A coating device
By setting a compensation plate in the coating cavity and forming a concave and convex structure on its edges, the problem of the existing coating device being unsatisfactory when adjusting the uniformity of the film thickness of the film is solved, and precise adjustment of the uniformity of the film layer distribution on the workpiece surface is achieved.
Patent Information
- Application Number
- CN202420599803.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-26
- Publication Date
- 2025-04-01
- Estimated Expiration
- 2034-03-26
AI Technical Summary
The existing coating devices are not ideal when adjusting the uniformity of the film thickness and cannot meet the needs of use.
A coating device is designed, by providing a compensation plate in the coating cavity, the second end of the compensation plate extends between the coating source and the workpiece, and forming a concave and convex structure at its edges to adjust the amount of deposition of the coating material in different areas of the surface of the workpiece.
It realizes accurate adjustment of the uniformity of the film layer distribution on the workpiece surface, which is more adaptable and is not limited by the coating area.
Smart Images

Figure CN222700401U_ABST
Abstract
Description
Technical Field
[0001] The present application belongs to the field of film coating technology, and specifically relates to a film coating device. Background Art
[0002] The principle of RPD (Reactive Plasma Deposition) plasma deposition coating is to bombard the target surface with a plasma beam. In a vacuum environment, the sublimated target ions are activated in the plasma area to form an ion state, and react with the introduced reaction gas to form a thin film deposited on the substrate surface. In the use of RPD equipment, due to factors such as the number and position distribution of the evaporation furnaces and the magnetic field in the cavity, the uniformity of the film deposited at different positions on the substrate to be plated varies.
[0003] In the related art, a shielding plate is arranged above the furnace, and a coating port is defined between the shielding plates or between the shielding plates and the inner wall of the coating chamber, so that the area of the substrate to be plated exposed at the coating port is concentrated directly above the furnace, so that the reaction gas and the target ions are always deposited on the area of the substrate to be plated directly above the furnace, thereby improving the uniformity of the film thickness. However, if this method is used, if the coating port is large, there will still be a problem of uneven film thickness. If the coating port is small, the coating area will be limited. Therefore, the adjustment effect on the uniformity of the film thickness is not ideal and cannot meet the use requirements. Utility Model Content
[0004] The present application aims to provide a coating device that can solve the problem that the coating device in the related art is not ideal in regulating the uniformity of film thickness and cannot meet the use requirements.
[0005] In order to solve the above technical problems, this application is implemented as follows:
[0006] The present application embodiment provides a coating device, which is characterized by comprising:
[0007] A coating chamber, wherein a coating source is disposed in the coating chamber for coating the workpiece;
[0008] The compensation plate is arranged in the coating chamber, and the compensation plate includes a first end and a second end opposite to each other.
[0009] Two ends, the first end is installed on the cavity wall of the coating cavity, the second end extends to between the coating source and the workpiece, and the edge of the second end is formed with a concave-convex structure for adjusting the uniformity of the film layer distribution on the surface of the workpiece.
[0010] Optionally, the compensation plate includes a plurality of splicing plates, and the plurality of splicing plates are sequentially arranged in parallel;
[0011] The cavity wall of the coating cavity is provided with a mounting portion, one end of the splicing plate is connected to the mounting portion, and the other end extends between the coating source and the workpiece; a plurality of the splicing plates are arranged on a side away from the mounting portion to form the concave-convex structure.
[0012] Optionally, a plurality of the splicing plates are parallel to each other and movably connected to the mounting portion, and each of the splicing plates can be moved relative to the mounting portion to adjust the shape of the concave-convex structure.
[0013] Optionally, the coating device further comprises: a plurality of adjustment components, each of which is connected to a corresponding splicing plate, and the adjustment component is used to adjust the position of the corresponding splicing plate to adjust the shape of the concave-convex structure.
[0014] Optionally, one end of the adjustment component away from the splicing plate is penetrated through the cavity wall of the coating cavity and at least partially extends outside the coating cavity. The adjustment component can move relative to the coating cavity to adjust the position of the splicing plate.
