137] Example 5

[0138] This embodiment is a variation of Embodiments 1 to 4.

[0139] In some embodiments, there are at least two first gas filter components 200. In some embodiments, the first gas filter components 200 are connected in parallel.

[0140] In some embodiments, there are two first gas filter components 200. The two first gas filter components 200 are connected in parallel.

[0141] It should be noted that, when one first gas filter component 200 needs to discharge waste and add iron powder, it can be switched to another first gas filter component 200 .

[0142] In some embodiments, there are at least two second gas filter components 300. The plurality of second gas filter components 300 are connected in parallel.

[0143] In some embodiments, there are two second gas filter components 300. The two second gas filter components 300 are connected in parallel.

[0144] It should be noted that, when one second gas filter component 300 needs to discharge waste liquid and add aqueous solution, it can be switched to another second gas filter component 300.

[0145] The usage and advantages of this embodiment are the same as those of embodiments 1 to 3, and will not be described in detail here.

[0146] Example 6

[0147] This embodiment is a variation of Embodiments 1 to 5.

[0148] like Figure 6As shown, the mixed tail gas separation device further includes a gas analysis component 400 , a purge component 500 , a vacuum component 600 and a pressure relief component 700 . Among them, the gas analysis component 400 is connected to the first gas filter component 200 and the second gas filter component 300 respectively, and is used to detect whether the first filtered gas, the second filtered gas, and the third filtered gas meet the standards; the purge component 500 is connected to the condensation component 100, the first gas filter component 200, and the second gas filter component 300 respectively, and is used to purge the condensation component 100, the first gas filter component 200, and the second gas filter component 300; the vacuum component 600 is connected to the condensation component 100, the first gas filter component 200, and the second gas filter component 300 respectively, and is used to discharge the gas inside the condensation component 100, the first gas filter component 200, and the second gas filter component 300; the pressure relief component 700 is connected to the condensation component 100, the first gas filter component 200, and the second gas filter component 300 respectively, and is used to relieve the pressure of the condensation component 100, the first gas filter component 200, and the second gas filter component 300.

[0149] like Figure 7 As shown, the gas analysis component 400 includes a first gas analysis component 410, a second gas analysis component 420 and a third gas analysis component 430. The first gas analysis component 410 is connected to the second filter component 240 in the first gas filter component 200 and is located downstream of the second filter component 240, and is used to detect whether the gas processed by the second filter component 240 meets the standard; the second gas analysis component 420 is connected to the third filter component 270 in the first gas filter component 200 and is located downstream of the third filter component 270, and is used to detect whether the gas processed by the third filter component 270 meets the standard; the third gas analysis component 430 is connected to the second gas filter component 300 and is located downstream of the second gas filter component 300, and is used to detect whether the gas processed by the second gas filter component 300 meets the standard.

[0150] Specifically, the first gas analysis component 410 is connected to the second phosphine removal pipeline and is located downstream of the fifth pneumatic diaphragm valve; the second gas analysis component 420 is connected to the second diborane removal pipeline and is located downstream of the ninth pneumatic diaphragm valve; the third gas analysis component 430 is connected to the second germanium hydride removal pipeline and is located downstream of the eleventh pneumatic diaphragm valve.

[0151] In some of the embodiments, the first gas analysis component 410 includes but is not limited to a gas analyzer; the second gas analysis component 420 includes but is not limited to a gas analyzer; and the third gas analysis component 430 includes but is not limited to a gas analyzer.

[0152] like Figure 7As shown, the purge component 500 includes a purge member 510. The purge member 510 is respectively connected to the condensation component 100, the first gas filter component 200, and the second gas filter component 300, and is used to purge the condensation component 100, the first gas filter component 200, and the second gas filter component 300.

[0153] Specifically, the purge component 510 includes a purge gas source, a purge main line, a first purge branch line, a second purge branch line, a third purge branch line and a fourth purge branch line. Among them, the first end of the purge main line is connected to the purge gas source, and the second end of the purge main line is connected to the first purge branch line, the second purge branch line, the third purge branch line, the fourth purge branch line, the fifth purge branch line and the sixth purge branch line respectively; the first end of the first purge branch line is connected to the purge main line, and the second end of the first purge branch line is connected to the first liquid storage line, and the connection point between the first purge branch line and the first liquid storage line is located between the second pneumatic diaphragm valve and the first manual diaphragm valve for conveying purge gas; the first end of the second purge branch line is connected to the purge main line, and the second end of the second purge branch line is connected to the third liquid storage line, and the second purge branch line and the first purge branch line are connected to the third liquid storage line. The connecting point of the three liquid storage pipelines is located between the third pneumatic diaphragm valve and the fourth manual diaphragm valve, and is used to transport purge gas; the first end of the third purge branch pipeline is connected to the main purge pipeline, the second end of the third purge branch pipeline is connected to the first phosphine removal pipeline, and the connecting point of the third purge branch pipeline and the first phosphine removal pipeline is located between the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, and is used to transport purge gas; the first end of the fourth purge branch pipeline is connected to the third purge branch pipeline, the second end of the fourth purge branch pipeline is connected to the second phosphine removal pipeline, and the connecting point of the fourth purge branch pipeline and the second phosphine removal pipeline is located between the fifth pneumatic diaphragm valve and the eighth manual diaphragm valve, and is used to transport purge gas.

