Cleaning mechanism for reaction cavity of plasma etching equipment
By designing a reaction chamber cleaning mechanism of a plasma etching equipment including a chute, a slider, a threaded rod and a worm gear mechanism, the complex cleaning process in the prior art is solved, and an efficient and convenient reaction chamber cleaning effect is achieved.
Patent Information
- Application Number
- CN202421210134.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-30
- Publication Date
- 2025-04-18
- Estimated Expiration
- 2034-05-30
AI Technical Summary
The cleaning method of the reaction chamber of existing plasma etching equipment requires overall disassembly, resulting in complex and inconvenient cleaning process.
A reaction chamber cleaning mechanism of plasma etching equipment is designed, adopting a chute and a slider structure, combining a threaded rod and a worm gear mechanism, and driving the cleaning roller to move on the inner wall of the bottom of the reaction chamber through a motor to achieve the cleaning of the deposit.
The device can effectively clean up the sediment at the bottom of the reaction chamber, improve cleaning effect, simplify the cleaning process, and improve convenience and stability.
Smart Images
Figure CN222766895U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of plasma etching, in particular to a plasma etching equipment reaction chamber cleaning mechanism. Background Art
[0002] The reaction chamber of the plasma etching equipment will be in contact with plasma gas for a long time, and chemical substances will be deposited on the surface to a greater or lesser extent.
[0003] These deposited substances may be released again to affect the subsequent etching effect, so the reaction chamber needs to be cleaned regularly. However, the existing cleaning method requires the reaction chamber to be disassembled as a whole and then cleaned, and the cleaning process becomes complicated due to disassembly and assembly. Utility Model Content
[0004] The utility model aims to solve the shortcomings in the prior art and proposes a plasma etching equipment reaction chamber cleaning mechanism.
[0005] In order to achieve the above purpose, the utility model adopts the following technical solutions:
[0006] A plasma etching equipment reaction chamber cleaning mechanism comprises a shell, both sides of the shell are provided with slide grooves, a slider is movably connected in the slide groove, the top of the slider is fixedly connected to two springs, and the springs are fixed to the top inner wall of the shell, one side of the slider is fixedly connected to a threaded rod, and the threaded rod is fixed to the shell, the outer side of the threaded rod is movably connected to a fixed plate, the bottom of the fixed plate is fixedly connected to a connecting frame, the inside of the fixed plate is movably connected to a worm gear, and the worm gear is threadedly connected to the threaded rod, the bottom of the connecting frame is movably connected to a cleaning roller, and the top of the connecting frame is provided with a power component.
[0007] As a further solution of the utility model, two positioning columns are inserted into the top of the shell, and the positioning columns are fixed to the slider, and the spring is sleeved on the outside of the positioning columns.
[0008] As a further solution of the utility model, the power assembly includes a motor, which is fixed to the upper surface of the connecting frame by bolts, a worm is installed at one end of the motor output shaft, and the worm is meshed with the worm wheel, one end of the cleaning roller and one end of the worm are fixedly connected with a pulley, and a belt is wound around the two pulleys.
[0009] As a further solution of the utility model, a magnetic strip is fixedly connected to the bottom of the shell.
[0010] As a further solution of the utility model, two fixing blocks are fixedly connected to the top of the connecting frame, and the worm passes through one of the fixing blocks.
[0011] As a further solution of the utility model, two guide rods are fixedly connected between the sliding block and the housing, and the guide rods are slidably connected to the fixed block.
[0012] As a further solution of the utility model, a heating wire is installed on the top inner wall of the shell.
[0013] The beneficial effects of the utility model are:
[0014] 1. Through the setting of the cleaning roller, the cleaning roller moves along the bottom inner wall of the reaction chamber of the plasma etching equipment while rotating, so that the cleaning roller cleans the substances deposited at the bottom of the reaction chamber, thereby improving the cleaning effect of the device.
[0015] 2. The setting of the magnetic strip makes it convenient for the staff to connect and fix the device to the reaction chamber of the plasma etching equipment, thereby improving the convenience of the device.