[0015] Optionally, the adjustment assembly includes an adjustment rod, a transmission gear and a rack;
[0016] The mounting portion is provided with a slide groove at a position corresponding to each of the splicing plates, the rack is slidably connected in the slide groove, and the splicing plates are connected to the rack;
[0017] The adjusting rod is penetrated through the cavity wall of the coating cavity, one end of the adjusting rod extends into the coating cavity and is connected to the transmission gear, the transmission gear is meshed with the rack, the other end of the adjusting rod is exposed in the coating cavity, and the adjusting rod can rotate relative to the coating cavity.
[0018] Optionally, a mounting hole is provided in the cavity wall of the coating cavity at a position corresponding to the adjusting rod, the adjusting rod is passed through the mounting hole, and a sealing mechanism is provided between the hole wall of the mounting hole and the adjusting rod for sealing the adjusting rod and the cavity wall of the coating cavity.
[0019] Optionally, the sealing mechanism is configured as a magnetic fluid sealing mechanism.
[0020] Optionally, the number of the coating sources is at least two, and the at least two coating sources are spaced apart in the coating cavity, and the arrangement direction of the plurality of splicing plates is consistent with the arrangement direction of the at least two coating sources.
[0021] Optionally, along the arrangement direction of the plurality of splicing plates, the width of each of the splicing plates is the same.
[0022] Optionally, the coating device further comprises: a transmission mechanism, the transmission mechanism being used to transmit the workpiece through the coating chamber;
[0023] and / or, a plasma generator, the plasma generator being used to generate an ion beam toward the coating source to excite the coating source to generate coating material particles;
[0024] And / or, a gas delivery mechanism, wherein the gas delivery mechanism is used to introduce reaction gas into the coating chamber.
[0025] In an embodiment of the present application, a compensation plate is arranged in the coating chamber so that the compensation plate is located between the coating source and the workpiece, and a concave-convex structure is arranged on the edge of the compensation plate. The concave-convex structure can form different shielding effects on different areas above the coating source, thereby affecting the deposition amount of the coating material generated by the coating source in different areas of the workpiece surface, thereby achieving precise adjustment of the uniformity of the film layer distribution on the workpiece surface, and is not limited by the coating area of the workpiece, and has stronger adaptability.
[0026] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS
[0027] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:
[0028] Figure 1 is a schematic diagram of a coating device according to an embodiment of the present application;
[0029] Figure 2 is a schematic diagram of installing a shielding plate in a coating device according to an embodiment of the present application;
[0030] Figure 3 is a schematic diagram of the working principle of the shielding plate according to an embodiment of the present application;
[0031] Figure 4 is a schematic diagram of the installation of several splicing plates and mounting parts according to an embodiment of the present application;
[0032] Figure 5 is a schematic diagram of the connection between the splicing plate and the adjustment assembly according to an embodiment of the present application;
[0033] Figure 6 It is a schematic diagram of the working principle of the splicing plate and the adjustment component according to the embodiment of the present application.
[0034] Reference numerals:
[0035] 10: Equipment body; 101: Coating chamber; 102: Mounting part; 11: Coating source; 12: Workpiece;
[0036] 13: transmission mechanism; 14: plasma generator; 15: gas transmission mechanism; 20: compensation plate; 20a: first end; 20b: second end; 201: concave-convex structure; 202: splicing plate; 30: adjustment component; 301: adjustment rod; 302: transmission gear; 303: rack; 40: sealing mechanism. DETAILED DESCRIPTION
[0037] The embodiments of the present application will be described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and should not be construed as limitations on the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.
[0038] The term "first" or "second" in the specification and claims of this application may include one or more of the features explicitly or implicitly. In the description of this application, unless otherwise specified, "plurality" means two or more. In addition, "and / or" in the specification and claims means at least one of the connected objects, and the character " / " generally means that the objects connected before and after are in an "or" relationship.
[0039] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.
[0040] In the description of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal connection of two elements.
[0041] For those skilled in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0042] The coating device provided in the embodiment of the present application is described in detail below through specific embodiments and their application scenarios in combination with the accompanying drawings.