[0154] In some of the embodiments, the purge gas source includes but is not limited to a PN2 gas source.

[0155] In some of the embodiments, the main purge pipeline includes but is not limited to a stainless steel pipe; the first purge branch pipeline includes but is not limited to a stainless steel pipe; the second purge branch pipeline includes but is not limited to a stainless steel pipe; the third purge branch pipeline includes but is not limited to a stainless steel pipe; and the fourth purge branch pipeline includes but is not limited to a stainless steel pipe.

[0156] Furthermore, the purge component 500 further includes a ninth valve body 520. The ninth valve body 520 is disposed on a pipeline connecting the purge component 510 with the condensation component 100, the first gas filter component 200, and the second gas filter component 300, for controlling the flow of the pipeline.

[0157] Specifically, the ninth valve body 520 includes an eighteenth manual diaphragm valve, a second regulating valve, a twelfth pneumatic diaphragm valve, a second non-return valve, a thirteenth pneumatic diaphragm valve, a third non-return valve, a fourteenth pneumatic diaphragm valve, a fourth non-return valve, a fifteenth pneumatic diaphragm valve and a fifth non-return valve. Among them, the eighteenth manual diaphragm valve is arranged in the purge main line to control the flow of the purge main line; the second regulating valve is arranged in the purge main line and is located downstream of the eighteenth manual diaphragm valve to adjust the pressure inside the purge main line; the twelfth pneumatic diaphragm valve is arranged in the first purge branch line to control the flow of the first purge branch line; the second non-return valve is arranged in the first purge branch line and is located downstream of the twelfth pneumatic diaphragm valve to prevent the gas inside the first purge branch line from backflowing; the thirteenth pneumatic diaphragm valve is arranged in the second purge branch line to control the flow of the second purge branch line; the third non-return valve is arranged in the second purge branch line The fourth pneumatic diaphragm valve is arranged on the third purge branch pipeline and is located downstream of the thirteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the second purge branch pipeline; the fourteenth pneumatic diaphragm valve is arranged on the third purge branch pipeline and is used to control the circulation of the third purge branch pipeline; the fourth one-way valve is arranged on the third purge branch pipeline and is located downstream of the fourteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the third purge branch pipeline; the fifteenth pneumatic diaphragm valve is arranged on the fourth purge branch pipeline and is located downstream of the fifteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the fourth purge branch pipeline.

[0158] Furthermore, the purge component 500 further includes a seventh monitoring component 530. The seventh monitoring component 530 is disposed on a pipeline connected to the purge component 510, and is used to monitor the pressure inside the pipeline.

[0159] Specifically, the seventh monitoring component 530 includes a sixth pressure sensor, wherein the sixth pressure sensor is communicated with the main purge line and is located downstream of the second regulating valve, and is used to monitor the pressure inside the main purge line.

[0160] like Figure 7 As shown, the vacuum component 600 includes a vacuum component 610. The vacuum component 610 is respectively connected to the condensation component 100, the first gas filter component 200, and the second gas filter component 300, and is used to discharge the gas inside the condensation component 100, the first gas filter component 200, and the second gas filter component 300.

[0161] Specifically, the vacuum component 610 includes a vacuum pump, a vacuum main line, a first vacuum branch line, a second vacuum branch line, a third vacuum branch line, and a fourth vacuum branch line. The first end of the vacuum main line is connected to the vacuum pump, and the second end of the vacuum main line is connected to the first vacuum branch line, the second vacuum branch line, the third vacuum branch line, the fourth vacuum branch line, and the pressure relief unit respectively; the first end of the first vacuum branch line is connected to the vacuum main line, and the second end of the first vacuum branch line is connected to the first liquid storage line, and the connection point between the first vacuum branch line and the first liquid storage line is located between the second pneumatic diaphragm valve and the first manual diaphragm valve for conveying gas; the first end of the second vacuum branch line is connected to the vacuum main line, and the second end of the second vacuum branch line is connected to the third liquid storage line, and the second vacuum branch line and the third liquid storage line are connected. The connection point is located between the third pneumatic diaphragm valve and the fourth manual diaphragm valve, and is used to transport gas; the first end of the third vacuum branch pipeline is connected to the vacuum main pipeline, the second end of the third vacuum branch pipeline is connected to the first phosphine removal pipeline, and the connection point between the third vacuum branch pipeline and the first phosphine removal pipeline is located between the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, and is used to transport gas; the first end of the fourth vacuum branch pipeline is connected to the third vacuum branch pipeline, the second end of the fourth vacuum branch pipeline is connected to the second phosphine removal pipeline, and the connection point between the fourth vacuum branch pipeline and the second phosphine removal pipeline is located between the fifth pneumatic diaphragm valve and the eighth manual diaphragm valve, and is used to transport gas.