[0016] 3. By setting the guide rod, the connecting frame can be moved stably, avoiding the connecting frame from tilting during the movement, thereby improving the stability of the device. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 This is a three-dimensional structural schematic diagram of a plasma etching equipment reaction chamber cleaning mechanism proposed by the utility model;
[0018] Figure 2 This is a schematic diagram of the cross-sectional structure of a shell of a plasma etching equipment reaction chamber cleaning mechanism proposed by the utility model;
[0019] Figure 3 The utility model is a schematic diagram of the enlarged structure of part A of a plasma etching equipment reaction chamber cleaning mechanism.
[0020] In the figure: 1. Shell; 2. Magnetic strip; 3. Heating wire; 4. Guide rod; 5. Worm gear; 6. Slide groove; 7. Slider; 8. Belt; 9. Pulley; 10. Cleaning roller; 11. Connecting frame; 12. Worm; 13. Fixed plate; 14. Fixed block; 15. Threaded rod; 16. Positioning column; 17. Spring. DETAILED DESCRIPTION
[0021] It should be noted that the terms "first", "second", etc. in the specification and claims of this application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence, so that the embodiments of the application described here, based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative work should fall within the scope of protection of this application.
[0022] Reference Figure 1-Figure 3A plasma etching equipment reaction chamber cleaning mechanism includes a shell 1, characterized in that both sides of the shell 1 are provided with a slide groove 6, a slider 7 is slidably connected in the slide groove 6, two springs 17 are welded on the top of the slider 7, and the spring 17 is fixed to the top inner wall of the shell 1, the shell 1 is placed on the top of the plasma etching equipment reaction chamber, at this time, the cleaning roller 10 is restricted by the bottom inner wall of the reaction chamber, the spring 17 contracts, so that the cleaning roller 10 is in close contact with the bottom inner wall of the reaction chamber, a threaded rod 15 is fixed to one side of the slider 7 by bolts, and the threaded rod 15 is fixed to the shell 1, the outer side of the threaded rod 15 is slidably connected to the fixed plate 13, the bottom of the fixed plate 13 is fixed to the connecting frame 11 by bolts, the inside of the fixed plate 13 is rotatably connected to the worm gear 5, and the worm gear 5 is threadedly connected to the threaded rod 15, and the bottom of the connecting frame 11 is rotatably connected to the cleaning roller 10 A power assembly is provided on the top of the connecting frame 11. The power assembly enables the worm wheel 5 to move along the threaded rod 15 while rotating, so that the parts installed on the connecting frame 11 are moved as a whole, and then the cleaning roller 10 moves along the bottom inner wall of the reaction chamber while rotating, so as to clean the reaction chamber. The power assembly includes a motor, which is fixed to the upper surface of the connecting frame 11 by bolts. A worm 12 is installed at one end of the motor output shaft, and the worm 12 is meshed with the worm wheel 5. A pulley 9 is fixed to one end of the cleaning roller 10 and one end of the worm 12 by bolts. A belt 8 is wound around the two pulleys 9. The rotation of the motor causes the worm 12 to drive the pulley 9 to rotate, so that the cleaning roller 10 rotates. At the same time, the rotation of the worm 12 causes the worm wheel 5 to rotate. Since the worm wheel 5 is threadedly connected to the threaded rod 15, the worm wheel 5 moves along the threaded rod 15 while rotating.
[0023] In the present utility model, it should be noted that two positioning columns 16 are inserted at the top of the shell 1, and the positioning columns 16 are fixed to the slider 7, and the spring 17 is sleeved on the outside of the positioning columns 16. The positioning columns 16 can guide the slider 7 so that it can move stably. The bottom of the shell 1 is fixed with a magnetic strip 2 by bolts. The magnetic strip 2 is convenient for the staff to connect and fix the shell 1 with the reaction chamber of the ion etching equipment. Two fixing blocks 14 are fixed to the top of the connecting frame 11 by bolts, and the worm 12 passes through one of the fixing blocks 14. Two guide rods 4 are fixed between the slider 7 and the shell 1 by bolts, and the guide rods 4 are slidably connected to the fixing blocks 14. The guide rods 4 can guide the fixing blocks 14 so that the connecting frame 11 can move stably and avoid the connecting frame 11 from tilting during the movement. A heating wire 3 is installed on the top inner wall of the shell 1. After cleaning, the heating wire 3 can dry the cleaning roller 10.