[0043] Before introducing the coating device provided in the embodiment of the present application in detail, the application scenario of the coating device is first specifically described:
[0044] In the solar cell production process, it is usually necessary to form a transparent conductive oxide layer (TCO) on at least one side of the cell surface. As an electron transport layer, TCO plays an important role in solar cells such as HJT cells, BC cells, and perovskite cells. RPD coating, as an important TCO film formation method, plays an irreplaceable role.
[0045] Compared with traditional magnetron sputtering, the RPD film formation method has better optical and electrical properties, less bombardment damage to the substrate, and can supplement the target material and replace different target materials in a vacuum environment. It has a wide range of applications both in laboratories and mass production lines.
[0046] However, due to the influence of factors such as the position distribution of the evaporation furnace, the magnetic field in the coating chamber, the target material and the film forming conditions, the deposition uniformity of the film layer at different positions on the same substrate will be different, especially for RPD equipment with multiple evaporation furnaces, the uniformity difference of the film thickness can reach about 40%. Especially when the substrate coating surface is large, the difference in the uniformity of the coating layer will increase.
[0047] In the related art, a compensation plate is provided in the RPD coating device, and the compensation plate is protrudingly provided on the inner wall of at least one side of the coating chamber, and then a coating port is defined between two opposite compensation plates, or between the compensation plate and the inner wall of the opposite coating chamber, and the substrate can be exposed at the coating port. The exposed area of the substrate is concentrated directly above the evaporation furnace chamber, and as the substrate continues to move, the reaction gas and the target material particles can always be deposited on the area of the substrate directly above the target material, thereby improving the uniformity of the film thickness on the substrate.
[0048] The compensation plate structure in the related art is used to limit the coating area to the top of the evaporation furnace using the coating port defined by the compensation plate. Although it can improve the uniformity of the film thickness to a certain extent, it is subject to many restrictions during use. Since the coating area needs to be limited to the top of the evaporation furnace, the coating area is small each time, which is not suitable for coating substrates with larger areas.
[0049] The coating efficiency is low; in addition, when multiple evaporation furnaces are set in the RPD coating device, the compensation plate structure cannot meet the use requirements. To this end, the present application provides a coating arrangement that can improve the uniformity of film thickness distribution during coating.
[0050] The coating device provided in the embodiment of the present application is described in detail below through specific embodiments and their application scenarios in combination with the accompanying drawings.
[0051] like Figure 1 and Figure 2 As shown, according to some embodiments of the present application, the coating device includes: an equipment body 10 and a compensation plate 20, a coating cavity 101 is provided in the equipment body 10, a coating source 11 is provided in the coating cavity 101, and is used to coat the workpiece 12; the compensation plate 20 is arranged in the coating cavity 101, and the compensation plate 20 includes a first end 20a and a second end 20b opposite to each other, the first end 20a is installed on the cavity wall of the coating cavity 101, and the second end 20b extends between the coating source 11 and the workpiece 12, and a concave-convex structure 201 is formed on the edge of the second end 20b, which is used to adjust the uniformity of the film layer distribution on the surface of the workpiece 12.
[0052] In the embodiment of the present application, a compensation plate 20 is arranged in the coating chamber 101 of the equipment body 10, so that the compensation plate 20 is located between the coating source 11 and the workpiece 12, and a concave-convex structure 201 is arranged on the edge of the compensation plate 20. The concave-convex structure 201 can form different shielding effects on different areas above the coating source 11, thereby affecting the deposition amount of the coating material generated by the coating source 11 in different areas of the surface of the workpiece 12, thereby achieving a precise adjustment of the uniformity of the film layer distribution on the surface of the workpiece 12. It is not limited by the coating area of the workpiece and has stronger adaptability.
[0053] It is understandable that the coating device in the embodiment of the present application may be an RPD coating device, which may be used to form a coating layer by reactive deposition on the surface of the workpiece 12, for example, it may be used to form a transparent conductive layer on the surface of a solar cell. Of course, the structure of the coating device of the present application may also be applied to other types of coating devices, which is not limited in the present application.