[0162] In some of the embodiments, the main vacuum pipeline includes but is not limited to a stainless steel pipe; the first vacuum branch pipeline includes but is not limited to a stainless steel pipe; the second vacuum branch pipeline includes but is not limited to a stainless steel pipe; the third vacuum branch pipeline includes but is not limited to a stainless steel pipe; and the fourth vacuum branch pipeline includes but is not limited to a stainless steel pipe.

[0163] Furthermore, the vacuum component 600 includes a tenth valve body 620. The tenth valve body 620 is disposed on a pipeline connecting the vacuum component 610 with the condensation component 100, the first gas filter component 200, and the second gas filter component 300, and is used to control the flow of the pipeline.

[0164] Specifically, the tenth valve body 620 includes a sixteenth pneumatic diaphragm valve, a sixth one-way valve, a seventeenth pneumatic diaphragm valve, a seventh one-way valve, an eighteenth pneumatic diaphragm valve, an eighth one-way valve, a nineteenth pneumatic diaphragm valve and a ninth one-way valve. Among them, the sixteenth pneumatic diaphragm valve is arranged in the first vacuum branch pipeline to control the flow of the first vacuum branch pipeline; the sixth one-way valve is arranged in the first vacuum branch pipeline and is located downstream of the sixteenth pneumatic diaphragm valve to prevent the gas inside the first vacuum branch pipeline from backflowing; the seventeenth pneumatic diaphragm valve is arranged in the second vacuum branch pipeline to control the flow of the second vacuum branch pipeline; the seventh one-way valve is arranged in the second vacuum branch pipeline and is located downstream of the seventeenth pneumatic diaphragm valve to prevent the gas inside the second vacuum branch pipeline from backflowing. flow; the eighteenth pneumatic diaphragm valve is arranged on the third vacuum branch pipeline, for controlling the flow of the third vacuum branch pipeline; the eighth one-way valve is arranged on the third vacuum branch pipeline, and is located downstream of the eighteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the third vacuum branch pipeline; the nineteenth pneumatic diaphragm valve is arranged on the fourth vacuum branch pipeline, for controlling the flow of the fourth vacuum branch pipeline; the ninth one-way valve is arranged on the fourth vacuum branch pipeline, and is located downstream of the nineteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the fourth vacuum branch pipeline.

[0165] Furthermore, the vacuum component 600 further includes an eighth monitoring component 630. The eighth monitoring component 630 is disposed on a pipeline connected to the vacuum component 610, and is used to monitor the pressure inside the pipeline.

[0166] Specifically, the eighth monitoring component 630 includes a seventh pressure sensor, wherein the seventh pressure sensor is connected to the vacuum main line and is used to monitor the pressure inside the vacuum main line.

[0167] like Figure 7 As shown, the pressure relief component 700 includes a first pressure relief component 710, a second pressure relief component 720 and a third pressure relief component 730. The first pressure relief component 710 is respectively connected to the condensation component 100 and the vacuum component 600, and is used to relieve pressure on the condensation component 100; the second pressure relief component 720 is respectively connected to the first gas filter component 200 and the vacuum component 600, and is used to relieve pressure on the first gas filter component 200; the third pressure relief component 730 is respectively connected to the second gas filter component 300 and the vacuum component 600, and is used to relieve pressure on the second gas filter component 300.

[0168] Specifically, the first pressure relief member 710 includes a first pressure relief pipeline, a first pressure relief valve, a second pressure relief pipeline, and a second pressure relief valve. The first end of the first pressure relief pipeline is connected to the first liquid storage member 120, and the second end of the first pressure relief pipeline is connected to the first vacuum branch pipeline; the first pressure relief valve is arranged on the first pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the first liquid storage member 120 is too high; the first end of the second pressure relief pipeline is connected to the second liquid storage member 160, and the second end of the second pressure relief pipeline is connected to the second vacuum branch pipeline; the second pressure relief valve is arranged on the second pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the second liquid storage member 160 is too high.

[0169] Specifically, the second pressure relief member 720 includes a third pressure relief pipeline, a third pressure relief valve, a fourth pressure relief pipeline and a fourth pressure relief valve. The first end of the third pressure relief pipeline is connected to the first reaction water tank, and the second end of the third pressure relief pipeline is connected to the vacuum main pipeline; the third pressure relief valve is arranged on the third pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the first reaction water tank is too high; the first end of the fourth pressure relief pipeline is connected to the second reaction water tank, and the second end of the fourth pressure relief pipeline is connected to the vacuum main pipeline; the fourth pressure relief valve is arranged on the fourth pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the second reaction water tank is too high.