[0024] Working principle: When the reaction chamber of the plasma etching equipment needs to be cleaned, first spray cleaning liquid on the cleaning roller 10, place the shell 1 on the top of the reaction chamber of the plasma etching equipment, and attract and fix the plasma etching equipment through the magnetic strip 2. At this time, the cleaning roller 10 contacts the bottom inner wall of the reaction chamber and is restricted by the bottom inner wall of the reaction chamber. The spring 17 contracts, so that the cleaning roller 10 is in close contact with the bottom inner wall of the reaction chamber, and then the motor is started. The motor rotates to make the worm 12 drive the pulley 9 to rotate, so that the cleaning roller 10 rotates. At the same time, the worm 12 rotates to make the worm wheel 5 rotate. Since the worm wheel 5 is threadedly connected to the threaded rod 15, the worm wheel 5 moves along the threaded rod 15 while rotating, so that the parts installed on the connecting frame 11 move as a whole, and then the cleaning roller 10 moves along the bottom inner wall of the reaction chamber while rotating, so that the cleaning roller 10 cleans the reaction chamber.
[0025] The present invention has been described through the above-mentioned embodiments. Those skilled in the art will appreciate that the present invention is not limited to the above-mentioned embodiments, and more modifications may be made according to the teachings of the present invention. These modifications are all within the scope of protection claimed by the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.
Claims
1. A plasma etching equipment reaction chamber cleaning mechanism, comprising a housing (1), characterized in that: Both sides of the housing (1) are provided with a slide groove (6), a slider (7) is movably connected in the slide groove (6), two springs (17) are fixedly connected to the top of the slider (7), and the spring (17) is fixed to the top inner wall of the housing (1), one side of the slider (7) is fixedly connected to a threaded rod (15), and the threaded rod (15) is fixed to the housing (1), the outer side of the threaded rod (15) is movably connected to a fixed plate (13), the bottom of the fixed plate (13) is fixedly connected to a connecting frame (11), the interior of the fixed plate (13) is movably connected to a worm gear (5), and the worm gear (5) is connected to the housing (1). The threaded rod (15) is threadedly connected, the bottom of the connecting frame (11) is movably connected to a cleaning roller (10), the top of the connecting frame (11) is provided with a power assembly, the bottom of the shell (1) is fixedly connected to a magnetic strip (2), the power assembly comprises a motor, the motor is fixed to the upper surface of the connecting frame (11) by bolts, a worm (12) is installed at one end of the motor output shaft, and the worm (12) is meshed with the worm wheel (5), one end of the cleaning roller (10) and one end of the worm (12) are fixedly connected to a pulley (9), and a belt (8) is wound between the two pulleys (9).
2. The plasma etching equipment reaction chamber cleaning mechanism according to claim 1, characterized in that: Two positioning columns (16) are inserted into the top of the housing (1), and the positioning columns (16) are fixed to the slider (7), and the spring (17) is sleeved on the outside of the positioning columns (16).
3. The plasma etching equipment reaction chamber cleaning mechanism according to claim 1, characterized in that: Two fixing blocks (14) are fixedly connected to the top of the connecting frame (11), and the worm (12) passes through one of the fixing blocks (14).
4. The plasma etching equipment reaction chamber cleaning mechanism according to claim 3, characterized in that: Two guide rods (4) are fixedly connected between the slide block (7) and the housing (1), and the guide rods (4) are slidably connected to the fixed block (14).
5. The plasma etching equipment reaction chamber cleaning mechanism according to claim 1, characterized in that: A heating wire (3) is installed on the top inner wall of the shell (1).