[0054] Specifically, the working mechanism of the compensation plate 20 is explained based on the RPD coating device as an example. Of course, the coating device in the present application can also be other types of deposition coating devices, and their working mechanisms can be understood by reference, and the present application will not repeat them here.
[0055] The coating device includes an equipment body 10, a coating chamber 101 is provided in the equipment body 10, and a plasma generator 14, a transmission mechanism 13 and a gas transmission mechanism 15 are provided in the coating chamber 101. The coating source 11 may include a heating furnace and a target material, the heating furnace is arranged at the bottom of the coating chamber 101, and the target material is arranged at the bottom of the coating chamber 101.
[0056] It is installed in a heating furnace, and the target material can be heated by the heating furnace.
[0057] Then, Ar gas generates plasma through the plasma generator 14. Under the support of the magnetic field and the electric field, the Ar plasma deviates and bombards the surface of the target material. At the same time, the furnace is heated to heat the target material. After heating, part of the target material sublimates into gas and migrates upward. The transmission mechanism 13 is arranged opposite to the coating source 11. The transmission mechanism 13 can transport the workpiece 12 to be coated to pass over the target material, so that the sublimated target material particles can be deposited on the surface of the workpiece 12. At the same time, the gas delivery mechanism 15 is used to transport the reaction gas into the coating chamber 101, and the reaction gas reacts with the sublimated target material particles to form a coating layer on the surface of the workpiece 12.
[0058] It is understandable that during the coating operation, the film thickness and the uniformity of the film distribution are two key indicators of the film quality. Among them, by changing the speed of the workpiece 12 moving above the evaporation furnace, the coating time can be extended or shortened, and the thickness of the film deposited on the surface of the workpiece 12 can be controlled. However, the uniformity of the film thickness distribution at different positions on the surface of the workpiece 12 is more difficult to adjust and control by setting process parameters.
[0059] To this end, in the embodiment of the present application, a compensation plate 20 is arranged in the coating chamber 101 of the equipment body 10, so that the first end of the compensation plate 20 is connected to the cavity wall of the coating chamber 101 in the equipment body 10, and the second end of the compensation plate 20 extends between the coating source 11 and the workpiece 12, and a concave-convex structure 201 is arranged at the second end of the compensation plate 20, so that during the upward migration of the target particles generated by the sublimation of the target material, some areas will be blocked by the compensation plate 20. The edge of the compensation plate 20 is provided with a concave-convex structure 201, so that the degree of shielding of different areas is different, which will affect the deposition amount of the target particles in different areas on the surface of the workpiece 12, and then the thickness of the film layer deposited in different areas on the surface of the workpiece 12 can be controlled, so as to achieve the precise adjustment of the uniformity of the thickness distribution of the film layer on the surface of the workpiece 12.
[0060] In practical applications, the concave-convex structure 201 at the edge of the compensation plate 20 can be set accordingly according to the distribution of the film thickness on the surface of the workpiece 12 when the compensation plate 20 is not set. Figure 3 As shown, the surface of the workpiece 12 can be divided into multiple regions, such as Figure 3 The workpiece surface is divided into five regions from top to bottom, and the thickness difference of the film layer in different regions is analyzed: if a certain region (such as Figure 3 If the film thickness of a certain area (such as the fourth area) is too thick, the corresponding portion of the edge of the compensation plate 20 is set as a protruding structure, and the thicker the thickness, the more protruding it is; on the contrary, if a certain area (such as Figure 3 No.1
[0061] 5 area) is too thin, then the portion corresponding to it at the edge of the compensation plate 20 is set as a concave structure, and the thinner the thickness, the more concave. Furthermore, by shielding the target material to different degrees by the convex structure and the concave structure, the thickness of the film layer at different positions can be corrected, thereby achieving precise adjustment and control of the film layer thickness distribution on the surface of the workpiece 12.