[0170] Specifically, the third pressure relief member 730 includes a fifth pressure relief pipeline and a fifth pressure relief valve. The first end of the fifth pressure relief pipeline is connected to the third reaction water tank, and the second end of the fifth pressure relief pipeline is connected to the vacuum main pipeline; the fifth pressure relief valve is arranged on the fifth pressure relief pipeline, and is used for automatically releasing pressure when the internal pressure of the third reaction water tank is too high.

[0171] The method of using this embodiment is as follows:

[0172] (1) opening the eighteenth manual diaphragm valve, the twelfth pneumatic diaphragm valve, the thirteenth pneumatic diaphragm valve, the fourteenth pneumatic diaphragm valve and the fifteenth pneumatic diaphragm valve, and the second regulating valve adjusting the pressure of the gas entering the purge main pipeline so that the purge gas fills the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor and the pipeline;

[0173] (2) turning on the vacuum pump, and opening the sixteenth pneumatic diaphragm valve, the seventeenth pneumatic diaphragm valve, the eighteenth pneumatic diaphragm valve, and the nineteenth pneumatic diaphragm valve, so that the vacuum pump forms a vacuum negative pressure at the first end of the vacuum main line, so that the gas in the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor, and the inside of the pipeline is discharged;

[0174] (3) When the internal pressure of the first liquid storage tank monitored by the first pressure sensor exceeds a preset threshold, the first pressure relief valve automatically opens, and the gas inside the first liquid storage tank can be discharged through the first pressure relief pipeline;

[0175] (4) When the internal pressure of the second liquid storage tank monitored by the second pressure sensor exceeds a preset threshold, the second pressure relief valve automatically opens, and the gas inside the second liquid storage tank can be discharged through the second pressure relief pipeline;

[0176] (5) When the pressure monitored by the fourth pressure sensor exceeds a preset threshold, the third pressure relief valve automatically opens, so that the gas inside the second reaction tank can be discharged through the third pressure relief pipeline;

[0177] (6) When the pressure monitored by the fifth pressure sensor exceeds a preset threshold, the fourth pressure relief valve automatically opens, so that the gas inside the third reaction tank can be discharged through the fourth pressure relief pipeline;

[0178] (7) When the pressure monitored by the third pressure sensor exceeds a preset threshold, the fifth pressure relief valve automatically opens, so that the gas inside the first reaction tank can be discharged through the fifth pressure relief pipeline.

[0179] The advantage of this embodiment is that, by setting up a gas analysis component, it is possible to observe whether the gas processed by the first gas filter component meets the standards, which can be convenient for staff to observe; by connecting the purge component, the vacuum component with the condensation component, the first gas filter component and the second gas filter component, the entire equipment and pipelines can be purged to ensure the cleanliness of the pipelines; by connecting the pressure relief component with the condensation component, the first gas filter component and the second gas filter component respectively, the pressure relief of the entire equipment can be achieved to ensure the safety of the entire equipment.

[0180] Example 7

[0181] This embodiment relates to a specific implementation of the mixed tail gas separation device of the utility model.

[0182] like Figure 8 As shown, the condensing component TCS condensing device includes a condenser (CO1), a liquid storage tank (CA1.1, CA1.2), a pneumatic diaphragm valve (PV1, PV1.5, PV1.6), a manual diaphragm valve (MV1, MV1.1, MV1.2, MV1.3, MV1.4, MV1.5, MV1.6), a regulating valve (REG1), a one-way valve (CV1), a filter (FILITER1), a pressure sensor (PT1, PT1.1, PT1.2), a thermostat (CJ1.1, CJ1.2), a temperature sensor (TE1.1, TE1.2), a liquid level sensor (LE1.1, LE1.2), and a ball valve (BV1.1, BV1.2).

[0183] Condensation components DCS condensing device includes condenser (CO2), liquid storage tank (CA2.1, CA2.2), pneumatic diaphragm valve (PV2.5, PV2.6), manual diaphragm valve (MV2.1, MV2.2, MV2.3, MV2.4, MV2.5, MV2.6), pressure sensor (PT2.1, PT2.2), thermostat (CJ2.1, CJ2.2), temperature sensor (TE2.1, TE2.2), liquid level sensor (LE2.1, LE2.2), ball valve (BV2.1, BV2.2).

[0184] The PH3 filtering device includes a high-temperature reaction furnace (HO3.1, HO3.2), a pneumatic diaphragm valve (PV3.1, PV3.2, PV3.11, PV3.12), a manual diaphragm valve (MV3.1, MV3.2, MV3.3, MV3.4), a ball valve (BV3.1, BV3.2, BV3.3, BV3.4), and a temperature sensor (TIC3.1, TIC3.2).