[0062] In some embodiments, the operation process of using the compensation plate 20 to adjust the uniformity of the film layer distribution on the surface of the workpiece 12 is as follows: the surface of the workpiece 12 is divided into several areas, and the film thickness distribution in each area is detected. According to the measured film thickness distribution data, the film thickness compensation amount of each area is calculated. Then, the concave-convex structure 201 on the edge of the compensation plate 20 is designed and processed according to the compensation amount, and the compensation plate 20 is loaded into the coating cavity 101 of the equipment body 10, and then the coating operation is performed. Then, the adjusted and corrected film thickness distribution data is measured again, and the concave-convex structure 201 on the surface of the compensation plate 20 is trimmed based on the measured data. Repeat the operation until the expected compensation plate 20 structure is obtained, and the compensation plate 20 is loaded into the coating cavity 101 to carry out the coating operation process.
[0063] It should be noted that the compensation plate 20 in the present application can be made of a rigid material, and the material used to make the compensation plate 20 does not chemically react with the reaction gas, and one end of the compensation plate 20 can be cut and processed to obtain the corresponding concave-convex structure 201. The concave-convex structure 201 at the end of the compensation plate 20 can be flexibly set according to actual use requirements, and the embodiments of the present application do not limit this.
[0064] Alternatively, if Figure 4 As shown, the compensation plate 20 includes a plurality of splicing plates 202, and the plurality of splicing plates 202 are arranged in parallel in sequence; a mounting portion 102 is provided on the cavity wall of the coating cavity 101, one end of the splicing plate 202 is movably connected to the mounting portion 102, and the other end extends between the coating source 11 and the workpiece 12; the plurality of splicing plates 202 are arranged on a side away from the mounting portion 102 to form a concave-convex structure 201.
[0065] In the embodiment of the present application, the compensation plate 20 is formed by splicing a plurality of splicing plates 202, and the plurality of splicing plates 202 are arranged on a side away from the mounting portion 102 to form a concave-convex structure 201, so as to use the concave-convex structure 201 to correct the uniformity of the film layer distribution on the surface of the workpiece 12. Furthermore, by changing the position and number of the splicing plates 202, the concave-convex structure 201 can be adjusted. At the same time, when the compensation plate 20 needs to be partially repaired, the corresponding part of the splicing plates 202 can be repaired or replaced, thereby reducing the maintenance and use costs.
[0066] Optionally, a plurality of splicing plates 202 are parallel to each other and movably connected to the mounting portion 102, each splicing plate 202 being
[0067] The plates 202 can move relative to the mounting portion 102 to adjust the shape of the concave-convex structure 201 .
[0068] In the embodiment of the present application, the compensation plate 20 is formed by splicing a plurality of splicing plates 202, and the plurality of splicing plates 202 are arranged on a side away from the mounting portion 102 to form a concave-convex structure 201, so as to use the concave-convex structure 201 to correct the uniformity of the film layer distribution on the surface of the workpiece 12. Furthermore, each splicing plate 202 is movably connected to the mounting portion 102, and the position of each splicing plate 202 can be adjusted to change the shape of the concave-convex structure 201 formed by the ends of the plurality of splicing plates 202, thereby changing the correction effect of the concave-convex structure 201 on the film layer thickness to meet different correction requirements.
[0069] Furthermore, by splicing a plurality of splicing plates 202 to form the compensation plate 20, the same compensation plate 20 can be used for film thickness correction operations in different scenarios, thereby improving the applicability of the compensation plate 20 and reducing the cost of use.
[0070] Specifically, a mounting portion 102 is provided in the coating cavity 101 of the device body 10. The mounting portion 102 may be a structure formed by protrusion of the cavity wall of the coating cavity 101, or may be a structural member separately provided on the cavity wall of the coating cavity 101, for installing a plurality of splicing plates 202. Furthermore, a plurality of mounting holes or mounting grooves may be provided in the mounting portion 102, so that each splicing plate 202 is correspondingly installed in a mounting hole or a mounting groove, and the splicing plate 202 may reciprocate along its extension direction. Furthermore, by adjusting the position of each splicing plate 202, the shape of the formed concave-convex structure 201 may be changed.
[0071] It should be noted that the workpiece 12 and the coating source 11 are arranged in the vertical direction, and the multiple splicing plates 202 can be arranged in the horizontal direction. Two adjacent splicing plates 202 can be fitted together, or there can be a partial gap. In addition, the structures of the multiple splicing plates 202 can be the same or different, and the number of splicing plates 202 forming the compensation plate 20 can be flexibly set according to the actual correction requirements, and the embodiment of the present application does not limit this.
[0072] Optionally, the coating device further includes: a plurality of adjustment components 30 , each adjustment component 30 is connected to a corresponding splicing plate 202 , and the adjustment component 30 is used to adjust the position of the corresponding splicing plate 202 to change the shape of the concave-convex structure 201 .
[0073] In the embodiment of the present application, an adjustment component 30 is provided for each splicing plate 202, so that the position of the splicing plate 202 relative to the mounting portion 102 can be flexibly adjusted by the adjustment component 30, thereby changing the shape of the concave-convex structure 201 formed by the ends of the plurality of splicing plates 202 to adapt to different
[0074] Modify requirements to facilitate actual operations.
[0075] Optionally, one end of the adjustment component 30 away from the splicing plate 202 is penetrated through the cavity wall of the coating cavity 101 and at least partially extends outside the coating cavity 101 . The adjustment component 30 can move relative to the coating cavity 101 to adjust the position of the splicing plate 202 .
[0076] In the embodiment of the present application, by setting the end of the adjustment component 30 away from the splicing plate 202 to at least partially extend outside the coating chamber 101, the adjustment component 30 can move relative to the coating chamber 101, so that the adjustment component 30 can be adjusted outside the coating chamber 101, thereby adjusting the positions of the multiple splicing plates 202 in the coating chamber 101. In this way, in actual use, the adjustment control can be completed without opening the coating chamber 101, which can simplify the operation and save equipment debugging time.
[0077] It is understandable that, in the coating operation process, the coating chamber 101 needs to be evacuated. If the splicing plate 202 is adjusted directly, the coating chamber 101 needs to be opened for each adjustment. After the position of the splicing plate 202 is adjusted, the vacuum needs to be evacuated again, which takes a long time to debug. In the present application, by setting the adjustment component 30 connected to each splicing plate 202 to at least partially extend outside the coating chamber 101, the adjustment operation can be completed outside the coating chamber 101, which can greatly shorten the equipment debugging time.
[0078] In some embodiments, the adjustment assembly 30 may include an adjustment rod 301, the mounting portion 102 is provided with a mounting hole or a mounting groove at a position corresponding to each splicing plate 202, the splicing plate 202 is slidably connected in the mounting hole or the mounting groove, one end of the adjustment rod 301 passes through the cavity wall of the coating cavity 101 and the mounting portion 102 in sequence and is connected to the splicing plate 202, and the other end of the adjustment rod 301 is exposed outside the coating cavity 101. When in use, the position adjustment operation of the splicing plate 202 can be achieved by moving the adjustment rod 301 back and forth outside the coating cavity 101.
[0079] It should be noted that the structure of the adjustment component 30 in the present application can be flexibly set according to actual conditions, as long as it can meet the purpose of adjusting the splicing plate 202 from the outside of the coating chamber 101. Technical personnel in this field can flexibly set it according to actual conditions, and the embodiments of the present application do not limit this.
[0080] Alternatively, if Figure 5 and Figure 6As shown, the adjustment assembly 30 includes an adjustment rod 301, a transmission gear 302 and a rack 303; the mounting portion 102 is provided with a slide groove at a position corresponding to each splicing plate 202, the rack 303 is slidably connected in the slide groove, and the splicing plate 202 is connected to the rack 303; the adjustment rod 301 is penetrated
[0081] The cavity wall of the coating cavity 101, one end of the adjusting rod 301 extends into the coating cavity 101 and is connected to the transmission gear 302, the transmission gear 302 is meshed with the rack 303, and the other end of the adjusting rod 301 is exposed in the coating cavity 101, and the adjusting rod 301 can rotate relative to the coating cavity 101.