[0185] The B2H6 filtration device includes a reaction water tank (HLS4.1, HLS4.2), a pneumatic diaphragm valve (PV4.1, PV4.2, PV4.3, PV4.4), a manual diaphragm valve (MV4.1, MV4.2, MV4.3, MV4.4, MV4.5, MV4.6), a ball valve (BV4.1, BV4.2, BV4.3, BV4.4), and a pressure sensor (PT4.1, PT4.2).

[0186] The GeH4 filtration device includes a reaction water tank (HLS5.1, HLS5.2), a pneumatic diaphragm valve (PV5.1, PV5.2, PV5.3, PV5.4), a manual diaphragm valve (MV5.1, MV5.2, MV5.3, MV5.4, MV5.5, MV5.6), a ball valve (BV5.1, BV5.2, BV5.3, BV5.4), and a pressure sensor (PT5.1, PT5.2).

[0187] The acid gas filtration device includes a reaction water tank (HLS6.1, HLS6.2), a pneumatic diaphragm valve (PV6.1, PV6.2, PV6.3, PV6.4), a manual diaphragm valve (MV6.1, MV6.2, MV6.3, MV6.4, MV6.5, MV6.6), a ball valve (BV6.1, BV6.2, BV6.3, BV6.4), a pressure sensor (PT6.1, PT6.2), and a PH detector (PH6.1, PH6.2).

[0188] The gas analysis device includes gas analyzers (GD3, GD4, GD5).

[0189] The purge device includes a manual diaphragm valve (MV2), a regulating valve (REG2), a filter (FILITER2), a pneumatic diaphragm valve (PV1.1, PV1.3, PV2.1, PV2.3, PV3.4, PV3.6), a one-way valve (CV1.1, CV1.3, CV2.1, CV2.3, CV3.2, CV3.4), and a pressure sensor (PT2).

[0190] The vacuum device includes a pneumatic diaphragm valve (PV1.2, PV1.4, PV2.2, PV2.4, PV3.3, PV3.5), a one-way valve (CV1.2, CV1.3, CV2.2, CV2.4, CV3.1, CV3.3), and a pressure sensor (PT3).

[0191] The pressure relief device includes pressure relief valves (SV1.1, SV1.2, SV2.1, SV2.2, SV4.1, SV4.2, SV5.1, SV5.2, SV6.1, SV6.2).

[0192] Specifically, the mixed tail gas separation method of this embodiment is as follows:

[0193] (1) Open MV2, PV1.1, PV1.3, PV2.1, PV2.3, PV3.4, and PV3.6, and REG2 adjusts the gas pressure entering the purge main line so that the purge gas fills the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor, and the pipeline;

[0194] (2) Turn on the vacuum pump, and open PV1.2, PV1.4, PV2.2, PV2.4, PV3.3, and PV3.5, so that the vacuum pump forms a vacuum negative pressure at the first end of the vacuum main line, so that the gas in CA1.1, CA1.2, CA2.1, CA2.2, HLS4.1, HLS4.2 and the pipeline is discharged;

[0195] (3) Open BV1.1, BV1.2, BV2.1, and BV2.2, so that the first water bath and the second water bath are connected to CO1 and CO2, respectively, so that the coolant in the first water bath and the second water bath can flow to CO1 and CO2, thereby making the internal temperature of CO1 and CO2 meet the requirements;

[0196] (4) Open MV1 and PV1, and adjust the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation device through REG1, so that the mixed gas generated by the upstream semiconductor process equipment flows to CO1, so that CO1 liquefies the gaseous trichlorosilane in the mixed gas, and obtains liquid trichlorosilane and the first condensed gas;

[0197] (5) Open PV1.5 and MV1.1 to connect CO1 with CA1.1, so that liquid trichlorosilane is stored in CA1.1; when switching to CA1.2, open PV1.6 and MV1.2, close PV1.5 and MV1.1, so that CO1 is connected with CA1.2;

[0198] (6) The first condensed gas flows to CO2 through a pipeline, and CO2 can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and a second condensed gas;

[0199] (7) Open PV2.5 and MV2.1 to connect CO2 with CA2.1, so that liquid trichlorosilane is stored in CA2.1; when switching to CA2.2, open PV2.6 and MV2.2, close PV2.5 and MV2.1, so that CO2 is connected with CA2.2, so that liquid trichlorosilane is stored in CA2.2;

[0200] (8) Open PV3.1 and MV3.1 to connect HO3.1 and CO2. HO3.1 removes PH3 gas in the second condensed gas by reacting PH3 gas (phosphine gas) in the second condensed gas with iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain the first filtered gas;

[0201] When switching to HO3.2, open PV3.2 and MV3.3, and close PV3.1 and MV3.1, so that HO3.2 and CO2 are connected;

[0202] (9) Open PV3.12, MV3.2 or PV3.11, MV3.4, PV4.2, MV4.2, so that HO3.1 or HO3.2 is connected to HLS4.1, and the aqueous solution inside HLS4.1 allows the B2H6 gas (borane gas) in the first filtered gas to react with water at room temperature, thereby obtaining a second filtered gas;