[0082] In the embodiment of the present application, the rack 303 is slidably connected to the slide groove provided in the mounting portion 102, the splicing plate 202 is connected to the rack 303, and the adjusting rod 301 is provided with a transmission gear 302. Through the cooperation of the transmission gear 302 and the rack 303, the rotation of the adjusting rod 301 can be converted into the linear movement of the splicing plate 202, so as to adjust the position of the splicing plate 202. At the same time, one end of the adjusting rod 301 passes through the cavity wall of the coating cavity 101 and is exposed outside the coating cavity 101, so that the adjustment operation of each splicing plate 202 can be realized outside the coating cavity 101.
[0083] In addition, in the embodiment of the present application, the adjustment assembly 30 is composed of an adjustment rod 301, a transmission gear 302 and a rack 303. The structure is simple and easy to process and install, and the cost of use is low, which is also convenient for the design of the sealing mechanism.
[0084] Alternatively, if Figure 6 As shown, the device body 10 is provided with a mounting hole at a position corresponding to the adjusting rod 301, and the adjusting rod 301 is passed through the mounting hole. A sealing mechanism 40 is provided between the hole wall of the mounting hole and the adjusting rod 301, which is used to seal the adjusting rod 301 and the cavity wall of the coating cavity 101.
[0085] It is understandable that the coating operation needs to be carried out in a vacuum environment, and therefore there are certain requirements for the sealing of the coating chamber 101. In the embodiment of the present application, the adjusting rod 301 passes through a mounting hole in the cavity wall of the coating chamber 101. A sealing mechanism 40 is provided between the hole wall of the mounting hole and the adjusting rod 301 to seal the connection between the adjusting rod 301 and the cavity wall of the coating chamber 101, thereby meeting the sealing requirements of the coating chamber 101.
[0086] In specific applications, since the adjusting rod 301 and the device body 10 will move relative to each other, a sealing mechanism 40 that satisfies dynamic sealing can be selected. Specifically, a corresponding dynamic sealing mechanism can be designed according to the movement mode of the adjusting component 30 relative to the cavity wall of the coating cavity 101. For example, a reciprocating dynamic seal and a rotary dynamic seal can be selected according to the different movement modes of the adjusting component 30. For example, a dynamic sealing mechanism such as a packing seal, an expansion ring seal, and a magnetic fluid seal can be selected.
[0087] Alternatively, if Figure 6 As shown, the sealing mechanism 40 is configured as a magnetic fluid sealing mechanism. In the embodiment of the present application, a magnetic fluid sealing mechanism is provided between the hole wall of the mounting hole and the adjusting rod 301 so as to
[0088] When the adjusting rod 301 rotates relative to the coating chamber 101 , it plays a dynamic sealing role.
[0089] Specifically, the magnetic fluid sealing mechanism may include a sealing mechanism body, the sealing mechanism body is installed in the installation hole, the adjustment rod 301 is passed through the sealing mechanism body, and a plurality of sealing grooves are provided in the sealing mechanism body around the adjustment rod 301, and each sealing groove is filled with magnetic fluid. Then, under the action of the magnetic field, the magnetic fluid will form a sealing mechanism on the circumferential outer side of the adjustment rod 301, thereby achieving a sealing effect.
[0090] It should be noted that the magnetic fluid can be obtained by stably dispersing fine powder of a strong magnetic permanent magnet such as magnetite in liquids such as water, oils, esters, ethers, etc. The specific selection of the magnetic fluid can be flexibly set according to actual conditions, and the embodiments of the present application do not limit this.
[0091] Alternatively, if Figure 2 As shown, there are at least two coating sources 11 , and the at least two coating sources 11 are spaced apart in the coating chamber 101 . The arrangement direction of the plurality of splicing plates 202 is consistent with the arrangement direction of the at least two coating sources 11 .
[0092] In the embodiment of the present application, at least two coating sources 11 are provided in the coating chamber 101, so that the arrangement direction of the plurality of splicing plates 202 is consistent with the arrangement direction of the at least two coating sources 11, so that the structure of the compensation plate 20 is adapted to the distribution of the coating sources 11, thereby playing a role in regulating the uniformity of the thickness distribution of the film layer of the workpiece 12 and reducing the influence of the number of coating sources 11 set on the distribution of the film layer thickness.
[0093] Optionally, along the arrangement direction of the plurality of splicing plates 202 , the width of each splicing plate 202 is the same.
[0094] In the embodiment of the present application, by setting the width of each splicing plate 202 to be the same, it is equivalent to dividing the compensation plate 20 into several parts along the arrangement direction of the plurality of splicing plates 202. In this way, during use, it is convenient to accurately adjust the shape of the concave-convex structure 201 according to the measured film thickness distribution data. At the same time, the versatility of each splicing plate 202 can also be improved.
[0095] It can be understood that the width dimension of each splicing plate 202 can be determined according to the size of the area division of the surface of the workpiece 12, and each splicing plate 202 can correspond to an area on the workpiece 12. The specific size setting of the splicing plate 202 can be flexibly designed according to actual needs, and the embodiments of the present application do not limit this.
[0096] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.
[0097] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present application is defined by the claims and their equivalents.
Claims
1. A coating device, characterized in that: include: A coating chamber, wherein a coating source is disposed in the coating chamber for coating the workpiece; A compensation plate is arranged in the coating chamber, and the compensation plate includes a first end and a second end relative to each other, the first end is installed on the cavity wall of the coating chamber, the second end extends to between the coating source and the workpiece, and the edge of the second end is formed with a concave-convex structure for adjusting the uniformity of the film layer distribution on the surface of the workpiece.
2. The coating device according to claim 1, characterized in that: The compensation plate includes a plurality of splicing plates, and the plurality of splicing plates are arranged in parallel in sequence; The cavity wall of the coating cavity is provided with a mounting portion, one end of the splicing plate is connected to the mounting portion, and the other end extends between the coating source and the workpiece; a plurality of the splicing plates are arranged on a side away from the mounting portion to form the concave-convex structure.
3. The coating device according to claim 2, characterized in that: A plurality of the splicing plates are parallel to each other and movably connected to the mounting portion, and each of the splicing plates can be moved relative to the mounting portion to adjust the shape of the concave-convex structure.
4. The coating device according to claim 3, characterized in that: The coating device further includes: a plurality of adjustment components, each of which is connected to a corresponding splicing plate, and the adjustment component is used to adjust the position of the corresponding splicing plate to adjust the shape of the concave-convex structure.
5. The coating device according to claim 4, characterized in that: One end of the adjustment component away from the splicing plate is penetrated through the cavity wall of the coating cavity and at least partially extends outside the coating cavity. The adjustment component can move relative to the coating cavity to adjust the position of the splicing plate.
6. The coating device according to claim 5, characterized in that: The adjustment assembly includes an adjustment rod, a transmission gear and a rack; The mounting portion is provided with a slide groove at a position corresponding to each of the splicing plates, the rack is slidably connected in the slide groove, and the splicing plates are connected to the rack; The adjusting rod is penetrated through the cavity wall of the coating cavity, one end of the adjusting rod extends into the coating cavity and is connected to the transmission gear, the transmission gear is meshed with the rack, the other end of the adjusting rod is exposed in the coating cavity, and the adjusting rod can rotate relative to the coating cavity.
7. The coating device according to claim 6, characterized in that: The cavity wall of the coating cavity is provided with a mounting hole at a position corresponding to the adjusting rod, the adjusting rod is passed through the mounting hole, and a sealing mechanism is provided between the hole wall of the mounting hole and the adjusting rod for sealing the adjusting rod and the cavity wall of the coating cavity.
8. The coating device according to claim 7, characterized in that: The sealing mechanism is configured as a magnetic fluid sealing mechanism.
9. The coating device according to claim 2, characterized in that: Along the arrangement direction of the plurality of splicing plates, the width of each splicing plate is the same.
10. The coating device according to claim 1, characterized in that: The coating device further comprises: a transmission mechanism, the transmission mechanism being used to transmit the workpiece through the coating chamber; and / or, a plasma generator, the plasma generator being used to generate an ion beam toward the coating source to excite the coating source to generate coating material particles; And / or, a gas delivery mechanism, wherein the gas delivery mechanism is used to introduce reaction gas into the coating chamber.