[0203] When switching to HLS4.2, turn on PV4.4 and MV4.6, and turn off PV4.2 and MV4.2, so that HO3.1 or HO3.2 is connected to HLS4.2;

[0204] (10) Open PV4.1, MV4.1 or PV4.3, MV4.4, PV5.2, MV5.2, so that HLS4.1 or HLS4.2 is connected to HLS5.1, and the silver nitrate solution in HLS5.1 can react with the GeH4 gas (germane gas) in the second filtered gas at room temperature to obtain the third filtered gas;

[0205] When switching to HLS5.2, turn on PV5.4 and MV5.5, and turn off PV5.2 and MV5.2, so that HLS4.1 or HLS4.2 is connected to HLS5.2;

[0206] (11) Open PV5.1, MV5.1 or PV5.3, MV5.4, PV6.1, MV6.1, so that HLS5.1 or HLS5.2 is connected to HLS6.1, and the NaOH solution inside HLS6.1 can absorb the acid gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N;

[0207] When switching to HLS6.2, open PV6.3 and MV6.4, and close PV6.1 and MV6.1, so that HLS5.1 or HLS5.2 is connected with HLS6.2;

[0208] (12) Open PV6.2, MV6.2 or PV6.4, MV6.5, so that HLS6.1 or HLS6.2 is connected to the downstream gas processing equipment, and H2 with a purity of 2N to 4N can be delivered to the downstream gas processing equipment.

[0209] Furthermore, the mixed tail gas separation method also includes:

[0210] (13) When the liquid level inside CA1.1 or CA1.2 monitored by LE1.1 or LE1.2 exceeds a preset threshold, open MV1.5 or MV1.6 so that the liquid in CA1.1 or CA1.2 can be discharged to the waste liquid treatment equipment;

[0211] (14) When the internal pressure of CA1.1 or CA1.2 monitored by PT1.1 or PT1.2 exceeds a preset threshold, SV1.1 or SV1.2 automatically opens, and the gas inside CA1.1 or CA1.2 can be discharged through the first pressure relief pipeline;

[0212] (15) When the internal pressure of CA2.1 or CA2.2 monitored by PT2.1 or PT2.2 exceeds a preset threshold, SV2.1 or SV2.2 automatically opens, and the gas inside CA2.1 or CA2.2 can be discharged through the second pressure relief pipeline;

[0213] (16) When the liquid level inside CA2.1 or CA2.2 monitored by LE2.1 or LE2.2 exceeds a preset threshold, open MV2.5 or MV2.6 so that the liquid inside CA2.1 or CA2.2 can be discharged to the waste liquid treatment equipment;

[0214] (17) When the iron powder in HO3.1 or HO3.2 needs to be replaced, open BV3.2 or BV3.4 to discharge the waste in HO3.1 or HO3.2; then, open BV3.1 or BV3.3, close BV3.2 or BV3.4, and add iron powder to HO3.1 or HO3.2;

[0215] (18) When it is necessary to replace the aqueous solution in HLS4.1 or HLS4.2, open BV4.2 or BV4.4 to discharge the waste liquid in HLS4.1 or HLS4.2 to the waste liquid treatment equipment; then, open BV4.1 or BV4.3 and close BV4.2 or BV4.4 so that the aqueous solution source can add aqueous solution to HLS4.1 or HLS4.2;

[0216] (19) When the pressure monitored by PT4.1 or PT4.2 exceeds a preset threshold, SV4.1 or SV4.2 automatically opens, so that the gas inside HLS4.1 or HLS4.2 can be discharged through the third pressure relief pipeline;

[0217] (20) When the silver nitrate solution in HLS5.1 or HLS5.2 needs to be replaced, open BV5.2 or BV5.4 to discharge the waste liquid in HLS5.1 or HLS5.2 to the waste liquid treatment equipment; then, open BV5.1 or BV5.3 and close BV5.2 or BV5.4 so that the silver nitrate solution source can add silver nitrate solution to HLS5.1 or HLS5.2;

[0218] (21) When the pressure monitored by PT5.1 or PT5.2 exceeds a preset threshold, SV5.1 or SV5.2 automatically opens, so that the gas inside HLS5.1 or HLS5.2 can be discharged through the fourth pressure relief pipeline;

[0219] (22) When it is necessary to replace the NaOH solution in HLS6.1 or HLS6.2, open BV6.2 or BV6.4 to discharge the waste liquid in HLS6.1 or HLS6.2 to the waste liquid treatment equipment; then, open BV6.1 or BV6.3 and close BV6.2 or BV6.4 so that the NaOH solution source can add NaOH solution to HLS6.1 or HLS6.2;

[0220] (23) When the pressure monitored by PT6.1 or PT6.2 exceeds a preset threshold, SV6.1 or SV6.2 automatically opens, allowing the gas inside HLS6.1 or HLS6.2 to be discharged through the fifth pressure relief pipeline.

[0221] Example 8

[0222] This embodiment relates to a semiconductor process system in the utility model.

[0223] A semiconductor process system includes the mixed tail gas separation equipment as described in Examples 1 to 6.

[0224] Furthermore, the mixed tail gas separation device also includes an iron powder feeding device, a waste liquid treatment device, and the iron powder feeding device is connected. Among them, the iron powder feeding device and the iron powder feeding device are connected to the first filter element in the first gas filter component, and the waste liquid treatment device is connected to the first liquid storage component, the second liquid storage component, the second filter element in the first gas filter component, and the third filter element in the first gas filter component of the condensation component.

[0225] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0226] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the utility model patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A mixed tail gas separation device, characterized in that: include: A condensation component, the condensation component is connected to an upstream semiconductor process device and is used to condense the mixed gas to remove dichlorosilane and / or trichlorosilane to obtain a condensed gas; a first gas filtering component, the first gas filtering component being in communication with the condensing component and being located downstream of the condensing component, and being used for filtering the condensed gas to remove phosphine and / or diborane and / or germanium hydride to obtain filtered gas; The second gas filter component is communicated with the first gas filter component and is located downstream of the first gas filter component, and is used for filtering the filtered gas to remove acidic gas to obtain H2 with a purity of 2N to 4N.

2. The mixed tail gas separation equipment according to claim 1, characterized in that: The condensing component comprises: a first condensing member, the first condensing member being in communication with an upstream semiconductor process equipment and the first gas filtering component, respectively, and being located downstream of the upstream semiconductor process equipment and upstream of the first gas filtering component, and being used for condensing the mixed gas to remove trichlorosilane to obtain a first condensed gas, and conveying the first condensed gas to the first gas filtering component; A first liquid storage member, the first liquid storage member is connected to the first condensing member and the waste liquid treatment equipment, and is used to store trichlorosilane; and / or The condensing component comprises: a second condensing member, the second condensing member being in communication with an upstream semiconductor process equipment and the first gas filtering member, respectively, and being located downstream of the upstream semiconductor process equipment and upstream of the first gas filtering member, and being used for condensing the mixed gas to remove dichlorosilane to obtain a second condensed gas, and conveying the second condensed gas to the first gas filtering member; A second liquid storage member, the second liquid storage member is connected to the second condensing member and the waste liquid treatment equipment respectively, and is used to store dichlorosilane; and / or The first gas filter component comprises: a first filter element, the first filter element being in communication with the condensation element and the second gas filter element respectively, and being located downstream of the condensation element and upstream of the second gas filter element, for filtering the condensed gas to remove phosphine to obtain a first filtered gas, and conveying the first filtered gas to the second gas filter element; and / or a second filter element, the second filter element being in communication with the condensation component and the second gas filter component respectively, and being located downstream of the condensation component and upstream of the second gas filter component, for filtering the condensed gas to remove diborane to obtain a second filtered gas, and delivering the second filtered gas to the second gas filter component; a third filter element, the third filter element being connected to the condensation component and the second gas filter component respectively, and being located downstream of the condensation component and downstream of the second gas filter component, for filtering the condensed gas to remove germanium hydride to obtain a third filtered gas, and conveying the third filtered gas to the second gas filter component; and / or The second gas filter component comprises: The fourth filter element is connected to the first gas filter component, the downstream gas processing equipment, and the waste liquid processing equipment respectively, and is located downstream of the first gas filter component and upstream of the downstream gas processing equipment, and is used to filter the filtered gas to remove acidic gases to obtain H2 with a purity of 2N to 4N.

3. The mixed tail gas separation equipment according to claim 2, characterized in that: The condensing component also includes: a first valve body, the first valve body being disposed on a pipeline connecting the first condensing member with an upstream semiconductor process device and the first liquid storage member, and being used to control the flow of the pipeline; a second valve body, the second valve body being disposed on a pipeline connecting the first liquid storage member, the first condensing member and the waste liquid treatment device, and being used to control the flow of the pipeline; and / or The condensing component also includes: a third valve body, the third valve body being disposed on a pipeline connecting the second condensing member and the second liquid storage member, the first gas filtering member, and the waste liquid treatment device, and being used to control the flow of the pipeline; and / or The first gas filter component also includes: a fourth valve body, the fourth valve body being arranged on a pipeline connecting the first filter element, the condensation component and the second gas filter component, and being used for controlling the flow of the pipeline; and / or a fifth valve body, the fifth valve body being arranged on a pipeline connecting the second filter element, the condensation component and the second gas filter component, and being used for controlling the flow of the pipeline; and / or a sixth valve body, the sixth valve body being arranged on a pipeline between the third filter element, the condensation component and the second gas filter component, and being used to control the flow of the pipeline; and / or The second gas filter component also includes: The seventh valve body is arranged on the pipeline connecting the fourth filter element, the first gas filter component and the downstream gas processing equipment, and is used to control the flow of the pipeline.

4. The mixed tail gas separation equipment according to claim 2, characterized in that: The condensing component also includes: A first monitoring component, which is in communication with the first liquid storage component and is used to monitor the pressure, temperature and liquid level inside the first liquid storage component; and / or The condensing component also includes: A second monitoring component, the second monitoring component is connected to the second liquid storage component and is used to monitor the pressure, temperature and liquid level inside the second liquid storage component; and / or The first gas filter component also includes: A third monitoring element, the third monitoring element being in communication with the first filter element and being used for monitoring the temperature inside the first filter element; and / or a fourth monitoring element, the fourth monitoring element being in communication with the second filter element and being used for monitoring the pressure and liquid level inside the second filter element; and / or a fifth monitoring element, the fifth monitoring element being in communication with the third filter element and being used for monitoring the pressure and liquid level inside the third filter element; and / or The second gas filter component also includes: A sixth monitoring component is communicated with the fourth filter component and is used for monitoring the pressure and liquid level inside the fourth filter component.

5. The mixed tail gas separation equipment according to any one of claims 1 to 4, characterized in that: There are at least two first gas filter components, and several of the first gas filter components are arranged in parallel with each other; and / or There are at least two second gas filter components, and several of the second gas filter components are arranged in parallel with each other.

6. The mixed tail gas separation equipment according to claim 5, characterized in that: Also includes: A gas analysis component, the gas analysis component is connected to the first gas filter component and the second gas filter component respectively, and is used to detect whether the first filtered gas, the second filtered gas, and the third filtered gas meet the requirements; and / or a purge component, the purge component being respectively connected to the condensation component, the first gas filter component, and the second gas filter component, and being used for purging the condensation component, the first gas filter component, and the second gas filter component; and / or a vacuum component, the vacuum component being connected to the condensation component, the first gas filter component, and the second gas filter component, respectively, and being used to discharge the gas inside the condensation component, the first gas filter component, and the second gas filter component; and / or A pressure relief component is connected to the condensation component, the first gas filter component and the second gas filter component respectively, and is used to relieve pressure on the condensation component, the first gas filter component and the second gas filter component.

7. The mixed tail gas separation equipment according to claim 6, characterized in that: The gas analysis component comprises: a first gas analysis element, which is connected to the second filter element in the first gas filter component and is located downstream of the second filter element, and is used to detect whether the gas processed by the second filter element meets the standard; and / or The gas analysis component comprises: a second gas analysis element, which is connected to the third filter element in the first gas filter component and is located downstream of the third filter element, and is used to detect whether the gas processed by the third filter element meets the standard; and / or The gas analysis component comprises: a third gas analysis component, the third gas analysis component being in communication with the second gas filter component and being located downstream of the second gas filter component, and being used for detecting whether the gas processed by the second gas filter component meets the standard; and / or The purge component comprises: a purge component, the purge component being respectively connected to the condensation component, the first gas filter component, and the second gas filter component, and being used for purging the condensation component, the first gas filter component, and the second gas filter component; and / or The vacuum component comprises: a vacuum component, the vacuum component being connected to the condensing component, the first gas filtering component, and the second gas filtering component, respectively, and being used to discharge the gas inside the condensing component, the first gas filtering component, and the second gas filtering component; and / or The pressure relief component comprises: a first pressure relief member, the first pressure relief member being in communication with the condensation component and the vacuum component respectively, and being used for relieving pressure on the condensation component; a second pressure relief member, the second pressure relief member being connected to the first gas filter component and the vacuum component respectively, and being used for relieving pressure on the first gas filter component; A third pressure relief component is connected to the second gas filter component and the vacuum component respectively, and is used for relieving pressure on the second gas filter component.

8. The mixed tail gas separation equipment according to claim 7, characterized in that: The purge component also includes: a ninth valve body, the ninth valve body being arranged on a pipeline connecting the purge component and the condensation component, the first gas filter component and the second gas filter component, and being used for controlling the flow of the pipeline; and / or The vacuum component comprises: The tenth valve body is arranged on the pipeline connecting the vacuum component with the condensation component, the first gas filter component and the second gas filter component, and is used to control the flow of the pipeline.

9. The mixed tail gas separation device according to claim 7 or 8, characterized in that: The purge component also includes: a seventh monitoring component, the seventh monitoring component being arranged on a pipeline connected to the purge component and being used for monitoring the pressure inside the pipeline; and / or The vacuum component also includes: An eighth monitoring component is disposed on a pipeline connected to the vacuum component and is used to monitor the pressure inside the pipeline.

10. A semiconductor process system, characterized in that: include: The mixed tail gas separation device according to any one of claims 1 to 9.

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